cleanroom - User contributions [en-gb]

File:Emergency shower.jpg

2026-05-22T13:18:00Z

Harry:

File:HF bench setup.png

2026-05-22T13:16:03Z

Harry:

HF safety

2026-05-22T13:12:37Z

Harry:

= Working with HF =

Hydrofluoric acid (HF) is a highly hazardous chemical with unique properties that require strict safety protocols. This guide outlines the procedures for safe handling, spill response, and emergency actions when working with HF in the cleanroom.

'''Warning''' HF can cause severe burns, tissue damage, and systemic toxicity.
'''Always follow these guidelines.'''

Watch our video on how to safely handle HF:

[[File:HF_handling.mp4|600px]]

== Chemical and Toxicological Properties ==
=== Chemical Properties ===
{|
|-
| <div style="background-color: #f8d7da; border: 1px solid #f5c6cb; padding: 10px; border-radius: 5px;">
* Clear and colorless with a density like that of water.
* HF dissolves glass, attacks metals, and forms explosive hydrogen gas.
* '''Use and Storage: polyethylene, polypropylene, or Teflon'''
</div>
|}
=== Toxicological Properties ===
{|
|-
| <div style="background-color: #f8d7da; border: 1px solid #f5c6cb; padding: 10px; border-radius: 5px;">
* Fluoride ions cause soft tissue and bone damage by binding to calcium. Fluoride ions are both acutely and chronically toxic. Acute effects of HF exposure include extreme respiratory irritation, immediate and severe eye damage and [https://en.wikipedia.org/wiki/Pulmonary_edema pulmonary edema].
* '''Exposure Routes:''' '''Skin contact''' with HF is probably the most common route of exposure for laboratory personnel, although HF can also cause damage through '''eye contact''', '''inhalation''', or '''ingestion'''.
* '''Symptoms:''' May be delayed (up to 24 hours for dilute solutions).
* '''Fatality Risk:''' Concentrated HF burns can be fatal even with small exposure (2% body surface area).
* '''If you are exposed to hydrofluoric acid, seek medical attention immediately, even if you do not feel pain.'''

</div>
|}

== Operational Restrictions ==
{|
|-
| <div style="background-color: #d1ecf1; border: 1px solid #17a2b8; padding: 10px; border-radius: 5px;">
<span style="color:#ff0000"> '''No HF work outside working hours'''</span>
* '''Allowed hours:''' Monday to Friday, '''8:00–18:00''' (no weekends, no holidays).
* A '''cleanroom staff member must be available in the building''' during HF use.
* '''HF buddy requirement:''' An HF buddy must be present with the user at all times.
* '''Maximum concentration:''' Training covers working with concentrations up to '''10% HF'''.
</div>
|}

== Emergency Equipment ==
{| class="wikitable"
| '''Equipment''' || '''Location'''
|-
| Calcium Gluconate Gel || Next to the fumehood '''&''' 2nd floor corridor emergency shower
|-
| Emergency Shower || 2nd floor corridor
|-
| Large/Medium Spill Kits || Outside CR1
|-
| Sodium Bicarbonate Powder || In CR1
|}

==Additional Notes==
* '''User Comfort:''' Users may stop work at any time if they feel uncomfortable.
* '''CR Staff Support:''' CR staff are available to assist or take over in case of uncertainty or emergencies.
* '''Training:''' All users must be trained in HF handling and emergency procedures before working with HF.

== General Setup and Preparation ==
=== Before Starting ===
<div style="background-color: #c0c0c0; border: 1px solid #f5c6cb; padding: 10px; border-radius: 5px;">
# Announce the start of HF work: ''“I am going to work with HF.”''
# Flip the door sign to indicate HF work is in progress.
# Find a buddy: '''Never work alone.'''
# Check:
## Waste container and HF supply.
## Availability of calcium gluconate gel and spill kit.
# Gown up:
<div style="background-color: #808080; border: 1px solid #f5c6cb; padding: 10px; border-radius: 5px;">
# Regular cleanroom attire (hairnet, goggles, gown, clogs, nitrile gloves).
# Barrier gloves.
# Face shield: Optional.
# Sleeves: Optional.
</div>
''Note: Always check gloves for tears prior to use.''
</div>

=== Tools and Materials ===
* '''Tweezers:''' Users should use their own.
* '''Beakers:'''
** Polypropylene (PP) beakers: Available at the laminar flow bench.
** PTFE (Teflon) beakers: Purchased and used from your own group (not public).

=== Workstation Setup ===
{|
|-
| <div style="background-color: #d1ecf1; border: 1px solid #17a2b8; padding: 10px; border-radius: 5px;">
* Always carry out work in the dedicated HF tray
* Use 1 beaker for HF and 2 beakers for MQ water
* Do not use wipes inside the tray
* Label the beakers by writing directly on the tray with a permanent marker (use IPA to erase it later)
* Place cleanroom wipes between the HF tray and the bench airfoil, to prevent any spill outside of the tray from dripping outside the bench.
</div>
|}

[[File:HF_bench_setup.png|center|thumb|800px|Recommended Setup Inside the Fume Hood]]

== Standard Operating Procedure ==

<div style="background-color: #c0c0c0; border: 1px solid #f5c6cb; padding: 10px; border-radius: 5px;">
# Pour MQ water in the dedicated beakers
# Announce in the room that you start handling HF (“Now I take HF from the cabinet”)
# Pour HF in the beaker
# Check that your gloves are dry (no liquid droplets)
## You should always assume that in case you see a droplet in your glove, it is HF and you should follow the procedure described later on [[S[p
# Return the HF bottle in the cabinet
# Run your process
# Once done, place the HF waste bottle inside the sink of the fumehood. You can use the funnel to dispose the liquids
# Pour the HF in the waste
# Pour the first MQ in the HF beaker and then dispose it in the waste
# Pour the second MQ in the HF beaker and then dispose it in the waste
# Check that your gloves are dry (no liquid droplets)
# Throw the beakers in the trash
# Return the HF waste bottle in the cabinet
# Announce the HF work is done (“I am done with HF”)
# Clean up the workspace
# Remove your barrier gloves inside the fumehood and dispose them in the chemical waste bin
# Remove the additional safety attire
</div>

== Waste Disposal ==
To ensure safety, users are requested to regularly check their safety equipment for potential sources of contamination.
{|
|-
| <div style="background-color: #f8d7da; border: 1px solid #f5c6cb; padding: 10px; border-radius: 5px;">
* '''HF Waste:''' Dispose in the '''designated HF waste container''' below the fume hood.
: '''Never exceed the fill line.''' New waste containers are found below the sink under the drying rack.
* '''Contaminated Materials:''' Gloves, wipes, or aprons exposed to HF must be treated as chemical waste.
</div>
|}

== Spill Protocols ==
=== Identifying Suspicious Droplets ===
{| class="wikitable"
| '''If you see a liquid drop on''' || '''Action Plan'''
|-
| Stainless steel airfoil || * Assume it is HF.
* Wipe once with a CR wipe.
* Wipe again with a water-soaked CR wipe and let it evaporate.
|-
| Barrier gloves || * Assume it is HF.
* Rinse gloves.
* Remove them by turning inside out (no wiping needed).
* Use a clean set of barrier gloves.
|-
| Apron || * Remove the apron and leave it '''inside the fume hood'''.
* Evacuate the area.
* CR staff flushes and disposes of the apron.
|}

=== Spill Inside the HF Tray ===
<div style="background-color: #f8d7da; border: 1px solid #f5c6cb; padding: 10px; border-radius: 5px;">
'''The HF work stops until the spill is removed.'''
* Buddy checks in with the user and contacts a CR staff member.
* User may proceed with removing the spill '''only if comfortable'''; otherwise, contact CR staff to take over.
* Dispose of the contents of all beakers.
* The spilled HF inside the tray can be disposed of either with a pipette or by tilting the tray and pouring directly into the HF waste container.
* '''Do not use wipes.'''
* Carefully rinse the tray with water to dilute any HF residues.
* Dispose of the water in the HF waste container.
* Carefully rinse the tray with plenty of water inside the sink.
* Dry the tray with a cleanroom wipe.
* User disposes of their barrier gloves.
''It is recommended for the user to take a break and continue their work fresh later or another day''
</div>

=== Spill Outside the HF Tray ===
{|class="wikitable"
| '''Spill Location''' || '''User Actions'''
|-
| Outside the HF tray but inside the bench || * '''Do not take any action'''—leave the setup immediately.
* Buddy helps remove contaminated PPE (keep PPE within the fume hood).
* Buddy calls for help (if user is HF-free).
|-
| Outside the HF tray and outside the bench || * '''Do not take any action'''—'''evacuate CR1 immediately'''.
* Remove contaminated PPE '''outside CR1 door''' (in the hallway).
* Buddy calls for help (if user is HF-free).
|}

=== Splash on the User’s Body ===
'''In case of a splash on the user’s body, the user should immediately evacuate and use the shower in the corridor of the 2nd floor.'''

'''The user and their buddy should follow the action plan bellow'''
{|
|-
| <div style="background-color: #fff3cd; border: 1px solid #ffc107; padding: 10px; border-radius: 5px;">
'''HF User:'''
# Exit CR1.
# Remove contaminated clothes in the corridor.
# Exit the cleanroom area through the emergency door right across from CR1.
# Start using the shower in the corridor.
# Apply running water on the area of contact for at least 20 minutes.
# Apply calcium gluconate gel to the affected area after 20 minutes of rinsing.

'''HF Buddy:'''
# Keep a distance from the user.
# Assist user with escape route.
# Call for help.
# Support HF user while help is on the way.
</div>
|}

[[File:Emergency_shower.jpg|center|thumb|800px|Emergency Showers in the Hallway of the Second Floor]]

---
== Exposure Response ==
{|
|-
| <div style="background-color: #f8d7da; border: 1px solid #f5c6cb; padding: 10px; border-radius: 5px;">
Although HF exposures can result in injury, quick response will minimize the damage. All exposures should be treated immediately even though burns may not be felt for hours. HF first aid (calcium gluconate gel) and spill response kits are located in the cleanroom and users are obliged to familiarize themselves with the location and proper use of them.

Affected personnel must receive medical attention for all exposures, i.e. any exposure to HF must be medically evaluated. Take a copy of these procedures and the MSDS with you to the emergency room.
</div>
|}

=== Skin Contact ===
* Immediately wash all affected areas with water.
* Remove any clothing or jewelry that could trap or retain HF (remove goggles last).
* Flush skin for 15 minutes or until medical attention is available.
* Get medical attention.
* Apply calcium gluconate gel to the affected area (use rubber gloves) every 15 minutes and repeat flushing in between.

=== Eye Contact ===
* Immediately flush eyes for at least 15 minutes with water while holding eyelids open.
* Remove contact lenses if applicable.
* Get medical attention.
* Flushing can be limited to 5 minutes if medical personnel are immediately available to administer sterile calcium gluconate (1%) solution (via continuous drip into eyes).

=== Inhalation ===
* Move to fresh air as soon as possible.
* Get medical attention.
* Medical personnel can administer pure oxygen and calcium gluconate (via nebulizer).

The [https://en.wikipedia.org/wiki/Threshold_limit_value threshold limit value] (TLV) for HF is 2 PPM.

{{Emergencies}}

[[Category:Safety]]

HF safety

2026-05-22T13:11:39Z

Harry:

= Working with HF =

Hydrofluoric acid (HF) is a highly hazardous chemical with unique properties that require strict safety protocols. This guide outlines the procedures for safe handling, spill response, and emergency actions when working with HF in the cleanroom.

'''Warning''' HF can cause severe burns, tissue damage, and systemic toxicity.
'''Always follow these guidelines.'''

Watch our video on how to safely handle HF:

[[File:HF_handling.mp4|600px]]

== Chemical and Toxicological Properties ==
=== Chemical Properties ===
{|
|-
| <div style="background-color: #f8d7da; border: 1px solid #f5c6cb; padding: 10px; border-radius: 5px;">
* Clear and colorless with a density like that of water.
* HF dissolves glass, attacks metals, and forms explosive hydrogen gas.
* '''Use and Storage: polyethylene, polypropylene, or Teflon'''
</div>
|}
=== Toxicological Properties ===
{|
|-
| <div style="background-color: #f8d7da; border: 1px solid #f5c6cb; padding: 10px; border-radius: 5px;">
* Fluoride ions cause soft tissue and bone damage by binding to calcium. Fluoride ions are both acutely and chronically toxic. Acute effects of HF exposure include extreme respiratory irritation, immediate and severe eye damage and [https://en.wikipedia.org/wiki/Pulmonary_edema pulmonary edema].
* '''Exposure Routes:''' '''Skin contact''' with HF is probably the most common route of exposure for laboratory personnel, although HF can also cause damage through '''eye contact''', '''inhalation''', or '''ingestion'''.
* '''Symptoms:''' May be delayed (up to 24 hours for dilute solutions).
* '''Fatality Risk:''' Concentrated HF burns can be fatal even with small exposure (2% body surface area).
* '''If you are exposed to hydrofluoric acid, seek medical attention immediately, even if you do not feel pain.'''

</div>
|}

== Operational Restrictions ==
{|
|-
| <div style="background-color: #d1ecf1; border: 1px solid #17a2b8; padding: 10px; border-radius: 5px;">
<span style="color:#ff0000"> '''No HF work outside working hours'''</span>
* '''Allowed hours:''' Monday to Friday, '''8:00–18:00''' (no weekends, no holidays).
* A '''cleanroom staff member must be available in the building''' during HF use.
* '''HF buddy requirement:''' An HF buddy must be present with the user at all times.
* '''Maximum concentration:''' Training covers working with concentrations up to '''10% HF'''.
</div>
|}

== Emergency Equipment ==
{| class="wikitable"
| '''Equipment''' || '''Location'''
|-
| Calcium Gluconate Gel || Next to the fumehood '''&''' 2nd floor corridor emergency shower
|-
| Emergency Shower || 2nd floor corridor
|-
| Large/Medium Spill Kits || Outside CR1
|-
| Sodium Bicarbonate Powder || In CR1
|}

==Additional Notes==
* '''User Comfort:''' Users may stop work at any time if they feel uncomfortable.
* '''CR Staff Support:''' CR staff are available to assist or take over in case of uncertainty or emergencies.
* '''Training:''' All users must be trained in HF handling and emergency procedures before working with HF.

