JEOL 7800F: Difference between revisions

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|manual = A printed version is in a blue binder by the instrument
|manual = A printed version is in a blue binder by the instrument
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The JEOL 7800F is a 30 kV field emission scanning electron microscope (SEM). It is equipped with two [https://en.wikipedia.org/wiki/Everhart-Thornley_detector secondary electron detectors] a backscatter detector, and a EDS detector. It has a eucentric stage, a range of different sample holders depending on application requirements, and can accommodate samples of up to 50 mm in diameter. A unique feature of this SEM, is its ability to place a negative bias on the sample stage in order to decelerate incoming electrons as well as to eject secondary electrons, thereby increasing the signal-to-noise ratio. This feature is known as gentle beam (GB), and is particularly useful when working at low acceleration voltages.


= Overview =
= Overview =


The JEOL 7800F is a 30 kV scanning electron microscope (SEM). It is equipped with two secondary electron ([https://en.wikipedia.org/wiki/Everhart-Thornley_detector Everhart-Thornley]) detectors: one in the chamber, known as the lower electron detector (LED), and one in the column, known as the upper electron detector, as well as a backscatter detector, and a EDS detector. The SEM and EDS systems are operated by two independent offline computers. Furthermore, the SEM room is equipped with a magnetic field cancellation system, with a sensor suspended adjacent to the electron beam column.
The different components of the SEM are illustrated in the two figures below:  
 
The different components and detectors of the SEM are illustrated in the two figures below:  
 
[[File:JEOL 7800F Overview 1.png|left|thumb|bla]]
[[File:JEOL 7800F Overview 2.png|left|thumb|bla]]
 
 
 
 
= Old wiki page =
 
The JEOL 7800F SEM is located in the basement in the room K08. The tool has a primary and a supporting Caar - Petur and Nader, respectively. The SEM is equipped with the following detectors:
* an Inlens detector, referred to as the UED (Upper electron detector)
* an SE2 detector, referred to as the LED (Lower electron detector)
* a back scattered electron detector, BSED
* an EDS (Energy dispersion X-ray detector)
 
The following manual is split up into three workflows:
* Loading your sample
* Beam conditioning
* Unloading your sample
 
Additionally, the sections are divided into basic, intermediate and advanced parts.
 
----
 
Here we go:
 
 
'''General Notes'''
 
Before loading your sample, one needs to choose the appropriate sample holder. There are 4 sample holders, and their dimensions determine the maximum sample size, working distance, and tilting one can use.
 
#12.5mm at 15WD 70 degrees, 10WD 50
#25mm - Tilt Max 50
#12.5mm Cross Section Holder
# 25mm Cross Section Holder
 
 
== Loading the sample ==
*Mount your sample on the correct sample holder using carbon tape or using a clip.
*Measure the offset your sample makes above the holder. One can recess their chip into the stage to reduce the chips offset to 0mm.
* Check that there is no sample in the chamber (In the instrument schematic in the JEOL software, the white stage line should be in the unload position).
*Vent the SEM chamber by holding down the Vent button on the side of the load lock until it starts to blink (1sec).
*Release the chip holding the door in place directly after letting go of the button to allow for a smoother transition. Open the door once the Vent button has stopped blinking.
*Place sample holder in the load lock tray. With one hand on the back of the door, grip the sample holder with two fingers and slide into place. Take note that orientation matters, and the arrows on the sample holder correspond to the direction it should be loaded.


[[File:JEOL 7800F Overview 1.png|left|thumb|Left side of the JEOL 7800F]]
[[File:JEOL 7800F Overview 2.png|left|thumb|Left side of the JEOL 7800F]]


