AJA systems - Revision history

Harry: /* Other available materials */

2026-04-28T09:42:48Z

Other available materials

← Older revision		Revision as of 09:42, 28 April 2026
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	'''Sputtering''': Nb<sub>2</sub>Ti<sub>1</sub>, Cu, InSb, Bi, Ti, Re, Mo, Ni, Si<sub>3</sub>N<sub>4</sub>, Ta, Nb<sub>4</sub>Ti<sub>1</sub>, Nb		'''Sputtering''': Nb<sub>2</sub>Ti<sub>1</sub>, Cu, InSb, Bi, Ti, Re, Mo, Ni, Si<sub>3</sub>N<sub>4</sub>, Ta, Nb<sub>4</sub>Ti<sub>1</sub>, Nb

	There is a big compatibility chart next to the prep bench behing AJA1.		There is a big [https://www.lesker.com/newweb/deposition_materials/materialdepositionchart.cfm compatibility chart] next to the prep bench behing AJA1.
	For each deposition material it lists a compatible evaporation crucible material, and a compatible sputtering power mode.		For each deposition material it lists a compatible evaporation crucible material, and a compatible sputtering power mode.

	~~The chart is also available [https://www.lesker.com/newweb/deposition_materials/materialdepositionchart.cfm online].~~

	== '''Step by step guide''' ==		== '''Step by step guide''' ==

Harry: /* Currently loaded materials */

2026-04-28T09:41:57Z

Currently loaded materials

← Older revision		Revision as of 09:41, 28 April 2026
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	\|}		\|}

	~~Note~~: *If you need to deposit a thicker layer, you need to book enough time for the cryo pump to reach base temperature before continuing with a second layer.		Notes:
			* If you need to deposit a thicker layer, you need to book enough time for the cryo pump to reach base temperature before continuing with a second layer.
			* When you make a booking, you have to select if your deposition includes gold. If yes, you will be asked to fill out the total Au thickness you plan to deposit.
	=== Other available materials ===		=== Other available materials ===
	'''Evaporation''': SiO<sub>2</sub>, MgB<sub>2</sub>, SiGe (p-doped), Ta, Nb, Pd, W		'''Evaporation''': SiO<sub>2</sub>, MgB<sub>2</sub>, SiGe (p-doped), Ta, Nb, Pd, W

Harry: /* Overview */

2026-04-28T09:38:05Z

Overview

← Older revision		Revision as of 09:38, 28 April 2026
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	They differ slightly in their outfitting:		They differ slightly in their outfitting:
	* System 1: Two 2" DC sputtering targets, Kaufman ion source for cleaning. Mechanically clamped to the loading arm and magnetically clamped to the rotating stage inside.		* System 1: Two 2" DC sputtering targets, Kaufman ion source for cleaning. Mechanically clamped to the loading arm and magnetically clamped to the rotating stage inside. Oxidation chamber on the loadlock.
	* System 2: One regular 2" DC sputtering target, one 2" DC sputtering target with adjustable working distance, one 2" RF sputtering target, and an RF supply to the stage for substrate sputtering (ion milling). Mechanically clamped to the loading arm as well as the stage inside the chamber. Stage water cooling (same 19°C chiller circuit as for magnetrons and e-beam crucibles). Stray electrons on the near side are stopped by an extra static shutter, magnetically steered away on the far side~~. Oxidation chamber on the loadlock~~.		* System 2: One regular 2" DC sputtering target, one 3" DC sputtering target with adjustable working distance, one 2" RF sputtering target, and an RF supply to the stage for substrate sputtering (ion milling). Mechanically clamped to the loading arm as well as the stage inside the chamber. Stage water cooling (same 19°C chiller circuit as for magnetrons and e-beam crucibles). Stray electrons on the near side are stopped by an extra static shutter, magnetically steered away on the far side.