== General Setup and Preparation ==
=== Before Starting ===
<div style="background-color: #c0c0c0; border: 1px solid #f5c6cb; padding: 10px; border-radius: 5px;">
# Announce the start of HF work: ''“I am going to work with HF.”''
# Flip the door sign to indicate HF work is in progress.
# Find a buddy: '''Never work alone.'''
# Check:
## Waste container and HF supply.
## Availability of calcium gluconate gel and spill kit.
# Gown up:
<div style="background-color: #808080; border: 1px solid #f5c6cb; padding: 10px; border-radius: 5px;">
# Regular cleanroom attire (hairnet, goggles, gown, clogs, nitrile gloves).
# Barrier gloves.
# Face shield: Optional.
# Sleeves: Optional.
</div>
''Note: Always check gloves for tears prior to use.''
</div>

=== Tools and Materials ===
* '''Tweezers:''' Users should use their own.
* '''Beakers:'''
** Polypropylene (PP) beakers: Available at the laminar flow bench.
** PTFE (Teflon) beakers: Purchased and used from your own group (not public).

=== Workstation Setup ===
{|
|-
| <div style="background-color: #d1ecf1; border: 1px solid #17a2b8; padding: 10px; border-radius: 5px;">
* Always carry out work in the dedicated HF tray
* Use 1 beaker for HF and 2 beakers for MQ water
* Do not use wipes inside the tray
* Label the beakers by writing directly on the tray with a permanent marker (use IPA to erase it later)
* Place cleanroom wipes between the HF tray and the bench airfoil, to prevent any spill outside of the tray from dripping outside the bench.
</div>
|}

[[File:HF_bench_setup.png|center|thumb|800px|Recommended Setup Inside the Fume Hood]]

== Standard Operating Procedure ==

<div style="background-color: #c0c0c0; border: 1px solid #f5c6cb; padding: 10px; border-radius: 5px;">
# Pour MQ water in the dedicated beakers
# Announce in the room that you start handling HF (“Now I take HF from the cabinet”)
# Pour HF in the beaker
# Check that your gloves are dry (no liquid droplets)
## You should always assume that in case you see a droplet in your glove, it is HF and you should follow the procedure described later on [[S[p
# Return the HF bottle in the cabinet
# Run your process
# Once done, place the HF waste bottle inside the sink of the fumehood. You can use the funnel to dispose the liquids
# Pour the HF in the waste
# Pour the first MQ in the HF beaker and then dispose it in the waste
# Pour the second MQ in the HF beaker and then dispose it in the waste
# Check that your gloves are dry (no liquid droplets)
# Throw the beakers in the trash
# Return the HF waste bottle in the cabinet
# Announce the HF work is done (“I am done with HF”)
# Clean up the workspace
# Remove your barrier gloves inside the fumehood and dispose them in the chemical waste bin
# Remove the additional safety attire
</div>

== Waste Disposal ==
To ensure safety, users are requested to regularly check their safety equipment for potential sources of contamination.
{|
|-
| <div style="background-color: #f8d7da; border: 1px solid #f5c6cb; padding: 10px; border-radius: 5px;">
* '''HF Waste:''' Dispose in the '''designated HF waste container''' below the fume hood.
: '''Never exceed the fill line.''' New waste containers are found below the sink under the drying rack.
* '''Contaminated Materials:''' Gloves, wipes, or aprons exposed to HF must be treated as chemical waste.
</div>
|}

== Spill Protocols ==
=== Identifying Suspicious Droplets ===
{| class="wikitable"
| '''If you see a liquid drop on''' || '''Action Plan'''
|-
| Stainless steel airfoil || * Assume it is HF.
* Wipe once with a CR wipe.
* Wipe again with a water-soaked CR wipe and let it evaporate.
|-
| Barrier gloves || * Assume it is HF.
* Rinse gloves.
* Remove them by turning inside out (no wiping needed).
* Use a clean set of barrier gloves.
|-
| Apron || * Remove the apron and leave it '''inside the fume hood'''.
* Evacuate the area.
* CR staff flushes and disposes of the apron.
|}

=== Spill Inside the HF Tray ===
<div style="background-color: #f8d7da; border: 1px solid #f5c6cb; padding: 10px; border-radius: 5px;">
'''The HF work stops until the spill is removed.'''
* Buddy checks in with the user and contacts a CR staff member.
* User may proceed with removing the spill '''only if comfortable'''; otherwise, contact CR staff to take over.
* Dispose of the contents of all beakers.
* The spilled HF inside the tray can be disposed of either with a pipette or by tilting the tray and pouring directly into the HF waste container.
* '''Do not use wipes.'''
* Carefully rinse the tray with water to dilute any HF residues.
* Dispose of the water in the HF waste container.
* Carefully rinse the tray with plenty of water inside the sink.
* Dry the tray with a cleanroom wipe.
* User disposes of their barrier gloves.
''It is recommended for the user to take a break and continue their work fresh later or another day''
</div>

=== Spill Outside the HF Tray ===
{|class="wikitable"
| '''Spill Location''' || '''User Actions'''
|-
| Outside the HF tray but inside the bench || * '''Do not take any action'''—leave the setup immediately.
* Buddy helps remove contaminated PPE (keep PPE within the fume hood).
* Buddy calls for help (if user is HF-free).
|-
| Outside the HF tray and outside the bench || * '''Do not take any action'''—'''evacuate CR1 immediately'''.
* Remove contaminated PPE '''outside CR1 door''' (in the hallway).
* Buddy calls for help (if user is HF-free).
|}

=== Splash on the User’s Body ===
'''In case of a splash on the user’s body, the user should immediately evacuate and use the shower in the corridor of the 2nd floor.'''

'''The user and their buddy should follow the action plan bellow'''
{|
|-
| <div style="background-color: #fff3cd; border: 1px solid #ffc107; padding: 10px; border-radius: 5px;">
'''HF User:'''
# Exit CR1.
# Remove contaminated clothes in the corridor.
# Exit the cleanroom area through the emergency door right across from CR1.
# Start using the shower in the corridor.
# Apply running water on the area of contact for at least 20 minutes.
# Apply calcium gluconate gel to the affected area after 20 minutes of rinsing.

'''HF Buddy:'''
# Keep a distance from the user.
# Assist user with escape route.
# Call for help.
# Support HF user while help is on the way.
</div>
|}

[[File:Emergency_shower.jpg|center|thumb|800px|Emergency Showers in the Hallway of the Second Floor]]

---
== Exposure Response ==
{|
|-
| <div style="background-color: #f8d7da; border: 1px solid #f5c6cb; padding: 10px; border-radius: 5px;">
Although HF exposures can result in injury, quick response will minimize the damage. All exposures should be treated immediately even though burns may not be felt for hours. HF first aid (calcium gluconate gel) and spill response kits are located in the cleanroom and users are obliged to familiarize themselves with the location and proper use of them.

Affected personnel must receive medical attention for all exposures, i.e. any exposure to HF must be medically evaluated. Take a copy of these procedures and the MSDS with you to the emergency room.
</div>
|}

=== Skin Contact ===
* Immediately wash all affected areas with water.
* Remove any clothing or jewelry that could trap or retain HF (remove goggles last).
* Flush skin for 15 minutes or until medical attention is available.
* Get medical attention.
* Apply calcium gluconate gel to the affected area (use rubber gloves) every 15 minutes and repeat flushing in between.

=== Eye Contact ===
* Immediately flush eyes for at least 15 minutes with water while holding eyelids open.
* Remove contact lenses if applicable.
* Get medical attention.
* Flushing can be limited to 5 minutes if medical personnel are immediately available to administer sterile calcium gluconate (1%) solution (via continuous drip into eyes).

=== Inhalation ===
* Move to fresh air as soon as possible.
* Get medical attention.
* Medical personnel can administer pure oxygen and calcium gluconate (via nebulizer).

{|
|-
| <div style="background-color: #fff3cd; border: 1px solid #ffc107; padding: 10px; border-radius: 5px;">
'''Note: The threshold limit value (TLV) for HF is 2 PPM.'''
</div>
|}

---
== First Aid ==
{|
|-
| <div style="background-color: #d1ecf1; border: 1px solid #17a2b8; padding: 10px; border-radius: 5px;">
'''Four Principles of First Aid:'''
# Stop the accident
# Preserve life
# Summon assistance
# Provide first aid

If you call emergency services (112), '''send a colleague to the main entrance of the HCØ building to guide paramedics to the accident site'''.

'''Emergency Ward:''' Bispebjerg Skadestue, 23 Bispebjergbakke, 2400 Copenhagen NV.

'''Reporting:''' All accidents must be reported to one of the permanent NBI staff members.
</div>
|}

---
== Location of Emergency Equipment ==
{|
| '''Equipment''' || '''Location'''
|-
| Emergency Showers || Hallway niches on all floors at HCØ except the basement. Shower head in ceiling, tap handle in wooden panel above cabinets.
|-
| Cleanroom Showers || Both cleanrooms.
|-
| Eyewash Bottles || Cleanroom and all labs where chemicals are used.
|-
| Plumbed-in Eyewash Shower || Common cleanroom corridor.
|-
| First Aid Kits || Hallway niches closest to the elevator on the 2nd and 4th floors.
|-
| Defibrillators || HCØ hallway ground floor.
|}

HF safety

2026-05-22T13:08:42Z

Harry: Created page with "= Working with HF = Hydrofluoric acid (HF) is a highly hazardous chemical with unique properties that require strict safety protocols. This guide outlines the procedures for safe handling, spill response, and emergency actions when working with HF in the cleanroom. '''Warning''' HF can cause severe burns, tissue damage, and systemic toxicity. '''Always follow these guidelines.''' Watch our video on how to safely handle HF: 600px == Chemical..."

= Working with HF =

Hydrofluoric acid (HF) is a highly hazardous chemical with unique properties that require strict safety protocols. This guide outlines the procedures for safe handling, spill response, and emergency actions when working with HF in the cleanroom.

'''Warning''' HF can cause severe burns, tissue damage, and systemic toxicity.
'''Always follow these guidelines.'''

Watch our video on how to safely handle HF:

[[File:HF_handling.mp4|600px]]

== Chemical and Toxicological Properties ==
=== Chemical Properties ===
{|
|-
| <div style="background-color: #f8d7da; border: 1px solid #f5c6cb; padding: 10px; border-radius: 5px;">
* Clear and colorless with a density like that of water.
* HF dissolves glass, attacks metals, and forms explosive hydrogen gas.
* '''Use and Storage: polyethylene, polypropylene, or Teflon'''
</div>
|}
=== Toxicological Properties ===
{|
|-
| <div style="background-color: #f8d7da; border: 1px solid #f5c6cb; padding: 10px; border-radius: 5px;">
* Fluoride ions cause soft tissue and bone damage by binding to calcium. Fluoride ions are both acutely and chronically toxic. Acute effects of HF exposure include extreme respiratory irritation, immediate and severe eye damage and [https://en.wikipedia.org/wiki/Pulmonary_edema pulmonary edema].
* '''Exposure Routes:''' '''Skin contact''' with HF is probably the most common route of exposure for laboratory personnel, although HF can also cause damage through '''eye contact''', '''inhalation''', or '''ingestion'''.
* '''Symptoms:''' May be delayed (up to 24 hours for dilute solutions).
* '''Fatality Risk:''' Concentrated HF burns can be fatal even with small exposure (2% body surface area).
* '''If you are exposed to hydrofluoric acid, seek medical attention immediately, even if you do not feel pain.'''

</div>
|}

== Operational Restrictions ==
{|
|-
| <div style="background-color: #d1ecf1; border: 1px solid #17a2b8; padding: 10px; border-radius: 5px;">
<span style="color:#ff0000"> '''No HF work outside working hours'''</span>
* '''Allowed hours:''' Monday to Friday, '''8:00–18:00''' (no weekends, no holidays).
* A '''cleanroom staff member must be available in the building''' during HF use.
* '''HF buddy requirement:''' An HF buddy must be present with the user at all times.
* '''Maximum concentration:''' Training covers working with concentrations up to '''10% HF'''.
</div>
|}

== Emergency Equipment ==
{| class="wikitable"
| '''Equipment''' || '''Location'''
|-
| Calcium Gluconate Gel || Next to the fumehood '''&''' 2nd floor corridor emergency shower
|-
| Emergency Shower || 2nd floor corridor
|-
| Large/Medium Spill Kits || Outside CR1
|-
| Sodium Bicarbonate Powder || In CR1
|}

==Additional Notes==
* '''User Comfort:''' Users may stop work at any time if they feel uncomfortable.
* '''CR Staff Support:''' CR staff are available to assist or take over in case of uncertainty or emergencies.
* '''Training:''' All users must be trained in HF handling and emergency procedures before working with HF.

== General Setup and Preparation ==
=== Before Starting ===
<div style="background-color: #c0c0c0; border: 1px solid #f5c6cb; padding: 10px; border-radius: 5px;">
# Announce the start of HF work: ''“I am going to work with HF.”''
# Flip the door sign to indicate HF work is in progress.
# Find a buddy: '''Never work alone.'''
# Check:
## Waste container and HF supply.
## Availability of calcium gluconate gel and spill kit.
# Gown up:
<div style="background-color: #808080; border: 1px solid #f5c6cb; padding: 10px; border-radius: 5px;">
# Regular cleanroom attire (hairnet, goggles, gown, clogs, nitrile gloves).
# Barrier gloves.
# Face shield: Optional.
# Sleeves: Optional.
</div>
''Note: Always check gloves for tears prior to use.''
</div>

=== Tools and Materials ===
* '''Tweezers:''' Users should use their own.
* '''Beakers:'''
** Polypropylene (PP) beakers: Available at the laminar flow bench.
** PTFE (Teflon) beakers: Purchased and used from your own group (not public).

