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	<updated>2026-04-09T23:12:47Z</updated>
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	<entry>
		<id>https://wiki.nbi.ku.dk/w/cleanroom/index.php?title=Tools&amp;diff=2273</id>
		<title>Tools</title>
		<link rel="alternate" type="text/html" href="https://wiki.nbi.ku.dk/w/cleanroom/index.php?title=Tools&amp;diff=2273"/>
		<updated>2023-11-16T08:59:38Z</updated>

		<summary type="html">&lt;p&gt;Nader: /* Tool list */&lt;/p&gt;
&lt;hr /&gt;
&lt;div&gt;A prerequisite for using the cleanroom tools is that a cleanroom staff member has given the necessary instruction or training.&lt;br /&gt;
This includes basic instruments such as hotplates and microscopes.&lt;br /&gt;
For &#039;&#039;&#039;all&#039;&#039;&#039; training requests, please read the [[Training|training]] page and afterwards contact [mailto:cleanroom@nbi.ku.dk cleanroom@nbi.ku.dk].]&lt;br /&gt;
A cleanroom staff member will typically respond within one workday.&lt;br /&gt;
Do not contact individual staff members for training. &lt;br /&gt;
&lt;br /&gt;
Once the user has completed the training, they are given booking rights in the [http://cleanroom.brickhost.com cleanroom booking system]. However, after a certain period of inactivity on a given tool, the booking rights will expire and the user will need to be retrained in order to continue using the tool.&lt;br /&gt;
&lt;br /&gt;
== Tool list ==&lt;br /&gt;
{| style=&amp;quot;width: 85%;&amp;quot;&lt;br /&gt;
|- style=&amp;quot;text-align:left;&amp;quot;&lt;br /&gt;
! Lithography !! Thin film &amp;amp; III-Vs !! Characterization !! Other&lt;br /&gt;
|- valign=&amp;quot;top&amp;quot; &lt;br /&gt;
| style=&amp;quot;width: 20%;&amp;quot; |&lt;br /&gt;
* [[Heidelberg µPG 501|Heidelberg LED writer]]&lt;br /&gt;
* [[Süss mask aligner]]&lt;br /&gt;
* [[Raith eLine|Raith eLine 30 kV EBL/SEM]]&lt;br /&gt;
* [[Elionix_7000|Elionix 7000 100 kV EBL]]&lt;br /&gt;
* [[Elionix_F-125|Elionix F-125 125kV EBL]] (QuanTech)&lt;br /&gt;
| style=&amp;quot;width: 20%;&amp;quot; |&lt;br /&gt;
* [[AJA systems]]&lt;br /&gt;
* [[Plassys Evaporator]]&lt;br /&gt;
* [[E-Gun evaporator]]&lt;br /&gt;
* [[Edwards evaporator|Edwards thermal evaporator]]&lt;br /&gt;
* [[Laurell spinners]]&lt;br /&gt;
* [[Cambridge ALD]]&lt;br /&gt;
* [[Leica sputter coater]]&lt;br /&gt;
* [[MBE]]&lt;br /&gt;
| style=&amp;quot;width: 20%;&amp;quot; |&lt;br /&gt;
* [[JEOL 6320F|JEOL JSM-6320F]]&lt;br /&gt;
* [[JEOL 7800F|JEOL JSM-7800F]]&lt;br /&gt;
* [[Raith eLine]]&lt;br /&gt;
* [[Philips TEM]]&lt;br /&gt;
* [[Tencor profilometer]]&lt;br /&gt;
* [[Alpha-SE ellipsometer]]&lt;br /&gt;
&amp;lt;!-- * [[Sensofar optical profiler]] --&amp;gt;&lt;br /&gt;
* [[Olympus microscopes]]&lt;br /&gt;
* [[Lynx EVO stereomicroscope]]&lt;br /&gt;
* [[Bruker Dimension Icon AFM]]&lt;br /&gt;
* [[Filmetrics reflectometer]]&lt;br /&gt;
* [[Probe station]]&lt;br /&gt;
| style=&amp;quot;width: 20%;&amp;quot; |&lt;br /&gt;
* [[Süss scriber|Manual Süss scriber]]&lt;br /&gt;
* [[Loomis scriber|Automatic Loomis scriber]]&lt;br /&gt;
* [[Dicing saw]]&lt;br /&gt;
* [[AccuThermo RTA]]&lt;br /&gt;
* [[Biorad]]&lt;br /&gt;
* [[Plasma-Preen asher]]&lt;br /&gt;
* [[Diener plasma asher]]&lt;br /&gt;
* [[Tergeo plasma asher]]&lt;br /&gt;
* [[FS bonder]]&lt;br /&gt;
&amp;lt;!-- * [[K&amp;amp;S Ball Bonder]] --&amp;gt;&lt;br /&gt;
* [[Micromanipulator]]&lt;br /&gt;
* [[Präzitherm hotplates]]&lt;br /&gt;
* [[Critical point dryer]]&lt;br /&gt;
|}&lt;br /&gt;
&lt;br /&gt;
== Tool access requirement guidelines ==&lt;br /&gt;
&lt;br /&gt;
{| cellspacing=0px style=&amp;quot;text-align: center;&amp;quot;&lt;br /&gt;
! scope=&amp;quot;col&amp;quot; width=&amp;quot;20%&amp;quot; align=&amp;quot;right&amp;quot;  | &lt;br /&gt;
! scope=&amp;quot;col&amp;quot; width=&amp;quot;20%&amp;quot; | Bachelor&lt;br /&gt;
! scope=&amp;quot;col&amp;quot; width=&amp;quot;20%&amp;quot; | Master&lt;br /&gt;
! scope=&amp;quot;col&amp;quot; width=&amp;quot;20%&amp;quot; | PhD&lt;br /&gt;
! scope=&amp;quot;col&amp;quot; width=&amp;quot;20%&amp;quot; | Postdoc&lt;br /&gt;
|-&lt;br /&gt;
| style=&amp;quot;text-align:right; padding-right:6px;&amp;quot; |  [[Raith eLine|eLine]]&lt;br /&gt;
| style=&amp;quot;background-color: #ff9f9f&amp;quot; | No&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
|-&lt;br /&gt;
| style=&amp;quot;text-align:right; padding-right:6px;&amp;quot; | [[Elionix]]&lt;br /&gt;
| style=&amp;quot;background-color: #ff9f9f&amp;quot; | No&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
|-&lt;br /&gt;
| style=&amp;quot;text-align:right; padding-right:6px;&amp;quot; | [[Heidelberg µPG 501|LED writer]]&lt;br /&gt;
| style=&amp;quot;background-color: #ff9f9f&amp;quot; | No&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
|-&lt;br /&gt;
| style=&amp;quot;text-align:right; padding-right:6px;&amp;quot; | [[Süss mask aligner|Mask aligner]]&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
|-&lt;br /&gt;
| style=&amp;quot;padding-bottom:6px;&amp;quot; |&lt;br /&gt;
|-&lt;br /&gt;
| style=&amp;quot;text-align:right; padding-right:6px;&amp;quot; | [[AJA Systems|AJAs]]&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
|-&lt;br /&gt;
| style=&amp;quot;text-align:right; padding-right:6px;&amp;quot; | [[E-Gun evaporator|E-gun]]&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
|-&lt;br /&gt;
| style=&amp;quot;text-align:right; padding-right:6px;&amp;quot; | [[Edwards evaporator|Edwards]]&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
|-&lt;br /&gt;
| style=&amp;quot;text-align:right; padding-right:6px;&amp;quot; | [[Cambridge ALD|ALD]]&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
|-&lt;br /&gt;
| style=&amp;quot;text-align:right; padding-right:6px;&amp;quot; | [[Leica sputter coater|Leica sputter]]&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
|-&lt;br /&gt;
| style=&amp;quot;padding-bottom:6px;&amp;quot; |&lt;br /&gt;
|-&lt;br /&gt;
| style=&amp;quot;text-align:right; padding-right:6px;&amp;quot; | [[JEOL 6320F]]&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
|-&lt;br /&gt;
| style=&amp;quot;text-align:right; padding-right:6px;&amp;quot; | [[JEOL 7800F]]&lt;br /&gt;
| style=&amp;quot;background-color: #ff9f9f&amp;quot; | No&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
|-&lt;br /&gt;
| style=&amp;quot;text-align:right; padding-right:6px;&amp;quot; | [[Philips TEM|TEM]]&lt;br /&gt;
| style=&amp;quot;background-color: #ff9f9f&amp;quot; | No&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
|-&lt;br /&gt;
| style=&amp;quot;text-align:right; padding-right:6px;&amp;quot; | [[Tencor profilometer|Profilometer]]&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
|-&lt;br /&gt;
| style=&amp;quot;text-align:right; padding-right:6px;&amp;quot; | [[Alpha-SE Ellipsometer|Ellipsometer]]&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
|-&lt;br /&gt;
&amp;lt;!-- | style=&amp;quot;text-align:right; padding-right:6px;&amp;quot; | [[Sensofar optical profiler|Sensofar]]&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
|- --&amp;gt;&lt;br /&gt;
| style=&amp;quot;text-align:right; padding-right:6px;&amp;quot; | [[Bruker Dimension Icon AFM|AFM]]&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
|-&lt;br /&gt;
| style=&amp;quot;text-align:right; padding-right:6px;&amp;quot; | [[Filmetrics reflectometer|Filmetrics]]&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
|-&lt;br /&gt;
| style=&amp;quot;padding-bottom:6px;&amp;quot; |&lt;br /&gt;
|-&lt;br /&gt;
| style=&amp;quot;text-align:right; padding-right:6px;&amp;quot; | [[Süss scriber|Manual scriber]]&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
|-&lt;br /&gt;
| style=&amp;quot;text-align:right; padding-right:6px;&amp;quot; | [[Loomis scriber]]&lt;br /&gt;
| style=&amp;quot;background-color: #ff9f9f&amp;quot; | No&lt;br /&gt;
| style=&amp;quot;background-color: #ff9f9f&amp;quot; | No&lt;br /&gt;
| style=&amp;quot;background-color: #ff9f9f&amp;quot; | No&lt;br /&gt;
| style=&amp;quot;background-color: #ff9f9f&amp;quot; | No&lt;br /&gt;
|-&lt;br /&gt;
| style=&amp;quot;text-align:right; padding-right:6px;&amp;quot; | [[AccuThermo RTA|RTA]]&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
|-&lt;br /&gt;
| style=&amp;quot;text-align:right; padding-right:6px;&amp;quot; | [[Biorad]]&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
|-&lt;br /&gt;
| style=&amp;quot;text-align:right; padding-right:6px;&amp;quot; | [[Plasma-Preen asher|Microwave asher]]&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
|-&lt;br /&gt;
| style=&amp;quot;text-align:right; padding-right:6px;&amp;quot; | [[Diener plasma asher|Diener asher]]&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
|-&lt;br /&gt;
| style=&amp;quot;text-align:right; padding-right:6px;&amp;quot; | [[Tergeo Plasma Asher|Tergeo asher]]&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
|-&lt;br /&gt;
| style=&amp;quot;text-align:right; padding-right:6px;&amp;quot; | [[Laurell spinners|Spinners]]&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
|}&lt;br /&gt;
&lt;br /&gt;
[[Category:Tools]]&lt;/div&gt;</summary>
		<author><name>Nader</name></author>
	</entry>
	<entry>
		<id>https://wiki.nbi.ku.dk/w/cleanroom/index.php?title=Biorad&amp;diff=2272</id>
		<title>Biorad</title>
		<link rel="alternate" type="text/html" href="https://wiki.nbi.ku.dk/w/cleanroom/index.php?title=Biorad&amp;diff=2272"/>
		<updated>2023-11-16T08:58:04Z</updated>

		<summary type="html">&lt;p&gt;Nader: &lt;/p&gt;
&lt;hr /&gt;
&lt;div&gt;&lt;br /&gt;
Small annealer Max sample size 20x20 mm, Max temperature 750 degrees C.&lt;br /&gt;
&lt;br /&gt;
Placed on Process lab 2nd floor.&lt;br /&gt;
&lt;br /&gt;
Startup Procedure&lt;br /&gt;
&lt;br /&gt;
If this is your first time using the machine, you can consult Cleanroom@nbi.ku.dk for training.&lt;/div&gt;</summary>
		<author><name>Nader</name></author>
	</entry>
	<entry>
		<id>https://wiki.nbi.ku.dk/w/cleanroom/index.php?title=Biorad&amp;diff=2271</id>
		<title>Biorad</title>
		<link rel="alternate" type="text/html" href="https://wiki.nbi.ku.dk/w/cleanroom/index.php?title=Biorad&amp;diff=2271"/>
		<updated>2023-11-16T08:57:02Z</updated>

		<summary type="html">&lt;p&gt;Nader: Created page with &amp;#039; Small annealer Max sample size 20x20 mm, Max temperature 750 degrees C. Startup Procedure If this is your first time using the machine, you can consult Cleanroom@nbi.ku.dk fo...&amp;#039;&lt;/p&gt;
&lt;hr /&gt;
&lt;div&gt;&lt;br /&gt;
Small annealer Max sample size 20x20 mm, Max temperature 750 degrees C.&lt;br /&gt;
Startup Procedure&lt;br /&gt;
If this is your first time using the machine, you can consult Cleanroom@nbi.ku.dk for training.&lt;/div&gt;</summary>
		<author><name>Nader</name></author>
	</entry>
	<entry>
		<id>https://wiki.nbi.ku.dk/w/cleanroom/index.php?title=Safety&amp;diff=2270</id>
		<title>Safety</title>
		<link rel="alternate" type="text/html" href="https://wiki.nbi.ku.dk/w/cleanroom/index.php?title=Safety&amp;diff=2270"/>
		<updated>2023-10-16T09:50:43Z</updated>

		<summary type="html">&lt;p&gt;Nader: /* Other */&lt;/p&gt;
&lt;hr /&gt;
&lt;div&gt;__NOTOC__&lt;br /&gt;
== Safety topics ==&lt;br /&gt;
* [https://wiki.nbi.ku.dk/w/cleanroom/images/9/9e/Topics_covered_during_Cleanroom_safety_training.pdf List of Topics covered during Cleanroom use and safety training - PDF]&lt;br /&gt;
*[[General rules for working in the cleanroom]]&lt;br /&gt;
*[[Working with chemicals]]&lt;br /&gt;
*[[Working with HF|Working with hydrofluoric acid]]&lt;br /&gt;
*[[Working with nanowires and nanotubes]]&lt;br /&gt;
*[[Working in the cleanroom while pregnant]]&lt;br /&gt;
*[[Introducing new chemicals or processes]]&lt;br /&gt;
*[[Lift transport of hazardous materials]]&lt;br /&gt;
*[[Gloves and chemical resistance]]&lt;br /&gt;
&lt;br /&gt;
== Other ==&lt;br /&gt;
&lt;br /&gt;
* [http://www.kemibrug.dk/ Kemibrug.dk] - Information on chemical safety, local handling procedures, and availability&lt;br /&gt;
* [https://wiki.nbi.ku.dk/w/cleanroom/images/3/30/APV-Eng-Chemical_risk_assessment.pdf Chemical risk assessment form - PDF] - [https://wiki.nbi.ku.dk/w/cleanroom/images/9/97/APV-Eng-Chemical_risk_assessment.doc Chemical risk assessment form - Word] - needed when introducing new processes&lt;br /&gt;
* [[Filled out chemical risk assessment forms]]&lt;br /&gt;
* [https://erda.ku.dk/vgrid/NBI_cleanroom/files/Chemical%20list%20-Marianne.xlsx Chemical list -Marianne]&lt;br /&gt;
* [https://wiki.nbi.ku.dk/w/cleanroom/images/3/34/Cleanroom_safety_authorization_checklist_310820.pdf Cleanroom safety authorization checklist]&lt;br /&gt;
&lt;br /&gt;
[[Category:Safety]]&lt;/div&gt;</summary>
		<author><name>Nader</name></author>
	</entry>
	<entry>
		<id>https://wiki.nbi.ku.dk/w/cleanroom/index.php?title=Safety&amp;diff=2269</id>
		<title>Safety</title>
		<link rel="alternate" type="text/html" href="https://wiki.nbi.ku.dk/w/cleanroom/index.php?title=Safety&amp;diff=2269"/>
		<updated>2023-10-16T09:50:16Z</updated>

		<summary type="html">&lt;p&gt;Nader: /* Other */&lt;/p&gt;
&lt;hr /&gt;
&lt;div&gt;__NOTOC__&lt;br /&gt;
== Safety topics ==&lt;br /&gt;
* [https://wiki.nbi.ku.dk/w/cleanroom/images/9/9e/Topics_covered_during_Cleanroom_safety_training.pdf List of Topics covered during Cleanroom use and safety training - PDF]&lt;br /&gt;
*[[General rules for working in the cleanroom]]&lt;br /&gt;
*[[Working with chemicals]]&lt;br /&gt;
*[[Working with HF|Working with hydrofluoric acid]]&lt;br /&gt;
*[[Working with nanowires and nanotubes]]&lt;br /&gt;
*[[Working in the cleanroom while pregnant]]&lt;br /&gt;
*[[Introducing new chemicals or processes]]&lt;br /&gt;
*[[Lift transport of hazardous materials]]&lt;br /&gt;
*[[Gloves and chemical resistance]]&lt;br /&gt;
&lt;br /&gt;
== Other ==&lt;br /&gt;
&lt;br /&gt;
* [http://www.kemibrug.dk/ Kemibrug.dk] - Information on chemical safety, local handling procedures, and availability&lt;br /&gt;
* [https://wiki.nbi.ku.dk/w/cleanroom/images/3/30/APV-Eng-Chemical_risk_assessment.pdf Chemical risk assessment form - PDF] - [https://wiki.nbi.ku.dk/w/cleanroom/images/9/97/APV-Eng-Chemical_risk_assessment.doc Chemical risk assessment form - Word] - needed when introducing new processes&lt;br /&gt;
* [[Filled out chemical risk assessment forms]]&lt;br /&gt;
* [https://erda.ku.dk/vgrid/NBI_cleanroom/files/Chemical list -Marianne.xlsx Chemical list -Marianne]&lt;br /&gt;
* [https://wiki.nbi.ku.dk/w/cleanroom/images/3/34/Cleanroom_safety_authorization_checklist_310820.pdf Cleanroom safety authorization checklist]&lt;br /&gt;
&lt;br /&gt;
[[Category:Safety]]&lt;/div&gt;</summary>
		<author><name>Nader</name></author>
	</entry>
	<entry>
		<id>https://wiki.nbi.ku.dk/w/cleanroom/index.php?title=Safety&amp;diff=2268</id>
		<title>Safety</title>
		<link rel="alternate" type="text/html" href="https://wiki.nbi.ku.dk/w/cleanroom/index.php?title=Safety&amp;diff=2268"/>
		<updated>2023-10-16T09:45:38Z</updated>

		<summary type="html">&lt;p&gt;Nader: /* Other */&lt;/p&gt;
&lt;hr /&gt;
&lt;div&gt;__NOTOC__&lt;br /&gt;
== Safety topics ==&lt;br /&gt;
* [https://wiki.nbi.ku.dk/w/cleanroom/images/9/9e/Topics_covered_during_Cleanroom_safety_training.pdf List of Topics covered during Cleanroom use and safety training - PDF]&lt;br /&gt;
*[[General rules for working in the cleanroom]]&lt;br /&gt;
*[[Working with chemicals]]&lt;br /&gt;
*[[Working with HF|Working with hydrofluoric acid]]&lt;br /&gt;
*[[Working with nanowires and nanotubes]]&lt;br /&gt;
*[[Working in the cleanroom while pregnant]]&lt;br /&gt;
*[[Introducing new chemicals or processes]]&lt;br /&gt;
*[[Lift transport of hazardous materials]]&lt;br /&gt;
*[[Gloves and chemical resistance]]&lt;br /&gt;
&lt;br /&gt;
== Other ==&lt;br /&gt;
&lt;br /&gt;
* [http://www.kemibrug.dk/ Kemibrug.dk] - Information on chemical safety, local handling procedures, and availability&lt;br /&gt;
* [https://wiki.nbi.ku.dk/w/cleanroom/images/3/30/APV-Eng-Chemical_risk_assessment.pdf Chemical risk assessment form - PDF] - [https://wiki.nbi.ku.dk/w/cleanroom/images/9/97/APV-Eng-Chemical_risk_assessment.doc Chemical risk assessment form - Word] - needed when introducing new processes&lt;br /&gt;
* [[Filled out chemical risk assessment forms]]&lt;br /&gt;
* [https://erda.ku.dk/vgrid/NBI_cleanroom/files/Chemical%20list%20-Marianne.xlsx Chemical list -Marianne]&lt;br /&gt;
* [https://wiki.nbi.ku.dk/w/cleanroom/images/3/34/Cleanroom_safety_authorization_checklist_310820.pdf Cleanroom safety authorization checklist]&lt;br /&gt;
&lt;br /&gt;
[[Category:Safety]]&lt;/div&gt;</summary>
		<author><name>Nader</name></author>
	</entry>
	<entry>
		<id>https://wiki.nbi.ku.dk/w/cleanroom/index.php?title=MBE&amp;diff=2267</id>
		<title>MBE</title>
		<link rel="alternate" type="text/html" href="https://wiki.nbi.ku.dk/w/cleanroom/index.php?title=MBE&amp;diff=2267"/>
		<updated>2023-10-16T06:27:21Z</updated>

		<summary type="html">&lt;p&gt;Nader: /* Safety */&lt;/p&gt;
&lt;hr /&gt;
&lt;div&gt;{{Infobox tool&lt;br /&gt;
|image = Tool MBE.jpg&lt;br /&gt;
|toolfullname = Varian GEN II&lt;br /&gt;
|company = Custom&lt;br /&gt;
|description = Molecular beam epitaxy system&lt;br /&gt;
|location = MBE lab (03.2.213A, 03.2.217, 03.2.217A)&lt;br /&gt;
|primary = Claus&lt;br /&gt;
}}&lt;br /&gt;
== General information ==&lt;br /&gt;
&lt;br /&gt;
&lt;br /&gt;
The MBE system is a materials research and development facility located at HCØ, owned by NBI/KU.&lt;br /&gt;
 &lt;br /&gt;
Our MBE lab is located on the 2nd floor in rooms 3-2-213A, 3-2-217 and 3-2-217A.&lt;br /&gt;
&lt;br /&gt;
The system is a Varian GEN II with a 3&amp;quot; substrate capability. The III-V growth chamber has eight sources with the following materials.&lt;br /&gt;
&lt;br /&gt;
&lt;br /&gt;
{| style=&amp;quot;width: 85%;&amp;quot;&lt;br /&gt;
|- style=&amp;quot;text-align:left;&amp;quot;&lt;br /&gt;
! Group V !! Group III !! Dopants !! Other &lt;br /&gt;
|- valign=&amp;quot;top&amp;quot; &lt;br /&gt;
| style=&amp;quot;width: 20%;&amp;quot; |&lt;br /&gt;
As and Sb&lt;br /&gt;
&lt;br /&gt;
| style=&amp;quot;width: 20%;&amp;quot; |&lt;br /&gt;
Ga, Al and In&lt;br /&gt;
&lt;br /&gt;
| style=&amp;quot;width: 20%;&amp;quot; |&lt;br /&gt;
Si and Be&lt;br /&gt;
&lt;br /&gt;
| style=&amp;quot;width: 20%;&amp;quot; |&lt;br /&gt;
Au&lt;br /&gt;
&lt;br /&gt;
|}&lt;br /&gt;
&lt;br /&gt;
The system also has a UHV metallization chamber attached equipped with a 6-pocket e-gun and a RF sputter source.&lt;br /&gt;
&lt;br /&gt;
The principal investigator (PI) in charge of the NBI facility is Prof. [http://www.nbi.ku.dk/english/staff/?pure=en/persons/67039 Jesper Nygård]. &lt;br /&gt;
&lt;br /&gt;
[http://www.nbi.ku.dk/ansatte/?pure=da/persons/79214 Claus B. Sørensen] is technical head of the lab.&lt;br /&gt;
&lt;br /&gt;
== MBE activities meetings ==&lt;br /&gt;
MBE activities and changes of procedures are discussed at open group meetings (typically the weekly MBE/Materials subgroup meeting at QDev) where the technical head is often present.&lt;br /&gt;
&lt;br /&gt;
== Access to the system ==&lt;br /&gt;
&lt;br /&gt;
New users should be approved by the local management and must receive basic training by the technical head or a person appointed by the technical head before working on the system. Further, new users must have completed the cleanroom safety course before signing up for MBE training and  gaining access to the MBE lab. The number of persons trained and allowed to use the MBE is limited in nature due to the complexity of operation. &lt;br /&gt;
&lt;br /&gt;
Requests for cleanroom training must be mailed to [mailto:cleanroom@nbi.ku.dk cleanroom@nbi.ku.dk]&lt;br /&gt;
&lt;br /&gt;
== Training ==&lt;br /&gt;
&lt;br /&gt;
Requests for MBE training must be addressed to:&lt;br /&gt;
&lt;br /&gt;
Jesper Nygård: [mailto:nygard@nbi.ku.dk nygard@nbi.ku.dk]&lt;br /&gt;
&lt;br /&gt;
Martin Saurbrey Bjergfelt: [mailto:martin.bjergfelt@nbi.ku.dk martin.bjergfelt@nbi.ku.dk]&lt;br /&gt;
&lt;br /&gt;
== Access to room ==&lt;br /&gt;
&lt;br /&gt;
Following completion of cleanroom and MBE training, access to the lab is granted by mailing your KU access card number and your contact details (mobile phone number and email) to:&lt;br /&gt;
&lt;br /&gt;
Jesper Nygård: [mailto:nygard@nbi.ku.dk nygard@nbi.ku.dk]&lt;br /&gt;
&lt;br /&gt;
Martin Saurbrey Bjergfelt: [mailto:martin.bjergfelt@nbi.ku.dk martin.bjergfelt@nbi.ku.dk]&lt;br /&gt;
&lt;br /&gt;
== Scheduling-Booking the system ==&lt;br /&gt;
&lt;br /&gt;
All use of the system must be booked using the cleanroom [http://cleanroom.brickhost.com/ tool booking page].&lt;br /&gt;
&lt;br /&gt;
A system for handling project (alias) and planned growths (materials) may become effective in 2018 to facilitate planning and invoicing. &lt;br /&gt;
&lt;br /&gt;
== Cleanroom attire ==&lt;br /&gt;
&lt;br /&gt;
&#039;&#039;&#039;Entering the MBE lab.&#039;&#039;&#039; &lt;br /&gt;
&lt;br /&gt;
Please make sure that only one door in the airlock is open at a time to keep the room clean. The MBE room is an ISO 6/7 room and the prep-room is ISO 5/6.&lt;br /&gt;
&lt;br /&gt;
# &#039;&#039;&#039;Before&#039;&#039;&#039; entering the gowning area: &#039;&#039;wear clogs&#039;&#039;&lt;br /&gt;
# &#039;&#039;&#039;Inside&#039;&#039;&#039; the gowning area you must put on the following:&lt;br /&gt;
## &#039;&#039;A cleanroom lab gown or a full cleanroom suit &#039;&#039;&lt;br /&gt;
## &#039;&#039;Hairnet&#039;&#039;&lt;br /&gt;
## &#039;&#039;Beard cover (if applicable)&#039;&#039;&lt;br /&gt;
&lt;br /&gt;
&#039;&#039;&#039;Entering the preparation room&#039;&#039;&#039;&lt;br /&gt;
&lt;br /&gt;
&#039;&#039;&#039;Before&#039;&#039;&#039; entering the preparation room, you must additionally: &#039;&#039;put on nitrile gloves&#039;&#039;&lt;br /&gt;
&lt;br /&gt;
== Safety ==&lt;br /&gt;
&lt;br /&gt;
&lt;br /&gt;
&#039;&#039;&#039;Oxygen depletion hazard&#039;&#039;&#039;&lt;br /&gt;
&lt;br /&gt;
The MBE system is cooled by a closed loop liquid nitrogen system with a direct connection to the storage tank on the street. As nitrogen act as an asphyxiant, the oxygen level in the room is monitored to ensure that no risk of oxygen depletion can occur. &lt;br /&gt;
&lt;br /&gt;
Should the oxygen level drop below the alarm value, the alarm will sound and flash.&lt;br /&gt;
&lt;br /&gt;
You must evacuate the room immediately and notify Science Campus Service and one of the named staff members below.&lt;br /&gt;
&lt;br /&gt;
Ensure that no one enters the room, block access!&lt;br /&gt;
&lt;br /&gt;
If the alarm is active when you arrive, do not enter.&lt;br /&gt;
&lt;br /&gt;
If needed, an emergency self-contained breathing apparatus is available on the 2nd floor on the wall across from room 03-2-214&lt;br /&gt;
&lt;br /&gt;
&lt;br /&gt;
&#039;&#039;&#039;Fire alarm&#039;&#039;&#039;&lt;br /&gt;
&lt;br /&gt;
The MBE lab also has an early fire warning system if smoke is detected in the corridor on the second floor.&lt;br /&gt;
&lt;br /&gt;
Should smoke be detected in the corridor, the alarm will sound and flash.&lt;br /&gt;
&lt;br /&gt;
You must evacuate the room immediately and notify Science Campus Service and one of the named staff members below.&lt;br /&gt;
&lt;br /&gt;
&lt;br /&gt;
{| style=&amp;quot;width: 85%;&amp;quot;&lt;br /&gt;
|- style=&amp;quot;text-align:left;&amp;quot;&lt;br /&gt;
! Claus B. Sørensen !! Nader Payami !! Science Campus Service helpdesk &lt;br /&gt;
|- valign=&amp;quot;top&amp;quot; &lt;br /&gt;
| style=&amp;quot;width: 20%;&amp;quot; |&lt;br /&gt;
Phone: 2875 0449&lt;br /&gt;
&lt;br /&gt;
Mail:  [mailto:cbs@nbi.ku.dk cbs@nbi.ku.dk]&lt;br /&gt;
&lt;br /&gt;
| style=&amp;quot;width: 20%;&amp;quot; |&lt;br /&gt;
Phone: 23 81 08 93&lt;br /&gt;
&lt;br /&gt;
Mail: [mailto:martin.bjergfelt@nbi.ku.dk martin.bjergfelt@nbi.ku.dk] &lt;br /&gt;
| style=&amp;quot;width: 20%;&amp;quot; |&lt;br /&gt;
Phone: 3533 1333&lt;br /&gt;
&lt;br /&gt;
Mail: [mailto:scshelpdesk@science.ku.dk scshelpdesk@science.ku.dk]&lt;br /&gt;
|}&lt;br /&gt;
&lt;br /&gt;
== Chemical and materials safety ==&lt;br /&gt;
&lt;br /&gt;
All safety procedures in the cleanroom also applies in the MBE-lab. It is mandatory for users to familiarize themselves with the Materials Safety Data Sheets (MSDS) and observe good laboratory praxis.&lt;br /&gt;
&lt;br /&gt;
&#039;&#039;Double gloving&#039;&#039;&lt;br /&gt;
&lt;br /&gt;
Before starting to handle wafers, substrate holders or chemicals a second pair of nitrile gloves must be put on. &lt;br /&gt;
&lt;br /&gt;
&#039;&#039;Wafers&#039;&#039;&lt;br /&gt;
&lt;br /&gt;
Arsenic containing substrates must be handled using clean tweezers and kept in suitable wafer trays or boxes when taken out of the MBE lab. Wafer and sample storage outside of the cleanroom or MBE must be kept locked. &lt;br /&gt;
&lt;br /&gt;
Full wafers and ready cut pieces are generally safe to handle when As containing dust particles are not generated.&lt;br /&gt;
&lt;br /&gt;
When mounting and handling substrate holders the local point exhaust must be turned on and placed as close to the workplace as possible.&lt;br /&gt;
&lt;br /&gt;
&#039;&#039;Fumehood&#039;&#039;&lt;br /&gt;
&lt;br /&gt;
The fumehood must be used at all times when processing substrates (solvent cleaning, etching etch)&lt;br /&gt;
&lt;br /&gt;
&#039;&#039;Contaminated and solid waste&#039;&#039;&lt;br /&gt;
&lt;br /&gt;
All gloves, wipes, substrate pieces etc that are suspected to be contaminated or known to contain hazardous materials must be disposed of in the special risk waste bins.&lt;br /&gt;
&lt;br /&gt;
&#039;&#039;Chemicals&#039;&#039;&lt;br /&gt;
&lt;br /&gt;
Waste chemicals must be handled in a similar way as in the cleanroom using designated waste cans.&lt;br /&gt;
&lt;br /&gt;
== Logbook and system-traceability ==&lt;br /&gt;
&lt;br /&gt;
&lt;br /&gt;
As meticulous traceability is vital, all users must complete the MBE logs and store growth recipes on the dedicated data storage units. Further, a system for storing post-growth characterization data is under development (2018).&lt;br /&gt;
&lt;br /&gt;
# Growth recipes should be stored in the MBE Molly control system&lt;br /&gt;
# Each growth is entered in the dedicated excel sheet on the MBE PC and the sheet is stored in a designated Dropbox&lt;br /&gt;
&lt;br /&gt;
&lt;br /&gt;
== Materials ==&lt;br /&gt;
&lt;br /&gt;
&lt;br /&gt;
As MBE growth of semiconductors depends heavily on the cleanliness of the system, extreme caution must be paid to keeping the system clean. &lt;br /&gt;
&lt;br /&gt;
Only materials and cleaning procedures approved must be used on substrates that are intended for use in the MBE system.&lt;br /&gt;
&lt;br /&gt;
Prior to using any new materials or cleaning procedures on substrates these must be approved by the technical head.&lt;br /&gt;
&lt;br /&gt;
The following substrates are approved in an Epi ready state:&lt;br /&gt;
&lt;br /&gt;
GaAs, InAs, GaSb, InSb, InP and Si.&lt;br /&gt;
&lt;br /&gt;
All substrates much be acquired from an approved, well-known source in high quality.&lt;br /&gt;
&lt;br /&gt;
Processed substrates must be free of any organic contaminants and thoroughly cleaned by oxygen plasma ashing and HF dipping prior to loading. During degassing of processed substrates the massspectrum of the residual gasses must be observed both in the load lock and subsequent in the buffer chamber. If any sign of organic or other unwanted contaminants show up, degassing must be stopped immediately and the substrate unloaded.&lt;br /&gt;
&lt;br /&gt;
&lt;br /&gt;
&lt;br /&gt;
Substrates have a long lead-time so please pay attention to the stock and give a heads up in good time before stock becomes low.&lt;br /&gt;
&lt;br /&gt;
== Operating the system ==&lt;br /&gt;
&lt;br /&gt;
&lt;br /&gt;
Cleanliness and vacuum integrity are key parameters for growing clean epi layers and attention must be paid to this at all times. Do not rush a sample through but wait for the chambers to reach the threshold vacuum values before transfer between chambers.&lt;br /&gt;
&lt;br /&gt;
&lt;br /&gt;
== Service and maintenance ==&lt;br /&gt;
 &lt;br /&gt;
&lt;br /&gt;
The users are no allowed to perform any maintenance or service on the system unless approved by the technical head. &lt;br /&gt;
&lt;br /&gt;
The only chamber that users are allowed to vent is the Load lock chamber.&lt;br /&gt;
&lt;br /&gt;
&lt;br /&gt;
== Problems and incidents ==&lt;br /&gt;
&lt;br /&gt;
We encourage users to report all problems or incidents. Using a complex system like the MBE, will from time to time result in mistakes  and unintentional incidents. We all learn from this and the best way to keep the system in a good operational state is to ask for help when needed!&lt;br /&gt;
&lt;br /&gt;
Thus, should you experience any problems with the system, these must be reported to the technical head immediately.&lt;br /&gt;
&lt;br /&gt;
In case of incidents including dropped or &amp;quot;hanging&amp;quot; sample holders please do not attempt to fix this but try to leave the system in a best possible safe state and report to the technical head.&lt;br /&gt;
&lt;br /&gt;
Last revision: July 2018.&lt;br /&gt;
&lt;br /&gt;
[[Category:Tools]]&lt;br /&gt;
[[Category:Deposition]]&lt;/div&gt;</summary>
		<author><name>Nader</name></author>
	</entry>
	<entry>
		<id>https://wiki.nbi.ku.dk/w/cleanroom/index.php?title=MBE&amp;diff=2266</id>
		<title>MBE</title>
		<link rel="alternate" type="text/html" href="https://wiki.nbi.ku.dk/w/cleanroom/index.php?title=MBE&amp;diff=2266"/>
		<updated>2023-10-16T06:26:42Z</updated>

		<summary type="html">&lt;p&gt;Nader: /* Safety */&lt;/p&gt;
&lt;hr /&gt;
&lt;div&gt;{{Infobox tool&lt;br /&gt;
|image = Tool MBE.jpg&lt;br /&gt;
|toolfullname = Varian GEN II&lt;br /&gt;
|company = Custom&lt;br /&gt;
|description = Molecular beam epitaxy system&lt;br /&gt;
|location = MBE lab (03.2.213A, 03.2.217, 03.2.217A)&lt;br /&gt;
|primary = Claus&lt;br /&gt;
}}&lt;br /&gt;
== General information ==&lt;br /&gt;
&lt;br /&gt;
&lt;br /&gt;
The MBE system is a materials research and development facility located at HCØ, owned by NBI/KU.&lt;br /&gt;
 &lt;br /&gt;
Our MBE lab is located on the 2nd floor in rooms 3-2-213A, 3-2-217 and 3-2-217A.&lt;br /&gt;
&lt;br /&gt;
The system is a Varian GEN II with a 3&amp;quot; substrate capability. The III-V growth chamber has eight sources with the following materials.&lt;br /&gt;
&lt;br /&gt;
&lt;br /&gt;
{| style=&amp;quot;width: 85%;&amp;quot;&lt;br /&gt;
|- style=&amp;quot;text-align:left;&amp;quot;&lt;br /&gt;
! Group V !! Group III !! Dopants !! Other &lt;br /&gt;
|- valign=&amp;quot;top&amp;quot; &lt;br /&gt;
| style=&amp;quot;width: 20%;&amp;quot; |&lt;br /&gt;
As and Sb&lt;br /&gt;
&lt;br /&gt;
| style=&amp;quot;width: 20%;&amp;quot; |&lt;br /&gt;
Ga, Al and In&lt;br /&gt;
&lt;br /&gt;
| style=&amp;quot;width: 20%;&amp;quot; |&lt;br /&gt;
Si and Be&lt;br /&gt;
&lt;br /&gt;
| style=&amp;quot;width: 20%;&amp;quot; |&lt;br /&gt;
Au&lt;br /&gt;
&lt;br /&gt;
|}&lt;br /&gt;
&lt;br /&gt;
The system also has a UHV metallization chamber attached equipped with a 6-pocket e-gun and a RF sputter source.&lt;br /&gt;
&lt;br /&gt;
The principal investigator (PI) in charge of the NBI facility is Prof. [http://www.nbi.ku.dk/english/staff/?pure=en/persons/67039 Jesper Nygård]. &lt;br /&gt;
&lt;br /&gt;
[http://www.nbi.ku.dk/ansatte/?pure=da/persons/79214 Claus B. Sørensen] is technical head of the lab.&lt;br /&gt;
&lt;br /&gt;
== MBE activities meetings ==&lt;br /&gt;
MBE activities and changes of procedures are discussed at open group meetings (typically the weekly MBE/Materials subgroup meeting at QDev) where the technical head is often present.&lt;br /&gt;
&lt;br /&gt;
== Access to the system ==&lt;br /&gt;
&lt;br /&gt;
New users should be approved by the local management and must receive basic training by the technical head or a person appointed by the technical head before working on the system. Further, new users must have completed the cleanroom safety course before signing up for MBE training and  gaining access to the MBE lab. The number of persons trained and allowed to use the MBE is limited in nature due to the complexity of operation. &lt;br /&gt;
&lt;br /&gt;
Requests for cleanroom training must be mailed to [mailto:cleanroom@nbi.ku.dk cleanroom@nbi.ku.dk]&lt;br /&gt;
&lt;br /&gt;
== Training ==&lt;br /&gt;
&lt;br /&gt;
Requests for MBE training must be addressed to:&lt;br /&gt;
&lt;br /&gt;
Jesper Nygård: [mailto:nygard@nbi.ku.dk nygard@nbi.ku.dk]&lt;br /&gt;
&lt;br /&gt;
Martin Saurbrey Bjergfelt: [mailto:martin.bjergfelt@nbi.ku.dk martin.bjergfelt@nbi.ku.dk]&lt;br /&gt;
&lt;br /&gt;
== Access to room ==&lt;br /&gt;
&lt;br /&gt;
Following completion of cleanroom and MBE training, access to the lab is granted by mailing your KU access card number and your contact details (mobile phone number and email) to:&lt;br /&gt;
&lt;br /&gt;
Jesper Nygård: [mailto:nygard@nbi.ku.dk nygard@nbi.ku.dk]&lt;br /&gt;
&lt;br /&gt;
Martin Saurbrey Bjergfelt: [mailto:martin.bjergfelt@nbi.ku.dk martin.bjergfelt@nbi.ku.dk]&lt;br /&gt;
&lt;br /&gt;
== Scheduling-Booking the system ==&lt;br /&gt;
&lt;br /&gt;
All use of the system must be booked using the cleanroom [http://cleanroom.brickhost.com/ tool booking page].&lt;br /&gt;
&lt;br /&gt;
A system for handling project (alias) and planned growths (materials) may become effective in 2018 to facilitate planning and invoicing. &lt;br /&gt;
&lt;br /&gt;
== Cleanroom attire ==&lt;br /&gt;
&lt;br /&gt;
&#039;&#039;&#039;Entering the MBE lab.&#039;&#039;&#039; &lt;br /&gt;
&lt;br /&gt;
Please make sure that only one door in the airlock is open at a time to keep the room clean. The MBE room is an ISO 6/7 room and the prep-room is ISO 5/6.&lt;br /&gt;
&lt;br /&gt;
# &#039;&#039;&#039;Before&#039;&#039;&#039; entering the gowning area: &#039;&#039;wear clogs&#039;&#039;&lt;br /&gt;
# &#039;&#039;&#039;Inside&#039;&#039;&#039; the gowning area you must put on the following:&lt;br /&gt;
## &#039;&#039;A cleanroom lab gown or a full cleanroom suit &#039;&#039;&lt;br /&gt;
## &#039;&#039;Hairnet&#039;&#039;&lt;br /&gt;
## &#039;&#039;Beard cover (if applicable)&#039;&#039;&lt;br /&gt;
&lt;br /&gt;
&#039;&#039;&#039;Entering the preparation room&#039;&#039;&#039;&lt;br /&gt;
&lt;br /&gt;
&#039;&#039;&#039;Before&#039;&#039;&#039; entering the preparation room, you must additionally: &#039;&#039;put on nitrile gloves&#039;&#039;&lt;br /&gt;
&lt;br /&gt;
== Safety ==&lt;br /&gt;
&lt;br /&gt;
&lt;br /&gt;
&#039;&#039;&#039;Oxygen depletion hazard&#039;&#039;&#039;&lt;br /&gt;
&lt;br /&gt;
The MBE system is cooled by a closed loop liquid nitrogen system with a direct connection to the storage tank on the street. As nitrogen act as an asphyxiant, the oxygen level in the room is monitored to ensure that no risk of oxygen depletion can occur. &lt;br /&gt;
&lt;br /&gt;
Should the oxygen level drop below the alarm value, the alarm will sound and flash.&lt;br /&gt;
&lt;br /&gt;
You must evacuate the room immediately and notify Science Campus Service and one of the named staff members below.&lt;br /&gt;
&lt;br /&gt;
Ensure that no one enters the room, block access!&lt;br /&gt;
&lt;br /&gt;
If the alarm is active when you arrive, do not enter.&lt;br /&gt;
&lt;br /&gt;
If needed, an emergency self-contained breathing apparatus is available on the 2nd floor on the wall across from room 03-2-214&lt;br /&gt;
&lt;br /&gt;
&lt;br /&gt;
&#039;&#039;&#039;Fire alarm&#039;&#039;&#039;&lt;br /&gt;
&lt;br /&gt;
The MBE lab also has an early fire warning system if smoke is detected in the corridor on the second floor.&lt;br /&gt;
&lt;br /&gt;
Should smoke be detected in the corridor, the alarm will sound and flash.&lt;br /&gt;
&lt;br /&gt;
You must evacuate the room immediately and notify Science Campus Service and one of the named staff members below.&lt;br /&gt;
&lt;br /&gt;
&lt;br /&gt;
{| style=&amp;quot;width: 85%;&amp;quot;&lt;br /&gt;
|- style=&amp;quot;text-align:left;&amp;quot;&lt;br /&gt;
! Claus B. Sørensen !! Nader Payami !! Science Campus Service helpdesk &lt;br /&gt;
|- valign=&amp;quot;top&amp;quot; &lt;br /&gt;
| style=&amp;quot;width: 20%;&amp;quot; |&lt;br /&gt;
Phone: 2875 0449&lt;br /&gt;
&lt;br /&gt;
Mail:  [mailto:cbs@nbi.ku.dk cbs@nbi.ku.dk]&lt;br /&gt;
&lt;br /&gt;
| style=&amp;quot;width: 20%;&amp;quot; |&lt;br /&gt;
Phone: 2875 0450&lt;br /&gt;
&lt;br /&gt;
Mail: [mailto:martin.bjergfelt@nbi.ku.dk martin.bjergfelt@nbi.ku.dk] &lt;br /&gt;
| style=&amp;quot;width: 20%;&amp;quot; |&lt;br /&gt;
Phone: 3533 1333&lt;br /&gt;
&lt;br /&gt;
Mail: [mailto:scshelpdesk@science.ku.dk scshelpdesk@science.ku.dk]&lt;br /&gt;
|}&lt;br /&gt;
&lt;br /&gt;
== Chemical and materials safety ==&lt;br /&gt;
&lt;br /&gt;
All safety procedures in the cleanroom also applies in the MBE-lab. It is mandatory for users to familiarize themselves with the Materials Safety Data Sheets (MSDS) and observe good laboratory praxis.&lt;br /&gt;
&lt;br /&gt;
&#039;&#039;Double gloving&#039;&#039;&lt;br /&gt;
&lt;br /&gt;
Before starting to handle wafers, substrate holders or chemicals a second pair of nitrile gloves must be put on. &lt;br /&gt;
&lt;br /&gt;
&#039;&#039;Wafers&#039;&#039;&lt;br /&gt;
&lt;br /&gt;
Arsenic containing substrates must be handled using clean tweezers and kept in suitable wafer trays or boxes when taken out of the MBE lab. Wafer and sample storage outside of the cleanroom or MBE must be kept locked. &lt;br /&gt;
&lt;br /&gt;
Full wafers and ready cut pieces are generally safe to handle when As containing dust particles are not generated.&lt;br /&gt;
&lt;br /&gt;
When mounting and handling substrate holders the local point exhaust must be turned on and placed as close to the workplace as possible.&lt;br /&gt;
&lt;br /&gt;
&#039;&#039;Fumehood&#039;&#039;&lt;br /&gt;
&lt;br /&gt;
The fumehood must be used at all times when processing substrates (solvent cleaning, etching etch)&lt;br /&gt;
&lt;br /&gt;
&#039;&#039;Contaminated and solid waste&#039;&#039;&lt;br /&gt;
&lt;br /&gt;
All gloves, wipes, substrate pieces etc that are suspected to be contaminated or known to contain hazardous materials must be disposed of in the special risk waste bins.&lt;br /&gt;
&lt;br /&gt;
&#039;&#039;Chemicals&#039;&#039;&lt;br /&gt;
&lt;br /&gt;
Waste chemicals must be handled in a similar way as in the cleanroom using designated waste cans.&lt;br /&gt;
&lt;br /&gt;
== Logbook and system-traceability ==&lt;br /&gt;
&lt;br /&gt;
&lt;br /&gt;
As meticulous traceability is vital, all users must complete the MBE logs and store growth recipes on the dedicated data storage units. Further, a system for storing post-growth characterization data is under development (2018).&lt;br /&gt;
&lt;br /&gt;
# Growth recipes should be stored in the MBE Molly control system&lt;br /&gt;
# Each growth is entered in the dedicated excel sheet on the MBE PC and the sheet is stored in a designated Dropbox&lt;br /&gt;
&lt;br /&gt;
&lt;br /&gt;
== Materials ==&lt;br /&gt;
&lt;br /&gt;
&lt;br /&gt;
As MBE growth of semiconductors depends heavily on the cleanliness of the system, extreme caution must be paid to keeping the system clean. &lt;br /&gt;
&lt;br /&gt;
Only materials and cleaning procedures approved must be used on substrates that are intended for use in the MBE system.&lt;br /&gt;
&lt;br /&gt;
Prior to using any new materials or cleaning procedures on substrates these must be approved by the technical head.&lt;br /&gt;
&lt;br /&gt;
The following substrates are approved in an Epi ready state:&lt;br /&gt;
&lt;br /&gt;
GaAs, InAs, GaSb, InSb, InP and Si.&lt;br /&gt;
&lt;br /&gt;
All substrates much be acquired from an approved, well-known source in high quality.&lt;br /&gt;
&lt;br /&gt;
Processed substrates must be free of any organic contaminants and thoroughly cleaned by oxygen plasma ashing and HF dipping prior to loading. During degassing of processed substrates the massspectrum of the residual gasses must be observed both in the load lock and subsequent in the buffer chamber. If any sign of organic or other unwanted contaminants show up, degassing must be stopped immediately and the substrate unloaded.&lt;br /&gt;
&lt;br /&gt;
&lt;br /&gt;
&lt;br /&gt;
Substrates have a long lead-time so please pay attention to the stock and give a heads up in good time before stock becomes low.&lt;br /&gt;
&lt;br /&gt;
== Operating the system ==&lt;br /&gt;
&lt;br /&gt;
&lt;br /&gt;
Cleanliness and vacuum integrity are key parameters for growing clean epi layers and attention must be paid to this at all times. Do not rush a sample through but wait for the chambers to reach the threshold vacuum values before transfer between chambers.&lt;br /&gt;
&lt;br /&gt;
&lt;br /&gt;
== Service and maintenance ==&lt;br /&gt;
 &lt;br /&gt;
&lt;br /&gt;
The users are no allowed to perform any maintenance or service on the system unless approved by the technical head. &lt;br /&gt;
&lt;br /&gt;
The only chamber that users are allowed to vent is the Load lock chamber.&lt;br /&gt;
&lt;br /&gt;
&lt;br /&gt;
== Problems and incidents ==&lt;br /&gt;
&lt;br /&gt;
We encourage users to report all problems or incidents. Using a complex system like the MBE, will from time to time result in mistakes  and unintentional incidents. We all learn from this and the best way to keep the system in a good operational state is to ask for help when needed!&lt;br /&gt;
&lt;br /&gt;
Thus, should you experience any problems with the system, these must be reported to the technical head immediately.&lt;br /&gt;
&lt;br /&gt;
In case of incidents including dropped or &amp;quot;hanging&amp;quot; sample holders please do not attempt to fix this but try to leave the system in a best possible safe state and report to the technical head.&lt;br /&gt;
&lt;br /&gt;
Last revision: July 2018.&lt;br /&gt;
&lt;br /&gt;
[[Category:Tools]]&lt;br /&gt;
[[Category:Deposition]]&lt;/div&gt;</summary>
		<author><name>Nader</name></author>
	</entry>
	<entry>
		<id>https://wiki.nbi.ku.dk/w/cleanroom/index.php?title=MBE&amp;diff=2265</id>
		<title>MBE</title>
		<link rel="alternate" type="text/html" href="https://wiki.nbi.ku.dk/w/cleanroom/index.php?title=MBE&amp;diff=2265"/>
		<updated>2023-10-16T06:19:27Z</updated>

