Resist spin coating: Difference between revisions
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* Take the resist from the cabinet | * Take the resist from the cabinet | ||
* In a cleanroom wipe, write your name to let users know who is using the fumehood | * In a cleanroom wipe, write your name to let users know who is using the fumehood | ||
* Choose the correct chuck with respect to your chip size: | * Choose the correct chuck with respect to your chip size | ||
<blockquote style="background-color: #F0F0F0; border: dashed thin grey;"> | |||
You can follow this guide for the smallest dimension of your chip: | |||
* <5mm: small chuck | |||
* 6-10mm: medium chuck | |||
* >10mm: large chuck | |||
* 2-inch wafers or larger: No chuck | |||
</blockquote> | |||
* Place the chuck on the stage | * Place the chuck on the stage | ||
* Place your chip on the chuck | * Place your chip on the chuck | ||
* Center your chip and press ''Vacuum'' | * Center your chip and press ''Vacuum'' | ||
** If you | ** If you think that your chip is not centered, repeat this step | ||
* Choose a spinner recipe | * Choose a spinner recipe | ||
* Close the lid | * Close the lid | ||
Line 39: | Line 42: | ||
** Return the resist bottle to the designated place in the cabinet | ** Return the resist bottle to the designated place in the cabinet | ||
** Set the timer for baking | ** Set the timer for baking | ||
<blockquote style="background-color: #F0F0F0; border: dashed thin grey;"> | |||
* AZ photoresists: 115 \textdegrees C for 1 min | |||
* e-beam resists: 185 \textdegrees C for 2 mins | |||
</blockquote> | |||
* Once your recipe is done, open the lid | * Once your recipe is done, open the lid | ||
* Press ''Vacuum'' to disable the vacuum | * Press ''Vacuum'' to disable the vacuum from the back of your chip | ||
* Transfer your chip to the hot plate for baking and start the timer | * Transfer your chip to the hot plate for baking and start the timer | ||
* '''Start cleaning the spinner''' | * '''Start cleaning the spinner''' | ||
** You should spend a significant amount of time cleaning the spinner | ** '''You should spend a significant amount of time cleaning the spinner''' | ||
*** Clean the chuck | *** Clean the chuck | ||
*** Clean carefully inside the spinner | *** Clean carefully inside the spinner (both at the bottom and inside the lid) | ||
*** Don't forget the top hole | |||
* Remove your sample from the hot plate and store it in your sample box | * Remove your sample from the hot plate and store it in your sample box | ||
* Keep cleaning | * '''Keep cleaning the spinner until it is spotless''' | ||
* Log your cleaning in the Google-sheets (''cleaning agents'', ''comments'') | * Log your cleaning in the Google-sheets (''cleaning agents'', ''comments'') | ||
* Tidy up the fumehood for the | * Tidy up the fumehood for the following user | ||
* Continue with the next steps of your process | * Continue with the next steps of your process |
Revision as of 12:28, 19 December 2024
How to behave
- Always think of safety first!
- Wait patiently for the previous user to finish their process in the spin coater and then you can start using the fumehoom.
- Minimise the duration for which the resist bottle stays open (without a lid).
- Clean the spinner and the chuck until there are no resist marks left
- Use 1,3 Dioxolane for CSAR and LOR3B resists
- In any other case, use Acetone
- Is a resist missing? Not it in the whiteboard in the gowning area.
How to spin coat
- Log your process in the designated Google-Sheets file (date, name, resist stack):
- CR1: PC with Olympus microscope
- CR2: PC with Olympus microscope
- Take the resist from the cabinet
- In a cleanroom wipe, write your name to let users know who is using the fumehood
- Choose the correct chuck with respect to your chip size
You can follow this guide for the smallest dimension of your chip:
- <5mm: small chuck
- 6-10mm: medium chuck
- >10mm: large chuck
- 2-inch wafers or larger: No chuck
- Place the chuck on the stage
- Place your chip on the chuck
- Center your chip and press Vacuum
- If you think that your chip is not centered, repeat this step
- Choose a spinner recipe
- Close the lid
- Choose a pipette
- Hold the pipette with one hand
- With the other hand, open the resist bottle
- Squize a sufficient amount of resist
- Close the resist bottle
- Deposit a sufficient amount of resist on your chip via the hole on top of the lid
- You should cover the entire chip surface
- Avoid the formation of bubbles
- You should be able to observe surface tension from the resist liquid on top of your chip
- You should stop pouring resist before the surface tension collapses and the resist spills on the sides of your chip
- Play the recipe
- While your recipe is running:
- Return the resist bottle to the designated place in the cabinet
- Set the timer for baking
- AZ photoresists: 115 \textdegrees C for 1 min
- e-beam resists: 185 \textdegrees C for 2 mins
- Once your recipe is done, open the lid
- Press Vacuum to disable the vacuum from the back of your chip
- Transfer your chip to the hot plate for baking and start the timer
- Start cleaning the spinner
- You should spend a significant amount of time cleaning the spinner
- Clean the chuck
- Clean carefully inside the spinner (both at the bottom and inside the lid)
- Don't forget the top hole
- You should spend a significant amount of time cleaning the spinner
- Remove your sample from the hot plate and store it in your sample box
- Keep cleaning the spinner until it is spotless
- Log your cleaning in the Google-sheets (cleaning agents, comments)
- Tidy up the fumehood for the following user
- Continue with the next steps of your process