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File:Savannah User Manual.pdf

Harry — Mon, 15 Jun 2026 13:22:37 GMT

Harry uploaded File:Savannah User Manual.pdf ALD2 savannah veeco user manual

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== Summary ==
ALD2 savannah veeco user manual

Cambridge ALD

Harry — Mon, 15 Jun 2026 13:04:20 GMT

← Older revision		Revision as of 13:04, 15 June 2026
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	== Growth per cycle (GPC) monitoring ==		== Growth per cycle (GPC) monitoring ==

	<gallery mode="packed" widths=500 heights=200>		<gallery mode="packed" widths=500 heights=200>
	Image:ALD1.png\|ALD1 HfOx		Image:ALD1.png\|ALD1 HfOx
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	</gallery>		</gallery>

			==Recommended heater temperatures==
			These are the recommended temperatures from the [manual]:
			Heaters for the trap (#6):150°C
			Stop valve (#7): 150°C
			ALD valve oven (#10): 150°C
			Precursor Manifold: 150°C
			Reactor heaters (#8 and #9): 100-200°C
			ALD1 (#8 and #9): 110°C

	== Witness samples ==		== Witness samples ==

	In CR1 and CR2, you can find various witness samples depending on the properties that you would like to explore:		In CR1 and CR2, you can find various witness samples depending on the properties that you would like to explore:
	* Only thickness: Si (001) 1 inch wafers		* Only thickness: Si (001) 1 inch wafers
	* Thickness and breakdown voltage: Si (001) 15x15 mm2 back-side Au plated		* Thickness and breakdown voltage: Si (001) 15x15 mm2 back-side Au plated

	It is recommended to ash the witness chips for 2 mins before loading them in the ALD tool.		It is recommended to ash the witness chips for 2 mins before loading them in the ALD tool.

Atomic layer deposition

Harry — Mon, 15 Jun 2026 12:50:41 GMT

Principles

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	=Principles=		=Principles=
	A repetitive sequence of four steps, so called '''cycle''', achieves the coating of the surface.		A repetitive sequence of four steps described below, so called '''cycle''', achieves the coating of the surface.
	==Cycle sequence==		==Cycle sequence==
	'''Initial state:''' The surface of the material is terminated with hydroxyl groups (formed during contact with air).		'''Initial state:''' The surface of the material is terminated with hydroxyl groups (formed during contact with air).
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	'''Final state:''' A single oxide layer has been formed and surface hydroxyl groups are used again to perform another cycle.		'''Final state:''' A single oxide layer has been formed and surface hydroxyl groups are used again to perform another cycle.

	A simplistic visualisation of a binary reaction sequence is illustrated below.		A simplistic visualisation of a binary reaction sequence is illustrated below.

			[[File:ALD_sequence.jpeg\|none\|thumb\|400px\| Schematic representation of ALD using self-limiting surface chemistry and an AB binary reaction sequence.‎<ref> George, Steven M. "Atomic layer deposition: an overview." Chemical reviews 110.1 (2010): 111-131. ‎</ref>]]

	==Notes==		==Notes==
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	==An ALD cycle in Savannah==		==An ALD cycle in Savannah==
	The following image is a part of the "playlist" in the ALD2 system corresponding to the deposition sequence.		The following image is a part of the "playlist" in the ALD2 system corresponding to the deposition sequence.
			[[File:ALD_AL2_sequence.jpeg\|none\|thumb\|400px\| Part of the playlist from ALD2 tool corresponding to the deposition sequence]]

	# '''pulse''': An electrical signal turns on the precursor valve, introducing precursor A		# '''pulse''': An electrical signal turns on the precursor valve, introducing precursor A
	# '''wait''': The reaction products and the non-reacted molecules of precursor A are pumped out of the system for a set time		# '''wait''': The reaction products and the non-reacted molecules of precursor A are pumped out of the system for a set time

File:ALD sequence.jpeg

Harry — Mon, 15 Jun 2026 12:37:28 GMT

Harry uploaded File:ALD sequence.jpeg

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Safety

Harry — Mon, 15 Jun 2026 12:32:44 GMT

Safety topics

← Older revision		Revision as of 12:32, 15 June 2026
(One intermediate revision by the same user not shown)
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	*[[Working with chemicals]]		*[[Working with chemicals]]
	<!--*[[Working with HF\|Working with hydrofluoric acid]]-->		<!--*[[Working with HF\|Working with hydrofluoric acid]]-->
	*[[HF safety\|HF ~~safety~~]]		*[[HF safety\|Working with HF]]
	*[[Working with nanowires and nanotubes]]		*[[Working with nanowires and nanotubes]]
	*[[Working in the cleanroom while pregnant]]		*[[Working in the cleanroom while pregnant]]

