Design template for lithography training: Difference between revisions
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Created page with "We recommend using a combination of the following tools for designing devices: ; Klayout or CleWin (only for Windows) ; [Phidl] (python-based) ; Copilot (great tool to boost your productivity)" |
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We recommend using a combination of the following tools for designing devices: | We recommend using a combination of the following tools for designing devices: | ||
* Klayout or CleWin (only for Windows) | |||
* [[Phidl]] (python-based) | |||
* Copilot (great tool to boost your productivity) | |||
There is a code you can use as a basis to build the design for your EBL trainings. | |||
You can find them on <code>N/SCI-NBI-Cleanroom/Elionix100 EXP files/general Training</code>. | |||
* CR_template_training.gds ''design with alrignment marks and vernier patterns (~27mins exposure time)'' | |||
* design_template.ipynb | |||
* layer1_training.ftxt ''BEAMER file for elionix 100keV with 500pA'' | |||
Revision as of 17:12, 17 February 2026
We recommend using a combination of the following tools for designing devices:
- Klayout or CleWin (only for Windows)
- Phidl (python-based)
- Copilot (great tool to boost your productivity)
There is a code you can use as a basis to build the design for your EBL trainings.
You can find them on N/SCI-NBI-Cleanroom/Elionix100 EXP files/general Training.
- CR_template_training.gds design with alrignment marks and vernier patterns (~27mins exposure time)
- design_template.ipynb
- layer1_training.ftxt BEAMER file for elionix 100keV with 500pA