Critical point dryer: Difference between revisions
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* The procedure of critical point drying is an efficient method for drying delicate samples for SEM applications. It preserves the surface structure of a specimen which could otherwise be damaged due to surface tension when changing from the liquid to gaseous state. | * The procedure of critical point drying is an efficient method for drying delicate samples for SEM applications. It preserves the surface structure of a specimen which could otherwise be damaged due to surface tension when changing from the liquid to gaseous state. | ||
* Si and III-V chips are allowed to be dried in this CPD tool, but chips releasing nanoparticles or nanowires are forbidden. | * Si and III-V chips are allowed to be dried in this CPD tool, but chips releasing nanoparticles or nanowires are forbidden. | ||
* The maximum chip size is 10*10 mm. | |||
* This tool belongs to Quantum Photonics group, and is available for all cleanroom users. Please write to the cleanroom staff ([mailto:cleanroom@nbi.dk cleanroom@nbi.dk]) to ask for training and access. | * This tool belongs to Quantum Photonics group, and is available for all cleanroom users. Please write to the cleanroom staff ([mailto:cleanroom@nbi.dk cleanroom@nbi.dk]) to ask for training and access. | ||
<!-- * To book time on the tool go to the [http://cleanroom.brickhost.com/Web/schedule.php?sid=10 web schedule]. You should make a booking in the system, even if the tool is available and not booked by others. --> | <!-- * To book time on the tool go to the [http://cleanroom.brickhost.com/Web/schedule.php?sid=10 web schedule]. You should make a booking in the system, even if the tool is available and not booked by others. --> | ||
[[Category:Tools]] | [[Category:Tools]] | ||
Latest revision as of 12:11, 29 March 2022
 | |
| Essentials | |
|---|---|
| Full name | Critical Point Dryer Leica EM CPD300 |
| Manufacturer | Leica |
| Description | Critical point dryer |
| Location | Cleanroom 2 (03.2.203B) |
| Responsibility | |
| Primary | Zhe |
CPD introduction and usage guidelines
- The procedure of critical point drying is an efficient method for drying delicate samples for SEM applications. It preserves the surface structure of a specimen which could otherwise be damaged due to surface tension when changing from the liquid to gaseous state.
- Si and III-V chips are allowed to be dried in this CPD tool, but chips releasing nanoparticles or nanowires are forbidden.
- The maximum chip size is 10*10 mm.
- This tool belongs to Quantum Photonics group, and is available for all cleanroom users. Please write to the cleanroom staff (cleanroom@nbi.dk) to ask for training and access.