		<summary type="html">&lt;p&gt;Nader: /* Cleanroom attire */&lt;/p&gt;
&lt;hr /&gt;
&lt;div&gt;{{Infobox tool&lt;br /&gt;
|image = Tool MBE.jpg&lt;br /&gt;
|toolfullname = Varian GEN II&lt;br /&gt;
|company = Custom&lt;br /&gt;
|description = Molecular beam epitaxy system&lt;br /&gt;
|location = MBE lab (03.2.213A, 03.2.217, 03.2.217A)&lt;br /&gt;
|primary = Claus&lt;br /&gt;
}}&lt;br /&gt;
== General information ==&lt;br /&gt;
&lt;br /&gt;
&lt;br /&gt;
The MBE system is a materials research and development facility located at HCØ, owned by NBI/KU.&lt;br /&gt;
 &lt;br /&gt;
Our MBE lab is located on the 2nd floor in rooms 3-2-213A, 3-2-217 and 3-2-217A.&lt;br /&gt;
&lt;br /&gt;
The system is a Varian GEN II with a 3&amp;quot; substrate capability. The III-V growth chamber has eight sources with the following materials.&lt;br /&gt;
&lt;br /&gt;
&lt;br /&gt;
{| style=&amp;quot;width: 85%;&amp;quot;&lt;br /&gt;
|- style=&amp;quot;text-align:left;&amp;quot;&lt;br /&gt;
! Group V !! Group III !! Dopants !! Other &lt;br /&gt;
|- valign=&amp;quot;top&amp;quot; &lt;br /&gt;
| style=&amp;quot;width: 20%;&amp;quot; |&lt;br /&gt;
As and Sb&lt;br /&gt;
&lt;br /&gt;
| style=&amp;quot;width: 20%;&amp;quot; |&lt;br /&gt;
Ga, Al and In&lt;br /&gt;
&lt;br /&gt;
| style=&amp;quot;width: 20%;&amp;quot; |&lt;br /&gt;
Si and Be&lt;br /&gt;
&lt;br /&gt;
| style=&amp;quot;width: 20%;&amp;quot; |&lt;br /&gt;
Au&lt;br /&gt;
&lt;br /&gt;
|}&lt;br /&gt;
&lt;br /&gt;
The system also has a UHV metallization chamber attached equipped with a 6-pocket e-gun and a RF sputter source.&lt;br /&gt;
&lt;br /&gt;
The principal investigator (PI) in charge of the NBI facility is Prof. [http://www.nbi.ku.dk/english/staff/?pure=en/persons/67039 Jesper Nygård]. &lt;br /&gt;
&lt;br /&gt;
[http://www.nbi.ku.dk/ansatte/?pure=da/persons/79214 Claus B. Sørensen] is technical head of the lab.&lt;br /&gt;
&lt;br /&gt;
== MBE activities meetings ==&lt;br /&gt;
MBE activities and changes of procedures are discussed at open group meetings (typically the weekly MBE/Materials subgroup meeting at QDev) where the technical head is often present.&lt;br /&gt;
&lt;br /&gt;
== Access to the system ==&lt;br /&gt;
&lt;br /&gt;
New users should be approved by the local management and must receive basic training by the technical head or a person appointed by the technical head before working on the system. Further, new users must have completed the cleanroom safety course before signing up for MBE training and  gaining access to the MBE lab. The number of persons trained and allowed to use the MBE is limited in nature due to the complexity of operation. &lt;br /&gt;
&lt;br /&gt;
Requests for cleanroom training must be mailed to [mailto:cleanroom@nbi.ku.dk cleanroom@nbi.ku.dk]&lt;br /&gt;
&lt;br /&gt;
== Training ==&lt;br /&gt;
&lt;br /&gt;
Requests for MBE training must be addressed to:&lt;br /&gt;
&lt;br /&gt;
Jesper Nygård: [mailto:nygard@nbi.ku.dk nygard@nbi.ku.dk]&lt;br /&gt;
&lt;br /&gt;
Martin Saurbrey Bjergfelt: [mailto:martin.bjergfelt@nbi.ku.dk martin.bjergfelt@nbi.ku.dk]&lt;br /&gt;
&lt;br /&gt;
== Access to room ==&lt;br /&gt;
&lt;br /&gt;
Following completion of cleanroom and MBE training, access to the lab is granted by mailing your KU access card number and your contact details (mobile phone number and email) to:&lt;br /&gt;
&lt;br /&gt;
Jesper Nygård: [mailto:nygard@nbi.ku.dk nygard@nbi.ku.dk]&lt;br /&gt;
&lt;br /&gt;
Martin Saurbrey Bjergfelt: [mailto:martin.bjergfelt@nbi.ku.dk martin.bjergfelt@nbi.ku.dk]&lt;br /&gt;
&lt;br /&gt;
== Scheduling-Booking the system ==&lt;br /&gt;
&lt;br /&gt;
All use of the system must be booked using the cleanroom [http://cleanroom.brickhost.com/ tool booking page].&lt;br /&gt;
&lt;br /&gt;
A system for handling project (alias) and planned growths (materials) may become effective in 2018 to facilitate planning and invoicing. &lt;br /&gt;
&lt;br /&gt;
== Cleanroom attire ==&lt;br /&gt;
&lt;br /&gt;
&#039;&#039;&#039;Entering the MBE lab.&#039;&#039;&#039; &lt;br /&gt;
&lt;br /&gt;
Please make sure that only one door in the airlock is open at a time to keep the room clean. The MBE room is an ISO 6/7 room and the prep-room is ISO 5/6.&lt;br /&gt;
&lt;br /&gt;
# &#039;&#039;&#039;Before&#039;&#039;&#039; entering the gowning area: &#039;&#039;wear clogs&#039;&#039;&lt;br /&gt;
# &#039;&#039;&#039;Inside&#039;&#039;&#039; the gowning area you must put on the following:&lt;br /&gt;
## &#039;&#039;A cleanroom lab gown or a full cleanroom suit &#039;&#039;&lt;br /&gt;
## &#039;&#039;Hairnet&#039;&#039;&lt;br /&gt;
## &#039;&#039;Beard cover (if applicable)&#039;&#039;&lt;br /&gt;
&lt;br /&gt;
&#039;&#039;&#039;Entering the preparation room&#039;&#039;&#039;&lt;br /&gt;
&lt;br /&gt;
&#039;&#039;&#039;Before&#039;&#039;&#039; entering the preparation room, you must additionally: &#039;&#039;put on nitrile gloves&#039;&#039;&lt;br /&gt;
&lt;br /&gt;
== Safety ==&lt;br /&gt;
&lt;br /&gt;
&lt;br /&gt;
&#039;&#039;&#039;Oxygen depletion hazard&#039;&#039;&#039;&lt;br /&gt;
&lt;br /&gt;
The MBE system is cooled by a closed loop liquid nitrogen system with a direct connection to the storage tank on the street. As nitrogen act as an asphyxiant, the oxygen level in the room is monitored to ensure that no risk of oxygen depletion can occur. &lt;br /&gt;
&lt;br /&gt;
Should the oxygen level drop below the alarm value, the alarm will sound and flash.&lt;br /&gt;
&lt;br /&gt;
You must evacuate the room immediately and notify Science Campus Service and one of the named staff members below.&lt;br /&gt;
&lt;br /&gt;
Ensure that no one enters the room, block access!&lt;br /&gt;
&lt;br /&gt;
If the alarm is active when you arrive, do not enter.&lt;br /&gt;
&lt;br /&gt;
If needed, an emergency self-contained breathing apparatus is available on the 2nd floor on the wall across from room 03-2-214&lt;br /&gt;
&lt;br /&gt;
&lt;br /&gt;
&#039;&#039;&#039;Fire alarm&#039;&#039;&#039;&lt;br /&gt;
&lt;br /&gt;
The MBE lab also has an early fire warning system if smoke is detected in the corridor on the second floor.&lt;br /&gt;
&lt;br /&gt;
Should smoke be detected in the corridor, the alarm will sound and flash.&lt;br /&gt;
&lt;br /&gt;
You must evacuate the room immediately and notify Science Campus Service and one of the named staff members below.&lt;br /&gt;
&lt;br /&gt;
&lt;br /&gt;
{| style=&amp;quot;width: 85%;&amp;quot;&lt;br /&gt;
|- style=&amp;quot;text-align:left;&amp;quot;&lt;br /&gt;
! Claus B. Sørensen !! Nader Payami !! Science Campus Service helpdesk &lt;br /&gt;
|- valign=&amp;quot;top&amp;quot; &lt;br /&gt;
| style=&amp;quot;width: 20%;&amp;quot; |&lt;br /&gt;
Phone: 2875 0449&lt;br /&gt;
&lt;br /&gt;
Mail:  [mailto:cbs@nbi.ku.dk cbs@nbi.ku.dk]&lt;br /&gt;
&lt;br /&gt;
| style=&amp;quot;width: 20%;&amp;quot; |&lt;br /&gt;
Phone: 2875 0450&lt;br /&gt;
&lt;br /&gt;
Mail: [mailto:nap@nbi.ku.dk nap@nbi.ku.dk] &lt;br /&gt;
| style=&amp;quot;width: 20%;&amp;quot; |&lt;br /&gt;
Phone: 3533 1333&lt;br /&gt;
&lt;br /&gt;
Mail: [mailto:scshelpdesk@science.ku.dk scshelpdesk@science.ku.dk]&lt;br /&gt;
|}&lt;br /&gt;
&lt;br /&gt;
== Chemical and materials safety ==&lt;br /&gt;
&lt;br /&gt;
All safety procedures in the cleanroom also applies in the MBE-lab. It is mandatory for users to familiarize themselves with the Materials Safety Data Sheets (MSDS) and observe good laboratory praxis.&lt;br /&gt;
&lt;br /&gt;
&#039;&#039;Double gloving&#039;&#039;&lt;br /&gt;
&lt;br /&gt;
Before starting to handle wafers, substrate holders or chemicals a second pair of nitrile gloves must be put on. &lt;br /&gt;
&lt;br /&gt;
&#039;&#039;Wafers&#039;&#039;&lt;br /&gt;
&lt;br /&gt;
Arsenic containing substrates must be handled using clean tweezers and kept in suitable wafer trays or boxes when taken out of the MBE lab. Wafer and sample storage outside of the cleanroom or MBE must be kept locked. &lt;br /&gt;
&lt;br /&gt;
Full wafers and ready cut pieces are generally safe to handle when As containing dust particles are not generated.&lt;br /&gt;
&lt;br /&gt;
When mounting and handling substrate holders the local point exhaust must be turned on and placed as close to the workplace as possible.&lt;br /&gt;
&lt;br /&gt;
&#039;&#039;Fumehood&#039;&#039;&lt;br /&gt;
&lt;br /&gt;
The fumehood must be used at all times when processing substrates (solvent cleaning, etching etch)&lt;br /&gt;
&lt;br /&gt;
&#039;&#039;Contaminated and solid waste&#039;&#039;&lt;br /&gt;
&lt;br /&gt;
All gloves, wipes, substrate pieces etc that are suspected to be contaminated or known to contain hazardous materials must be disposed of in the special risk waste bins.&lt;br /&gt;
&lt;br /&gt;
&#039;&#039;Chemicals&#039;&#039;&lt;br /&gt;
&lt;br /&gt;
Waste chemicals must be handled in a similar way as in the cleanroom using designated waste cans.&lt;br /&gt;
&lt;br /&gt;
== Logbook and system-traceability ==&lt;br /&gt;
&lt;br /&gt;
&lt;br /&gt;
As meticulous traceability is vital, all users must complete the MBE logs and store growth recipes on the dedicated data storage units. Further, a system for storing post-growth characterization data is under development (2018).&lt;br /&gt;
&lt;br /&gt;
# Growth recipes should be stored in the MBE Molly control system&lt;br /&gt;
# Each growth is entered in the dedicated excel sheet on the MBE PC and the sheet is stored in a designated Dropbox&lt;br /&gt;
&lt;br /&gt;
&lt;br /&gt;
== Materials ==&lt;br /&gt;
&lt;br /&gt;
&lt;br /&gt;
As MBE growth of semiconductors depends heavily on the cleanliness of the system, extreme caution must be paid to keeping the system clean. &lt;br /&gt;
&lt;br /&gt;
Only materials and cleaning procedures approved must be used on substrates that are intended for use in the MBE system.&lt;br /&gt;
&lt;br /&gt;
Prior to using any new materials or cleaning procedures on substrates these must be approved by the technical head.&lt;br /&gt;
&lt;br /&gt;
The following substrates are approved in an Epi ready state:&lt;br /&gt;
&lt;br /&gt;
GaAs, InAs, GaSb, InSb, InP and Si.&lt;br /&gt;
&lt;br /&gt;
All substrates much be acquired from an approved, well-known source in high quality.&lt;br /&gt;
&lt;br /&gt;
Processed substrates must be free of any organic contaminants and thoroughly cleaned by oxygen plasma ashing and HF dipping prior to loading. During degassing of processed substrates the massspectrum of the residual gasses must be observed both in the load lock and subsequent in the buffer chamber. If any sign of organic or other unwanted contaminants show up, degassing must be stopped immediately and the substrate unloaded.&lt;br /&gt;
&lt;br /&gt;
&lt;br /&gt;
&lt;br /&gt;
Substrates have a long lead-time so please pay attention to the stock and give a heads up in good time before stock becomes low.&lt;br /&gt;
&lt;br /&gt;
== Operating the system ==&lt;br /&gt;
&lt;br /&gt;
&lt;br /&gt;
Cleanliness and vacuum integrity are key parameters for growing clean epi layers and attention must be paid to this at all times. Do not rush a sample through but wait for the chambers to reach the threshold vacuum values before transfer between chambers.&lt;br /&gt;
&lt;br /&gt;
&lt;br /&gt;
== Service and maintenance ==&lt;br /&gt;
 &lt;br /&gt;
&lt;br /&gt;
The users are no allowed to perform any maintenance or service on the system unless approved by the technical head. &lt;br /&gt;
&lt;br /&gt;
The only chamber that users are allowed to vent is the Load lock chamber.&lt;br /&gt;
&lt;br /&gt;
&lt;br /&gt;
== Problems and incidents ==&lt;br /&gt;
&lt;br /&gt;
We encourage users to report all problems or incidents. Using a complex system like the MBE, will from time to time result in mistakes  and unintentional incidents. We all learn from this and the best way to keep the system in a good operational state is to ask for help when needed!&lt;br /&gt;
&lt;br /&gt;
Thus, should you experience any problems with the system, these must be reported to the technical head immediately.&lt;br /&gt;
&lt;br /&gt;
In case of incidents including dropped or &amp;quot;hanging&amp;quot; sample holders please do not attempt to fix this but try to leave the system in a best possible safe state and report to the technical head.&lt;br /&gt;
&lt;br /&gt;
Last revision: July 2018.&lt;br /&gt;
&lt;br /&gt;
[[Category:Tools]]&lt;br /&gt;
[[Category:Deposition]]&lt;/div&gt;</summary>
		<author><name>Nader</name></author>
	</entry>
	<entry>
		<id>https://wiki.nbi.ku.dk/w/cleanroom/index.php?title=MBE&amp;diff=2264</id>
		<title>MBE</title>
		<link rel="alternate" type="text/html" href="https://wiki.nbi.ku.dk/w/cleanroom/index.php?title=MBE&amp;diff=2264"/>
		<updated>2023-10-16T06:16:47Z</updated>

		<summary type="html">&lt;p&gt;Nader: /* Access to room */&lt;/p&gt;
&lt;hr /&gt;
&lt;div&gt;{{Infobox tool&lt;br /&gt;
|image = Tool MBE.jpg&lt;br /&gt;
|toolfullname = Varian GEN II&lt;br /&gt;
|company = Custom&lt;br /&gt;
|description = Molecular beam epitaxy system&lt;br /&gt;
|location = MBE lab (03.2.213A, 03.2.217, 03.2.217A)&lt;br /&gt;
|primary = Claus&lt;br /&gt;
}}&lt;br /&gt;
== General information ==&lt;br /&gt;
&lt;br /&gt;
&lt;br /&gt;
The MBE system is a materials research and development facility located at HCØ, owned by NBI/KU.&lt;br /&gt;
 &lt;br /&gt;
Our MBE lab is located on the 2nd floor in rooms 3-2-213A, 3-2-217 and 3-2-217A.&lt;br /&gt;
&lt;br /&gt;
The system is a Varian GEN II with a 3&amp;quot; substrate capability. The III-V growth chamber has eight sources with the following materials.&lt;br /&gt;
&lt;br /&gt;
&lt;br /&gt;
{| style=&amp;quot;width: 85%;&amp;quot;&lt;br /&gt;
|- style=&amp;quot;text-align:left;&amp;quot;&lt;br /&gt;
! Group V !! Group III !! Dopants !! Other &lt;br /&gt;
|- valign=&amp;quot;top&amp;quot; &lt;br /&gt;
| style=&amp;quot;width: 20%;&amp;quot; |&lt;br /&gt;
As and Sb&lt;br /&gt;
&lt;br /&gt;
| style=&amp;quot;width: 20%;&amp;quot; |&lt;br /&gt;
Ga, Al and In&lt;br /&gt;
&lt;br /&gt;
| style=&amp;quot;width: 20%;&amp;quot; |&lt;br /&gt;
Si and Be&lt;br /&gt;
&lt;br /&gt;
| style=&amp;quot;width: 20%;&amp;quot; |&lt;br /&gt;
Au&lt;br /&gt;
&lt;br /&gt;
|}&lt;br /&gt;
&lt;br /&gt;
The system also has a UHV metallization chamber attached equipped with a 6-pocket e-gun and a RF sputter source.&lt;br /&gt;
&lt;br /&gt;
The principal investigator (PI) in charge of the NBI facility is Prof. [http://www.nbi.ku.dk/english/staff/?pure=en/persons/67039 Jesper Nygård]. &lt;br /&gt;
&lt;br /&gt;
[http://www.nbi.ku.dk/ansatte/?pure=da/persons/79214 Claus B. Sørensen] is technical head of the lab.&lt;br /&gt;
&lt;br /&gt;
== MBE activities meetings ==&lt;br /&gt;
MBE activities and changes of procedures are discussed at open group meetings (typically the weekly MBE/Materials subgroup meeting at QDev) where the technical head is often present.&lt;br /&gt;
&lt;br /&gt;
== Access to the system ==&lt;br /&gt;
&lt;br /&gt;
New users should be approved by the local management and must receive basic training by the technical head or a person appointed by the technical head before working on the system. Further, new users must have completed the cleanroom safety course before signing up for MBE training and  gaining access to the MBE lab. The number of persons trained and allowed to use the MBE is limited in nature due to the complexity of operation. &lt;br /&gt;
&lt;br /&gt;
Requests for cleanroom training must be mailed to [mailto:cleanroom@nbi.ku.dk cleanroom@nbi.ku.dk]&lt;br /&gt;
&lt;br /&gt;
== Training ==&lt;br /&gt;
&lt;br /&gt;
Requests for MBE training must be addressed to:&lt;br /&gt;
&lt;br /&gt;
Jesper Nygård: [mailto:nygard@nbi.ku.dk nygard@nbi.ku.dk]&lt;br /&gt;
&lt;br /&gt;
Martin Saurbrey Bjergfelt: [mailto:martin.bjergfelt@nbi.ku.dk martin.bjergfelt@nbi.ku.dk]&lt;br /&gt;
&lt;br /&gt;
== Access to room ==&lt;br /&gt;
&lt;br /&gt;
Following completion of cleanroom and MBE training, access to the lab is granted by mailing your KU access card number and your contact details (mobile phone number and email) to:&lt;br /&gt;
&lt;br /&gt;
Jesper Nygård: [mailto:nygard@nbi.ku.dk nygard@nbi.ku.dk]&lt;br /&gt;
&lt;br /&gt;
Martin Saurbrey Bjergfelt: [mailto:martin.bjergfelt@nbi.ku.dk martin.bjergfelt@nbi.ku.dk]&lt;br /&gt;
&lt;br /&gt;
== Scheduling-Booking the system ==&lt;br /&gt;
&lt;br /&gt;
All use of the system must be booked using the cleanroom [http://cleanroom.brickhost.com/ tool booking page].&lt;br /&gt;
&lt;br /&gt;
A system for handling project (alias) and planned growths (materials) may become effective in 2018 to facilitate planning and invoicing. &lt;br /&gt;
&lt;br /&gt;
== Cleanroom attire ==&lt;br /&gt;
&lt;br /&gt;
&#039;&#039;&#039;Entering the MBE lab.&#039;&#039;&#039; &lt;br /&gt;
&lt;br /&gt;
Please make sure that only one door in the air lock is open at a time to keep the room clean. The MBE room is an ISO 6/7 room and the prep-room is ISO 5/6.&lt;br /&gt;
&lt;br /&gt;
# &#039;&#039;&#039;Before&#039;&#039;&#039; entering the gowning area: &#039;&#039;put on shoe covers&#039;&#039;&lt;br /&gt;
# &#039;&#039;&#039;Inside&#039;&#039;&#039; the gowning area you must put on the following:&lt;br /&gt;
## &#039;&#039;A cleanroom lab gown or a full cleanroom suit &#039;&#039;&lt;br /&gt;
## &#039;&#039;Hairnet&#039;&#039;&lt;br /&gt;
## &#039;&#039;Beard cover (if applicable)&#039;&#039;&lt;br /&gt;
&lt;br /&gt;
&#039;&#039;&#039;Entering the preparation room&#039;&#039;&#039;&lt;br /&gt;
&lt;br /&gt;
&#039;&#039;&#039;Before&#039;&#039;&#039; entering the preparation room, you must additionally: &#039;&#039;put on nitrile gloves&#039;&#039;&lt;br /&gt;
&lt;br /&gt;
== Safety ==&lt;br /&gt;
&lt;br /&gt;
&lt;br /&gt;
&#039;&#039;&#039;Oxygen depletion hazard&#039;&#039;&#039;&lt;br /&gt;
&lt;br /&gt;
The MBE system is cooled by a closed loop liquid nitrogen system with a direct connection to the storage tank on the street. As nitrogen act as an asphyxiant, the oxygen level in the room is monitored to ensure that no risk of oxygen depletion can occur. &lt;br /&gt;
&lt;br /&gt;
Should the oxygen level drop below the alarm value, the alarm will sound and flash.&lt;br /&gt;
&lt;br /&gt;
You must evacuate the room immediately and notify Science Campus Service and one of the named staff members below.&lt;br /&gt;
&lt;br /&gt;
Ensure that no one enters the room, block access!&lt;br /&gt;
&lt;br /&gt;
If the alarm is active when you arrive, do not enter.&lt;br /&gt;
&lt;br /&gt;
If needed, an emergency self-contained breathing apparatus is available on the 2nd floor on the wall across from room 03-2-214&lt;br /&gt;
&lt;br /&gt;
&lt;br /&gt;
&#039;&#039;&#039;Fire alarm&#039;&#039;&#039;&lt;br /&gt;
&lt;br /&gt;
The MBE lab also has an early fire warning system if smoke is detected in the corridor on the second floor.&lt;br /&gt;
&lt;br /&gt;
Should smoke be detected in the corridor, the alarm will sound and flash.&lt;br /&gt;
&lt;br /&gt;
You must evacuate the room immediately and notify Science Campus Service and one of the named staff members below.&lt;br /&gt;
&lt;br /&gt;
&lt;br /&gt;
{| style=&amp;quot;width: 85%;&amp;quot;&lt;br /&gt;
|- style=&amp;quot;text-align:left;&amp;quot;&lt;br /&gt;
! Claus B. Sørensen !! Nader Payami !! Science Campus Service helpdesk &lt;br /&gt;
|- valign=&amp;quot;top&amp;quot; &lt;br /&gt;
| style=&amp;quot;width: 20%;&amp;quot; |&lt;br /&gt;
Phone: 2875 0449&lt;br /&gt;
&lt;br /&gt;
Mail:  [mailto:cbs@nbi.ku.dk cbs@nbi.ku.dk]&lt;br /&gt;
&lt;br /&gt;
| style=&amp;quot;width: 20%;&amp;quot; |&lt;br /&gt;
Phone: 2875 0450&lt;br /&gt;
&lt;br /&gt;
Mail: [mailto:nap@nbi.ku.dk nap@nbi.ku.dk] &lt;br /&gt;
| style=&amp;quot;width: 20%;&amp;quot; |&lt;br /&gt;
Phone: 3533 1333&lt;br /&gt;
&lt;br /&gt;
Mail: [mailto:scshelpdesk@science.ku.dk scshelpdesk@science.ku.dk]&lt;br /&gt;
|}&lt;br /&gt;
&lt;br /&gt;
== Chemical and materials safety ==&lt;br /&gt;
&lt;br /&gt;
All safety procedures in the cleanroom also applies in the MBE-lab. It is mandatory for users to familiarize themselves with the Materials Safety Data Sheets (MSDS) and observe good laboratory praxis.&lt;br /&gt;
&lt;br /&gt;
&#039;&#039;Double gloving&#039;&#039;&lt;br /&gt;
&lt;br /&gt;
Before starting to handle wafers, substrate holders or chemicals a second pair of nitrile gloves must be put on. &lt;br /&gt;
&lt;br /&gt;
&#039;&#039;Wafers&#039;&#039;&lt;br /&gt;
&lt;br /&gt;
Arsenic containing substrates must be handled using clean tweezers and kept in suitable wafer trays or boxes when taken out of the MBE lab. Wafer and sample storage outside of the cleanroom or MBE must be kept locked. &lt;br /&gt;
&lt;br /&gt;
Full wafers and ready cut pieces are generally safe to handle when As containing dust particles are not generated.&lt;br /&gt;
&lt;br /&gt;
When mounting and handling substrate holders the local point exhaust must be turned on and placed as close to the workplace as possible.&lt;br /&gt;
&lt;br /&gt;
&#039;&#039;Fumehood&#039;&#039;&lt;br /&gt;
&lt;br /&gt;
The fumehood must be used at all times when processing substrates (solvent cleaning, etching etch)&lt;br /&gt;
&lt;br /&gt;
&#039;&#039;Contaminated and solid waste&#039;&#039;&lt;br /&gt;
&lt;br /&gt;
All gloves, wipes, substrate pieces etc that are suspected to be contaminated or known to contain hazardous materials must be disposed of in the special risk waste bins.&lt;br /&gt;
&lt;br /&gt;
&#039;&#039;Chemicals&#039;&#039;&lt;br /&gt;
&lt;br /&gt;
Waste chemicals must be handled in a similar way as in the cleanroom using designated waste cans.&lt;br /&gt;
&lt;br /&gt;
== Logbook and system-traceability ==&lt;br /&gt;
&lt;br /&gt;
&lt;br /&gt;
As meticulous traceability is vital, all users must complete the MBE logs and store growth recipes on the dedicated data storage units. Further, a system for storing post-growth characterization data is under development (2018).&lt;br /&gt;
&lt;br /&gt;
# Growth recipes should be stored in the MBE Molly control system&lt;br /&gt;
# Each growth is entered in the dedicated excel sheet on the MBE PC and the sheet is stored in a designated Dropbox&lt;br /&gt;
&lt;br /&gt;
&lt;br /&gt;
== Materials ==&lt;br /&gt;
&lt;br /&gt;
&lt;br /&gt;
As MBE growth of semiconductors depends heavily on the cleanliness of the system, extreme caution must be paid to keeping the system clean. &lt;br /&gt;
&lt;br /&gt;
Only materials and cleaning procedures approved must be used on substrates that are intended for use in the MBE system.&lt;br /&gt;
&lt;br /&gt;
Prior to using any new materials or cleaning procedures on substrates these must be approved by the technical head.&lt;br /&gt;
&lt;br /&gt;
The following substrates are approved in an Epi ready state:&lt;br /&gt;
&lt;br /&gt;
GaAs, InAs, GaSb, InSb, InP and Si.&lt;br /&gt;
&lt;br /&gt;
All substrates much be acquired from an approved, well-known source in high quality.&lt;br /&gt;
&lt;br /&gt;
Processed substrates must be free of any organic contaminants and thoroughly cleaned by oxygen plasma ashing and HF dipping prior to loading. During degassing of processed substrates the massspectrum of the residual gasses must be observed both in the load lock and subsequent in the buffer chamber. If any sign of organic or other unwanted contaminants show up, degassing must be stopped immediately and the substrate unloaded.&lt;br /&gt;
&lt;br /&gt;
&lt;br /&gt;
&lt;br /&gt;
Substrates have a long lead-time so please pay attention to the stock and give a heads up in good time before stock becomes low.&lt;br /&gt;
&lt;br /&gt;
== Operating the system ==&lt;br /&gt;
&lt;br /&gt;
&lt;br /&gt;
Cleanliness and vacuum integrity are key parameters for growing clean epi layers and attention must be paid to this at all times. Do not rush a sample through but wait for the chambers to reach the threshold vacuum values before transfer between chambers.&lt;br /&gt;
&lt;br /&gt;
&lt;br /&gt;
== Service and maintenance ==&lt;br /&gt;
 &lt;br /&gt;
&lt;br /&gt;
The users are no allowed to perform any maintenance or service on the system unless approved by the technical head. &lt;br /&gt;
&lt;br /&gt;
The only chamber that users are allowed to vent is the Load lock chamber.&lt;br /&gt;
&lt;br /&gt;
&lt;br /&gt;
== Problems and incidents ==&lt;br /&gt;
&lt;br /&gt;
We encourage users to report all problems or incidents. Using a complex system like the MBE, will from time to time result in mistakes  and unintentional incidents. We all learn from this and the best way to keep the system in a good operational state is to ask for help when needed!&lt;br /&gt;
&lt;br /&gt;
Thus, should you experience any problems with the system, these must be reported to the technical head immediately.&lt;br /&gt;
&lt;br /&gt;
In case of incidents including dropped or &amp;quot;hanging&amp;quot; sample holders please do not attempt to fix this but try to leave the system in a best possible safe state and report to the technical head.&lt;br /&gt;
&lt;br /&gt;
Last revision: July 2018.&lt;br /&gt;
&lt;br /&gt;
[[Category:Tools]]&lt;br /&gt;
[[Category:Deposition]]&lt;/div&gt;</summary>
		<author><name>Nader</name></author>
	</entry>
	<entry>
		<id>https://wiki.nbi.ku.dk/w/cleanroom/index.php?title=MBE&amp;diff=2263</id>
		<title>MBE</title>
		<link rel="alternate" type="text/html" href="https://wiki.nbi.ku.dk/w/cleanroom/index.php?title=MBE&amp;diff=2263"/>
		<updated>2023-10-16T06:15:45Z</updated>

		<summary type="html">&lt;p&gt;Nader: /* Training */&lt;/p&gt;
&lt;hr /&gt;
&lt;div&gt;{{Infobox tool&lt;br /&gt;
|image = Tool MBE.jpg&lt;br /&gt;
|toolfullname = Varian GEN II&lt;br /&gt;
|company = Custom&lt;br /&gt;
|description = Molecular beam epitaxy system&lt;br /&gt;
|location = MBE lab (03.2.213A, 03.2.217, 03.2.217A)&lt;br /&gt;
|primary = Claus&lt;br /&gt;
}}&lt;br /&gt;
== General information ==&lt;br /&gt;
&lt;br /&gt;
&lt;br /&gt;
The MBE system is a materials research and development facility located at HCØ, owned by NBI/KU.&lt;br /&gt;
 &lt;br /&gt;
Our MBE lab is located on the 2nd floor in rooms 3-2-213A, 3-2-217 and 3-2-217A.&lt;br /&gt;
&lt;br /&gt;
The system is a Varian GEN II with a 3&amp;quot; substrate capability. The III-V growth chamber has eight sources with the following materials.&lt;br /&gt;
&lt;br /&gt;
&lt;br /&gt;
{| style=&amp;quot;width: 85%;&amp;quot;&lt;br /&gt;
|- style=&amp;quot;text-align:left;&amp;quot;&lt;br /&gt;
! Group V !! Group III !! Dopants !! Other &lt;br /&gt;
|- valign=&amp;quot;top&amp;quot; &lt;br /&gt;
| style=&amp;quot;width: 20%;&amp;quot; |&lt;br /&gt;
As and Sb&lt;br /&gt;
&lt;br /&gt;
| style=&amp;quot;width: 20%;&amp;quot; |&lt;br /&gt;
Ga, Al and In&lt;br /&gt;
&lt;br /&gt;
| style=&amp;quot;width: 20%;&amp;quot; |&lt;br /&gt;
Si and Be&lt;br /&gt;
&lt;br /&gt;
| style=&amp;quot;width: 20%;&amp;quot; |&lt;br /&gt;
Au&lt;br /&gt;
&lt;br /&gt;
|}&lt;br /&gt;
&lt;br /&gt;
The system also has a UHV metallization chamber attached equipped with a 6-pocket e-gun and a RF sputter source.&lt;br /&gt;
&lt;br /&gt;
The principal investigator (PI) in charge of the NBI facility is Prof. [http://www.nbi.ku.dk/english/staff/?pure=en/persons/67039 Jesper Nygård]. &lt;br /&gt;
&lt;br /&gt;
[http://www.nbi.ku.dk/ansatte/?pure=da/persons/79214 Claus B. Sørensen] is technical head of the lab.&lt;br /&gt;
&lt;br /&gt;
== MBE activities meetings ==&lt;br /&gt;
MBE activities and changes of procedures are discussed at open group meetings (typically the weekly MBE/Materials subgroup meeting at QDev) where the technical head is often present.&lt;br /&gt;
&lt;br /&gt;
== Access to the system ==&lt;br /&gt;
&lt;br /&gt;
New users should be approved by the local management and must receive basic training by the technical head or a person appointed by the technical head before working on the system. Further, new users must have completed the cleanroom safety course before signing up for MBE training and  gaining access to the MBE lab. The number of persons trained and allowed to use the MBE is limited in nature due to the complexity of operation. &lt;br /&gt;
&lt;br /&gt;
Requests for cleanroom training must be mailed to [mailto:cleanroom@nbi.ku.dk cleanroom@nbi.ku.dk]&lt;br /&gt;
&lt;br /&gt;
== Training ==&lt;br /&gt;
&lt;br /&gt;
Requests for MBE training must be addressed to:&lt;br /&gt;
&lt;br /&gt;
Jesper Nygård: [mailto:nygard@nbi.ku.dk nygard@nbi.ku.dk]&lt;br /&gt;
&lt;br /&gt;
Martin Saurbrey Bjergfelt: [mailto:martin.bjergfelt@nbi.ku.dk martin.bjergfelt@nbi.ku.dk]&lt;br /&gt;
&lt;br /&gt;
== Access to room ==&lt;br /&gt;
&lt;br /&gt;
Following completion of cleanroom and MBE training, access to the lab is granted by mailing your KU access card number and your contact details (mobile phone number and email) to:&lt;br /&gt;
&lt;br /&gt;
Jesper Nygård: [mailto:nygard@nbi.ku.dk nygard@nbi.ku.dk]&lt;br /&gt;
&lt;br /&gt;
Claus B. Sørensen: [mailto:cbs@nbi.ku.dk cbs@nbi.ku.dk]&lt;br /&gt;
&lt;br /&gt;
== Scheduling-Booking the system ==&lt;br /&gt;
&lt;br /&gt;
All use of the system must be booked using the cleanroom [http://cleanroom.brickhost.com/ tool booking page].&lt;br /&gt;
&lt;br /&gt;
A system for handling project (alias) and planned growths (materials) may become effective in 2018 to facilitate planning and invoicing. &lt;br /&gt;
&lt;br /&gt;
== Cleanroom attire ==&lt;br /&gt;
&lt;br /&gt;
&#039;&#039;&#039;Entering the MBE lab.&#039;&#039;&#039; &lt;br /&gt;
&lt;br /&gt;
Please make sure that only one door in the air lock is open at a time to keep the room clean. The MBE room is an ISO 6/7 room and the prep-room is ISO 5/6.&lt;br /&gt;
&lt;br /&gt;
# &#039;&#039;&#039;Before&#039;&#039;&#039; entering the gowning area: &#039;&#039;put on shoe covers&#039;&#039;&lt;br /&gt;
# &#039;&#039;&#039;Inside&#039;&#039;&#039; the gowning area you must put on the following:&lt;br /&gt;
## &#039;&#039;A cleanroom lab gown or a full cleanroom suit &#039;&#039;&lt;br /&gt;
## &#039;&#039;Hairnet&#039;&#039;&lt;br /&gt;
## &#039;&#039;Beard cover (if applicable)&#039;&#039;&lt;br /&gt;
&lt;br /&gt;
&#039;&#039;&#039;Entering the preparation room&#039;&#039;&#039;&lt;br /&gt;
&lt;br /&gt;
&#039;&#039;&#039;Before&#039;&#039;&#039; entering the preparation room, you must additionally: &#039;&#039;put on nitrile gloves&#039;&#039;&lt;br /&gt;
&lt;br /&gt;
== Safety ==&lt;br /&gt;
&lt;br /&gt;
&lt;br /&gt;
&#039;&#039;&#039;Oxygen depletion hazard&#039;&#039;&#039;&lt;br /&gt;
&lt;br /&gt;
The MBE system is cooled by a closed loop liquid nitrogen system with a direct connection to the storage tank on the street. As nitrogen act as an asphyxiant, the oxygen level in the room is monitored to ensure that no risk of oxygen depletion can occur. &lt;br /&gt;
&lt;br /&gt;
Should the oxygen level drop below the alarm value, the alarm will sound and flash.&lt;br /&gt;
&lt;br /&gt;
You must evacuate the room immediately and notify Science Campus Service and one of the named staff members below.&lt;br /&gt;
&lt;br /&gt;
Ensure that no one enters the room, block access!&lt;br /&gt;
&lt;br /&gt;
If the alarm is active when you arrive, do not enter.&lt;br /&gt;
&lt;br /&gt;
If needed, an emergency self-contained breathing apparatus is available on the 2nd floor on the wall across from room 03-2-214&lt;br /&gt;
&lt;br /&gt;
&lt;br /&gt;
&#039;&#039;&#039;Fire alarm&#039;&#039;&#039;&lt;br /&gt;
&lt;br /&gt;
The MBE lab also has an early fire warning system if smoke is detected in the corridor on the second floor.&lt;br /&gt;
&lt;br /&gt;
Should smoke be detected in the corridor, the alarm will sound and flash.&lt;br /&gt;
&lt;br /&gt;
You must evacuate the room immediately and notify Science Campus Service and one of the named staff members below.&lt;br /&gt;
&lt;br /&gt;
&lt;br /&gt;
{| style=&amp;quot;width: 85%;&amp;quot;&lt;br /&gt;
|- style=&amp;quot;text-align:left;&amp;quot;&lt;br /&gt;
! Claus B. Sørensen !! Nader Payami !! Science Campus Service helpdesk &lt;br /&gt;
|- valign=&amp;quot;top&amp;quot; &lt;br /&gt;
| style=&amp;quot;width: 20%;&amp;quot; |&lt;br /&gt;
Phone: 2875 0449&lt;br /&gt;
&lt;br /&gt;
Mail:  [mailto:cbs@nbi.ku.dk cbs@nbi.ku.dk]&lt;br /&gt;
&lt;br /&gt;
| style=&amp;quot;width: 20%;&amp;quot; |&lt;br /&gt;
Phone: 2875 0450&lt;br /&gt;
&lt;br /&gt;
Mail: [mailto:nap@nbi.ku.dk nap@nbi.ku.dk] &lt;br /&gt;
| style=&amp;quot;width: 20%;&amp;quot; |&lt;br /&gt;
Phone: 3533 1333&lt;br /&gt;
&lt;br /&gt;
Mail: [mailto:scshelpdesk@science.ku.dk scshelpdesk@science.ku.dk]&lt;br /&gt;
|}&lt;br /&gt;
&lt;br /&gt;
== Chemical and materials safety ==&lt;br /&gt;
&lt;br /&gt;
All safety procedures in the cleanroom also applies in the MBE-lab. It is mandatory for users to familiarize themselves with the Materials Safety Data Sheets (MSDS) and observe good laboratory praxis.&lt;br /&gt;
&lt;br /&gt;
&#039;&#039;Double gloving&#039;&#039;&lt;br /&gt;
&lt;br /&gt;
Before starting to handle wafers, substrate holders or chemicals a second pair of nitrile gloves must be put on. &lt;br /&gt;
&lt;br /&gt;
&#039;&#039;Wafers&#039;&#039;&lt;br /&gt;
&lt;br /&gt;
Arsenic containing substrates must be handled using clean tweezers and kept in suitable wafer trays or boxes when taken out of the MBE lab. Wafer and sample storage outside of the cleanroom or MBE must be kept locked. &lt;br /&gt;
&lt;br /&gt;
Full wafers and ready cut pieces are generally safe to handle when As containing dust particles are not generated.&lt;br /&gt;
&lt;br /&gt;
When mounting and handling substrate holders the local point exhaust must be turned on and placed as close to the workplace as possible.&lt;br /&gt;
&lt;br /&gt;
&#039;&#039;Fumehood&#039;&#039;&lt;br /&gt;
&lt;br /&gt;
The fumehood must be used at all times when processing substrates (solvent cleaning, etching etch)&lt;br /&gt;
&lt;br /&gt;
&#039;&#039;Contaminated and solid waste&#039;&#039;&lt;br /&gt;
&lt;br /&gt;
All gloves, wipes, substrate pieces etc that are suspected to be contaminated or known to contain hazardous materials must be disposed of in the special risk waste bins.&lt;br /&gt;
&lt;br /&gt;
&#039;&#039;Chemicals&#039;&#039;&lt;br /&gt;
&lt;br /&gt;
Waste chemicals must be handled in a similar way as in the cleanroom using designated waste cans.&lt;br /&gt;
&lt;br /&gt;
== Logbook and system-traceability ==&lt;br /&gt;
&lt;br /&gt;
&lt;br /&gt;
As meticulous traceability is vital, all users must complete the MBE logs and store growth recipes on the dedicated data storage units. Further, a system for storing post-growth characterization data is under development (2018).&lt;br /&gt;
&lt;br /&gt;
# Growth recipes should be stored in the MBE Molly control system&lt;br /&gt;
# Each growth is entered in the dedicated excel sheet on the MBE PC and the sheet is stored in a designated Dropbox&lt;br /&gt;
&lt;br /&gt;
&lt;br /&gt;
== Materials ==&lt;br /&gt;
&lt;br /&gt;
&lt;br /&gt;
As MBE growth of semiconductors depends heavily on the cleanliness of the system, extreme caution must be paid to keeping the system clean. &lt;br /&gt;
&lt;br /&gt;
Only materials and cleaning procedures approved must be used on substrates that are intended for use in the MBE system.&lt;br /&gt;
&lt;br /&gt;
Prior to using any new materials or cleaning procedures on substrates these must be approved by the technical head.&lt;br /&gt;
&lt;br /&gt;
The following substrates are approved in an Epi ready state:&lt;br /&gt;
&lt;br /&gt;
GaAs, InAs, GaSb, InSb, InP and Si.&lt;br /&gt;
&lt;br /&gt;
All substrates much be acquired from an approved, well-known source in high quality.&lt;br /&gt;
&lt;br /&gt;
Processed substrates must be free of any organic contaminants and thoroughly cleaned by oxygen plasma ashing and HF dipping prior to loading. During degassing of processed substrates the massspectrum of the residual gasses must be observed both in the load lock and subsequent in the buffer chamber. If any sign of organic or other unwanted contaminants show up, degassing must be stopped immediately and the substrate unloaded.&lt;br /&gt;
&lt;br /&gt;
&lt;br /&gt;
&lt;br /&gt;
Substrates have a long lead-time so please pay attention to the stock and give a heads up in good time before stock becomes low.&lt;br /&gt;
&lt;br /&gt;
== Operating the system ==&lt;br /&gt;
&lt;br /&gt;
&lt;br /&gt;
Cleanliness and vacuum integrity are key parameters for growing clean epi layers and attention must be paid to this at all times. Do not rush a sample through but wait for the chambers to reach the threshold vacuum values before transfer between chambers.&lt;br /&gt;
&lt;br /&gt;
&lt;br /&gt;
== Service and maintenance ==&lt;br /&gt;
 &lt;br /&gt;
&lt;br /&gt;
The users are no allowed to perform any maintenance or service on the system unless approved by the technical head. &lt;br /&gt;
&lt;br /&gt;
The only chamber that users are allowed to vent is the Load lock chamber.&lt;br /&gt;
&lt;br /&gt;
&lt;br /&gt;
== Problems and incidents ==&lt;br /&gt;
&lt;br /&gt;
We encourage users to report all problems or incidents. Using a complex system like the MBE, will from time to time result in mistakes  and unintentional incidents. We all learn from this and the best way to keep the system in a good operational state is to ask for help when needed!&lt;br /&gt;
&lt;br /&gt;
Thus, should you experience any problems with the system, these must be reported to the technical head immediately.&lt;br /&gt;
&lt;br /&gt;
In case of incidents including dropped or &amp;quot;hanging&amp;quot; sample holders please do not attempt to fix this but try to leave the system in a best possible safe state and report to the technical head.&lt;br /&gt;
&lt;br /&gt;
Last revision: July 2018.&lt;br /&gt;
&lt;br /&gt;
[[Category:Tools]]&lt;br /&gt;
[[Category:Deposition]]&lt;/div&gt;</summary>
		<author><name>Nader</name></author>
	</entry>
	<entry>
		<id>https://wiki.nbi.ku.dk/w/cleanroom/index.php?title=About&amp;diff=2262</id>
		<title>About</title>
		<link rel="alternate" type="text/html" href="https://wiki.nbi.ku.dk/w/cleanroom/index.php?title=About&amp;diff=2262"/>
		<updated>2023-10-16T06:12:46Z</updated>

		<summary type="html">&lt;p&gt;Nader: /* Staff */&lt;/p&gt;
&lt;hr /&gt;
&lt;div&gt;== Cleanroom meetings ==&lt;br /&gt;
&lt;br /&gt;
The [[Main Page|cleanroom]] staff and stake holders usually meet on Fridays at 12:30pm (HCØ 1st floor, room 03-1-114).&lt;br /&gt;
Users who have special requests or would like to discuss a cleanroom issue can join such a meeting; contact staff or drop by.&lt;br /&gt;
&lt;br /&gt;
== Staff ==&lt;br /&gt;
&lt;br /&gt;
{| class=&amp;quot;wikitable&amp;quot;&lt;br /&gt;
|-&lt;br /&gt;
! Name&lt;br /&gt;
! Position&lt;br /&gt;
! Office&lt;br /&gt;
! Phone&lt;br /&gt;
! Email&lt;br /&gt;
|-&lt;br /&gt;
| Martin Saurbrey Bjergfelt&lt;br /&gt;
| Cleanroom Manager&lt;br /&gt;
| 03.2.212&lt;br /&gt;
| 23 81 08 93&lt;br /&gt;
| [mailto:martin.bjergfelt@nbi.ku.dk martin.bjergfelt@nbi.ku.dk]&lt;br /&gt;
|-&lt;br /&gt;
| Nader Payami&lt;br /&gt;
| Chemical process engineer&lt;br /&gt;
| 03.2.214&lt;br /&gt;
| 28 75 04 50&lt;br /&gt;
| [mailto:nap@nbi.ku.dk nap@nbi.ku.dk]&lt;br /&gt;
|-&lt;br /&gt;
| Smitha Nair Themadath&lt;br /&gt;
| Process Specialist &lt;br /&gt;
| 03.2.212&lt;br /&gt;
| 50 38 07 12&lt;br /&gt;
| [mailto:smitha.nair@nbi.ku.dk  smitha.nair@nbi.ku.dk]&lt;br /&gt;
|-&lt;br /&gt;
| Zhe Liu&lt;br /&gt;
| Process Specialist&lt;br /&gt;
| 03.2.214&lt;br /&gt;
| 52 82 55 55&lt;br /&gt;
| [mailto:zhe.liu@nbi.ku.dk  zhe.liu@nbi.ku.dk]&lt;br /&gt;
|-&lt;br /&gt;
| Marianne Lund Jensen&lt;br /&gt;
| Laborant&lt;br /&gt;
| 03.3.&lt;br /&gt;
| 40 49 90 37&lt;br /&gt;
| [mailto:mljensen@nbi.ku.dk mljensen@nbi.ku.dk]&lt;br /&gt;
|-&lt;br /&gt;
| Henriette Lerche&lt;br /&gt;
| safety coordinator&lt;br /&gt;
| Blegdamsvej 17, Ka1&lt;br /&gt;
| 51 29 83 37&lt;br /&gt;
| [mailto:hlerche@nbi.ku.dk hlerche@nbi.ku.dk] &lt;br /&gt;
|-&lt;br /&gt;
| Jesper Nygård&lt;br /&gt;
| Professor&lt;br /&gt;
| 03.4.410&lt;br /&gt;
| 24 62 61 20&lt;br /&gt;
| [mailto:nygard@nbi.ku.dk nygard@nbi.ku.dk]&lt;br /&gt;
|}&lt;br /&gt;
&lt;br /&gt;
== Pricing ==&lt;br /&gt;
Current price lists as of 2022 April 1:&lt;br /&gt;
* [[Media:NBI cleanroom price list 1st April 2023.pdf|NBI-owned tools]]&lt;br /&gt;
* [[Media:Quantech pricing information January 2023.pdf|QuanTech-owned tools]]&lt;/div&gt;</summary>
		<author><name>Nader</name></author>
	</entry>
	<entry>
		<id>https://wiki.nbi.ku.dk/w/cleanroom/index.php?title=General_rules_for_working_in_the_cleanroom&amp;diff=2261</id>
		<title>General rules for working in the cleanroom</title>
		<link rel="alternate" type="text/html" href="https://wiki.nbi.ku.dk/w/cleanroom/index.php?title=General_rules_for_working_in_the_cleanroom&amp;diff=2261"/>
		<updated>2023-10-16T06:06:48Z</updated>

		<summary type="html">&lt;p&gt;Nader: /* Cleanroom attire */&lt;/p&gt;
&lt;hr /&gt;
&lt;div&gt;New users must complete the Cleanroom safety course before gaining access to the Cleanroom.&lt;br /&gt;
&lt;br /&gt;
Send a [mailto:cleanroom@nbi.ku.dk cleanroom@nbi.ku.dk] to join a course. Please provide information on which group or PI you are affiliated with.&lt;br /&gt;
&lt;br /&gt;
The safety of you and coworkers in the lab is of utmost importance. Although we encourage constructive feedback on safety procedures, and how to improve them, you must accept that safety is not a democratic process. The rules must be followed.&lt;br /&gt;
&lt;br /&gt;
In case of an accident, you must also accept that your coworkers or [[About|cleanroom staff]] takes over and instructs you in order to help in the best possible way. You may not think rationally in such a situation!&lt;br /&gt;
&lt;br /&gt;
= How to behave =&lt;br /&gt;
* Always think of [[Safety|safety]] first!&lt;br /&gt;
* Always wear the required cleanroom attire&lt;br /&gt;
* Change your cleanroom gown at least once a week&lt;br /&gt;
* Respect a comfort safety zone around people working in the cleanroom&lt;br /&gt;
* The maximum number of people in each of the two cleanrooms is 8, providing that people are distibuted at different fumehoods and tools&lt;br /&gt;
* When you work at the fume hoods:&lt;br /&gt;
** Use slow movements (to avoid turbulence)&lt;br /&gt;
** Reduce the amount of equipment and bottles in the bench&lt;br /&gt;
** Operate with sash as low as possible (always below arrow marking max sash height)&lt;br /&gt;
** Keep the worksurface tidy&lt;br /&gt;
** Clean up after use&lt;br /&gt;
** If you must leave a process unattended, please limit the time and attach a note with name, contact info, and return time &lt;br /&gt;
* Wash labware after use with Milli-Q water and hang to dry on rack&lt;br /&gt;
* No food or drinks allowed in the cleanroom&lt;br /&gt;
* Broken glass must be cleaned and disposed of in the glass bins&lt;br /&gt;
* No earphones! You must be able to hear and see to act safely&lt;br /&gt;
&lt;br /&gt;
= How to dress =&lt;br /&gt;
&lt;br /&gt;
When working in the cleanroom, you must always wear cleanroom attire, and when working with acids or dangerous chemicals, you must also wear personal protective equipment (PPE). Cleanroom attire and PPE have different purposes. Clean room attire is not PPE. You wear cleanroom attire to protect samples from dust generated by you, and you wear PPE to protect you from chemicals. &lt;br /&gt;
&lt;br /&gt;
To minimize particle generation your personal clothes and hair must be totally covered from the lower edge of the clean room coat and up. Long hair must be tucked under the hood and neither headscarves nor hair must stick out or block your vision.&lt;br /&gt;
&lt;br /&gt;
Oversized trousers or floor long dresses pose a safety risk as you may trip while handling chemicals and is thus not allowed. Clothing that contains excessive fringe or even overly loose-fitting clothing may be ruled to be unsafe. Open toed shoes are accepted.&lt;br /&gt;
&lt;br /&gt;
The use of contact lenses is not recommended in the lab. Contact lenses make it difficult to wash the eyes in case of splashes. If you choose to wear them you should alert other cleanroom users. Other users need to know that lenses will need to be removed if you do get something in your eye.&lt;br /&gt;
&lt;br /&gt;
Please note that you are required to strip your clothes when using the safety shower. Not removing contaminated clothes will make the situation worse. If you are not comfortable with this, you should not enter the lab.&lt;br /&gt;
&lt;br /&gt;
== Cleanroom attire ==&lt;br /&gt;
[[File:Required cleanroom attire.png|320px|right|Required cleanroom attire]]&lt;br /&gt;
The required cleanroom attire is:&lt;br /&gt;
&lt;br /&gt;
* Hair cover&lt;br /&gt;
* Safety glasses, even over normal glasses. They may only be removed when using the microscopes.&lt;br /&gt;
* Beard cover if you have a beard or stubble over 3 mm long&lt;br /&gt;
* Cleanroom gown&lt;br /&gt;
* Gloves&lt;br /&gt;
* Cleanroom colgs&lt;br /&gt;
&lt;br /&gt;
== Personal protective equipment ==&lt;br /&gt;
&lt;br /&gt;
Further required PPE when working with dangerous chemicals:&lt;br /&gt;
&lt;br /&gt;
* Apron&lt;br /&gt;
* General chemical work: Nitrile gloves&lt;br /&gt;
* Strong acids/chemicals: Nitrile + sleeve covers + tri-polymer protective sleeves&lt;br /&gt;
* Fumehood sash kept low&lt;br /&gt;
&lt;br /&gt;
= Practical information = &lt;br /&gt;
* All staff members are covered by the insurance provisions of the Occupational Injuries Act. In this relation a staff member is someone receiving a salary for the work done&lt;br /&gt;
* Students are not usually covered by the insurance provisions of the Occupational Injuries Act. We recommend that you have an accident policy, and that you make sure it also applies when you are studying and when you are working in the lab.&lt;br /&gt;
* Please familiarize yourself with the  [https://kunet.ku.dk/faculty-and-department/nbi/health-and-safety/Documents/Beredskabsplaner%20for%20Niels%20Bohr%20Institutet_ENG_febr2019.pdf Emergency plan]&lt;br /&gt;
* Please familiarize yourself with the [https://kunet.ku.dk/employee-guide/Pages/Safety-and-Emergency-Preparedness/Evacuation.aspx general evacuation concept of KU]&lt;br /&gt;
* Information about the NBI Occupational Health and Safety Committee can be found  [https://kunet.ku.dk/faculty-and-department/nbi/health-and-safety/Pages/default.aspx here]. This webpage also has links to other relevant Occupational Health and Safety sites at KU.&lt;br /&gt;
* A very thorough [https://kunet.ku.dk/faculty-and-department/nbi/health-and-safety/Documents/Health%20and%20Safety%20in%20Laboratory%20Teaching%20in%20Physics%20NBI%2014.pdf general lab safety manual for physics students] at NBI.&lt;br /&gt;
* KU provides First Aid courses. Keep an eye out for [https://kunet.ku.dk/employee-guide/Pages/Course-Catalogue/Ucphcourses.aspx courses] given in English (Generally offered a couple of times a year).&lt;br /&gt;
&lt;br /&gt;
[[Category:Safety]]&lt;/div&gt;</summary>
		<author><name>Nader</name></author>
	</entry>
	<entry>
		<id>https://wiki.nbi.ku.dk/w/cleanroom/index.php?title=File:Quantech_pricing_information_January_2023.pdf&amp;diff=2257</id>
		<title>File:Quantech pricing information January 2023.pdf</title>
		<link rel="alternate" type="text/html" href="https://wiki.nbi.ku.dk/w/cleanroom/index.php?title=File:Quantech_pricing_information_January_2023.pdf&amp;diff=2257"/>
		<updated>2023-07-17T09:21:28Z</updated>