*Close the Load Lock door and latch the door shut.
* The lower electron detector (LED) is a [https://en.wikipedia.org/wiki/Secondary_electrons secondary electron] detector, located in the chamber, and is mostly used for overview images, or in conjunction with sample tilting or high acceleration voltages.
*Evacuate the chamber by pressing and holding the load lock button on the side of the load lock until it starts blinking.
* The upper electron detector (UED) is an in-lens secondary electron detector located in the electron beam column. It is typically used for obtaining ultrahigh resolution iamges at low acceleration voltages. It is usually used in conjunction with the gentle beam (GB).
*Wait until the chamber has evacuated to the order of 10-2 Pa. There will be three hisses denoting the closing of the turbo pump value, opening the load lock door, and opening the turbo pump value again.
* The backscatter detector (BSD) measures the high energy electrons from the incident beam that are backscattered by the sample surface. Particularly useful for samples composed of different materials of contrasting densities. The detector is inserted by a pneumatic valve when needed by the user, but is otherwise retracted.
*Special care needs to be taken when loading the sample into the chamber. The loading arm is '''Never''' to be rotated or tilted to sides (only up and down directions), and the metal portion of the loading arm is never be touched.
* The EDS detector measures the x-ray wavelengths of photons generated in the sample when exposed to the electron beam. Using the measured x-ray spectrum, the sample material composition may be determined.
*Begin by pulling the loading arm directly down to a horizontal position. The loading arm will be pulled into place. It has the ability to be moved up and down by a few degrees.
* The chamber camera is colour sensitive, and primarily used to see the sample and sample holder in relation to the pole-piece. It can only be switched on if the gun-valve is closed, and the gun-valve cannot be opened while the camera is on.
*The loading arm does not go into the chamber at a perfectly horizontal angle, one needs to slightly play with the angle, find the correct orientation, and push the loading arm into the chamber.
* The loadlock camera automatically takes a picture of the sample surface when the loadlock is evacuated. However, if the user is not logged in, the image will not be taken, and there is no way to take it without venting and re-evacuating the loadlock. The overview picture can be used for rough navigation of the sample.  
*Push the loading arm all the way in until you feel the sample is gripped by the stage.
* There is a magnetic field sensor suspended adjacent the electron beam column, and is connected to a magnetic field cancellation unit in the corner of the room. If you notice interference, or feel that you are not reaching the image resolution you feel you should, check the field cancellation unit to see if it has been tripped. This happens once in a while due to vibration from foot traffic outside, etc, and the field cancellation may be restored by pressing the reset button on the unit.
*Pull out the loading arm all the way out. The loading arm will click twice on its journey outwards, and will be pulled out far enough when the upper portion of the loading arm extends past the two white arrows.
* The SEM has a N2 dewar for cooling the sample stage.  
*Keeping tension on the loading arm pull the loading arm up into its upright position.


*Once the sample is in place, a box will prompt in the JEOL software. It will ask for you to select your sample holder and your offset you measured before. This will ensure the e-gun does not run into your sample.
= Sample mounting =


== Beam conditioning ==
* '''Select the appropriate sample holder:''' There are several different sample holders available for the SEM, each adapted for a particular sample size or function, such as a full 2 inch wafer holder, cross-sectional sample holder etc. Generally, you should use the smallest sample holder that will accommodate your sample. This will give you the greatest range of tilt. The PC-SEM software knows about the geometry of the different sample holders, and will automatically set the safe tilt angles for you, and prevent you from accidentally running the sample holder into the pole-piece.  
*When you load your sample into the chamber, the camera will automatically take a topview photo of your sample on the stage. Navigate onto your sample by right clicking on the sample location (Take image rotation into account).
* '''Attach the sample:''' The 2 inch wafer holder allows for the attachment of samples to the holder via clips, and the cross-sectional sample holders alow the samples to be either clamped in place or mounted with a screw. For the remaining sample holders, and adhesive must be used, e.g. carbon tape, graphite paste, or silver conducting paste. Most users use the carbon tape. It is easy to use, and to remove, but due to the elastic nature of the tape, some drift may occur at high magnification. If this is a problem, or you have fragile samples that may break when removed from the adhesive tape, you can try the graphite paste. It has lower adhesion, but also more electrically resistive. There are two pastes available, one suspended in water solution, and the other in isopropanol. Apply only a small dot to the sample holder surface and place your sample over it, press down gently on the sample and then leave it to try for about 5 minutes. Test whether the sample is well attached to the sample holder before loading. Note: Do not use for full wafers.
*Choose desired Voltage value.
* '''Set the sample height:''' The sample must be attached to the sample holder such that its surface protrudes slightly from the edge of the sample holder when viewed from the side. The height of this protrusion is known as the sample surface offset. If the sample surface is below the edge of the sample holder, it must be adjusted. In the case of the 12.5 mm sample holder (see figure), this is done by loosening the two retaining screws on the side of the holer, and then screwing the large screw on the underside of the holder. This adjusts the height of the central stub to which the sample is attached.
*Choose desired probe current (higher current is advised for high tilt and high view distances)
*Enable the LDF mode, which is a large depth of field mode. This mode is useful for rough conditioning.
*Find a suitable object or the corner of your sample and use the rough focus (right click on the focus button) to get decent focus.
*Zoom in and roughly focus and stimgate.
*Switch the LDF mode off and zoom onto an object at x 10-20k. Focus and Stimagate.
*Enable the wobbler, and use the same nobs as the stigmator to correct for the aperture alignment. This is done by trying to reduce the movement of your object.
*Turn off the wobbler and refocus and stimgmate.
*Voila ́ you are ready to image


== Unloading your sample ==
*To unload your sample click on the '''Specimen Exchange''' button in the software. This will cause the SEM to prepare the stage to be unloaded, by untilting, unrotating, moving the stage to z = 40mm, ect.
*Once this procedure is complete the '''Specimen Exchange'''  button will turn green and the sample is ready to be unloaded.
*Pull the loading arm down, and gently push it into the SEM chamber. Push until you have transferred your sample onto the loading arm. Pull out your sample without rotating the arm.
*Press and hold down (2 s) the '''Vent''' button on the side of the Load Lock.
*Open the Latch on the side of the loadlock to help release the pressure.
** This is to prevent the overpressure from popping the O-ring out of groove.
*Once the '''Vent''' button stops blinking your sample is ready to be unloaded.