Atomic layer deposition

Harry — Mon, 15 Jun 2026 12:29:49 GMT

Principles

← Older revision		Revision as of 12:29, 15 June 2026
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	A repetitive sequence of four steps, so called '''cycle''', achieves the coating of the surface.		A repetitive sequence of four steps, so called '''cycle''', achieves the coating of the surface.
	==Cycle sequence==		==Cycle sequence==
	# The surface of the material is terminated with hydroxyl groups (formed during contact with air).		'''Initial state:''' The surface of the material is terminated with hydroxyl groups (formed during contact with air).
	# '''The first precursor is introduced:''' The precursor molecules react with the surface hydroxyles forming a single saturated monolayer.		# '''The first precursor is introduced:''' The precursor molecules react with the surface hydroxyles forming a single saturated monolayer.
	# '''Evacuation:''' The byproducts of the reaction (methane - CH<sub>3</sub>) and the unreacted precursor molecules are pumped out of the chamber		# '''Evacuation:''' The byproducts of the reaction (methane - CH<sub>3</sub>) and the unreacted precursor molecules are pumped out of the chamber
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	# '''Evacuation:''' The byproducts of the reaction (methane - CH<sub>3</sub>) and the unreacted precursor molecules are pumped out of the chamber.		# '''Evacuation:''' The byproducts of the reaction (methane - CH<sub>3</sub>) and the unreacted precursor molecules are pumped out of the chamber.

	~~As a result, a~~ single oxide layer has been formed and surface hydroxyl groups are used again to perform another cycle.		'''Final state:''' A single oxide layer has been formed and surface hydroxyl groups are used again to perform another cycle.

			A simplistic visualisation of a binary reaction sequence is illustrated below.

	==Notes==		==Notes==
	* During the coating procedure, N<sub>2</sub> is used as a carrier gas in a user-determined flow, and a scroll pump attached to the exhaust continuously pumps the byproducts from the reactor.		* During the coating procedure, N<sub>2</sub> is used as a carrier gas in a user-determined flow, and a scroll pump attached to the exhaust continuously pumps the byproducts from the reactor.
	* The ratio of the ''oxide thickness'' over the ''growth cycles'' gives the '''growth per cycle (GPC)'''		* The ratio of the ''oxide thickness'' over the ''growth cycles'' gives the '''growth per cycle (GPC)'''

			==An ALD cycle in Savannah==
			The following image is a part of the "playlist" in the ALD2 system corresponding to the deposition sequence.
			# '''pulse''': An electrical signal turns on the precursor valve, introducing precursor A
			# '''wait''': The reaction products and the non-reacted molecules of precursor A are pumped out of the system for a set time
			# '''pulse''': An electrical signal turns on the precursor valve, introducing precursor B (water)
			# '''wait''': The reaction products and the non-reacted molecules of precursor B (water) are pumped out of the system for a set time
			# '''goto''': The loop command. It defines the line that the cycle will restart as well as the amount of cycles that you desire.

Main Page

Harry — Mon, 15 Jun 2026 11:48:32 GMT

Current tool status

← Older revision		Revision as of 11:48, 15 June 2026
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	\|}		\|}

	''List updated: ~~Tue 14 Apr~~ 2026''		''List updated: Fri 12 Jun 2026''

	<!--		<!--

Atomic layer deposition

Harry — Mon, 15 Jun 2026 10:09:10 GMT

Created page with "An Atomic Layer Deposition (ALD) process is a vapor-phase, thin-film deposition method driven by the chemical saturation of surfaces, allowing for conformal coatings of surfaces with very high aspect ratios. The reason for this uniform coating lies in the '''saturative chemisorption''' of sequential cycles of precursor vapors. =Principles= A repetitive sequence of four steps, so called '''cycle''', achieves the coating of the surface. ==Cycle sequence== # The surface of..."

New page

An Atomic Layer Deposition (ALD) process is a vapor-phase, thin-film deposition method driven by the chemical saturation of surfaces, allowing for conformal coatings of surfaces with very high aspect ratios. The reason for this uniform coating lies in the '''saturative chemisorption''' of sequential cycles of precursor vapors.

