Resist spin coating - Revision history

Harry: /* Set up your workspace */

2024-12-20T11:01:10Z

Set up your workspace

← Older revision		Revision as of 11:01, 20 December 2024
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	* >10mm: large chuck		* >10mm: large chuck
	* 2-inch wafers or larger: No chuck		* 2-inch wafers or larger: No chuck
			There is also a special fork to center 2" wafers; look for it inside the fumehood of CR1 spinner.
	</blockquote>		</blockquote>

2024-12-20T11:00:52Z

Laurell spin coaters

← Older revision		Revision as of 11:00, 20 December 2024
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	= How to spin coat =		= How to spin coat =
	==Laurell spin coaters==		==Laurell spin coaters==
	There is a spin coater in each cleanroom. You can find more information about them on the [[Laurell spinners]] page		There is a spin coater in each cleanroom. You can find more information about them on the [[Laurell spinners]] page.

	==Set up your workspace==		==Set up your workspace==

2024-12-20T10:51:18Z

How to spin coat

← Older revision		Revision as of 10:51, 20 December 2024
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	= How to spin coat =		= How to spin coat =
			==Laurell spin coaters==
			There is a spin coater in each cleanroom. You can find more information about them on the [[Laurell spinners]] page

	==Set up your workspace==		==Set up your workspace==
	* Log your process in the designated Google-Sheets file (''date, name, resist stack''):		* Log your process in the designated Google-Sheets file (''date, name, resist stack''):

2024-12-20T10:48:51Z

How to behave

← Older revision		Revision as of 10:48, 20 December 2024
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	* Minimise the duration for which the resist bottle stays open (without a lid).		* Minimise the duration for which the resist bottle stays open (without a lid).
	* Clean the spinner and the chuck until there are no resist marks left		* Clean the spinner and the chuck until there are no resist marks left
			** Use Acetone for photoresists
	** Use 1,3 Dioxolane for e-beam resists		** Use 1,3 Dioxolane for e-beam resists
	** Use Acetone for photoresists
	* Is a resist missing? Not it in the whiteboard in the gowning area.		* Is a resist missing? Not it in the whiteboard in the gowning area.

2024-12-20T10:48:04Z

Cleaning and baking

← Older revision		Revision as of 10:48, 20 December 2024
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	** Clean carefully inside the spinner (at the bottom and inside the lid)		** Clean carefully inside the spinner (at the bottom and inside the lid)
	**Clean the plastic foil of the lid		**Clean the plastic foil of the lid
	*** Adjust the foil so ~~the~~ two ends are aligned with the slit of the lid		*** Adjust the foil so its two ends are aligned with the slit of the lid
	** Don't forget the top hole		** Don't forget the top hole
	<blockquote style="background-color: #F0F0F0; border: dashed thin grey;">		<blockquote style="background-color: #F0F0F0; border: dashed thin grey;">

2024-12-20T10:47:41Z

Cleaning and baking

← Older revision		Revision as of 10:47, 20 December 2024
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	** Clean the chuck		** Clean the chuck
	** Clean carefully inside the spinner (at the bottom and inside the lid)		** Clean carefully inside the spinner (at the bottom and inside the lid)
			**Clean the plastic foil of the lid
			*** Adjust the foil so the two ends are aligned with the slit of the lid
	** Don't forget the top hole		** Don't forget the top hole
	<blockquote style="background-color: #F0F0F0; border: dashed thin grey;">		<blockquote style="background-color: #F0F0F0; border: dashed thin grey;">
	Cleaning chemicals for each ~~the~~ resist ~~series~~:		Cleaning chemicals for each resist type:
	* 1,3 Dioxolane: ~~CSAR, ZEP, LOR~~		* Acetone: photoresist
	* Acetone: PMMA A, EL, AZ,		* 1,3 Dioxolane: e-beam resist and LOR3B
	</blockquote>		</blockquote>
	* Remove your sample from the hot plate and store it in your sample box		* Remove your sample from the hot plate and store it in your sample box

2024-12-20T10:43:28Z

How to behave

← Older revision		Revision as of 10:43, 20 December 2024
Line 4:		Line 4:
	* Minimise the duration for which the resist bottle stays open (without a lid).		* Minimise the duration for which the resist bottle stays open (without a lid).
	* Clean the spinner and the chuck until there are no resist marks left		* Clean the spinner and the chuck until there are no resist marks left
	** Use 1,3 Dioxolane for ~~CSAR, ZEP, and LOR3B~~ resists		** Use 1,3 Dioxolane for e-beam resists
	** ~~In any other case, use~~ Acetone		** Use Acetone for photoresists
	* Is a resist missing? Not it in the whiteboard in the gowning area.		* Is a resist missing? Not it in the whiteboard in the gowning area.

2024-12-20T10:26:56Z

How to behave

← Older revision		Revision as of 10:26, 20 December 2024
Line 4:		Line 4:
	* Minimise the duration for which the resist bottle stays open (without a lid).		* Minimise the duration for which the resist bottle stays open (without a lid).
	* Clean the spinner and the chuck until there are no resist marks left		* Clean the spinner and the chuck until there are no resist marks left
	** Use 1,3 Dioxolane for CSAR, ZEP. and LOR3B resists		** Use 1,3 Dioxolane for CSAR, ZEP, and LOR3B resists
	** In any other case, use Acetone		** In any other case, use Acetone
	* Is a resist missing? Not it in the whiteboard in the gowning area.		* Is a resist missing? Not it in the whiteboard in the gowning area.

2024-12-20T10:26:27Z

How to behave

← Older revision		Revision as of 10:26, 20 December 2024
Line 4:		Line 4:
	* Minimise the duration for which the resist bottle stays open (without a lid).		* Minimise the duration for which the resist bottle stays open (without a lid).
	* Clean the spinner and the chuck until there are no resist marks left		* Clean the spinner and the chuck until there are no resist marks left
	** Use 1,3 Dioxolane for CSAR and LOR3B resists		** Use 1,3 Dioxolane for CSAR, ZEP. and LOR3B resists
	** In any other case, use Acetone		** In any other case, use Acetone
	* Is a resist missing? Not it in the whiteboard in the gowning area.		* Is a resist missing? Not it in the whiteboard in the gowning area.

2024-12-19T13:21:10Z

Set up your workspace

← Older revision		Revision as of 13:21, 19 December 2024
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	* Choose the correct chuck with respect to your chip size		* Choose the correct chuck with respect to your chip size
	<blockquote style="background-color: #F0F0F0; border: dashed thin grey;">		<blockquote style="background-color: #F0F0F0; border: dashed thin grey;">
	~~You can follow this guide for~~ the smallest dimension of your chip:		Depending on the smallest dimension of your chip use the recommended chuck:
	* <5mm: small chuck		* <5mm: small chuck
	* 6-10mm: medium chuck		* 6-10mm: medium chuck
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	* 2-inch wafers or larger: No chuck		* 2-inch wafers or larger: No chuck
	</blockquote>		</blockquote>

	==Spin resist==		==Spin resist==
	* Place the chuck on the stage		* Place the chuck on the stage