=== Workstation Setup ===
{|
|-
| <div style="background-color: #d1ecf1; border: 1px solid #17a2b8; padding: 10px; border-radius: 5px;">
* Always carry out work in the dedicated HF tray
* Use 1 beaker for HF and 2 beakers for MQ water
* Do not use wipes inside the tray
* Label the beakers by writing directly on the tray with a permanent marker (use IPA to erase it later)
* Place cleanroom wipes between the HF tray and the bench airfoil, to prevent any spill outside of the tray from dripping outside the bench.
</div>
|}

[[File:HF_bench_setup.png|center|thumb|800px|Recommended Setup Inside the Fume Hood]]

== Standard Operating Procedure ==

<div style="background-color: #c0c0c0; border: 1px solid #f5c6cb; padding: 10px; border-radius: 5px;">
# Pour MQ water in the dedicated beakers
# Announce in the room that you start handling HF (“Now I take HF from the cabinet”)
# Pour HF in the beaker
# Check that your gloves are dry (no liquid droplets)
## You should always assume that in case you see a droplet in your glove, it is HF and you should follow the procedure described later on [[S[p
# Return the HF bottle in the cabinet
# Run your process
# Once done, place the HF waste bottle inside the sink of the fumehood. You can use the funnel to dispose the liquids
# Pour the HF in the waste
# Pour the first MQ in the HF beaker and then dispose it in the waste
# Pour the second MQ in the HF beaker and then dispose it in the waste
# Check that your gloves are dry (no liquid droplets)
# Throw the beakers in the trash
# Return the HF waste bottle in the cabinet
# Announce the HF work is done (“I am done with HF”)
# Clean up the workspace
# Remove your barrier gloves inside the fumehood and dispose them in the chemical waste bin
# Remove the additional safety attire
</div>

== Waste Disposal ==
To ensure safety, users are requested to regularly check their safety equipment for potential sources of contamination.
{|
|-
| <div style="background-color: #f8d7da; border: 1px solid #f5c6cb; padding: 10px; border-radius: 5px;">
* '''HF Waste:''' Dispose in the '''designated HF waste container''' below the fume hood.
: '''Never exceed the fill line.''' New waste containers are found below the sink under the drying rack.
* '''Contaminated Materials:''' Gloves, wipes, or aprons exposed to HF must be treated as chemical waste.
</div>
|}

== Spill Protocols ==
=== Identifying Suspicious Droplets ===
{| class="wikitable"
| '''If you see a liquid drop on''' || '''Action Plan'''
|-
| Stainless steel airfoil || * Assume it is HF.
* Wipe once with a CR wipe.
* Wipe again with a water-soaked CR wipe and let it evaporate.
|-
| Barrier gloves || * Assume it is HF.
* Rinse gloves.
* Remove them by turning inside out (no wiping needed).
* Use a clean set of barrier gloves.
|-
| Apron || * Remove the apron and leave it '''inside the fume hood'''.
* Evacuate the area.
* CR staff flushes and disposes of the apron.
|}

=== Spill Inside the HF Tray ===
<div style="background-color: #f8d7da; border: 1px solid #f5c6cb; padding: 10px; border-radius: 5px;">
'''The HF work stops until the spill is removed.'''
* Buddy checks in with the user and contacts a CR staff member.
* User may proceed with removing the spill '''only if comfortable'''; otherwise, contact CR staff to take over.
* Dispose of the contents of all beakers.
* The spilled HF inside the tray can be disposed of either with a pipette or by tilting the tray and pouring directly into the HF waste container.
* '''Do not use wipes.'''
* Carefully rinse the tray with water to dilute any HF residues.
* Dispose of the water in the HF waste container.
* Carefully rinse the tray with plenty of water inside the sink.
* Dry the tray with a cleanroom wipe.
* User disposes of their barrier gloves.
''It is recommended for the user to take a break and continue their work fresh later or another day''
</div>

=== Spill Outside the HF Tray ===
{|class="wikitable"
| '''Spill Location''' || '''User Actions'''
|-
| Outside the HF tray but inside the bench || * '''Do not take any action'''—leave the setup immediately.
* Buddy helps remove contaminated PPE (keep PPE within the fume hood).
* Buddy calls for help (if user is HF-free).
|-
| Outside the HF tray and outside the bench || * '''Do not take any action'''—'''evacuate CR1 immediately'''.
* Remove contaminated PPE '''outside CR1 door''' (in the hallway).
* Buddy calls for help (if user is HF-free).
|}

=== Splash on the User’s Body ===
'''In case of a splash on the user’s body, the user should immediately evacuate and use the shower in the corridor of the 2nd floor.'''

'''The user and their buddy should follow the action plan bellow'''
{|
|-
| <div style="background-color: #fff3cd; border: 1px solid #ffc107; padding: 10px; border-radius: 5px;">
'''HF User:'''
# Exit CR1.
# Remove contaminated clothes in the corridor.
# Exit the cleanroom area through the emergency door right across from CR1.
# Start using the shower in the corridor.
# Apply running water on the area of contact for at least 20 minutes.
# Apply calcium gluconate gel to the affected area after 20 minutes of rinsing.

'''HF Buddy:'''
# Keep a distance from the user.
# Assist user with escape route.
# Call for help.
# Support HF user while help is on the way.
</div>
|}

[[File:Emergency_shower.jpg|center|thumb|800px|Emergency Showers in the Hallway of the Second Floor]]

---
== Exposure Response ==
{|
|-
| <div style="background-color: #f8d7da; border: 1px solid #f5c6cb; padding: 10px; border-radius: 5px;">
Although HF exposures can result in injury, '''quick response will minimize the damage'''. All exposures should be treated immediately even if burns are not felt for hours. HF first aid (calcium gluconate gel) and spill response kits are located in the cleanroom, and users are obliged to familiarize themselves with their location and proper use.

'''Affected personnel must receive medical attention for all exposures.''' Any exposure to HF must be medically evaluated. Take a copy of these procedures and the MSDS to the emergency room.
</div>
|}

=== Skin Contact ===
# Immediately wash all affected areas with water.
# Remove any clothing or jewelry that could trap or retain HF (remove goggles last).
# Flush skin for 15 minutes or until medical attention is available.
# Get medical attention.
# Apply calcium gluconate gel to the affected area (use rubber gloves) every 15 minutes and repeat flushing in between.

=== Eye Contact ===
# Immediately flush eyes for at least 15 minutes with water while holding eyelids open.
# Remove contact lenses if applicable.
# Get medical attention.
# Flushing can be limited to 5 minutes if medical personnel are immediately available to administer sterile calcium gluconate (1%) solution (via continuous drip into eyes).

=== Inhalation ===
# Move to fresh air as soon as possible.
# Get medical attention.
# Medical personnel can administer pure oxygen and calcium gluconate (via nebulizer).

{|
|-
| <div style="background-color: #fff3cd; border: 1px solid #ffc107; padding: 10px; border-radius: 5px;">
'''Note: The threshold limit value (TLV) for HF is 2 PPM.'''
</div>
|}

---
== First Aid ==
{|
|-
| <div style="background-color: #d1ecf1; border: 1px solid #17a2b8; padding: 10px; border-radius: 5px;">
'''Four Principles of First Aid:'''
# Stop the accident.
# Preserve life.
# Summon assistance.
# Provide first aid.

If you call emergency services (112), '''send a colleague to the main entrance of the HCØ building to guide paramedics to the accident site'''.

'''Emergency Ward:''' Bispebjerg Skadestue, 23 Bispebjergbakke, 2400 Copenhagen NV.

'''Reporting:''' All accidents must be reported to one of the permanent NBI staff members.
</div>
|}

---
== Location of Emergency Equipment ==
{|
| '''Equipment''' || '''Location'''
|-
| Emergency Showers || Hallway niches on all floors at HCØ except the basement. Shower head in ceiling, tap handle in wooden panel above cabinets.
|-
| Cleanroom Showers || Both cleanrooms.
|-
| Eyewash Bottles || Cleanroom and all labs where chemicals are used.
|-
| Plumbed-in Eyewash Shower || Common cleanroom corridor.
|-
| First Aid Kits || Hallway niches closest to the elevator on the 2nd and 4th floors.
|-
| Defibrillators || HCØ hallway ground floor.
|}

Safety

2026-05-22T12:21:19Z

Harry: /* Safety topics */

= Safety topics =
*[[General rules for working in the cleanroom]]
*[[Working with chemicals]]
*[[Working with HF|Working with hydrofluoric acid]]
*[[HF safety|HF safety]]
*[[Working with nanowires and nanotubes]]
*[[Working in the cleanroom while pregnant]]
*[[Introducing new chemicals or processes]]
*[[Lift transport of hazardous materials]]

= Cleanroom introduction training =
Trainings take place at HCØ building D, 2nd floor, from 9.30 to 15.00. Training is scheduled regularly (approximately once a month) based on the requests received by new users. It is always a good idea to write in advance and avoid long waiting times.

==Sign up and training schedule==
You can sign up on the waiting list to receive the cleanroom introduction training by sending an email to cleanroom@nbi.ku.dk.

During the training, you will be introduced to the cleanroom, external labs, safety precautions, emergency protocols and chemical processes. A [https://wiki.nbi.ku.dk/w/cleanroom/images/8/82/Detailed_introduction_schedule.pdf detailed schedule] is used as a guide for the training.
* [https://wiki.nbi.ku.dk/w/cleanroom/images/9/9e/Topics_covered_during_Cleanroom_safety_training.pdf List of Topics covered during Cleanroom use and safety training - PDF]

During the sign-up process, you must name a mentor/superuser (preferably from your group) who can assist you in the first few weeks after your safety/introduction training. The mentor should teach you the standard processes used in the group until you are both comfortable that you can work independently.
When the mentor has assessed that you are ready to work independently, they must inform the cleanroom team and '''only then will you get full access to cleanroom labs'''.

==Preparation==
Before you attend the training, you are required to read the following documents:
*[[General rules for working in the cleanroom]]
*[[Working with chemicals]]
*[[Working with HF|Working with hydrofluoric acid]]
*[[Working with nanowires and nanotubes]]
*[https://kunet.ku.dk/employee-guide/Pages/Safety-and-Emergency-Preparedness/Evacuation.aspx Evacuation guide from KU]
*[https://kunet.ku.dk/faculty-and-department/nbi/about-the-institute/Councils%20and%20committees/Occupational%20health%20and%20safety%20comm/Pages/default.aspx NBI-Handbook on the NBInet]
*[https://kunet.ku.dk/employee-guide/Pages/Safety-and-Emergency-Preparedness/Safety-and-emergency.aspx Safety and Emergency preparedness]
*[https://kunet.ku.dk/faculty-and-department/nbi/health-and-safety/Pages/default.aspx Health and Safety]

It is good to familiarize yourselves with our wikipage. Browse and make a list with the tools and processes that you need to use in the cleanroom.

==Authorisation==
At the end of the training day, you will be requested to fill out a questionnaire. This includes True/False statements as well as an exercise on how to dispose chemicals correctly. The objective of the quiz is to increase your awareness during the training and clear out any ambiguities. The questions are based on previous experiences and complaints of our regular users.

Once all the participants fill out the questionnaires, the users and the instructor discuss any mistakes as a group. There is no grading, but the mistakes tend to lead to insightful conversations. You will also receive a list with [https://wiki.nbi.ku.dk/w/cleanroom/images/1/15/Dosdonts.pdf dos and don'ts] in case you forget something in the future. When in doubt, you are always welcome to contact one of the cleanroom staff and discuss.

As a last part of the training, you need to sign the [https://wiki.nbi.ku.dk/w/cleanroom/images/6/6b/Cleanroom_safety_authorization_checklist_2025.pdf Cleanroom safety authorization checklist]

= Other =

* [http://www.kemibrug.dk/ Kemibrug.dk] - Information on chemical safety, local handling procedures, and availability
* [https://wiki.nbi.ku.dk/w/cleanroom/images/3/30/APV-Eng-Chemical_risk_assessment.pdf Chemical risk assessment form - PDF] - [https://wiki.nbi.ku.dk/w/cleanroom/images/9/97/APV-Eng-Chemical_risk_assessment.doc Chemical risk assessment form - Word] - needed when introducing new processes
* [[Filled out chemical risk assessment forms]]
* [https://erda.ku.dk/vgrid/NBI_cleanroom/files/Chemical%20list%20-Marianne.xlsx Chemical list - Marianne]
* [https://wiki.nbi.ku.dk/w/cleanroom/images/6/6b/Cleanroom_safety_authorization_checklist_2025.pdf Cleanroom safety authorization checklist]
* [[Waste handling]]
* [[Sustainability]]

[[Category:Safety]]

AJA systems

2026-04-28T09:42:48Z

Harry: /* Other available materials */

{{Infobox tool
|image = Tool AJA2.jpg
|toolfullname = AJA Orion
|website = http://www.ajaint.com/atc-orion-series-sputtering-systems.html
|company = AJA INTERNATIONAL INC.
|description = Thin film deposition and milling systems
|location = 03.2.218
|primary = Harry
|secondary = Martin
}}
''Page last updated: 11 Nov 2025''

There are two AJA Orion physical vapor deposition (PVD) systems at the [[Main Page|NBI cleanroom]].
They both have 2" magnetron sputtering and electron beam evaporation capabilities, as well as some form of substrate milling/sputtering.
Most users utilize the tools for thin film metal deposition and substrate surface cleaning.

Other deposition tools at the [[Main Page|NBI cleanroom]]:
* Metal PVD:
** [[E-Gun evaporator]]
** [[Edwards evaporator|Edwards thermal evaporator]]
** [[Leica sputter coater]]
* Oxide ALD:
** [[Cambridge ALD]]
* III-V growth:
** [[MBE]]

== Overview ==

Systems 1 and 2 are identical in terms of operating procedures. The password for logging in is ''apex''.

They differ slightly in their outfitting:
* System 1: Two 2" DC sputtering targets, Kaufman ion source for cleaning. Mechanically clamped to the loading arm and magnetically clamped to the rotating stage inside. Oxidation chamber on the loadlock.
* System 2: One regular 2" DC sputtering target, one 3" DC sputtering target with adjustable working distance, one 2" RF sputtering target, and an RF supply to the stage for substrate sputtering (ion milling). Mechanically clamped to the loading arm as well as the stage inside the chamber. Stage water cooling (same 19°C chiller circuit as for magnetrons and e-beam crucibles). Stray electrons on the near side are stopped by an extra static shutter, magnetically steered away on the far side.

Systems 1 and 2 are expected to at least reach a vacuum of about 2x10<sup>-8</sup> Torr and 6x10<sup>-8</sup> Torr (respectively) after pumping for 24 hours on the main chamber from atmosphere.
The chamber vacuum is monitored periodically by shutting the cryo-valve and recording the rise of pressure rise for 10 mins. The ''rate-of-rise'' history is provided here [link].