=Principles=
A repetitive sequence of four steps, so called '''cycle''', achieves the coating of the surface.
==Cycle sequence==
# The surface of the material is terminated with hydroxyl groups (formed during contact with air).
# '''The first precursor is introduced:''' The precursor molecules react with the surface hydroxyles forming a single saturated monolayer.
# '''Evacuation:''' The byproducts of the reaction (methane - CH3) and the unreacted precursor molecules are pumped out of the chamber
#'''Water (H20) is introduced:''' Water (H20) is pulsed into the reactor. This will remove the CH3 groups and create oxide bridges, and passivate the surface with hydroxyles.
# '''Evacuation:''' The byproducts of the reaction (methane - CH3) and the unreacted precursor molecules are pumped out of the chamber.

As a result, a single oxide layer has been formed and surface hydroxyl groups are used again to perform another cycle.

==Notes==
* During the coating procedure, N2 is used as a carrier gas in a user-determined flow, and a scroll pump attached to the exhaust continuously pumps the byproducts from the reactor.
* The ratio of the ''oxide thickness'' over the ''growth cycles'' gives the '''growth per cycle (GPC)'''

Cambridge ALD

Harry — Mon, 15 Jun 2026 09:16:08 GMT

← Older revision		Revision as of 09:16, 15 June 2026
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	\|secondary = Martin		\|secondary = Martin
	}}		}}
	''Page last updated: ~~11 Nov 2025~~''
	Two nearly identical Savannah S100-like systems are used for atomic layer deposition of '''aluminum''', '''hafnium''', '''titanium''', '''zirconium''', and '''oxide'''.		''Page last updated: 15 Jun 2026''

			Two nearly identical Savannah S100-like systems are used for [[atomic layer deposition]] of '''aluminum''', '''hafnium''', '''titanium''', '''zirconium''', and '''oxide'''.

	Other material deposition alternatives at the [[Main Page\|NBI cleanroom]]:		Other material deposition alternatives at the [[Main Page\|NBI cleanroom]]:
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	* [[Leica sputter coater]]		* [[Leica sputter coater]]
	* [[MBE\|Molecular beam epitaxy system]]		* [[MBE\|Molecular beam epitaxy system]]


	~~== Growth per cycle (GPC) monitoring ==~~

	~~<gallery mode="packed" widths=500 heights=200>~~
	~~Image:ALD1.png\|ALD1 HfOx~~
	~~Image:ALD1AlOx.png\|ALD1 AlOx~~
	~~Image:ALD2.png\|ALD2 HfOx~~
	~~</gallery>~~

