SU-8 - Revision history

Harry at 12:25, 6 August 2025

2025-08-06T12:25:30Z

← Older revision		Revision as of 12:25, 6 August 2025
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	SU-8 is a negative, epoxy based, near-UV photoresist designed for MEMS and other microelectronic applications. It was originally developed and patented by IBM. SU-8 is processed using standard lithography techniques. When SU-8 is exposed to UV light its molecular chains cross-link, causing the SU-8 to solidify. SU-8 is highly transparent in the ultraviolet range. This allows for the fabrication of relatively thick (hundreds of micrometers) structures with nearly vertical side walls. Two companies have licenses from IBM to sell SU-8: MicroChem and Gersteltec.		SU-8 is a negative, epoxy based, near-UV photoresist designed for MEMS and other microelectronic applications. It was originally developed and patented by IBM. SU-8 is processed using standard lithography techniques. When SU-8 is exposed to UV light its molecular chains cross-link, causing the SU-8 to solidify. SU-8 is highly transparent in the ultraviolet range. This allows for the fabrication of relatively thick (hundreds of micrometers) structures with nearly vertical side walls. Two companies have licenses from IBM to sell SU-8: MicroChem and Gersteltec.

	[[File:SU83000_SC.png\|thumb\|~~left~~\|Spin curve of SU-8 3000 series. SU-8 3000 Thickness vs. Spin Speed.]]		[[File:SU83000_SC.png\|thumb\|centre\|Spin curve of SU-8 3000 series. SU-8 3000 Thickness vs. Spin Speed.]]

	In the Cleanroom of the University of Copnehagen we provide '''SU-8 3050'''.		In the Cleanroom of the University of Copnehagen we provide '''SU-8 3050'''.

Harry at 12:24, 6 August 2025

2025-08-06T12:24:45Z

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 [[File:SU83000_SC.png|thumb|left|Spin curve of SU-8 3000 series. SU-8 3000 Thickness vs. Spin Speed.]]
 =Technical datasheets=
 * SU-8 3000 series [https://kayakuam.com/wp-content/uploads/2020/07/KAM-SU-8-3000-Datasheet-7.10-final.pdf]
 * SU-8 2000 series [https://kayakuam.com/wp-content/uploads/2019/09/SU-82000DataSheet2025thru2075Ver4-3.pdf]
 =Information from other institutes=
 * Kavli Nanolab Delft [https://filelist.tudelft.nl/TNW/Afdelingen/Quantum%20Nanoscience/Kavli%20Nanolab%20Delft/Equipment/Recipe%20using%20SU8-3050.pdf]
 * Brigham Young University, Integrated Microfabrication Lab [https://cleanroom.byu.edu/su-8-information-page]

Harry at 12:18, 6 August 2025

2025-08-06T12:18:06Z

← Older revision		Revision as of 12:18, 6 August 2025
Line 1:		Line 1:
	SU-8 is a negative, epoxy based, near-UV photoresist designed for MEMS and other microelectronic applications. It was originally developed and patented by IBM. SU-8 is processed using standard lithography techniques. When SU-8 is exposed to UV light its molecular chains cross-link, causing the SU-8 to solidify. SU-8 is highly transparent in the ultraviolet range. This allows for the fabrication of relatively thick (hundreds of micrometers) structures with nearly vertical side walls. Two companies have licenses from IBM to sell SU-8: MicroChem and Gersteltec.		SU-8 is a negative, epoxy based, near-UV photoresist designed for MEMS and other microelectronic applications. It was originally developed and patented by IBM. SU-8 is processed using standard lithography techniques. When SU-8 is exposed to UV light its molecular chains cross-link, causing the SU-8 to solidify. SU-8 is highly transparent in the ultraviolet range. This allows for the fabrication of relatively thick (hundreds of micrometers) structures with nearly vertical side walls. Two companies have licenses from IBM to sell SU-8: MicroChem and Gersteltec.

			[[File:SU83000_SC.png\|thumb\|left\|Spin curve of SU-8 3000 series. SU-8 3000 Thickness vs. Spin Speed.]]

	=Technical datasheets=		=Technical datasheets=

Harry: Created page with "SU-8 is a negative, epoxy based, near-UV photoresist designed for MEMS and other microelectronic applications. It was originally developed and patented by IBM. SU-8 is processed using standard lithography techniques. When SU-8 is exposed to UV light its molecular chains cross-link, causing the SU-8 to solidify. SU-8 is highly transparent in the ultraviolet range. This allows for the fabrication of relatively thick (hundreds of micrometers) structures with nearly vertical..."

2025-08-06T12:15:08Z

Created page with "SU-8 is a negative, epoxy based, near-UV photoresist designed for MEMS and other microelectronic applications. It was originally developed and patented by IBM. SU-8 is processed using standard lithography techniques. When SU-8 is exposed to UV light its molecular chains cross-link, causing the SU-8 to solidify. SU-8 is highly transparent in the ultraviolet range. This allows for the fabrication of relatively thick (hundreds of micrometers) structures with nearly vertical..."

New page

SU-8 is a negative, epoxy based, near-UV photoresist designed for MEMS and other microelectronic applications. It was originally developed and patented by IBM. SU-8 is processed using standard lithography techniques. When SU-8 is exposed to UV light its molecular chains cross-link, causing the SU-8 to solidify. SU-8 is highly transparent in the ultraviolet range. This allows for the fabrication of relatively thick (hundreds of micrometers) structures with nearly vertical side walls. Two companies have licenses from IBM to sell SU-8: MicroChem and Gersteltec.

=Technical datasheets=
* SU-8 3000 series [https://kayakuam.com/wp-content/uploads/2020/07/KAM-SU-8-3000-Datasheet-7.10-final.pdf]
* SU-8 2000 series [https://kayakuam.com/wp-content/uploads/2019/09/SU-82000DataSheet2025thru2075Ver4-3.pdf]

=Information from other institutes=
* Kavli Nanolab Delft [https://filelist.tudelft.nl/TNW/Afdelingen/Quantum%20Nanoscience/Kavli%20Nanolab%20Delft/Equipment/Recipe%20using%20SU8-3050.pdf]
* Brigham Young University, Integrated Microfabrication Lab [https://cleanroom.byu.edu/su-8-information-page]