= Resources =
= Resources =

Revision as of 11:55, 12 April 2017

JEOL 7800F
Picture of JEOL 7800F text
Essentials
Full nameJEOL JSM-7800F
ManufacturerJEOL, Ltd.
DescriptionScanning electron microscope
Location03.1.K08
ManualA printed version is in a blue binder by the instrument
Responsibility
PrimaryPétur
SecondaryNader

The JEOL 7800F is a 30 kV field emission scanning electron microscope (SEM). It is equipped with two secondary electron detectors a backscatter detector, and a EDS detector. It has a eucentric stage, a range of different sample holders depending on application requirements, and can accommodate samples of up to 50 mm in diameter. A unique feature of this SEM, is its ability to place a negative bias on the sample stage in order to decelerate incoming electrons as well as to eject secondary electrons, thereby increasing the signal-to-noise ratio. This feature is known as gentle beam (GB), and is particularly useful when working at low acceleration voltages.

Overview

The different components of the SEM are illustrated in the two figures below:

Left side of the JEOL 7800F
Left side of the JEOL 7800F
  • The lower electron detector (LED) is a secondary electron detector, located in the chamber, and is mostly used for overview images, or in conjunction with sample tilting or high acceleration voltages.
  • The upper electron detector (UED) is an in-lens secondary electron detector located in the electron beam column. It is typically used for obtaining ultrahigh resolution iamges at low acceleration voltages. It is usually used in conjunction with the gentle beam (GB).
  • The backscatter detector (BSD) measures the high energy electrons from the incident beam that are backscattered by the sample surface. Particularly useful for samples composed of different materials of contrasting densities. The detector is inserted by a pneumatic valve when needed by the user, but is otherwise retracted.
  • The EDS detector measures the x-ray wavelengths of photons generated in the sample when exposed to the electron beam. Using the measured x-ray spectrum, the sample material composition may be determined.
  • The chamber camera is colour sensitive, and primarily used to see the sample and sample holder in relation to the pole-piece. It can only be switched on if the gun-valve is closed, and the gun-valve cannot be opened while the camera is on.
  • The loadlock camera automatically takes a picture of the sample surface when the loadlock is evacuated. However, if the user is not logged in, the image will not be taken, and there is no way to take it without venting and re-evacuating the loadlock. The overview picture can be used for rough navigation of the sample.
  • There is a magnetic field sensor suspended adjacent the electron beam column, and is connected to a magnetic field cancellation unit in the corner of the room. If you notice interference, or feel that you are not reaching the image resolution you feel you should, check the field cancellation unit to see if it has been tripped. This happens once in a while due to vibration from foot traffic outside, etc, and the field cancellation may be restored by pressing the reset button on the unit.
  • The SEM has a N2 dewar for cooling the sample stage.

Sample mounting

  • Select the appropriate sample holder: There are several different sample holders available for the SEM, each adapted for a particular sample size or function, such as a full 2 inch wafer holder, cross-sectional sample holder etc. Generally, you should use the smallest sample holder that will accommodate your sample. This will give you the greatest range of tilt. The PC-SEM software knows about the geometry of the different sample holders, and will automatically set the safe tilt angles for you, and prevent you from accidentally running the sample holder into the pole-piece.
  • Attach the sample: The 2 inch wafer holder allows for the attachment of samples to the holder via clips, and the cross-sectional sample holders alow the samples to be either clamped in place or mounted with a screw. For the remaining sample holders, and adhesive must be used, e.g. carbon tape, graphite paste, or silver conducting paste. Most users use the carbon tape. It is easy to use, and to remove, but due to the elastic nature of the tape, some drift may occur at high magnification. If this is a problem, or you have fragile samples that may break when removed from the adhesive tape, you can try the graphite paste. It has lower adhesion, but also more electrically resistive. There are two pastes available, one suspended in water solution, and the other in isopropanol. Apply only a small dot to the sample holder surface and place your sample over it, press down gently on the sample and then leave it to try for about 5 minutes. Test whether the sample is well attached to the sample holder before loading. Note: Do not use for full wafers.
  • Set the sample height: The sample must be attached to the sample holder such that its surface protrudes slightly from the edge of the sample holder when viewed from the side. The height of this protrusion is known as the sample surface offset. If the sample surface is below the edge of the sample holder, it must be adjusted. In the case of the 12.5 mm sample holder (see figure), this is done by loosening the two retaining screws on the side of the holer, and then screwing the large screw on the underside of the holder. This adjusts the height of the central stub to which the sample is attached.


Resources

Invitation to the SEM world

A guide to scanning microscope observation (JEOL)

Hitachi SEM user guide (2007)