	== Available processes ==		== Available processes ==
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	== Standard ~~operating procedure~~ ==		== Standard Operating Procedure ==
	* Log your process in the Excel notebook.		===ALD1===
	* Check the nitrogen bottle:		<div style="background-color: #c0c0c0; border: 1px solid #00000; padding: 10px; border-radius: 5px;">
	** Verify that the ~~main valve~~ on top of the ~~bottle is open~~.		====Loading====
	*: ''~~The N2 flow in idle state is~~ '''~~5 sccm~~'''.''		# Log your process in the Excel notebook.
	** Verify that the ~~main bottle pressure is at least 5 bar~~.		# Check the nitrogen bottle: ''The indicators should be close to the designated values. If line pressure is ~0bar, contact the cleanroom staff.''
	** The line pressure should be >~~1 bar (ALD1) 1~~-~~2 bar (ALD2)~~.		# Make sure the valves of '''all''' precursors inside the ALD tool are closed.
	*: ''If line pressure is ~~outside the range~~, ~~please report it to~~ the cleanroom staff.''		# Run recipe '''chamber prep''' to pump out any residual gas in the gas lines.
	* Make sure the valves of '''all''' precursors inside the ALD ~~machine~~ are closed.		# Press the round '''VENT''' button.
	* Run recipe ''~~Default_cleaning~~'' to pump out any residual gas in the gas lines.		# Open the metal lid.
	* Press the ~~'''VENT''' or~~ '''VENT REACTOR''' button.		# Put your sample inside, roughly in the center, away from the gas inlet and outlet.
	* Open the metal lid.		#: Check whether the rubber O-ring is properly seated.
	* Put your sample inside, roughly in the center, away from the gas inlet and outlet.		# Close the metal lid. Check that the lid is aligned to sit directly on top of the reactor chamber.
	*: Check whether the rubber O-ring is properly seated.		# Press the round '''PUMP''' button.
	* Close the metal lid. Check that the lid is aligned to sit directly on top of the reactor chamber.		# Place the metal cage on top of the tool.
	* Press the '''~~PUMP~~''' or '''PUMP REACTOR''' button.		# Open the H<sub>2</sub>0 valve.
	*: Pressure with flow set to 0: ~5e-2 Torr or lower.		# Open relevant precursor valve.
	* Place the metal cage on top of the tool.		# Run your recipe.
	* Open relevant precursor ~~valves~~.		====Unloading====
	* Run your recipe.		# Close precursor valves.
	~~<blockquote style="background-color:~~ #~~F0F0F0; border: dashed thin grey;">~~		# Press the round '''VENT''' button.
	* Pressure with 20 sccm N<sub>2</sub> flow present: low e-1 Torr.		# Place the metal cage on the side of the tool.
	* ALD1 pulse lengths: H<sub>2</sub>O ~~~0.5 s, HfOx TDMAH 0.2 s, AlOx TMA 0.02 s~~.		# Take out your sample. Check the rubber o-ring.
	* ALD2 pulse lengths: H<sub>2</sub>O ~0.02 s, HfOx TDMAH 0.2-0.5 s.		# Press the round '''PUMP''' button.
	~~</blockquote>~~		# Run recipe '''chamber_finalise'''.
	* Close precursor ~~valves~~.		# Leave the system in the appropriate state.
	* Press the ~~big round '''VENT''' or~~ '''VENT REACTOR''' button.		</div>
	* Place the metal cage on the ~~side of the tool~~.
	* Take out your sample. Check the rubber o-ring.		===ALD2===
	* Press the ~~big round~~ '''~~PUMP~~''' or '''PUMP REACTOR''' button.		<div style="background-color: #c0c0c0; border: 1px solid #00000; padding: 10px; border-radius: 5px;">
	* Run recipe ''~~Default_heater_set~~''.		====Loading====
	* Verify that the ~~flow is set at 5 sccm~~.		# Log your process in the Excel notebook.
			# Check the nitrogen bottle: ''The indicators should be close to the designated values. If line pressure is ~0bar, contact the cleanroom staff.''
			# Make sure the valves of '''all''' precursors inside the ALD tool are closed.
			# Run recipe '''chamber prep.txt''' to pump out any residual gas in the gas lines.
			# Press the '''VENT REACTOR''' button.
			# Open the metal lid.
			# Put your sample inside, roughly in the center, away from the gas inlet and outlet.
			#: Check whether the rubber O-ring is properly seated.
			# Close the metal lid. Check that the lid is aligned to sit directly on top of the reactor chamber.
			# Press the '''STOP VENTING''' button.
			# Press the '''PUMP REACTOR''' button.
			# Place the metal cage on top of the tool.
			# Open relevant precursor valve.
			# H<sub>2</sub>O is always open.
			# Run your recipe.
			====Unloading====
			# Close precursor valve.
			# Press the '''VENT REACTOR''' button.
			# Place the metal cage on the wall.
			# Take out your sample. Check the rubber o-ring.
			# Press the '''STOP VENTING''' button.
			# Press the '''PUMP REACTOR''' button.
			# Run recipe '''chamber_finalise.txt'''.
			# Leave the system in the appropriate state.
			</div>

			== Growth per cycle (GPC) monitoring ==

			<gallery mode="packed" widths=500 heights=200>
			Image:ALD1.png\|ALD1 HfOx
			Image:ALD1AlOx.png\|ALD1 AlOx
			Image:ALD2.png\|ALD2 HfOx
			</gallery>


	== Witness samples ==		== Witness samples ==

Safety

Harry — Mon, 15 Jun 2026 08:52:27 GMT

Safety topics

← Older revision		Revision as of 08:52, 15 June 2026
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	*[[General rules for working in the cleanroom]]		*[[General rules for working in the cleanroom]]
	*[[Working with chemicals]]		*[[Working with chemicals]]
	*[[Working with HF\|Working with hydrofluoric acid]]		<!--*[[Working with HF\|Working with hydrofluoric acid]]-->
	*[[HF safety\|HF safety]]		*[[HF safety\|HF safety]]
	*[[Working with nanowires and nanotubes]]		*[[Working with nanowires and nanotubes]]

