Critical point dryer - Revision history

Zhe at 20:14, 7 November 2025

2025-11-07T20:14:34Z

← Older revision		Revision as of 20:14, 7 November 2025
Line 7:		Line 7:
	\|location = Cleanroom 2 (03.2.203B)		\|location = Cleanroom 2 (03.2.203B)
	\|primary = Zhe		\|primary = Zhe
			\|secondary = Nader
	}}		}}
	== CPD introduction and usage guidelines ==		== CPD introduction and usage guidelines ==

Zhe at 12:11, 29 March 2022

2022-03-29T12:11:30Z

← Older revision		Revision as of 12:11, 29 March 2022
Line 11:		Line 11:
	* The procedure of critical point drying is an efficient method for drying delicate samples for SEM applications. It preserves the surface structure of a specimen which could otherwise be damaged due to surface tension when changing from the liquid to gaseous state.		* The procedure of critical point drying is an efficient method for drying delicate samples for SEM applications. It preserves the surface structure of a specimen which could otherwise be damaged due to surface tension when changing from the liquid to gaseous state.
	* Si and III-V chips are allowed to be dried in this CPD tool, but chips releasing nanoparticles or nanowires are forbidden.		* Si and III-V chips are allowed to be dried in this CPD tool, but chips releasing nanoparticles or nanowires are forbidden.
			* The maximum chip size is 10*10 mm.
	* This tool belongs to Quantum Photonics group, and is available for all cleanroom users. Please write to the cleanroom staff ([mailto:cleanroom@nbi.dk cleanroom@nbi.dk]) to ask for training and access.		* This tool belongs to Quantum Photonics group, and is available for all cleanroom users. Please write to the cleanroom staff ([mailto:cleanroom@nbi.dk cleanroom@nbi.dk]) to ask for training and access.
	* The maximum chip size is 10*10 mm.
	<!-- * To book time on the tool go to the [http://cleanroom.brickhost.com/Web/schedule.php?sid=10 web schedule]. You should make a booking in the system, even if the tool is available and not booked by others. -->		<!-- * To book time on the tool go to the [http://cleanroom.brickhost.com/Web/schedule.php?sid=10 web schedule]. You should make a booking in the system, even if the tool is available and not booked by others. -->

	[[Category:Tools]]		[[Category:Tools]]

Zhe at 12:11, 29 March 2022

2022-03-29T12:11:13Z

← Older revision		Revision as of 12:11, 29 March 2022
Line 12:		Line 12:
	* Si and III-V chips are allowed to be dried in this CPD tool, but chips releasing nanoparticles or nanowires are forbidden.		* Si and III-V chips are allowed to be dried in this CPD tool, but chips releasing nanoparticles or nanowires are forbidden.
	* This tool belongs to Quantum Photonics group, and is available for all cleanroom users. Please write to the cleanroom staff ([mailto:cleanroom@nbi.dk cleanroom@nbi.dk]) to ask for training and access.		* This tool belongs to Quantum Photonics group, and is available for all cleanroom users. Please write to the cleanroom staff ([mailto:cleanroom@nbi.dk cleanroom@nbi.dk]) to ask for training and access.
			* The maximum chip size is 10*10 mm.
	<!-- * To book time on the tool go to the [http://cleanroom.brickhost.com/Web/schedule.php?sid=10 web schedule]. You should make a booking in the system, even if the tool is available and not booked by others. -->		<!-- * To book time on the tool go to the [http://cleanroom.brickhost.com/Web/schedule.php?sid=10 web schedule]. You should make a booking in the system, even if the tool is available and not booked by others. -->

	[[Category:Tools]]		[[Category:Tools]]

Zhe: /* CPD introduction and usage guidelines */

2022-03-29T09:22:10Z

CPD introduction and usage guidelines

← Older revision		Revision as of 09:22, 29 March 2022
Line 10:		Line 10:
	== CPD introduction and usage guidelines ==		== CPD introduction and usage guidelines ==
	* The procedure of critical point drying is an efficient method for drying delicate samples for SEM applications. It preserves the surface structure of a specimen which could otherwise be damaged due to surface tension when changing from the liquid to gaseous state.		* The procedure of critical point drying is an efficient method for drying delicate samples for SEM applications. It preserves the surface structure of a specimen which could otherwise be damaged due to surface tension when changing from the liquid to gaseous state.
			* Si and III-V chips are allowed to be dried in this CPD tool, but chips releasing nanoparticles or nanowires are forbidden.
	* This tool belongs to Quantum Photonics group, and is available for all cleanroom users. Please write to the cleanroom staff ([mailto:cleanroom@nbi.dk cleanroom@nbi.dk]) to ask for training and access.		* This tool belongs to Quantum Photonics group, and is available for all cleanroom users. Please write to the cleanroom staff ([mailto:cleanroom@nbi.dk cleanroom@nbi.dk]) to ask for training and access.
	<!-- * To book time on the tool go to the [http://cleanroom.brickhost.com/Web/schedule.php?sid=10 web schedule]. You should make a booking in the system, even if the tool is available and not booked by others. -->		<!-- * To book time on the tool go to the [http://cleanroom.brickhost.com/Web/schedule.php?sid=10 web schedule]. You should make a booking in the system, even if the tool is available and not booked by others. -->

	[[Category:Tools]]		[[Category:Tools]]

Zhe: Created page with "{{Infobox tool |image = Tools CPD.jpg |toolfullname = Critical Point Dryer Leica EM CPD300 |website = https://www.leica-microsystems.com/products/sample-preparation-for-electr..."

2022-03-15T14:45:26Z

Created page with "{{Infobox tool |image = Tools CPD.jpg |toolfullname = Critical Point Dryer Leica EM CPD300 |website = https://www.leica-microsystems.com/products/sample-preparation-for-electr..."

New page

{{Infobox tool
|image = Tools CPD.jpg
|toolfullname = Critical Point Dryer Leica EM CPD300
|website = https://www.leica-microsystems.com/products/sample-preparation-for-electron-microscopy/p/leica-em-cpd300/
|company = Leica
|description = Critical point dryer
|location = Cleanroom 2 (03.2.203B)
|primary = Zhe
}}
== CPD introduction and usage guidelines ==
* The procedure of critical point drying is an efficient method for drying delicate samples for SEM applications. It preserves the surface structure of a specimen which could otherwise be damaged due to surface tension when changing from the liquid to gaseous state.
* This tool belongs to Quantum Photonics group, and is available for all cleanroom users. Please write to the cleanroom staff ([mailto:cleanroom@nbi.dk cleanroom@nbi.dk]) to ask for training and access.


[[Category:Tools]]