== Currently loaded materials ==

The materials currently available for deposition are as follows (updated 2024 July 2):

{|
|-
|
{| class="wikitable"
|-
! AJA1 !! Material !! Liner !! Thickness limit
|-
| 1 || Al || Intermetallic ||
|-
| 2 || Ti1 || Fabmate ||
|-
| 3 || SiOx || Tungsten ||
|-
| 4 || Au2 || Tungsten ||
|-
| 5 || Ge || Fabmate ||
|-
| 6 || Pt || FabMate || 200 nm*
|-
| DC1 || W || -- ||
|-
| DC2 || Nb<sub>2</sub>Ti || -- ||
|-
|}
|
<span style="display:inline-block; width: 20px;"></span>
|
{| class="wikitable"
|-
! AJA2 !! Material !! Liner !! Thickness limit
|-
| 1 || Pt || Tungsten || 200 nm*
|-
| 2 || Au2 || FabMate ||
|-
| 3 || Al || Intermetallic ||
|-
| 4 || Ti || intermetallic ||
|-
| 5 || Pd || FabMate ||
|-
| 6 || Cr || FabMate ||
|-
| DC1 || Ti || -- ||
|-
| RF2 || Mo || -- ||
|-
| RF3
| Nb<sub>2</sub>Ti || -- ||
|-
|}
|-
|}

Notes:
* If you need to deposit a thicker layer, you need to book enough time for the cryo pump to reach base temperature before continuing with a second layer.
* When you make a booking, you have to select if your deposition includes gold. If yes, you will be asked to fill out the total Au thickness you plan to deposit.
=== Other available materials ===
'''Evaporation''': SiO<sub>2</sub>, MgB<sub>2</sub>, SiGe (p-doped), Ta, Nb, Pd, W
'''Sputtering''': Nb<sub>2</sub>Ti<sub>1</sub>, Cu, InSb, Bi, Ti, Re, Mo, Ni, Si<sub>3</sub>N<sub>4</sub>, Ta, Nb<sub>4</sub>Ti<sub>1</sub>, Nb

There is a big [https://www.lesker.com/newweb/deposition_materials/materialdepositionchart.cfm compatibility chart] next to the prep bench behing AJA1.
For each deposition material it lists a compatible evaporation crucible material, and a compatible sputtering power mode.

== '''Step by step guide''' ==

Various procedures on the system are shown in the video and in a step by step guide below:

[[File:AJA_load_movie.mp4|500px]]

[https://youtu.be/irRtsm70ggU Click here to watch the video on YouTube]

([[Media:How_to_Evaporate_metal_in_AJA1.pdf|An illustrated guide for new users by Mingtang]]. A physical copy of the same lies by the tool. It is a bit outdated but may help you remember some steps)

===Loading your sample===
* Check the cryo-pump monitor. It should be between 12-17 K. If it's higher than 20 K, grab a tool responsible or a technical staff member.
* Check that the turbo frequency is 1500 Hz. The turbo pumps on the load lock.
* Check that the pressure in the main chamber (ion gauge sensor) is <1x10<sup>-7</sup> Torr. '''Log this value.'''
* Check that the load lock gate valve (connects the load lock to the main chamber) is closed.
* Push down the 'Load Lock' switch in order to vent the load lock.
* Once the load lock pressure reaches ~760 Torr, the load lock lid pops out a bit and can be rotated freely.
** Do not apply force and pull the load lock lid out. The load lock may not be vented yet.
* Rotate the lid until the permanent markers meet and twist the lid out, pivoting about the two permanent marks on the left.
** The permanent marks indicate the position of spring loaded ball bearing that hold the lid in place, preventing it from falling out.
** Ideally, you want rotate the lid so as to pivot against two bearings.
* Place the load lock lid, handle up, on the three rubber bumps.
* Remove the sample holder. It's held in place by three pins that lock into a groove.
* Grab a fresh cleanroom wipe, place the sample holder on the wipe.
*; Important note for AJA2:
*: If your entire process ends with Au deposition, use the dedicated Au sample holder. If your process ends with anything else, use the generic sample holder. This ensures that the surface on the Au sample holder remains consistent. This is important for RF substrate milling.
* Load your chip either using the mechanical clamps or the double sided Kapton tape.
* Load the sample holder inside the load lock, rotate the holder to confirm all three pins are locked in place, replace the lid and flick the 'load lock' switch up to pump out.
* Wait until the chamber pressure goes down to 3x10<sup>-6</sup> Torr. This can take 5-30 minutes, depending on your sample. The turbo will have revved up to 1500 Hz by now. Confirm this.
* Open the gate valve between the main chamber and the load lock.
* Load your sample.
** AJA1: You should feel the magnetic pull when the sample holder is close enough to the stage to be coupled. Then unlock the loading arm from the sample holder and retract the arm.
** AJA2: Screw in the sample holder into the stage.
** Take note of the sample holder orientation on the stage as well as the rotation/orientation of the loading arm. In principle, you should unload using the same orientation as this will be the easiest.
* Close the load lock valve.
** Check main chamber vacuum.
** Check cryo pump temperature.

===Evaporating metal===
* Rotate the stage to face the crucible liners.
* Choose the material on the linear crucible drive as well as on the deposition controller.
* Open the e-beam shutter by flicking the physical e-beam shutter switch to open.
** This exposes the metal to be evaporated.
** If you don't open this shutter, the accelerated focused electron beam will hit the shutter instead of the metal and drill a hole through it!
* Switch on the Carrera Ferro Tec high voltage power supply. The switch is green and is labelled 'Main'.
* Turn on the high voltage on the hand remote. It sets the beam acceleration voltage to 10 kV. This is fixed and cannot be changed by the users.
** Be very sure that you have opened the e-beam shutter.
* Two clicks of the knob and the current set point is set to 4 mA (AJA2) or 5 mA (AJA1).
** Wait until the current increases to this value.
* Can you see the bright spot where the beam hits the metal in the crucible?
** Center the beam and make sure the beam is <del>neither too focused nor too defocused</del> not sweeping (unless required for some materials).
* Now, consult the Excel log sheet to determine the typical current needed to get a finite evaporation rate.
* Ramp the current up at about 20 mA/min to half the value (1 click/10 seconds). Let it sit at that value for 2 mins while the metal soaks and thermally equilibriates.
** Too fast and you'll crack the crucible liner
** or your evaporated metal film will be rough.
* 1 Å/s is a good rate for metal film evaporation. Try and stay around this value. 2 Å/s for gold is okay.
* When you are ready to evaporate, zero the counter on the deposition controller and open the sample shutter.
** The shutter takes about 1-2 secs to open, so you don't have to be paranoid about synchronizing the zero with the shutter opening.
* Wait until the right thickness is evaporated.
* Close the substrate shutter.
* Ramp the beam down to 0 in a period of a couple of minutes (1 click/10 seconds). Don't be too quick about it. We want the metal and the liner to cool down slowly to stop the liner from cracking due to thermal stress.
* Turn off high voltage.
* Wait 2-3 mins for the metal to cool down before moving over to the next metal. The metal inside the crucible should stop glowing.
* If you're done, turn off the Carrera voltage supply.
* Close the e-beam shutter if the metal is no longer red hot.

===Unloading your sample===
* Rotate the sample to the correct position (same orientation as during the loading procedure).
* Open the load lock gate valve, and unload your sample.
* Close the load lock valve.
* Vent the load lock using the load lock switch on the main rack.
* As before, wait till the load lock reaches ~760 Torr and pops out a bit.
* Twist and pull the lid out if the permanent marks are lined up.
* Rest the lid on rubber knobs, handle up.
* Fresh cleanroom wipe!
* Get the sample cassette out, unload your sample.
** If you used double sided tape, wipe off the residue with IPA or ethanol.
* Put the sample cassette back and pump out the load lock.
* Fill out the Excel log file.
* Clean up after yourself. If the work station is found untidy, the last user will be held accountable.

===Using the Kaufman ion source (ion milling)===
* Load your sample via the load lock following the procedure detailed above.
* Rotate the sample to face the ion milling gun.
* Turn off the ion gauge (pressure gauge).
* On the laptop, make sure the PhaseIIJ program is running. If not, start it up.
** The password: apex
* Set the adaptive pressure controller to 'Remote'.
** It's a 3 sec long press.
* In the program, click on the ion gas button. It should turn green. This diverts the Ar gas flow to the gun.
* Turn on the Ar flow and set the 'STPT' (set point) to an appropriate value.
** Look at the Excel log files to select a relevant set of values for the flow. The flow roughly sets the base Ar pressure in the chamber.
* Select 'Pressure' button and enter a value:
** Again, the Excel log files should guide you in selecting an appropriate value. Typically, a flow of 6 sccm and a pressure of 0.6 mbar works nicely.
** The program floors the entered value to a single digit precision. 0.61 will become 0.6. 0.6 sometimes becomes 0.5. I just live with this minor annoyance.
* A PID controlled gate valve between the cryo pump and the chamber will adjust so that the Ar pressure in the chamber matches the set point. You'll hear the valve adjusting when you set the controller to remote. On the adaptive pressure controller display look at the 'SP' and the 'P1'. These should match the value that you want and keyed into the PhaseIIJ program.
* Turn on the Kaufman ion source controller power supply.
* Set the power supply to remote mode.

* On the PC at the prep table there are several shortcuts to scripts.
# Execute the relevant beam voltage script (100 V or 300 V). Confirm the settings are reflected on the power supply.
# Execute the discharge script: enter the desired discharge time in seconds and press ENTER.

* Go back to the laptop.
* Click on the small 'output' button to turn on the gun.
** This fires the Ar ions. The ion source shutter still protects your sample.
* Wait for the indicator to turn purple.
* Start your timer and open the shutter with the big 'shutter' button.
* You are now milling.

* To turn off the Kaufman ion source click the green output button. It should turn red.
* Wait 2 mins for the gun to cool down. Do NOT turn off the Ar yet.
* In the pressure control section of the PhaseIIJ software click 'Open' to completely open the cryo gate valve and pump the Ar out.
* Turn off the Ar gas flow.
* Turn off the Kaufman source controller.
* Set the adaptive pressure controller to local.
* Turn on the ion gauge (pressure sensor).
* Proceed with evaporating metal or unloading your sample following the guidelines.

===Sputtering metals===
* Load your sample via the load lock following the procedure detailed above
* Turn off the ion gauge (pressure gauge).
* On the laptop, make sure the PhaseIIJ programs is running.
** If not start it up. The password:apex
* Set the adaptive pressure controller to 'Remote'
** It's a 3 sec long press.
* info: Finer control over the Ar pressure in the chamber is achieved by selecting 'Pressure' button and entering a value.
* info: In the program, turn on the Ar flow and set the 'STPT' (set point) to an appropriate value.
** Look at the Excel log files to select a relevant set of values for the flow. The flow roughly sets the base Ar pressure in the chamber.
* info: Finer control over the Ar pressure in the chamber is achieved by selecting 'Pressure' button and entering a value.
** Again, the Excel log files should guide you in selecting an appropriate value.
** The program floors the entered value to a single digit precision. 0.61 will become 0.6. 0.6 sometimes becomes 0.5. I just live with this minor annoyance.
* info: A PID controlled gate valve between the cryo pump and the chamber will adjust so that the Ar pressure in the chamber matches the set point. You'll hear the valve adjusting when you set the controller to remote. On the adaptive pressure controller display look at the 'SP' and the 'P1'. These should match the value that you want and keyed into the phaseIIJ program.
* Rotate the sample to face downwards.
** The sputter sources are angled a bit and 10-20 degree might give you a more head on sputtering.
* Power up the relevant sputtering source power unit.

====Auto====
* Click Run process
* Scroll down to and select your desired sputtering recipe
* Run

====Manual====
* Striking the plasma:
** Open the substrate shutter. The sputter sources have individual shutters.
** Set the Ar flow to 80 sccm and pressure to 30 mTorr.
** Set the power stpt to 50 W and turn on the output.
** Once the plasma ignites, the pressure can be lowered to 2-4 mTorr and flow to 20 sccm.
** Check that the plasma is visible (a faint purple blueish hue inside the main chamber).
** There is a little pink indicator in the software that should light up in the control software congruent with when the plasma is visible in the chamber.
* Ramping: Enter the ramp time first and '''then''' the new set point such that the ramp rate is 1 W/s. Hit enter or click away after entering the new set point.
** Entering the new set point before entering the ramp time will result in the system jumping to the set point in one step. This will cause rapid heating and will break the sputter housing.
** Close the viewport shutter, since they will get covered with the sputtered film.
** Once the desired set point is reached, open the sputter shutter and start the timer.
* Ramping down:
** Enter the ramp down time and THEN the set point of 50 W.
** Once the system ramps down to 50 W, turn off the output.
* Open the adaptive pressure controller by clicking on 'Open' in the software.
** This opens up the cryo valve to max.
* Turn off the Ar gas flow.

For safe operation of the RF ALWAYS enter a ramp rate such that the RF circuitry never ramps faster than 1W/second. Enter ramp rate BEFORE changing wattage!

====After either Auto or Manual====
* Set the adaptive pressure controller to local
* Turn on the ion gauge
* Carry on with other steps such as metallization, unloading, etc as outlined above.

===Substrate sputtering (RF)===
* Load your sample via the load lock following the procedure detailed above
* Turn off the ion gauge (pressure gauge).
* On the laptop, make sure the PhaseIIJ programs is running.
** If not start it up. The password:apex
* Set the adaptive pressure controller to 'Remote'
** It's a 3 sec long press.
* Rotate the sample to face downwards.
* Power up the relevant sputtering source power unit.
====Auto====
* Select run process
* Scroll down to the desired program
* Run
====Manual====
* Striking the plasma:
** Set the Ar flow to 80 sccm and pressure to 30 mTorr.
<div class="toccolours">
Info:

A PID controlled gate valve between the cryo pump and the chamber will adjust so that the Ar pressure in the chamber matches the set point. You'll hear the valve adjusting when you set the controller to remote. On the adaptive pressure controller display look at the 'SP' and the 'P1'. These should match the value that you want and keyed into the phaseIIJ program.

The program floors the entered pressure set point value to a single digit precision. 0.61 will become 0.6. 0.6 sometimes becomes 0.5. I just live with this minor annoyance.
</div>
* Striking the plasma (contd.):
** Set the RF1 stpt to 25 W and turn on the output.
** Once the plasma ignites, the pressure can be lowered to 2-4 mTorr and flow to 20 sccm.
** Check that the plasma is visible (a faint purple blueish hue inside the main chamber).
** There is a little pink indicator in the software that should light up in the control software congruent with when the plasma is visible in the chamber.
* Ramping: Enter the ramp time first and '''then''' the new set point such that the ramp rate is 1 W/s. Hit enter or click away after entering the new set point.
** Max set pt is 50 W
** Entering the new set point before entering the ramp time will result in the system jumping to the set point in one step. This will cause rapid heating.
** Close the viewport shutter.
** Once the desired set point is reached start the timer.
* Ramping down:
** Enter the ramp down time and THEN the set point of 25 W.
** Once the system ramps down to 25 W, turn off the output.
* Open the adaptive pressure controller by clicking on 'Open'.
** This opens up the cryo valve to max.
* Turn off the Ar gas flow.

====After Auto or Manual====
* Set the adaptive pressure controller to local
* Turn on the ion gauge
* Turn off the RF power source
* Carry on with other steps such as metalization, unloading, etc as outlined above.

=== Oxidation in loadlock ===

The process is set up for ~10 Torr. In practice it should be between 9.8-10.0 Torr (see log sheet).