Working with HF

Harry — Mon, 15 Jun 2026 08:48:45 GMT

← Older revision		Revision as of 08:48, 15 June 2026
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	Hydrofluoric acid (HF) has a number of chemical, physical, and toxicological properties, which make handling of this material especially hazardous. Although chemists consider HF to be a “weak” acid, its potential to produce serious health effects greatly exceeds that of “strong” acids commonly used in the laboratory. HF shares the corrosive properties common among mineral acids but is unique in its ability to cause deep tissue damage and hypocalcemia (low calcium levels in the blood). Anhydrous (containing no water) HF is a clear, colorless, fuming, and corrosive liquid. HF is also available in the gaseous state. All forms, including solutions or vapor, can cause severe burns to tissue which are extremely painful and very slow to heal.		Hydrofluoric acid (HF) has a number of chemical, physical, and toxicological properties, which make handling of this material especially hazardous. Although chemists consider HF to be a “weak” acid, its potential to produce serious health effects greatly exceeds that of “strong” acids commonly used in the laboratory. HF shares the corrosive properties common among mineral acids but is unique in its ability to cause deep tissue damage and hypocalcemia (low calcium levels in the blood). Anhydrous (containing no water) HF is a clear, colorless, fuming, and corrosive liquid. HF is also available in the gaseous state. All forms, including solutions or vapor, can cause severe burns to tissue which are extremely painful and very slow to heal.

	Watch our video on how to safely handle HF:		<!--Watch our video on how to safely handle HF:

	[[File:HF_handling.mp4\|600px]]		[[File:HF_handling.mp4\|600px]]-->

	<!--The following picture shown an example of an HF burn caused by exposure to 70% hydrofluoric acid.		<!--The following picture shown an example of an HF burn caused by exposure to 70% hydrofluoric acid.

Cambridge ALD

Harry — Mon, 15 Jun 2026 07:58:43 GMT

Witness samples

← Older revision		Revision as of 07:58, 15 June 2026
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	In CR1 and CR2, you can find various witness samples depending on the properties that you would like to explore:		In CR1 and CR2, you can find various witness samples depending on the properties that you would like to explore:
	* Only thickness: Si (001) ~~of dimension > 7x7 mm2~~		* Only thickness: Si (001) 1 inch wafers
	* Thickness and breakdown voltage: Si (001) 15x15 mm2 back-side Au plated		* Thickness and breakdown voltage: Si (001) 15x15 mm2 back-side Au plated

Main Page

Chenglee — Fri, 12 Jun 2026 13:20:43 GMT

Current tool status

← Older revision		Revision as of 13:20, 12 June 2026
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	\|-		\|-
	\| style="text-align:right; padding-right:6px;" \| [[JEOL 7800F\|JEOL JSM-7800F prime]]		\| style="text-align:right; padding-right:6px;" \| [[JEOL 7800F\|JEOL JSM-7800F prime]]
	\| style="background-color: #~~FFBF00~~" \| ~~Imaging issue. Expected recovery date: mid-June 2026.~~		\| style="background-color: #c6e0b4" \| All good!
	\|-		\|-
	\| style="text-align:right; padding-right:6px;" \| [[Talos F200i S/TEM\|TEM]]		\| style="text-align:right; padding-right:6px;" \| [[Talos F200i S/TEM\|TEM]]

HF safety

Harry — Fri, 12 Jun 2026 08:11:16 GMT

Workstation Setup

← Older revision		Revision as of 08:11, 12 June 2026
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	\|}		\|}

	[[File:HF_bench_setup.png\|~~center~~\|thumb\|800px\|Recommended Setup Inside the Fume Hood]]		[[File:HF_bench_setup.png\|none\|thumb\|800px\|Recommended Setup Inside the Fume Hood]]