		<summary type="html">&lt;p&gt;Nader: &lt;/p&gt;
&lt;hr /&gt;
&lt;div&gt;&lt;/div&gt;</summary>
		<author><name>Nader</name></author>
	</entry>
	<entry>
		<id>https://wiki.nbi.ku.dk/w/cleanroom/index.php?title=About&amp;diff=2256</id>
		<title>About</title>
		<link rel="alternate" type="text/html" href="https://wiki.nbi.ku.dk/w/cleanroom/index.php?title=About&amp;diff=2256"/>
		<updated>2023-07-17T09:20:50Z</updated>

		<summary type="html">&lt;p&gt;Nader: &lt;/p&gt;
&lt;hr /&gt;
&lt;div&gt;== Cleanroom meetings ==&lt;br /&gt;
&lt;br /&gt;
The [[Main Page|cleanroom]] staff and stake holders usually meet on Fridays at 12:30pm (HCØ 1st floor, room 03-1-114).&lt;br /&gt;
Users who have special requests or would like to discuss a cleanroom issue can join such a meeting; contact staff or drop by.&lt;br /&gt;
&lt;br /&gt;
== Staff ==&lt;br /&gt;
&lt;br /&gt;
{| class=&amp;quot;wikitable&amp;quot;&lt;br /&gt;
|-&lt;br /&gt;
! Name&lt;br /&gt;
! Position&lt;br /&gt;
! Office&lt;br /&gt;
! Phone&lt;br /&gt;
! Email&lt;br /&gt;
|-&lt;br /&gt;
| Claus B. Sørensen&lt;br /&gt;
| Technical head&lt;br /&gt;
| 03.02.216&lt;br /&gt;
| 28 75 04 49&lt;br /&gt;
| [mailto:cbs@nbi.ku.dk cbs@nbi.ku.dk]&lt;br /&gt;
|-&lt;br /&gt;
| Martin Saurbrey Bjergfelt&lt;br /&gt;
| Cleanroom Manager&lt;br /&gt;
| 03.2.212&lt;br /&gt;
| 23 81 08 93&lt;br /&gt;
| [mailto:martin.bjergfelt@nbi.ku.dk martin.bjergfelt@nbi.ku.dk]&lt;br /&gt;
|-&lt;br /&gt;
| Nader Payami&lt;br /&gt;
| Chemical process engineer&lt;br /&gt;
| 03.2.214&lt;br /&gt;
| 28 75 04 50&lt;br /&gt;
| [mailto:nap@nbi.ku.dk nap@nbi.ku.dk]&lt;br /&gt;
|-&lt;br /&gt;
| Smitha Nair Themadath&lt;br /&gt;
| Senior Research Associate&lt;br /&gt;
| 03.2.212&lt;br /&gt;
| 50 31 40 55&lt;br /&gt;
| [mailto:smitha.nair@nbi.ku.dk  smitha.nair@nbi.ku.dk]&lt;br /&gt;
|-&lt;br /&gt;
| Zhe Liu&lt;br /&gt;
| Process Specialist&lt;br /&gt;
| 03.2.214&lt;br /&gt;
| 52 82 55 55&lt;br /&gt;
| [mailto:zhe.liu@nbi.ku.dk  zhe.liu@nbi.ku.dk]&lt;br /&gt;
|-&lt;br /&gt;
| Marianne Lund Jensen&lt;br /&gt;
| Laborant&lt;br /&gt;
| 03.3.&lt;br /&gt;
| 40 49 90 37&lt;br /&gt;
| [mailto:mljensen@nbi.ku.dk mljensen@nbi.ku.dk]&lt;br /&gt;
|-&lt;br /&gt;
| Henriette Lerche&lt;br /&gt;
| safety coordinator&lt;br /&gt;
| Blegdamsvej 17, Ka1&lt;br /&gt;
| 51 29 83 37&lt;br /&gt;
| [mailto:hlerche@nbi.ku.dk hlerche@nbi.ku.dk] &lt;br /&gt;
|-&lt;br /&gt;
| Charles Marcus&lt;br /&gt;
| Professor&lt;br /&gt;
| 03.4.406&lt;br /&gt;
| 20 34 11 81&lt;br /&gt;
| [mailto:marcus@nbi.ku.dk marcus@nbi.ku.dk]&lt;br /&gt;
|-&lt;br /&gt;
| Jesper Nygård&lt;br /&gt;
| Professor&lt;br /&gt;
| 03.4.410&lt;br /&gt;
| 24 62 61 20&lt;br /&gt;
| [mailto:nygard@nbi.ku.dk nygard@nbi.ku.dk]&lt;br /&gt;
|}&lt;br /&gt;
&lt;br /&gt;
== Pricing ==&lt;br /&gt;
Current price lists as of 2022 April 1:&lt;br /&gt;
* [[Media:NBI cleanroom price list 1st April 2023.pdf|NBI-owned tools]]&lt;br /&gt;
* [[Media:Quantech pricing information January 2023.pdf|QuanTech-owned tools]]&lt;/div&gt;</summary>
		<author><name>Nader</name></author>
	</entry>
	<entry>
		<id>https://wiki.nbi.ku.dk/w/cleanroom/index.php?title=File:NBI_cleanroom_price_list_1st_April_2023.pdf&amp;diff=2255</id>
		<title>File:NBI cleanroom price list 1st April 2023.pdf</title>
		<link rel="alternate" type="text/html" href="https://wiki.nbi.ku.dk/w/cleanroom/index.php?title=File:NBI_cleanroom_price_list_1st_April_2023.pdf&amp;diff=2255"/>
		<updated>2023-07-17T09:16:32Z</updated>

		<summary type="html">&lt;p&gt;Nader: &lt;/p&gt;
&lt;hr /&gt;
&lt;div&gt;&lt;/div&gt;</summary>
		<author><name>Nader</name></author>
	</entry>
	<entry>
		<id>https://wiki.nbi.ku.dk/w/cleanroom/index.php?title=About&amp;diff=2254</id>
		<title>About</title>
		<link rel="alternate" type="text/html" href="https://wiki.nbi.ku.dk/w/cleanroom/index.php?title=About&amp;diff=2254"/>
		<updated>2023-07-17T09:14:12Z</updated>

		<summary type="html">&lt;p&gt;Nader: &lt;/p&gt;
&lt;hr /&gt;
&lt;div&gt;== Cleanroom meetings ==&lt;br /&gt;
&lt;br /&gt;
The [[Main Page|cleanroom]] staff and stake holders usually meet on Fridays at 12:30pm (HCØ 1st floor, room 03-1-114).&lt;br /&gt;
Users who have special requests or would like to discuss a cleanroom issue can join such a meeting; contact staff or drop by.&lt;br /&gt;
&lt;br /&gt;
== Staff ==&lt;br /&gt;
&lt;br /&gt;
{| class=&amp;quot;wikitable&amp;quot;&lt;br /&gt;
|-&lt;br /&gt;
! Name&lt;br /&gt;
! Position&lt;br /&gt;
! Office&lt;br /&gt;
! Phone&lt;br /&gt;
! Email&lt;br /&gt;
|-&lt;br /&gt;
| Claus B. Sørensen&lt;br /&gt;
| Technical head&lt;br /&gt;
| 03.02.216&lt;br /&gt;
| 28 75 04 49&lt;br /&gt;
| [mailto:cbs@nbi.ku.dk cbs@nbi.ku.dk]&lt;br /&gt;
|-&lt;br /&gt;
| Martin Saurbrey Bjergfelt&lt;br /&gt;
| Cleanroom Manager&lt;br /&gt;
| 03.2.212&lt;br /&gt;
| 23 81 08 93&lt;br /&gt;
| [mailto:martin.bjergfelt@nbi.ku.dk martin.bjergfelt@nbi.ku.dk]&lt;br /&gt;
|-&lt;br /&gt;
| Nader Payami&lt;br /&gt;
| Chemical process engineer&lt;br /&gt;
| 03.2.214&lt;br /&gt;
| 28 75 04 50&lt;br /&gt;
| [mailto:nap@nbi.ku.dk nap@nbi.ku.dk]&lt;br /&gt;
|-&lt;br /&gt;
| Smitha Nair Themadath&lt;br /&gt;
| Senior Research Associate&lt;br /&gt;
| 03.2.212&lt;br /&gt;
| 50 31 40 55&lt;br /&gt;
| [mailto:smitha.nair@nbi.ku.dk  smitha.nair@nbi.ku.dk]&lt;br /&gt;
|-&lt;br /&gt;
| Zhe Liu&lt;br /&gt;
| Process Specialist&lt;br /&gt;
| 03.2.214&lt;br /&gt;
| 52 82 55 55&lt;br /&gt;
| [mailto:zhe.liu@nbi.ku.dk  zhe.liu@nbi.ku.dk]&lt;br /&gt;
|-&lt;br /&gt;
| Marianne Lund Jensen&lt;br /&gt;
| Laborant&lt;br /&gt;
| 03.3.&lt;br /&gt;
| 40 49 90 37&lt;br /&gt;
| [mailto:mljensen@nbi.ku.dk mljensen@nbi.ku.dk]&lt;br /&gt;
|-&lt;br /&gt;
| Henriette Lerche&lt;br /&gt;
| safety coordinator&lt;br /&gt;
| Blegdamsvej 17, Ka1&lt;br /&gt;
| 51 29 83 37&lt;br /&gt;
| [mailto:hlerche@nbi.ku.dk hlerche@nbi.ku.dk] &lt;br /&gt;
|-&lt;br /&gt;
| Charles Marcus&lt;br /&gt;
| Professor&lt;br /&gt;
| 03.4.406&lt;br /&gt;
| 20 34 11 81&lt;br /&gt;
| [mailto:marcus@nbi.ku.dk marcus@nbi.ku.dk]&lt;br /&gt;
|-&lt;br /&gt;
| Jesper Nygård&lt;br /&gt;
| Professor&lt;br /&gt;
| 03.4.410&lt;br /&gt;
| 24 62 61 20&lt;br /&gt;
| [mailto:nygard@nbi.ku.dk nygard@nbi.ku.dk]&lt;br /&gt;
|}&lt;br /&gt;
&lt;br /&gt;
== Pricing ==&lt;br /&gt;
Current price lists as of 2022 April 1:&lt;br /&gt;
* [[Media:NBI cleanroom price list 1st April 2023.pdf|NBI-owned tools]]&lt;br /&gt;
* [[Media:Quantech pricing information 2022.pdf|QuanTech-owned tools]]&lt;/div&gt;</summary>
		<author><name>Nader</name></author>
	</entry>
	<entry>
		<id>https://wiki.nbi.ku.dk/w/cleanroom/index.php?title=File:NBI_cleanroom_price_list_1st_January_2022.pdf&amp;diff=2253</id>
		<title>File:NBI cleanroom price list 1st January 2022.pdf</title>
		<link rel="alternate" type="text/html" href="https://wiki.nbi.ku.dk/w/cleanroom/index.php?title=File:NBI_cleanroom_price_list_1st_January_2022.pdf&amp;diff=2253"/>
		<updated>2023-07-17T09:10:32Z</updated>

		<summary type="html">&lt;p&gt;Nader: Nader uploaded a new version of File:NBI cleanroom price list 1st January 2022.pdf&lt;/p&gt;
&lt;hr /&gt;
&lt;div&gt;&lt;/div&gt;</summary>
		<author><name>Nader</name></author>
	</entry>
	<entry>
		<id>https://wiki.nbi.ku.dk/w/cleanroom/index.php?title=Template:Emergencies&amp;diff=2217</id>
		<title>Template:Emergencies</title>
		<link rel="alternate" type="text/html" href="https://wiki.nbi.ku.dk/w/cleanroom/index.php?title=Template:Emergencies&amp;diff=2217"/>
		<updated>2023-02-16T10:43:19Z</updated>

		<summary type="html">&lt;p&gt;Nader: &lt;/p&gt;
&lt;hr /&gt;
&lt;div&gt;== First aid ==&lt;br /&gt;
Apply the four principles of first aid:&lt;br /&gt;
* Stop the accident&lt;br /&gt;
* Preserve life&lt;br /&gt;
* Summon assistance&lt;br /&gt;
* Provide first aid&lt;br /&gt;
&lt;br /&gt;
If you call the emergency services via 112 you must send a colleague down to the main entrance of the HCØ building to help the paramedics locate the site of the accident.&lt;br /&gt;
&lt;br /&gt;
The local emergency ward is the [https://www.google.com/maps/place/Akutmodtagelse/@55.714384,12.5401747,15z/data=!4m2!3m1!1s0x0:0xfa5f7f74cc6fe003?sa=X&amp;amp;ved=0ahUKEwi19azjsNbQAhXHDiwKHUtcCsMQ_BIIhAEwDQ Bispebjerg Skadestue, 23 Bispebjergbakke, 2400 Copenhagen NV]&lt;br /&gt;
&lt;br /&gt;
All accidents must be reported to one of the [[About#Staff|permanent NBI staff members]].&lt;br /&gt;
&lt;br /&gt;
== Location of emergency equipment ==&lt;br /&gt;
* Emergency showers are located in the hallway niches on all floors at HCØ except the basement. The shower head is in the ceiling and tap handle is in the wooden panel above the cabinets.&lt;br /&gt;
* There are showers in both cleanrooms&lt;br /&gt;
* Eyewash bottles are in the cleanroom and in all labs where chemicals are used&lt;br /&gt;
* There is a plumbed-in eyewash shower in the common cleanroom corridor&lt;br /&gt;
* Larger first aid kits are located in the hallway niches closest to the elevator on the 2&amp;lt;sup&amp;gt;nd&amp;lt;/sup&amp;gt; floor and 4&amp;lt;sup&amp;gt;th&amp;lt;/sup&amp;gt; floor&lt;br /&gt;
* Defibrillators are located in the HCØ hallway ground floor.&lt;/div&gt;</summary>
		<author><name>Nader</name></author>
	</entry>
	<entry>
		<id>https://wiki.nbi.ku.dk/w/cleanroom/index.php?title=Tools&amp;diff=1749</id>
		<title>Tools</title>
		<link rel="alternate" type="text/html" href="https://wiki.nbi.ku.dk/w/cleanroom/index.php?title=Tools&amp;diff=1749"/>
		<updated>2020-09-04T14:21:52Z</updated>

		<summary type="html">&lt;p&gt;Nader: /* Tool list */&lt;/p&gt;
&lt;hr /&gt;
&lt;div&gt;A prerequisite for using the cleanroom tools is that a cleanroom staff member has given the necessary instruction or training. This includes basic instruments such as hotplates and microscopes. For &#039;&#039;&#039;all&#039;&#039;&#039; training requests, please contact [mailto:cleanroom@nbi.ku.dk cleanroom@nbi.ku.dk], and a cleanroom staff member will typically respond within one workday. Do not contact individual staff members for training. &lt;br /&gt;
&lt;br /&gt;
Once the user has completed the training, they are given booking rights in the [http://cleanroom.brickhost.com cleanroom booking system]. However, after a certain period of inactivity on a given tool, the booking rights will expire and the user will need to be retrained in order to continue using the tool.&lt;br /&gt;
&lt;br /&gt;
== Tool list ==&lt;br /&gt;
{| style=&amp;quot;width: 85%;&amp;quot;&lt;br /&gt;
|- style=&amp;quot;text-align:left;&amp;quot;&lt;br /&gt;
! Lithography !! Thin film &amp;amp; III-Vs !! Characterization !! Other&lt;br /&gt;
|- valign=&amp;quot;top&amp;quot; &lt;br /&gt;
| style=&amp;quot;width: 20%;&amp;quot; |&lt;br /&gt;
* [[Raith eLine]]&lt;br /&gt;
* [[Elionix|Elionix EBL system]]&lt;br /&gt;
* [[Heidelberg µPG 501|Heidelberg LED writer]]&lt;br /&gt;
* [[Süss mask aligner]]&lt;br /&gt;
| style=&amp;quot;width: 20%;&amp;quot; |&lt;br /&gt;
* [[AJA Systems]]&lt;br /&gt;
* [[E-Gun evaporator]]&lt;br /&gt;
* [[Edwards evaporator|Edwards thermal evaporator]]&lt;br /&gt;
* [[Laurell spinners]]&lt;br /&gt;
* [[Cambridge ALD]]&lt;br /&gt;
* [[Leica sputter coater]]&lt;br /&gt;
* MBE&lt;br /&gt;
| style=&amp;quot;width: 20%;&amp;quot; |&lt;br /&gt;
* [[JEOL 6320F|JEOL JSM-6320F]]&lt;br /&gt;
* [[JEOL 7800F|JEOL JSM-7800F]]&lt;br /&gt;
* [[Raith eLine]]&lt;br /&gt;
* [[Philips TEM]]&lt;br /&gt;
* [[Alphastep Tencor profilometer]]&lt;br /&gt;
* [[Alpha_SE Ellipsometer]]&lt;br /&gt;
* [[Sensofar optical profiler]]&lt;br /&gt;
* [[Olympus BX51M|Olympus BX51M microscopes]]&lt;br /&gt;
* [[Bruker Dimension Icon AFM]]&lt;br /&gt;
| style=&amp;quot;width: 20%;&amp;quot; |&lt;br /&gt;
* [[Süss scriber]]&lt;br /&gt;
* [[Loomis scriber]]&lt;br /&gt;
* [[Dicing Saw]]&lt;br /&gt;
* [[AccuThermo RTA]]&lt;br /&gt;
* [[Plasma-Preen asher]]&lt;br /&gt;
* [[Diener plasma asher]]&lt;br /&gt;
* [[FS bonder]]&lt;br /&gt;
&amp;lt;!-- * [[K&amp;amp;S Ball Bonder]] --&amp;gt;&lt;br /&gt;
* [[Präzitherm hotplates]]&lt;br /&gt;
|}&lt;br /&gt;
&lt;br /&gt;
== Tool access requirement guidelines ==&lt;br /&gt;
&lt;br /&gt;
{| cellspacing=0px style=&amp;quot;text-align: center;&amp;quot;&lt;br /&gt;
! scope=&amp;quot;col&amp;quot; width=&amp;quot;20%&amp;quot; align=&amp;quot;right&amp;quot;  | &lt;br /&gt;
! scope=&amp;quot;col&amp;quot; width=&amp;quot;20%&amp;quot; | Bachelor&lt;br /&gt;
! scope=&amp;quot;col&amp;quot; width=&amp;quot;20%&amp;quot; | Master&lt;br /&gt;
! scope=&amp;quot;col&amp;quot; width=&amp;quot;20%&amp;quot; | PhD&lt;br /&gt;
! scope=&amp;quot;col&amp;quot; width=&amp;quot;20%&amp;quot; | Postdoc&lt;br /&gt;
|-&lt;br /&gt;
| style=&amp;quot;text-align:right; padding-right:6px;&amp;quot; |  eLine&lt;br /&gt;
| style=&amp;quot;background-color: #ff9f9f&amp;quot; | No&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
|-&lt;br /&gt;
| style=&amp;quot;text-align:right; padding-right:6px;&amp;quot; | Elionix&lt;br /&gt;
| style=&amp;quot;background-color: #ff9f9f&amp;quot; | No&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
|-&lt;br /&gt;
| style=&amp;quot;text-align:right; padding-right:6px;&amp;quot; | Heidelberg&lt;br /&gt;
| style=&amp;quot;background-color: #ff9f9f&amp;quot; | No&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
|-&lt;br /&gt;
| style=&amp;quot;text-align:right; padding-right:6px;&amp;quot; | Mask aligner&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
|-&lt;br /&gt;
| style=&amp;quot;padding-bottom:6px;&amp;quot; |&lt;br /&gt;
|-&lt;br /&gt;
| style=&amp;quot;text-align:right; padding-right:6px;&amp;quot; | AJAs&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
|-&lt;br /&gt;
| style=&amp;quot;text-align:right; padding-right:6px;&amp;quot; | e-gun&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
|-&lt;br /&gt;
| style=&amp;quot;text-align:right; padding-right:6px;&amp;quot; | Edwards&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
|-&lt;br /&gt;
| style=&amp;quot;text-align:right; padding-right:6px;&amp;quot; | ALD&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
|-&lt;br /&gt;
| style=&amp;quot;text-align:right; padding-right:6px;&amp;quot; | Leica Sputter&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
|-&lt;br /&gt;
| style=&amp;quot;padding-bottom:6px;&amp;quot; |&lt;br /&gt;
|-&lt;br /&gt;
| style=&amp;quot;text-align:right; padding-right:6px;&amp;quot; | JEOL 6230F&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
|-&lt;br /&gt;
| style=&amp;quot;text-align:right; padding-right:6px;&amp;quot; | JEOL 7800F&lt;br /&gt;
| style=&amp;quot;background-color: #ff9f9f&amp;quot; | No&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
|-&lt;br /&gt;
| style=&amp;quot;text-align:right; padding-right:6px;&amp;quot; | TEM&lt;br /&gt;
| style=&amp;quot;background-color: #ff9f9f&amp;quot; | No&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
|-&lt;br /&gt;
| style=&amp;quot;text-align:right; padding-right:6px;&amp;quot; | Alphastep Tencor profilometer&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
|-&lt;br /&gt;
| style=&amp;quot;text-align:right; padding-right:6px;&amp;quot; | Alpha_SE Ellipsometer&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
|-&lt;br /&gt;
| style=&amp;quot;text-align:right; padding-right:6px;&amp;quot; | Sensofar&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
|-&lt;br /&gt;
| style=&amp;quot;text-align:right; padding-right:6px;&amp;quot; | AFM&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
|-&lt;br /&gt;
| style=&amp;quot;padding-bottom:6px;&amp;quot; |&lt;br /&gt;
|-&lt;br /&gt;
| style=&amp;quot;text-align:right; padding-right:6px;&amp;quot; | Süss scriber&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
|-&lt;br /&gt;
| style=&amp;quot;text-align:right; padding-right:6px;&amp;quot; | Loomis scriber&lt;br /&gt;
| style=&amp;quot;background-color: #ff9f9f&amp;quot; | No&lt;br /&gt;
| style=&amp;quot;background-color: #ff9f9f&amp;quot; | No&lt;br /&gt;
| style=&amp;quot;background-color: #ff9f9f&amp;quot; | No&lt;br /&gt;
| style=&amp;quot;background-color: #ff9f9f&amp;quot; | No&lt;br /&gt;
|-&lt;br /&gt;
| style=&amp;quot;text-align:right; padding-right:6px;&amp;quot; | RTA&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
|-&lt;br /&gt;
| style=&amp;quot;text-align:right; padding-right:6px;&amp;quot; | Biorad&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
|-&lt;br /&gt;
| style=&amp;quot;text-align:right; padding-right:6px;&amp;quot; | Plasma-preen asher&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
|-&lt;br /&gt;
| style=&amp;quot;text-align:right; padding-right:6px;&amp;quot; | Diener asher&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
|-&lt;br /&gt;
| style=&amp;quot;text-align:right; padding-right:6px;&amp;quot; | Spinners&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
|}&lt;/div&gt;</summary>
		<author><name>Nader</name></author>
	</entry>
	<entry>
		<id>https://wiki.nbi.ku.dk/w/cleanroom/index.php?title=Tools&amp;diff=1748</id>
		<title>Tools</title>
		<link rel="alternate" type="text/html" href="https://wiki.nbi.ku.dk/w/cleanroom/index.php?title=Tools&amp;diff=1748"/>
		<updated>2020-09-04T14:21:00Z</updated>

		<summary type="html">&lt;p&gt;Nader: /* Tool access requirement guidelines */&lt;/p&gt;
&lt;hr /&gt;
&lt;div&gt;A prerequisite for using the cleanroom tools is that a cleanroom staff member has given the necessary instruction or training. This includes basic instruments such as hotplates and microscopes. For &#039;&#039;&#039;all&#039;&#039;&#039; training requests, please contact [mailto:cleanroom@nbi.ku.dk cleanroom@nbi.ku.dk], and a cleanroom staff member will typically respond within one workday. Do not contact individual staff members for training. &lt;br /&gt;
&lt;br /&gt;
Once the user has completed the training, they are given booking rights in the [http://cleanroom.brickhost.com cleanroom booking system]. However, after a certain period of inactivity on a given tool, the booking rights will expire and the user will need to be retrained in order to continue using the tool.&lt;br /&gt;
&lt;br /&gt;
== Tool list ==&lt;br /&gt;
{| style=&amp;quot;width: 85%;&amp;quot;&lt;br /&gt;
|- style=&amp;quot;text-align:left;&amp;quot;&lt;br /&gt;
! Lithography !! Thin film &amp;amp; III-Vs !! Characterization !! Other&lt;br /&gt;
|- valign=&amp;quot;top&amp;quot; &lt;br /&gt;
| style=&amp;quot;width: 20%;&amp;quot; |&lt;br /&gt;
* [[Raith eLine]]&lt;br /&gt;
* [[Elionix|Elionix EBL system]]&lt;br /&gt;
* [[Heidelberg µPG 501|Heidelberg LED writer]]&lt;br /&gt;
* [[Süss mask aligner]]&lt;br /&gt;
| style=&amp;quot;width: 20%;&amp;quot; |&lt;br /&gt;
* [[AJA Systems]]&lt;br /&gt;
* [[E-Gun evaporator]]&lt;br /&gt;
* [[Edwards evaporator|Edwards thermal evaporator]]&lt;br /&gt;
* [[Laurell spinners]]&lt;br /&gt;
* [[Cambridge ALD]]&lt;br /&gt;
* [[Leica sputter coater]]&lt;br /&gt;
* MBE&lt;br /&gt;
| style=&amp;quot;width: 20%;&amp;quot; |&lt;br /&gt;
* [[JEOL 6320F|JEOL JSM-6320F]]&lt;br /&gt;
* [[JEOL 7800F|JEOL JSM-7800F]]&lt;br /&gt;
* [[Raith eLine]]&lt;br /&gt;
* [[Philips TEM]]&lt;br /&gt;
* [[Tencor profilometer]]&lt;br /&gt;
* [[Alpha_SE Ellipsometer]]&lt;br /&gt;
* [[Sensofar optical profiler]]&lt;br /&gt;
* [[Olympus BX51M|Olympus BX51M microscopes]]&lt;br /&gt;
* [[Bruker Dimension Icon AFM]]&lt;br /&gt;
| style=&amp;quot;width: 20%;&amp;quot; |&lt;br /&gt;
* [[Süss scriber]]&lt;br /&gt;
* [[Loomis scriber]]&lt;br /&gt;
* [[Dicing Saw]]&lt;br /&gt;
* [[AccuThermo RTA]]&lt;br /&gt;
* [[Plasma-Preen asher]]&lt;br /&gt;
* [[Diener plasma asher]]&lt;br /&gt;
* [[FS bonder]]&lt;br /&gt;
&amp;lt;!-- * [[K&amp;amp;S Ball Bonder]] --&amp;gt;&lt;br /&gt;
* [[Präzitherm hotplates]]&lt;br /&gt;
|}&lt;br /&gt;
&lt;br /&gt;
== Tool access requirement guidelines ==&lt;br /&gt;
&lt;br /&gt;
{| cellspacing=0px style=&amp;quot;text-align: center;&amp;quot;&lt;br /&gt;
! scope=&amp;quot;col&amp;quot; width=&amp;quot;20%&amp;quot; align=&amp;quot;right&amp;quot;  | &lt;br /&gt;
! scope=&amp;quot;col&amp;quot; width=&amp;quot;20%&amp;quot; | Bachelor&lt;br /&gt;
! scope=&amp;quot;col&amp;quot; width=&amp;quot;20%&amp;quot; | Master&lt;br /&gt;
! scope=&amp;quot;col&amp;quot; width=&amp;quot;20%&amp;quot; | PhD&lt;br /&gt;
! scope=&amp;quot;col&amp;quot; width=&amp;quot;20%&amp;quot; | Postdoc&lt;br /&gt;
|-&lt;br /&gt;
| style=&amp;quot;text-align:right; padding-right:6px;&amp;quot; |  eLine&lt;br /&gt;
| style=&amp;quot;background-color: #ff9f9f&amp;quot; | No&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
|-&lt;br /&gt;
| style=&amp;quot;text-align:right; padding-right:6px;&amp;quot; | Elionix&lt;br /&gt;
| style=&amp;quot;background-color: #ff9f9f&amp;quot; | No&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
|-&lt;br /&gt;
| style=&amp;quot;text-align:right; padding-right:6px;&amp;quot; | Heidelberg&lt;br /&gt;
| style=&amp;quot;background-color: #ff9f9f&amp;quot; | No&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
|-&lt;br /&gt;
| style=&amp;quot;text-align:right; padding-right:6px;&amp;quot; | Mask aligner&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
|-&lt;br /&gt;
| style=&amp;quot;padding-bottom:6px;&amp;quot; |&lt;br /&gt;
|-&lt;br /&gt;
| style=&amp;quot;text-align:right; padding-right:6px;&amp;quot; | AJAs&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
|-&lt;br /&gt;
| style=&amp;quot;text-align:right; padding-right:6px;&amp;quot; | e-gun&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
|-&lt;br /&gt;
| style=&amp;quot;text-align:right; padding-right:6px;&amp;quot; | Edwards&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
|-&lt;br /&gt;
| style=&amp;quot;text-align:right; padding-right:6px;&amp;quot; | ALD&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
|-&lt;br /&gt;
| style=&amp;quot;text-align:right; padding-right:6px;&amp;quot; | Leica Sputter&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
|-&lt;br /&gt;
| style=&amp;quot;padding-bottom:6px;&amp;quot; |&lt;br /&gt;
|-&lt;br /&gt;
| style=&amp;quot;text-align:right; padding-right:6px;&amp;quot; | JEOL 6230F&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
|-&lt;br /&gt;
| style=&amp;quot;text-align:right; padding-right:6px;&amp;quot; | JEOL 7800F&lt;br /&gt;
| style=&amp;quot;background-color: #ff9f9f&amp;quot; | No&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
|-&lt;br /&gt;
| style=&amp;quot;text-align:right; padding-right:6px;&amp;quot; | TEM&lt;br /&gt;
| style=&amp;quot;background-color: #ff9f9f&amp;quot; | No&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
|-&lt;br /&gt;
| style=&amp;quot;text-align:right; padding-right:6px;&amp;quot; | Alphastep Tencor profilometer&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
|-&lt;br /&gt;
| style=&amp;quot;text-align:right; padding-right:6px;&amp;quot; | Alpha_SE Ellipsometer&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
|-&lt;br /&gt;
| style=&amp;quot;text-align:right; padding-right:6px;&amp;quot; | Sensofar&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
|-&lt;br /&gt;
| style=&amp;quot;text-align:right; padding-right:6px;&amp;quot; | AFM&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
|-&lt;br /&gt;
| style=&amp;quot;padding-bottom:6px;&amp;quot; |&lt;br /&gt;
|-&lt;br /&gt;
| style=&amp;quot;text-align:right; padding-right:6px;&amp;quot; | Süss scriber&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
|-&lt;br /&gt;
| style=&amp;quot;text-align:right; padding-right:6px;&amp;quot; | Loomis scriber&lt;br /&gt;
| style=&amp;quot;background-color: #ff9f9f&amp;quot; | No&lt;br /&gt;
| style=&amp;quot;background-color: #ff9f9f&amp;quot; | No&lt;br /&gt;
| style=&amp;quot;background-color: #ff9f9f&amp;quot; | No&lt;br /&gt;
| style=&amp;quot;background-color: #ff9f9f&amp;quot; | No&lt;br /&gt;
|-&lt;br /&gt;
| style=&amp;quot;text-align:right; padding-right:6px;&amp;quot; | RTA&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
|-&lt;br /&gt;
| style=&amp;quot;text-align:right; padding-right:6px;&amp;quot; | Biorad&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
|-&lt;br /&gt;
| style=&amp;quot;text-align:right; padding-right:6px;&amp;quot; | Plasma-preen asher&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
|-&lt;br /&gt;
| style=&amp;quot;text-align:right; padding-right:6px;&amp;quot; | Diener asher&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
|-&lt;br /&gt;
| style=&amp;quot;text-align:right; padding-right:6px;&amp;quot; | Spinners&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
|}&lt;/div&gt;</summary>
		<author><name>Nader</name></author>
	</entry>
	<entry>
		<id>https://wiki.nbi.ku.dk/w/cleanroom/index.php?title=Tools&amp;diff=1747</id>
		<title>Tools</title>
		<link rel="alternate" type="text/html" href="https://wiki.nbi.ku.dk/w/cleanroom/index.php?title=Tools&amp;diff=1747"/>
		<updated>2020-09-04T14:11:38Z</updated>

		<summary type="html">&lt;p&gt;Nader: /* Tool access requirement guidelines */&lt;/p&gt;
&lt;hr /&gt;
&lt;div&gt;A prerequisite for using the cleanroom tools is that a cleanroom staff member has given the necessary instruction or training. This includes basic instruments such as hotplates and microscopes. For &#039;&#039;&#039;all&#039;&#039;&#039; training requests, please contact [mailto:cleanroom@nbi.ku.dk cleanroom@nbi.ku.dk], and a cleanroom staff member will typically respond within one workday. Do not contact individual staff members for training. &lt;br /&gt;
&lt;br /&gt;
Once the user has completed the training, they are given booking rights in the [http://cleanroom.brickhost.com cleanroom booking system]. However, after a certain period of inactivity on a given tool, the booking rights will expire and the user will need to be retrained in order to continue using the tool.&lt;br /&gt;
&lt;br /&gt;
== Tool list ==&lt;br /&gt;
{| style=&amp;quot;width: 85%;&amp;quot;&lt;br /&gt;
|- style=&amp;quot;text-align:left;&amp;quot;&lt;br /&gt;
! Lithography !! Thin film &amp;amp; III-Vs !! Characterization !! Other&lt;br /&gt;
|- valign=&amp;quot;top&amp;quot; &lt;br /&gt;
| style=&amp;quot;width: 20%;&amp;quot; |&lt;br /&gt;
* [[Raith eLine]]&lt;br /&gt;
* [[Elionix|Elionix EBL system]]&lt;br /&gt;
* [[Heidelberg µPG 501|Heidelberg LED writer]]&lt;br /&gt;
* [[Süss mask aligner]]&lt;br /&gt;
| style=&amp;quot;width: 20%;&amp;quot; |&lt;br /&gt;
* [[AJA Systems]]&lt;br /&gt;
* [[E-Gun evaporator]]&lt;br /&gt;
* [[Edwards evaporator|Edwards thermal evaporator]]&lt;br /&gt;
* [[Laurell spinners]]&lt;br /&gt;
* [[Cambridge ALD]]&lt;br /&gt;
* [[Leica sputter coater]]&lt;br /&gt;
* MBE&lt;br /&gt;
| style=&amp;quot;width: 20%;&amp;quot; |&lt;br /&gt;
* [[JEOL 6320F|JEOL JSM-6320F]]&lt;br /&gt;
* [[JEOL 7800F|JEOL JSM-7800F]]&lt;br /&gt;
* [[Raith eLine]]&lt;br /&gt;
* [[Philips TEM]]&lt;br /&gt;
* [[Tencor profilometer]]&lt;br /&gt;
* [[Alpha_SE Ellipsometer]]&lt;br /&gt;
* [[Sensofar optical profiler]]&lt;br /&gt;
* [[Olympus BX51M|Olympus BX51M microscopes]]&lt;br /&gt;
* [[Bruker Dimension Icon AFM]]&lt;br /&gt;
| style=&amp;quot;width: 20%;&amp;quot; |&lt;br /&gt;
* [[Süss scriber]]&lt;br /&gt;
* [[Loomis scriber]]&lt;br /&gt;
* [[Dicing Saw]]&lt;br /&gt;
* [[AccuThermo RTA]]&lt;br /&gt;
* [[Plasma-Preen asher]]&lt;br /&gt;
* [[Diener plasma asher]]&lt;br /&gt;
* [[FS bonder]]&lt;br /&gt;
&amp;lt;!-- * [[K&amp;amp;S Ball Bonder]] --&amp;gt;&lt;br /&gt;
* [[Präzitherm hotplates]]&lt;br /&gt;
|}&lt;br /&gt;
&lt;br /&gt;
== Tool access requirement guidelines ==&lt;br /&gt;
&lt;br /&gt;
{| cellspacing=0px style=&amp;quot;text-align: center;&amp;quot;&lt;br /&gt;
! scope=&amp;quot;col&amp;quot; width=&amp;quot;20%&amp;quot; align=&amp;quot;right&amp;quot;  | &lt;br /&gt;
! scope=&amp;quot;col&amp;quot; width=&amp;quot;20%&amp;quot; | Bachelor&lt;br /&gt;
! scope=&amp;quot;col&amp;quot; width=&amp;quot;20%&amp;quot; | Master&lt;br /&gt;
! scope=&amp;quot;col&amp;quot; width=&amp;quot;20%&amp;quot; | PhD&lt;br /&gt;
! scope=&amp;quot;col&amp;quot; width=&amp;quot;20%&amp;quot; | Postdoc&lt;br /&gt;
|-&lt;br /&gt;
| style=&amp;quot;text-align:right; padding-right:6px;&amp;quot; |  eLine&lt;br /&gt;
| style=&amp;quot;background-color: #ff9f9f&amp;quot; | No&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
|-&lt;br /&gt;
| style=&amp;quot;text-align:right; padding-right:6px;&amp;quot; | Elionix&lt;br /&gt;
| style=&amp;quot;background-color: #ff9f9f&amp;quot; | No&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
|-&lt;br /&gt;
| style=&amp;quot;text-align:right; padding-right:6px;&amp;quot; | Heidelberg&lt;br /&gt;
| style=&amp;quot;background-color: #ff9f9f&amp;quot; | No&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
|-&lt;br /&gt;
| style=&amp;quot;text-align:right; padding-right:6px;&amp;quot; | Mask aligner&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
|-&lt;br /&gt;
| style=&amp;quot;padding-bottom:6px;&amp;quot; |&lt;br /&gt;
|-&lt;br /&gt;
| style=&amp;quot;text-align:right; padding-right:6px;&amp;quot; | AJAs&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
|-&lt;br /&gt;
| style=&amp;quot;text-align:right; padding-right:6px;&amp;quot; | e-gun&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
|-&lt;br /&gt;
| style=&amp;quot;text-align:right; padding-right:6px;&amp;quot; | Edwards&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
|-&lt;br /&gt;
| style=&amp;quot;text-align:right; padding-right:6px;&amp;quot; | ALD&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
|-&lt;br /&gt;
| style=&amp;quot;text-align:right; padding-right:6px;&amp;quot; | Leica&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
|-&lt;br /&gt;
| style=&amp;quot;padding-bottom:6px;&amp;quot; |&lt;br /&gt;
|-&lt;br /&gt;
| style=&amp;quot;text-align:right; padding-right:6px;&amp;quot; | JEOL 6230F&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
|-&lt;br /&gt;
| style=&amp;quot;text-align:right; padding-right:6px;&amp;quot; | JEOL 7800F&lt;br /&gt;
| style=&amp;quot;background-color: #ff9f9f&amp;quot; | No&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
|-&lt;br /&gt;
| style=&amp;quot;text-align:right; padding-right:6px;&amp;quot; | TEM&lt;br /&gt;
| style=&amp;quot;background-color: #ff9f9f&amp;quot; | No&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
|-&lt;br /&gt;
| style=&amp;quot;text-align:right; padding-right:6px;&amp;quot; | Alphastep&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
|-&lt;br /&gt;
| style=&amp;quot;text-align:right; padding-right:6px;&amp;quot; | Alpha_SE Ellipsometer&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
|-&lt;br /&gt;
| style=&amp;quot;text-align:right; padding-right:6px;&amp;quot; | Sensofar&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
|-&lt;br /&gt;
| style=&amp;quot;text-align:right; padding-right:6px;&amp;quot; | AFM&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
|-&lt;br /&gt;
| style=&amp;quot;padding-bottom:6px;&amp;quot; |&lt;br /&gt;
|-&lt;br /&gt;
| style=&amp;quot;text-align:right; padding-right:6px;&amp;quot; | Süss scriber&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
|-&lt;br /&gt;
| style=&amp;quot;text-align:right; padding-right:6px;&amp;quot; | Loomis scriber&lt;br /&gt;
| style=&amp;quot;background-color: #ff9f9f&amp;quot; | No&lt;br /&gt;
| style=&amp;quot;background-color: #ff9f9f&amp;quot; | No&lt;br /&gt;
| style=&amp;quot;background-color: #ff9f9f&amp;quot; | No&lt;br /&gt;
| style=&amp;quot;background-color: #ff9f9f&amp;quot; | No&lt;br /&gt;
|-&lt;br /&gt;
| style=&amp;quot;text-align:right; padding-right:6px;&amp;quot; | RTA&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
|-&lt;br /&gt;
| style=&amp;quot;text-align:right; padding-right:6px;&amp;quot; | Biorad&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
|-&lt;br /&gt;
| style=&amp;quot;text-align:right; padding-right:6px;&amp;quot; | Plasma-preen asher&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
|-&lt;br /&gt;
| style=&amp;quot;text-align:right; padding-right:6px;&amp;quot; | Diener asher&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
|-&lt;br /&gt;
| style=&amp;quot;text-align:right; padding-right:6px;&amp;quot; | Spinners&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
|}&lt;/div&gt;</summary>
		<author><name>Nader</name></author>
	</entry>
	<entry>
		<id>https://wiki.nbi.ku.dk/w/cleanroom/index.php?title=Tools&amp;diff=1746</id>
		<title>Tools</title>
		<link rel="alternate" type="text/html" href="https://wiki.nbi.ku.dk/w/cleanroom/index.php?title=Tools&amp;diff=1746"/>
		<updated>2020-09-04T13:49:36Z</updated>

		<summary type="html">&lt;p&gt;Nader: /* Tool list */&lt;/p&gt;
&lt;hr /&gt;
&lt;div&gt;A prerequisite for using the cleanroom tools is that a cleanroom staff member has given the necessary instruction or training. This includes basic instruments such as hotplates and microscopes. For &#039;&#039;&#039;all&#039;&#039;&#039; training requests, please contact [mailto:cleanroom@nbi.ku.dk cleanroom@nbi.ku.dk], and a cleanroom staff member will typically respond within one workday. Do not contact individual staff members for training. &lt;br /&gt;
&lt;br /&gt;
Once the user has completed the training, they are given booking rights in the [http://cleanroom.brickhost.com cleanroom booking system]. However, after a certain period of inactivity on a given tool, the booking rights will expire and the user will need to be retrained in order to continue using the tool.&lt;br /&gt;
&lt;br /&gt;
== Tool list ==&lt;br /&gt;
{| style=&amp;quot;width: 85%;&amp;quot;&lt;br /&gt;
|- style=&amp;quot;text-align:left;&amp;quot;&lt;br /&gt;
! Lithography !! Thin film &amp;amp; III-Vs !! Characterization !! Other&lt;br /&gt;
|- valign=&amp;quot;top&amp;quot; &lt;br /&gt;
| style=&amp;quot;width: 20%;&amp;quot; |&lt;br /&gt;
* [[Raith eLine]]&lt;br /&gt;
* [[Elionix|Elionix EBL system]]&lt;br /&gt;
* [[Heidelberg µPG 501|Heidelberg LED writer]]&lt;br /&gt;
* [[Süss mask aligner]]&lt;br /&gt;
| style=&amp;quot;width: 20%;&amp;quot; |&lt;br /&gt;
* [[AJA Systems]]&lt;br /&gt;
* [[E-Gun evaporator]]&lt;br /&gt;
* [[Edwards evaporator|Edwards thermal evaporator]]&lt;br /&gt;
* [[Laurell spinners]]&lt;br /&gt;
* [[Cambridge ALD]]&lt;br /&gt;
* [[Leica sputter coater]]&lt;br /&gt;
* MBE&lt;br /&gt;
| style=&amp;quot;width: 20%;&amp;quot; |&lt;br /&gt;
* [[JEOL 6320F|JEOL JSM-6320F]]&lt;br /&gt;
* [[JEOL 7800F|JEOL JSM-7800F]]&lt;br /&gt;
* [[Raith eLine]]&lt;br /&gt;
* [[Philips TEM]]&lt;br /&gt;
* [[Tencor profilometer]]&lt;br /&gt;
* [[Alpha_SE Ellipsometer]]&lt;br /&gt;
* [[Sensofar optical profiler]]&lt;br /&gt;
* [[Olympus BX51M|Olympus BX51M microscopes]]&lt;br /&gt;
* [[Bruker Dimension Icon AFM]]&lt;br /&gt;
| style=&amp;quot;width: 20%;&amp;quot; |&lt;br /&gt;
* [[Süss scriber]]&lt;br /&gt;
* [[Loomis scriber]]&lt;br /&gt;
* [[Dicing Saw]]&lt;br /&gt;
* [[AccuThermo RTA]]&lt;br /&gt;
* [[Plasma-Preen asher]]&lt;br /&gt;
* [[Diener plasma asher]]&lt;br /&gt;
* [[FS bonder]]&lt;br /&gt;
&amp;lt;!-- * [[K&amp;amp;S Ball Bonder]] --&amp;gt;&lt;br /&gt;
* [[Präzitherm hotplates]]&lt;br /&gt;
|}&lt;br /&gt;
&lt;br /&gt;
== Tool access requirement guidelines ==&lt;br /&gt;
&lt;br /&gt;
{| cellspacing=0px style=&amp;quot;text-align: center;&amp;quot;&lt;br /&gt;
! scope=&amp;quot;col&amp;quot; width=&amp;quot;20%&amp;quot; align=&amp;quot;right&amp;quot;  | &lt;br /&gt;
! scope=&amp;quot;col&amp;quot; width=&amp;quot;20%&amp;quot; | Bachelor&lt;br /&gt;
! scope=&amp;quot;col&amp;quot; width=&amp;quot;20%&amp;quot; | Master&lt;br /&gt;
! scope=&amp;quot;col&amp;quot; width=&amp;quot;20%&amp;quot; | PhD&lt;br /&gt;
! scope=&amp;quot;col&amp;quot; width=&amp;quot;20%&amp;quot; | Postdoc&lt;br /&gt;
|-&lt;br /&gt;
| style=&amp;quot;text-align:right; padding-right:6px;&amp;quot; |  eLine&lt;br /&gt;
| style=&amp;quot;background-color: #ff9f9f&amp;quot; | No&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
|-&lt;br /&gt;
| style=&amp;quot;text-align:right; padding-right:6px;&amp;quot; | Elionix&lt;br /&gt;
| style=&amp;quot;background-color: #ff9f9f&amp;quot; | No&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
|-&lt;br /&gt;
| style=&amp;quot;text-align:right; padding-right:6px;&amp;quot; | Heidelberg&lt;br /&gt;
| style=&amp;quot;background-color: #ff9f9f&amp;quot; | No&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
|-&lt;br /&gt;
| style=&amp;quot;text-align:right; padding-right:6px;&amp;quot; | Mask aligner&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
|-&lt;br /&gt;
| style=&amp;quot;padding-bottom:6px;&amp;quot; |&lt;br /&gt;
|-&lt;br /&gt;
| style=&amp;quot;text-align:right; padding-right:6px;&amp;quot; | AJAs&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
|-&lt;br /&gt;
| style=&amp;quot;text-align:right; padding-right:6px;&amp;quot; | e-gun&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
|-&lt;br /&gt;
| style=&amp;quot;text-align:right; padding-right:6px;&amp;quot; | Edwards&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
|-&lt;br /&gt;
| style=&amp;quot;text-align:right; padding-right:6px;&amp;quot; | ALD&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
|-&lt;br /&gt;
| style=&amp;quot;text-align:right; padding-right:6px;&amp;quot; | Leica&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
|-&lt;br /&gt;
| style=&amp;quot;padding-bottom:6px;&amp;quot; |&lt;br /&gt;
|-&lt;br /&gt;
| style=&amp;quot;text-align:right; padding-right:6px;&amp;quot; | JEOL 6230F&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
|-&lt;br /&gt;
| style=&amp;quot;text-align:right; padding-right:6px;&amp;quot; | JEOL 7800F&lt;br /&gt;
| style=&amp;quot;background-color: #ff9f9f&amp;quot; | No&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
|-&lt;br /&gt;
| style=&amp;quot;text-align:right; padding-right:6px;&amp;quot; | TEM&lt;br /&gt;
| style=&amp;quot;background-color: #ff9f9f&amp;quot; | No&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
|-&lt;br /&gt;
| style=&amp;quot;text-align:right; padding-right:6px;&amp;quot; | Alphastep&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
|-&lt;br /&gt;
| style=&amp;quot;text-align:right; padding-right:6px;&amp;quot; | Sensofar&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
|-&lt;br /&gt;
| style=&amp;quot;text-align:right; padding-right:6px;&amp;quot; | AFM&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
|-&lt;br /&gt;
| style=&amp;quot;padding-bottom:6px;&amp;quot; |&lt;br /&gt;
|-&lt;br /&gt;
| style=&amp;quot;text-align:right; padding-right:6px;&amp;quot; | Süss scriber&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
|-&lt;br /&gt;
| style=&amp;quot;text-align:right; padding-right:6px;&amp;quot; | Loomis scriber&lt;br /&gt;
| style=&amp;quot;background-color: #ff9f9f&amp;quot; | No&lt;br /&gt;
| style=&amp;quot;background-color: #ff9f9f&amp;quot; | No&lt;br /&gt;
| style=&amp;quot;background-color: #ff9f9f&amp;quot; | No&lt;br /&gt;
| style=&amp;quot;background-color: #ff9f9f&amp;quot; | No&lt;br /&gt;
|-&lt;br /&gt;
| style=&amp;quot;text-align:right; padding-right:6px;&amp;quot; | RTA&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
|-&lt;br /&gt;
| style=&amp;quot;text-align:right; padding-right:6px;&amp;quot; | Biorad&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
|-&lt;br /&gt;
| style=&amp;quot;text-align:right; padding-right:6px;&amp;quot; | Plasma-preen asher&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
|-&lt;br /&gt;
| style=&amp;quot;text-align:right; padding-right:6px;&amp;quot; | Diener asher&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
|-&lt;br /&gt;
| style=&amp;quot;text-align:right; padding-right:6px;&amp;quot; | Spinners&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
|}&lt;/div&gt;</summary>
		<author><name>Nader</name></author>
	</entry>
	<entry>
		<id>https://wiki.nbi.ku.dk/w/cleanroom/index.php?title=Tools&amp;diff=1745</id>
		<title>Tools</title>
		<link rel="alternate" type="text/html" href="https://wiki.nbi.ku.dk/w/cleanroom/index.php?title=Tools&amp;diff=1745"/>
		<updated>2020-09-04T13:45:18Z</updated>