[[Media:Oxidation upgrade.xlsx|Data gathered during initial testing (xlsx)]]

Empirically: ''regulator_valve = (desired_pressure / 9) - 1''

The Baratron gauge only goes up to 10 Torr. Therefore this is the maximum allowed pressure for oxidation.

The gas hooked up for the process is 85% Ar / 15% O2.

Reference Figure for valve numbering.
The actual placement of the parts is slightly different, but all six valves have stickers with numbers on them.

[[Image:AJA oxidation valves.jpg]]

==== Changing the oxidation pressure ====

Consult the speadsheet describing regulator valve reading vs Baratron pressure.

Decide on the regulator valve reading you will go for.

Quick guess: ''(desired pressure in Torr / 9) - 1''

# Make sure '''Valves 1, 3, 5, 6''' are closed.
#: Make sure '''Valve 4''' is closed in the software.
# Close '''Valve 2''' (turbo iso).
#: Open '''Valve 5''' (roughing).
#: Open '''Valve 3''' (soak).
# Move behind the tool so you can comfortably reach '''Valve 1''' and the regulator valve.
# Open '''Valve 1''' (fill). The regulator valve pressure should drop about 0.05 bar.
#: Adjust the regulator valve to desired value.
#: Close '''Valve 1'''.
# Open '''Valve 4''' (turbo purge) in the software. Wait for the pressure to go down to 0.148 Torr. You can safely continue if it is lower.
# Close '''Valve 5''' (roughing).
#: Open '''Valve 2''' (turbo iso). Wait until the pressure in the loadlock is below 3e-6 Torr.
# Close '''Valve 3''' (soak).

==== Standard oxidation procedure ====

Before you start make sure that:
* The loadlock is below 3e-6 Torr and your sample is already transferred in; ready for the oxidation process.
* Gate valve to the main chamber is closed.
* '''Valves 1, 3, 5, 6''' are closed.
* '''Valve 4''' (LL tp) is closed in the software.
* '''Valve 2''' is open.
* O2/Ar gas bottle regulator valve shows a reading that will give you a desirable pressure in the loadlock. '''Log this value.''' The pressure reading is relative to ambient atmosphere.

# Open '''Valve 1''' (Fill valve) for <del>~30</del> ''a few'' seconds in order to charge the gas ballast section. You will hear the gas quickly filling the volume.
# Close '''Valve 1'''.
# Close '''Valve 2''' (Turbo Iso valve) in order to isolate the load lock volume from the turbo.
# Open '''Valve 3''' (Soak valve) in order to expose O2 gas ballast to load lock volume. '''Start a timer.'''
#: If at any point the load lock increases above 10 Torr, it is safest/best to vent the load lock up to atmospheric pressure by opening '''Valve 6''' (manual N2 vent).
#:: Do not attempt to rough out the load lock if above 10 Torr through the manual bypass '''Valve 5'''.
# Soak for desired oxidation time. '''Log the Baratron pressure''' (red LEDs at the bottom of the tool). '''Log the oxidation time.'''
#: ''This needs data feedback from the users. --Karolis''
# Open '''Valve 4''' (turbo N2 purge valve) through the ''AJA PhaseIIJ'' software to initiate the purging process.
# Once ready to rough out the load lock body, slowly crack open '''Valve 5''' (rough valve) – monitor the load lock turbo's DCU display to ensure the turbo's speed doesn't get bogged down (the exhaust/foreline pressure will increase while roughing out the load lock of course).
#: ''It should be fine. --Karolis''
#: ''In case it is not fine and the turbo starts spinning down: turn loadlock pumping off and back on. If there's still a problem, repeat with Valve 4 closed. --Karolis''
#: The max foreline pressure that the turbo can handle is 10 Torr – this is only for short durations of time when roughing out after an oxidation process. Normally the foreline pressure would be ~e-3 – e-2 Torr range.
# Continue to monitor the load lock pressure as '''Valve 5''' continues to remain open while roughing.
# Once the pressure levels off after a couple minutes, you can close '''Valve 5'''.
#: ''The Baratron reading should reach 0.138 Torr while Valve 4 is open. --Karolis''
# Slowly crack open '''Valve 2''' (turbo iso valve) in order to continue pumping the load lock as normal; there will be a slight pressure differential, but well within the limits of valve operation.
#: ''It should be fine. --Karolis''
#: The Turbo iso '''Valve 2''' (or VAT Isolation valve) should not be operated with a high pressure differential. The greatest pressure differential this valve can operate is 100 mTorr. If following the example process above, this warning has already been taken into account.
# After the pressure goes down to 3e-6 Torr, you can close off '''Valve 4''' (turbo purge) from the software & also close '''Valve 3''' (soak valve). This will ensure the gas ballast returns to high vacuum before isolating.
# The load lock oxidation process is now complete. Repeat from Step 1 as necessary.

== Older ion milling notes ==
When operating normally, the chamber should light a clear whiteish hue, and the kaufman power source should read numbers similar to these:
[[Image: Milling_STDPROC.png|thumb|center|600px|Approximate standard values on power supply when running the milling]]<BR>

====Miscellaneous notes / values for milling ====
Please update this list with good tips / mill rates for materials:
* The approximate mill rate for '''InSb heterostructure is 15 nm/min'''. It is advised to tilt the sample to 30 degrees and use 30 speed on the rotating engine. This gives a cleaner and more smooth surface.

* '''Photolith AZ1505''' millrate is approximately '''15nm/min''' (at angle 30 degrees).

== '''Troubleshooting''' ==

; No rate?
:* E-beam shutter open?
:* Correct material selected on deposition controller?
:* Enough current?
:* Beam in center of crucible and hitting the material?
:* Enough material in crucible?

; Rate falling during deposition?
: Material running out. Needs top-up.

; Crucible drive getting stuck?
:* Drive support shafts worn + linear bearings gunked up. Replace
:** Protect by wiping with IPA
:** and covering with Al foil
:* Crucible liner sideways. Abort and open system.

; Can't turn on HV on remote emission controller?
:* Clear yellow error
:* Make sure power supply is on
:* Reconnect the controller cable
:*: Login as service: "2013"
:*: Adjust max emission so that 1% = 2.0/2.5 mA

; Can't adjust current?
:* Left in auto mode. Change back to manual
:* Emission knob encoder broken. Send back to factory to repair/replace.

; Red LED on loadlock gauge?
: Power cycle should fix it during next vent/pump.

; Lots of reflected power for an RF power source?
:* The matching network for RF3 on AJA2 sometimes needs a bigger kick.
:** Try turning on the power without ramping it.
:** Another option would be to set the matching network to manual mode and strike the plasma, then turn it back to manual mode.
:* The RF1 cable in the red shroud on AJA2 sometimes gets loose:
:*: Abort process, turn off RF milling power supply, reconnect cable, tighten as much as possible.
:* The RF1 power supply controls are very sensitive, maybe someone touched them?
:*: Extremely slowly adjust Load to reach minimum of reflected power. If not 0 W, adust Tune. Iterate until 0 W.

; Recipes failing when adjusting gas flow?
: Adjust MFC timeout to 30 s
:: user: service

; Software empty?
: Fill in with parameters from OneNote or the [[AJA_systems#Special_notes|special notes]].
:: user: apex

== Maintenance ==

=== Standard maintenance ===

# Log cryo temp, base pressure.
# Close cryo gate valve.
# Turn off ion gauge.
# Open loadlock gate valve.
# Turn off loadlock turbo.
#: While venting:
#* Unscrew right port with the linear crucible drive using two 9/16" wrenches.
#* Unscrew lid if you intend to open it.
#* Above 1e0 Torr loadlock pressure slowly open the vent nitrogen needle valve in front of the chamber.
# At atmosphere: start stopwatch.
# Pull out right port, open e-beam shutter.
# For each crucible:
#* Wipe target metal surface with wipe
#* Weigh with digital scale
#** W crucible weighs ~120 g
#** Intermetallic crucible ~20 g
#** FabMate crucible ~12 g
#** Gold pellets <80 g, 40-45 g for half
#** Al pellets 6-7 g
#** Top up target material if needed, log amount.
# If Sensor Life < 70% change the QCM. You can do this by sticking your hand through the loadlock. Be careful not to touch the mirror.
#* AJA1: gold plated 6 MHz. There are two. Sensor 2 is towards the end of the assembly. It is a bit tricky to get out, even with the sensor shutter open.
#* AJA2: silver plated 6 MHz (doesn't fail immediately during Pt evaporation)
# Push the linear drive back inside, screw the nuts back on the bolts
# Check if you can see the crucible in the mirror. If not:
## Attach chain to only one lid hook. Pull with ceiling motor for 20 mins
## Once the lid is open then lower the lid and lift with all three hooks
## Check if the quarter silicon wafer has started to delaminate. If so, peel off and reuse if possible. If it is not reflective enough, replace with clean quarter wafer.
## Adjust the clamp holding the mirror so that you can see the crucible through the port with LED light.
## Close lid, do not tighten screws/nuts
# Start pumping, log time at atmosphere, tighten the nuts on the crucible linear drive
# Close vent needle valve (not too tight!)
# If loadlock pressure goes below 1e-1 Torr, there are no obvious leaks
# After 30-60 mins check pressure. If <1e-4 Torr, turn on ion gauge
# Open cryo gate valve at own discretion. Turbo helps pumping down to ~1e-6 Torr. At lower pressures loadlock gate valve should be closed and only cryo should be open to the main chamber.
# Write a message to the users!

=== Cryo pump regeneration ===

# Close cryo VAT valve ( Adaptive pressure controller ) .
# Open the loadloack valve.
# Open Turbo is pumping the main chamber
# Turn off cryo (on the wall behind the tool). Just press and release switch .
# Open nitrogen vent valve on the back left of the cryo.
# Let warm to max T (~285 K), takes ~1 hour
# Close nitrogen vent valve
# Close roughing pump to turbo (screw valve under the loadlock turbo)
# Open roughing to cryo (screw valve next to cryo)
# Wait 20 mins to rough pump cryo
# Open roughing to turbo
# Turn on cryo ( wall switch) . Please check compressor as well .
# Wait ~60 mins to get between 200-150 K
# Close roughing to cryo
# Wait until min T. Must be below 20 K (2-3 hours at 2 K/min)
#: If does not go down below 20 K, replace cryo with spare unit. Return cryo for repair/refurb to Edwards Vacuum. Contacts on the [https://wiki.nbi.ku.dk/qdevwiki/AJA_Systems internal QDev wiki]
# Close loadlock
# Open cryo VAT valve

=== Special notes ===
The standard Phase II J software onfigurations on the systems are:



'''AJA1'''
[[Image:Aja1setup.jpg|600px|standard config AJA1]]

'''AJA2'''
[[Image:Aja2setup.jpg|600px|standard config AJA2]]

* If you are unable to ignite the plasma (either DC, RF or ion plasma) start by checking for shorts between pins on the powersupply input on the sputtering arm / ion source.

==Service/repair/purchasing==
More notes and service/repair/purchasing contacts on the [https://wiki.nbi.ku.dk/qdevwiki/AJA_Systems internal QDev wiki].
== Remote access ==
* TeamViewer: FILM
* LogMeIn: FILM AJA
[[Category:Tools]]
[[Category:Deposition]]

AJA systems

2026-04-28T09:41:57Z

Harry: /* Currently loaded materials */

{{Infobox tool
|image = Tool AJA2.jpg
|toolfullname = AJA Orion
|website = http://www.ajaint.com/atc-orion-series-sputtering-systems.html
|company = AJA INTERNATIONAL INC.
|description = Thin film deposition and milling systems
|location = 03.2.218
|primary = Harry
|secondary = Martin
}}
''Page last updated: 11 Nov 2025''

There are two AJA Orion physical vapor deposition (PVD) systems at the [[Main Page|NBI cleanroom]].
They both have 2" magnetron sputtering and electron beam evaporation capabilities, as well as some form of substrate milling/sputtering.
Most users utilize the tools for thin film metal deposition and substrate surface cleaning.

Other deposition tools at the [[Main Page|NBI cleanroom]]:
* Metal PVD:
** [[E-Gun evaporator]]
** [[Edwards evaporator|Edwards thermal evaporator]]
** [[Leica sputter coater]]
* Oxide ALD:
** [[Cambridge ALD]]
* III-V growth:
** [[MBE]]

== Overview ==

Systems 1 and 2 are identical in terms of operating procedures. The password for logging in is ''apex''.

They differ slightly in their outfitting:
* System 1: Two 2" DC sputtering targets, Kaufman ion source for cleaning. Mechanically clamped to the loading arm and magnetically clamped to the rotating stage inside. Oxidation chamber on the loadlock.
* System 2: One regular 2" DC sputtering target, one 3" DC sputtering target with adjustable working distance, one 2" RF sputtering target, and an RF supply to the stage for substrate sputtering (ion milling). Mechanically clamped to the loading arm as well as the stage inside the chamber. Stage water cooling (same 19°C chiller circuit as for magnetrons and e-beam crucibles). Stray electrons on the near side are stopped by an extra static shutter, magnetically steered away on the far side.

Systems 1 and 2 are expected to at least reach a vacuum of about 2x10<sup>-8</sup> Torr and 6x10<sup>-8</sup> Torr (respectively) after pumping for 24 hours on the main chamber from atmosphere.
The chamber vacuum is monitored periodically by shutting the cryo-valve and recording the rise of pressure rise for 10 mins. The ''rate-of-rise'' history is provided here [link].

== Currently loaded materials ==

The materials currently available for deposition are as follows (updated 2024 July 2):

{|
|-
|
{| class="wikitable"
|-
! AJA1 !! Material !! Liner !! Thickness limit
|-
| 1 || Al || Intermetallic ||
|-
| 2 || Ti1 || Fabmate ||
|-
| 3 || SiOx || Tungsten ||
|-
| 4 || Au2 || Tungsten ||
|-
| 5 || Ge || Fabmate ||
|-
| 6 || Pt || FabMate || 200 nm*
|-
| DC1 || W || -- ||
|-
| DC2 || Nb<sub>2</sub>Ti || -- ||
|-
|}
|
<span style="display:inline-block; width: 20px;"></span>
|
{| class="wikitable"
|-
! AJA2 !! Material !! Liner !! Thickness limit
|-
| 1 || Pt || Tungsten || 200 nm*
|-
| 2 || Au2 || FabMate ||
|-
| 3 || Al || Intermetallic ||
|-
| 4 || Ti || intermetallic ||
|-
| 5 || Pd || FabMate ||
|-
| 6 || Cr || FabMate ||
|-
| DC1 || Ti || -- ||
|-
| RF2 || Mo || -- ||
|-
| RF3
| Nb<sub>2</sub>Ti || -- ||
|-
|}
|-
|}

Notes:
* If you need to deposit a thicker layer, you need to book enough time for the cryo pump to reach base temperature before continuing with a second layer.
* When you make a booking, you have to select if your deposition includes gold. If yes, you will be asked to fill out the total Au thickness you plan to deposit.
=== Other available materials ===
'''Evaporation''': SiO<sub>2</sub>, MgB<sub>2</sub>, SiGe (p-doped), Ta, Nb, Pd, W
'''Sputtering''': Nb<sub>2</sub>Ti<sub>1</sub>, Cu, InSb, Bi, Ti, Re, Mo, Ni, Si<sub>3</sub>N<sub>4</sub>, Ta, Nb<sub>4</sub>Ti<sub>1</sub>, Nb

There is a big compatibility chart next to the prep bench behing AJA1.
For each deposition material it lists a compatible evaporation crucible material, and a compatible sputtering power mode.

