BEAMER

Beamer is a software package used to process design files (.dxf, .gds, etc.) and make them ready for e-beam lithography machines. Crucially, it includes a proximity error correction (PEC) module.

For any questions regarding Beamer use, please first refer to the manual: Help > Help Manual (F1). Elionix-specific documentation: Help > Formatter Notes > Elionix.

It thoroughly covers all modules, their use, some theory, as well as includes helpful examples.

On the developer website you can find useful tutorials and application notes.

The Beamer software package also includes TRACER which allows for PEC for user-defined substrates, and ProSEM for image analysis.

Quick-start guide

This is a quick guide to get started quickly.

The process should be tailored to your specific needs.

The full manual can be found in Help > Help Manual (F1).

Import

Choose your design file.

Manual: Modules > Layout Operation > Import

Suggestion: Copy your files from N-Drive to the local machine (text{C:\Users\nanouser\Downloads\Desktop\local folder because ndrive is slow}).

Extract

Extract the layers you want to expose.

Manual: Modules > Layout Operation > Extract

The options will only appear after the Import module has been run.

Heal

Merge touching features and eliminate overlaps.

Manual: Modules > Layout Operation > Heal

This can also be used again after PEC with the option Healing Per Dose

Recommended settings: Heal per layer

PEC

This module takes proximity effect into consideration and changes the dose locally. Dose factor will be increased at the edges so they don't get underexposed, and might be decreased in the middle of large features so they don't get overexposed.

Manual: Modules > Process Correction > PEC

Recommended settings:

In the General tab:

• Click Archive... and find the resist/substrate combination of your sample:
  • Energy: 100/125keV (choose based on the acceleration voltage of the tool)
  • Position:
    • If you etch: High
    • If you lift-off: Low
  • Substrate, Layers and Resist: choose the right stack
  • If it does not exist:
    • Pick a similar resist on the same substrate or
    • Create a new option using TRACER (takes 15-30 minutes).

In the Advanced tab, typically:

• For Si: Optimal Contrast: 100
• For III-V substrates: Optimal Contrast: 0

The reason is that III-V substrates backscatter much more strongly. See the section about the difference between two main PEC modes.

Transform

Shift your entire design so that it lies within the positive quadrant of the coordinate system

Manual: Modules > Layout Operation > Transform

Comment: This step may be omitted if your design has already positive coordinates.

Export

Write out the results in the format that you need.

Elionix-specific manual: Help > Formatter Notes > Elionix

In the Save File dialog:

• For Elionix file formats, select Elionix con FILE

  You don't have to create a new folder yourself. Beamer will do that for you in the next step.

  The string characters that are allowed is 11 which can give confusing results sometimes (eg do not use a file formats called chip00066_exposure_for_gates_fine and chip00066_exposure_for_gates_rough because both will be shortened to chip00066_exposure_fo00001.scon)

In the General tab of the Elionix CON Export dialog:

• Select Replace Existing Files. It is useful if you tweak your flow and end up exporting a few times.
• Select Generate folder. The "file name" that you input will be the name of the new folder.
• Select the appropriate Format Type:
  • for Elionix 7000 (100 kV) use CO7
  • for Elionix F-125 (125 kV) use SCON
• Change all the Exposure settings according to your needs.
• Change Base Dose Time. You can calculate this using either:
  • WeCaS on the Design PCs
  • Unofficial dose calculator

  note that the limits are:

  • for Elionix 7000 (100 kV) minimum 0.10 us and 0.05 us stepsize
  • for Elionix F-125 (125 kV) minimum 0.06 us and 0.02 us stepsize

• Select Dose Time Interpolation

In the Advanced tab of the Elionix CON Export dialog:

• Typically Field Placement: Floating
• Fracturing Mode: LRFT
• Feature Sorting: FollowGeometry

File formats

Beamer supports common CAD file formats. Most users at QDev use GDSII (.gds) or DXF files for their designs.

Our current software supports exporting to file formats for:

• Elionix 7000 (100 kV)
• Elionix F-125 (125 kV)
• new generation Elionix systems (CAR file format)
• general file format GDS that's accepted by eLine
• other general file formats

Tutorials

This page is missing tutorials

FAQ

This page is missing FAQ

Licenses

In the cleanroom of the University of Copenhagen, we have two licences available for Design PC 5 and Design PC 7. They can be accessed remotely via VPN and VNC, but, first, book the PC via the booking system. If the licences seem occupied while nobody is using the computers try the following.

• Restart the PC that you are currently working on
• On Design 7 kill the zombies:
  • open
  • find
  • Now it should be working again.

Open CodeMeter Control Center Select the “WebAdmin” at the lower right. You will see there who uses the licenses and could even kill the licenses there so that they are returned to the pool. 102000 is the BEAMER core license – without it nothing goes. When clicking the 102000 you will jump to the details and see who uses it.

Contact

General support: support@genisys-gmbh.com

Sales: Olga Ohletz butler@genisys-gmbh.com