		<summary type="html">&lt;p&gt;Nader: /* Tool list */&lt;/p&gt;
&lt;hr /&gt;
&lt;div&gt;A prerequisite for using the cleanroom tools is that a cleanroom staff member has given the necessary instruction or training. This includes basic instruments such as hotplates and microscopes. For &#039;&#039;&#039;all&#039;&#039;&#039; training requests, please contact [mailto:cleanroom@nbi.ku.dk cleanroom@nbi.ku.dk], and a cleanroom staff member will typically respond within one workday. Do not contact individual staff members for training. &lt;br /&gt;
&lt;br /&gt;
Once the user has completed the training, they are given booking rights in the [http://cleanroom.brickhost.com cleanroom booking system]. However, after a certain period of inactivity on a given tool, the booking rights will expire and the user will need to be retrained in order to continue using the tool.&lt;br /&gt;
&lt;br /&gt;
== Tool list ==&lt;br /&gt;
{| style=&amp;quot;width: 85%;&amp;quot;&lt;br /&gt;
|- style=&amp;quot;text-align:left;&amp;quot;&lt;br /&gt;
! Lithography !! Thin film &amp;amp; III-Vs !! Characterization !! Other&lt;br /&gt;
|- valign=&amp;quot;top&amp;quot; &lt;br /&gt;
| style=&amp;quot;width: 20%;&amp;quot; |&lt;br /&gt;
* [[Raith eLine]]&lt;br /&gt;
* [[Elionix|Elionix EBL system]]&lt;br /&gt;
* [[Heidelberg µPG 501|Heidelberg LED writer]]&lt;br /&gt;
* [[Süss mask aligner]]&lt;br /&gt;
| style=&amp;quot;width: 20%;&amp;quot; |&lt;br /&gt;
* [[AJA Systems]]&lt;br /&gt;
* [[E-Gun evaporator]]&lt;br /&gt;
* [[Edwards evaporator|Edwards thermal evaporator]]&lt;br /&gt;
* [[Laurell spinners]]&lt;br /&gt;
* [[Cambridge ALD]]&lt;br /&gt;
* [[Leica sputter coater]]&lt;br /&gt;
* MBE&lt;br /&gt;
| style=&amp;quot;width: 20%;&amp;quot; |&lt;br /&gt;
* [[JEOL 6320F|JEOL JSM-6320F]]&lt;br /&gt;
* [[JEOL 7800F|JEOL JSM-7800F]]&lt;br /&gt;
* [[Raith eLine]]&lt;br /&gt;
* [[Philips TEM]]&lt;br /&gt;
* [[Tencor profilometer]]&lt;br /&gt;
* [[Alpha_SE Ellipsometer]]&lt;br /&gt;
* [[Sensofar optical profiler]]&lt;br /&gt;
* [[Olympus BX51M|Olympus BX51M microscopes]]&lt;br /&gt;
* [[Bruker Dimension Icon AFM]]&lt;br /&gt;
| style=&amp;quot;width: 20%;&amp;quot; |&lt;br /&gt;
* [[Süss scriber]]&lt;br /&gt;
* [[Loomis scriber]]&lt;br /&gt;
* [[Dicing Saw]]&lt;br /&gt;
* [[AccuThermo RTA]]&lt;br /&gt;
* [[Plasma-Preen asher]]&lt;br /&gt;
* [[Diener plasma asher]]&lt;br /&gt;
&amp;lt;!-- * [[K&amp;amp;S Ball Bonder]] --&amp;gt;&lt;br /&gt;
* [[Präzitherm hotplates]]&lt;br /&gt;
|}&lt;br /&gt;
&lt;br /&gt;
== Tool access requirement guidelines ==&lt;br /&gt;
&lt;br /&gt;
{| cellspacing=0px style=&amp;quot;text-align: center;&amp;quot;&lt;br /&gt;
! scope=&amp;quot;col&amp;quot; width=&amp;quot;20%&amp;quot; align=&amp;quot;right&amp;quot;  | &lt;br /&gt;
! scope=&amp;quot;col&amp;quot; width=&amp;quot;20%&amp;quot; | Bachelor&lt;br /&gt;
! scope=&amp;quot;col&amp;quot; width=&amp;quot;20%&amp;quot; | Master&lt;br /&gt;
! scope=&amp;quot;col&amp;quot; width=&amp;quot;20%&amp;quot; | PhD&lt;br /&gt;
! scope=&amp;quot;col&amp;quot; width=&amp;quot;20%&amp;quot; | Postdoc&lt;br /&gt;
|-&lt;br /&gt;
| style=&amp;quot;text-align:right; padding-right:6px;&amp;quot; |  eLine&lt;br /&gt;
| style=&amp;quot;background-color: #ff9f9f&amp;quot; | No&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
|-&lt;br /&gt;
| style=&amp;quot;text-align:right; padding-right:6px;&amp;quot; | Elionix&lt;br /&gt;
| style=&amp;quot;background-color: #ff9f9f&amp;quot; | No&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
|-&lt;br /&gt;
| style=&amp;quot;text-align:right; padding-right:6px;&amp;quot; | Heidelberg&lt;br /&gt;
| style=&amp;quot;background-color: #ff9f9f&amp;quot; | No&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
|-&lt;br /&gt;
| style=&amp;quot;text-align:right; padding-right:6px;&amp;quot; | Mask aligner&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
|-&lt;br /&gt;
| style=&amp;quot;padding-bottom:6px;&amp;quot; |&lt;br /&gt;
|-&lt;br /&gt;
| style=&amp;quot;text-align:right; padding-right:6px;&amp;quot; | AJAs&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
|-&lt;br /&gt;
| style=&amp;quot;text-align:right; padding-right:6px;&amp;quot; | e-gun&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
|-&lt;br /&gt;
| style=&amp;quot;text-align:right; padding-right:6px;&amp;quot; | Edwards&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
|-&lt;br /&gt;
| style=&amp;quot;text-align:right; padding-right:6px;&amp;quot; | ALD&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
|-&lt;br /&gt;
| style=&amp;quot;text-align:right; padding-right:6px;&amp;quot; | Leica&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
|-&lt;br /&gt;
| style=&amp;quot;padding-bottom:6px;&amp;quot; |&lt;br /&gt;
|-&lt;br /&gt;
| style=&amp;quot;text-align:right; padding-right:6px;&amp;quot; | JEOL 6230F&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
|-&lt;br /&gt;
| style=&amp;quot;text-align:right; padding-right:6px;&amp;quot; | JEOL 7800F&lt;br /&gt;
| style=&amp;quot;background-color: #ff9f9f&amp;quot; | No&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
|-&lt;br /&gt;
| style=&amp;quot;text-align:right; padding-right:6px;&amp;quot; | TEM&lt;br /&gt;
| style=&amp;quot;background-color: #ff9f9f&amp;quot; | No&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
|-&lt;br /&gt;
| style=&amp;quot;text-align:right; padding-right:6px;&amp;quot; | Alphastep&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
|-&lt;br /&gt;
| style=&amp;quot;text-align:right; padding-right:6px;&amp;quot; | Sensofar&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
|-&lt;br /&gt;
| style=&amp;quot;text-align:right; padding-right:6px;&amp;quot; | AFM&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
|-&lt;br /&gt;
| style=&amp;quot;padding-bottom:6px;&amp;quot; |&lt;br /&gt;
|-&lt;br /&gt;
| style=&amp;quot;text-align:right; padding-right:6px;&amp;quot; | Süss scriber&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
|-&lt;br /&gt;
| style=&amp;quot;text-align:right; padding-right:6px;&amp;quot; | Loomis scriber&lt;br /&gt;
| style=&amp;quot;background-color: #ff9f9f&amp;quot; | No&lt;br /&gt;
| style=&amp;quot;background-color: #ff9f9f&amp;quot; | No&lt;br /&gt;
| style=&amp;quot;background-color: #ff9f9f&amp;quot; | No&lt;br /&gt;
| style=&amp;quot;background-color: #ff9f9f&amp;quot; | No&lt;br /&gt;
|-&lt;br /&gt;
| style=&amp;quot;text-align:right; padding-right:6px;&amp;quot; | RTA&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
|-&lt;br /&gt;
| style=&amp;quot;text-align:right; padding-right:6px;&amp;quot; | Biorad&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
|-&lt;br /&gt;
| style=&amp;quot;text-align:right; padding-right:6px;&amp;quot; | Plasma-preen asher&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
|-&lt;br /&gt;
| style=&amp;quot;text-align:right; padding-right:6px;&amp;quot; | Diener asher&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
|-&lt;br /&gt;
| style=&amp;quot;text-align:right; padding-right:6px;&amp;quot; | Spinners&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
|}&lt;/div&gt;</summary>
		<author><name>Nader</name></author>
	</entry>
	<entry>
		<id>https://wiki.nbi.ku.dk/w/cleanroom/index.php?title=Tools&amp;diff=1744</id>
		<title>Tools</title>
		<link rel="alternate" type="text/html" href="https://wiki.nbi.ku.dk/w/cleanroom/index.php?title=Tools&amp;diff=1744"/>
		<updated>2020-09-04T08:37:41Z</updated>

		<summary type="html">&lt;p&gt;Nader: /* Tool access requirement guidelines */&lt;/p&gt;
&lt;hr /&gt;
&lt;div&gt;A prerequisite for using the cleanroom tools is that a cleanroom staff member has given the necessary instruction or training. This includes basic instruments such as hotplates and microscopes. For &#039;&#039;&#039;all&#039;&#039;&#039; training requests, please contact [mailto:cleanroom@nbi.ku.dk cleanroom@nbi.ku.dk], and a cleanroom staff member will typically respond within one workday. Do not contact individual staff members for training. &lt;br /&gt;
&lt;br /&gt;
Once the user has completed the training, they are given booking rights in the [http://cleanroom.brickhost.com cleanroom booking system]. However, after a certain period of inactivity on a given tool, the booking rights will expire and the user will need to be retrained in order to continue using the tool.&lt;br /&gt;
&lt;br /&gt;
== Tool list ==&lt;br /&gt;
{| style=&amp;quot;width: 85%;&amp;quot;&lt;br /&gt;
|- style=&amp;quot;text-align:left;&amp;quot;&lt;br /&gt;
! Lithography !! Thin film &amp;amp; III-Vs !! Characterization !! Other&lt;br /&gt;
|- valign=&amp;quot;top&amp;quot; &lt;br /&gt;
| style=&amp;quot;width: 20%;&amp;quot; |&lt;br /&gt;
* [[Raith eLine]]&lt;br /&gt;
* [[Elionix|Elionix EBL system]]&lt;br /&gt;
* [[Heidelberg µPG 501|Heidelberg LED writer]]&lt;br /&gt;
* [[Süss mask aligner]]&lt;br /&gt;
| style=&amp;quot;width: 20%;&amp;quot; |&lt;br /&gt;
* [[AJA Systems]]&lt;br /&gt;
* [[E-Gun evaporator]]&lt;br /&gt;
* [[Edwards evaporator|Edwards thermal evaporator]]&lt;br /&gt;
* [[Laurell spinners]]&lt;br /&gt;
* [[Cambridge ALD]]&lt;br /&gt;
* [[Leica sputter coater]]&lt;br /&gt;
* MBE&lt;br /&gt;
| style=&amp;quot;width: 20%;&amp;quot; |&lt;br /&gt;
* [[JEOL 6320F|JEOL JSM-6320F]]&lt;br /&gt;
* [[JEOL 7800F|JEOL JSM-7800F]]&lt;br /&gt;
* [[Raith eLine]]&lt;br /&gt;
* [[Philips TEM]]&lt;br /&gt;
* [[Tencor profilometer]]&lt;br /&gt;
* [[Sensofar optical profiler]]&lt;br /&gt;
* [[Olympus BX51M|Olympus BX51M microscopes]]&lt;br /&gt;
* [[Bruker Dimension Icon AFM]]&lt;br /&gt;
| style=&amp;quot;width: 20%;&amp;quot; |&lt;br /&gt;
* [[Süss scriber]]&lt;br /&gt;
* [[Loomis scriber]]&lt;br /&gt;
* [[Dicing Saw]]&lt;br /&gt;
* [[AccuThermo RTA]]&lt;br /&gt;
* [[Plasma-Preen asher]]&lt;br /&gt;
* [[Diener plasma asher]]&lt;br /&gt;
&amp;lt;!-- * [[K&amp;amp;S Ball Bonder]] --&amp;gt;&lt;br /&gt;
* [[Präzitherm hotplates]]&lt;br /&gt;
|}&lt;br /&gt;
&lt;br /&gt;
== Tool access requirement guidelines ==&lt;br /&gt;
&lt;br /&gt;
{| cellspacing=0px style=&amp;quot;text-align: center;&amp;quot;&lt;br /&gt;
! scope=&amp;quot;col&amp;quot; width=&amp;quot;20%&amp;quot; align=&amp;quot;right&amp;quot;  | &lt;br /&gt;
! scope=&amp;quot;col&amp;quot; width=&amp;quot;20%&amp;quot; | Bachelor&lt;br /&gt;
! scope=&amp;quot;col&amp;quot; width=&amp;quot;20%&amp;quot; | Master&lt;br /&gt;
! scope=&amp;quot;col&amp;quot; width=&amp;quot;20%&amp;quot; | PhD&lt;br /&gt;
! scope=&amp;quot;col&amp;quot; width=&amp;quot;20%&amp;quot; | Postdoc&lt;br /&gt;
|-&lt;br /&gt;
| style=&amp;quot;text-align:right; padding-right:6px;&amp;quot; |  eLine&lt;br /&gt;
| style=&amp;quot;background-color: #ff9f9f&amp;quot; | No&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
|-&lt;br /&gt;
| style=&amp;quot;text-align:right; padding-right:6px;&amp;quot; | Elionix&lt;br /&gt;
| style=&amp;quot;background-color: #ff9f9f&amp;quot; | No&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
|-&lt;br /&gt;
| style=&amp;quot;text-align:right; padding-right:6px;&amp;quot; | Heidelberg&lt;br /&gt;
| style=&amp;quot;background-color: #ff9f9f&amp;quot; | No&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
|-&lt;br /&gt;
| style=&amp;quot;text-align:right; padding-right:6px;&amp;quot; | Mask aligner&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
|-&lt;br /&gt;
| style=&amp;quot;padding-bottom:6px;&amp;quot; |&lt;br /&gt;
|-&lt;br /&gt;
| style=&amp;quot;text-align:right; padding-right:6px;&amp;quot; | AJAs&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
|-&lt;br /&gt;
| style=&amp;quot;text-align:right; padding-right:6px;&amp;quot; | e-gun&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
|-&lt;br /&gt;
| style=&amp;quot;text-align:right; padding-right:6px;&amp;quot; | Edwards&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
|-&lt;br /&gt;
| style=&amp;quot;text-align:right; padding-right:6px;&amp;quot; | ALD&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
|-&lt;br /&gt;
| style=&amp;quot;text-align:right; padding-right:6px;&amp;quot; | Leica&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
|-&lt;br /&gt;
| style=&amp;quot;padding-bottom:6px;&amp;quot; |&lt;br /&gt;
|-&lt;br /&gt;
| style=&amp;quot;text-align:right; padding-right:6px;&amp;quot; | JEOL 6230F&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
|-&lt;br /&gt;
| style=&amp;quot;text-align:right; padding-right:6px;&amp;quot; | JEOL 7800F&lt;br /&gt;
| style=&amp;quot;background-color: #ff9f9f&amp;quot; | No&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
|-&lt;br /&gt;
| style=&amp;quot;text-align:right; padding-right:6px;&amp;quot; | TEM&lt;br /&gt;
| style=&amp;quot;background-color: #ff9f9f&amp;quot; | No&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
|-&lt;br /&gt;
| style=&amp;quot;text-align:right; padding-right:6px;&amp;quot; | Alphastep&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
|-&lt;br /&gt;
| style=&amp;quot;text-align:right; padding-right:6px;&amp;quot; | Sensofar&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
|-&lt;br /&gt;
| style=&amp;quot;text-align:right; padding-right:6px;&amp;quot; | AFM&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
|-&lt;br /&gt;
| style=&amp;quot;padding-bottom:6px;&amp;quot; |&lt;br /&gt;
|-&lt;br /&gt;
| style=&amp;quot;text-align:right; padding-right:6px;&amp;quot; | Süss scriber&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
|-&lt;br /&gt;
| style=&amp;quot;text-align:right; padding-right:6px;&amp;quot; | Loomis scriber&lt;br /&gt;
| style=&amp;quot;background-color: #ff9f9f&amp;quot; | No&lt;br /&gt;
| style=&amp;quot;background-color: #ff9f9f&amp;quot; | No&lt;br /&gt;
| style=&amp;quot;background-color: #ff9f9f&amp;quot; | No&lt;br /&gt;
| style=&amp;quot;background-color: #ff9f9f&amp;quot; | No&lt;br /&gt;
|-&lt;br /&gt;
| style=&amp;quot;text-align:right; padding-right:6px;&amp;quot; | RTA&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
|-&lt;br /&gt;
| style=&amp;quot;text-align:right; padding-right:6px;&amp;quot; | Biorad&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
|-&lt;br /&gt;
| style=&amp;quot;text-align:right; padding-right:6px;&amp;quot; | Plasma-preen asher&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
|-&lt;br /&gt;
| style=&amp;quot;text-align:right; padding-right:6px;&amp;quot; | Diener asher&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
|-&lt;br /&gt;
| style=&amp;quot;text-align:right; padding-right:6px;&amp;quot; | Spinners&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
|}&lt;/div&gt;</summary>
		<author><name>Nader</name></author>
	</entry>
	<entry>
		<id>https://wiki.nbi.ku.dk/w/cleanroom/index.php?title=Tools&amp;diff=1743</id>
		<title>Tools</title>
		<link rel="alternate" type="text/html" href="https://wiki.nbi.ku.dk/w/cleanroom/index.php?title=Tools&amp;diff=1743"/>
		<updated>2020-09-04T08:36:17Z</updated>

		<summary type="html">&lt;p&gt;Nader: /* Tool access requirement guidelines */&lt;/p&gt;
&lt;hr /&gt;
&lt;div&gt;A prerequisite for using the cleanroom tools is that a cleanroom staff member has given the necessary instruction or training. This includes basic instruments such as hotplates and microscopes. For &#039;&#039;&#039;all&#039;&#039;&#039; training requests, please contact [mailto:cleanroom@nbi.ku.dk cleanroom@nbi.ku.dk], and a cleanroom staff member will typically respond within one workday. Do not contact individual staff members for training. &lt;br /&gt;
&lt;br /&gt;
Once the user has completed the training, they are given booking rights in the [http://cleanroom.brickhost.com cleanroom booking system]. However, after a certain period of inactivity on a given tool, the booking rights will expire and the user will need to be retrained in order to continue using the tool.&lt;br /&gt;
&lt;br /&gt;
== Tool list ==&lt;br /&gt;
{| style=&amp;quot;width: 85%;&amp;quot;&lt;br /&gt;
|- style=&amp;quot;text-align:left;&amp;quot;&lt;br /&gt;
! Lithography !! Thin film &amp;amp; III-Vs !! Characterization !! Other&lt;br /&gt;
|- valign=&amp;quot;top&amp;quot; &lt;br /&gt;
| style=&amp;quot;width: 20%;&amp;quot; |&lt;br /&gt;
* [[Raith eLine]]&lt;br /&gt;
* [[Elionix|Elionix EBL system]]&lt;br /&gt;
* [[Heidelberg µPG 501|Heidelberg LED writer]]&lt;br /&gt;
* [[Süss mask aligner]]&lt;br /&gt;
| style=&amp;quot;width: 20%;&amp;quot; |&lt;br /&gt;
* [[AJA Systems]]&lt;br /&gt;
* [[E-Gun evaporator]]&lt;br /&gt;
* [[Edwards evaporator|Edwards thermal evaporator]]&lt;br /&gt;
* [[Laurell spinners]]&lt;br /&gt;
* [[Cambridge ALD]]&lt;br /&gt;
* [[Leica sputter coater]]&lt;br /&gt;
* MBE&lt;br /&gt;
| style=&amp;quot;width: 20%;&amp;quot; |&lt;br /&gt;
* [[JEOL 6320F|JEOL JSM-6320F]]&lt;br /&gt;
* [[JEOL 7800F|JEOL JSM-7800F]]&lt;br /&gt;
* [[Raith eLine]]&lt;br /&gt;
* [[Philips TEM]]&lt;br /&gt;
* [[Tencor profilometer]]&lt;br /&gt;
* [[Sensofar optical profiler]]&lt;br /&gt;
* [[Olympus BX51M|Olympus BX51M microscopes]]&lt;br /&gt;
* [[Bruker Dimension Icon AFM]]&lt;br /&gt;
| style=&amp;quot;width: 20%;&amp;quot; |&lt;br /&gt;
* [[Süss scriber]]&lt;br /&gt;
* [[Loomis scriber]]&lt;br /&gt;
* [[Dicing Saw]]&lt;br /&gt;
* [[AccuThermo RTA]]&lt;br /&gt;
* [[Plasma-Preen asher]]&lt;br /&gt;
* [[Diener plasma asher]]&lt;br /&gt;
&amp;lt;!-- * [[K&amp;amp;S Ball Bonder]] --&amp;gt;&lt;br /&gt;
* [[Präzitherm hotplates]]&lt;br /&gt;
|}&lt;br /&gt;
&lt;br /&gt;
== Tool access requirement guidelines ==&lt;br /&gt;
&lt;br /&gt;
{| cellspacing=0px style=&amp;quot;text-align: center;&amp;quot;&lt;br /&gt;
! scope=&amp;quot;col&amp;quot; width=&amp;quot;20%&amp;quot; align=&amp;quot;right&amp;quot;  | &lt;br /&gt;
! scope=&amp;quot;col&amp;quot; width=&amp;quot;20%&amp;quot; | Bachelor&lt;br /&gt;
! scope=&amp;quot;col&amp;quot; width=&amp;quot;20%&amp;quot; | Master&lt;br /&gt;
! scope=&amp;quot;col&amp;quot; width=&amp;quot;20%&amp;quot; | PhD&lt;br /&gt;
! scope=&amp;quot;col&amp;quot; width=&amp;quot;20%&amp;quot; | Postdoc&lt;br /&gt;
|-&lt;br /&gt;
| style=&amp;quot;text-align:right; padding-right:6px;&amp;quot; |  eLine&lt;br /&gt;
| style=&amp;quot;background-color: #ff9f9f&amp;quot; | No&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
|-&lt;br /&gt;
| style=&amp;quot;text-align:right; padding-right:6px;&amp;quot; | Elionix&lt;br /&gt;
| style=&amp;quot;background-color: #ff9f9f&amp;quot; | No&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
|-&lt;br /&gt;
| style=&amp;quot;text-align:right; padding-right:6px;&amp;quot; | Heidelberg&lt;br /&gt;
| style=&amp;quot;background-color: #ff9f9f&amp;quot; | No&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
|-&lt;br /&gt;
| style=&amp;quot;text-align:right; padding-right:6px;&amp;quot; | Mask aligner&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
|-&lt;br /&gt;
| style=&amp;quot;padding-bottom:6px;&amp;quot; |&lt;br /&gt;
|-&lt;br /&gt;
| style=&amp;quot;text-align:right; padding-right:6px;&amp;quot; | AJAs&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
|-&lt;br /&gt;
| style=&amp;quot;text-align:right; padding-right:6px;&amp;quot; | e-gun&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
|-&lt;br /&gt;
| style=&amp;quot;text-align:right; padding-right:6px;&amp;quot; | Edwards&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
|-&lt;br /&gt;
| style=&amp;quot;text-align:right; padding-right:6px;&amp;quot; | ALD&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
|-&lt;br /&gt;
| style=&amp;quot;text-align:right; padding-right:6px;&amp;quot; | Leica&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
|-&lt;br /&gt;
| style=&amp;quot;padding-bottom:6px;&amp;quot; |&lt;br /&gt;
|-&lt;br /&gt;
| style=&amp;quot;text-align:right; padding-right:6px;&amp;quot; | JEOL 6230F&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
|-&lt;br /&gt;
| style=&amp;quot;text-align:right; padding-right:6px;&amp;quot; | JEOL 7800F&lt;br /&gt;
| style=&amp;quot;background-color: #ff9f9f&amp;quot; | No&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
|-&lt;br /&gt;
| style=&amp;quot;text-align:right; padding-right:6px;&amp;quot; | TEM&lt;br /&gt;
| style=&amp;quot;background-color: #ff9f9f&amp;quot; | No&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
|-&lt;br /&gt;
| style=&amp;quot;text-align:right; padding-right:6px;&amp;quot; | Alphastep&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
|-&lt;br /&gt;
| style=&amp;quot;text-align:right; padding-right:6px;&amp;quot; | Sensofar&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
|-&lt;br /&gt;
| style=&amp;quot;text-align:right; padding-right:6px;&amp;quot; | AFM&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
|-&lt;br /&gt;
| style=&amp;quot;padding-bottom:6px;&amp;quot; |&lt;br /&gt;
|-&lt;br /&gt;
| style=&amp;quot;text-align:right; padding-right:6px;&amp;quot; | Süss scriber&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
|-&lt;br /&gt;
| style=&amp;quot;text-align:right; padding-right:6px;&amp;quot; | Loomis scriber&lt;br /&gt;
| style=&amp;quot;background-color: #ff9f9f&amp;quot; | No&lt;br /&gt;
| style=&amp;quot;background-color: #ff9f9f&amp;quot; | No&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | No&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | No&lt;br /&gt;
|-&lt;br /&gt;
| style=&amp;quot;text-align:right; padding-right:6px;&amp;quot; | RTA&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
|-&lt;br /&gt;
| style=&amp;quot;text-align:right; padding-right:6px;&amp;quot; | Biorad&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
|-&lt;br /&gt;
| style=&amp;quot;text-align:right; padding-right:6px;&amp;quot; | Plasma-preen asher&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
|-&lt;br /&gt;
| style=&amp;quot;text-align:right; padding-right:6px;&amp;quot; | Diener asher&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
|-&lt;br /&gt;
| style=&amp;quot;text-align:right; padding-right:6px;&amp;quot; | Spinners&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
|}&lt;/div&gt;</summary>
		<author><name>Nader</name></author>
	</entry>
	<entry>
		<id>https://wiki.nbi.ku.dk/w/cleanroom/index.php?title=Tools&amp;diff=1709</id>
		<title>Tools</title>
		<link rel="alternate" type="text/html" href="https://wiki.nbi.ku.dk/w/cleanroom/index.php?title=Tools&amp;diff=1709"/>
		<updated>2020-08-26T12:19:52Z</updated>

		<summary type="html">&lt;p&gt;Nader: /* Tool list */&lt;/p&gt;
&lt;hr /&gt;
&lt;div&gt;A prerequisite for using the cleanroom tools is that a cleanroom staff member has given the necessary instruction or training. This includes basic instruments such as hotplates and microscopes. For &#039;&#039;&#039;all&#039;&#039;&#039; training requests, please contact [mailto:cleanroom@nbi.ku.dk cleanroom@nbi.ku.dk], and a cleanroom staff member will typically respond within one workday. Do not contact individual staff members for training. &lt;br /&gt;
&lt;br /&gt;
Once the user has completed the training, they are given booking rights in the [http://cleanroom.brickhost.com cleanroom booking system]. However, after a certain period of inactivity on a given tool, the booking rights will expire and the user will need to be retrained in order to continue using the tool.&lt;br /&gt;
&lt;br /&gt;
== Tool list ==&lt;br /&gt;
{| style=&amp;quot;width: 85%;&amp;quot;&lt;br /&gt;
|- style=&amp;quot;text-align:left;&amp;quot;&lt;br /&gt;
! Lithography !! Thin film &amp;amp; III-Vs !! Characterization !! Other&lt;br /&gt;
|- valign=&amp;quot;top&amp;quot; &lt;br /&gt;
| style=&amp;quot;width: 20%;&amp;quot; |&lt;br /&gt;
* [[Raith eLine]]&lt;br /&gt;
* [[Elionix|Elionix EBL system]]&lt;br /&gt;
* [[Heidelberg µPG 501|Heidelberg LED writer]]&lt;br /&gt;
* [[Süss mask aligner]]&lt;br /&gt;
| style=&amp;quot;width: 20%;&amp;quot; |&lt;br /&gt;
* [[AJA Systems]]&lt;br /&gt;
* [[E-Gun evaporator]]&lt;br /&gt;
* [[Edwards evaporator|Edwards thermal evaporator]]&lt;br /&gt;
* [[Laurell spinners]]&lt;br /&gt;
* [[Cambridge ALD]]&lt;br /&gt;
* [[Leica sputter coater]]&lt;br /&gt;
* MBE&lt;br /&gt;
| style=&amp;quot;width: 20%;&amp;quot; |&lt;br /&gt;
* [[JEOL 6320F|JEOL JSM-6320F]]&lt;br /&gt;
* [[JEOL 7800F|JEOL JSM-7800F]]&lt;br /&gt;
* [[Raith eLine]]&lt;br /&gt;
* [[Philips TEM]]&lt;br /&gt;
* [[Tencor profilometer]]&lt;br /&gt;
* [[Sensofar optical profiler]]&lt;br /&gt;
* [[Olympus BX51M|Olympus BX51M microscopes]]&lt;br /&gt;
* [[Bruker Dimension Icon AFM]]&lt;br /&gt;
| style=&amp;quot;width: 20%;&amp;quot; |&lt;br /&gt;
* [[Süss scriber]]&lt;br /&gt;
* [[Loomis scriber]]&lt;br /&gt;
* [[Dicing Saw]]&lt;br /&gt;
* [[AccuThermo RTA]]&lt;br /&gt;
* [[Plasma-Preen asher]]&lt;br /&gt;
* [[Diener plasma asher]]&lt;br /&gt;
&amp;lt;!-- * [[K&amp;amp;S Ball Bonder]] --&amp;gt;&lt;br /&gt;
* [[Präzitherm hotplates]]&lt;br /&gt;
|}&lt;br /&gt;
&lt;br /&gt;
== Tool access requirement guidelines ==&lt;br /&gt;
&lt;br /&gt;
{| cellspacing=0px style=&amp;quot;text-align: center;&amp;quot;&lt;br /&gt;
! scope=&amp;quot;col&amp;quot; width=&amp;quot;20%&amp;quot; align=&amp;quot;right&amp;quot;  | &lt;br /&gt;
! scope=&amp;quot;col&amp;quot; width=&amp;quot;20%&amp;quot; | Bachelor&lt;br /&gt;
! scope=&amp;quot;col&amp;quot; width=&amp;quot;20%&amp;quot; | Master&lt;br /&gt;
! scope=&amp;quot;col&amp;quot; width=&amp;quot;20%&amp;quot; | PhD&lt;br /&gt;
! scope=&amp;quot;col&amp;quot; width=&amp;quot;20%&amp;quot; | Postdoc&lt;br /&gt;
|-&lt;br /&gt;
| style=&amp;quot;text-align:right; padding-right:6px;&amp;quot; |  eLine&lt;br /&gt;
| style=&amp;quot;background-color: #ff9f9f&amp;quot; | No&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
|-&lt;br /&gt;
| style=&amp;quot;text-align:right; padding-right:6px;&amp;quot; | Elionix&lt;br /&gt;
| style=&amp;quot;background-color: #ff9f9f&amp;quot; | No&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
|-&lt;br /&gt;
| style=&amp;quot;text-align:right; padding-right:6px;&amp;quot; | Heidelberg&lt;br /&gt;
| style=&amp;quot;background-color: #ff9f9f&amp;quot; | No&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
|-&lt;br /&gt;
| style=&amp;quot;text-align:right; padding-right:6px;&amp;quot; | Mask aligner&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
|-&lt;br /&gt;
| style=&amp;quot;padding-bottom:6px;&amp;quot; |&lt;br /&gt;
|-&lt;br /&gt;
| style=&amp;quot;text-align:right; padding-right:6px;&amp;quot; | AJAs&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
|-&lt;br /&gt;
| style=&amp;quot;text-align:right; padding-right:6px;&amp;quot; | e-gun&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
|-&lt;br /&gt;
| style=&amp;quot;text-align:right; padding-right:6px;&amp;quot; | Edwards&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
|-&lt;br /&gt;
| style=&amp;quot;text-align:right; padding-right:6px;&amp;quot; | ALD&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
|-&lt;br /&gt;
| style=&amp;quot;text-align:right; padding-right:6px;&amp;quot; | Leica&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
|-&lt;br /&gt;
| style=&amp;quot;padding-bottom:6px;&amp;quot; |&lt;br /&gt;
|-&lt;br /&gt;
| style=&amp;quot;text-align:right; padding-right:6px;&amp;quot; | JEOL 6230F&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
|-&lt;br /&gt;
| style=&amp;quot;text-align:right; padding-right:6px;&amp;quot; | JEOL 7800F&lt;br /&gt;
| style=&amp;quot;background-color: #ff9f9f&amp;quot; | No&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
|-&lt;br /&gt;
| style=&amp;quot;text-align:right; padding-right:6px;&amp;quot; | TEM&lt;br /&gt;
| style=&amp;quot;background-color: #ff9f9f&amp;quot; | No&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
|-&lt;br /&gt;
| style=&amp;quot;text-align:right; padding-right:6px;&amp;quot; | Alphastep&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
|-&lt;br /&gt;
| style=&amp;quot;text-align:right; padding-right:6px;&amp;quot; | Sensofar&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
|-&lt;br /&gt;
| style=&amp;quot;text-align:right; padding-right:6px;&amp;quot; | AFM&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
|-&lt;br /&gt;
| style=&amp;quot;padding-bottom:6px;&amp;quot; |&lt;br /&gt;
|-&lt;br /&gt;
| style=&amp;quot;text-align:right; padding-right:6px;&amp;quot; | Süss scriber&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
|-&lt;br /&gt;
| style=&amp;quot;text-align:right; padding-right:6px;&amp;quot; | Loomis scriber&lt;br /&gt;
| style=&amp;quot;background-color: #ff9f9f&amp;quot; | No&lt;br /&gt;
| style=&amp;quot;background-color: #ff9f9f&amp;quot; | No*&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
|-&lt;br /&gt;
| style=&amp;quot;text-align:right; padding-right:6px;&amp;quot; | RTA&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
|-&lt;br /&gt;
| style=&amp;quot;text-align:right; padding-right:6px;&amp;quot; | Biorad&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
|-&lt;br /&gt;
| style=&amp;quot;text-align:right; padding-right:6px;&amp;quot; | Plasma-preen asher&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
|-&lt;br /&gt;
| style=&amp;quot;text-align:right; padding-right:6px;&amp;quot; | Diener asher&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
|-&lt;br /&gt;
| style=&amp;quot;text-align:right; padding-right:6px;&amp;quot; | Spinners&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
| style=&amp;quot;background-color: #c6e0b4&amp;quot; | Yes&lt;br /&gt;
|}&lt;/div&gt;</summary>
		<author><name>Nader</name></author>
	</entry>
	<entry>
		<id>https://wiki.nbi.ku.dk/w/cleanroom/index.php?title=Working_with_nanowires_and_nanotubes&amp;diff=1708</id>
		<title>Working with nanowires and nanotubes</title>
		<link rel="alternate" type="text/html" href="https://wiki.nbi.ku.dk/w/cleanroom/index.php?title=Working_with_nanowires_and_nanotubes&amp;diff=1708"/>
		<updated>2020-08-25T06:53:27Z</updated>

		<summary type="html">&lt;p&gt;Nader: /* Guidelines */&lt;/p&gt;
&lt;hr /&gt;
&lt;div&gt;When considering the possible health implications of working with nanowires and nanotubes, two issues needs to be taken seriously into account: their chemical composition and their size.&lt;br /&gt;
&lt;br /&gt;
For risk assessment in relation to the chemical composition please always consult the appropriate MSDS. This can be found at [http://www.kemibrug.dk kemibrug.dk]&lt;br /&gt;
&lt;br /&gt;
The possible implications of inhaling nanowires (carbon, silicon, indium arsenide, etc) are not yet fully investigated nor understood. It is thus sensible to assume that there might be a potential health risk associated with the inhalation of nanowires. The reason for this assumption is that the dimensions of nanowires and asbestos are similar. This means that the risk is associated to the ratio of the length &#039;&#039;l&#039;&#039; of the wire divided by its diameter &#039;&#039;d&#039;&#039; being larger than 3 and smaller than 10. The dimensions that might potentially cause the highest health risk are:&lt;br /&gt;
&lt;br /&gt;
&amp;lt;center&amp;gt;&lt;br /&gt;
8 μm &amp;lt; l &amp;lt; 100 μm &amp;lt;br /&amp;gt;&lt;br /&gt;
d &amp;lt; 250 nm &amp;lt;br /&amp;gt;&lt;br /&gt;
l/d &amp;gt; 3&lt;br /&gt;
&amp;lt;/center&amp;gt;&lt;br /&gt;
&lt;br /&gt;
As a consequence, certain precautions must be taken when working with nanowires in order to minimize the risk of inhaling them.&lt;br /&gt;
&lt;br /&gt;
= Guidelines = &lt;br /&gt;
&lt;br /&gt;
The health risks associated with nanowires and nanotubes are both based on airborne particles. Therefore reduction of the hazard associated with wires and dust is to minimize possibility of generating airborne particles.&lt;br /&gt;
&lt;br /&gt;
Hazard reduction instructions are:&lt;br /&gt;
* Hygienic work conditions (no eating nor drinking in the lab, wet cleaning of surfaces after experiment and washing of hands after experiments).&lt;br /&gt;
* [[General_rules_for_working_in_the_cleanroom#Personal_protective_equipment|Personal protective equipment]] (gloves, face-mask, etc) must be worn. Note that the effectiveness of a face mask for very small particles is not proven.&lt;br /&gt;
* Process your sample in a fume hood or under local fume extraction&lt;br /&gt;
* Keep process wet as long as possible.&lt;br /&gt;
* Wear a class P3 [https://en.wikipedia.org/wiki/Respirator particulate respiratory face mask] or use fume exhaust during cleaving of nanowire samples. If you need a respiratory face mask please ask a clean room staff member for advice before purchasing.&lt;br /&gt;
* Clean surfaces with wet wipes to prevent nanowire or nanotubes from becoming airborne and dispose wipes as toxic waste.&lt;br /&gt;
&lt;br /&gt;
It is important to note that PPE such as a face mask is only the last resort in order to keep you safe. It is much more important to prevent wires from escaping by good laboratory practice and working under the fume hood than it is to behave irresponsibly and wear a facemask. Also remember that the dimensions of the particles are small in one direction, so your mask should ensure that dimension cannot get through. This means that only class P3 particulate filter masks will suffice!&lt;br /&gt;
&lt;br /&gt;
Remember, you are obliged to read the MSDS of all materials involved in your process before starting any work. If in doubt about anything please consult your supervisor, or a member of the NBI cleanroom staff.&lt;br /&gt;
&lt;br /&gt;
More info on health and safety in nanotechnology can be found on [http://www.i-bar.dk/media/2827533/nanopartikler-i-arbejdsmiljoeet-laboratorium_eng_pdf.pdf here] (English), and [http://www.i-bar.dk/media/3864560/nanopartikler-i-arbejdsmiljoeet.pdf here] (Danish), or [http://www.i-bar.dk/media/3864560/nanopartikler-i-arbejdsmiljoeet.pdf here] (Danish)&lt;/div&gt;</summary>
		<author><name>Nader</name></author>
	</entry>
	<entry>
		<id>https://wiki.nbi.ku.dk/w/cleanroom/index.php?title=About&amp;diff=1649</id>
		<title>About</title>
		<link rel="alternate" type="text/html" href="https://wiki.nbi.ku.dk/w/cleanroom/index.php?title=About&amp;diff=1649"/>
		<updated>2020-02-18T10:55:53Z</updated>

		<summary type="html">&lt;p&gt;Nader: /* Staff */&lt;/p&gt;
&lt;hr /&gt;
&lt;div&gt;== Cleanroom meetings ==&lt;br /&gt;
&lt;br /&gt;
The cleanroom staff and stake holders usually meet on Fridays at 12:30pm (HCØ 1st floor, room 03-1-114). Users who have special requests or would like to discuss a cleanroom issue can join such a meeting; contact staff or drop by.&lt;br /&gt;
&lt;br /&gt;
== Staff ==&lt;br /&gt;
&lt;br /&gt;
{| class=&amp;quot;wikitable&amp;quot;&lt;br /&gt;
|-&lt;br /&gt;
! Name&lt;br /&gt;
! Position&lt;br /&gt;
! Office&lt;br /&gt;
! Phone&lt;br /&gt;
! Email&lt;br /&gt;
|-&lt;br /&gt;
| Claus B. Sørensen&lt;br /&gt;
| technical head&lt;br /&gt;
| 03.02.216&lt;br /&gt;
| 28 75 04 49&lt;br /&gt;
| [mailto:cbs@nbi.ku.dk cbs@nbi.ku.dk]&lt;br /&gt;
|-&lt;br /&gt;
| Charles Marcus&lt;br /&gt;
| professor&lt;br /&gt;
| 03.04.406&lt;br /&gt;
| 20 34 11 81&lt;br /&gt;
| [mailto:marcus@nbi.ku.dk marcus@nbi.ku.dk]&lt;br /&gt;
|-&lt;br /&gt;
| Jesper Nygård&lt;br /&gt;
| professor&lt;br /&gt;
| 03.04.410&lt;br /&gt;
| 24 62 61 20&lt;br /&gt;
| [mailto:nygard@nbi.ku.dk nygard@nbi.ku.dk]&lt;br /&gt;
|-&lt;br /&gt;
| Nader Payami&lt;br /&gt;
| Chemical process engineer&lt;br /&gt;
| 03.02.214&lt;br /&gt;
| 28 75 04 50&lt;br /&gt;
| [mailto:nap@nbi.ku.dk nap@nbi.ku.dk]&lt;br /&gt;
|-&lt;br /&gt;
| Inger Jensen&lt;br /&gt;
| laborant&lt;br /&gt;
| 03.02.212&lt;br /&gt;
| 28 75 04 66&lt;br /&gt;
| [mailto:ijensen@nbi.ku.dk ijensen@nbi.ku.dk]&lt;br /&gt;
|-&lt;br /&gt;
| Henriette Lerche&lt;br /&gt;
| safety coordinator&lt;br /&gt;
| Blegdamsvej 17, Ka1&lt;br /&gt;
| 51 29 83 37&lt;br /&gt;
| [mailto:hlerche@nbi.ku.dk hlerche@nbi.ku.dk]&lt;br /&gt;
&amp;lt;!-- |-&lt;br /&gt;
| Shiv Upadhyay&lt;br /&gt;
| process specialist&lt;br /&gt;
| 03.02.212&lt;br /&gt;
| 21 28 90 25&lt;br /&gt;
| [mailto:shiv@nbi.ku.dk shiv@nbi.ku.dk] --&amp;gt;&lt;br /&gt;
|-&lt;br /&gt;
| Karolis Parfeniukas&lt;br /&gt;
| nanolithography specialist&lt;br /&gt;
| 03.02.212&lt;br /&gt;
| 50 31 40 55&lt;br /&gt;
| [mailto:karolis.parfeniukas@nbi.ku.dk karolis.parfeniukas@nbi.ku.dk]&lt;br /&gt;
|}&lt;/div&gt;</summary>
		<author><name>Nader</name></author>
	</entry>
	<entry>
		<id>https://wiki.nbi.ku.dk/w/cleanroom/index.php?title=AccuThermo_RTA&amp;diff=1630</id>
		<title>AccuThermo RTA</title>
		<link rel="alternate" type="text/html" href="https://wiki.nbi.ku.dk/w/cleanroom/index.php?title=AccuThermo_RTA&amp;diff=1630"/>
		<updated>2019-10-18T11:37:31Z</updated>

		<summary type="html">&lt;p&gt;Nader: /* Startup Procedure */&lt;/p&gt;
&lt;hr /&gt;
&lt;div&gt;{{Infobox tool&lt;br /&gt;
|image = Tool RTA.jpg&lt;br /&gt;
|toolfullname = AccuThermo AW 610&lt;br /&gt;
|website = https://allwin21.com/accuthermo-aw-610/&lt;br /&gt;
|company = Allwin21 Corp.&lt;br /&gt;
|description = Rapid thermal annealer&lt;br /&gt;
|location = 03.2.213&lt;br /&gt;
|primary = Nader&lt;br /&gt;
|secondary = Shiv&lt;br /&gt;
}}&lt;br /&gt;
&lt;br /&gt;
== RTP AW610 ==&lt;br /&gt;
&lt;br /&gt;
Short description&lt;br /&gt;
&lt;br /&gt;
&lt;br /&gt;
=== Startup Procedure ===&lt;br /&gt;
&lt;br /&gt;
If this is your first time using the machine, consult the Czar for training. You can use the computer to create a recipe without powering on the machine, so there is no reason not to do it first. Refer to &#039;&#039;&#039;Creating a recipe&#039;&#039;&#039;&lt;br /&gt;
&lt;br /&gt;
If your recipe is already created:&lt;br /&gt;
&lt;br /&gt;
:#Sign up the sheet..&lt;br /&gt;
:#Make sure the Lamp Power is set to &#039;&#039;&#039;OFF&#039;&#039;&#039;&lt;br /&gt;
:#Make sure the power switch on the wall is set to &#039;&#039;&#039;ON&#039;&#039;&#039;.&lt;br /&gt;
:#Check that the emergency button is not engaged( is pulled out ).&lt;br /&gt;
:#Load your sample into the susceptor.&lt;br /&gt;
:#Open oven door approx. &#039;&#039;&#039;10cm out.&#039;&#039;&#039; &#039;&#039;This will prevent any potential overpressure from shattering the quartz isolation chamber&#039;&#039;&lt;br /&gt;
:#Load the susceptor inside the chamber and close the door.&lt;br /&gt;
:#Open up for Air cooling valves&#039;&#039;&#039;(5.5 bar)&#039;&#039;&#039;.&lt;br /&gt;
:#Open up the process gas/gasses on the cylinders that you need by opening the main valves on the cylinders. Pressure of the regulator on secondary manometer should be set to &#039;&#039;&#039;1.5 bar&#039;&#039;&#039; ( Check them also during the run ).&lt;br /&gt;
:#Turn the blue valve on the blue tube to open for air cooling line. &#039;&#039;&#039;The pressure should be around 2.5 bar and the flow rate of above 280&#039;&#039;&#039;.&lt;br /&gt;
:#Turn the Lamp Power &#039;&#039;&#039;ON&#039;&#039;&#039; in front.&lt;br /&gt;
:#Choose and load your recipe.&lt;br /&gt;
:#Run the proces.&lt;br /&gt;
:#Check that the water flow is between &#039;&#039;&#039;500-700&#039;&#039;&#039; lph during your run( Flowmeter is below Scriber ).&lt;br /&gt;
&lt;br /&gt;
=== Power Down Procedure ===&lt;br /&gt;
&lt;br /&gt;
After the system has cooled down and the sample was removed:&lt;br /&gt;
&lt;br /&gt;
:#Make sure the Lamp Power is set to &#039;&#039;&#039;OFF&#039;&#039;&#039;&lt;br /&gt;
:#Open the oven door and unload the susceptor.&lt;br /&gt;
:#&#039;&#039;&#039;Put&#039;&#039;&#039; the wafer back in the oven and close the door.&lt;br /&gt;
:#Turn the blue knob on the blue tube the  line to &#039;&#039;&#039;Close&#039;&#039;&#039; position.&lt;br /&gt;
:#Close the main valves for the process gasses that have been used.&lt;br /&gt;
:#&#039;&#039;&#039;Close&#039;&#039;&#039; the Air cooling valves.&lt;br /&gt;
:# On the computer press ESC until the main menu appears.&lt;br /&gt;
:#&#039;&#039;&#039;Leave&#039;&#039;&#039; AC power at &#039;&#039;&#039;ON&#039;&#039;&#039; position at the wall&lt;br /&gt;
&lt;br /&gt;
For recipe creation and sample handling refer to the wiki.&lt;br /&gt;
&lt;br /&gt;
=== Creating a recipe ===&lt;br /&gt;
&lt;br /&gt;
For managing the annealing process the RTP AW610 uses a custom software suite. Before creating a recipe consider if you will be using a susceptor&#039;&#039;(refer to Sample loading)&#039;&#039;.&lt;br /&gt;
&lt;br /&gt;
To create a recipe:&lt;br /&gt;
&lt;br /&gt;
:*First navigate to &#039;&#039;&#039;&#039;&#039;Process for Engineer&#039;&#039;&#039;&#039;&#039; tab in the main menu&lt;br /&gt;
:*click on the &#039;&#039;&#039;NEW&#039;&#039;&#039; recipe in the recipe list&lt;br /&gt;
:*click on &#039;&#039;&#039;&#039;&#039;Edit Recipe&#039;&#039;&#039;&#039;&#039;&lt;br /&gt;
:*Write a new name for your recipe in the respective field and click on &#039;&#039;&#039;&#039;&#039;Save&#039;&#039;&#039;&#039;&#039;. This creates a new recipe in the list that you can now freely edit.&lt;br /&gt;
:*Check &#039;&#039;&#039;&#039;&#039;Sensor type&#039;&#039;&#039;&#039;&#039; to be set to &#039;&#039;&#039;&#039;&#039;Thermocouple&#039;&#039;&#039;&#039;&#039; and &#039;&#039;&#039;&#039;&#039;Wafer Type&#039;&#039;&#039;&#039;&#039; to be set to either &#039;&#039;&#039;&#039;&#039;Susceptor&#039;&#039;&#039;&#039;&#039; or &#039;&#039;&#039;&#039;&#039;Wafer&#039;&#039;&#039;&#039;&#039; depending on what you will be using.(&#039;&#039;consult Sample loading section&#039;&#039;)&lt;br /&gt;
&lt;br /&gt;
Other parameters should be left as they are unless you know what you are doing and want something different.&lt;br /&gt;
&lt;br /&gt;
You can now proceed with creating the recipe sequence itself. The available parameters are step number, function, time for a given step, temperature, init factor and gas flow for each connected process gas. Ignore the initiation factor.&lt;br /&gt;
&lt;br /&gt;
Main available functions are:&lt;br /&gt;
&lt;br /&gt;
:*&#039;&#039;&#039;Delay&#039;&#039;&#039; - keeps the lamp power off while maintaining other parametes, such as gas flow rates. Used for purging the chamber of air as an initial step and is a good option for cooling.&lt;br /&gt;
&lt;br /&gt;
:*&#039;&#039;&#039;Ramp&#039;&#039;&#039; - ramps the temperature up or down to a desired value. The ramping rate is calculated by &#039;&#039;&#039;&#039;&#039;time/target temperature&#039;&#039;&#039;&#039;&#039;. Note: &#039;&#039;when using a susceptor, maximum ramp up rates should not exceed 15C/s&#039;&#039;&lt;br /&gt;
&lt;br /&gt;
:*&#039;&#039;&#039;Steady&#039;&#039;&#039; - keeps the lamps turned on and the temperature at a set value. The ideal step for baking the sample at a particular temperatures for a longer time.&lt;br /&gt;
&lt;br /&gt;
===&#039;&#039;&#039;Important&#039;&#039;&#039;===&lt;br /&gt;
&lt;br /&gt;
&#039;&#039;&#039;The total flow rate through the chamber should never exceed 15slpm&#039;&#039;&#039;.&lt;br /&gt;
&lt;br /&gt;
&#039;&#039;&#039;At the temperatures above 600C the thermocouple begins to melt with the susceptor or a silicon wafer.&#039;&#039;&#039;&lt;br /&gt;
&lt;br /&gt;
&lt;br /&gt;
&lt;br /&gt;
Tips for creating a good recipe:&lt;br /&gt;
&lt;br /&gt;
A good initial step is to displace the normal atmosphere by Nitrogen. The total volume of the quartz chamber is 0.84l, therefore it is a good idea to start the process by letting Nitrogen flow into the chamber at around 5slpm for 15-20 seconds. After this initial step is complete, add or replace Nitrogen with a desired process gas.&lt;br /&gt;
&lt;br /&gt;
During &#039;&#039;&#039;&#039;&#039;Ramping&#039;&#039;&#039;&#039;&#039; and &#039;&#039;&#039;&#039;&#039;Steady&#039;&#039;&#039;&#039;&#039; step, the maximum total flow rate should be 5slpm&lt;br /&gt;
&lt;br /&gt;
It takes between 10-15 seconds for the machine to stabilize the temperature. Consider this when creating a multistep recipe.&lt;br /&gt;
&lt;br /&gt;
&lt;br /&gt;
&lt;br /&gt;
=== Sample loading ===&lt;br /&gt;
&lt;br /&gt;
The first rule: Dont touch anything behind the front door without gloves!&lt;br /&gt;
&lt;br /&gt;
The sample holder is a quartz tray. Be gentle when putting down your sample!&lt;br /&gt;
&lt;br /&gt;
=====Thermocouple=====&lt;br /&gt;
&lt;br /&gt;
The temperature measurement in the RTP is obtained with a thermocouple which is connected to the oven door. When placing a sample(a wafer or a susceptor) onto the quartz loading tray make sure that:&lt;br /&gt;
&lt;br /&gt;
::*the thermocople is still in one piece&lt;br /&gt;
::*the tip of the thermocouple is in contact with your sample&lt;br /&gt;
::*the two wires of the thermocouple are not in contact with eachother or the sample at any point&lt;br /&gt;
::*when closing the door ensure that the thermocouple will not be bent&lt;br /&gt;
&lt;br /&gt;
If not set correctly, the temperature readout will not be accurate and might lead to the destruction of the sample or the machine. Use your fingers of tweezers to gently shape the thermocople wires in a sort of a bow shaped spring. If broken, contact the Czar or refer to the Service Manual to replace it.&lt;br /&gt;
&lt;br /&gt;
=====Susceptor=====&lt;br /&gt;
&lt;br /&gt;
When using a small sample or if your sample is transparent to the radiation spectrum emitted by the lamps(like GaAs) you&#039;d want to use a susceptor. The susceptor is a SiC coated graphite piece that will evenly heat the sample that is placed inside.&lt;br /&gt;
&lt;br /&gt;
::* The inside of the susceptor should not be exposed outside of the cleanroom&lt;br /&gt;
::* Before loading your sample into the susceptor, examine the latter for cracks and scratches. If any deep scratches or cracks are present - use another one and report the issue to a Czar&lt;br /&gt;
::* With flow rates of around 5 slpm, the process gasses should have no problem reaching the inside of the susceptor&lt;br /&gt;
::* &#039;&#039;&#039;&#039;&#039;Be careful not to scratch the susceptor when placing your sample inside it&#039;&#039;&#039;&#039;&#039;&lt;br /&gt;
::* &#039;&#039;&#039;&#039;&#039;When using a susceptor the maximum heating rate should not exceed 15C/s!&#039;&#039;&#039;&#039;&#039;&lt;br /&gt;
::* &#039;&#039;&#039;&#039;&#039;Do not heat the susceptor without a sample inside it&#039;&#039;&#039;&#039;&#039;&lt;br /&gt;
::* Store the susceptor in a designated spot. Do not leave it in the oven.&lt;br /&gt;
&lt;br /&gt;
==[[RTP log]]==&lt;br /&gt;
&lt;br /&gt;
List of avalable spare parts and maintenance log&lt;br /&gt;
&lt;br /&gt;
[[Category:Tools]]&lt;/div&gt;</summary>
		<author><name>Nader</name></author>
	</entry>
	<entry>
		<id>https://wiki.nbi.ku.dk/w/cleanroom/index.php?title=AccuThermo_RTA&amp;diff=1629</id>
		<title>AccuThermo RTA</title>
		<link rel="alternate" type="text/html" href="https://wiki.nbi.ku.dk/w/cleanroom/index.php?title=AccuThermo_RTA&amp;diff=1629"/>
		<updated>2019-10-18T11:36:09Z</updated>