	Systems 1 and 2 are expected to at least reach a vacuum of about 2x10<sup>-8</sup> Torr and 6x10<sup>-8</sup> Torr (respectively) after pumping for 24 hours on the main chamber from atmosphere.		Systems 1 and 2 are expected to at least reach a vacuum of about 2x10<sup>-8</sup> Torr and 6x10<sup>-8</sup> Torr (respectively) after pumping for 24 hours on the main chamber from atmosphere.
			The chamber vacuum is monitored periodically by shutting the cryo-valve and recording the rise of pressure rise for 10 mins. The ''rate-of-rise'' history is provided here [link].

	== Currently loaded materials ==		== Currently loaded materials ==

Harry at 10:22, 11 November 2025

2025-11-11T10:22:48Z

← Older revision		Revision as of 10:22, 11 November 2025
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	\|secondary = Martin		\|secondary = Martin
	}}		}}
			''Page last updated: 11 Nov 2025''

	There are two AJA Orion physical vapor deposition (PVD) systems at the [[Main Page\|NBI cleanroom]].		There are two AJA Orion physical vapor deposition (PVD) systems at the [[Main Page\|NBI cleanroom]].
	They both have 2" magnetron sputtering and electron beam evaporation capabilities, as well as some form of substrate milling/sputtering.		They both have 2" magnetron sputtering and electron beam evaporation capabilities, as well as some form of substrate milling/sputtering.

Harry: /* Currently loaded materials */

2025-11-11T10:22:14Z

Currently loaded materials

← Older revision		Revision as of 10:22, 11 November 2025
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	{\| class="wikitable"		{\| class="wikitable"
	\|-		\|-
	! AJA1		! AJA1 !! Material !! Liner !! Thickness limit
	! Material
	! Liner
	! Thickness limit
	\|-		\|-
	\| 1		\| 1 \|\| Al \|\| Intermetallic \|\|
	\| Al
	\| Intermetallic
	\|
	\|-		\|-
	\| 2		\| 2 \|\| Ti1 \|\| Fabmate \|\|
	\| Ti1
	\| Fabmate
	\|
	\|-		\|-
	\| 3		\| 3 \|\| SiOx \|\| Tungsten \|\|
	\| ~~Au1~~
	\| Tungsten
	\|
	\|-		\|-
	\| 4		\| 4 \|\| Au2 \|\| Tungsten \|\|
	\| Au2
	\| Tungsten
	\|
	\|-		\|-
	\| 5		\| 5 \|\| Ge \|\| Fabmate \|\|
	\| ~~Ti2~~
	\| Fabmate
	\|
	\|-		\|-
	\| 6		\| 6 \|\| Pt \|\| FabMate \|\| 200 nm*
	\| Pt
	\| FabMate
	\| 200 nm*
	\|
	\|-		\|-
	\| DC1		\| DC1 \|\| W \|\| -- \|\|
	\| W
	\| --
	\|
	\|-		\|-
	\| DC2		\| DC2 \|\| Nb<sub>2</sub>Ti \|\| -- \|\|
	\| Nb<sub>2</sub>Ti~~<sub>1</sub>~~
	\| --
	\|-		\|-
	\|
	\|}		\|}
	\|		\|
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	{\| class="wikitable"		{\| class="wikitable"
	\|-		\|-
	! AJA2		! AJA2 !! Material !! Liner !! Thickness limit
	! Material
	! Liner
	! Thickness limit
	\|-		\|-
	\| 1		\| 1 \|\| Pt \|\| Tungsten \|\| 200 nm*
	\| Au
	\| Tungsten
	\|
	\|-		\|-
	\| 2		\| 2 \|\| Au2 \|\| FabMate \|\|
	\| ~~Titanium~~
	\| FabMate
	\|
	\|-		\|-
	\| 3		\| 3 \|\| Al \|\| Intermetallic \|\|
	\| Al
	\| Intermetallic
	\|
	\|-		\|-
	\| 4		\| 4 \|\| Ti \|\| intermetallic \|\|
	\| Pd
	\| intermetallic
	\|
	\|-		\|-
	\| 5		\| 5 \|\| Pd \|\| FabMate \|\|
	\| Ge
	\| FabMate
	\|
	\|-		\|-
	\| 6		\| 6 \|\| Cr \|\| FabMate \|\|
	\| Pt
	\| FabMate
	\| 200 nm*
	\|-		\|-
	\| DC1		\| DC1 \|\| Ti \|\| -- \|\|
	\| V
	\| --
	\|
	\|-		\|-
	\| RF2		\| RF2 \|\| Mo \|\| -- \|\|
	\| ~~V3Si~~
	\| --
	\|
	\|-		\|-
	\| RF3		\| RF3
	\| Nb<sub>2</sub>Ti~~<sub>1</sub>~~		\| Nb<sub>2</sub>Ti \|\| -- \|\|
	\| --
	\|
	\|-		\|-
	\|}		\|}
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	\|}		\|}