The chart is also available [https://www.lesker.com/newweb/deposition_materials/materialdepositionchart.cfm online].

== '''Step by step guide''' ==

Various procedures on the system are shown in the video and in a step by step guide below:

[[File:AJA_load_movie.mp4|500px]]

[https://youtu.be/irRtsm70ggU Click here to watch the video on YouTube]

([[Media:How_to_Evaporate_metal_in_AJA1.pdf|An illustrated guide for new users by Mingtang]]. A physical copy of the same lies by the tool. It is a bit outdated but may help you remember some steps)

===Loading your sample===
* Check the cryo-pump monitor. It should be between 12-17 K. If it's higher than 20 K, grab a tool responsible or a technical staff member.
* Check that the turbo frequency is 1500 Hz. The turbo pumps on the load lock.
* Check that the pressure in the main chamber (ion gauge sensor) is <1x10<sup>-7</sup> Torr. '''Log this value.'''
* Check that the load lock gate valve (connects the load lock to the main chamber) is closed.
* Push down the 'Load Lock' switch in order to vent the load lock.
* Once the load lock pressure reaches ~760 Torr, the load lock lid pops out a bit and can be rotated freely.
** Do not apply force and pull the load lock lid out. The load lock may not be vented yet.
* Rotate the lid until the permanent markers meet and twist the lid out, pivoting about the two permanent marks on the left.
** The permanent marks indicate the position of spring loaded ball bearing that hold the lid in place, preventing it from falling out.
** Ideally, you want rotate the lid so as to pivot against two bearings.
* Place the load lock lid, handle up, on the three rubber bumps.
* Remove the sample holder. It's held in place by three pins that lock into a groove.
* Grab a fresh cleanroom wipe, place the sample holder on the wipe.
*; Important note for AJA2:
*: If your entire process ends with Au deposition, use the dedicated Au sample holder. If your process ends with anything else, use the generic sample holder. This ensures that the surface on the Au sample holder remains consistent. This is important for RF substrate milling.
* Load your chip either using the mechanical clamps or the double sided Kapton tape.
* Load the sample holder inside the load lock, rotate the holder to confirm all three pins are locked in place, replace the lid and flick the 'load lock' switch up to pump out.
* Wait until the chamber pressure goes down to 3x10<sup>-6</sup> Torr. This can take 5-30 minutes, depending on your sample. The turbo will have revved up to 1500 Hz by now. Confirm this.
* Open the gate valve between the main chamber and the load lock.
* Load your sample.
** AJA1: You should feel the magnetic pull when the sample holder is close enough to the stage to be coupled. Then unlock the loading arm from the sample holder and retract the arm.
** AJA2: Screw in the sample holder into the stage.
** Take note of the sample holder orientation on the stage as well as the rotation/orientation of the loading arm. In principle, you should unload using the same orientation as this will be the easiest.
* Close the load lock valve.
** Check main chamber vacuum.
** Check cryo pump temperature.

===Evaporating metal===
* Rotate the stage to face the crucible liners.
* Choose the material on the linear crucible drive as well as on the deposition controller.
* Open the e-beam shutter by flicking the physical e-beam shutter switch to open.
** This exposes the metal to be evaporated.
** If you don't open this shutter, the accelerated focused electron beam will hit the shutter instead of the metal and drill a hole through it!
* Switch on the Carrera Ferro Tec high voltage power supply. The switch is green and is labelled 'Main'.
* Turn on the high voltage on the hand remote. It sets the beam acceleration voltage to 10 kV. This is fixed and cannot be changed by the users.
** Be very sure that you have opened the e-beam shutter.
* Two clicks of the knob and the current set point is set to 4 mA (AJA2) or 5 mA (AJA1).
** Wait until the current increases to this value.
* Can you see the bright spot where the beam hits the metal in the crucible?
** Center the beam and make sure the beam is <del>neither too focused nor too defocused</del> not sweeping (unless required for some materials).
* Now, consult the Excel log sheet to determine the typical current needed to get a finite evaporation rate.
* Ramp the current up at about 20 mA/min to half the value (1 click/10 seconds). Let it sit at that value for 2 mins while the metal soaks and thermally equilibriates.
** Too fast and you'll crack the crucible liner
** or your evaporated metal film will be rough.
* 1 Å/s is a good rate for metal film evaporation. Try and stay around this value. 2 Å/s for gold is okay.
* When you are ready to evaporate, zero the counter on the deposition controller and open the sample shutter.
** The shutter takes about 1-2 secs to open, so you don't have to be paranoid about synchronizing the zero with the shutter opening.
* Wait until the right thickness is evaporated.
* Close the substrate shutter.
* Ramp the beam down to 0 in a period of a couple of minutes (1 click/10 seconds). Don't be too quick about it. We want the metal and the liner to cool down slowly to stop the liner from cracking due to thermal stress.
* Turn off high voltage.
* Wait 2-3 mins for the metal to cool down before moving over to the next metal. The metal inside the crucible should stop glowing.
* If you're done, turn off the Carrera voltage supply.
* Close the e-beam shutter if the metal is no longer red hot.

===Unloading your sample===
* Rotate the sample to the correct position (same orientation as during the loading procedure).
* Open the load lock gate valve, and unload your sample.
* Close the load lock valve.
* Vent the load lock using the load lock switch on the main rack.
* As before, wait till the load lock reaches ~760 Torr and pops out a bit.
* Twist and pull the lid out if the permanent marks are lined up.
* Rest the lid on rubber knobs, handle up.
* Fresh cleanroom wipe!
* Get the sample cassette out, unload your sample.
** If you used double sided tape, wipe off the residue with IPA or ethanol.
* Put the sample cassette back and pump out the load lock.
* Fill out the Excel log file.
* Clean up after yourself. If the work station is found untidy, the last user will be held accountable.

===Using the Kaufman ion source (ion milling)===
* Load your sample via the load lock following the procedure detailed above.
* Rotate the sample to face the ion milling gun.
* Turn off the ion gauge (pressure gauge).
* On the laptop, make sure the PhaseIIJ program is running. If not, start it up.
** The password: apex
* Set the adaptive pressure controller to 'Remote'.
** It's a 3 sec long press.
* In the program, click on the ion gas button. It should turn green. This diverts the Ar gas flow to the gun.
* Turn on the Ar flow and set the 'STPT' (set point) to an appropriate value.
** Look at the Excel log files to select a relevant set of values for the flow. The flow roughly sets the base Ar pressure in the chamber.
* Select 'Pressure' button and enter a value:
** Again, the Excel log files should guide you in selecting an appropriate value. Typically, a flow of 6 sccm and a pressure of 0.6 mbar works nicely.
** The program floors the entered value to a single digit precision. 0.61 will become 0.6. 0.6 sometimes becomes 0.5. I just live with this minor annoyance.
* A PID controlled gate valve between the cryo pump and the chamber will adjust so that the Ar pressure in the chamber matches the set point. You'll hear the valve adjusting when you set the controller to remote. On the adaptive pressure controller display look at the 'SP' and the 'P1'. These should match the value that you want and keyed into the PhaseIIJ program.
* Turn on the Kaufman ion source controller power supply.
* Set the power supply to remote mode.

* On the PC at the prep table there are several shortcuts to scripts.
# Execute the relevant beam voltage script (100 V or 300 V). Confirm the settings are reflected on the power supply.
# Execute the discharge script: enter the desired discharge time in seconds and press ENTER.

* Go back to the laptop.
* Click on the small 'output' button to turn on the gun.
** This fires the Ar ions. The ion source shutter still protects your sample.
* Wait for the indicator to turn purple.
* Start your timer and open the shutter with the big 'shutter' button.
* You are now milling.

* To turn off the Kaufman ion source click the green output button. It should turn red.
* Wait 2 mins for the gun to cool down. Do NOT turn off the Ar yet.
* In the pressure control section of the PhaseIIJ software click 'Open' to completely open the cryo gate valve and pump the Ar out.
* Turn off the Ar gas flow.
* Turn off the Kaufman source controller.
* Set the adaptive pressure controller to local.
* Turn on the ion gauge (pressure sensor).
* Proceed with evaporating metal or unloading your sample following the guidelines.

===Sputtering metals===
* Load your sample via the load lock following the procedure detailed above
* Turn off the ion gauge (pressure gauge).
* On the laptop, make sure the PhaseIIJ programs is running.
** If not start it up. The password:apex
* Set the adaptive pressure controller to 'Remote'
** It's a 3 sec long press.
* info: Finer control over the Ar pressure in the chamber is achieved by selecting 'Pressure' button and entering a value.
* info: In the program, turn on the Ar flow and set the 'STPT' (set point) to an appropriate value.
** Look at the Excel log files to select a relevant set of values for the flow. The flow roughly sets the base Ar pressure in the chamber.
* info: Finer control over the Ar pressure in the chamber is achieved by selecting 'Pressure' button and entering a value.
** Again, the Excel log files should guide you in selecting an appropriate value.
** The program floors the entered value to a single digit precision. 0.61 will become 0.6. 0.6 sometimes becomes 0.5. I just live with this minor annoyance.
* info: A PID controlled gate valve between the cryo pump and the chamber will adjust so that the Ar pressure in the chamber matches the set point. You'll hear the valve adjusting when you set the controller to remote. On the adaptive pressure controller display look at the 'SP' and the 'P1'. These should match the value that you want and keyed into the phaseIIJ program.
* Rotate the sample to face downwards.
** The sputter sources are angled a bit and 10-20 degree might give you a more head on sputtering.
* Power up the relevant sputtering source power unit.

====Auto====
* Click Run process
* Scroll down to and select your desired sputtering recipe
* Run

====Manual====
* Striking the plasma:
** Open the substrate shutter. The sputter sources have individual shutters.
** Set the Ar flow to 80 sccm and pressure to 30 mTorr.
** Set the power stpt to 50 W and turn on the output.
** Once the plasma ignites, the pressure can be lowered to 2-4 mTorr and flow to 20 sccm.
** Check that the plasma is visible (a faint purple blueish hue inside the main chamber).
** There is a little pink indicator in the software that should light up in the control software congruent with when the plasma is visible in the chamber.
* Ramping: Enter the ramp time first and '''then''' the new set point such that the ramp rate is 1 W/s. Hit enter or click away after entering the new set point.
** Entering the new set point before entering the ramp time will result in the system jumping to the set point in one step. This will cause rapid heating and will break the sputter housing.
** Close the viewport shutter, since they will get covered with the sputtered film.
** Once the desired set point is reached, open the sputter shutter and start the timer.
* Ramping down:
** Enter the ramp down time and THEN the set point of 50 W.
** Once the system ramps down to 50 W, turn off the output.
* Open the adaptive pressure controller by clicking on 'Open' in the software.
** This opens up the cryo valve to max.
* Turn off the Ar gas flow.

For safe operation of the RF ALWAYS enter a ramp rate such that the RF circuitry never ramps faster than 1W/second. Enter ramp rate BEFORE changing wattage!

====After either Auto or Manual====
* Set the adaptive pressure controller to local
* Turn on the ion gauge
* Carry on with other steps such as metallization, unloading, etc as outlined above.

===Substrate sputtering (RF)===
* Load your sample via the load lock following the procedure detailed above
* Turn off the ion gauge (pressure gauge).
* On the laptop, make sure the PhaseIIJ programs is running.
** If not start it up. The password:apex
* Set the adaptive pressure controller to 'Remote'
** It's a 3 sec long press.
* Rotate the sample to face downwards.
* Power up the relevant sputtering source power unit.
====Auto====
* Select run process
* Scroll down to the desired program
* Run
====Manual====
* Striking the plasma:
** Set the Ar flow to 80 sccm and pressure to 30 mTorr.
<div class="toccolours">
Info:

A PID controlled gate valve between the cryo pump and the chamber will adjust so that the Ar pressure in the chamber matches the set point. You'll hear the valve adjusting when you set the controller to remote. On the adaptive pressure controller display look at the 'SP' and the 'P1'. These should match the value that you want and keyed into the phaseIIJ program.

The program floors the entered pressure set point value to a single digit precision. 0.61 will become 0.6. 0.6 sometimes becomes 0.5. I just live with this minor annoyance.
</div>
* Striking the plasma (contd.):
** Set the RF1 stpt to 25 W and turn on the output.
** Once the plasma ignites, the pressure can be lowered to 2-4 mTorr and flow to 20 sccm.
** Check that the plasma is visible (a faint purple blueish hue inside the main chamber).
** There is a little pink indicator in the software that should light up in the control software congruent with when the plasma is visible in the chamber.
* Ramping: Enter the ramp time first and '''then''' the new set point such that the ramp rate is 1 W/s. Hit enter or click away after entering the new set point.
** Max set pt is 50 W
** Entering the new set point before entering the ramp time will result in the system jumping to the set point in one step. This will cause rapid heating.
** Close the viewport shutter.
** Once the desired set point is reached start the timer.
* Ramping down:
** Enter the ramp down time and THEN the set point of 25 W.
** Once the system ramps down to 25 W, turn off the output.
* Open the adaptive pressure controller by clicking on 'Open'.
** This opens up the cryo valve to max.
* Turn off the Ar gas flow.

====After Auto or Manual====
* Set the adaptive pressure controller to local
* Turn on the ion gauge
* Turn off the RF power source
* Carry on with other steps such as metalization, unloading, etc as outlined above.

=== Oxidation in loadlock ===

The process is set up for ~10 Torr. In practice it should be between 9.8-10.0 Torr (see log sheet).

[[Media:Oxidation upgrade.xlsx|Data gathered during initial testing (xlsx)]]

Empirically: ''regulator_valve = (desired_pressure / 9) - 1''

The Baratron gauge only goes up to 10 Torr. Therefore this is the maximum allowed pressure for oxidation.

The gas hooked up for the process is 85% Ar / 15% O2.

Reference Figure for valve numbering.
The actual placement of the parts is slightly different, but all six valves have stickers with numbers on them.