		<summary type="html">&lt;p&gt;Nader: /* Power Down Procedure */&lt;/p&gt;
&lt;hr /&gt;
&lt;div&gt;{{Infobox tool&lt;br /&gt;
|image = Tool RTA.jpg&lt;br /&gt;
|toolfullname = AccuThermo AW 610&lt;br /&gt;
|website = https://allwin21.com/accuthermo-aw-610/&lt;br /&gt;
|company = Allwin21 Corp.&lt;br /&gt;
|description = Rapid thermal annealer&lt;br /&gt;
|location = 03.2.213&lt;br /&gt;
|primary = Nader&lt;br /&gt;
|secondary = Shiv&lt;br /&gt;
}}&lt;br /&gt;
&lt;br /&gt;
== RTP AW610 ==&lt;br /&gt;
&lt;br /&gt;
Short description&lt;br /&gt;
&lt;br /&gt;
&lt;br /&gt;
=== Startup Procedure ===&lt;br /&gt;
&lt;br /&gt;
If this is your first time using the machine, consult the Czar for training. You can use the computer to create a recipe without powering on the machine, so there is no reason not to do it first. Refer to &#039;&#039;&#039;Creating a recipe&#039;&#039;&#039;&lt;br /&gt;
&lt;br /&gt;
If your recipe is already created:&lt;br /&gt;
&lt;br /&gt;
:#Sign up the sheet..&lt;br /&gt;
:#Make sure the Lamp Power is set to &#039;&#039;&#039;OFF&#039;&#039;&#039;&lt;br /&gt;
:#Make sure the power switch on the wall is set to &#039;&#039;&#039;ON&#039;&#039;&#039;.&lt;br /&gt;
:#Check that the emergency button is not engaged( is pulled out ).&lt;br /&gt;
:#Load your sample into the susceptor.&lt;br /&gt;
:#Open oven door approx. &#039;&#039;&#039;10cm out.&#039;&#039;&#039; &#039;&#039;This will prevent any potential overpressure from shattering the quartz isolation chamber&#039;&#039;&lt;br /&gt;
:#Load the susceptor inside the chamber and close the door.&lt;br /&gt;
:#Open up for Air cooling valves&#039;&#039;&#039;(5.5 bar)&#039;&#039;&#039;.&lt;br /&gt;
:#Open up the process gas/gasses on the cylinders that you need by opening the main valves on the cylinders. Pressure of the regulator on secondary manometer should be set to &#039;&#039;&#039;1.5 bar&#039;&#039;&#039; ( Check them also during the run ).&lt;br /&gt;
:#Turn the blue valve on the blue tube to open for air cooling line. &#039;&#039;&#039;The pressure should be around 2.5 bar and the flow rate of above 280&#039;&#039;&#039;.&lt;br /&gt;
:#Turn the Lamp Power &#039;&#039;&#039;ON&#039;&#039;&#039; in front.&lt;br /&gt;
:#Choose and load your recipe.&lt;br /&gt;
:#Run the proces.&lt;br /&gt;
:#Check that the water flow is between &#039;&#039;&#039;500-700&#039;&#039;&#039; lph during your run( Below Scriber ).&lt;br /&gt;
&lt;br /&gt;
=== Power Down Procedure ===&lt;br /&gt;
&lt;br /&gt;
After the system has cooled down and the sample was removed:&lt;br /&gt;
&lt;br /&gt;
:#Make sure the Lamp Power is set to &#039;&#039;&#039;OFF&#039;&#039;&#039;&lt;br /&gt;
:#Open the oven door and unload the susceptor.&lt;br /&gt;
:#&#039;&#039;&#039;Put&#039;&#039;&#039; the wafer back in the oven and close the door.&lt;br /&gt;
:#Turn the blue knob on the blue tube the  line to &#039;&#039;&#039;Close&#039;&#039;&#039; position.&lt;br /&gt;
:#Close the main valves for the process gasses that have been used.&lt;br /&gt;
:#&#039;&#039;&#039;Close&#039;&#039;&#039; the Air cooling valves.&lt;br /&gt;
:# On the computer press ESC until the main menu appears.&lt;br /&gt;
:#&#039;&#039;&#039;Leave&#039;&#039;&#039; AC power at &#039;&#039;&#039;ON&#039;&#039;&#039; position at the wall&lt;br /&gt;
&lt;br /&gt;
For recipe creation and sample handling refer to the wiki.&lt;br /&gt;
&lt;br /&gt;
=== Creating a recipe ===&lt;br /&gt;
&lt;br /&gt;
For managing the annealing process the RTP AW610 uses a custom software suite. Before creating a recipe consider if you will be using a susceptor&#039;&#039;(refer to Sample loading)&#039;&#039;.&lt;br /&gt;
&lt;br /&gt;
To create a recipe:&lt;br /&gt;
&lt;br /&gt;
:*First navigate to &#039;&#039;&#039;&#039;&#039;Process for Engineer&#039;&#039;&#039;&#039;&#039; tab in the main menu&lt;br /&gt;
:*click on the &#039;&#039;&#039;NEW&#039;&#039;&#039; recipe in the recipe list&lt;br /&gt;
:*click on &#039;&#039;&#039;&#039;&#039;Edit Recipe&#039;&#039;&#039;&#039;&#039;&lt;br /&gt;
:*Write a new name for your recipe in the respective field and click on &#039;&#039;&#039;&#039;&#039;Save&#039;&#039;&#039;&#039;&#039;. This creates a new recipe in the list that you can now freely edit.&lt;br /&gt;
:*Check &#039;&#039;&#039;&#039;&#039;Sensor type&#039;&#039;&#039;&#039;&#039; to be set to &#039;&#039;&#039;&#039;&#039;Thermocouple&#039;&#039;&#039;&#039;&#039; and &#039;&#039;&#039;&#039;&#039;Wafer Type&#039;&#039;&#039;&#039;&#039; to be set to either &#039;&#039;&#039;&#039;&#039;Susceptor&#039;&#039;&#039;&#039;&#039; or &#039;&#039;&#039;&#039;&#039;Wafer&#039;&#039;&#039;&#039;&#039; depending on what you will be using.(&#039;&#039;consult Sample loading section&#039;&#039;)&lt;br /&gt;
&lt;br /&gt;
Other parameters should be left as they are unless you know what you are doing and want something different.&lt;br /&gt;
&lt;br /&gt;
You can now proceed with creating the recipe sequence itself. The available parameters are step number, function, time for a given step, temperature, init factor and gas flow for each connected process gas. Ignore the initiation factor.&lt;br /&gt;
&lt;br /&gt;
Main available functions are:&lt;br /&gt;
&lt;br /&gt;
:*&#039;&#039;&#039;Delay&#039;&#039;&#039; - keeps the lamp power off while maintaining other parametes, such as gas flow rates. Used for purging the chamber of air as an initial step and is a good option for cooling.&lt;br /&gt;
&lt;br /&gt;
:*&#039;&#039;&#039;Ramp&#039;&#039;&#039; - ramps the temperature up or down to a desired value. The ramping rate is calculated by &#039;&#039;&#039;&#039;&#039;time/target temperature&#039;&#039;&#039;&#039;&#039;. Note: &#039;&#039;when using a susceptor, maximum ramp up rates should not exceed 15C/s&#039;&#039;&lt;br /&gt;
&lt;br /&gt;
:*&#039;&#039;&#039;Steady&#039;&#039;&#039; - keeps the lamps turned on and the temperature at a set value. The ideal step for baking the sample at a particular temperatures for a longer time.&lt;br /&gt;
&lt;br /&gt;
===&#039;&#039;&#039;Important&#039;&#039;&#039;===&lt;br /&gt;
&lt;br /&gt;
&#039;&#039;&#039;The total flow rate through the chamber should never exceed 15slpm&#039;&#039;&#039;.&lt;br /&gt;
&lt;br /&gt;
&#039;&#039;&#039;At the temperatures above 600C the thermocouple begins to melt with the susceptor or a silicon wafer.&#039;&#039;&#039;&lt;br /&gt;
&lt;br /&gt;
&lt;br /&gt;
&lt;br /&gt;
Tips for creating a good recipe:&lt;br /&gt;
&lt;br /&gt;
A good initial step is to displace the normal atmosphere by Nitrogen. The total volume of the quartz chamber is 0.84l, therefore it is a good idea to start the process by letting Nitrogen flow into the chamber at around 5slpm for 15-20 seconds. After this initial step is complete, add or replace Nitrogen with a desired process gas.&lt;br /&gt;
&lt;br /&gt;
During &#039;&#039;&#039;&#039;&#039;Ramping&#039;&#039;&#039;&#039;&#039; and &#039;&#039;&#039;&#039;&#039;Steady&#039;&#039;&#039;&#039;&#039; step, the maximum total flow rate should be 5slpm&lt;br /&gt;
&lt;br /&gt;
It takes between 10-15 seconds for the machine to stabilize the temperature. Consider this when creating a multistep recipe.&lt;br /&gt;
&lt;br /&gt;
&lt;br /&gt;
&lt;br /&gt;
=== Sample loading ===&lt;br /&gt;
&lt;br /&gt;
The first rule: Dont touch anything behind the front door without gloves!&lt;br /&gt;
&lt;br /&gt;
The sample holder is a quartz tray. Be gentle when putting down your sample!&lt;br /&gt;
&lt;br /&gt;
=====Thermocouple=====&lt;br /&gt;
&lt;br /&gt;
The temperature measurement in the RTP is obtained with a thermocouple which is connected to the oven door. When placing a sample(a wafer or a susceptor) onto the quartz loading tray make sure that:&lt;br /&gt;
&lt;br /&gt;
::*the thermocople is still in one piece&lt;br /&gt;
::*the tip of the thermocouple is in contact with your sample&lt;br /&gt;
::*the two wires of the thermocouple are not in contact with eachother or the sample at any point&lt;br /&gt;
::*when closing the door ensure that the thermocouple will not be bent&lt;br /&gt;
&lt;br /&gt;
If not set correctly, the temperature readout will not be accurate and might lead to the destruction of the sample or the machine. Use your fingers of tweezers to gently shape the thermocople wires in a sort of a bow shaped spring. If broken, contact the Czar or refer to the Service Manual to replace it.&lt;br /&gt;
&lt;br /&gt;
=====Susceptor=====&lt;br /&gt;
&lt;br /&gt;
When using a small sample or if your sample is transparent to the radiation spectrum emitted by the lamps(like GaAs) you&#039;d want to use a susceptor. The susceptor is a SiC coated graphite piece that will evenly heat the sample that is placed inside.&lt;br /&gt;
&lt;br /&gt;
::* The inside of the susceptor should not be exposed outside of the cleanroom&lt;br /&gt;
::* Before loading your sample into the susceptor, examine the latter for cracks and scratches. If any deep scratches or cracks are present - use another one and report the issue to a Czar&lt;br /&gt;
::* With flow rates of around 5 slpm, the process gasses should have no problem reaching the inside of the susceptor&lt;br /&gt;
::* &#039;&#039;&#039;&#039;&#039;Be careful not to scratch the susceptor when placing your sample inside it&#039;&#039;&#039;&#039;&#039;&lt;br /&gt;
::* &#039;&#039;&#039;&#039;&#039;When using a susceptor the maximum heating rate should not exceed 15C/s!&#039;&#039;&#039;&#039;&#039;&lt;br /&gt;
::* &#039;&#039;&#039;&#039;&#039;Do not heat the susceptor without a sample inside it&#039;&#039;&#039;&#039;&#039;&lt;br /&gt;
::* Store the susceptor in a designated spot. Do not leave it in the oven.&lt;br /&gt;
&lt;br /&gt;
==[[RTP log]]==&lt;br /&gt;
&lt;br /&gt;
List of avalable spare parts and maintenance log&lt;br /&gt;
&lt;br /&gt;
[[Category:Tools]]&lt;/div&gt;</summary>
		<author><name>Nader</name></author>
	</entry>
	<entry>
		<id>https://wiki.nbi.ku.dk/w/cleanroom/index.php?title=AccuThermo_RTA&amp;diff=1628</id>
		<title>AccuThermo RTA</title>
		<link rel="alternate" type="text/html" href="https://wiki.nbi.ku.dk/w/cleanroom/index.php?title=AccuThermo_RTA&amp;diff=1628"/>
		<updated>2019-10-18T10:01:14Z</updated>

		<summary type="html">&lt;p&gt;Nader: /* Power Down Procedure */&lt;/p&gt;
&lt;hr /&gt;
&lt;div&gt;{{Infobox tool&lt;br /&gt;
|image = Tool RTA.jpg&lt;br /&gt;
|toolfullname = AccuThermo AW 610&lt;br /&gt;
|website = https://allwin21.com/accuthermo-aw-610/&lt;br /&gt;
|company = Allwin21 Corp.&lt;br /&gt;
|description = Rapid thermal annealer&lt;br /&gt;
|location = 03.2.213&lt;br /&gt;
|primary = Nader&lt;br /&gt;
|secondary = Shiv&lt;br /&gt;
}}&lt;br /&gt;
&lt;br /&gt;
== RTP AW610 ==&lt;br /&gt;
&lt;br /&gt;
Short description&lt;br /&gt;
&lt;br /&gt;
&lt;br /&gt;
=== Startup Procedure ===&lt;br /&gt;
&lt;br /&gt;
If this is your first time using the machine, consult the Czar for training. You can use the computer to create a recipe without powering on the machine, so there is no reason not to do it first. Refer to &#039;&#039;&#039;Creating a recipe&#039;&#039;&#039;&lt;br /&gt;
&lt;br /&gt;
If your recipe is already created:&lt;br /&gt;
&lt;br /&gt;
:#Sign up the sheet..&lt;br /&gt;
:#Make sure the Lamp Power is set to &#039;&#039;&#039;OFF&#039;&#039;&#039;&lt;br /&gt;
:#Make sure the power switch on the wall is set to &#039;&#039;&#039;ON&#039;&#039;&#039;.&lt;br /&gt;
:#Check that the emergency button is not engaged( is pulled out ).&lt;br /&gt;
:#Load your sample into the susceptor.&lt;br /&gt;
:#Open oven door approx. &#039;&#039;&#039;10cm out.&#039;&#039;&#039; &#039;&#039;This will prevent any potential overpressure from shattering the quartz isolation chamber&#039;&#039;&lt;br /&gt;
:#Load the susceptor inside the chamber and close the door.&lt;br /&gt;
:#Open up for Air cooling valves&#039;&#039;&#039;(5.5 bar)&#039;&#039;&#039;.&lt;br /&gt;
:#Open up the process gas/gasses on the cylinders that you need by opening the main valves on the cylinders. Pressure of the regulator on secondary manometer should be set to &#039;&#039;&#039;1.5 bar&#039;&#039;&#039; ( Check them also during the run ).&lt;br /&gt;
:#Turn the blue valve on the blue tube to open for air cooling line. &#039;&#039;&#039;The pressure should be around 2.5 bar and the flow rate of above 280&#039;&#039;&#039;.&lt;br /&gt;
:#Turn the Lamp Power &#039;&#039;&#039;ON&#039;&#039;&#039; in front.&lt;br /&gt;
:#Choose and load your recipe.&lt;br /&gt;
:#Run the proces.&lt;br /&gt;
:#Check that the water flow is between &#039;&#039;&#039;500-700&#039;&#039;&#039; lph during your run( Below Scriber ).&lt;br /&gt;
&lt;br /&gt;
=== Power Down Procedure ===&lt;br /&gt;
&lt;br /&gt;
After the system has cooled down and the sample was removed:&lt;br /&gt;
&lt;br /&gt;
:#Make sure the Lamp Power is set to &#039;&#039;&#039;OFF&#039;&#039;&#039;&lt;br /&gt;
:#Open the oven door and unload the susceptor.&lt;br /&gt;
:#&#039;&#039;&#039;Put&#039;&#039;&#039; the wafer back in the oven and close the door.&lt;br /&gt;
:#Turn the blue knob on the blue tube the  line to &#039;&#039;&#039;Close&#039;&#039;&#039; position.&lt;br /&gt;
:#Close the main valves for the process gasses that have been used.&lt;br /&gt;
:#&#039;&#039;&#039;Close&#039;&#039;&#039; the Air cooling valves.&lt;br /&gt;
:# On the computer press ESC until the main menu appears.&lt;br /&gt;
:#&#039;&#039;&#039;Leave&#039;&#039;&#039; AC power at &#039;&#039;&#039;ON&#039;&#039;&#039; positio at the wall&lt;br /&gt;
&lt;br /&gt;
For recipe creation and sample handling refer to the wiki.&lt;br /&gt;
&lt;br /&gt;
=== Creating a recipe ===&lt;br /&gt;
&lt;br /&gt;
For managing the annealing process the RTP AW610 uses a custom software suite. Before creating a recipe consider if you will be using a susceptor&#039;&#039;(refer to Sample loading)&#039;&#039;.&lt;br /&gt;
&lt;br /&gt;
To create a recipe:&lt;br /&gt;
&lt;br /&gt;
:*First navigate to &#039;&#039;&#039;&#039;&#039;Process for Engineer&#039;&#039;&#039;&#039;&#039; tab in the main menu&lt;br /&gt;
:*click on the &#039;&#039;&#039;NEW&#039;&#039;&#039; recipe in the recipe list&lt;br /&gt;
:*click on &#039;&#039;&#039;&#039;&#039;Edit Recipe&#039;&#039;&#039;&#039;&#039;&lt;br /&gt;
:*Write a new name for your recipe in the respective field and click on &#039;&#039;&#039;&#039;&#039;Save&#039;&#039;&#039;&#039;&#039;. This creates a new recipe in the list that you can now freely edit.&lt;br /&gt;
:*Check &#039;&#039;&#039;&#039;&#039;Sensor type&#039;&#039;&#039;&#039;&#039; to be set to &#039;&#039;&#039;&#039;&#039;Thermocouple&#039;&#039;&#039;&#039;&#039; and &#039;&#039;&#039;&#039;&#039;Wafer Type&#039;&#039;&#039;&#039;&#039; to be set to either &#039;&#039;&#039;&#039;&#039;Susceptor&#039;&#039;&#039;&#039;&#039; or &#039;&#039;&#039;&#039;&#039;Wafer&#039;&#039;&#039;&#039;&#039; depending on what you will be using.(&#039;&#039;consult Sample loading section&#039;&#039;)&lt;br /&gt;
&lt;br /&gt;
Other parameters should be left as they are unless you know what you are doing and want something different.&lt;br /&gt;
&lt;br /&gt;
You can now proceed with creating the recipe sequence itself. The available parameters are step number, function, time for a given step, temperature, init factor and gas flow for each connected process gas. Ignore the initiation factor.&lt;br /&gt;
&lt;br /&gt;
Main available functions are:&lt;br /&gt;
&lt;br /&gt;
:*&#039;&#039;&#039;Delay&#039;&#039;&#039; - keeps the lamp power off while maintaining other parametes, such as gas flow rates. Used for purging the chamber of air as an initial step and is a good option for cooling.&lt;br /&gt;
&lt;br /&gt;
:*&#039;&#039;&#039;Ramp&#039;&#039;&#039; - ramps the temperature up or down to a desired value. The ramping rate is calculated by &#039;&#039;&#039;&#039;&#039;time/target temperature&#039;&#039;&#039;&#039;&#039;. Note: &#039;&#039;when using a susceptor, maximum ramp up rates should not exceed 15C/s&#039;&#039;&lt;br /&gt;
&lt;br /&gt;
:*&#039;&#039;&#039;Steady&#039;&#039;&#039; - keeps the lamps turned on and the temperature at a set value. The ideal step for baking the sample at a particular temperatures for a longer time.&lt;br /&gt;
&lt;br /&gt;
===&#039;&#039;&#039;Important&#039;&#039;&#039;===&lt;br /&gt;
&lt;br /&gt;
&#039;&#039;&#039;The total flow rate through the chamber should never exceed 15slpm&#039;&#039;&#039;.&lt;br /&gt;
&lt;br /&gt;
&#039;&#039;&#039;At the temperatures above 600C the thermocouple begins to melt with the susceptor or a silicon wafer.&#039;&#039;&#039;&lt;br /&gt;
&lt;br /&gt;
&lt;br /&gt;
&lt;br /&gt;
Tips for creating a good recipe:&lt;br /&gt;
&lt;br /&gt;
A good initial step is to displace the normal atmosphere by Nitrogen. The total volume of the quartz chamber is 0.84l, therefore it is a good idea to start the process by letting Nitrogen flow into the chamber at around 5slpm for 15-20 seconds. After this initial step is complete, add or replace Nitrogen with a desired process gas.&lt;br /&gt;
&lt;br /&gt;
During &#039;&#039;&#039;&#039;&#039;Ramping&#039;&#039;&#039;&#039;&#039; and &#039;&#039;&#039;&#039;&#039;Steady&#039;&#039;&#039;&#039;&#039; step, the maximum total flow rate should be 5slpm&lt;br /&gt;
&lt;br /&gt;
It takes between 10-15 seconds for the machine to stabilize the temperature. Consider this when creating a multistep recipe.&lt;br /&gt;
&lt;br /&gt;
&lt;br /&gt;
&lt;br /&gt;
=== Sample loading ===&lt;br /&gt;
&lt;br /&gt;
The first rule: Dont touch anything behind the front door without gloves!&lt;br /&gt;
&lt;br /&gt;
The sample holder is a quartz tray. Be gentle when putting down your sample!&lt;br /&gt;
&lt;br /&gt;
=====Thermocouple=====&lt;br /&gt;
&lt;br /&gt;
The temperature measurement in the RTP is obtained with a thermocouple which is connected to the oven door. When placing a sample(a wafer or a susceptor) onto the quartz loading tray make sure that:&lt;br /&gt;
&lt;br /&gt;
::*the thermocople is still in one piece&lt;br /&gt;
::*the tip of the thermocouple is in contact with your sample&lt;br /&gt;
::*the two wires of the thermocouple are not in contact with eachother or the sample at any point&lt;br /&gt;
::*when closing the door ensure that the thermocouple will not be bent&lt;br /&gt;
&lt;br /&gt;
If not set correctly, the temperature readout will not be accurate and might lead to the destruction of the sample or the machine. Use your fingers of tweezers to gently shape the thermocople wires in a sort of a bow shaped spring. If broken, contact the Czar or refer to the Service Manual to replace it.&lt;br /&gt;
&lt;br /&gt;
=====Susceptor=====&lt;br /&gt;
&lt;br /&gt;
When using a small sample or if your sample is transparent to the radiation spectrum emitted by the lamps(like GaAs) you&#039;d want to use a susceptor. The susceptor is a SiC coated graphite piece that will evenly heat the sample that is placed inside.&lt;br /&gt;
&lt;br /&gt;
::* The inside of the susceptor should not be exposed outside of the cleanroom&lt;br /&gt;
::* Before loading your sample into the susceptor, examine the latter for cracks and scratches. If any deep scratches or cracks are present - use another one and report the issue to a Czar&lt;br /&gt;
::* With flow rates of around 5 slpm, the process gasses should have no problem reaching the inside of the susceptor&lt;br /&gt;
::* &#039;&#039;&#039;&#039;&#039;Be careful not to scratch the susceptor when placing your sample inside it&#039;&#039;&#039;&#039;&#039;&lt;br /&gt;
::* &#039;&#039;&#039;&#039;&#039;When using a susceptor the maximum heating rate should not exceed 15C/s!&#039;&#039;&#039;&#039;&#039;&lt;br /&gt;
::* &#039;&#039;&#039;&#039;&#039;Do not heat the susceptor without a sample inside it&#039;&#039;&#039;&#039;&#039;&lt;br /&gt;
::* Store the susceptor in a designated spot. Do not leave it in the oven.&lt;br /&gt;
&lt;br /&gt;
==[[RTP log]]==&lt;br /&gt;
&lt;br /&gt;
List of avalable spare parts and maintenance log&lt;br /&gt;
&lt;br /&gt;
[[Category:Tools]]&lt;/div&gt;</summary>
		<author><name>Nader</name></author>
	</entry>
	<entry>
		<id>https://wiki.nbi.ku.dk/w/cleanroom/index.php?title=AccuThermo_RTA&amp;diff=1627</id>
		<title>AccuThermo RTA</title>
		<link rel="alternate" type="text/html" href="https://wiki.nbi.ku.dk/w/cleanroom/index.php?title=AccuThermo_RTA&amp;diff=1627"/>
		<updated>2019-10-18T10:00:47Z</updated>

		<summary type="html">&lt;p&gt;Nader: /* Power Down Procedure */&lt;/p&gt;
&lt;hr /&gt;
&lt;div&gt;{{Infobox tool&lt;br /&gt;
|image = Tool RTA.jpg&lt;br /&gt;
|toolfullname = AccuThermo AW 610&lt;br /&gt;
|website = https://allwin21.com/accuthermo-aw-610/&lt;br /&gt;
|company = Allwin21 Corp.&lt;br /&gt;
|description = Rapid thermal annealer&lt;br /&gt;
|location = 03.2.213&lt;br /&gt;
|primary = Nader&lt;br /&gt;
|secondary = Shiv&lt;br /&gt;
}}&lt;br /&gt;
&lt;br /&gt;
== RTP AW610 ==&lt;br /&gt;
&lt;br /&gt;
Short description&lt;br /&gt;
&lt;br /&gt;
&lt;br /&gt;
=== Startup Procedure ===&lt;br /&gt;
&lt;br /&gt;
If this is your first time using the machine, consult the Czar for training. You can use the computer to create a recipe without powering on the machine, so there is no reason not to do it first. Refer to &#039;&#039;&#039;Creating a recipe&#039;&#039;&#039;&lt;br /&gt;
&lt;br /&gt;
If your recipe is already created:&lt;br /&gt;
&lt;br /&gt;
:#Sign up the sheet..&lt;br /&gt;
:#Make sure the Lamp Power is set to &#039;&#039;&#039;OFF&#039;&#039;&#039;&lt;br /&gt;
:#Make sure the power switch on the wall is set to &#039;&#039;&#039;ON&#039;&#039;&#039;.&lt;br /&gt;
:#Check that the emergency button is not engaged( is pulled out ).&lt;br /&gt;
:#Load your sample into the susceptor.&lt;br /&gt;
:#Open oven door approx. &#039;&#039;&#039;10cm out.&#039;&#039;&#039; &#039;&#039;This will prevent any potential overpressure from shattering the quartz isolation chamber&#039;&#039;&lt;br /&gt;
:#Load the susceptor inside the chamber and close the door.&lt;br /&gt;
:#Open up for Air cooling valves&#039;&#039;&#039;(5.5 bar)&#039;&#039;&#039;.&lt;br /&gt;
:#Open up the process gas/gasses on the cylinders that you need by opening the main valves on the cylinders. Pressure of the regulator on secondary manometer should be set to &#039;&#039;&#039;1.5 bar&#039;&#039;&#039; ( Check them also during the run ).&lt;br /&gt;
:#Turn the blue valve on the blue tube to open for air cooling line. &#039;&#039;&#039;The pressure should be around 2.5 bar and the flow rate of above 280&#039;&#039;&#039;.&lt;br /&gt;
:#Turn the Lamp Power &#039;&#039;&#039;ON&#039;&#039;&#039; in front.&lt;br /&gt;
:#Choose and load your recipe.&lt;br /&gt;
:#Run the proces.&lt;br /&gt;
:#Check that the water flow is between &#039;&#039;&#039;500-700&#039;&#039;&#039; lph during your run( Below Scriber ).&lt;br /&gt;
&lt;br /&gt;
=== Power Down Procedure ===&lt;br /&gt;
&lt;br /&gt;
After the system has cooled down and the sample was removed:&lt;br /&gt;
&lt;br /&gt;
:#Make sure the Lamp Power is set to &#039;&#039;&#039;OFF&#039;&#039;&#039;&lt;br /&gt;
:#Open the oven door and unload the susceptor.&lt;br /&gt;
:#&#039;&#039;&#039;Put&#039;&#039;&#039; the wafer back in the oven and close the door.&lt;br /&gt;
:#Turn the blue knob on the blue tube the  line to &#039;&#039;&#039;Close&#039;&#039;&#039; position.&lt;br /&gt;
:#Close the main valves for the process gasses that have been used.&lt;br /&gt;
:#&#039;&#039;&#039;Close&#039;&#039;&#039; the Air cooling valves.&lt;br /&gt;
:# On the computer press ESC until the main menu appears.&lt;br /&gt;
:#&#039;&#039;&#039;Leave&#039;&#039;&#039; AC power at &#039;&#039;&#039;ON&#039;&#039;&#039; positio at the wall&lt;br /&gt;
&lt;br /&gt;
: For recipe creation and sample handling refer to the wiki.&lt;br /&gt;
&lt;br /&gt;
=== Creating a recipe ===&lt;br /&gt;
&lt;br /&gt;
For managing the annealing process the RTP AW610 uses a custom software suite. Before creating a recipe consider if you will be using a susceptor&#039;&#039;(refer to Sample loading)&#039;&#039;.&lt;br /&gt;
&lt;br /&gt;
To create a recipe:&lt;br /&gt;
&lt;br /&gt;
:*First navigate to &#039;&#039;&#039;&#039;&#039;Process for Engineer&#039;&#039;&#039;&#039;&#039; tab in the main menu&lt;br /&gt;
:*click on the &#039;&#039;&#039;NEW&#039;&#039;&#039; recipe in the recipe list&lt;br /&gt;
:*click on &#039;&#039;&#039;&#039;&#039;Edit Recipe&#039;&#039;&#039;&#039;&#039;&lt;br /&gt;
:*Write a new name for your recipe in the respective field and click on &#039;&#039;&#039;&#039;&#039;Save&#039;&#039;&#039;&#039;&#039;. This creates a new recipe in the list that you can now freely edit.&lt;br /&gt;
:*Check &#039;&#039;&#039;&#039;&#039;Sensor type&#039;&#039;&#039;&#039;&#039; to be set to &#039;&#039;&#039;&#039;&#039;Thermocouple&#039;&#039;&#039;&#039;&#039; and &#039;&#039;&#039;&#039;&#039;Wafer Type&#039;&#039;&#039;&#039;&#039; to be set to either &#039;&#039;&#039;&#039;&#039;Susceptor&#039;&#039;&#039;&#039;&#039; or &#039;&#039;&#039;&#039;&#039;Wafer&#039;&#039;&#039;&#039;&#039; depending on what you will be using.(&#039;&#039;consult Sample loading section&#039;&#039;)&lt;br /&gt;
&lt;br /&gt;
Other parameters should be left as they are unless you know what you are doing and want something different.&lt;br /&gt;
&lt;br /&gt;
You can now proceed with creating the recipe sequence itself. The available parameters are step number, function, time for a given step, temperature, init factor and gas flow for each connected process gas. Ignore the initiation factor.&lt;br /&gt;
&lt;br /&gt;
Main available functions are:&lt;br /&gt;
&lt;br /&gt;
:*&#039;&#039;&#039;Delay&#039;&#039;&#039; - keeps the lamp power off while maintaining other parametes, such as gas flow rates. Used for purging the chamber of air as an initial step and is a good option for cooling.&lt;br /&gt;
&lt;br /&gt;
:*&#039;&#039;&#039;Ramp&#039;&#039;&#039; - ramps the temperature up or down to a desired value. The ramping rate is calculated by &#039;&#039;&#039;&#039;&#039;time/target temperature&#039;&#039;&#039;&#039;&#039;. Note: &#039;&#039;when using a susceptor, maximum ramp up rates should not exceed 15C/s&#039;&#039;&lt;br /&gt;
&lt;br /&gt;
:*&#039;&#039;&#039;Steady&#039;&#039;&#039; - keeps the lamps turned on and the temperature at a set value. The ideal step for baking the sample at a particular temperatures for a longer time.&lt;br /&gt;
&lt;br /&gt;
===&#039;&#039;&#039;Important&#039;&#039;&#039;===&lt;br /&gt;
&lt;br /&gt;
&#039;&#039;&#039;The total flow rate through the chamber should never exceed 15slpm&#039;&#039;&#039;.&lt;br /&gt;
&lt;br /&gt;
&#039;&#039;&#039;At the temperatures above 600C the thermocouple begins to melt with the susceptor or a silicon wafer.&#039;&#039;&#039;&lt;br /&gt;
&lt;br /&gt;
&lt;br /&gt;
&lt;br /&gt;
Tips for creating a good recipe:&lt;br /&gt;
&lt;br /&gt;
A good initial step is to displace the normal atmosphere by Nitrogen. The total volume of the quartz chamber is 0.84l, therefore it is a good idea to start the process by letting Nitrogen flow into the chamber at around 5slpm for 15-20 seconds. After this initial step is complete, add or replace Nitrogen with a desired process gas.&lt;br /&gt;
&lt;br /&gt;
During &#039;&#039;&#039;&#039;&#039;Ramping&#039;&#039;&#039;&#039;&#039; and &#039;&#039;&#039;&#039;&#039;Steady&#039;&#039;&#039;&#039;&#039; step, the maximum total flow rate should be 5slpm&lt;br /&gt;
&lt;br /&gt;
It takes between 10-15 seconds for the machine to stabilize the temperature. Consider this when creating a multistep recipe.&lt;br /&gt;
&lt;br /&gt;
&lt;br /&gt;
&lt;br /&gt;
=== Sample loading ===&lt;br /&gt;
&lt;br /&gt;
The first rule: Dont touch anything behind the front door without gloves!&lt;br /&gt;
&lt;br /&gt;
The sample holder is a quartz tray. Be gentle when putting down your sample!&lt;br /&gt;
&lt;br /&gt;
=====Thermocouple=====&lt;br /&gt;
&lt;br /&gt;
The temperature measurement in the RTP is obtained with a thermocouple which is connected to the oven door. When placing a sample(a wafer or a susceptor) onto the quartz loading tray make sure that:&lt;br /&gt;
&lt;br /&gt;
::*the thermocople is still in one piece&lt;br /&gt;
::*the tip of the thermocouple is in contact with your sample&lt;br /&gt;
::*the two wires of the thermocouple are not in contact with eachother or the sample at any point&lt;br /&gt;
::*when closing the door ensure that the thermocouple will not be bent&lt;br /&gt;
&lt;br /&gt;
If not set correctly, the temperature readout will not be accurate and might lead to the destruction of the sample or the machine. Use your fingers of tweezers to gently shape the thermocople wires in a sort of a bow shaped spring. If broken, contact the Czar or refer to the Service Manual to replace it.&lt;br /&gt;
&lt;br /&gt;
=====Susceptor=====&lt;br /&gt;
&lt;br /&gt;
When using a small sample or if your sample is transparent to the radiation spectrum emitted by the lamps(like GaAs) you&#039;d want to use a susceptor. The susceptor is a SiC coated graphite piece that will evenly heat the sample that is placed inside.&lt;br /&gt;
&lt;br /&gt;
::* The inside of the susceptor should not be exposed outside of the cleanroom&lt;br /&gt;
::* Before loading your sample into the susceptor, examine the latter for cracks and scratches. If any deep scratches or cracks are present - use another one and report the issue to a Czar&lt;br /&gt;
::* With flow rates of around 5 slpm, the process gasses should have no problem reaching the inside of the susceptor&lt;br /&gt;
::* &#039;&#039;&#039;&#039;&#039;Be careful not to scratch the susceptor when placing your sample inside it&#039;&#039;&#039;&#039;&#039;&lt;br /&gt;
::* &#039;&#039;&#039;&#039;&#039;When using a susceptor the maximum heating rate should not exceed 15C/s!&#039;&#039;&#039;&#039;&#039;&lt;br /&gt;
::* &#039;&#039;&#039;&#039;&#039;Do not heat the susceptor without a sample inside it&#039;&#039;&#039;&#039;&#039;&lt;br /&gt;
::* Store the susceptor in a designated spot. Do not leave it in the oven.&lt;br /&gt;
&lt;br /&gt;
==[[RTP log]]==&lt;br /&gt;
&lt;br /&gt;
List of avalable spare parts and maintenance log&lt;br /&gt;
&lt;br /&gt;
[[Category:Tools]]&lt;/div&gt;</summary>
		<author><name>Nader</name></author>
	</entry>
	<entry>
		<id>https://wiki.nbi.ku.dk/w/cleanroom/index.php?title=AccuThermo_RTA&amp;diff=1626</id>
		<title>AccuThermo RTA</title>
		<link rel="alternate" type="text/html" href="https://wiki.nbi.ku.dk/w/cleanroom/index.php?title=AccuThermo_RTA&amp;diff=1626"/>
		<updated>2019-10-18T10:00:35Z</updated>

		<summary type="html">&lt;p&gt;Nader: /* Power Down Procedure */&lt;/p&gt;
&lt;hr /&gt;
&lt;div&gt;{{Infobox tool&lt;br /&gt;
|image = Tool RTA.jpg&lt;br /&gt;
|toolfullname = AccuThermo AW 610&lt;br /&gt;
|website = https://allwin21.com/accuthermo-aw-610/&lt;br /&gt;
|company = Allwin21 Corp.&lt;br /&gt;
|description = Rapid thermal annealer&lt;br /&gt;
|location = 03.2.213&lt;br /&gt;
|primary = Nader&lt;br /&gt;
|secondary = Shiv&lt;br /&gt;
}}&lt;br /&gt;
&lt;br /&gt;
== RTP AW610 ==&lt;br /&gt;
&lt;br /&gt;
Short description&lt;br /&gt;
&lt;br /&gt;
&lt;br /&gt;
=== Startup Procedure ===&lt;br /&gt;
&lt;br /&gt;
If this is your first time using the machine, consult the Czar for training. You can use the computer to create a recipe without powering on the machine, so there is no reason not to do it first. Refer to &#039;&#039;&#039;Creating a recipe&#039;&#039;&#039;&lt;br /&gt;
&lt;br /&gt;
If your recipe is already created:&lt;br /&gt;
&lt;br /&gt;
:#Sign up the sheet..&lt;br /&gt;
:#Make sure the Lamp Power is set to &#039;&#039;&#039;OFF&#039;&#039;&#039;&lt;br /&gt;
:#Make sure the power switch on the wall is set to &#039;&#039;&#039;ON&#039;&#039;&#039;.&lt;br /&gt;
:#Check that the emergency button is not engaged( is pulled out ).&lt;br /&gt;
:#Load your sample into the susceptor.&lt;br /&gt;
:#Open oven door approx. &#039;&#039;&#039;10cm out.&#039;&#039;&#039; &#039;&#039;This will prevent any potential overpressure from shattering the quartz isolation chamber&#039;&#039;&lt;br /&gt;
:#Load the susceptor inside the chamber and close the door.&lt;br /&gt;
:#Open up for Air cooling valves&#039;&#039;&#039;(5.5 bar)&#039;&#039;&#039;.&lt;br /&gt;
:#Open up the process gas/gasses on the cylinders that you need by opening the main valves on the cylinders. Pressure of the regulator on secondary manometer should be set to &#039;&#039;&#039;1.5 bar&#039;&#039;&#039; ( Check them also during the run ).&lt;br /&gt;
:#Turn the blue valve on the blue tube to open for air cooling line. &#039;&#039;&#039;The pressure should be around 2.5 bar and the flow rate of above 280&#039;&#039;&#039;.&lt;br /&gt;
:#Turn the Lamp Power &#039;&#039;&#039;ON&#039;&#039;&#039; in front.&lt;br /&gt;
:#Choose and load your recipe.&lt;br /&gt;
:#Run the proces.&lt;br /&gt;
:#Check that the water flow is between &#039;&#039;&#039;500-700&#039;&#039;&#039; lph during your run( Below Scriber ).&lt;br /&gt;
&lt;br /&gt;
=== Power Down Procedure ===&lt;br /&gt;
&lt;br /&gt;
After the system has cooled down and the sample was removed:&lt;br /&gt;
&lt;br /&gt;
:#Make sure the Lamp Power is set to &#039;&#039;&#039;OFF&#039;&#039;&#039;&lt;br /&gt;
:#Open the oven door and unload the susceptor.&lt;br /&gt;
:#&#039;&#039;&#039;Put&#039;&#039;&#039; the wafer back in the oven and close the door.&lt;br /&gt;
:#Turn the blue knob on the blue tube the  line to &#039;&#039;&#039;Close&#039;&#039;&#039; position.&lt;br /&gt;
:#Close the main valves for the process gasses that have been used.&lt;br /&gt;
:#&#039;&#039;&#039;Close&#039;&#039;&#039; the Air cooling valves.&lt;br /&gt;
:# On the computer press ESC until the main menu appears.&lt;br /&gt;
:#&#039;&#039;&#039;Leave&#039;&#039;&#039; AC power at &#039;&#039;&#039;ON&#039;&#039;&#039; positio at the wall&lt;br /&gt;
: For recipe creation and sample handling refer to the wiki.&lt;br /&gt;
&lt;br /&gt;
=== Creating a recipe ===&lt;br /&gt;
&lt;br /&gt;
For managing the annealing process the RTP AW610 uses a custom software suite. Before creating a recipe consider if you will be using a susceptor&#039;&#039;(refer to Sample loading)&#039;&#039;.&lt;br /&gt;
&lt;br /&gt;
To create a recipe:&lt;br /&gt;
&lt;br /&gt;
:*First navigate to &#039;&#039;&#039;&#039;&#039;Process for Engineer&#039;&#039;&#039;&#039;&#039; tab in the main menu&lt;br /&gt;
:*click on the &#039;&#039;&#039;NEW&#039;&#039;&#039; recipe in the recipe list&lt;br /&gt;
:*click on &#039;&#039;&#039;&#039;&#039;Edit Recipe&#039;&#039;&#039;&#039;&#039;&lt;br /&gt;
:*Write a new name for your recipe in the respective field and click on &#039;&#039;&#039;&#039;&#039;Save&#039;&#039;&#039;&#039;&#039;. This creates a new recipe in the list that you can now freely edit.&lt;br /&gt;
:*Check &#039;&#039;&#039;&#039;&#039;Sensor type&#039;&#039;&#039;&#039;&#039; to be set to &#039;&#039;&#039;&#039;&#039;Thermocouple&#039;&#039;&#039;&#039;&#039; and &#039;&#039;&#039;&#039;&#039;Wafer Type&#039;&#039;&#039;&#039;&#039; to be set to either &#039;&#039;&#039;&#039;&#039;Susceptor&#039;&#039;&#039;&#039;&#039; or &#039;&#039;&#039;&#039;&#039;Wafer&#039;&#039;&#039;&#039;&#039; depending on what you will be using.(&#039;&#039;consult Sample loading section&#039;&#039;)&lt;br /&gt;
&lt;br /&gt;
Other parameters should be left as they are unless you know what you are doing and want something different.&lt;br /&gt;
&lt;br /&gt;
You can now proceed with creating the recipe sequence itself. The available parameters are step number, function, time for a given step, temperature, init factor and gas flow for each connected process gas. Ignore the initiation factor.&lt;br /&gt;
&lt;br /&gt;
Main available functions are:&lt;br /&gt;
&lt;br /&gt;
:*&#039;&#039;&#039;Delay&#039;&#039;&#039; - keeps the lamp power off while maintaining other parametes, such as gas flow rates. Used for purging the chamber of air as an initial step and is a good option for cooling.&lt;br /&gt;
&lt;br /&gt;
:*&#039;&#039;&#039;Ramp&#039;&#039;&#039; - ramps the temperature up or down to a desired value. The ramping rate is calculated by &#039;&#039;&#039;&#039;&#039;time/target temperature&#039;&#039;&#039;&#039;&#039;. Note: &#039;&#039;when using a susceptor, maximum ramp up rates should not exceed 15C/s&#039;&#039;&lt;br /&gt;
&lt;br /&gt;
:*&#039;&#039;&#039;Steady&#039;&#039;&#039; - keeps the lamps turned on and the temperature at a set value. The ideal step for baking the sample at a particular temperatures for a longer time.&lt;br /&gt;
&lt;br /&gt;
===&#039;&#039;&#039;Important&#039;&#039;&#039;===&lt;br /&gt;
&lt;br /&gt;
&#039;&#039;&#039;The total flow rate through the chamber should never exceed 15slpm&#039;&#039;&#039;.&lt;br /&gt;
&lt;br /&gt;
&#039;&#039;&#039;At the temperatures above 600C the thermocouple begins to melt with the susceptor or a silicon wafer.&#039;&#039;&#039;&lt;br /&gt;
&lt;br /&gt;
&lt;br /&gt;
&lt;br /&gt;
Tips for creating a good recipe:&lt;br /&gt;
&lt;br /&gt;
A good initial step is to displace the normal atmosphere by Nitrogen. The total volume of the quartz chamber is 0.84l, therefore it is a good idea to start the process by letting Nitrogen flow into the chamber at around 5slpm for 15-20 seconds. After this initial step is complete, add or replace Nitrogen with a desired process gas.&lt;br /&gt;
&lt;br /&gt;
During &#039;&#039;&#039;&#039;&#039;Ramping&#039;&#039;&#039;&#039;&#039; and &#039;&#039;&#039;&#039;&#039;Steady&#039;&#039;&#039;&#039;&#039; step, the maximum total flow rate should be 5slpm&lt;br /&gt;
&lt;br /&gt;
It takes between 10-15 seconds for the machine to stabilize the temperature. Consider this when creating a multistep recipe.&lt;br /&gt;
&lt;br /&gt;
&lt;br /&gt;
&lt;br /&gt;
=== Sample loading ===&lt;br /&gt;
&lt;br /&gt;
The first rule: Dont touch anything behind the front door without gloves!&lt;br /&gt;
&lt;br /&gt;
The sample holder is a quartz tray. Be gentle when putting down your sample!&lt;br /&gt;
&lt;br /&gt;
=====Thermocouple=====&lt;br /&gt;
&lt;br /&gt;
The temperature measurement in the RTP is obtained with a thermocouple which is connected to the oven door. When placing a sample(a wafer or a susceptor) onto the quartz loading tray make sure that:&lt;br /&gt;
&lt;br /&gt;
::*the thermocople is still in one piece&lt;br /&gt;
::*the tip of the thermocouple is in contact with your sample&lt;br /&gt;
::*the two wires of the thermocouple are not in contact with eachother or the sample at any point&lt;br /&gt;
::*when closing the door ensure that the thermocouple will not be bent&lt;br /&gt;
&lt;br /&gt;
If not set correctly, the temperature readout will not be accurate and might lead to the destruction of the sample or the machine. Use your fingers of tweezers to gently shape the thermocople wires in a sort of a bow shaped spring. If broken, contact the Czar or refer to the Service Manual to replace it.&lt;br /&gt;
&lt;br /&gt;
=====Susceptor=====&lt;br /&gt;
&lt;br /&gt;
When using a small sample or if your sample is transparent to the radiation spectrum emitted by the lamps(like GaAs) you&#039;d want to use a susceptor. The susceptor is a SiC coated graphite piece that will evenly heat the sample that is placed inside.&lt;br /&gt;
&lt;br /&gt;
::* The inside of the susceptor should not be exposed outside of the cleanroom&lt;br /&gt;
::* Before loading your sample into the susceptor, examine the latter for cracks and scratches. If any deep scratches or cracks are present - use another one and report the issue to a Czar&lt;br /&gt;
::* With flow rates of around 5 slpm, the process gasses should have no problem reaching the inside of the susceptor&lt;br /&gt;
::* &#039;&#039;&#039;&#039;&#039;Be careful not to scratch the susceptor when placing your sample inside it&#039;&#039;&#039;&#039;&#039;&lt;br /&gt;
::* &#039;&#039;&#039;&#039;&#039;When using a susceptor the maximum heating rate should not exceed 15C/s!&#039;&#039;&#039;&#039;&#039;&lt;br /&gt;
::* &#039;&#039;&#039;&#039;&#039;Do not heat the susceptor without a sample inside it&#039;&#039;&#039;&#039;&#039;&lt;br /&gt;
::* Store the susceptor in a designated spot. Do not leave it in the oven.&lt;br /&gt;
&lt;br /&gt;
==[[RTP log]]==&lt;br /&gt;
&lt;br /&gt;
List of avalable spare parts and maintenance log&lt;br /&gt;
&lt;br /&gt;
[[Category:Tools]]&lt;/div&gt;</summary>
		<author><name>Nader</name></author>
	</entry>
	<entry>
		<id>https://wiki.nbi.ku.dk/w/cleanroom/index.php?title=AccuThermo_RTA&amp;diff=1625</id>
		<title>AccuThermo RTA</title>
		<link rel="alternate" type="text/html" href="https://wiki.nbi.ku.dk/w/cleanroom/index.php?title=AccuThermo_RTA&amp;diff=1625"/>
		<updated>2019-10-18T09:59:57Z</updated>

