cleanroom - Recent changes [en-gb]

Main Page

Chenglee — Thu, 30 Jul 2026 11:11:55 GMT

Current Tool Status

← Older revision		Revision as of 11:11, 30 July 2026
(2 intermediate revisions by the same user not shown)
Line 20:		Line 20:
	==Current Tool Status==		==Current Tool Status==

	''List updated: ~~Tue 1~~ July 2026''		''List updated: Thursday 30 July 2026''

	{\| cellspacing=0px style="text-align: left;"		{\| cellspacing=0px style="text-align: left;"

About

Chenglee — Tue, 21 Jul 2026 17:33:53 GMT

Pricing

← Older revision		Revision as of 17:33, 21 July 2026
(8 intermediate revisions by the same user not shown)
Line 64:		Line 64:

	== Pricing ==		== Pricing ==
	Current ~~price lists as of 2022 April 1:~~		'''Current Access Fees'''
	* [[Media:NBI cleanroom price list ~~1st April 2023~~.pdf\|NBI-owned tools]]
	* [[Media:Quantech pricing information January 2023.pdf\|QuanTech-owned tools]]		[[Media:NBI cleanroom price list 2026.pdf\|NBI-owned tools]]

			[[Media:Quantech pricing information January 2023.pdf\|QuanTech-owned tools]]

File:NBI cleanroom price list 2026.pdf

Chenglee — Tue, 21 Jul 2026 11:13:54 GMT

Chenglee uploaded File:NBI cleanroom price list 2026.pdf

New page

NBI cleanroom price list 2026

How to evaporate metals in AJA

Harry — Mon, 20 Jul 2026 14:04:40 GMT

Gold

← Older revision		Revision as of 14:04, 20 July 2026
Line 16:		Line 16:

	==Gold==		==Gold==
	~~Directly copied from~~ Lekser ~~website.~~ Will be adjusted according to our SOPs		===Tips===
			* Use a deposition rate of 1 AA/sec to limit the material consumption.
			* Use large oscillation on the beam spread while you ramp up the current.
			** After the thermal soaking, limit the beam oscillation to a steady beam spot (no oscillation).
			* After you ramp down the current to 0 mA, wait for 3 minutes until the incandescent material no longer glows.
			===Lekser recommendations===
			''Will be adjusted according to our SOPs'''

	We recommend sweeping the e-beam and ramping power to fully melt the material before depositing films. Once melted, a focused e-beam can be used for the deposition process. With an evaporation temperature of ~1,400°C and a base pressure for evaporation of 10-6 Torr or lower, we anticipate the deposition rate to be 1-5 Angstroms per second.		We recommend sweeping the e-beam and ramping power to fully melt the material before depositing films. Once melted, a focused e-beam can be used for the deposition process. With an evaporation temperature of ~1,400°C and a base pressure for evaporation of 10-6 Torr or lower, we anticipate the deposition rate to be 1-5 Angstroms per second.

	==Platinum==		==Platinum==

Tools

Chenglee — Thu, 16 Jul 2026 11:30:56 GMT

← Older revision		Revision as of 11:30, 16 July 2026
Line 3:		Line 3:
	'''A standardized training request form has been introduced. The new system will allow users to request training for multiple instruments using a single form ([https://forms.office.com/e/b3PDKjsZ88?origin=lpr NBI-Cleanroom Training Request Form]). Please only request training for instruments that require immediate access. Following submission of the request form, email communication will continue to be used for scheduling and coordinating training activities. The Cleanroom staff will acknowledge and respond to training requests within 1-2 working days'''.		'''A standardized training request form has been introduced. The new system will allow users to request training for multiple instruments using a single form ([https://forms.office.com/e/b3PDKjsZ88?origin=lpr NBI-Cleanroom Training Request Form]). Please only request training for instruments that require immediate access. Following submission of the request form, email communication will continue to be used for scheduling and coordinating training activities. The Cleanroom staff will acknowledge and respond to training requests within 1-2 working days'''.