[[Image:AJA oxidation valves.jpg]]

==== Changing the oxidation pressure ====

Consult the speadsheet describing regulator valve reading vs Baratron pressure.

Decide on the regulator valve reading you will go for.

Quick guess: ''(desired pressure in Torr / 9) - 1''

# Make sure '''Valves 1, 3, 5, 6''' are closed.
#: Make sure '''Valve 4''' is closed in the software.
# Close '''Valve 2''' (turbo iso).
#: Open '''Valve 5''' (roughing).
#: Open '''Valve 3''' (soak).
# Move behind the tool so you can comfortably reach '''Valve 1''' and the regulator valve.
# Open '''Valve 1''' (fill). The regulator valve pressure should drop about 0.05 bar.
#: Adjust the regulator valve to desired value.
#: Close '''Valve 1'''.
# Open '''Valve 4''' (turbo purge) in the software. Wait for the pressure to go down to 0.148 Torr. You can safely continue if it is lower.
# Close '''Valve 5''' (roughing).
#: Open '''Valve 2''' (turbo iso). Wait until the pressure in the loadlock is below 3e-6 Torr.
# Close '''Valve 3''' (soak).

==== Standard oxidation procedure ====

Before you start make sure that:
* The loadlock is below 3e-6 Torr and your sample is already transferred in; ready for the oxidation process.
* Gate valve to the main chamber is closed.
* '''Valves 1, 3, 5, 6''' are closed.
* '''Valve 4''' (LL tp) is closed in the software.
* '''Valve 2''' is open.
* O2/Ar gas bottle regulator valve shows a reading that will give you a desirable pressure in the loadlock. '''Log this value.''' The pressure reading is relative to ambient atmosphere.

# Open '''Valve 1''' (Fill valve) for <del>~30</del> ''a few'' seconds in order to charge the gas ballast section. You will hear the gas quickly filling the volume.
# Close '''Valve 1'''.
# Close '''Valve 2''' (Turbo Iso valve) in order to isolate the load lock volume from the turbo.
# Open '''Valve 3''' (Soak valve) in order to expose O2 gas ballast to load lock volume. '''Start a timer.'''
#: If at any point the load lock increases above 10 Torr, it is safest/best to vent the load lock up to atmospheric pressure by opening '''Valve 6''' (manual N2 vent).
#:: Do not attempt to rough out the load lock if above 10 Torr through the manual bypass '''Valve 5'''.
# Soak for desired oxidation time. '''Log the Baratron pressure''' (red LEDs at the bottom of the tool). '''Log the oxidation time.'''
#: ''This needs data feedback from the users. --Karolis''
# Open '''Valve 4''' (turbo N2 purge valve) through the ''AJA PhaseIIJ'' software to initiate the purging process.
# Once ready to rough out the load lock body, slowly crack open '''Valve 5''' (rough valve) – monitor the load lock turbo's DCU display to ensure the turbo's speed doesn't get bogged down (the exhaust/foreline pressure will increase while roughing out the load lock of course).
#: ''It should be fine. --Karolis''
#: ''In case it is not fine and the turbo starts spinning down: turn loadlock pumping off and back on. If there's still a problem, repeat with Valve 4 closed. --Karolis''
#: The max foreline pressure that the turbo can handle is 10 Torr – this is only for short durations of time when roughing out after an oxidation process. Normally the foreline pressure would be ~e-3 – e-2 Torr range.
# Continue to monitor the load lock pressure as '''Valve 5''' continues to remain open while roughing.
# Once the pressure levels off after a couple minutes, you can close '''Valve 5'''.
#: ''The Baratron reading should reach 0.138 Torr while Valve 4 is open. --Karolis''
# Slowly crack open '''Valve 2''' (turbo iso valve) in order to continue pumping the load lock as normal; there will be a slight pressure differential, but well within the limits of valve operation.
#: ''It should be fine. --Karolis''
#: The Turbo iso '''Valve 2''' (or VAT Isolation valve) should not be operated with a high pressure differential. The greatest pressure differential this valve can operate is 100 mTorr. If following the example process above, this warning has already been taken into account.
# After the pressure goes down to 3e-6 Torr, you can close off '''Valve 4''' (turbo purge) from the software & also close '''Valve 3''' (soak valve). This will ensure the gas ballast returns to high vacuum before isolating.
# The load lock oxidation process is now complete. Repeat from Step 1 as necessary.

== Older ion milling notes ==
When operating normally, the chamber should light a clear whiteish hue, and the kaufman power source should read numbers similar to these:
[[Image: Milling_STDPROC.png|thumb|center|600px|Approximate standard values on power supply when running the milling]]<BR>

====Miscellaneous notes / values for milling ====
Please update this list with good tips / mill rates for materials:
* The approximate mill rate for '''InSb heterostructure is 15 nm/min'''. It is advised to tilt the sample to 30 degrees and use 30 speed on the rotating engine. This gives a cleaner and more smooth surface.

* '''Photolith AZ1505''' millrate is approximately '''15nm/min''' (at angle 30 degrees).

== '''Troubleshooting''' ==

; No rate?
:* E-beam shutter open?
:* Correct material selected on deposition controller?
:* Enough current?
:* Beam in center of crucible and hitting the material?
:* Enough material in crucible?

; Rate falling during deposition?
: Material running out. Needs top-up.

; Crucible drive getting stuck?
:* Drive support shafts worn + linear bearings gunked up. Replace
:** Protect by wiping with IPA
:** and covering with Al foil
:* Crucible liner sideways. Abort and open system.

; Can't turn on HV on remote emission controller?
:* Clear yellow error
:* Make sure power supply is on
:* Reconnect the controller cable
:*: Login as service: "2013"
:*: Adjust max emission so that 1% = 2.0/2.5 mA

; Can't adjust current?
:* Left in auto mode. Change back to manual
:* Emission knob encoder broken. Send back to factory to repair/replace.

; Red LED on loadlock gauge?
: Power cycle should fix it during next vent/pump.

; Lots of reflected power for an RF power source?
:* The matching network for RF3 on AJA2 sometimes needs a bigger kick.
:** Try turning on the power without ramping it.
:** Another option would be to set the matching network to manual mode and strike the plasma, then turn it back to manual mode.
:* The RF1 cable in the red shroud on AJA2 sometimes gets loose:
:*: Abort process, turn off RF milling power supply, reconnect cable, tighten as much as possible.
:* The RF1 power supply controls are very sensitive, maybe someone touched them?
:*: Extremely slowly adjust Load to reach minimum of reflected power. If not 0 W, adust Tune. Iterate until 0 W.

; Recipes failing when adjusting gas flow?
: Adjust MFC timeout to 30 s
:: user: service

; Software empty?
: Fill in with parameters from OneNote or the [[AJA_systems#Special_notes|special notes]].
:: user: apex

== Maintenance ==

=== Standard maintenance ===

# Log cryo temp, base pressure.
# Close cryo gate valve.
# Turn off ion gauge.
# Open loadlock gate valve.
# Turn off loadlock turbo.
#: While venting:
#* Unscrew right port with the linear crucible drive using two 9/16" wrenches.
#* Unscrew lid if you intend to open it.
#* Above 1e0 Torr loadlock pressure slowly open the vent nitrogen needle valve in front of the chamber.
# At atmosphere: start stopwatch.
# Pull out right port, open e-beam shutter.
# For each crucible:
#* Wipe target metal surface with wipe
#* Weigh with digital scale
#** W crucible weighs ~120 g
#** Intermetallic crucible ~20 g
#** FabMate crucible ~12 g
#** Gold pellets <80 g, 40-45 g for half
#** Al pellets 6-7 g
#** Top up target material if needed, log amount.
# If Sensor Life < 70% change the QCM. You can do this by sticking your hand through the loadlock. Be careful not to touch the mirror.
#* AJA1: gold plated 6 MHz. There are two. Sensor 2 is towards the end of the assembly. It is a bit tricky to get out, even with the sensor shutter open.
#* AJA2: silver plated 6 MHz (doesn't fail immediately during Pt evaporation)
# Push the linear drive back inside, screw the nuts back on the bolts
# Check if you can see the crucible in the mirror. If not:
## Attach chain to only one lid hook. Pull with ceiling motor for 20 mins
## Once the lid is open then lower the lid and lift with all three hooks
## Check if the quarter silicon wafer has started to delaminate. If so, peel off and reuse if possible. If it is not reflective enough, replace with clean quarter wafer.
## Adjust the clamp holding the mirror so that you can see the crucible through the port with LED light.
## Close lid, do not tighten screws/nuts
# Start pumping, log time at atmosphere, tighten the nuts on the crucible linear drive
# Close vent needle valve (not too tight!)
# If loadlock pressure goes below 1e-1 Torr, there are no obvious leaks
# After 30-60 mins check pressure. If <1e-4 Torr, turn on ion gauge
# Open cryo gate valve at own discretion. Turbo helps pumping down to ~1e-6 Torr. At lower pressures loadlock gate valve should be closed and only cryo should be open to the main chamber.
# Write a message to the users!

=== Cryo pump regeneration ===

# Close cryo VAT valve ( Adaptive pressure controller ) .
# Open the loadloack valve.
# Open Turbo is pumping the main chamber
# Turn off cryo (on the wall behind the tool). Just press and release switch .
# Open nitrogen vent valve on the back left of the cryo.
# Let warm to max T (~285 K), takes ~1 hour
# Close nitrogen vent valve
# Close roughing pump to turbo (screw valve under the loadlock turbo)
# Open roughing to cryo (screw valve next to cryo)
# Wait 20 mins to rough pump cryo
# Open roughing to turbo
# Turn on cryo ( wall switch) . Please check compressor as well .
# Wait ~60 mins to get between 200-150 K
# Close roughing to cryo
# Wait until min T. Must be below 20 K (2-3 hours at 2 K/min)
#: If does not go down below 20 K, replace cryo with spare unit. Return cryo for repair/refurb to Edwards Vacuum. Contacts on the [https://wiki.nbi.ku.dk/qdevwiki/AJA_Systems internal QDev wiki]
# Close loadlock
# Open cryo VAT valve

=== Special notes ===
The standard Phase II J software onfigurations on the systems are:



'''AJA1'''
[[Image:Aja1setup.jpg|600px|standard config AJA1]]

'''AJA2'''
[[Image:Aja2setup.jpg|600px|standard config AJA2]]

* If you are unable to ignite the plasma (either DC, RF or ion plasma) start by checking for shorts between pins on the powersupply input on the sputtering arm / ion source.

==Service/repair/purchasing==
More notes and service/repair/purchasing contacts on the [https://wiki.nbi.ku.dk/qdevwiki/AJA_Systems internal QDev wiki].
== Remote access ==
* TeamViewer: FILM
* LogMeIn: FILM AJA
[[Category:Tools]]
[[Category:Deposition]]

AJA systems

2026-04-28T09:38:05Z

Harry: /* Overview */

{{Infobox tool
|image = Tool AJA2.jpg
|toolfullname = AJA Orion
|website = http://www.ajaint.com/atc-orion-series-sputtering-systems.html
|company = AJA INTERNATIONAL INC.
|description = Thin film deposition and milling systems
|location = 03.2.218
|primary = Harry
|secondary = Martin
}}
''Page last updated: 11 Nov 2025''

There are two AJA Orion physical vapor deposition (PVD) systems at the [[Main Page|NBI cleanroom]].
They both have 2" magnetron sputtering and electron beam evaporation capabilities, as well as some form of substrate milling/sputtering.
Most users utilize the tools for thin film metal deposition and substrate surface cleaning.

Other deposition tools at the [[Main Page|NBI cleanroom]]:
* Metal PVD:
** [[E-Gun evaporator]]
** [[Edwards evaporator|Edwards thermal evaporator]]
** [[Leica sputter coater]]
* Oxide ALD:
** [[Cambridge ALD]]
* III-V growth:
** [[MBE]]

== Overview ==

Systems 1 and 2 are identical in terms of operating procedures. The password for logging in is ''apex''.

They differ slightly in their outfitting:
* System 1: Two 2" DC sputtering targets, Kaufman ion source for cleaning. Mechanically clamped to the loading arm and magnetically clamped to the rotating stage inside. Oxidation chamber on the loadlock.
* System 2: One regular 2" DC sputtering target, one 3" DC sputtering target with adjustable working distance, one 2" RF sputtering target, and an RF supply to the stage for substrate sputtering (ion milling). Mechanically clamped to the loading arm as well as the stage inside the chamber. Stage water cooling (same 19°C chiller circuit as for magnetrons and e-beam crucibles). Stray electrons on the near side are stopped by an extra static shutter, magnetically steered away on the far side.

Systems 1 and 2 are expected to at least reach a vacuum of about 2x10<sup>-8</sup> Torr and 6x10<sup>-8</sup> Torr (respectively) after pumping for 24 hours on the main chamber from atmosphere.
The chamber vacuum is monitored periodically by shutting the cryo-valve and recording the rise of pressure rise for 10 mins. The ''rate-of-rise'' history is provided here [link].

== Currently loaded materials ==

The materials currently available for deposition are as follows (updated 2024 July 2):

{|
|-
|
{| class="wikitable"
|-
! AJA1 !! Material !! Liner !! Thickness limit
|-
| 1 || Al || Intermetallic ||
|-
| 2 || Ti1 || Fabmate ||
|-
| 3 || SiOx || Tungsten ||
|-
| 4 || Au2 || Tungsten ||
|-
| 5 || Ge || Fabmate ||
|-
| 6 || Pt || FabMate || 200 nm*
|-
| DC1 || W || -- ||
|-
| DC2 || Nb<sub>2</sub>Ti || -- ||
|-
|}
|
<span style="display:inline-block; width: 20px;"></span>
|
{| class="wikitable"
|-
! AJA2 !! Material !! Liner !! Thickness limit
|-
| 1 || Pt || Tungsten || 200 nm*
|-
| 2 || Au2 || FabMate ||
|-
| 3 || Al || Intermetallic ||
|-
| 4 || Ti || intermetallic ||
|-
| 5 || Pd || FabMate ||
|-
| 6 || Cr || FabMate ||
|-
| DC1 || Ti || -- ||
|-
| RF2 || Mo || -- ||
|-
| RF3
| Nb<sub>2</sub>Ti || -- ||
|-
|}
|-
|}

Note: *If you need to deposit a thicker layer, you need to book enough time for the cryo pump to reach base temperature before continuing with a second layer.

