Raith eLine - Revision history

Zhe at 19:51, 7 November 2025

2025-11-07T19:51:49Z

← Older revision		Revision as of 19:51, 7 November 2025
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	\|description = Electron beam lithography and microscopy system		\|description = Electron beam lithography and microscopy system
	\|location = Cleanroom (03.2.209C)		\|location = Cleanroom (03.2.209C)
	\|primary = ~~Shiv~~		\|primary = Zhe
	\|secondary = ~~Karolis~~		\|secondary = Nader
	}}		}}
	Raith eLine is a variable acceleration voltage (up to 30 kV) scanning electron microscope/lithography tool.		Raith eLine is a variable acceleration voltage (up to 30 kV) scanning electron microscope/lithography tool.

Karolis: /* Remote access */

2022-05-03T09:36:55Z

Remote access

← Older revision		Revision as of 09:36, 3 May 2022
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	SEM software > open right hand menu > Airlock > Close CCV		SEM software > open right hand menu > Airlock > Close CCV

			== Remote access ==
			* TeamViewer: ELINE
			* LogMeIn: ELINE

	[[Category:Tools]]		[[Category:Tools]]
	[[Category:Lithography]]		[[Category:Lithography]]
	[[Category:Characterization]]		[[Category:Characterization]]

Karolis: /* Maintenance */ added section

2022-05-03T09:23:54Z

Maintenance: added section

@@ Line 44: / Line 44: @@
 ; Error regarding failed 5V supply during EM server software startup?
 : Normal and harmless.
 [[Category:Tools]]
 [[Category:Lithography]]
 [[Category:Characterization]]

Karolis: added troubleshooting of failed 5V power supply error

2022-05-03T08:48:58Z

added troubleshooting of failed 5V power supply error

← Older revision		Revision as of 08:48, 3 May 2022
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	(*) Some NW wafer exposures take longer and exceptions to these rules are made to accommodate these tasks. A special account '''NW-MBE''' is used in the booking system to indicate these jobs.		(*) Some NW wafer exposures take longer and exceptions to these rules are made to accommodate these tasks. A special account '''NW-MBE''' is used in the booking system to indicate these jobs.
	* Please talk to a [[About\|staff member]] if you have fab jobs that are not compatible with the rules above		* Please talk to a [[About\|staff member]] if you have fab jobs that are not compatible with the rules above

			== Troubleshooting ==

			; Error regarding failed 5V supply during EM server software startup?
			: Normal and harmless.

	[[Category:Tools]]		[[Category:Tools]]
	[[Category:Lithography]]		[[Category:Lithography]]
	[[Category:Characterization]]		[[Category:Characterization]]

Karolis: added general info

2022-05-03T08:46:36Z

added general info

@@ Line 9: / Line 9: @@
 |secondary = Karolis
 }}
 == eLine usage and reservation guidelines ==
 * To book time on the machine go to the [http://cleanroom.brickhost.com/Web/schedule.php web schedule]. You should make a booking in the system, even if the machine is available and not booked by others.

Karolis at 18:42, 10 April 2022

2022-04-10T18:42:20Z

← Older revision		Revision as of 18:42, 10 April 2022
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	\|company = Raith Nanofabrication		\|company = Raith Nanofabrication
	\|description = Electron beam lithography and microscopy system		\|description = Electron beam lithography and microscopy system
	\|location = 03.2.209C		\|location = Cleanroom (03.2.209C)
	\|primary = Shiv		\|primary = Shiv
	\|secondary = Karolis		\|secondary = Karolis
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	** write to the experiment mailing list that the machine is free, if you finish earlier.		** write to the experiment mailing list that the machine is free, if you finish earlier.
	(*) Some NW wafer exposures take longer and exceptions to these rules are made to accommodate these tasks. A special account '''NW-MBE''' is used in the booking system to indicate these jobs.		(*) Some NW wafer exposures take longer and exceptions to these rules are made to accommodate these tasks. A special account '''NW-MBE''' is used in the booking system to indicate these jobs.
	* Please talk to a staff member if you have fab jobs that are not compatible with the rules above		* Please talk to a [[About\|staff member]] if you have fab jobs that are not compatible with the rules above

	[[Category:Tools]]		[[Category:Tools]]
	[[Category:Lithography]]		[[Category:Lithography]]
	[[Category:Characterization]]		[[Category:Characterization]]