	Once the user has completed the training, they are given booking rights in the [http://cleanroom.brickhost.com cleanroom booking system]. However, after a certain period of inactivity on a given tool, the booking rights will expire and the user will need to be retrained in order to continue using the tool.		Once the user has completed the training, they are given booking rights in the [http://cleanroom.brickhost.com cleanroom booking system]. However, after a certain period of inactivity (90-day) on a given tool, the booking rights will expire and the user will need to be retrained in order to continue using the tool.

	== Tool list ==		== Tool list ==

Main Page

Chenglee — Thu, 16 Jul 2026 07:31:47 GMT

Current Tool Status

← Older revision		Revision as of 07:31, 16 July 2026
(7 intermediate revisions by the same user not shown)
Line 13:		Line 13:

	==NEWS: NBI-Cleanroom Training Request Form==		==NEWS: NBI-Cleanroom Training Request Form==
	Starting in July 2026, a standardized training request form ~~will be~~ introduced. The new system will allow users to request training for multiple instruments using a single form ([https://forms.office.com/e/b3PDKjsZ88?origin=lprLink NBI-Cleanroom Training Request Form]). Following submission of the request form, email communication will continue to be used for scheduling and coordinating training activities.		Starting in July 2026, a standardized training request form has been introduced. The new system will allow users to request training for multiple instruments using a single form ([https://forms.office.com/e/b3PDKjsZ88?origin=lprLink NBI-Cleanroom Training Request Form]). Following submission of the request form, email communication will continue to be used for scheduling and coordinating training activities.

	==~~Current tool status~~==		==NEWS: Sample Storage Box Label Policy==
			Starting in July 2026, a new standard policy for labeling sample storage boxes has been implemented. As a minimum, each storage box must be labelled with user's name, research group or company, month and year the box was first used, and whether it contains III-V materials. In addition, all individual sample trays and wafer boxes must be labelled with sample ID and clearly indicate whether they contain III-V materials.

			==Current Tool Status==

			''List updated: Tue 1 July 2026''

	{\| cellspacing=0px style="text-align: left;"		{\| cellspacing=0px style="text-align: left;"
Line 80:		Line 84:
	\| style="background-color: #c6e0b4" \| All good!		\| style="background-color: #c6e0b4" \| All good!
	\|}		\|}

	~~''List updated: Tue 1 July 2026''~~

	<!--		<!--

Sensofar optical profiler

Chenglee — Fri, 10 Jul 2026 07:34:39 GMT

← Older revision		Revision as of 07:34, 10 July 2026
(2 intermediate revisions by the same user not shown)
Line 4:		Line 4:
	\|website = https://www.sensofar.com/metrology/sneox/		\|website = https://www.sensofar.com/metrology/sneox/
	\|company = Sensofar Metrology		\|company = Sensofar Metrology
	\|description = Optical ~~surface~~ profiler		\|description = Optical profiler
	\|location = Cleanroom 2		\|location = Cleanroom 2
	\|primary = Nader		\|primary = Nader
	\|secondary = Nikki		\|secondary = Nikki
	}}		}}

			[[Category:Tools]]
			[[Category:Characterization]]

			Sensofar S Neox is a versatile, '''non-contact 3D optical profiler''' used for high-precision surface metrology. It combines confocal, interferometry and focus variation techniques to characterize a wide range of surface topology and materials, including roughness, flatness, step height and texture. Choosing the appropriate technique based on the sample's surface characteristics is essential for obtaining accurate and reliable results.

			'''Confocal''': for high lateral resolution to very rough surfaces.
			'''Interferometry''' (PSI/VSI/ePSI): for smooth to moderately rough surfaces and sub-nanometer height resolution.
			'''Focus Variation''': for very rough or steep surfaces.

			Compared with contact profilometry and AFM:
			* Lower lateral resolution than AFM for nanoscale feature.
			* Less suitable for measuring features smaller than the optical diffraction limit.
			* Transparent and semi-transparent films may generate reflections from multiple interfaces, which can reduce measurement accuracy.

			'''💡Questions?'''

			For more information, kindly contact NBI-Cleanroom staff.

