Heidelberg µPG 501: Difference between revisions

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Revision as of 22:50, 14 February 2016


Work flow 1: Measuring diode intensity

Work flow 2: Loading the chip

  • Center the chip and mind the rotated XY coordinate system compared to all other systems in the house (Elionix, eLine, SEM, etc)
  • Find plate center to determine your chip dimensions
    • The exposure must NOT go over the chip else you risk crashing the write head (100 um working distance)


Work flow 3: Design conversion

  • Copy your design down to the Design PC. Access this folder from EXP PC.
    • gdsII, dxf, cif all work. DXF or GDS is recommended.
    • No local user sub folders - gds files go in the gds sub folder, etc.
  • Convert to HIMT format: (Complete tasks and then complete job)
    • Be aware that often overwriting an old job with a new file or changes still results in the old job file being exposed
    • Blank chip or overlay?


Work flow 4: Exposure

  • Dose test
  • Standard exposure (blank chip, no alignment to edge, etc)
  • Alignment:
    • Edge alignment on a blank rectangular chip
    • Cross alignment: Works like a dream
    • Manual alignment: If you don't have well defined alignment crosses


Workflow 5: Unload