Karolis at 19:40, 6 April 2022

2022-04-06T19:40:23Z

← Older revision		Revision as of 19:40, 6 April 2022
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	(*) Some NW wafer exposures take longer and exceptions to these rules are made to accommodate these tasks. A special account '''NW-MBE''' is used in the booking system to indicate these jobs.		(*) Some NW wafer exposures take longer and exceptions to these rules are made to accommodate these tasks. A special account '''NW-MBE''' is used in the booking system to indicate these jobs.
	* Please talk to a staff member if you have fab jobs that are not compatible with the rules above		* Please talk to a staff member if you have fab jobs that are not compatible with the rules above



	[[Category:Tools]]		[[Category:Tools]]
			[[Category:Lithography]]
			[[Category:Characterization]]

Karolis: updated infobox, responsibilities, links

2019-02-12T15:00:32Z

updated infobox, responsibilities, links

← Older revision		Revision as of 15:00, 12 February 2019
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	\|location = 03.2.209C		\|location = 03.2.209C
	\|primary = Shiv		\|primary = Shiv
	\|secondary = ~~Nader~~		\|secondary = Karolis
	~~\|limits = TBD~~
	~~\|computer = TBD~~
	~~\|manual = TBD~~
	}}		}}
	= eLine usage and reservation guidelines =		== eLine usage and reservation guidelines ==
	* To book time on the machine go to [http://cleanroom.brickhost.com/Web/schedule.php]. You should ~~sign in~~ in the ~~booking~~ system, even if the machine is available and not booked by others.		* To book time on the machine go to the [http://cleanroom.brickhost.com/Web/schedule.php web schedule]. You should make a booking in the system, even if the machine is available and not booked by others.
	* Late cancellations of sessions that you’ve signed up should only happen when unforeseen conflicts or unexpected fab difficulties occur. Please do not sign up to use equipment unless you are prepared and have every intention of using the time.		* Late cancellations of sessions that you’ve signed up should only happen when unforeseen conflicts or unexpected fab difficulties occur. Please do not sign up to use equipment unless you are prepared and have every intention of using the time.
	<blockquote style="background-color: #F0F0F0; border: dashed thin grey;">		<blockquote style="background-color: #F0F0F0; border: dashed thin grey;">
	If you don't have an account write to the cleanroom staff (cleanroom~~[at]~~nbi~~[dot~~]dk) and we will provide you with username and password.		If you don't have an account write to the cleanroom staff ([mailto:cleanroom@nbi.dk cleanroom@nbi.dk]) and we will provide you with username and password.
	</blockquote>		</blockquote>
	* Use the dedicated SEM (JEOL) for microscopy, unless the e_Line is really needed. Ask for SEM training if needed.		* Use the dedicated SEM (JEOL) for microscopy, unless the e_Line is really needed. Ask for SEM training if needed.
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	** delete booking only before the starting time.		** delete booking only before the starting time.
	** write to the experiment mailing list that the machine is free, if you finish earlier.		** write to the experiment mailing list that the machine is free, if you finish earlier.
	(*) Some NW wafer exposures take longer and exceptions to these rules are made to ~~accomodate~~ these tasks. A special account '''NW-MBE''' is used in the booking system to indicate these jobs.		(*) Some NW wafer exposures take longer and exceptions to these rules are made to accommodate these tasks. A special account '''NW-MBE''' is used in the booking system to indicate these jobs.
	* Please talk to a staff member if you have fab jobs that are not compatible with the rules above		* Please talk to a staff member if you have fab jobs that are not compatible with the rules above

Petur at 13:26, 19 December 2016

2016-12-19T13:26:09Z

← Older revision		Revision as of 13:26, 19 December 2016
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	\|company = Raith Nanofabrication		\|company = Raith Nanofabrication
	\|description = Electron beam lithography and microscopy system		\|description = Electron beam lithography and microscopy system
	\|location = ~~TBD~~		\|location = 03.2.209C
	\|primary = Shiv		\|primary = Shiv
	\|secondary = Nader		\|secondary = Nader

Petur at 14:14, 5 December 2016

2016-12-05T14:14:04Z

← Older revision		Revision as of 14:14, 5 December 2016
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	{{Infobox tool		{{Infobox tool
	\|image = Tool eline.jpg		\|image = Tool eline.jpg
	\|toolfullname = Raith ~~e-Line~~		\|toolfullname = Raith eLine
	\|website = https://www.raith.com/		\|website = https://www.raith.com/
	\|company = Raith Nanofabrication		\|company = Raith Nanofabrication