View source for SU-8

SU-8 is a negative, epoxy based, near-UV photoresist designed for MEMS and other microelectronic applications. It was originally developed and patented by IBM. SU-8 is processed using standard lithography techniques. When SU-8 is exposed to UV light its molecular chains cross-link, causing the SU-8 to solidify. SU-8 is highly transparent in the ultraviolet range. This allows for the fabrication of relatively thick (hundreds of micrometers) structures with nearly vertical side walls. Two companies have licenses from IBM to sell SU-8: MicroChem and Gersteltec.

[[File:SU83000_SC.png|thumb|left|Spin curve of SU-8 3000 series. SU-8 3000 Thickness vs. Spin Speed.]]

=Technical datasheets=
* SU-8 3000 series [https://kayakuam.com/wp-content/uploads/2020/07/KAM-SU-8-3000-Datasheet-7.10-final.pdf]
* SU-8 2000 series [https://kayakuam.com/wp-content/uploads/2019/09/SU-82000DataSheet2025thru2075Ver4-3.pdf]

=Information from other institutes=
* Kavli Nanolab Delft [https://filelist.tudelft.nl/TNW/Afdelingen/Quantum%20Nanoscience/Kavli%20Nanolab%20Delft/Equipment/Recipe%20using%20SU8-3050.pdf]
* Brigham Young University, Integrated Microfabrication Lab [https://cleanroom.byu.edu/su-8-information-page]