		<summary type="html">&lt;p&gt;Nader: /* Power Down Procedure */&lt;/p&gt;
&lt;hr /&gt;
&lt;div&gt;{{Infobox tool&lt;br /&gt;
|image = Tool RTA.jpg&lt;br /&gt;
|toolfullname = AccuThermo AW 610&lt;br /&gt;
|website = https://allwin21.com/accuthermo-aw-610/&lt;br /&gt;
|company = Allwin21 Corp.&lt;br /&gt;
|description = Rapid thermal annealer&lt;br /&gt;
|location = 03.2.213&lt;br /&gt;
|primary = Nader&lt;br /&gt;
|secondary = Shiv&lt;br /&gt;
}}&lt;br /&gt;
&lt;br /&gt;
== RTP AW610 ==&lt;br /&gt;
&lt;br /&gt;
Short description&lt;br /&gt;
&lt;br /&gt;
&lt;br /&gt;
=== Startup Procedure ===&lt;br /&gt;
&lt;br /&gt;
If this is your first time using the machine, consult the Czar for training. You can use the computer to create a recipe without powering on the machine, so there is no reason not to do it first. Refer to &#039;&#039;&#039;Creating a recipe&#039;&#039;&#039;&lt;br /&gt;
&lt;br /&gt;
If your recipe is already created:&lt;br /&gt;
&lt;br /&gt;
:#Sign up the sheet..&lt;br /&gt;
:#Make sure the Lamp Power is set to &#039;&#039;&#039;OFF&#039;&#039;&#039;&lt;br /&gt;
:#Make sure the power switch on the wall is set to &#039;&#039;&#039;ON&#039;&#039;&#039;.&lt;br /&gt;
:#Check that the emergency button is not engaged( is pulled out ).&lt;br /&gt;
:#Load your sample into the susceptor.&lt;br /&gt;
:#Open oven door approx. &#039;&#039;&#039;10cm out.&#039;&#039;&#039; &#039;&#039;This will prevent any potential overpressure from shattering the quartz isolation chamber&#039;&#039;&lt;br /&gt;
:#Load the susceptor inside the chamber and close the door.&lt;br /&gt;
:#Open up for Air cooling valves&#039;&#039;&#039;(5.5 bar)&#039;&#039;&#039;.&lt;br /&gt;
:#Open up the process gas/gasses on the cylinders that you need by opening the main valves on the cylinders. Pressure of the regulator on secondary manometer should be set to &#039;&#039;&#039;1.5 bar&#039;&#039;&#039; ( Check them also during the run ).&lt;br /&gt;
:#Turn the blue valve on the blue tube to open for air cooling line. &#039;&#039;&#039;The pressure should be around 2.5 bar and the flow rate of above 280&#039;&#039;&#039;.&lt;br /&gt;
:#Turn the Lamp Power &#039;&#039;&#039;ON&#039;&#039;&#039; in front.&lt;br /&gt;
:#Choose and load your recipe.&lt;br /&gt;
:#Run the proces.&lt;br /&gt;
:#Check that the water flow is between &#039;&#039;&#039;500-700&#039;&#039;&#039; lph during your run( Below Scriber ).&lt;br /&gt;
&lt;br /&gt;
=== Power Down Procedure ===&lt;br /&gt;
&lt;br /&gt;
After the system has cooled down and the sample was removed:&lt;br /&gt;
&lt;br /&gt;
:#Make sure the Lamp Power is set to &#039;&#039;&#039;OFF&#039;&#039;&#039;&lt;br /&gt;
:#Open the oven door and unload the susceptor.&lt;br /&gt;
:#&#039;&#039;&#039;Put&#039;&#039;&#039; the wafer back in the oven and close the door.&lt;br /&gt;
:#Turn the blue knob on the blue tube the  line to &#039;&#039;&#039;Close&#039;&#039;&#039; position.&lt;br /&gt;
:#Close the main valves for the process gasses that have been used.&lt;br /&gt;
:#&#039;&#039;&#039;Close&#039;&#039;&#039; the Air cooling valves.&lt;br /&gt;
:# On the computer press ESC until the main menu appears.&lt;br /&gt;
:#&#039;&#039;&#039;Leave&#039;&#039;&#039; AC power at &#039;&#039;&#039;ON&#039;&#039;&#039; positio at the wall&lt;br /&gt;
:# For recipe creation and sample handling refer to the wiki.&lt;br /&gt;
&lt;br /&gt;
=== Creating a recipe ===&lt;br /&gt;
&lt;br /&gt;
For managing the annealing process the RTP AW610 uses a custom software suite. Before creating a recipe consider if you will be using a susceptor&#039;&#039;(refer to Sample loading)&#039;&#039;.&lt;br /&gt;
&lt;br /&gt;
To create a recipe:&lt;br /&gt;
&lt;br /&gt;
:*First navigate to &#039;&#039;&#039;&#039;&#039;Process for Engineer&#039;&#039;&#039;&#039;&#039; tab in the main menu&lt;br /&gt;
:*click on the &#039;&#039;&#039;NEW&#039;&#039;&#039; recipe in the recipe list&lt;br /&gt;
:*click on &#039;&#039;&#039;&#039;&#039;Edit Recipe&#039;&#039;&#039;&#039;&#039;&lt;br /&gt;
:*Write a new name for your recipe in the respective field and click on &#039;&#039;&#039;&#039;&#039;Save&#039;&#039;&#039;&#039;&#039;. This creates a new recipe in the list that you can now freely edit.&lt;br /&gt;
:*Check &#039;&#039;&#039;&#039;&#039;Sensor type&#039;&#039;&#039;&#039;&#039; to be set to &#039;&#039;&#039;&#039;&#039;Thermocouple&#039;&#039;&#039;&#039;&#039; and &#039;&#039;&#039;&#039;&#039;Wafer Type&#039;&#039;&#039;&#039;&#039; to be set to either &#039;&#039;&#039;&#039;&#039;Susceptor&#039;&#039;&#039;&#039;&#039; or &#039;&#039;&#039;&#039;&#039;Wafer&#039;&#039;&#039;&#039;&#039; depending on what you will be using.(&#039;&#039;consult Sample loading section&#039;&#039;)&lt;br /&gt;
&lt;br /&gt;
Other parameters should be left as they are unless you know what you are doing and want something different.&lt;br /&gt;
&lt;br /&gt;
You can now proceed with creating the recipe sequence itself. The available parameters are step number, function, time for a given step, temperature, init factor and gas flow for each connected process gas. Ignore the initiation factor.&lt;br /&gt;
&lt;br /&gt;
Main available functions are:&lt;br /&gt;
&lt;br /&gt;
:*&#039;&#039;&#039;Delay&#039;&#039;&#039; - keeps the lamp power off while maintaining other parametes, such as gas flow rates. Used for purging the chamber of air as an initial step and is a good option for cooling.&lt;br /&gt;
&lt;br /&gt;
:*&#039;&#039;&#039;Ramp&#039;&#039;&#039; - ramps the temperature up or down to a desired value. The ramping rate is calculated by &#039;&#039;&#039;&#039;&#039;time/target temperature&#039;&#039;&#039;&#039;&#039;. Note: &#039;&#039;when using a susceptor, maximum ramp up rates should not exceed 15C/s&#039;&#039;&lt;br /&gt;
&lt;br /&gt;
:*&#039;&#039;&#039;Steady&#039;&#039;&#039; - keeps the lamps turned on and the temperature at a set value. The ideal step for baking the sample at a particular temperatures for a longer time.&lt;br /&gt;
&lt;br /&gt;
===&#039;&#039;&#039;Important&#039;&#039;&#039;===&lt;br /&gt;
&lt;br /&gt;
&#039;&#039;&#039;The total flow rate through the chamber should never exceed 15slpm&#039;&#039;&#039;.&lt;br /&gt;
&lt;br /&gt;
&#039;&#039;&#039;At the temperatures above 600C the thermocouple begins to melt with the susceptor or a silicon wafer.&#039;&#039;&#039;&lt;br /&gt;
&lt;br /&gt;
&lt;br /&gt;
&lt;br /&gt;
Tips for creating a good recipe:&lt;br /&gt;
&lt;br /&gt;
A good initial step is to displace the normal atmosphere by Nitrogen. The total volume of the quartz chamber is 0.84l, therefore it is a good idea to start the process by letting Nitrogen flow into the chamber at around 5slpm for 15-20 seconds. After this initial step is complete, add or replace Nitrogen with a desired process gas.&lt;br /&gt;
&lt;br /&gt;
During &#039;&#039;&#039;&#039;&#039;Ramping&#039;&#039;&#039;&#039;&#039; and &#039;&#039;&#039;&#039;&#039;Steady&#039;&#039;&#039;&#039;&#039; step, the maximum total flow rate should be 5slpm&lt;br /&gt;
&lt;br /&gt;
It takes between 10-15 seconds for the machine to stabilize the temperature. Consider this when creating a multistep recipe.&lt;br /&gt;
&lt;br /&gt;
&lt;br /&gt;
&lt;br /&gt;
=== Sample loading ===&lt;br /&gt;
&lt;br /&gt;
The first rule: Dont touch anything behind the front door without gloves!&lt;br /&gt;
&lt;br /&gt;
The sample holder is a quartz tray. Be gentle when putting down your sample!&lt;br /&gt;
&lt;br /&gt;
=====Thermocouple=====&lt;br /&gt;
&lt;br /&gt;
The temperature measurement in the RTP is obtained with a thermocouple which is connected to the oven door. When placing a sample(a wafer or a susceptor) onto the quartz loading tray make sure that:&lt;br /&gt;
&lt;br /&gt;
::*the thermocople is still in one piece&lt;br /&gt;
::*the tip of the thermocouple is in contact with your sample&lt;br /&gt;
::*the two wires of the thermocouple are not in contact with eachother or the sample at any point&lt;br /&gt;
::*when closing the door ensure that the thermocouple will not be bent&lt;br /&gt;
&lt;br /&gt;
If not set correctly, the temperature readout will not be accurate and might lead to the destruction of the sample or the machine. Use your fingers of tweezers to gently shape the thermocople wires in a sort of a bow shaped spring. If broken, contact the Czar or refer to the Service Manual to replace it.&lt;br /&gt;
&lt;br /&gt;
=====Susceptor=====&lt;br /&gt;
&lt;br /&gt;
When using a small sample or if your sample is transparent to the radiation spectrum emitted by the lamps(like GaAs) you&#039;d want to use a susceptor. The susceptor is a SiC coated graphite piece that will evenly heat the sample that is placed inside.&lt;br /&gt;
&lt;br /&gt;
::* The inside of the susceptor should not be exposed outside of the cleanroom&lt;br /&gt;
::* Before loading your sample into the susceptor, examine the latter for cracks and scratches. If any deep scratches or cracks are present - use another one and report the issue to a Czar&lt;br /&gt;
::* With flow rates of around 5 slpm, the process gasses should have no problem reaching the inside of the susceptor&lt;br /&gt;
::* &#039;&#039;&#039;&#039;&#039;Be careful not to scratch the susceptor when placing your sample inside it&#039;&#039;&#039;&#039;&#039;&lt;br /&gt;
::* &#039;&#039;&#039;&#039;&#039;When using a susceptor the maximum heating rate should not exceed 15C/s!&#039;&#039;&#039;&#039;&#039;&lt;br /&gt;
::* &#039;&#039;&#039;&#039;&#039;Do not heat the susceptor without a sample inside it&#039;&#039;&#039;&#039;&#039;&lt;br /&gt;
::* Store the susceptor in a designated spot. Do not leave it in the oven.&lt;br /&gt;
&lt;br /&gt;
==[[RTP log]]==&lt;br /&gt;
&lt;br /&gt;
List of avalable spare parts and maintenance log&lt;br /&gt;
&lt;br /&gt;
[[Category:Tools]]&lt;/div&gt;</summary>
		<author><name>Nader</name></author>
	</entry>
	<entry>
		<id>https://wiki.nbi.ku.dk/w/cleanroom/index.php?title=AccuThermo_RTA&amp;diff=1624</id>
		<title>AccuThermo RTA</title>
		<link rel="alternate" type="text/html" href="https://wiki.nbi.ku.dk/w/cleanroom/index.php?title=AccuThermo_RTA&amp;diff=1624"/>
		<updated>2019-10-18T09:50:33Z</updated>

		<summary type="html">&lt;p&gt;Nader: /* Startup Procedure */&lt;/p&gt;
&lt;hr /&gt;
&lt;div&gt;{{Infobox tool&lt;br /&gt;
|image = Tool RTA.jpg&lt;br /&gt;
|toolfullname = AccuThermo AW 610&lt;br /&gt;
|website = https://allwin21.com/accuthermo-aw-610/&lt;br /&gt;
|company = Allwin21 Corp.&lt;br /&gt;
|description = Rapid thermal annealer&lt;br /&gt;
|location = 03.2.213&lt;br /&gt;
|primary = Nader&lt;br /&gt;
|secondary = Shiv&lt;br /&gt;
}}&lt;br /&gt;
&lt;br /&gt;
== RTP AW610 ==&lt;br /&gt;
&lt;br /&gt;
Short description&lt;br /&gt;
&lt;br /&gt;
&lt;br /&gt;
=== Startup Procedure ===&lt;br /&gt;
&lt;br /&gt;
If this is your first time using the machine, consult the Czar for training. You can use the computer to create a recipe without powering on the machine, so there is no reason not to do it first. Refer to &#039;&#039;&#039;Creating a recipe&#039;&#039;&#039;&lt;br /&gt;
&lt;br /&gt;
If your recipe is already created:&lt;br /&gt;
&lt;br /&gt;
:#Sign up the sheet..&lt;br /&gt;
:#Make sure the Lamp Power is set to &#039;&#039;&#039;OFF&#039;&#039;&#039;&lt;br /&gt;
:#Make sure the power switch on the wall is set to &#039;&#039;&#039;ON&#039;&#039;&#039;.&lt;br /&gt;
:#Check that the emergency button is not engaged( is pulled out ).&lt;br /&gt;
:#Load your sample into the susceptor.&lt;br /&gt;
:#Open oven door approx. &#039;&#039;&#039;10cm out.&#039;&#039;&#039; &#039;&#039;This will prevent any potential overpressure from shattering the quartz isolation chamber&#039;&#039;&lt;br /&gt;
:#Load the susceptor inside the chamber and close the door.&lt;br /&gt;
:#Open up for Air cooling valves&#039;&#039;&#039;(5.5 bar)&#039;&#039;&#039;.&lt;br /&gt;
:#Open up the process gas/gasses on the cylinders that you need by opening the main valves on the cylinders. Pressure of the regulator on secondary manometer should be set to &#039;&#039;&#039;1.5 bar&#039;&#039;&#039; ( Check them also during the run ).&lt;br /&gt;
:#Turn the blue valve on the blue tube to open for air cooling line. &#039;&#039;&#039;The pressure should be around 2.5 bar and the flow rate of above 280&#039;&#039;&#039;.&lt;br /&gt;
:#Turn the Lamp Power &#039;&#039;&#039;ON&#039;&#039;&#039; in front.&lt;br /&gt;
:#Choose and load your recipe.&lt;br /&gt;
:#Run the proces.&lt;br /&gt;
:#Check that the water flow is between &#039;&#039;&#039;500-700&#039;&#039;&#039; lph during your run( Below Scriber ).&lt;br /&gt;
&lt;br /&gt;
=== Power Down Procedure ===&lt;br /&gt;
&lt;br /&gt;
After the system has cooled down and the sample was removed:&lt;br /&gt;
&lt;br /&gt;
:#Make sure the Lamp Power is set to &#039;&#039;&#039;OFF&#039;&#039;&#039;&lt;br /&gt;
:#Open the oven door around &#039;&#039;&#039;10cm&#039;&#039;&#039; and unload the susceptor.&lt;br /&gt;
:#&#039;&#039;&#039;Put&#039;&#039;&#039; the wafer back in the oven and close the door.&lt;br /&gt;
:#Turn the blue knob on the blue tube the  line to &#039;&#039;&#039;Close&#039;&#039;&#039; position.&lt;br /&gt;
:#Close the main valves for the process gasses that have been used.&lt;br /&gt;
:#&#039;&#039;&#039;Close&#039;&#039;&#039; the Air cooling valves.&lt;br /&gt;
&lt;br /&gt;
For recipe creation and sample handling refer to the wiki. &lt;br /&gt;
&lt;br /&gt;
The system should be left with AC power connected and turned on and the cooling water flowing. On the computer press ESC until the main menu appears.&lt;br /&gt;
&lt;br /&gt;
=== Creating a recipe ===&lt;br /&gt;
&lt;br /&gt;
For managing the annealing process the RTP AW610 uses a custom software suite. Before creating a recipe consider if you will be using a susceptor&#039;&#039;(refer to Sample loading)&#039;&#039;.&lt;br /&gt;
&lt;br /&gt;
To create a recipe:&lt;br /&gt;
&lt;br /&gt;
:*First navigate to &#039;&#039;&#039;&#039;&#039;Process for Engineer&#039;&#039;&#039;&#039;&#039; tab in the main menu&lt;br /&gt;
:*click on the &#039;&#039;&#039;NEW&#039;&#039;&#039; recipe in the recipe list&lt;br /&gt;
:*click on &#039;&#039;&#039;&#039;&#039;Edit Recipe&#039;&#039;&#039;&#039;&#039;&lt;br /&gt;
:*Write a new name for your recipe in the respective field and click on &#039;&#039;&#039;&#039;&#039;Save&#039;&#039;&#039;&#039;&#039;. This creates a new recipe in the list that you can now freely edit.&lt;br /&gt;
:*Check &#039;&#039;&#039;&#039;&#039;Sensor type&#039;&#039;&#039;&#039;&#039; to be set to &#039;&#039;&#039;&#039;&#039;Thermocouple&#039;&#039;&#039;&#039;&#039; and &#039;&#039;&#039;&#039;&#039;Wafer Type&#039;&#039;&#039;&#039;&#039; to be set to either &#039;&#039;&#039;&#039;&#039;Susceptor&#039;&#039;&#039;&#039;&#039; or &#039;&#039;&#039;&#039;&#039;Wafer&#039;&#039;&#039;&#039;&#039; depending on what you will be using.(&#039;&#039;consult Sample loading section&#039;&#039;)&lt;br /&gt;
&lt;br /&gt;
Other parameters should be left as they are unless you know what you are doing and want something different.&lt;br /&gt;
&lt;br /&gt;
You can now proceed with creating the recipe sequence itself. The available parameters are step number, function, time for a given step, temperature, init factor and gas flow for each connected process gas. Ignore the initiation factor.&lt;br /&gt;
&lt;br /&gt;
Main available functions are:&lt;br /&gt;
&lt;br /&gt;
:*&#039;&#039;&#039;Delay&#039;&#039;&#039; - keeps the lamp power off while maintaining other parametes, such as gas flow rates. Used for purging the chamber of air as an initial step and is a good option for cooling.&lt;br /&gt;
&lt;br /&gt;
:*&#039;&#039;&#039;Ramp&#039;&#039;&#039; - ramps the temperature up or down to a desired value. The ramping rate is calculated by &#039;&#039;&#039;&#039;&#039;time/target temperature&#039;&#039;&#039;&#039;&#039;. Note: &#039;&#039;when using a susceptor, maximum ramp up rates should not exceed 15C/s&#039;&#039;&lt;br /&gt;
&lt;br /&gt;
:*&#039;&#039;&#039;Steady&#039;&#039;&#039; - keeps the lamps turned on and the temperature at a set value. The ideal step for baking the sample at a particular temperatures for a longer time.&lt;br /&gt;
&lt;br /&gt;
===&#039;&#039;&#039;Important&#039;&#039;&#039;===&lt;br /&gt;
&lt;br /&gt;
&#039;&#039;&#039;The total flow rate through the chamber should never exceed 15slpm&#039;&#039;&#039;.&lt;br /&gt;
&lt;br /&gt;
&#039;&#039;&#039;At the temperatures above 600C the thermocouple begins to melt with the susceptor or a silicon wafer.&#039;&#039;&#039;&lt;br /&gt;
&lt;br /&gt;
&lt;br /&gt;
&lt;br /&gt;
Tips for creating a good recipe:&lt;br /&gt;
&lt;br /&gt;
A good initial step is to displace the normal atmosphere by Nitrogen. The total volume of the quartz chamber is 0.84l, therefore it is a good idea to start the process by letting Nitrogen flow into the chamber at around 5slpm for 15-20 seconds. After this initial step is complete, add or replace Nitrogen with a desired process gas.&lt;br /&gt;
&lt;br /&gt;
During &#039;&#039;&#039;&#039;&#039;Ramping&#039;&#039;&#039;&#039;&#039; and &#039;&#039;&#039;&#039;&#039;Steady&#039;&#039;&#039;&#039;&#039; step, the maximum total flow rate should be 5slpm&lt;br /&gt;
&lt;br /&gt;
It takes between 10-15 seconds for the machine to stabilize the temperature. Consider this when creating a multistep recipe.&lt;br /&gt;
&lt;br /&gt;
&lt;br /&gt;
&lt;br /&gt;
=== Sample loading ===&lt;br /&gt;
&lt;br /&gt;
The first rule: Dont touch anything behind the front door without gloves!&lt;br /&gt;
&lt;br /&gt;
The sample holder is a quartz tray. Be gentle when putting down your sample!&lt;br /&gt;
&lt;br /&gt;
=====Thermocouple=====&lt;br /&gt;
&lt;br /&gt;
The temperature measurement in the RTP is obtained with a thermocouple which is connected to the oven door. When placing a sample(a wafer or a susceptor) onto the quartz loading tray make sure that:&lt;br /&gt;
&lt;br /&gt;
::*the thermocople is still in one piece&lt;br /&gt;
::*the tip of the thermocouple is in contact with your sample&lt;br /&gt;
::*the two wires of the thermocouple are not in contact with eachother or the sample at any point&lt;br /&gt;
::*when closing the door ensure that the thermocouple will not be bent&lt;br /&gt;
&lt;br /&gt;
If not set correctly, the temperature readout will not be accurate and might lead to the destruction of the sample or the machine. Use your fingers of tweezers to gently shape the thermocople wires in a sort of a bow shaped spring. If broken, contact the Czar or refer to the Service Manual to replace it.&lt;br /&gt;
&lt;br /&gt;
=====Susceptor=====&lt;br /&gt;
&lt;br /&gt;
When using a small sample or if your sample is transparent to the radiation spectrum emitted by the lamps(like GaAs) you&#039;d want to use a susceptor. The susceptor is a SiC coated graphite piece that will evenly heat the sample that is placed inside.&lt;br /&gt;
&lt;br /&gt;
::* The inside of the susceptor should not be exposed outside of the cleanroom&lt;br /&gt;
::* Before loading your sample into the susceptor, examine the latter for cracks and scratches. If any deep scratches or cracks are present - use another one and report the issue to a Czar&lt;br /&gt;
::* With flow rates of around 5 slpm, the process gasses should have no problem reaching the inside of the susceptor&lt;br /&gt;
::* &#039;&#039;&#039;&#039;&#039;Be careful not to scratch the susceptor when placing your sample inside it&#039;&#039;&#039;&#039;&#039;&lt;br /&gt;
::* &#039;&#039;&#039;&#039;&#039;When using a susceptor the maximum heating rate should not exceed 15C/s!&#039;&#039;&#039;&#039;&#039;&lt;br /&gt;
::* &#039;&#039;&#039;&#039;&#039;Do not heat the susceptor without a sample inside it&#039;&#039;&#039;&#039;&#039;&lt;br /&gt;
::* Store the susceptor in a designated spot. Do not leave it in the oven.&lt;br /&gt;
&lt;br /&gt;
==[[RTP log]]==&lt;br /&gt;
&lt;br /&gt;
List of avalable spare parts and maintenance log&lt;br /&gt;
&lt;br /&gt;
[[Category:Tools]]&lt;/div&gt;</summary>
		<author><name>Nader</name></author>
	</entry>
	<entry>
		<id>https://wiki.nbi.ku.dk/w/cleanroom/index.php?title=General_rules_for_working_in_the_cleanroom&amp;diff=1564</id>
		<title>General rules for working in the cleanroom</title>
		<link rel="alternate" type="text/html" href="https://wiki.nbi.ku.dk/w/cleanroom/index.php?title=General_rules_for_working_in_the_cleanroom&amp;diff=1564"/>
		<updated>2018-08-31T13:00:06Z</updated>

		<summary type="html">&lt;p&gt;Nader: /* Practical information */&lt;/p&gt;
&lt;hr /&gt;
&lt;div&gt;New users must complete the Cleanroom safety course before gaining access to the Cleanroom.&lt;br /&gt;
&lt;br /&gt;
Send a mail to: cleanroom@nbi.ku.dk to join a course. Please provide information on which group or PI you are affiliated with.&lt;br /&gt;
&lt;br /&gt;
The safety of you and coworkers in the lab is of utmost importance. Although we encourage constructive feedback on safety procedures, and how to improve them, you must accept that safety is not a democratic process. The rules must be followed.&lt;br /&gt;
&lt;br /&gt;
In case of an accident, you must also accept that your coworkers or cleanroom staff takes over and instructs you in order to help in the best possible way. You may not think rationally in such a situation!&lt;br /&gt;
&lt;br /&gt;
= How to behave =&lt;br /&gt;
* Always think of safety first!&lt;br /&gt;
* Always wear the required cleanroom attire&lt;br /&gt;
* Change you cleanroom gown at least once a week&lt;br /&gt;
* Respect a comfort safety zone around people working in the cleanroom&lt;br /&gt;
* The maximum number of people in each of the two cleanrooms is 8, providing that people are distibuted at different fumehoods and tools&lt;br /&gt;
* When you work at the fume hoods:&lt;br /&gt;
** Use slow movements (to avoid turbulence)&lt;br /&gt;
** Reduce the amount of equipment and bottles in the bench&lt;br /&gt;
** Operate with sash as low as possible (Always below arrow marking max sash height)&lt;br /&gt;
** Keep the worksurface tidy&lt;br /&gt;
** Clean up after use&lt;br /&gt;
** If you must leave a process unattended, please limit the time and attach a note with name, contact info, and return time. &lt;br /&gt;
* Wash labware after use with Milli-Q water and hang to dry on rack&lt;br /&gt;
* No food or drinks allowed in the cleanroom&lt;br /&gt;
* Broken glass must be cleaned and disposed of in the glass bins&lt;br /&gt;
* No earphones! You must be able to hear and see to act safely&lt;br /&gt;
&lt;br /&gt;
= How to dress =&lt;br /&gt;
&lt;br /&gt;
When working in the cleanroom, you must always wear cleanroom attire, and when working with acids or dangerous chemicals, you must also wear personal protective equipment (PPE). Cleanroom attire and PPE have different purposes. Clean room attire is not PPE. You wear cleanroom attire to protect samples from dust generated by you, and you wear PPE to protect you from chemicals. &lt;br /&gt;
&lt;br /&gt;
To minimize particle generation your personal clothes and hair must be totally covered from the lower edge of the clean room coat and up. Long hair must be tucked under the hood and neither headscarves nor hair must stick out or block your vision.&lt;br /&gt;
&lt;br /&gt;
Oversized trousers or floor long dresses pose a safety risk as you may trip while handling chemicals and is thus not allowed. Clothing that contains excessive fringe or even overly loose-fitting clothing may be ruled to be unsafe. Open toed shoes are accepted.&lt;br /&gt;
&lt;br /&gt;
The use of contact lenses is not recommended in the lab. Contact lenses make it difficult to wash the eyes in case of splashes. If you choose to wear them you should alert other cleanroom users. Other users need to know that lenses will need to be removed if you do get something in your eye&lt;br /&gt;
&lt;br /&gt;
Please note that you are required to strip your clothes when using the safety shower. Not removing contaminated clothes will make the situation worse. If you are not comfortable with this, you should not enter the lab.&lt;br /&gt;
&lt;br /&gt;
== Cleanroom attire ==&lt;br /&gt;
[[File:Required cleanroom attire.png|320px|right|Required cleanroom attire]]&lt;br /&gt;
The required cleanroom attire is:&lt;br /&gt;
&lt;br /&gt;
* Hair cover&lt;br /&gt;
* Safety glasses, even over normal glasses. They may only be removed when using the microscopes.&lt;br /&gt;
* Beard cover if you have a beard or stubble over 3 mm long&lt;br /&gt;
* Cleanroom gown&lt;br /&gt;
* Gloves&lt;br /&gt;
* Shoe covers&lt;br /&gt;
&lt;br /&gt;
== Personal protective equipment ==&lt;br /&gt;
&lt;br /&gt;
Further required PPE when working with dangerous chemicals:&lt;br /&gt;
&lt;br /&gt;
* Apron&lt;br /&gt;
* General chemical work: Nitrile gloves&lt;br /&gt;
* Strong acids/chemicals: Nitrile + sleeve covers + tri-polymer protective sleeves&lt;br /&gt;
* Fumehood sash kept low&lt;br /&gt;
&lt;br /&gt;
= Practical information = &lt;br /&gt;
* All staff members are covered by the insurance provisions of the Occupational Injuries Act. In this relation a staff member is someone receiving a salary for the work done&lt;br /&gt;
* Students are not usually covered by the insurance provisions of the Occupational Injuries Act. We recommend that you have an accident policy, and that you make sure it also applies when you are studying and when you are working in the lab.&lt;br /&gt;
* Please familiarize yourself with the  [https://intranet.ku.dk/nbi/en/Organisation/Councils%20and%20committees/Occupational%20health%20and%20safety%20comm/Emergency%20Plans/Documents/Beredskabsplaner%20for%20Niels%20Bohr%20Institutet_ENG.pdf Emergency plan]&lt;br /&gt;
* Please familiarize yourself with the [https://intranet.ku.dk/nbi/en/Organisation/Councils%20and%20committees/Occupational%20health%20and%20safety%20comm/Evacuation/Pages/default.aspx general evacuation concept of KU]&lt;br /&gt;
* Information about the NBI Occupational Health and Safety Committee can be found [https://kunet.ku.dk/fakultet-og-institut/nbi/organisation/raad%20og%20udvalg/arbejsdsmiljoeudvalget/PublishingImages/Sider/default/OrganisationalChartOHS-Maj%202018_DANSK2.pdf]. This webpage also has links to other relevant Occupational Health and Safety sites at KU.&lt;br /&gt;
* A very thorough [https://intranet.ku.dk/nbi/organisation/raad%20og%20udvalg/arbejsdsmiljoeudvalget/Documents/sikkerhed_i_undervisningen11.pdf general lab safety manual for physics students] at NBI.&lt;br /&gt;
* KU provides First Aid courses. Keep an eye out for [https://intranet.ku.dk/employeeguide/course/Pages/default.aspx courses] given in English (Generally offered a couple of times a year).&lt;/div&gt;</summary>
		<author><name>Nader</name></author>
	</entry>
	<entry>
		<id>https://wiki.nbi.ku.dk/w/cleanroom/index.php?title=AccuThermo_RTA&amp;diff=1454</id>
		<title>AccuThermo RTA</title>
		<link rel="alternate" type="text/html" href="https://wiki.nbi.ku.dk/w/cleanroom/index.php?title=AccuThermo_RTA&amp;diff=1454"/>
		<updated>2018-03-19T10:46:20Z</updated>

		<summary type="html">&lt;p&gt;Nader: /* Startup Procedure */&lt;/p&gt;
&lt;hr /&gt;
&lt;div&gt;{{Infobox tool&lt;br /&gt;
|image = Tool RTA.jpg&lt;br /&gt;
|toolfullname = AccuThermo AW 610&lt;br /&gt;
|website = https://allwin21.com/&lt;br /&gt;
|company = Allwin21 Corp.&lt;br /&gt;
|description = Rapid thermal annealer&lt;br /&gt;
|location = 03.2.213&lt;br /&gt;
|primary = Nader&lt;br /&gt;
|secondary = Shiv&lt;br /&gt;
|limits = None&lt;br /&gt;
|computer = TBD&lt;br /&gt;
|manual = TBD&lt;br /&gt;
}}&lt;br /&gt;
&lt;br /&gt;
= RTP AW610 =&lt;br /&gt;
&lt;br /&gt;
Short description&lt;br /&gt;
&lt;br /&gt;
&lt;br /&gt;
== Startup Procedure ==&lt;br /&gt;
&lt;br /&gt;
If this is your first time using the machine, consult the Czar for training. You can use the computer to create a recipe without powering on the machine, so there is no reason not to do it first. Refer to &#039;&#039;&#039;Creating a recipe&#039;&#039;&#039;&lt;br /&gt;
&lt;br /&gt;
If your recipe is already created:&lt;br /&gt;
&lt;br /&gt;
:#Sign up the sheet..&lt;br /&gt;
:#Make sure the Lamp Power is set to &#039;&#039;&#039;OFF&#039;&#039;&#039;&lt;br /&gt;
:#Make sure the power switch on the wall is set to &#039;&#039;&#039;ON&#039;&#039;&#039;.&lt;br /&gt;
:#Check that the emergency button is not engaged( is pulled out ).&lt;br /&gt;
:#Load your sample into the susceptor.&lt;br /&gt;
:#Open oven door approx. &#039;&#039;&#039;10cm out.&#039;&#039;&#039; &#039;&#039;This will prevent any potential overpressure from shattering the quartz isolation chamber&#039;&#039;&lt;br /&gt;
:#Load the susceptor inside the chamber and close the door.&lt;br /&gt;
:#Open up for Air cooling valves&#039;&#039;&#039;(5.5 bar)&#039;&#039;&#039;.&lt;br /&gt;
:#Open up the process gas/gasses on the cylinders that you need by opening the main valves on the cylinders. Pressure of the regulator on secondary manometer should be set to &#039;&#039;&#039;1.5 bar&#039;&#039;&#039;.&lt;br /&gt;
:#Turn the blue valve on the blue tube to open for air cooling line. &#039;&#039;&#039;The pressure should be around 2.5bar and the flow rate of above 280&#039;&#039;&#039;.&lt;br /&gt;
:#Load the sample into the system.&lt;br /&gt;
:#Turn the Lamp Power &#039;&#039;&#039;ON&#039;&#039;&#039; in font.&lt;br /&gt;
:#Check that the water flow is between &#039;&#039;&#039;500-700&#039;&#039;&#039; lph during your run.&lt;br /&gt;
:#Choose and load your recipe.&lt;br /&gt;
:#Run the proces.&lt;br /&gt;
&lt;br /&gt;
== Power Down Procedure ==&lt;br /&gt;
&lt;br /&gt;
After the system has cooled down and the sample was removed:&lt;br /&gt;
&lt;br /&gt;
:#Make sure the Lamp Power is set to &#039;&#039;&#039;OFF&#039;&#039;&#039;&lt;br /&gt;
:#Open the oven door around &#039;&#039;&#039;10cm&#039;&#039;&#039; and unload the susceptor.&lt;br /&gt;
:#&#039;&#039;&#039;Put&#039;&#039;&#039; the wafer back in the oven and close the door.&lt;br /&gt;
:#Turn the blue knob on the blue tube the  line to &#039;&#039;&#039;Close&#039;&#039;&#039; position.&lt;br /&gt;
:#Close the main valves for the process gasses that have been used.&lt;br /&gt;
:#&#039;&#039;&#039;Close&#039;&#039;&#039; the Air cooling valves.&lt;br /&gt;
&lt;br /&gt;
For recipe creation and sample handling refer to the wiki. &lt;br /&gt;
&lt;br /&gt;
The system should be left with AC power connected and turned on and the cooling water flowing. On the computer press ESC until the main menu appears.&lt;br /&gt;
&lt;br /&gt;
== Creating a recipe ==&lt;br /&gt;
&lt;br /&gt;
For managing the annealing process the RTP AW610 uses a custom software suite. Before creating a recipe consider if you will be using a susceptor&#039;&#039;(refer to Sample loading)&#039;&#039;.&lt;br /&gt;
&lt;br /&gt;
To create a recipe:&lt;br /&gt;
&lt;br /&gt;
:*First navigate to &#039;&#039;&#039;&#039;&#039;Process for Engineer&#039;&#039;&#039;&#039;&#039; tab in the main menu&lt;br /&gt;
:*click on the &#039;&#039;&#039;NEW&#039;&#039;&#039; recipe in the recipe list&lt;br /&gt;
:*click on &#039;&#039;&#039;&#039;&#039;Edit Recipe&#039;&#039;&#039;&#039;&#039;&lt;br /&gt;
:*Write a new name for your recipe in the respective field and click on &#039;&#039;&#039;&#039;&#039;Save&#039;&#039;&#039;&#039;&#039;. This creates a new recipe in the list that you can now freely edit.&lt;br /&gt;
:*Check &#039;&#039;&#039;&#039;&#039;Sensor type&#039;&#039;&#039;&#039;&#039; to be set to &#039;&#039;&#039;&#039;&#039;Thermocouple&#039;&#039;&#039;&#039;&#039; and &#039;&#039;&#039;&#039;&#039;Wafer Type&#039;&#039;&#039;&#039;&#039; to be set to either &#039;&#039;&#039;&#039;&#039;Susceptor&#039;&#039;&#039;&#039;&#039; or &#039;&#039;&#039;&#039;&#039;Wafer&#039;&#039;&#039;&#039;&#039; depending on what you will be using.(&#039;&#039;consult Sample loading section&#039;&#039;)&lt;br /&gt;
&lt;br /&gt;
Other parameters should be left as they are unless you know what you are doing and want something different.&lt;br /&gt;
&lt;br /&gt;
You can now proceed with creating the recipe sequence itself. The available parameters are step number, function, time for a given step, temperature, init factor and gas flow for each connected process gas. Ignore the initiation factor.&lt;br /&gt;
&lt;br /&gt;
Main available functions are:&lt;br /&gt;
&lt;br /&gt;
:*&#039;&#039;&#039;Delay&#039;&#039;&#039; - keeps the lamp power off while maintaining other parametes, such as gas flow rates. Used for purging the chamber of air as an initial step and is a good option for cooling.&lt;br /&gt;
&lt;br /&gt;
:*&#039;&#039;&#039;Ramp&#039;&#039;&#039; - ramps the temperature up or down to a desired value. The ramping rate is calculated by &#039;&#039;&#039;&#039;&#039;time/target temperature&#039;&#039;&#039;&#039;&#039;. Note: &#039;&#039;when using a susceptor, maximum ramp up rates should not exceed 15C/s&#039;&#039;&lt;br /&gt;
&lt;br /&gt;
:*&#039;&#039;&#039;Steady&#039;&#039;&#039; - keeps the lamps turned on and the temperature at a set value. The ideal step for baking the sample at a particular temperatures for a longer time.&lt;br /&gt;
&lt;br /&gt;
===&#039;&#039;&#039;Important&#039;&#039;&#039;===&lt;br /&gt;
&lt;br /&gt;
&#039;&#039;&#039;The total flow rate through the chamber should never exceed 15slpm&#039;&#039;&#039;.&lt;br /&gt;
&lt;br /&gt;
&#039;&#039;&#039;At the temperatures above 600C the thermocouple begins to melt with the susceptor or a silicon wafer.&#039;&#039;&#039;&lt;br /&gt;
&lt;br /&gt;
&lt;br /&gt;
&lt;br /&gt;
Tips for creating a good recipe:&lt;br /&gt;
&lt;br /&gt;
A good initial step is to displace the normal atmosphere by Nitrogen. The total volume of the quartz chamber is 0.84l, therefore it is a good idea to start the process by letting Nitrogen flow into the chamber at around 5slpm for 15-20 seconds. After this initial step is complete, add or replace Nitrogen with a desired process gas.&lt;br /&gt;
&lt;br /&gt;
During &#039;&#039;&#039;&#039;&#039;Ramping&#039;&#039;&#039;&#039;&#039; and &#039;&#039;&#039;&#039;&#039;Steady&#039;&#039;&#039;&#039;&#039; step, the maximum total flow rate should be 5slpm&lt;br /&gt;
&lt;br /&gt;
It takes between 10-15 seconds for the machine to stabilize the temperature. Consider this when creating a multistep recipe.&lt;br /&gt;
&lt;br /&gt;
&lt;br /&gt;
&lt;br /&gt;
== Sample loading ==&lt;br /&gt;
&lt;br /&gt;
The first rule: Dont touch anything behind the front door without gloves!&lt;br /&gt;
&lt;br /&gt;
The sample holder is a quartz tray. Be gentle when putting down your sample!&lt;br /&gt;
&lt;br /&gt;
=====Thermocouple=====&lt;br /&gt;
&lt;br /&gt;
The temperature measurement in the RTP is obtained with a thermocouple which is connected to the oven door. When placing a sample(a wafer or a susceptor) onto the quartz loading tray make sure that:&lt;br /&gt;
&lt;br /&gt;
::*the thermocople is still in one piece&lt;br /&gt;
::*the tip of the thermocouple is in contact with your sample&lt;br /&gt;
::*the two wires of the thermocouple are not in contact with eachother or the sample at any point&lt;br /&gt;
::*when closing the door ensure that the thermocouple will not be bent&lt;br /&gt;
&lt;br /&gt;
If not set correctly, the temperature readout will not be accurate and might lead to the destruction of the sample or the machine. Use your fingers of tweezers to gently shape the thermocople wires in a sort of a bow shaped spring. If broken, contact the Czar or refer to the Service Manual to replace it.&lt;br /&gt;
&lt;br /&gt;
=====Susceptor=====&lt;br /&gt;
&lt;br /&gt;
When using a small sample or if your sample is transparent to the radiation spectrum emitted by the lamps(like GaAs) you&#039;d want to use a susceptor. The susceptor is a SiC coated graphite piece that will evenly heat the sample that is placed inside.&lt;br /&gt;
&lt;br /&gt;
::* The inside of the susceptor should not be exposed outside of the cleanroom&lt;br /&gt;
::* Before loading your sample into the susceptor, examine the latter for cracks and scratches. If any deep scratches or cracks are present - use another one and report the issue to a Czar&lt;br /&gt;
::* With flow rates of around 5 slpm, the process gasses should have no problem reaching the inside of the susceptor&lt;br /&gt;
::* &#039;&#039;&#039;&#039;&#039;Be careful not to scratch the susceptor when placing your sample inside it&#039;&#039;&#039;&#039;&#039;&lt;br /&gt;
::* &#039;&#039;&#039;&#039;&#039;When using a susceptor the maximum heating rate should not exceed 15C/s!&#039;&#039;&#039;&#039;&#039;&lt;br /&gt;
::* &#039;&#039;&#039;&#039;&#039;Do not heat the susceptor without a sample inside it&#039;&#039;&#039;&#039;&#039;&lt;br /&gt;
::* Store the susceptor in a designated spot. Do not leave it in the oven.&lt;br /&gt;
&lt;br /&gt;
==[[RTP log]]==&lt;br /&gt;
&lt;br /&gt;
List of avalable spare parts and maintenance log&lt;br /&gt;
&lt;br /&gt;
[[Category:Tools]]&lt;/div&gt;</summary>
		<author><name>Nader</name></author>
	</entry>
	<entry>
		<id>https://wiki.nbi.ku.dk/w/cleanroom/index.php?title=AccuThermo_RTA&amp;diff=1453</id>
		<title>AccuThermo RTA</title>
		<link rel="alternate" type="text/html" href="https://wiki.nbi.ku.dk/w/cleanroom/index.php?title=AccuThermo_RTA&amp;diff=1453"/>
		<updated>2018-03-19T10:45:17Z</updated>

		<summary type="html">&lt;p&gt;Nader: /* Startup Procedure */&lt;/p&gt;
&lt;hr /&gt;
&lt;div&gt;{{Infobox tool&lt;br /&gt;
|image = Tool RTA.jpg&lt;br /&gt;
|toolfullname = AccuThermo AW 610&lt;br /&gt;
|website = https://allwin21.com/&lt;br /&gt;
|company = Allwin21 Corp.&lt;br /&gt;
|description = Rapid thermal annealer&lt;br /&gt;
|location = 03.2.213&lt;br /&gt;
|primary = Nader&lt;br /&gt;
|secondary = Shiv&lt;br /&gt;
|limits = None&lt;br /&gt;
|computer = TBD&lt;br /&gt;
|manual = TBD&lt;br /&gt;
}}&lt;br /&gt;
&lt;br /&gt;
= RTP AW610 =&lt;br /&gt;
&lt;br /&gt;
Short description&lt;br /&gt;
&lt;br /&gt;
&lt;br /&gt;
== Startup Procedure ==&lt;br /&gt;
&lt;br /&gt;
If this is your first time using the machine, consult the Czar for training. You can use the computer to create a recipe without powering on the machine, so there is no reason not to do it first. Refer to &#039;&#039;&#039;Creating a recipe&#039;&#039;&#039;&lt;br /&gt;
&lt;br /&gt;
If your recipe is already created:&lt;br /&gt;
&lt;br /&gt;
:#Sign up the sheet..&lt;br /&gt;
:#Make sure the Lamp Power is set to &#039;&#039;&#039;OFF&#039;&#039;&#039;&lt;br /&gt;
:#Make sure the power switch on the wall is set to &#039;&#039;&#039;ON&#039;&#039;&#039;.&lt;br /&gt;
:#Check that the emergency button is not engaged( is pulled out ).&lt;br /&gt;
:#Load your sample into the susceptor.&lt;br /&gt;
:#Open oven door approx. &#039;&#039;&#039;10cm out.&#039;&#039;&#039; &#039;&#039;This will prevent any potential overpressure from shattering the quartz isolation chamber&#039;&#039;&lt;br /&gt;
:#Load the susceptor inside the chamber and close the door.&lt;br /&gt;
:#Open up for Air cooling valves&#039;&#039;&#039;(5.5 bar)&#039;&#039;&#039;.&lt;br /&gt;
:#Open up the process gas/gasses on the cylinders that you need by opening the main valves on the cylinders. Pressure of the regulator on secondary manometer should be set to &#039;&#039;&#039;1.5 bar&#039;&#039;&#039;.&lt;br /&gt;
:#Turn the blue valve on the blue tube to open for air cooling line. &#039;&#039;&#039;The pressure should be around 2,5bar and the flow rate of above 280&#039;&#039;&#039;.&lt;br /&gt;
:#Load the sample into the system.&lt;br /&gt;
:#Turn the Lamp Power &#039;&#039;&#039;ON&#039;&#039;&#039; in font.&lt;br /&gt;
:#Check that the water flow is between &#039;&#039;&#039;500-700&#039;&#039;&#039; lph during your run.&lt;br /&gt;
:#Choose and load your recipe.&lt;br /&gt;
:#Run the proces.&lt;br /&gt;
&lt;br /&gt;
== Power Down Procedure ==&lt;br /&gt;
&lt;br /&gt;
After the system has cooled down and the sample was removed:&lt;br /&gt;
&lt;br /&gt;
:#Make sure the Lamp Power is set to &#039;&#039;&#039;OFF&#039;&#039;&#039;&lt;br /&gt;
:#Open the oven door around &#039;&#039;&#039;10cm&#039;&#039;&#039; and unload the susceptor.&lt;br /&gt;
:#&#039;&#039;&#039;Put&#039;&#039;&#039; the wafer back in the oven and close the door.&lt;br /&gt;
:#Turn the blue knob on the blue tube the  line to &#039;&#039;&#039;Close&#039;&#039;&#039; position.&lt;br /&gt;
:#Close the main valves for the process gasses that have been used.&lt;br /&gt;
:#&#039;&#039;&#039;Close&#039;&#039;&#039; the Air cooling valves.&lt;br /&gt;
&lt;br /&gt;
For recipe creation and sample handling refer to the wiki. &lt;br /&gt;
&lt;br /&gt;
The system should be left with AC power connected and turned on and the cooling water flowing. On the computer press ESC until the main menu appears.&lt;br /&gt;
&lt;br /&gt;
== Creating a recipe ==&lt;br /&gt;
&lt;br /&gt;
For managing the annealing process the RTP AW610 uses a custom software suite. Before creating a recipe consider if you will be using a susceptor&#039;&#039;(refer to Sample loading)&#039;&#039;.&lt;br /&gt;
&lt;br /&gt;
To create a recipe:&lt;br /&gt;
&lt;br /&gt;
:*First navigate to &#039;&#039;&#039;&#039;&#039;Process for Engineer&#039;&#039;&#039;&#039;&#039; tab in the main menu&lt;br /&gt;
:*click on the &#039;&#039;&#039;NEW&#039;&#039;&#039; recipe in the recipe list&lt;br /&gt;
:*click on &#039;&#039;&#039;&#039;&#039;Edit Recipe&#039;&#039;&#039;&#039;&#039;&lt;br /&gt;
:*Write a new name for your recipe in the respective field and click on &#039;&#039;&#039;&#039;&#039;Save&#039;&#039;&#039;&#039;&#039;. This creates a new recipe in the list that you can now freely edit.&lt;br /&gt;
:*Check &#039;&#039;&#039;&#039;&#039;Sensor type&#039;&#039;&#039;&#039;&#039; to be set to &#039;&#039;&#039;&#039;&#039;Thermocouple&#039;&#039;&#039;&#039;&#039; and &#039;&#039;&#039;&#039;&#039;Wafer Type&#039;&#039;&#039;&#039;&#039; to be set to either &#039;&#039;&#039;&#039;&#039;Susceptor&#039;&#039;&#039;&#039;&#039; or &#039;&#039;&#039;&#039;&#039;Wafer&#039;&#039;&#039;&#039;&#039; depending on what you will be using.(&#039;&#039;consult Sample loading section&#039;&#039;)&lt;br /&gt;
&lt;br /&gt;
Other parameters should be left as they are unless you know what you are doing and want something different.&lt;br /&gt;
&lt;br /&gt;
You can now proceed with creating the recipe sequence itself. The available parameters are step number, function, time for a given step, temperature, init factor and gas flow for each connected process gas. Ignore the initiation factor.&lt;br /&gt;
&lt;br /&gt;
Main available functions are:&lt;br /&gt;
&lt;br /&gt;
:*&#039;&#039;&#039;Delay&#039;&#039;&#039; - keeps the lamp power off while maintaining other parametes, such as gas flow rates. Used for purging the chamber of air as an initial step and is a good option for cooling.&lt;br /&gt;
&lt;br /&gt;
:*&#039;&#039;&#039;Ramp&#039;&#039;&#039; - ramps the temperature up or down to a desired value. The ramping rate is calculated by &#039;&#039;&#039;&#039;&#039;time/target temperature&#039;&#039;&#039;&#039;&#039;. Note: &#039;&#039;when using a susceptor, maximum ramp up rates should not exceed 15C/s&#039;&#039;&lt;br /&gt;
&lt;br /&gt;
:*&#039;&#039;&#039;Steady&#039;&#039;&#039; - keeps the lamps turned on and the temperature at a set value. The ideal step for baking the sample at a particular temperatures for a longer time.&lt;br /&gt;
&lt;br /&gt;
===&#039;&#039;&#039;Important&#039;&#039;&#039;===&lt;br /&gt;
&lt;br /&gt;
&#039;&#039;&#039;The total flow rate through the chamber should never exceed 15slpm&#039;&#039;&#039;.&lt;br /&gt;
&lt;br /&gt;
&#039;&#039;&#039;At the temperatures above 600C the thermocouple begins to melt with the susceptor or a silicon wafer.&#039;&#039;&#039;&lt;br /&gt;
&lt;br /&gt;
&lt;br /&gt;
&lt;br /&gt;
Tips for creating a good recipe:&lt;br /&gt;
&lt;br /&gt;
A good initial step is to displace the normal atmosphere by Nitrogen. The total volume of the quartz chamber is 0.84l, therefore it is a good idea to start the process by letting Nitrogen flow into the chamber at around 5slpm for 15-20 seconds. After this initial step is complete, add or replace Nitrogen with a desired process gas.&lt;br /&gt;
&lt;br /&gt;
During &#039;&#039;&#039;&#039;&#039;Ramping&#039;&#039;&#039;&#039;&#039; and &#039;&#039;&#039;&#039;&#039;Steady&#039;&#039;&#039;&#039;&#039; step, the maximum total flow rate should be 5slpm&lt;br /&gt;
&lt;br /&gt;
It takes between 10-15 seconds for the machine to stabilize the temperature. Consider this when creating a multistep recipe.&lt;br /&gt;
&lt;br /&gt;
&lt;br /&gt;
&lt;br /&gt;
== Sample loading ==&lt;br /&gt;
&lt;br /&gt;
The first rule: Dont touch anything behind the front door without gloves!&lt;br /&gt;
&lt;br /&gt;
The sample holder is a quartz tray. Be gentle when putting down your sample!&lt;br /&gt;
&lt;br /&gt;
=====Thermocouple=====&lt;br /&gt;
&lt;br /&gt;
The temperature measurement in the RTP is obtained with a thermocouple which is connected to the oven door. When placing a sample(a wafer or a susceptor) onto the quartz loading tray make sure that:&lt;br /&gt;
&lt;br /&gt;
::*the thermocople is still in one piece&lt;br /&gt;
::*the tip of the thermocouple is in contact with your sample&lt;br /&gt;
::*the two wires of the thermocouple are not in contact with eachother or the sample at any point&lt;br /&gt;
::*when closing the door ensure that the thermocouple will not be bent&lt;br /&gt;
&lt;br /&gt;
If not set correctly, the temperature readout will not be accurate and might lead to the destruction of the sample or the machine. Use your fingers of tweezers to gently shape the thermocople wires in a sort of a bow shaped spring. If broken, contact the Czar or refer to the Service Manual to replace it.&lt;br /&gt;
&lt;br /&gt;
=====Susceptor=====&lt;br /&gt;
&lt;br /&gt;
When using a small sample or if your sample is transparent to the radiation spectrum emitted by the lamps(like GaAs) you&#039;d want to use a susceptor. The susceptor is a SiC coated graphite piece that will evenly heat the sample that is placed inside.&lt;br /&gt;
&lt;br /&gt;
::* The inside of the susceptor should not be exposed outside of the cleanroom&lt;br /&gt;
::* Before loading your sample into the susceptor, examine the latter for cracks and scratches. If any deep scratches or cracks are present - use another one and report the issue to a Czar&lt;br /&gt;
::* With flow rates of around 5 slpm, the process gasses should have no problem reaching the inside of the susceptor&lt;br /&gt;
::* &#039;&#039;&#039;&#039;&#039;Be careful not to scratch the susceptor when placing your sample inside it&#039;&#039;&#039;&#039;&#039;&lt;br /&gt;
::* &#039;&#039;&#039;&#039;&#039;When using a susceptor the maximum heating rate should not exceed 15C/s!&#039;&#039;&#039;&#039;&#039;&lt;br /&gt;
::* &#039;&#039;&#039;&#039;&#039;Do not heat the susceptor without a sample inside it&#039;&#039;&#039;&#039;&#039;&lt;br /&gt;
::* Store the susceptor in a designated spot. Do not leave it in the oven.&lt;br /&gt;
&lt;br /&gt;
==[[RTP log]]==&lt;br /&gt;
&lt;br /&gt;
List of avalable spare parts and maintenance log&lt;br /&gt;
&lt;br /&gt;
[[Category:Tools]]&lt;/div&gt;</summary>
		<author><name>Nader</name></author>
	</entry>
	<entry>
		<id>https://wiki.nbi.ku.dk/w/cleanroom/index.php?title=AccuThermo_RTA&amp;diff=1452</id>
		<title>AccuThermo RTA</title>
		<link rel="alternate" type="text/html" href="https://wiki.nbi.ku.dk/w/cleanroom/index.php?title=AccuThermo_RTA&amp;diff=1452"/>
		<updated>2018-03-19T10:43:30Z</updated>