Bruker Dimension Icon AFM

Chenglee — Thu, 09 Jul 2026 13:49:01 GMT

← Older revision		Revision as of 13:49, 9 July 2026
Line 5:		Line 5:
	\|description = Atomic Force Microscope		\|description = Atomic Force Microscope
	\|website = https://www.bruker.com/en/products-and-solutions/microscopes/materials-afm/dimension-icon-afm.html		\|website = https://www.bruker.com/en/products-and-solutions/microscopes/materials-afm/dimension-icon-afm.html
	\|location = ~~Characterization room (~~03.01.K08)		\|location = 03.01.K08
	\|primary = Nikki		\|primary = Nikki
	\|secondary = Zhe		\|secondary = Zhe

Sensofar optical profiler

Chenglee — Thu, 09 Jul 2026 13:45:41 GMT

← Older revision		Revision as of 13:45, 9 July 2026
Line 6:		Line 6:
	\|description = Optical surface profiler		\|description = Optical surface profiler
	\|location = Cleanroom 2		\|location = Cleanroom 2
	\|primary = ~~Nikki~~		\|primary = Nader
	\|secondary = ~~Nader~~		\|secondary = Nikki
	}}		}}

Cambridge ALD

Harry — Wed, 08 Jul 2026 11:43:17 GMT

← Older revision		Revision as of 11:43, 8 July 2026
Line 12:		Line 12:
	''Page last updated: 15 Jun 2026''		''Page last updated: 15 Jun 2026''

	Two nearly identical Savannah S100-like systems are used for [[atomic layer deposition]] of '''aluminum''', '''hafnium''', '''titanium''', '''zirconium~~''', and '''oxide~~'''.		Two nearly identical Savannah S100-like systems are used for [[atomic layer deposition]] of '''aluminum''', '''hafnium''', '''titanium''', '''zirconium'''.

	Other material deposition alternatives at the [[Main Page\|NBI cleanroom]]:		Other material deposition alternatives at the [[Main Page\|NBI cleanroom]]:

Training

Harry — Wed, 08 Jul 2026 08:18:38 GMT

Shadowing requirements

← Older revision		Revision as of 08:18, 8 July 2026
(One intermediate revision by the same user not shown)
Line 192:		Line 192:

	=== Plassys Evaporator ===		=== Plassys Evaporator ===
	A physical vapour deposition tool of aluminium ~~via~~ e-beam evaporation for Josephson junction fabrication.		A physical vapour deposition tool for aluminium e-beam evaporation for Josephson junction fabrication.

	Apply for training via the [https://forms.office.com/e/b3PDKjsZ88?origin=lprLink NBI-Cleanroom Training Request Form].		Apply for training via the [https://forms.office.com/e/b3PDKjsZ88?origin=lprLink NBI-Cleanroom Training Request Form].
Line 202:		Line 202:
	* Confirm that you have a sample ready.		* Confirm that you have a sample ready.
	* Confirm that you have shadowed your colleagues using the tool 2-3 times.		* Confirm that you have shadowed your colleagues using the tool 2-3 times.
	* Specify process steps you want to run		* Specify the process steps you want to run
	*: Materials, thickness, tilt, milling, oxidation		*: Materials, thickness, tilt, milling, oxidation
	* The name of the recipe.		* The name of the recipe.
			====Shadowing requirements====
			Most likely, you will use this tool to make Manhattan-type junctions: '''You are required to draw a schematic with the evaporation angles with respect to your chip design'''. Please show this to the instructor once you have planned the first training.

			The best time to do that is during the shadowing session! Your experienced colleague can explain to you the geometry of the evaporation and based on your chip design, you can create together an appropriate recipe and schematics

			During the shadowing session, you are expected to '''actively participate in the process''':
			* Understand the risks of the tool
			* Ask questions
			* Keep notes
			* Have some hands-on experience (help with loading, make a new recipe, use the GUI, etc)

	==== Restrictions====		==== Restrictions====
	* Only Si and sapphire samples are allowed in the chamber.		* Only Si and sapphire samples are allowed in the chamber.