	*If you need to deposit a thicker layer, you need to book enough time for the cryo pump to reach base temperature before continuing with a second layer.		Note: *If you need to deposit a thicker layer, you need to book enough time for the cryo pump to reach base temperature before continuing with a second layer.

	=== Other available materials ===		=== Other available materials ===

Zhe at 19:55, 7 November 2025

2025-11-07T19:55:21Z

← Older revision		Revision as of 19:55, 7 November 2025
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	\|description = Thin film deposition and milling systems		\|description = Thin film deposition and milling systems
	\|location = 03.2.218		\|location = 03.2.218
	\|primary = ~~Martin~~		\|primary = Harry
	\|secondary = ~~Nader~~		\|secondary = Martin
	}}		}}
	There are two AJA Orion physical vapor deposition (PVD) systems at the [[Main Page\|NBI cleanroom]].		There are two AJA Orion physical vapor deposition (PVD) systems at the [[Main Page\|NBI cleanroom]].

Harry: /* Currently loaded materials */

2025-09-02T08:54:25Z

Currently loaded materials

← Older revision		Revision as of 08:54, 2 September 2025
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	\|-		\|-
	\| DC2		\| DC2
	\| ~~NbTi~~		\| Nb<sub>2</sub>Ti<sub>1</sub>
	\| --		\| --
	\|-		\|-
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	\|-		\|-
	\| RF3		\| RF3
	\| ~~NbTi~~		\| Nb<sub>2</sub>Ti<sub>1</sub>
	\| --		\| --
	\|		\|

Martin: /* Currently loaded materials */

2024-07-02T11:58:49Z

Currently loaded materials

← Older revision		Revision as of 11:58, 2 July 2024
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	\| Pt		\| Pt
	\| FabMate		\| FabMate
	\| 200 nm		\| 200 nm*
	\|		\|
	\|-		\|-
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	\| Pt		\| Pt
	\| FabMate		\| FabMate
	\| 200 nm		\| 200 nm*
	\|-		\|-
	\| DC1		\| DC1
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	\|-		\|-
	\|}		\|}

			*If you need to deposit a thicker layer, you need to book enough time for the cryo pump to reach base temperature before continuing with a second layer.

	=== Other available materials ===		=== Other available materials ===

Martin: /* Currently loaded materials */

2024-07-02T11:51:47Z

Currently loaded materials

← Older revision		Revision as of 11:51, 2 July 2024
Line 145:		Line 145:
	\|-		\|-
	\|}		\|}
			\|-
			\|}

	=== Other available materials ===		=== Other available materials ===

Martin: /* Currently loaded materials */

2024-07-02T11:51:32Z

Currently loaded materials

← Older revision		Revision as of 11:51, 2 July 2024
Line 35:		Line 35:
	== Currently loaded materials ==		== Currently loaded materials ==

	The materials currently available for deposition are as follows (updated ~~2023January 02~~):		The materials currently available for deposition are as follows (updated 2024 July 2):

	{\|		{\|
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	\|-		\|-
	\|}		\|}
	\|-
	\|}

	=== Other available materials ===		=== Other available materials ===