		<summary type="html">&lt;p&gt;Nader: /* Startup Procedure */&lt;/p&gt;
&lt;hr /&gt;
&lt;div&gt;{{Infobox tool&lt;br /&gt;
|image = Tool RTA.jpg&lt;br /&gt;
|toolfullname = AccuThermo AW 610&lt;br /&gt;
|website = https://allwin21.com/&lt;br /&gt;
|company = Allwin21 Corp.&lt;br /&gt;
|description = Rapid thermal annealer&lt;br /&gt;
|location = 03.2.213&lt;br /&gt;
|primary = Nader&lt;br /&gt;
|secondary = Shiv&lt;br /&gt;
|limits = None&lt;br /&gt;
|computer = TBD&lt;br /&gt;
|manual = TBD&lt;br /&gt;
}}&lt;br /&gt;
&lt;br /&gt;
= RTP AW610 =&lt;br /&gt;
&lt;br /&gt;
Short description&lt;br /&gt;
&lt;br /&gt;
&lt;br /&gt;
== Startup Procedure ==&lt;br /&gt;
&lt;br /&gt;
If this is your first time using the machine, consult the Czar for training. You can use the computer to create a recipe without powering on the machine, so there is no reason not to do it first. Refer to &#039;&#039;&#039;Creating a recipe&#039;&#039;&#039;&lt;br /&gt;
&lt;br /&gt;
If your recipe is already created:&lt;br /&gt;
&lt;br /&gt;
:#Sign up the sheet..&lt;br /&gt;
:#Make sure the Lamp Power is set to &#039;&#039;&#039;OFF&#039;&#039;&#039;&lt;br /&gt;
:#Make sure the power switch on the wall is set to &#039;&#039;&#039;ON&#039;&#039;&#039;.&lt;br /&gt;
:#Check that the emergency button is not engaged( is pulled out ).&lt;br /&gt;
:#Load your sample into the susceptor.&lt;br /&gt;
:#Open oven door approx. &#039;&#039;&#039;10cm out.&#039;&#039;&#039; &#039;&#039;This will prevent any potential overpressure from shattering the quartz isolation chamber&#039;&#039;&lt;br /&gt;
:#Load the susceptor inside the chamber and close the door.&lt;br /&gt;
:#Open up for Air cooling valves&#039;&#039;&#039;(5.5 bar)&#039;&#039;&#039;.&lt;br /&gt;
:#Open up the process gas/gasses on the cylinders that you need by opening the main valves on the cylinders. Pressure of the regulator on manometer should be set to &#039;&#039;&#039;1.5 bar&#039;&#039;&#039;.&lt;br /&gt;
:#Turn the blue valve on the blue tube to open for air cooling line. &#039;&#039;&#039;The pressure should be around 2,5bar and the flow rate of above 280&#039;&#039;&#039;.&lt;br /&gt;
:#Load the sample into the system.&lt;br /&gt;
:#Turn the Lamp Power &#039;&#039;&#039;ON&#039;&#039;&#039; in font.&lt;br /&gt;
:#Check that the water flow is between &#039;&#039;&#039;500-700&#039;&#039;&#039; lph during your run.&lt;br /&gt;
:#Choose and load your recipe.&lt;br /&gt;
:#Run the proces.&lt;br /&gt;
&lt;br /&gt;
== Power Down Procedure ==&lt;br /&gt;
&lt;br /&gt;
After the system has cooled down and the sample was removed:&lt;br /&gt;
&lt;br /&gt;
:#Make sure the Lamp Power is set to &#039;&#039;&#039;OFF&#039;&#039;&#039;&lt;br /&gt;
:#Open the oven door around &#039;&#039;&#039;10cm&#039;&#039;&#039; and unload the susceptor.&lt;br /&gt;
:#&#039;&#039;&#039;Put&#039;&#039;&#039; the wafer back in the oven and close the door.&lt;br /&gt;
:#Turn the blue knob on the blue tube the  line to &#039;&#039;&#039;Close&#039;&#039;&#039; position.&lt;br /&gt;
:#Close the main valves for the process gasses that have been used.&lt;br /&gt;
:#&#039;&#039;&#039;Close&#039;&#039;&#039; the Air cooling valves.&lt;br /&gt;
&lt;br /&gt;
For recipe creation and sample handling refer to the wiki. &lt;br /&gt;
&lt;br /&gt;
The system should be left with AC power connected and turned on and the cooling water flowing. On the computer press ESC until the main menu appears.&lt;br /&gt;
&lt;br /&gt;
== Creating a recipe ==&lt;br /&gt;
&lt;br /&gt;
For managing the annealing process the RTP AW610 uses a custom software suite. Before creating a recipe consider if you will be using a susceptor&#039;&#039;(refer to Sample loading)&#039;&#039;.&lt;br /&gt;
&lt;br /&gt;
To create a recipe:&lt;br /&gt;
&lt;br /&gt;
:*First navigate to &#039;&#039;&#039;&#039;&#039;Process for Engineer&#039;&#039;&#039;&#039;&#039; tab in the main menu&lt;br /&gt;
:*click on the &#039;&#039;&#039;NEW&#039;&#039;&#039; recipe in the recipe list&lt;br /&gt;
:*click on &#039;&#039;&#039;&#039;&#039;Edit Recipe&#039;&#039;&#039;&#039;&#039;&lt;br /&gt;
:*Write a new name for your recipe in the respective field and click on &#039;&#039;&#039;&#039;&#039;Save&#039;&#039;&#039;&#039;&#039;. This creates a new recipe in the list that you can now freely edit.&lt;br /&gt;
:*Check &#039;&#039;&#039;&#039;&#039;Sensor type&#039;&#039;&#039;&#039;&#039; to be set to &#039;&#039;&#039;&#039;&#039;Thermocouple&#039;&#039;&#039;&#039;&#039; and &#039;&#039;&#039;&#039;&#039;Wafer Type&#039;&#039;&#039;&#039;&#039; to be set to either &#039;&#039;&#039;&#039;&#039;Susceptor&#039;&#039;&#039;&#039;&#039; or &#039;&#039;&#039;&#039;&#039;Wafer&#039;&#039;&#039;&#039;&#039; depending on what you will be using.(&#039;&#039;consult Sample loading section&#039;&#039;)&lt;br /&gt;
&lt;br /&gt;
Other parameters should be left as they are unless you know what you are doing and want something different.&lt;br /&gt;
&lt;br /&gt;
You can now proceed with creating the recipe sequence itself. The available parameters are step number, function, time for a given step, temperature, init factor and gas flow for each connected process gas. Ignore the initiation factor.&lt;br /&gt;
&lt;br /&gt;
Main available functions are:&lt;br /&gt;
&lt;br /&gt;
:*&#039;&#039;&#039;Delay&#039;&#039;&#039; - keeps the lamp power off while maintaining other parametes, such as gas flow rates. Used for purging the chamber of air as an initial step and is a good option for cooling.&lt;br /&gt;
&lt;br /&gt;
:*&#039;&#039;&#039;Ramp&#039;&#039;&#039; - ramps the temperature up or down to a desired value. The ramping rate is calculated by &#039;&#039;&#039;&#039;&#039;time/target temperature&#039;&#039;&#039;&#039;&#039;. Note: &#039;&#039;when using a susceptor, maximum ramp up rates should not exceed 15C/s&#039;&#039;&lt;br /&gt;
&lt;br /&gt;
:*&#039;&#039;&#039;Steady&#039;&#039;&#039; - keeps the lamps turned on and the temperature at a set value. The ideal step for baking the sample at a particular temperatures for a longer time.&lt;br /&gt;
&lt;br /&gt;
===&#039;&#039;&#039;Important&#039;&#039;&#039;===&lt;br /&gt;
&lt;br /&gt;
&#039;&#039;&#039;The total flow rate through the chamber should never exceed 15slpm&#039;&#039;&#039;.&lt;br /&gt;
&lt;br /&gt;
&#039;&#039;&#039;At the temperatures above 600C the thermocouple begins to melt with the susceptor or a silicon wafer.&#039;&#039;&#039;&lt;br /&gt;
&lt;br /&gt;
&lt;br /&gt;
&lt;br /&gt;
Tips for creating a good recipe:&lt;br /&gt;
&lt;br /&gt;
A good initial step is to displace the normal atmosphere by Nitrogen. The total volume of the quartz chamber is 0.84l, therefore it is a good idea to start the process by letting Nitrogen flow into the chamber at around 5slpm for 15-20 seconds. After this initial step is complete, add or replace Nitrogen with a desired process gas.&lt;br /&gt;
&lt;br /&gt;
During &#039;&#039;&#039;&#039;&#039;Ramping&#039;&#039;&#039;&#039;&#039; and &#039;&#039;&#039;&#039;&#039;Steady&#039;&#039;&#039;&#039;&#039; step, the maximum total flow rate should be 5slpm&lt;br /&gt;
&lt;br /&gt;
It takes between 10-15 seconds for the machine to stabilize the temperature. Consider this when creating a multistep recipe.&lt;br /&gt;
&lt;br /&gt;
&lt;br /&gt;
&lt;br /&gt;
== Sample loading ==&lt;br /&gt;
&lt;br /&gt;
The first rule: Dont touch anything behind the front door without gloves!&lt;br /&gt;
&lt;br /&gt;
The sample holder is a quartz tray. Be gentle when putting down your sample!&lt;br /&gt;
&lt;br /&gt;
=====Thermocouple=====&lt;br /&gt;
&lt;br /&gt;
The temperature measurement in the RTP is obtained with a thermocouple which is connected to the oven door. When placing a sample(a wafer or a susceptor) onto the quartz loading tray make sure that:&lt;br /&gt;
&lt;br /&gt;
::*the thermocople is still in one piece&lt;br /&gt;
::*the tip of the thermocouple is in contact with your sample&lt;br /&gt;
::*the two wires of the thermocouple are not in contact with eachother or the sample at any point&lt;br /&gt;
::*when closing the door ensure that the thermocouple will not be bent&lt;br /&gt;
&lt;br /&gt;
If not set correctly, the temperature readout will not be accurate and might lead to the destruction of the sample or the machine. Use your fingers of tweezers to gently shape the thermocople wires in a sort of a bow shaped spring. If broken, contact the Czar or refer to the Service Manual to replace it.&lt;br /&gt;
&lt;br /&gt;
=====Susceptor=====&lt;br /&gt;
&lt;br /&gt;
When using a small sample or if your sample is transparent to the radiation spectrum emitted by the lamps(like GaAs) you&#039;d want to use a susceptor. The susceptor is a SiC coated graphite piece that will evenly heat the sample that is placed inside.&lt;br /&gt;
&lt;br /&gt;
::* The inside of the susceptor should not be exposed outside of the cleanroom&lt;br /&gt;
::* Before loading your sample into the susceptor, examine the latter for cracks and scratches. If any deep scratches or cracks are present - use another one and report the issue to a Czar&lt;br /&gt;
::* With flow rates of around 5 slpm, the process gasses should have no problem reaching the inside of the susceptor&lt;br /&gt;
::* &#039;&#039;&#039;&#039;&#039;Be careful not to scratch the susceptor when placing your sample inside it&#039;&#039;&#039;&#039;&#039;&lt;br /&gt;
::* &#039;&#039;&#039;&#039;&#039;When using a susceptor the maximum heating rate should not exceed 15C/s!&#039;&#039;&#039;&#039;&#039;&lt;br /&gt;
::* &#039;&#039;&#039;&#039;&#039;Do not heat the susceptor without a sample inside it&#039;&#039;&#039;&#039;&#039;&lt;br /&gt;
::* Store the susceptor in a designated spot. Do not leave it in the oven.&lt;br /&gt;
&lt;br /&gt;
==[[RTP log]]==&lt;br /&gt;
&lt;br /&gt;
List of avalable spare parts and maintenance log&lt;br /&gt;
&lt;br /&gt;
[[Category:Tools]]&lt;/div&gt;</summary>
		<author><name>Nader</name></author>
	</entry>
	<entry>
		<id>https://wiki.nbi.ku.dk/w/cleanroom/index.php?title=AccuThermo_RTA&amp;diff=1451</id>
		<title>AccuThermo RTA</title>
		<link rel="alternate" type="text/html" href="https://wiki.nbi.ku.dk/w/cleanroom/index.php?title=AccuThermo_RTA&amp;diff=1451"/>
		<updated>2018-03-19T10:37:06Z</updated>

		<summary type="html">&lt;p&gt;Nader: /* Startup Procedure */&lt;/p&gt;
&lt;hr /&gt;
&lt;div&gt;{{Infobox tool&lt;br /&gt;
|image = Tool RTA.jpg&lt;br /&gt;
|toolfullname = AccuThermo AW 610&lt;br /&gt;
|website = https://allwin21.com/&lt;br /&gt;
|company = Allwin21 Corp.&lt;br /&gt;
|description = Rapid thermal annealer&lt;br /&gt;
|location = 03.2.213&lt;br /&gt;
|primary = Nader&lt;br /&gt;
|secondary = Shiv&lt;br /&gt;
|limits = None&lt;br /&gt;
|computer = TBD&lt;br /&gt;
|manual = TBD&lt;br /&gt;
}}&lt;br /&gt;
&lt;br /&gt;
= RTP AW610 =&lt;br /&gt;
&lt;br /&gt;
Short description&lt;br /&gt;
&lt;br /&gt;
&lt;br /&gt;
== Startup Procedure ==&lt;br /&gt;
&lt;br /&gt;
If this is your first time using the machine, consult the Czar for training. You can use the computer to create a recipe without powering on the machine, so there is no reason not to do it first. Refer to &#039;&#039;&#039;Creating a recipe&#039;&#039;&#039;&lt;br /&gt;
&lt;br /&gt;
If your recipe is already created:&lt;br /&gt;
&lt;br /&gt;
:#Sign up the sheet..&lt;br /&gt;
:#Make sure the Lamp Power is set to &#039;&#039;&#039;OFF&#039;&#039;&#039;&lt;br /&gt;
:#Make sure the power switch on the wall is set to &#039;&#039;&#039;ON&#039;&#039;&#039;.&lt;br /&gt;
:#Check that the emergency button is not engaged( is pulled out ).&lt;br /&gt;
:#Load your sample into the susceptor.&lt;br /&gt;
:#Open oven door approx. &#039;&#039;&#039;10cm out.&#039;&#039;&#039; &#039;&#039;This will prevent any potential overpressure from shattering the quartz isolation chamber&#039;&#039;&lt;br /&gt;
:#Load the susceptor inside the chamber and close the door.&lt;br /&gt;
:#Open up for Air cooling valves&#039;&#039;&#039;(5,5 bar)&#039;&#039;&#039;.&lt;br /&gt;
:#Open up the process gas/gasses on the cylinders that you need by opening the main valves on the cylinders. Pressure of the regulator on manometer should be set to &#039;&#039;&#039;1.5 bar&#039;&#039;&#039;.&lt;br /&gt;
:#Turn the blue valve on the blue tube to open for air cooling line. &#039;&#039;&#039;The pressure should be around 2,5bar and the flow rate of above 280&#039;&#039;&#039;.&lt;br /&gt;
:#Load the sample into the system.&lt;br /&gt;
:#Turn the Lamp Power &#039;&#039;&#039;ON&#039;&#039;&#039; in font.&lt;br /&gt;
:#Check that the water flow is between &#039;&#039;&#039;500-700&#039;&#039;&#039; lph during your run.&lt;br /&gt;
:#Choose and load your recipe.&lt;br /&gt;
:#Run the proces.&lt;br /&gt;
&lt;br /&gt;
== Power Down Procedure ==&lt;br /&gt;
&lt;br /&gt;
After the system has cooled down and the sample was removed:&lt;br /&gt;
&lt;br /&gt;
:#Make sure the Lamp Power is set to &#039;&#039;&#039;OFF&#039;&#039;&#039;&lt;br /&gt;
:#Open the oven door around &#039;&#039;&#039;10cm&#039;&#039;&#039; and unload the susceptor.&lt;br /&gt;
:#&#039;&#039;&#039;Put&#039;&#039;&#039; the wafer back in the oven and close the door.&lt;br /&gt;
:#Turn the blue knob on the blue tube the  line to &#039;&#039;&#039;Close&#039;&#039;&#039; position.&lt;br /&gt;
:#Close the main valves for the process gasses that have been used.&lt;br /&gt;
:#&#039;&#039;&#039;Close&#039;&#039;&#039; the Air cooling valves.&lt;br /&gt;
&lt;br /&gt;
For recipe creation and sample handling refer to the wiki. &lt;br /&gt;
&lt;br /&gt;
The system should be left with AC power connected and turned on and the cooling water flowing. On the computer press ESC until the main menu appears.&lt;br /&gt;
&lt;br /&gt;
== Creating a recipe ==&lt;br /&gt;
&lt;br /&gt;
For managing the annealing process the RTP AW610 uses a custom software suite. Before creating a recipe consider if you will be using a susceptor&#039;&#039;(refer to Sample loading)&#039;&#039;.&lt;br /&gt;
&lt;br /&gt;
To create a recipe:&lt;br /&gt;
&lt;br /&gt;
:*First navigate to &#039;&#039;&#039;&#039;&#039;Process for Engineer&#039;&#039;&#039;&#039;&#039; tab in the main menu&lt;br /&gt;
:*click on the &#039;&#039;&#039;NEW&#039;&#039;&#039; recipe in the recipe list&lt;br /&gt;
:*click on &#039;&#039;&#039;&#039;&#039;Edit Recipe&#039;&#039;&#039;&#039;&#039;&lt;br /&gt;
:*Write a new name for your recipe in the respective field and click on &#039;&#039;&#039;&#039;&#039;Save&#039;&#039;&#039;&#039;&#039;. This creates a new recipe in the list that you can now freely edit.&lt;br /&gt;
:*Check &#039;&#039;&#039;&#039;&#039;Sensor type&#039;&#039;&#039;&#039;&#039; to be set to &#039;&#039;&#039;&#039;&#039;Thermocouple&#039;&#039;&#039;&#039;&#039; and &#039;&#039;&#039;&#039;&#039;Wafer Type&#039;&#039;&#039;&#039;&#039; to be set to either &#039;&#039;&#039;&#039;&#039;Susceptor&#039;&#039;&#039;&#039;&#039; or &#039;&#039;&#039;&#039;&#039;Wafer&#039;&#039;&#039;&#039;&#039; depending on what you will be using.(&#039;&#039;consult Sample loading section&#039;&#039;)&lt;br /&gt;
&lt;br /&gt;
Other parameters should be left as they are unless you know what you are doing and want something different.&lt;br /&gt;
&lt;br /&gt;
You can now proceed with creating the recipe sequence itself. The available parameters are step number, function, time for a given step, temperature, init factor and gas flow for each connected process gas. Ignore the initiation factor.&lt;br /&gt;
&lt;br /&gt;
Main available functions are:&lt;br /&gt;
&lt;br /&gt;
:*&#039;&#039;&#039;Delay&#039;&#039;&#039; - keeps the lamp power off while maintaining other parametes, such as gas flow rates. Used for purging the chamber of air as an initial step and is a good option for cooling.&lt;br /&gt;
&lt;br /&gt;
:*&#039;&#039;&#039;Ramp&#039;&#039;&#039; - ramps the temperature up or down to a desired value. The ramping rate is calculated by &#039;&#039;&#039;&#039;&#039;time/target temperature&#039;&#039;&#039;&#039;&#039;. Note: &#039;&#039;when using a susceptor, maximum ramp up rates should not exceed 15C/s&#039;&#039;&lt;br /&gt;
&lt;br /&gt;
:*&#039;&#039;&#039;Steady&#039;&#039;&#039; - keeps the lamps turned on and the temperature at a set value. The ideal step for baking the sample at a particular temperatures for a longer time.&lt;br /&gt;
&lt;br /&gt;
===&#039;&#039;&#039;Important&#039;&#039;&#039;===&lt;br /&gt;
&lt;br /&gt;
&#039;&#039;&#039;The total flow rate through the chamber should never exceed 15slpm&#039;&#039;&#039;.&lt;br /&gt;
&lt;br /&gt;
&#039;&#039;&#039;At the temperatures above 600C the thermocouple begins to melt with the susceptor or a silicon wafer.&#039;&#039;&#039;&lt;br /&gt;
&lt;br /&gt;
&lt;br /&gt;
&lt;br /&gt;
Tips for creating a good recipe:&lt;br /&gt;
&lt;br /&gt;
A good initial step is to displace the normal atmosphere by Nitrogen. The total volume of the quartz chamber is 0.84l, therefore it is a good idea to start the process by letting Nitrogen flow into the chamber at around 5slpm for 15-20 seconds. After this initial step is complete, add or replace Nitrogen with a desired process gas.&lt;br /&gt;
&lt;br /&gt;
During &#039;&#039;&#039;&#039;&#039;Ramping&#039;&#039;&#039;&#039;&#039; and &#039;&#039;&#039;&#039;&#039;Steady&#039;&#039;&#039;&#039;&#039; step, the maximum total flow rate should be 5slpm&lt;br /&gt;
&lt;br /&gt;
It takes between 10-15 seconds for the machine to stabilize the temperature. Consider this when creating a multistep recipe.&lt;br /&gt;
&lt;br /&gt;
&lt;br /&gt;
&lt;br /&gt;
== Sample loading ==&lt;br /&gt;
&lt;br /&gt;
The first rule: Dont touch anything behind the front door without gloves!&lt;br /&gt;
&lt;br /&gt;
The sample holder is a quartz tray. Be gentle when putting down your sample!&lt;br /&gt;
&lt;br /&gt;
=====Thermocouple=====&lt;br /&gt;
&lt;br /&gt;
The temperature measurement in the RTP is obtained with a thermocouple which is connected to the oven door. When placing a sample(a wafer or a susceptor) onto the quartz loading tray make sure that:&lt;br /&gt;
&lt;br /&gt;
::*the thermocople is still in one piece&lt;br /&gt;
::*the tip of the thermocouple is in contact with your sample&lt;br /&gt;
::*the two wires of the thermocouple are not in contact with eachother or the sample at any point&lt;br /&gt;
::*when closing the door ensure that the thermocouple will not be bent&lt;br /&gt;
&lt;br /&gt;
If not set correctly, the temperature readout will not be accurate and might lead to the destruction of the sample or the machine. Use your fingers of tweezers to gently shape the thermocople wires in a sort of a bow shaped spring. If broken, contact the Czar or refer to the Service Manual to replace it.&lt;br /&gt;
&lt;br /&gt;
=====Susceptor=====&lt;br /&gt;
&lt;br /&gt;
When using a small sample or if your sample is transparent to the radiation spectrum emitted by the lamps(like GaAs) you&#039;d want to use a susceptor. The susceptor is a SiC coated graphite piece that will evenly heat the sample that is placed inside.&lt;br /&gt;
&lt;br /&gt;
::* The inside of the susceptor should not be exposed outside of the cleanroom&lt;br /&gt;
::* Before loading your sample into the susceptor, examine the latter for cracks and scratches. If any deep scratches or cracks are present - use another one and report the issue to a Czar&lt;br /&gt;
::* With flow rates of around 5 slpm, the process gasses should have no problem reaching the inside of the susceptor&lt;br /&gt;
::* &#039;&#039;&#039;&#039;&#039;Be careful not to scratch the susceptor when placing your sample inside it&#039;&#039;&#039;&#039;&#039;&lt;br /&gt;
::* &#039;&#039;&#039;&#039;&#039;When using a susceptor the maximum heating rate should not exceed 15C/s!&#039;&#039;&#039;&#039;&#039;&lt;br /&gt;
::* &#039;&#039;&#039;&#039;&#039;Do not heat the susceptor without a sample inside it&#039;&#039;&#039;&#039;&#039;&lt;br /&gt;
::* Store the susceptor in a designated spot. Do not leave it in the oven.&lt;br /&gt;
&lt;br /&gt;
==[[RTP log]]==&lt;br /&gt;
&lt;br /&gt;
List of avalable spare parts and maintenance log&lt;br /&gt;
&lt;br /&gt;
[[Category:Tools]]&lt;/div&gt;</summary>
		<author><name>Nader</name></author>
	</entry>
	<entry>
		<id>https://wiki.nbi.ku.dk/w/cleanroom/index.php?title=AccuThermo_RTA&amp;diff=1450</id>
		<title>AccuThermo RTA</title>
		<link rel="alternate" type="text/html" href="https://wiki.nbi.ku.dk/w/cleanroom/index.php?title=AccuThermo_RTA&amp;diff=1450"/>
		<updated>2018-03-19T10:29:43Z</updated>

		<summary type="html">&lt;p&gt;Nader: /* Startup Procedure */&lt;/p&gt;
&lt;hr /&gt;
&lt;div&gt;{{Infobox tool&lt;br /&gt;
|image = Tool RTA.jpg&lt;br /&gt;
|toolfullname = AccuThermo AW 610&lt;br /&gt;
|website = https://allwin21.com/&lt;br /&gt;
|company = Allwin21 Corp.&lt;br /&gt;
|description = Rapid thermal annealer&lt;br /&gt;
|location = 03.2.213&lt;br /&gt;
|primary = Nader&lt;br /&gt;
|secondary = Shiv&lt;br /&gt;
|limits = None&lt;br /&gt;
|computer = TBD&lt;br /&gt;
|manual = TBD&lt;br /&gt;
}}&lt;br /&gt;
&lt;br /&gt;
= RTP AW610 =&lt;br /&gt;
&lt;br /&gt;
Short description&lt;br /&gt;
&lt;br /&gt;
&lt;br /&gt;
== Startup Procedure ==&lt;br /&gt;
&lt;br /&gt;
If this is your first time using the machine, consult the Czar for training. You can use the computer to create a recipe without powering on the machine, so there is no reason not to do it first. Refer to &#039;&#039;&#039;Creating a recipe&#039;&#039;&#039;&lt;br /&gt;
&lt;br /&gt;
If your recipe is already created:&lt;br /&gt;
&lt;br /&gt;
:#Sign up the sheet..&lt;br /&gt;
:#Make sure the Lamp Power is set to &#039;&#039;&#039;OFF&#039;&#039;&#039;&lt;br /&gt;
:#Make sure the power switch on the wall is set to &#039;&#039;&#039;ON&#039;&#039;&#039;.&lt;br /&gt;
:#Check that the emergency button is not engaged.&lt;br /&gt;
:#Load your sample into the susceptor.&lt;br /&gt;
:#Open oven door approx &#039;&#039;&#039;10cm out.&#039;&#039;&#039; &#039;&#039;This will prevent any potential overpressure from shattering the quartz isolation chamber&#039;&#039;&lt;br /&gt;
:#Load the susceptor inside the chamber and close the door.&lt;br /&gt;
:#Open up for Air cooling valves&#039;&#039;&#039;(5,5 bar)&#039;&#039;&#039;.&lt;br /&gt;
:#Open up the process gas/gasses on the cylinders that you need by opening the main valves on the cylinders. Pressure of the regulator on manometer should be set to &#039;&#039;&#039;1.5 bar&#039;&#039;&#039;.&lt;br /&gt;
:#Turn the blue valve on the blue tube to open for air cooling line. &#039;&#039;&#039;The pressure should be around 2,5bar and the flow rate of above 280&#039;&#039;&#039;.&lt;br /&gt;
:#Load the sample into the system.&lt;br /&gt;
:#Turn the Lamp Power &#039;&#039;&#039;ON&#039;&#039;&#039; in font.&lt;br /&gt;
:#Check that the water flow is between &#039;&#039;&#039;500-700&#039;&#039;&#039; lph during your run.&lt;br /&gt;
:#Choose and load your reciepe.&lt;br /&gt;
:#Run the process.&lt;br /&gt;
&lt;br /&gt;
== Power Down Procedure ==&lt;br /&gt;
&lt;br /&gt;
After the system has cooled down and the sample was removed:&lt;br /&gt;
&lt;br /&gt;
:#Make sure the Lamp Power is set to &#039;&#039;&#039;OFF&#039;&#039;&#039;&lt;br /&gt;
:#Open the oven door around &#039;&#039;&#039;10cm&#039;&#039;&#039; and unload the susceptor.&lt;br /&gt;
:#&#039;&#039;&#039;Put&#039;&#039;&#039; the wafer back in the oven and close the door.&lt;br /&gt;
:#Turn the blue knob on the blue tube the  line to &#039;&#039;&#039;Close&#039;&#039;&#039; position.&lt;br /&gt;
:#Close the main valves for the process gasses that have been used.&lt;br /&gt;
:#&#039;&#039;&#039;Close&#039;&#039;&#039; the Air cooling valves.&lt;br /&gt;
&lt;br /&gt;
For recipe creation and sample handling refer to the wiki. &lt;br /&gt;
&lt;br /&gt;
The system should be left with AC power connected and turned on and the cooling water flowing. On the computer press ESC until the main menu appears.&lt;br /&gt;
&lt;br /&gt;
== Creating a recipe ==&lt;br /&gt;
&lt;br /&gt;
For managing the annealing process the RTP AW610 uses a custom software suite. Before creating a recipe consider if you will be using a susceptor&#039;&#039;(refer to Sample loading)&#039;&#039;.&lt;br /&gt;
&lt;br /&gt;
To create a recipe:&lt;br /&gt;
&lt;br /&gt;
:*First navigate to &#039;&#039;&#039;&#039;&#039;Process for Engineer&#039;&#039;&#039;&#039;&#039; tab in the main menu&lt;br /&gt;
:*click on the &#039;&#039;&#039;NEW&#039;&#039;&#039; recipe in the recipe list&lt;br /&gt;
:*click on &#039;&#039;&#039;&#039;&#039;Edit Recipe&#039;&#039;&#039;&#039;&#039;&lt;br /&gt;
:*Write a new name for your recipe in the respective field and click on &#039;&#039;&#039;&#039;&#039;Save&#039;&#039;&#039;&#039;&#039;. This creates a new recipe in the list that you can now freely edit.&lt;br /&gt;
:*Check &#039;&#039;&#039;&#039;&#039;Sensor type&#039;&#039;&#039;&#039;&#039; to be set to &#039;&#039;&#039;&#039;&#039;Thermocouple&#039;&#039;&#039;&#039;&#039; and &#039;&#039;&#039;&#039;&#039;Wafer Type&#039;&#039;&#039;&#039;&#039; to be set to either &#039;&#039;&#039;&#039;&#039;Susceptor&#039;&#039;&#039;&#039;&#039; or &#039;&#039;&#039;&#039;&#039;Wafer&#039;&#039;&#039;&#039;&#039; depending on what you will be using.(&#039;&#039;consult Sample loading section&#039;&#039;)&lt;br /&gt;
&lt;br /&gt;
Other parameters should be left as they are unless you know what you are doing and want something different.&lt;br /&gt;
&lt;br /&gt;
You can now proceed with creating the recipe sequence itself. The available parameters are step number, function, time for a given step, temperature, init factor and gas flow for each connected process gas. Ignore the initiation factor.&lt;br /&gt;
&lt;br /&gt;
Main available functions are:&lt;br /&gt;
&lt;br /&gt;
:*&#039;&#039;&#039;Delay&#039;&#039;&#039; - keeps the lamp power off while maintaining other parametes, such as gas flow rates. Used for purging the chamber of air as an initial step and is a good option for cooling.&lt;br /&gt;
&lt;br /&gt;
:*&#039;&#039;&#039;Ramp&#039;&#039;&#039; - ramps the temperature up or down to a desired value. The ramping rate is calculated by &#039;&#039;&#039;&#039;&#039;time/target temperature&#039;&#039;&#039;&#039;&#039;. Note: &#039;&#039;when using a susceptor, maximum ramp up rates should not exceed 15C/s&#039;&#039;&lt;br /&gt;
&lt;br /&gt;
:*&#039;&#039;&#039;Steady&#039;&#039;&#039; - keeps the lamps turned on and the temperature at a set value. The ideal step for baking the sample at a particular temperatures for a longer time.&lt;br /&gt;
&lt;br /&gt;
===&#039;&#039;&#039;Important&#039;&#039;&#039;===&lt;br /&gt;
&lt;br /&gt;
&#039;&#039;&#039;The total flow rate through the chamber should never exceed 15slpm&#039;&#039;&#039;.&lt;br /&gt;
&lt;br /&gt;
&#039;&#039;&#039;At the temperatures above 600C the thermocouple begins to melt with the susceptor or a silicon wafer.&#039;&#039;&#039;&lt;br /&gt;
&lt;br /&gt;
&lt;br /&gt;
&lt;br /&gt;
Tips for creating a good recipe:&lt;br /&gt;
&lt;br /&gt;
A good initial step is to displace the normal atmosphere by Nitrogen. The total volume of the quartz chamber is 0.84l, therefore it is a good idea to start the process by letting Nitrogen flow into the chamber at around 5slpm for 15-20 seconds. After this initial step is complete, add or replace Nitrogen with a desired process gas.&lt;br /&gt;
&lt;br /&gt;
During &#039;&#039;&#039;&#039;&#039;Ramping&#039;&#039;&#039;&#039;&#039; and &#039;&#039;&#039;&#039;&#039;Steady&#039;&#039;&#039;&#039;&#039; step, the maximum total flow rate should be 5slpm&lt;br /&gt;
&lt;br /&gt;
It takes between 10-15 seconds for the machine to stabilize the temperature. Consider this when creating a multistep recipe.&lt;br /&gt;
&lt;br /&gt;
&lt;br /&gt;
&lt;br /&gt;
== Sample loading ==&lt;br /&gt;
&lt;br /&gt;
The first rule: Dont touch anything behind the front door without gloves!&lt;br /&gt;
&lt;br /&gt;
The sample holder is a quartz tray. Be gentle when putting down your sample!&lt;br /&gt;
&lt;br /&gt;
=====Thermocouple=====&lt;br /&gt;
&lt;br /&gt;
The temperature measurement in the RTP is obtained with a thermocouple which is connected to the oven door. When placing a sample(a wafer or a susceptor) onto the quartz loading tray make sure that:&lt;br /&gt;
&lt;br /&gt;
::*the thermocople is still in one piece&lt;br /&gt;
::*the tip of the thermocouple is in contact with your sample&lt;br /&gt;
::*the two wires of the thermocouple are not in contact with eachother or the sample at any point&lt;br /&gt;
::*when closing the door ensure that the thermocouple will not be bent&lt;br /&gt;
&lt;br /&gt;
If not set correctly, the temperature readout will not be accurate and might lead to the destruction of the sample or the machine. Use your fingers of tweezers to gently shape the thermocople wires in a sort of a bow shaped spring. If broken, contact the Czar or refer to the Service Manual to replace it.&lt;br /&gt;
&lt;br /&gt;
=====Susceptor=====&lt;br /&gt;
&lt;br /&gt;
When using a small sample or if your sample is transparent to the radiation spectrum emitted by the lamps(like GaAs) you&#039;d want to use a susceptor. The susceptor is a SiC coated graphite piece that will evenly heat the sample that is placed inside.&lt;br /&gt;
&lt;br /&gt;
::* The inside of the susceptor should not be exposed outside of the cleanroom&lt;br /&gt;
::* Before loading your sample into the susceptor, examine the latter for cracks and scratches. If any deep scratches or cracks are present - use another one and report the issue to a Czar&lt;br /&gt;
::* With flow rates of around 5 slpm, the process gasses should have no problem reaching the inside of the susceptor&lt;br /&gt;
::* &#039;&#039;&#039;&#039;&#039;Be careful not to scratch the susceptor when placing your sample inside it&#039;&#039;&#039;&#039;&#039;&lt;br /&gt;
::* &#039;&#039;&#039;&#039;&#039;When using a susceptor the maximum heating rate should not exceed 15C/s!&#039;&#039;&#039;&#039;&#039;&lt;br /&gt;
::* &#039;&#039;&#039;&#039;&#039;Do not heat the susceptor without a sample inside it&#039;&#039;&#039;&#039;&#039;&lt;br /&gt;
::* Store the susceptor in a designated spot. Do not leave it in the oven.&lt;br /&gt;
&lt;br /&gt;
==[[RTP log]]==&lt;br /&gt;
&lt;br /&gt;
List of avalable spare parts and maintenance log&lt;br /&gt;
&lt;br /&gt;
[[Category:Tools]]&lt;/div&gt;</summary>
		<author><name>Nader</name></author>
	</entry>
	<entry>
		<id>https://wiki.nbi.ku.dk/w/cleanroom/index.php?title=AccuThermo_RTA&amp;diff=1449</id>
		<title>AccuThermo RTA</title>
		<link rel="alternate" type="text/html" href="https://wiki.nbi.ku.dk/w/cleanroom/index.php?title=AccuThermo_RTA&amp;diff=1449"/>
		<updated>2018-03-19T10:25:03Z</updated>

		<summary type="html">&lt;p&gt;Nader: /* Power Down Procedure */&lt;/p&gt;
&lt;hr /&gt;
&lt;div&gt;{{Infobox tool&lt;br /&gt;
|image = Tool RTA.jpg&lt;br /&gt;
|toolfullname = AccuThermo AW 610&lt;br /&gt;
|website = https://allwin21.com/&lt;br /&gt;
|company = Allwin21 Corp.&lt;br /&gt;
|description = Rapid thermal annealer&lt;br /&gt;
|location = 03.2.213&lt;br /&gt;
|primary = Nader&lt;br /&gt;
|secondary = Shiv&lt;br /&gt;
|limits = None&lt;br /&gt;
|computer = TBD&lt;br /&gt;
|manual = TBD&lt;br /&gt;
}}&lt;br /&gt;
&lt;br /&gt;
= RTP AW610 =&lt;br /&gt;
&lt;br /&gt;
Short description&lt;br /&gt;
&lt;br /&gt;
&lt;br /&gt;
== Startup Procedure ==&lt;br /&gt;
&lt;br /&gt;
If this is your first time using the machine, consult the Czar for training. You can use the computer to create a recipe without powering on the machine, so there is no reason not to do it first. Refer to &#039;&#039;&#039;Creating a recipe&#039;&#039;&#039;&lt;br /&gt;
&lt;br /&gt;
If your recipe is already created:&lt;br /&gt;
&lt;br /&gt;
:#Sign up the sheet..&lt;br /&gt;
:#Make sure the Lamp Power is set to &#039;&#039;&#039;OFF&#039;&#039;&#039;&lt;br /&gt;
:#Make sure the power switch on the wall is set to &#039;&#039;&#039;ON&#039;&#039;&#039;.&lt;br /&gt;
:#Check that the emergency button is not engaged.&lt;br /&gt;
:#Load your sample into the round metal holder.&lt;br /&gt;
:#Open oven door approx &#039;&#039;&#039;10cm out.&#039;&#039;&#039; &#039;&#039;This will prevent any potential overpressure from shattering the quartz isolation chamber&#039;&#039;&lt;br /&gt;
:#Load the holder inside the chamber and close the door.&lt;br /&gt;
:#Open up for Air cooling and pneumatics&#039;&#039;&#039;(5,5 bar)&#039;&#039;&#039;.&lt;br /&gt;
:#Open up the process gas/gasses on the cylinders that you need. Pressure of the regulator on manometer should be set to &#039;&#039;&#039;1.5 bar&#039;&#039;&#039;.&lt;br /&gt;
:#Turn the blue valve on the blue tube to open for air cooling line. &#039;&#039;&#039;The pressure should be around 2,5bar and the flow rate of above 280&#039;&#039;&#039;.&lt;br /&gt;
:#Load the sample into the system&lt;br /&gt;
:#Turn the Lamp Power &#039;&#039;&#039;ON&#039;&#039;&#039; in font.&lt;br /&gt;
:#Check that the water flow is between &#039;&#039;&#039;500-700&#039;&#039;&#039; lph during your run.&lt;br /&gt;
:#Choose and load your reciepe.&lt;br /&gt;
:#Run the process.&lt;br /&gt;
&lt;br /&gt;
== Power Down Procedure ==&lt;br /&gt;
&lt;br /&gt;
After the system has cooled down and the sample was removed:&lt;br /&gt;
&lt;br /&gt;
:#Make sure the Lamp Power is set to &#039;&#039;&#039;OFF&#039;&#039;&#039;&lt;br /&gt;
:#Open the oven door around &#039;&#039;&#039;10cm&#039;&#039;&#039; and unload the susceptor.&lt;br /&gt;
:#&#039;&#039;&#039;Put&#039;&#039;&#039; the wafer back in the oven and close the door.&lt;br /&gt;
:#Turn the blue knob on the blue tube the  line to &#039;&#039;&#039;Close&#039;&#039;&#039; position.&lt;br /&gt;
:#Close the main valves for the process gasses that have been used.&lt;br /&gt;
:#&#039;&#039;&#039;Close&#039;&#039;&#039; the Air cooling valves.&lt;br /&gt;
&lt;br /&gt;
For recipe creation and sample handling refer to the wiki. &lt;br /&gt;
&lt;br /&gt;
The system should be left with AC power connected and turned on and the cooling water flowing. On the computer press ESC until the main menu appears.&lt;br /&gt;
&lt;br /&gt;
== Creating a recipe ==&lt;br /&gt;
&lt;br /&gt;
For managing the annealing process the RTP AW610 uses a custom software suite. Before creating a recipe consider if you will be using a susceptor&#039;&#039;(refer to Sample loading)&#039;&#039;.&lt;br /&gt;
&lt;br /&gt;
To create a recipe:&lt;br /&gt;
&lt;br /&gt;
:*First navigate to &#039;&#039;&#039;&#039;&#039;Process for Engineer&#039;&#039;&#039;&#039;&#039; tab in the main menu&lt;br /&gt;
:*click on the &#039;&#039;&#039;NEW&#039;&#039;&#039; recipe in the recipe list&lt;br /&gt;
:*click on &#039;&#039;&#039;&#039;&#039;Edit Recipe&#039;&#039;&#039;&#039;&#039;&lt;br /&gt;
:*Write a new name for your recipe in the respective field and click on &#039;&#039;&#039;&#039;&#039;Save&#039;&#039;&#039;&#039;&#039;. This creates a new recipe in the list that you can now freely edit.&lt;br /&gt;
:*Check &#039;&#039;&#039;&#039;&#039;Sensor type&#039;&#039;&#039;&#039;&#039; to be set to &#039;&#039;&#039;&#039;&#039;Thermocouple&#039;&#039;&#039;&#039;&#039; and &#039;&#039;&#039;&#039;&#039;Wafer Type&#039;&#039;&#039;&#039;&#039; to be set to either &#039;&#039;&#039;&#039;&#039;Susceptor&#039;&#039;&#039;&#039;&#039; or &#039;&#039;&#039;&#039;&#039;Wafer&#039;&#039;&#039;&#039;&#039; depending on what you will be using.(&#039;&#039;consult Sample loading section&#039;&#039;)&lt;br /&gt;
&lt;br /&gt;
Other parameters should be left as they are unless you know what you are doing and want something different.&lt;br /&gt;
&lt;br /&gt;
You can now proceed with creating the recipe sequence itself. The available parameters are step number, function, time for a given step, temperature, init factor and gas flow for each connected process gas. Ignore the initiation factor.&lt;br /&gt;
&lt;br /&gt;
Main available functions are:&lt;br /&gt;
&lt;br /&gt;
:*&#039;&#039;&#039;Delay&#039;&#039;&#039; - keeps the lamp power off while maintaining other parametes, such as gas flow rates. Used for purging the chamber of air as an initial step and is a good option for cooling.&lt;br /&gt;
&lt;br /&gt;
:*&#039;&#039;&#039;Ramp&#039;&#039;&#039; - ramps the temperature up or down to a desired value. The ramping rate is calculated by &#039;&#039;&#039;&#039;&#039;time/target temperature&#039;&#039;&#039;&#039;&#039;. Note: &#039;&#039;when using a susceptor, maximum ramp up rates should not exceed 15C/s&#039;&#039;&lt;br /&gt;
&lt;br /&gt;
:*&#039;&#039;&#039;Steady&#039;&#039;&#039; - keeps the lamps turned on and the temperature at a set value. The ideal step for baking the sample at a particular temperatures for a longer time.&lt;br /&gt;
&lt;br /&gt;
===&#039;&#039;&#039;Important&#039;&#039;&#039;===&lt;br /&gt;
&lt;br /&gt;
&#039;&#039;&#039;The total flow rate through the chamber should never exceed 15slpm&#039;&#039;&#039;.&lt;br /&gt;
&lt;br /&gt;
&#039;&#039;&#039;At the temperatures above 600C the thermocouple begins to melt with the susceptor or a silicon wafer.&#039;&#039;&#039;&lt;br /&gt;
&lt;br /&gt;
&lt;br /&gt;
&lt;br /&gt;
Tips for creating a good recipe:&lt;br /&gt;
&lt;br /&gt;
A good initial step is to displace the normal atmosphere by Nitrogen. The total volume of the quartz chamber is 0.84l, therefore it is a good idea to start the process by letting Nitrogen flow into the chamber at around 5slpm for 15-20 seconds. After this initial step is complete, add or replace Nitrogen with a desired process gas.&lt;br /&gt;
&lt;br /&gt;
During &#039;&#039;&#039;&#039;&#039;Ramping&#039;&#039;&#039;&#039;&#039; and &#039;&#039;&#039;&#039;&#039;Steady&#039;&#039;&#039;&#039;&#039; step, the maximum total flow rate should be 5slpm&lt;br /&gt;
&lt;br /&gt;
It takes between 10-15 seconds for the machine to stabilize the temperature. Consider this when creating a multistep recipe.&lt;br /&gt;
&lt;br /&gt;
&lt;br /&gt;
&lt;br /&gt;
== Sample loading ==&lt;br /&gt;
&lt;br /&gt;
The first rule: Dont touch anything behind the front door without gloves!&lt;br /&gt;
&lt;br /&gt;
The sample holder is a quartz tray. Be gentle when putting down your sample!&lt;br /&gt;
&lt;br /&gt;
=====Thermocouple=====&lt;br /&gt;
&lt;br /&gt;
The temperature measurement in the RTP is obtained with a thermocouple which is connected to the oven door. When placing a sample(a wafer or a susceptor) onto the quartz loading tray make sure that:&lt;br /&gt;
&lt;br /&gt;
::*the thermocople is still in one piece&lt;br /&gt;
::*the tip of the thermocouple is in contact with your sample&lt;br /&gt;
::*the two wires of the thermocouple are not in contact with eachother or the sample at any point&lt;br /&gt;
::*when closing the door ensure that the thermocouple will not be bent&lt;br /&gt;
&lt;br /&gt;
If not set correctly, the temperature readout will not be accurate and might lead to the destruction of the sample or the machine. Use your fingers of tweezers to gently shape the thermocople wires in a sort of a bow shaped spring. If broken, contact the Czar or refer to the Service Manual to replace it.&lt;br /&gt;
&lt;br /&gt;
=====Susceptor=====&lt;br /&gt;
&lt;br /&gt;
When using a small sample or if your sample is transparent to the radiation spectrum emitted by the lamps(like GaAs) you&#039;d want to use a susceptor. The susceptor is a SiC coated graphite piece that will evenly heat the sample that is placed inside.&lt;br /&gt;
&lt;br /&gt;
::* The inside of the susceptor should not be exposed outside of the cleanroom&lt;br /&gt;
::* Before loading your sample into the susceptor, examine the latter for cracks and scratches. If any deep scratches or cracks are present - use another one and report the issue to a Czar&lt;br /&gt;
::* With flow rates of around 5 slpm, the process gasses should have no problem reaching the inside of the susceptor&lt;br /&gt;
::* &#039;&#039;&#039;&#039;&#039;Be careful not to scratch the susceptor when placing your sample inside it&#039;&#039;&#039;&#039;&#039;&lt;br /&gt;
::* &#039;&#039;&#039;&#039;&#039;When using a susceptor the maximum heating rate should not exceed 15C/s!&#039;&#039;&#039;&#039;&#039;&lt;br /&gt;
::* &#039;&#039;&#039;&#039;&#039;Do not heat the susceptor without a sample inside it&#039;&#039;&#039;&#039;&#039;&lt;br /&gt;
::* Store the susceptor in a designated spot. Do not leave it in the oven.&lt;br /&gt;
&lt;br /&gt;
==[[RTP log]]==&lt;br /&gt;
&lt;br /&gt;
List of avalable spare parts and maintenance log&lt;br /&gt;
&lt;br /&gt;
[[Category:Tools]]&lt;/div&gt;</summary>
		<author><name>Nader</name></author>
	</entry>
	<entry>
		<id>https://wiki.nbi.ku.dk/w/cleanroom/index.php?title=AccuThermo_RTA&amp;diff=1448</id>
		<title>AccuThermo RTA</title>
		<link rel="alternate" type="text/html" href="https://wiki.nbi.ku.dk/w/cleanroom/index.php?title=AccuThermo_RTA&amp;diff=1448"/>
		<updated>2018-03-19T10:13:20Z</updated>

