Design template for lithography training: Difference between revisions

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Created page with "We recommend using a combination of the following tools for designing devices: ; Klayout or CleWin (only for Windows) ; [Phidl] (python-based) ; Copilot (great tool to boost your productivity)"
 
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We recommend using a combination of the following tools for designing devices:
We recommend using a combination of the following tools for designing devices:
; Klayout or CleWin (only for Windows)
* Klayout or CleWin (only for Windows)
; [Phidl] (python-based)
* [[Phidl]] (python-based)
; Copilot (great tool to boost your productivity)
* Copilot (great tool to boost your productivity)
 
There is a code you can use as a basis to build the design for your EBL trainings.
 
You can find them on <code>N/SCI-NBI-Cleanroom/Elionix100 EXP files/general Training</code>.
* CR_template_training.gds ''design with alrignment marks and vernier patterns (~27mins exposure time)''
* design_template.ipynb
* layer1_training.ftxt ''BEAMER file for elionix 100keV with 500pA''

Revision as of 17:12, 17 February 2026

We recommend using a combination of the following tools for designing devices:

  • Klayout or CleWin (only for Windows)
  • Phidl (python-based)
  • Copilot (great tool to boost your productivity)

There is a code you can use as a basis to build the design for your EBL trainings.

You can find them on N/SCI-NBI-Cleanroom/Elionix100 EXP files/general Training.

  • CR_template_training.gds design with alrignment marks and vernier patterns (~27mins exposure time)
  • design_template.ipynb
  • layer1_training.ftxt BEAMER file for elionix 100keV with 500pA