	== Standard Operating Procedure ==		== Standard Operating Procedure ==
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	\| '''If you see a liquid drop on''' \|\| '''Action Plan'''		\| '''If you see a liquid drop on''' \|\| '''Action Plan'''
	\|-		\|-
	\| Stainless steel airfoil \|\| * Assume it is HF.		\| Stainless steel airfoil \|\|
			* Assume it is HF.
	* Wipe once with a CR wipe.		* Wipe once with a CR wipe.
	* Wipe again with a water-soaked CR wipe and let it evaporate.		* Wipe again with a water-soaked CR wipe and let it evaporate.
	\|-		\|-
	\| Barrier gloves \|\| * Assume it is HF.		\| Barrier gloves \|\|
			* Assume it is HF.
	* Rinse gloves.		* Rinse gloves.
	* Remove them by turning inside out (no wiping needed).		* Remove them by turning inside out (no wiping needed).
	* Use a clean set of barrier gloves.		* Use a clean set of barrier gloves.
	\|-		\|-
	\| Apron \|\| * Remove the apron and leave it '''inside the fume hood'''.		\| Apron \|\|
			* Remove the apron and leave it '''inside the fume hood'''.
	* Evacuate the area.		* Evacuate the area.
	* CR staff flushes and disposes of the apron.		* CR staff flushes and disposes of the apron.
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	\| '''Spill Location''' \|\| '''User Actions'''		\| '''Spill Location''' \|\| '''User Actions'''
	\|-		\|-
	\| Outside the HF tray but inside the bench \|\| * '''Do not take any action'''—leave the setup immediately.		\| Outside the HF tray but inside the bench \|\|
			* '''Do not take any action'''—leave the setup immediately.
	* Buddy helps remove contaminated PPE (keep PPE within the fume hood).		* Buddy helps remove contaminated PPE (keep PPE within the fume hood).
	* Buddy calls for help (if user is HF-free).		* Buddy calls for help (if user is HF-free).
	\|-		\|-
	\| Outside the HF tray and outside the bench \|\| * '''Do not take any action'''—'''evacuate CR1 immediately'''.		\| Outside the HF tray and outside the bench \|\|
			* '''Do not take any action'''—'''evacuate CR1 immediately'''.
	* Remove contaminated PPE '''outside CR1 door''' (in the hallway).		* Remove contaminated PPE '''outside CR1 door''' (in the hallway).
	* Buddy calls for help (if user is HF-free).		* Buddy calls for help (if user is HF-free).
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	'''The user and their buddy should follow the action plan bellow'''		'''The user and their buddy should follow the action plan bellow'''
			[[File:Emergency_shower.jpg\|right\|thumb\|400px\|Emergency Showers in the Hallway of the Second Floor]]
	{\|		{\|
	\|-		\|-
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	\|}		\|}

	~~[[File:Emergency_shower.jpg\|center\|thumb\|800px\|Emergency Showers in the Hallway of the Second Floor]]~~

	~~---~~
	== Exposure Response ==		== Exposure Response ==
	{\|		{\|

Main Page

Chenglee — Thu, 11 Jun 2026 11:33:47 GMT

Current tool status

← Older revision		Revision as of 11:33, 11 June 2026
(One intermediate revision by the same user not shown)
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	\|-		\|-
	\| style="text-align:right; padding-right:6px;" \| [[JEOL 7800F\|JEOL JSM-7800F prime]]		\| style="text-align:right; padding-right:6px;" \| [[JEOL 7800F\|JEOL JSM-7800F prime]]
	\| style="background-color: #~~c6e0b4~~" \| ~~All good!~~		\| style="background-color: #FFBF00" \| Imaging issue. Expected recovery date: mid-June 2026.
	\|-		\|-
	\| style="text-align:right; padding-right:6px;" \| [[Talos F200i S/TEM\|TEM]]		\| style="text-align:right; padding-right:6px;" \| [[Talos F200i S/TEM\|TEM]]

Main Page

Zhe — Tue, 09 Jun 2026 11:09:44 GMT

← Older revision		Revision as of 11:09, 9 June 2026
(One intermediate revision by the same user not shown)
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	\|-		\|-
	\| style="text-align:right; padding-right:6px;" \| [[Raith eLine\|Raith eLine 30 kV]]		\| style="text-align:right; padding-right:6px;" \| [[Raith eLine\|Raith eLine 30 kV]]
	\| style="background-color: #~~c6e0b4~~" \| ~~All good!~~		\| style="background-color: #ff9f9f" \| Service: Gun vacuum is too low
	\|-		\|-
	\| style="text-align:right; padding-right:6px;" \| [[Elionix_7000\|Elionix 7000 100 kV]]		\| style="text-align:right; padding-right:6px;" \| [[Elionix_7000\|Elionix 7000 100 kV]]