		<summary type="html">&lt;p&gt;Nader: /* Startup Procedure */&lt;/p&gt;
&lt;hr /&gt;
&lt;div&gt;{{Infobox tool&lt;br /&gt;
|image = Tool RTA.jpg&lt;br /&gt;
|toolfullname = AccuThermo AW 610&lt;br /&gt;
|website = https://allwin21.com/&lt;br /&gt;
|company = Allwin21 Corp.&lt;br /&gt;
|description = Rapid thermal annealer&lt;br /&gt;
|location = 03.2.213&lt;br /&gt;
|primary = Nader&lt;br /&gt;
|secondary = Shiv&lt;br /&gt;
|limits = None&lt;br /&gt;
|computer = TBD&lt;br /&gt;
|manual = TBD&lt;br /&gt;
}}&lt;br /&gt;
&lt;br /&gt;
= RTP AW610 =&lt;br /&gt;
&lt;br /&gt;
Short description&lt;br /&gt;
&lt;br /&gt;
&lt;br /&gt;
== Startup Procedure ==&lt;br /&gt;
&lt;br /&gt;
If this is your first time using the machine, consult the Czar for training. You can use the computer to create a recipe without powering on the machine, so there is no reason not to do it first. Refer to &#039;&#039;&#039;Creating a recipe&#039;&#039;&#039;&lt;br /&gt;
&lt;br /&gt;
If your recipe is already created:&lt;br /&gt;
&lt;br /&gt;
:#Sign up the sheet..&lt;br /&gt;
:#Make sure the Lamp Power is set to &#039;&#039;&#039;OFF&#039;&#039;&#039;&lt;br /&gt;
:#Make sure the power switch on the wall is set to &#039;&#039;&#039;ON&#039;&#039;&#039;.&lt;br /&gt;
:#Check that the emergency button is not engaged.&lt;br /&gt;
:#Load your sample into the round metal holder.&lt;br /&gt;
:#Open oven door approx &#039;&#039;&#039;10cm out.&#039;&#039;&#039; &#039;&#039;This will prevent any potential overpressure from shattering the quartz isolation chamber&#039;&#039;&lt;br /&gt;
:#Load the holder inside the chamber and close the door.&lt;br /&gt;
:#Open up for Air cooling and pneumatics&#039;&#039;&#039;(5,5 bar)&#039;&#039;&#039;.&lt;br /&gt;
:#Open up the process gas/gasses on the cylinders that you need. Pressure of the regulator on manometer should be set to &#039;&#039;&#039;1.5 bar&#039;&#039;&#039;.&lt;br /&gt;
:#Turn the blue valve on the blue tube to open for air cooling line. &#039;&#039;&#039;The pressure should be around 2,5bar and the flow rate of above 280&#039;&#039;&#039;.&lt;br /&gt;
:#Load the sample into the system&lt;br /&gt;
:#Turn the Lamp Power &#039;&#039;&#039;ON&#039;&#039;&#039; in font.&lt;br /&gt;
:#Check that the water flow is between &#039;&#039;&#039;500-700&#039;&#039;&#039; lph during your run.&lt;br /&gt;
:#Choose and load your reciepe.&lt;br /&gt;
:#Run the process.&lt;br /&gt;
&lt;br /&gt;
== Power Down Procedure ==&lt;br /&gt;
&lt;br /&gt;
After the system has cooled down and the sample was removed:&lt;br /&gt;
&lt;br /&gt;
:#Make sure the Lamp Power is set to &#039;&#039;&#039;OFF&#039;&#039;&#039;&lt;br /&gt;
:#Open the oven door around &#039;&#039;&#039;1cm&#039;&#039;&#039;&lt;br /&gt;
:#&#039;&#039;&#039;Shut off&#039;&#039;&#039; any process gasses that have been used.&lt;br /&gt;
:#Turn the knob on the Nitrogen cooling line to shut it &#039;&#039;&#039;OFF&#039;&#039;&#039;&lt;br /&gt;
:#&#039;&#039;&#039;Shut off&#039;&#039;&#039; the Nitrogen cooling and pneumatics&lt;br /&gt;
:#Close the oven door&lt;br /&gt;
&lt;br /&gt;
The system should be left with AC power connected and turned on and the cooling water flowing. On the computer press ESC until the main menu appears.&lt;br /&gt;
&lt;br /&gt;
== Creating a recipe ==&lt;br /&gt;
&lt;br /&gt;
For managing the annealing process the RTP AW610 uses a custom software suite. Before creating a recipe consider if you will be using a susceptor&#039;&#039;(refer to Sample loading)&#039;&#039;.&lt;br /&gt;
&lt;br /&gt;
To create a recipe:&lt;br /&gt;
&lt;br /&gt;
:*First navigate to &#039;&#039;&#039;&#039;&#039;Process for Engineer&#039;&#039;&#039;&#039;&#039; tab in the main menu&lt;br /&gt;
:*click on the &#039;&#039;&#039;NEW&#039;&#039;&#039; recipe in the recipe list&lt;br /&gt;
:*click on &#039;&#039;&#039;&#039;&#039;Edit Recipe&#039;&#039;&#039;&#039;&#039;&lt;br /&gt;
:*Write a new name for your recipe in the respective field and click on &#039;&#039;&#039;&#039;&#039;Save&#039;&#039;&#039;&#039;&#039;. This creates a new recipe in the list that you can now freely edit.&lt;br /&gt;
:*Check &#039;&#039;&#039;&#039;&#039;Sensor type&#039;&#039;&#039;&#039;&#039; to be set to &#039;&#039;&#039;&#039;&#039;Thermocouple&#039;&#039;&#039;&#039;&#039; and &#039;&#039;&#039;&#039;&#039;Wafer Type&#039;&#039;&#039;&#039;&#039; to be set to either &#039;&#039;&#039;&#039;&#039;Susceptor&#039;&#039;&#039;&#039;&#039; or &#039;&#039;&#039;&#039;&#039;Wafer&#039;&#039;&#039;&#039;&#039; depending on what you will be using.(&#039;&#039;consult Sample loading section&#039;&#039;)&lt;br /&gt;
&lt;br /&gt;
Other parameters should be left as they are unless you know what you are doing and want something different.&lt;br /&gt;
&lt;br /&gt;
You can now proceed with creating the recipe sequence itself. The available parameters are step number, function, time for a given step, temperature, init factor and gas flow for each connected process gas. Ignore the initiation factor.&lt;br /&gt;
&lt;br /&gt;
Main available functions are:&lt;br /&gt;
&lt;br /&gt;
:*&#039;&#039;&#039;Delay&#039;&#039;&#039; - keeps the lamp power off while maintaining other parametes, such as gas flow rates. Used for purging the chamber of air as an initial step and is a good option for cooling.&lt;br /&gt;
&lt;br /&gt;
:*&#039;&#039;&#039;Ramp&#039;&#039;&#039; - ramps the temperature up or down to a desired value. The ramping rate is calculated by &#039;&#039;&#039;&#039;&#039;time/target temperature&#039;&#039;&#039;&#039;&#039;. Note: &#039;&#039;when using a susceptor, maximum ramp up rates should not exceed 15C/s&#039;&#039;&lt;br /&gt;
&lt;br /&gt;
:*&#039;&#039;&#039;Steady&#039;&#039;&#039; - keeps the lamps turned on and the temperature at a set value. The ideal step for baking the sample at a particular temperatures for a longer time.&lt;br /&gt;
&lt;br /&gt;
===&#039;&#039;&#039;Important&#039;&#039;&#039;===&lt;br /&gt;
&lt;br /&gt;
&#039;&#039;&#039;The total flow rate through the chamber should never exceed 15slpm&#039;&#039;&#039;.&lt;br /&gt;
&lt;br /&gt;
&#039;&#039;&#039;At the temperatures above 600C the thermocouple begins to melt with the susceptor or a silicon wafer.&#039;&#039;&#039;&lt;br /&gt;
&lt;br /&gt;
&lt;br /&gt;
&lt;br /&gt;
Tips for creating a good recipe:&lt;br /&gt;
&lt;br /&gt;
A good initial step is to displace the normal atmosphere by Nitrogen. The total volume of the quartz chamber is 0.84l, therefore it is a good idea to start the process by letting Nitrogen flow into the chamber at around 5slpm for 15-20 seconds. After this initial step is complete, add or replace Nitrogen with a desired process gas.&lt;br /&gt;
&lt;br /&gt;
During &#039;&#039;&#039;&#039;&#039;Ramping&#039;&#039;&#039;&#039;&#039; and &#039;&#039;&#039;&#039;&#039;Steady&#039;&#039;&#039;&#039;&#039; step, the maximum total flow rate should be 5slpm&lt;br /&gt;
&lt;br /&gt;
It takes between 10-15 seconds for the machine to stabilize the temperature. Consider this when creating a multistep recipe.&lt;br /&gt;
&lt;br /&gt;
&lt;br /&gt;
&lt;br /&gt;
== Sample loading ==&lt;br /&gt;
&lt;br /&gt;
The first rule: Dont touch anything behind the front door without gloves!&lt;br /&gt;
&lt;br /&gt;
The sample holder is a quartz tray. Be gentle when putting down your sample!&lt;br /&gt;
&lt;br /&gt;
=====Thermocouple=====&lt;br /&gt;
&lt;br /&gt;
The temperature measurement in the RTP is obtained with a thermocouple which is connected to the oven door. When placing a sample(a wafer or a susceptor) onto the quartz loading tray make sure that:&lt;br /&gt;
&lt;br /&gt;
::*the thermocople is still in one piece&lt;br /&gt;
::*the tip of the thermocouple is in contact with your sample&lt;br /&gt;
::*the two wires of the thermocouple are not in contact with eachother or the sample at any point&lt;br /&gt;
::*when closing the door ensure that the thermocouple will not be bent&lt;br /&gt;
&lt;br /&gt;
If not set correctly, the temperature readout will not be accurate and might lead to the destruction of the sample or the machine. Use your fingers of tweezers to gently shape the thermocople wires in a sort of a bow shaped spring. If broken, contact the Czar or refer to the Service Manual to replace it.&lt;br /&gt;
&lt;br /&gt;
=====Susceptor=====&lt;br /&gt;
&lt;br /&gt;
When using a small sample or if your sample is transparent to the radiation spectrum emitted by the lamps(like GaAs) you&#039;d want to use a susceptor. The susceptor is a SiC coated graphite piece that will evenly heat the sample that is placed inside.&lt;br /&gt;
&lt;br /&gt;
::* The inside of the susceptor should not be exposed outside of the cleanroom&lt;br /&gt;
::* Before loading your sample into the susceptor, examine the latter for cracks and scratches. If any deep scratches or cracks are present - use another one and report the issue to a Czar&lt;br /&gt;
::* With flow rates of around 5 slpm, the process gasses should have no problem reaching the inside of the susceptor&lt;br /&gt;
::* &#039;&#039;&#039;&#039;&#039;Be careful not to scratch the susceptor when placing your sample inside it&#039;&#039;&#039;&#039;&#039;&lt;br /&gt;
::* &#039;&#039;&#039;&#039;&#039;When using a susceptor the maximum heating rate should not exceed 15C/s!&#039;&#039;&#039;&#039;&#039;&lt;br /&gt;
::* &#039;&#039;&#039;&#039;&#039;Do not heat the susceptor without a sample inside it&#039;&#039;&#039;&#039;&#039;&lt;br /&gt;
::* Store the susceptor in a designated spot. Do not leave it in the oven.&lt;br /&gt;
&lt;br /&gt;
==[[RTP log]]==&lt;br /&gt;
&lt;br /&gt;
List of avalable spare parts and maintenance log&lt;br /&gt;
&lt;br /&gt;
[[Category:Tools]]&lt;/div&gt;</summary>
		<author><name>Nader</name></author>
	</entry>
	<entry>
		<id>https://wiki.nbi.ku.dk/w/cleanroom/index.php?title=AccuThermo_RTA&amp;diff=1447</id>
		<title>AccuThermo RTA</title>
		<link rel="alternate" type="text/html" href="https://wiki.nbi.ku.dk/w/cleanroom/index.php?title=AccuThermo_RTA&amp;diff=1447"/>
		<updated>2018-03-19T09:59:11Z</updated>

		<summary type="html">&lt;p&gt;Nader: /* Startup Procedure */&lt;/p&gt;
&lt;hr /&gt;
&lt;div&gt;{{Infobox tool&lt;br /&gt;
|image = Tool RTA.jpg&lt;br /&gt;
|toolfullname = AccuThermo AW 610&lt;br /&gt;
|website = https://allwin21.com/&lt;br /&gt;
|company = Allwin21 Corp.&lt;br /&gt;
|description = Rapid thermal annealer&lt;br /&gt;
|location = 03.2.213&lt;br /&gt;
|primary = Nader&lt;br /&gt;
|secondary = Shiv&lt;br /&gt;
|limits = None&lt;br /&gt;
|computer = TBD&lt;br /&gt;
|manual = TBD&lt;br /&gt;
}}&lt;br /&gt;
&lt;br /&gt;
= RTP AW610 =&lt;br /&gt;
&lt;br /&gt;
Short description&lt;br /&gt;
&lt;br /&gt;
&lt;br /&gt;
== Startup Procedure ==&lt;br /&gt;
&lt;br /&gt;
If this is your first time using the machine, consult the Czar for training. You can use the computer to create a recipe without powering on the machine, so there is no reason not to do it first. Refer to &#039;&#039;&#039;Creating a recipe&#039;&#039;&#039;&lt;br /&gt;
&lt;br /&gt;
If your recipe is already created:&lt;br /&gt;
&lt;br /&gt;
:#Sign up the sheet..&lt;br /&gt;
:#Make sure the Lamp Power is set to &#039;&#039;&#039;OFF&#039;&#039;&#039;&lt;br /&gt;
:#Make sure the power switch on the wall is set to &#039;&#039;&#039;ON&#039;&#039;&#039;.&lt;br /&gt;
:#Check that the emergency button is not engaged.&lt;br /&gt;
&lt;br /&gt;
:#Open oven door approx &#039;&#039;&#039;1cm out.&#039;&#039;&#039; &#039;&#039;This will prevent any potential overpressure from shattering the quartz isolation chamber&#039;&#039;&lt;br /&gt;
:#Open up for Nitrogen cooling and pneumatics&#039;&#039;&#039;(5,5 bar)&#039;&#039;&#039;&lt;br /&gt;
:#Open up the process gas/gasses that you need. Pressure on the outer gauge should be set to &#039;&#039;&#039;1.5 bar&#039;&#039;&#039;&lt;br /&gt;
:#Turn the knob on the nitrogen cooling line to turn on the system Nitrogen cooling. &#039;&#039;&#039;The pressure should be around 2,5bar and the flow rate of above 280&#039;&#039;&#039;&lt;br /&gt;
:#Load the sample into the system(refer to Sample loading)&lt;br /&gt;
:#Turn the Lamp Power &#039;&#039;&#039;ON&#039;&#039;&#039;&lt;br /&gt;
:#Check that the water flow is between &#039;&#039;&#039;500-700&#039;&#039;&#039; lph during your run.&lt;br /&gt;
:#Run the process&lt;br /&gt;
&lt;br /&gt;
== Power Down Procedure ==&lt;br /&gt;
&lt;br /&gt;
After the system has cooled down and the sample was removed:&lt;br /&gt;
&lt;br /&gt;
:#Make sure the Lamp Power is set to &#039;&#039;&#039;OFF&#039;&#039;&#039;&lt;br /&gt;
:#Open the oven door around &#039;&#039;&#039;1cm&#039;&#039;&#039;&lt;br /&gt;
:#&#039;&#039;&#039;Shut off&#039;&#039;&#039; any process gasses that have been used.&lt;br /&gt;
:#Turn the knob on the Nitrogen cooling line to shut it &#039;&#039;&#039;OFF&#039;&#039;&#039;&lt;br /&gt;
:#&#039;&#039;&#039;Shut off&#039;&#039;&#039; the Nitrogen cooling and pneumatics&lt;br /&gt;
:#Close the oven door&lt;br /&gt;
&lt;br /&gt;
The system should be left with AC power connected and turned on and the cooling water flowing. On the computer press ESC until the main menu appears.&lt;br /&gt;
&lt;br /&gt;
== Creating a recipe ==&lt;br /&gt;
&lt;br /&gt;
For managing the annealing process the RTP AW610 uses a custom software suite. Before creating a recipe consider if you will be using a susceptor&#039;&#039;(refer to Sample loading)&#039;&#039;.&lt;br /&gt;
&lt;br /&gt;
To create a recipe:&lt;br /&gt;
&lt;br /&gt;
:*First navigate to &#039;&#039;&#039;&#039;&#039;Process for Engineer&#039;&#039;&#039;&#039;&#039; tab in the main menu&lt;br /&gt;
:*click on the &#039;&#039;&#039;NEW&#039;&#039;&#039; recipe in the recipe list&lt;br /&gt;
:*click on &#039;&#039;&#039;&#039;&#039;Edit Recipe&#039;&#039;&#039;&#039;&#039;&lt;br /&gt;
:*Write a new name for your recipe in the respective field and click on &#039;&#039;&#039;&#039;&#039;Save&#039;&#039;&#039;&#039;&#039;. This creates a new recipe in the list that you can now freely edit.&lt;br /&gt;
:*Check &#039;&#039;&#039;&#039;&#039;Sensor type&#039;&#039;&#039;&#039;&#039; to be set to &#039;&#039;&#039;&#039;&#039;Thermocouple&#039;&#039;&#039;&#039;&#039; and &#039;&#039;&#039;&#039;&#039;Wafer Type&#039;&#039;&#039;&#039;&#039; to be set to either &#039;&#039;&#039;&#039;&#039;Susceptor&#039;&#039;&#039;&#039;&#039; or &#039;&#039;&#039;&#039;&#039;Wafer&#039;&#039;&#039;&#039;&#039; depending on what you will be using.(&#039;&#039;consult Sample loading section&#039;&#039;)&lt;br /&gt;
&lt;br /&gt;
Other parameters should be left as they are unless you know what you are doing and want something different.&lt;br /&gt;
&lt;br /&gt;
You can now proceed with creating the recipe sequence itself. The available parameters are step number, function, time for a given step, temperature, init factor and gas flow for each connected process gas. Ignore the initiation factor.&lt;br /&gt;
&lt;br /&gt;
Main available functions are:&lt;br /&gt;
&lt;br /&gt;
:*&#039;&#039;&#039;Delay&#039;&#039;&#039; - keeps the lamp power off while maintaining other parametes, such as gas flow rates. Used for purging the chamber of air as an initial step and is a good option for cooling.&lt;br /&gt;
&lt;br /&gt;
:*&#039;&#039;&#039;Ramp&#039;&#039;&#039; - ramps the temperature up or down to a desired value. The ramping rate is calculated by &#039;&#039;&#039;&#039;&#039;time/target temperature&#039;&#039;&#039;&#039;&#039;. Note: &#039;&#039;when using a susceptor, maximum ramp up rates should not exceed 15C/s&#039;&#039;&lt;br /&gt;
&lt;br /&gt;
:*&#039;&#039;&#039;Steady&#039;&#039;&#039; - keeps the lamps turned on and the temperature at a set value. The ideal step for baking the sample at a particular temperatures for a longer time.&lt;br /&gt;
&lt;br /&gt;
===&#039;&#039;&#039;Important&#039;&#039;&#039;===&lt;br /&gt;
&lt;br /&gt;
&#039;&#039;&#039;The total flow rate through the chamber should never exceed 15slpm&#039;&#039;&#039;.&lt;br /&gt;
&lt;br /&gt;
&#039;&#039;&#039;At the temperatures above 600C the thermocouple begins to melt with the susceptor or a silicon wafer.&#039;&#039;&#039;&lt;br /&gt;
&lt;br /&gt;
&lt;br /&gt;
&lt;br /&gt;
Tips for creating a good recipe:&lt;br /&gt;
&lt;br /&gt;
A good initial step is to displace the normal atmosphere by Nitrogen. The total volume of the quartz chamber is 0.84l, therefore it is a good idea to start the process by letting Nitrogen flow into the chamber at around 5slpm for 15-20 seconds. After this initial step is complete, add or replace Nitrogen with a desired process gas.&lt;br /&gt;
&lt;br /&gt;
During &#039;&#039;&#039;&#039;&#039;Ramping&#039;&#039;&#039;&#039;&#039; and &#039;&#039;&#039;&#039;&#039;Steady&#039;&#039;&#039;&#039;&#039; step, the maximum total flow rate should be 5slpm&lt;br /&gt;
&lt;br /&gt;
It takes between 10-15 seconds for the machine to stabilize the temperature. Consider this when creating a multistep recipe.&lt;br /&gt;
&lt;br /&gt;
&lt;br /&gt;
&lt;br /&gt;
== Sample loading ==&lt;br /&gt;
&lt;br /&gt;
The first rule: Dont touch anything behind the front door without gloves!&lt;br /&gt;
&lt;br /&gt;
The sample holder is a quartz tray. Be gentle when putting down your sample!&lt;br /&gt;
&lt;br /&gt;
=====Thermocouple=====&lt;br /&gt;
&lt;br /&gt;
The temperature measurement in the RTP is obtained with a thermocouple which is connected to the oven door. When placing a sample(a wafer or a susceptor) onto the quartz loading tray make sure that:&lt;br /&gt;
&lt;br /&gt;
::*the thermocople is still in one piece&lt;br /&gt;
::*the tip of the thermocouple is in contact with your sample&lt;br /&gt;
::*the two wires of the thermocouple are not in contact with eachother or the sample at any point&lt;br /&gt;
::*when closing the door ensure that the thermocouple will not be bent&lt;br /&gt;
&lt;br /&gt;
If not set correctly, the temperature readout will not be accurate and might lead to the destruction of the sample or the machine. Use your fingers of tweezers to gently shape the thermocople wires in a sort of a bow shaped spring. If broken, contact the Czar or refer to the Service Manual to replace it.&lt;br /&gt;
&lt;br /&gt;
=====Susceptor=====&lt;br /&gt;
&lt;br /&gt;
When using a small sample or if your sample is transparent to the radiation spectrum emitted by the lamps(like GaAs) you&#039;d want to use a susceptor. The susceptor is a SiC coated graphite piece that will evenly heat the sample that is placed inside.&lt;br /&gt;
&lt;br /&gt;
::* The inside of the susceptor should not be exposed outside of the cleanroom&lt;br /&gt;
::* Before loading your sample into the susceptor, examine the latter for cracks and scratches. If any deep scratches or cracks are present - use another one and report the issue to a Czar&lt;br /&gt;
::* With flow rates of around 5 slpm, the process gasses should have no problem reaching the inside of the susceptor&lt;br /&gt;
::* &#039;&#039;&#039;&#039;&#039;Be careful not to scratch the susceptor when placing your sample inside it&#039;&#039;&#039;&#039;&#039;&lt;br /&gt;
::* &#039;&#039;&#039;&#039;&#039;When using a susceptor the maximum heating rate should not exceed 15C/s!&#039;&#039;&#039;&#039;&#039;&lt;br /&gt;
::* &#039;&#039;&#039;&#039;&#039;Do not heat the susceptor without a sample inside it&#039;&#039;&#039;&#039;&#039;&lt;br /&gt;
::* Store the susceptor in a designated spot. Do not leave it in the oven.&lt;br /&gt;
&lt;br /&gt;
==[[RTP log]]==&lt;br /&gt;
&lt;br /&gt;
List of avalable spare parts and maintenance log&lt;br /&gt;
&lt;br /&gt;
[[Category:Tools]]&lt;/div&gt;</summary>
		<author><name>Nader</name></author>
	</entry>
	<entry>
		<id>https://wiki.nbi.ku.dk/w/cleanroom/index.php?title=AccuThermo_RTA&amp;diff=1446</id>
		<title>AccuThermo RTA</title>
		<link rel="alternate" type="text/html" href="https://wiki.nbi.ku.dk/w/cleanroom/index.php?title=AccuThermo_RTA&amp;diff=1446"/>
		<updated>2018-03-19T09:57:25Z</updated>

		<summary type="html">&lt;p&gt;Nader: /* Startup Procedure */&lt;/p&gt;
&lt;hr /&gt;
&lt;div&gt;{{Infobox tool&lt;br /&gt;
|image = Tool RTA.jpg&lt;br /&gt;
|toolfullname = AccuThermo AW 610&lt;br /&gt;
|website = https://allwin21.com/&lt;br /&gt;
|company = Allwin21 Corp.&lt;br /&gt;
|description = Rapid thermal annealer&lt;br /&gt;
|location = 03.2.213&lt;br /&gt;
|primary = Nader&lt;br /&gt;
|secondary = Shiv&lt;br /&gt;
|limits = None&lt;br /&gt;
|computer = TBD&lt;br /&gt;
|manual = TBD&lt;br /&gt;
}}&lt;br /&gt;
&lt;br /&gt;
= RTP AW610 =&lt;br /&gt;
&lt;br /&gt;
Short description&lt;br /&gt;
&lt;br /&gt;
&lt;br /&gt;
== Startup Procedure ==&lt;br /&gt;
&lt;br /&gt;
If this is your first time using the machine, consult the Czar for training. You can use the computer to create a recipe without powering on the machine, so there is no reason not to do it first. Refer to &#039;&#039;&#039;Creating a recipe&#039;&#039;&#039;&lt;br /&gt;
&lt;br /&gt;
If your recipe is already created:&lt;br /&gt;
&lt;br /&gt;
:#Sign up the sheet&lt;br /&gt;
:#Make sure the Lamp Power is set to &#039;&#039;&#039;OFF&#039;&#039;&#039;&lt;br /&gt;
:#Make sure the power switch on the wall is set to &#039;&#039;&#039;ON&#039;&#039;&#039;&lt;br /&gt;
:#Check that the emergency button is disengaged&lt;br /&gt;
:#Check that the water flow is between &#039;&#039;&#039;500-700&#039;&#039;&#039; lph&lt;br /&gt;
:#Open oven door approx &#039;&#039;&#039;1cm out.&#039;&#039;&#039; &#039;&#039;This will prevent any potential overpressure from shattering the quartz isolation chamber&#039;&#039;&lt;br /&gt;
:#Open up for Nitrogen cooling and pneumatics&#039;&#039;&#039;(5,5 bar)&#039;&#039;&#039;&lt;br /&gt;
:#Open up the process gas/gasses that you need. Pressure on the outer gauge should be set to &#039;&#039;&#039;1.5 bar&#039;&#039;&#039;&lt;br /&gt;
:#Turn the knob on the nitrogen cooling line to turn on the system Nitrogen cooling. &#039;&#039;&#039;The pressure should be around 2,5bar and the flow rate of above 280&#039;&#039;&#039;&lt;br /&gt;
:#Load the sample into the system(refer to Sample loading)&lt;br /&gt;
:#Turn the Lamp Power &#039;&#039;&#039;ON&#039;&#039;&#039;&lt;br /&gt;
:#Run the process&lt;br /&gt;
&lt;br /&gt;
== Power Down Procedure ==&lt;br /&gt;
&lt;br /&gt;
After the system has cooled down and the sample was removed:&lt;br /&gt;
&lt;br /&gt;
:#Make sure the Lamp Power is set to &#039;&#039;&#039;OFF&#039;&#039;&#039;&lt;br /&gt;
:#Open the oven door around &#039;&#039;&#039;1cm&#039;&#039;&#039;&lt;br /&gt;
:#&#039;&#039;&#039;Shut off&#039;&#039;&#039; any process gasses that have been used.&lt;br /&gt;
:#Turn the knob on the Nitrogen cooling line to shut it &#039;&#039;&#039;OFF&#039;&#039;&#039;&lt;br /&gt;
:#&#039;&#039;&#039;Shut off&#039;&#039;&#039; the Nitrogen cooling and pneumatics&lt;br /&gt;
:#Close the oven door&lt;br /&gt;
&lt;br /&gt;
The system should be left with AC power connected and turned on and the cooling water flowing. On the computer press ESC until the main menu appears.&lt;br /&gt;
&lt;br /&gt;
== Creating a recipe ==&lt;br /&gt;
&lt;br /&gt;
For managing the annealing process the RTP AW610 uses a custom software suite. Before creating a recipe consider if you will be using a susceptor&#039;&#039;(refer to Sample loading)&#039;&#039;.&lt;br /&gt;
&lt;br /&gt;
To create a recipe:&lt;br /&gt;
&lt;br /&gt;
:*First navigate to &#039;&#039;&#039;&#039;&#039;Process for Engineer&#039;&#039;&#039;&#039;&#039; tab in the main menu&lt;br /&gt;
:*click on the &#039;&#039;&#039;NEW&#039;&#039;&#039; recipe in the recipe list&lt;br /&gt;
:*click on &#039;&#039;&#039;&#039;&#039;Edit Recipe&#039;&#039;&#039;&#039;&#039;&lt;br /&gt;
:*Write a new name for your recipe in the respective field and click on &#039;&#039;&#039;&#039;&#039;Save&#039;&#039;&#039;&#039;&#039;. This creates a new recipe in the list that you can now freely edit.&lt;br /&gt;
:*Check &#039;&#039;&#039;&#039;&#039;Sensor type&#039;&#039;&#039;&#039;&#039; to be set to &#039;&#039;&#039;&#039;&#039;Thermocouple&#039;&#039;&#039;&#039;&#039; and &#039;&#039;&#039;&#039;&#039;Wafer Type&#039;&#039;&#039;&#039;&#039; to be set to either &#039;&#039;&#039;&#039;&#039;Susceptor&#039;&#039;&#039;&#039;&#039; or &#039;&#039;&#039;&#039;&#039;Wafer&#039;&#039;&#039;&#039;&#039; depending on what you will be using.(&#039;&#039;consult Sample loading section&#039;&#039;)&lt;br /&gt;
&lt;br /&gt;
Other parameters should be left as they are unless you know what you are doing and want something different.&lt;br /&gt;
&lt;br /&gt;
You can now proceed with creating the recipe sequence itself. The available parameters are step number, function, time for a given step, temperature, init factor and gas flow for each connected process gas. Ignore the initiation factor.&lt;br /&gt;
&lt;br /&gt;
Main available functions are:&lt;br /&gt;
&lt;br /&gt;
:*&#039;&#039;&#039;Delay&#039;&#039;&#039; - keeps the lamp power off while maintaining other parametes, such as gas flow rates. Used for purging the chamber of air as an initial step and is a good option for cooling.&lt;br /&gt;
&lt;br /&gt;
:*&#039;&#039;&#039;Ramp&#039;&#039;&#039; - ramps the temperature up or down to a desired value. The ramping rate is calculated by &#039;&#039;&#039;&#039;&#039;time/target temperature&#039;&#039;&#039;&#039;&#039;. Note: &#039;&#039;when using a susceptor, maximum ramp up rates should not exceed 15C/s&#039;&#039;&lt;br /&gt;
&lt;br /&gt;
:*&#039;&#039;&#039;Steady&#039;&#039;&#039; - keeps the lamps turned on and the temperature at a set value. The ideal step for baking the sample at a particular temperatures for a longer time.&lt;br /&gt;
&lt;br /&gt;
===&#039;&#039;&#039;Important&#039;&#039;&#039;===&lt;br /&gt;
&lt;br /&gt;
&#039;&#039;&#039;The total flow rate through the chamber should never exceed 15slpm&#039;&#039;&#039;.&lt;br /&gt;
&lt;br /&gt;
&#039;&#039;&#039;At the temperatures above 600C the thermocouple begins to melt with the susceptor or a silicon wafer.&#039;&#039;&#039;&lt;br /&gt;
&lt;br /&gt;
&lt;br /&gt;
&lt;br /&gt;
Tips for creating a good recipe:&lt;br /&gt;
&lt;br /&gt;
A good initial step is to displace the normal atmosphere by Nitrogen. The total volume of the quartz chamber is 0.84l, therefore it is a good idea to start the process by letting Nitrogen flow into the chamber at around 5slpm for 15-20 seconds. After this initial step is complete, add or replace Nitrogen with a desired process gas.&lt;br /&gt;
&lt;br /&gt;
During &#039;&#039;&#039;&#039;&#039;Ramping&#039;&#039;&#039;&#039;&#039; and &#039;&#039;&#039;&#039;&#039;Steady&#039;&#039;&#039;&#039;&#039; step, the maximum total flow rate should be 5slpm&lt;br /&gt;
&lt;br /&gt;
It takes between 10-15 seconds for the machine to stabilize the temperature. Consider this when creating a multistep recipe.&lt;br /&gt;
&lt;br /&gt;
&lt;br /&gt;
&lt;br /&gt;
== Sample loading ==&lt;br /&gt;
&lt;br /&gt;
The first rule: Dont touch anything behind the front door without gloves!&lt;br /&gt;
&lt;br /&gt;
The sample holder is a quartz tray. Be gentle when putting down your sample!&lt;br /&gt;
&lt;br /&gt;
=====Thermocouple=====&lt;br /&gt;
&lt;br /&gt;
The temperature measurement in the RTP is obtained with a thermocouple which is connected to the oven door. When placing a sample(a wafer or a susceptor) onto the quartz loading tray make sure that:&lt;br /&gt;
&lt;br /&gt;
::*the thermocople is still in one piece&lt;br /&gt;
::*the tip of the thermocouple is in contact with your sample&lt;br /&gt;
::*the two wires of the thermocouple are not in contact with eachother or the sample at any point&lt;br /&gt;
::*when closing the door ensure that the thermocouple will not be bent&lt;br /&gt;
&lt;br /&gt;
If not set correctly, the temperature readout will not be accurate and might lead to the destruction of the sample or the machine. Use your fingers of tweezers to gently shape the thermocople wires in a sort of a bow shaped spring. If broken, contact the Czar or refer to the Service Manual to replace it.&lt;br /&gt;
&lt;br /&gt;
=====Susceptor=====&lt;br /&gt;
&lt;br /&gt;
When using a small sample or if your sample is transparent to the radiation spectrum emitted by the lamps(like GaAs) you&#039;d want to use a susceptor. The susceptor is a SiC coated graphite piece that will evenly heat the sample that is placed inside.&lt;br /&gt;
&lt;br /&gt;
::* The inside of the susceptor should not be exposed outside of the cleanroom&lt;br /&gt;
::* Before loading your sample into the susceptor, examine the latter for cracks and scratches. If any deep scratches or cracks are present - use another one and report the issue to a Czar&lt;br /&gt;
::* With flow rates of around 5 slpm, the process gasses should have no problem reaching the inside of the susceptor&lt;br /&gt;
::* &#039;&#039;&#039;&#039;&#039;Be careful not to scratch the susceptor when placing your sample inside it&#039;&#039;&#039;&#039;&#039;&lt;br /&gt;
::* &#039;&#039;&#039;&#039;&#039;When using a susceptor the maximum heating rate should not exceed 15C/s!&#039;&#039;&#039;&#039;&#039;&lt;br /&gt;
::* &#039;&#039;&#039;&#039;&#039;Do not heat the susceptor without a sample inside it&#039;&#039;&#039;&#039;&#039;&lt;br /&gt;
::* Store the susceptor in a designated spot. Do not leave it in the oven.&lt;br /&gt;
&lt;br /&gt;
==[[RTP log]]==&lt;br /&gt;
&lt;br /&gt;
List of avalable spare parts and maintenance log&lt;br /&gt;
&lt;br /&gt;
[[Category:Tools]]&lt;/div&gt;</summary>
		<author><name>Nader</name></author>
	</entry>
	<entry>
		<id>https://wiki.nbi.ku.dk/w/cleanroom/index.php?title=About&amp;diff=1439</id>
		<title>About</title>
		<link rel="alternate" type="text/html" href="https://wiki.nbi.ku.dk/w/cleanroom/index.php?title=About&amp;diff=1439"/>
		<updated>2018-01-23T10:42:28Z</updated>

		<summary type="html">&lt;p&gt;Nader: /* Staff */&lt;/p&gt;
&lt;hr /&gt;
&lt;div&gt;== Staff ==&lt;br /&gt;
&lt;br /&gt;
{| class=&amp;quot;wikitable&amp;quot;&lt;br /&gt;
|-&lt;br /&gt;
! Name&lt;br /&gt;
! Position&lt;br /&gt;
! Office&lt;br /&gt;
! Phone&lt;br /&gt;
! email&lt;br /&gt;
|-&lt;br /&gt;
| Claus B. Sørensen&lt;br /&gt;
| technical head&lt;br /&gt;
| 03.02.216&lt;br /&gt;
| 28 75 04 49&lt;br /&gt;
| cbs*nbi.dk&lt;br /&gt;
|-&lt;br /&gt;
| Charles Marcus&lt;br /&gt;
| professor&lt;br /&gt;
| 03.04.406&lt;br /&gt;
| 20 34 11 81&lt;br /&gt;
| marcus*nbi.dk &lt;br /&gt;
|-&lt;br /&gt;
| Jesper Nygård&lt;br /&gt;
| professor&lt;br /&gt;
| 03.04.410&lt;br /&gt;
| 24 62 61 20&lt;br /&gt;
| nygard*nbi.dk&lt;br /&gt;
|-&lt;br /&gt;
| Nader Payami&lt;br /&gt;
| kemotekniker&lt;br /&gt;
| 03.02.214&lt;br /&gt;
| 28 75 04 50&lt;br /&gt;
| nap*nbi.dk&lt;br /&gt;
|-&lt;br /&gt;
| Inger Jensen&lt;br /&gt;
| laborant&lt;br /&gt;
| 03.02.212&lt;br /&gt;
| 28 75 04 66&lt;br /&gt;
| ijensen*nbi.ku.dk&lt;br /&gt;
|-&lt;br /&gt;
| Henriette Lerche&lt;br /&gt;
| Safety coordinator&lt;br /&gt;
| Blegdamsvej 17, Ka1&lt;br /&gt;
| 51 29 83 37&lt;br /&gt;
| hlerche*nbi.ku.dk&lt;br /&gt;
|-&lt;br /&gt;
| Shiv Upadhyay&lt;br /&gt;
| process specialist&lt;br /&gt;
| 03.02.212&lt;br /&gt;
| 21 28 90 25&lt;br /&gt;
| shiv*nbi.dk&lt;br /&gt;
&lt;br /&gt;
== Cleanroom meetings ==&lt;br /&gt;
&lt;br /&gt;
The cleanroom staff and stake holders usually meet on Fridays at 12:30pm (HCØ, 03.01.114). Users who have special requests or would like to discuss a cleanroom issue can join such a meeting; contact staff or drop by.&lt;/div&gt;</summary>
		<author><name>Nader</name></author>
	</entry>
	<entry>
		<id>https://wiki.nbi.ku.dk/w/cleanroom/index.php?title=General_rules_for_working_in_the_cleanroom&amp;diff=1438</id>
		<title>General rules for working in the cleanroom</title>
		<link rel="alternate" type="text/html" href="https://wiki.nbi.ku.dk/w/cleanroom/index.php?title=General_rules_for_working_in_the_cleanroom&amp;diff=1438"/>
		<updated>2018-01-23T10:35:49Z</updated>

		<summary type="html">&lt;p&gt;Nader: /* Practical information */&lt;/p&gt;
&lt;hr /&gt;
&lt;div&gt;The safety of you and coworkers in the lab is of utmost importance. Although we encourage constructive feedback on safety procedures, and how to improve them, you must accept that safety is not a democratic process. The rules must be followed.&lt;br /&gt;
&lt;br /&gt;
In case of an accident, you must also accept that your coworkers or cleanroom staff takes over and instructs you in order to help in the best possible way. You may not think rationally in such a situation!&lt;br /&gt;
&lt;br /&gt;
= How to behave =&lt;br /&gt;
* Always think of safety first!&lt;br /&gt;
* Always wear the required cleanroom attire&lt;br /&gt;
* Change you cleanroom gown at least once a week&lt;br /&gt;
* Respect a comfort safety zone around people working in the cleanroom&lt;br /&gt;
* When you work at the fume hoods:&lt;br /&gt;
** Use slow movements (to avoid turbulence)&lt;br /&gt;
** Reduce the amount of equipment and bottles in the bench&lt;br /&gt;
** Operate with sash as low as possible (Always below arrow marking max sash height)&lt;br /&gt;
** Keep the worksurface tidy&lt;br /&gt;
** Clean up after use&lt;br /&gt;
** If you must leave a process unattended, please limit the time and attach a note with name, contact info, and return time. &lt;br /&gt;
* Wash labware after use with Milli-Q water and hang to dry on rack&lt;br /&gt;
* No food or drinks allowed in the cleanroom&lt;br /&gt;
* Broken glass must be cleaned and disposed of in the glass bins&lt;br /&gt;
* No earphones! You must be able to hear and see to act safely&lt;br /&gt;
&lt;br /&gt;
= How to dress =&lt;br /&gt;
&lt;br /&gt;
When working in the cleanroom, you must always wear cleanroom attire, and when working with acids or dangerous chemicals, you must also wear personal protective equipment (PPE). Cleanroom attire and PPE have different purposes. Clean room attire is not PPE. You wear cleanroom attire to protect samples from dust generated by you, and you wear PPE to protect you from chemicals. &lt;br /&gt;
&lt;br /&gt;
To minimize particle generation your personal clothes and hair must be totally covered from the lower edge of the clean room coat and up. Long hair must be tucked under the hood and neither headscarves nor hair must stick out or block your vision.&lt;br /&gt;
&lt;br /&gt;
Oversized trousers or floor long dresses pose a safety risk as you may trip while handling chemicals and is thus not allowed. Clothing that contains excessive fringe or even overly loose-fitting clothing may be ruled to be unsafe. Open toed shoes are accepted.&lt;br /&gt;
&lt;br /&gt;
The use of contact lenses is not recommended in the lab. Contact lenses make it difficult to wash the eyes in case of splashes. If you choose to wear them you should alert other cleanroom users. Other users need to know that lenses will need to be removed if you do get something in your eye&lt;br /&gt;
&lt;br /&gt;
Please note that you are required to strip your clothes when using the safety shower. Not removing contaminated clothes will make the situation worse. If you are not comfortable with this, you should not enter the lab.&lt;br /&gt;
&lt;br /&gt;
== Cleanroom attire ==&lt;br /&gt;
[[File:Required cleanroom attire.png|320px|right|Required cleanroom attire]]&lt;br /&gt;
The required cleanroom attire is:&lt;br /&gt;
&lt;br /&gt;
* Hair cover&lt;br /&gt;
* Safety glasses, even over normal glasses. They may only be removed when using the microscopes.&lt;br /&gt;
* Beard cover if you have a beard or stubble over 3 mm long&lt;br /&gt;
* Cleanroom gown&lt;br /&gt;
* Gloves&lt;br /&gt;
* Shoe covers&lt;br /&gt;
&lt;br /&gt;
== Personal protective equipment ==&lt;br /&gt;
&lt;br /&gt;
Further required PPE when working with dangerous chemicals:&lt;br /&gt;
&lt;br /&gt;
* Apron&lt;br /&gt;
* Face splash shield&lt;br /&gt;
* Double nitrile or latex gloves (provides better safety and facilitates glove change after spill)&lt;br /&gt;
* Protective sleeves&lt;br /&gt;
* Fumehood sash kept low&lt;br /&gt;
&lt;br /&gt;
= Practical information = &lt;br /&gt;
* All staff members are covered by the insurance provisions of the Occupational Injuries Act. In this relation a staff member is someone receiving a salary for the work done&lt;br /&gt;
* Students are not usually covered by the insurance provisions of the Occupational Injuries Act. We recommend that you have an accident policy, and that you make sure it also applies when you are studying and when you are working in the lab.&lt;br /&gt;
* Please familiarize yourself with the  [https://intranet.ku.dk/nbi/en/Organisation/Councils%20and%20committees/Occupational%20health%20and%20safety%20comm/Emergency%20Plans/Documents/Beredskabsplaner%20for%20Niels%20Bohr%20Institutet_ENG.pdf Emergency plan]&lt;br /&gt;
* Please familiarize yourself with the [https://intranet.ku.dk/nbi/en/Organisation/Councils%20and%20committees/Occupational%20health%20and%20safety%20comm/Evacuation/Pages/default.aspx general evacuation concept of KU]&lt;br /&gt;
* Information about the NBI Occupational Health and Safety Committee can be found [https://intranet.ku.dk/NBI/EN/ORGANISATION/COUNCILS%20AND%20COMMITTEES/OCCUPATIONAL%20HEALTH%20AND%20SAFETY%20COMM/Pages/default.aspx here]. This webpage also has links to other relevant Occupational Health and Safety sites at KU.&lt;br /&gt;
* A very thorough [https://intranet.ku.dk/nbi/organisation/raad%20og%20udvalg/arbejsdsmiljoeudvalget/Documents/sikkerhed_i_undervisningen11.pdf general lab safety manual for physics students] at NBI.&lt;br /&gt;
* KU provides First Aid courses. Keep an eye out for [https://intranet.ku.dk/employeeguide/course/Pages/default.aspx courses] given in English (Generally offered a couple of times a year).&lt;/div&gt;</summary>
		<author><name>Nader</name></author>
	</entry>
	<entry>
		<id>https://wiki.nbi.ku.dk/w/cleanroom/index.php?title=General_rules_for_working_in_the_cleanroom&amp;diff=1437</id>
		<title>General rules for working in the cleanroom</title>
		<link rel="alternate" type="text/html" href="https://wiki.nbi.ku.dk/w/cleanroom/index.php?title=General_rules_for_working_in_the_cleanroom&amp;diff=1437"/>
		<updated>2018-01-23T10:35:06Z</updated>

		<summary type="html">&lt;p&gt;Nader: /* Practical information */&lt;/p&gt;
&lt;hr /&gt;
&lt;div&gt;The safety of you and coworkers in the lab is of utmost importance. Although we encourage constructive feedback on safety procedures, and how to improve them, you must accept that safety is not a democratic process. The rules must be followed.&lt;br /&gt;
&lt;br /&gt;
In case of an accident, you must also accept that your coworkers or cleanroom staff takes over and instructs you in order to help in the best possible way. You may not think rationally in such a situation!&lt;br /&gt;
&lt;br /&gt;
= How to behave =&lt;br /&gt;
* Always think of safety first!&lt;br /&gt;
* Always wear the required cleanroom attire&lt;br /&gt;
* Change you cleanroom gown at least once a week&lt;br /&gt;
* Respect a comfort safety zone around people working in the cleanroom&lt;br /&gt;
* When you work at the fume hoods:&lt;br /&gt;
** Use slow movements (to avoid turbulence)&lt;br /&gt;
** Reduce the amount of equipment and bottles in the bench&lt;br /&gt;
** Operate with sash as low as possible (Always below arrow marking max sash height)&lt;br /&gt;
** Keep the worksurface tidy&lt;br /&gt;
** Clean up after use&lt;br /&gt;
** If you must leave a process unattended, please limit the time and attach a note with name, contact info, and return time. &lt;br /&gt;
* Wash labware after use with Milli-Q water and hang to dry on rack&lt;br /&gt;
* No food or drinks allowed in the cleanroom&lt;br /&gt;
* Broken glass must be cleaned and disposed of in the glass bins&lt;br /&gt;
* No earphones! You must be able to hear and see to act safely&lt;br /&gt;
&lt;br /&gt;
= How to dress =&lt;br /&gt;
&lt;br /&gt;
When working in the cleanroom, you must always wear cleanroom attire, and when working with acids or dangerous chemicals, you must also wear personal protective equipment (PPE). Cleanroom attire and PPE have different purposes. Clean room attire is not PPE. You wear cleanroom attire to protect samples from dust generated by you, and you wear PPE to protect you from chemicals. &lt;br /&gt;
&lt;br /&gt;
To minimize particle generation your personal clothes and hair must be totally covered from the lower edge of the clean room coat and up. Long hair must be tucked under the hood and neither headscarves nor hair must stick out or block your vision.&lt;br /&gt;
&lt;br /&gt;
Oversized trousers or floor long dresses pose a safety risk as you may trip while handling chemicals and is thus not allowed. Clothing that contains excessive fringe or even overly loose-fitting clothing may be ruled to be unsafe. Open toed shoes are accepted.&lt;br /&gt;
&lt;br /&gt;
The use of contact lenses is not recommended in the lab. Contact lenses make it difficult to wash the eyes in case of splashes. If you choose to wear them you should alert other cleanroom users. Other users need to know that lenses will need to be removed if you do get something in your eye&lt;br /&gt;
&lt;br /&gt;
Please note that you are required to strip your clothes when using the safety shower. Not removing contaminated clothes will make the situation worse. If you are not comfortable with this, you should not enter the lab.&lt;br /&gt;
&lt;br /&gt;
== Cleanroom attire ==&lt;br /&gt;
[[File:Required cleanroom attire.png|320px|right|Required cleanroom attire]]&lt;br /&gt;
The required cleanroom attire is:&lt;br /&gt;
&lt;br /&gt;
* Hair cover&lt;br /&gt;
* Safety glasses, even over normal glasses. They may only be removed when using the microscopes.&lt;br /&gt;
* Beard cover if you have a beard or stubble over 3 mm long&lt;br /&gt;
* Cleanroom gown&lt;br /&gt;
* Gloves&lt;br /&gt;
* Shoe covers&lt;br /&gt;
&lt;br /&gt;
== Personal protective equipment ==&lt;br /&gt;
&lt;br /&gt;
Further required PPE when working with dangerous chemicals:&lt;br /&gt;
&lt;br /&gt;
* Apron&lt;br /&gt;
* Face splash shield&lt;br /&gt;
* Double nitrile or latex gloves (provides better safety and facilitates glove change after spill)&lt;br /&gt;
* Protective sleeves&lt;br /&gt;
* Fumehood sash kept low&lt;br /&gt;
&lt;br /&gt;
= Practical information = &lt;br /&gt;
* All staff members are covered by the insurance provisions of the Occupational Injuries Act. In this relation a staff member is someone receiving a salary for the work done&lt;br /&gt;
* Students are not usually covered by the insurance provisions of the Occupational Injuries Act. We recommend that you have an accident policy, and that you make sure it also applies when you are studying and when you are working in the lab.&lt;br /&gt;
* Please familiarize yourself with the Emergency plan [https://intranet.ku.dk/nbi/en/Organisation/Councils%20and%20committees/Occupational%20health%20and%20safety%20comm/Emergency%20Plans/Documents/Beredskabsplaner%20for%20Niels%20Bohr%20Institutet_ENG.pdf]&lt;br /&gt;
* Please familiarize yourself with the [https://intranet.ku.dk/nbi/en/Organisation/Councils%20and%20committees/Occupational%20health%20and%20safety%20comm/Evacuation/Pages/default.aspx general evacuation concept of KU]&lt;br /&gt;
* Information about the NBI Occupational Health and Safety Committee can be found [https://intranet.ku.dk/NBI/EN/ORGANISATION/COUNCILS%20AND%20COMMITTEES/OCCUPATIONAL%20HEALTH%20AND%20SAFETY%20COMM/Pages/default.aspx here]. This webpage also has links to other relevant Occupational Health and Safety sites at KU.&lt;br /&gt;
* A very thorough [https://intranet.ku.dk/nbi/organisation/raad%20og%20udvalg/arbejsdsmiljoeudvalget/Documents/sikkerhed_i_undervisningen11.pdf general lab safety manual for physics students] at NBI.&lt;br /&gt;
* KU provides First Aid courses. Keep an eye out for [https://intranet.ku.dk/employeeguide/course/Pages/default.aspx courses] given in English (Generally offered a couple of times a year).&lt;/div&gt;</summary>
		<author><name>Nader</name></author>
	</entry>
	<entry>
		<id>https://wiki.nbi.ku.dk/w/cleanroom/index.php?title=General_rules_for_working_in_the_cleanroom&amp;diff=1436</id>
		<title>General rules for working in the cleanroom</title>
		<link rel="alternate" type="text/html" href="https://wiki.nbi.ku.dk/w/cleanroom/index.php?title=General_rules_for_working_in_the_cleanroom&amp;diff=1436"/>
		<updated>2018-01-23T10:31:16Z</updated>

		<summary type="html">&lt;p&gt;Nader: /* Practical information */&lt;/p&gt;
&lt;hr /&gt;
&lt;div&gt;The safety of you and coworkers in the lab is of utmost importance. Although we encourage constructive feedback on safety procedures, and how to improve them, you must accept that safety is not a democratic process. The rules must be followed.&lt;br /&gt;
&lt;br /&gt;
In case of an accident, you must also accept that your coworkers or cleanroom staff takes over and instructs you in order to help in the best possible way. You may not think rationally in such a situation!&lt;br /&gt;
&lt;br /&gt;
= How to behave =&lt;br /&gt;
* Always think of safety first!&lt;br /&gt;
* Always wear the required cleanroom attire&lt;br /&gt;
* Change you cleanroom gown at least once a week&lt;br /&gt;
* Respect a comfort safety zone around people working in the cleanroom&lt;br /&gt;
* When you work at the fume hoods:&lt;br /&gt;
** Use slow movements (to avoid turbulence)&lt;br /&gt;
** Reduce the amount of equipment and bottles in the bench&lt;br /&gt;
** Operate with sash as low as possible (Always below arrow marking max sash height)&lt;br /&gt;
** Keep the worksurface tidy&lt;br /&gt;
** Clean up after use&lt;br /&gt;
** If you must leave a process unattended, please limit the time and attach a note with name, contact info, and return time. &lt;br /&gt;
* Wash labware after use with Milli-Q water and hang to dry on rack&lt;br /&gt;
* No food or drinks allowed in the cleanroom&lt;br /&gt;
* Broken glass must be cleaned and disposed of in the glass bins&lt;br /&gt;
* No earphones! You must be able to hear and see to act safely&lt;br /&gt;
&lt;br /&gt;
= How to dress =&lt;br /&gt;
&lt;br /&gt;
When working in the cleanroom, you must always wear cleanroom attire, and when working with acids or dangerous chemicals, you must also wear personal protective equipment (PPE). Cleanroom attire and PPE have different purposes. Clean room attire is not PPE. You wear cleanroom attire to protect samples from dust generated by you, and you wear PPE to protect you from chemicals. &lt;br /&gt;
&lt;br /&gt;
To minimize particle generation your personal clothes and hair must be totally covered from the lower edge of the clean room coat and up. Long hair must be tucked under the hood and neither headscarves nor hair must stick out or block your vision.&lt;br /&gt;
&lt;br /&gt;
Oversized trousers or floor long dresses pose a safety risk as you may trip while handling chemicals and is thus not allowed. Clothing that contains excessive fringe or even overly loose-fitting clothing may be ruled to be unsafe. Open toed shoes are accepted.&lt;br /&gt;
&lt;br /&gt;
The use of contact lenses is not recommended in the lab. Contact lenses make it difficult to wash the eyes in case of splashes. If you choose to wear them you should alert other cleanroom users. Other users need to know that lenses will need to be removed if you do get something in your eye&lt;br /&gt;
&lt;br /&gt;
Please note that you are required to strip your clothes when using the safety shower. Not removing contaminated clothes will make the situation worse. If you are not comfortable with this, you should not enter the lab.&lt;br /&gt;
&lt;br /&gt;
== Cleanroom attire ==&lt;br /&gt;
[[File:Required cleanroom attire.png|320px|right|Required cleanroom attire]]&lt;br /&gt;
The required cleanroom attire is:&lt;br /&gt;
&lt;br /&gt;
* Hair cover&lt;br /&gt;
* Safety glasses, even over normal glasses. They may only be removed when using the microscopes.&lt;br /&gt;
* Beard cover if you have a beard or stubble over 3 mm long&lt;br /&gt;
* Cleanroom gown&lt;br /&gt;
* Gloves&lt;br /&gt;
* Shoe covers&lt;br /&gt;
&lt;br /&gt;
== Personal protective equipment ==&lt;br /&gt;
&lt;br /&gt;
Further required PPE when working with dangerous chemicals:&lt;br /&gt;
&lt;br /&gt;
* Apron&lt;br /&gt;
* Face splash shield&lt;br /&gt;
* Double nitrile or latex gloves (provides better safety and facilitates glove change after spill)&lt;br /&gt;
* Protective sleeves&lt;br /&gt;
* Fumehood sash kept low&lt;br /&gt;
&lt;br /&gt;
= Practical information = &lt;br /&gt;
* All staff members are covered by the insurance provisions of the Occupational Injuries Act. In this relation a staff member is someone receiving a salary for the work done&lt;br /&gt;
* Students are not usually covered by the insurance provisions of the Occupational Injuries Act. We recommend that you have an accident policy, and that you make sure it also applies when you are studying and when you are working in the lab.&lt;br /&gt;
* Please familiarize yourself with the [https://intranet.ku.dk/nbi/en/Organisation/Councils%20and%20committees/Occupational%20health%20and%20safety%20comm/Emergency%20Plans/Documents/Beredskabsplaner%20for%20Niels%20Bohr%20Institutet_ENG.pdf]&lt;br /&gt;
* Please familiarize yourself with the [https://intranet.ku.dk/nbi/en/Organisation/Councils%20and%20committees/Occupational%20health%20and%20safety%20comm/Evacuation/Pages/default.aspx general evacuation concept of KU]&lt;br /&gt;
* Information about the NBI Occupational Health and Safety Committee can be found [https://intranet.ku.dk/NBI/EN/ORGANISATION/COUNCILS%20AND%20COMMITTEES/OCCUPATIONAL%20HEALTH%20AND%20SAFETY%20COMM/Pages/default.aspx here]. This webpage also has links to other relevant Occupational Health and Safety sites at KU.&lt;br /&gt;
* A very thorough [https://intranet.ku.dk/nbi/organisation/raad%20og%20udvalg/arbejsdsmiljoeudvalget/Documents/sikkerhed_i_undervisningen11.pdf general lab safety manual for physics students] at NBI.&lt;br /&gt;
* KU provides First Aid courses. Keep an eye out for [https://intranet.ku.dk/employeeguide/course/Pages/default.aspx courses] given in English (Generally offered a couple of times a year).&lt;/div&gt;</summary>
		<author><name>Nader</name></author>
	</entry>
</feed>