=== Other available materials ===
'''Evaporation''': SiO<sub>2</sub>, MgB<sub>2</sub>, SiGe (p-doped), Ta, Nb, Pd, W
'''Sputtering''': Nb<sub>2</sub>Ti<sub>1</sub>, Cu, InSb, Bi, Ti, Re, Mo, Ni, Si<sub>3</sub>N<sub>4</sub>, Ta, Nb<sub>4</sub>Ti<sub>1</sub>, Nb

There is a big compatibility chart next to the prep bench behing AJA1.
For each deposition material it lists a compatible evaporation crucible material, and a compatible sputtering power mode.

The chart is also available [https://www.lesker.com/newweb/deposition_materials/materialdepositionchart.cfm online].

== '''Step by step guide''' ==

Various procedures on the system are shown in the video and in a step by step guide below:

[[File:AJA_load_movie.mp4|500px]]

[https://youtu.be/irRtsm70ggU Click here to watch the video on YouTube]

([[Media:How_to_Evaporate_metal_in_AJA1.pdf|An illustrated guide for new users by Mingtang]]. A physical copy of the same lies by the tool. It is a bit outdated but may help you remember some steps)

===Loading your sample===
* Check the cryo-pump monitor. It should be between 12-17 K. If it's higher than 20 K, grab a tool responsible or a technical staff member.
* Check that the turbo frequency is 1500 Hz. The turbo pumps on the load lock.
* Check that the pressure in the main chamber (ion gauge sensor) is <1x10<sup>-7</sup> Torr. '''Log this value.'''
* Check that the load lock gate valve (connects the load lock to the main chamber) is closed.
* Push down the 'Load Lock' switch in order to vent the load lock.
* Once the load lock pressure reaches ~760 Torr, the load lock lid pops out a bit and can be rotated freely.
** Do not apply force and pull the load lock lid out. The load lock may not be vented yet.
* Rotate the lid until the permanent markers meet and twist the lid out, pivoting about the two permanent marks on the left.
** The permanent marks indicate the position of spring loaded ball bearing that hold the lid in place, preventing it from falling out.
** Ideally, you want rotate the lid so as to pivot against two bearings.
* Place the load lock lid, handle up, on the three rubber bumps.
* Remove the sample holder. It's held in place by three pins that lock into a groove.
* Grab a fresh cleanroom wipe, place the sample holder on the wipe.
*; Important note for AJA2:
*: If your entire process ends with Au deposition, use the dedicated Au sample holder. If your process ends with anything else, use the generic sample holder. This ensures that the surface on the Au sample holder remains consistent. This is important for RF substrate milling.
* Load your chip either using the mechanical clamps or the double sided Kapton tape.
* Load the sample holder inside the load lock, rotate the holder to confirm all three pins are locked in place, replace the lid and flick the 'load lock' switch up to pump out.
* Wait until the chamber pressure goes down to 3x10<sup>-6</sup> Torr. This can take 5-30 minutes, depending on your sample. The turbo will have revved up to 1500 Hz by now. Confirm this.
* Open the gate valve between the main chamber and the load lock.
* Load your sample.
** AJA1: You should feel the magnetic pull when the sample holder is close enough to the stage to be coupled. Then unlock the loading arm from the sample holder and retract the arm.
** AJA2: Screw in the sample holder into the stage.
** Take note of the sample holder orientation on the stage as well as the rotation/orientation of the loading arm. In principle, you should unload using the same orientation as this will be the easiest.
* Close the load lock valve.
** Check main chamber vacuum.
** Check cryo pump temperature.

===Evaporating metal===
* Rotate the stage to face the crucible liners.
* Choose the material on the linear crucible drive as well as on the deposition controller.
* Open the e-beam shutter by flicking the physical e-beam shutter switch to open.
** This exposes the metal to be evaporated.
** If you don't open this shutter, the accelerated focused electron beam will hit the shutter instead of the metal and drill a hole through it!
* Switch on the Carrera Ferro Tec high voltage power supply. The switch is green and is labelled 'Main'.
* Turn on the high voltage on the hand remote. It sets the beam acceleration voltage to 10 kV. This is fixed and cannot be changed by the users.
** Be very sure that you have opened the e-beam shutter.
* Two clicks of the knob and the current set point is set to 4 mA (AJA2) or 5 mA (AJA1).
** Wait until the current increases to this value.
* Can you see the bright spot where the beam hits the metal in the crucible?
** Center the beam and make sure the beam is <del>neither too focused nor too defocused</del> not sweeping (unless required for some materials).
* Now, consult the Excel log sheet to determine the typical current needed to get a finite evaporation rate.
* Ramp the current up at about 20 mA/min to half the value (1 click/10 seconds). Let it sit at that value for 2 mins while the metal soaks and thermally equilibriates.
** Too fast and you'll crack the crucible liner
** or your evaporated metal film will be rough.
* 1 Å/s is a good rate for metal film evaporation. Try and stay around this value. 2 Å/s for gold is okay.
* When you are ready to evaporate, zero the counter on the deposition controller and open the sample shutter.
** The shutter takes about 1-2 secs to open, so you don't have to be paranoid about synchronizing the zero with the shutter opening.
* Wait until the right thickness is evaporated.
* Close the substrate shutter.
* Ramp the beam down to 0 in a period of a couple of minutes (1 click/10 seconds). Don't be too quick about it. We want the metal and the liner to cool down slowly to stop the liner from cracking due to thermal stress.
* Turn off high voltage.
* Wait 2-3 mins for the metal to cool down before moving over to the next metal. The metal inside the crucible should stop glowing.
* If you're done, turn off the Carrera voltage supply.
* Close the e-beam shutter if the metal is no longer red hot.

===Unloading your sample===
* Rotate the sample to the correct position (same orientation as during the loading procedure).
* Open the load lock gate valve, and unload your sample.
* Close the load lock valve.
* Vent the load lock using the load lock switch on the main rack.
* As before, wait till the load lock reaches ~760 Torr and pops out a bit.
* Twist and pull the lid out if the permanent marks are lined up.
* Rest the lid on rubber knobs, handle up.
* Fresh cleanroom wipe!
* Get the sample cassette out, unload your sample.
** If you used double sided tape, wipe off the residue with IPA or ethanol.
* Put the sample cassette back and pump out the load lock.
* Fill out the Excel log file.
* Clean up after yourself. If the work station is found untidy, the last user will be held accountable.

===Using the Kaufman ion source (ion milling)===
* Load your sample via the load lock following the procedure detailed above.
* Rotate the sample to face the ion milling gun.
* Turn off the ion gauge (pressure gauge).
* On the laptop, make sure the PhaseIIJ program is running. If not, start it up.
** The password: apex
* Set the adaptive pressure controller to 'Remote'.
** It's a 3 sec long press.
* In the program, click on the ion gas button. It should turn green. This diverts the Ar gas flow to the gun.
* Turn on the Ar flow and set the 'STPT' (set point) to an appropriate value.
** Look at the Excel log files to select a relevant set of values for the flow. The flow roughly sets the base Ar pressure in the chamber.
* Select 'Pressure' button and enter a value:
** Again, the Excel log files should guide you in selecting an appropriate value. Typically, a flow of 6 sccm and a pressure of 0.6 mbar works nicely.
** The program floors the entered value to a single digit precision. 0.61 will become 0.6. 0.6 sometimes becomes 0.5. I just live with this minor annoyance.
* A PID controlled gate valve between the cryo pump and the chamber will adjust so that the Ar pressure in the chamber matches the set point. You'll hear the valve adjusting when you set the controller to remote. On the adaptive pressure controller display look at the 'SP' and the 'P1'. These should match the value that you want and keyed into the PhaseIIJ program.
* Turn on the Kaufman ion source controller power supply.
* Set the power supply to remote mode.

* On the PC at the prep table there are several shortcuts to scripts.
# Execute the relevant beam voltage script (100 V or 300 V). Confirm the settings are reflected on the power supply.
# Execute the discharge script: enter the desired discharge time in seconds and press ENTER.

* Go back to the laptop.
* Click on the small 'output' button to turn on the gun.
** This fires the Ar ions. The ion source shutter still protects your sample.
* Wait for the indicator to turn purple.
* Start your timer and open the shutter with the big 'shutter' button.
* You are now milling.

* To turn off the Kaufman ion source click the green output button. It should turn red.
* Wait 2 mins for the gun to cool down. Do NOT turn off the Ar yet.
* In the pressure control section of the PhaseIIJ software click 'Open' to completely open the cryo gate valve and pump the Ar out.
* Turn off the Ar gas flow.
* Turn off the Kaufman source controller.
* Set the adaptive pressure controller to local.
* Turn on the ion gauge (pressure sensor).
* Proceed with evaporating metal or unloading your sample following the guidelines.

===Sputtering metals===
* Load your sample via the load lock following the procedure detailed above
* Turn off the ion gauge (pressure gauge).
* On the laptop, make sure the PhaseIIJ programs is running.
** If not start it up. The password:apex
* Set the adaptive pressure controller to 'Remote'
** It's a 3 sec long press.
* info: Finer control over the Ar pressure in the chamber is achieved by selecting 'Pressure' button and entering a value.
* info: In the program, turn on the Ar flow and set the 'STPT' (set point) to an appropriate value.
** Look at the Excel log files to select a relevant set of values for the flow. The flow roughly sets the base Ar pressure in the chamber.
* info: Finer control over the Ar pressure in the chamber is achieved by selecting 'Pressure' button and entering a value.
** Again, the Excel log files should guide you in selecting an appropriate value.
** The program floors the entered value to a single digit precision. 0.61 will become 0.6. 0.6 sometimes becomes 0.5. I just live with this minor annoyance.
* info: A PID controlled gate valve between the cryo pump and the chamber will adjust so that the Ar pressure in the chamber matches the set point. You'll hear the valve adjusting when you set the controller to remote. On the adaptive pressure controller display look at the 'SP' and the 'P1'. These should match the value that you want and keyed into the phaseIIJ program.
* Rotate the sample to face downwards.
** The sputter sources are angled a bit and 10-20 degree might give you a more head on sputtering.
* Power up the relevant sputtering source power unit.

====Auto====
* Click Run process
* Scroll down to and select your desired sputtering recipe
* Run

====Manual====
* Striking the plasma:
** Open the substrate shutter. The sputter sources have individual shutters.
** Set the Ar flow to 80 sccm and pressure to 30 mTorr.
** Set the power stpt to 50 W and turn on the output.
** Once the plasma ignites, the pressure can be lowered to 2-4 mTorr and flow to 20 sccm.
** Check that the plasma is visible (a faint purple blueish hue inside the main chamber).
** There is a little pink indicator in the software that should light up in the control software congruent with when the plasma is visible in the chamber.
* Ramping: Enter the ramp time first and '''then''' the new set point such that the ramp rate is 1 W/s. Hit enter or click away after entering the new set point.
** Entering the new set point before entering the ramp time will result in the system jumping to the set point in one step. This will cause rapid heating and will break the sputter housing.
** Close the viewport shutter, since they will get covered with the sputtered film.
** Once the desired set point is reached, open the sputter shutter and start the timer.
* Ramping down:
** Enter the ramp down time and THEN the set point of 50 W.
** Once the system ramps down to 50 W, turn off the output.
* Open the adaptive pressure controller by clicking on 'Open' in the software.
** This opens up the cryo valve to max.
* Turn off the Ar gas flow.

For safe operation of the RF ALWAYS enter a ramp rate such that the RF circuitry never ramps faster than 1W/second. Enter ramp rate BEFORE changing wattage!

====After either Auto or Manual====
* Set the adaptive pressure controller to local
* Turn on the ion gauge
* Carry on with other steps such as metallization, unloading, etc as outlined above.

===Substrate sputtering (RF)===
* Load your sample via the load lock following the procedure detailed above
* Turn off the ion gauge (pressure gauge).
* On the laptop, make sure the PhaseIIJ programs is running.
** If not start it up. The password:apex
* Set the adaptive pressure controller to 'Remote'
** It's a 3 sec long press.
* Rotate the sample to face downwards.
* Power up the relevant sputtering source power unit.
====Auto====
* Select run process
* Scroll down to the desired program
* Run
====Manual====
* Striking the plasma:
** Set the Ar flow to 80 sccm and pressure to 30 mTorr.
<div class="toccolours">
Info:

A PID controlled gate valve between the cryo pump and the chamber will adjust so that the Ar pressure in the chamber matches the set point. You'll hear the valve adjusting when you set the controller to remote. On the adaptive pressure controller display look at the 'SP' and the 'P1'. These should match the value that you want and keyed into the phaseIIJ program.

The program floors the entered pressure set point value to a single digit precision. 0.61 will become 0.6. 0.6 sometimes becomes 0.5. I just live with this minor annoyance.
</div>
* Striking the plasma (contd.):
** Set the RF1 stpt to 25 W and turn on the output.
** Once the plasma ignites, the pressure can be lowered to 2-4 mTorr and flow to 20 sccm.
** Check that the plasma is visible (a faint purple blueish hue inside the main chamber).
** There is a little pink indicator in the software that should light up in the control software congruent with when the plasma is visible in the chamber.
* Ramping: Enter the ramp time first and '''then''' the new set point such that the ramp rate is 1 W/s. Hit enter or click away after entering the new set point.
** Max set pt is 50 W
** Entering the new set point before entering the ramp time will result in the system jumping to the set point in one step. This will cause rapid heating.
** Close the viewport shutter.
** Once the desired set point is reached start the timer.
* Ramping down:
** Enter the ramp down time and THEN the set point of 25 W.
** Once the system ramps down to 25 W, turn off the output.
* Open the adaptive pressure controller by clicking on 'Open'.
** This opens up the cryo valve to max.
* Turn off the Ar gas flow.

====After Auto or Manual====
* Set the adaptive pressure controller to local
* Turn on the ion gauge
* Turn off the RF power source
* Carry on with other steps such as metalization, unloading, etc as outlined above.

=== Oxidation in loadlock ===

The process is set up for ~10 Torr. In practice it should be between 9.8-10.0 Torr (see log sheet).

[[Media:Oxidation upgrade.xlsx|Data gathered during initial testing (xlsx)]]

Empirically: ''regulator_valve = (desired_pressure / 9) - 1''

The Baratron gauge only goes up to 10 Torr. Therefore this is the maximum allowed pressure for oxidation.

The gas hooked up for the process is 85% Ar / 15% O2.

Reference Figure for valve numbering.
The actual placement of the parts is slightly different, but all six valves have stickers with numbers on them.

[[Image:AJA oxidation valves.jpg]]

==== Changing the oxidation pressure ====

Consult the speadsheet describing regulator valve reading vs Baratron pressure.

Decide on the regulator valve reading you will go for.

Quick guess: ''(desired pressure in Torr / 9) - 1''

# Make sure '''Valves 1, 3, 5, 6''' are closed.
#: Make sure '''Valve 4''' is closed in the software.
# Close '''Valve 2''' (turbo iso).
#: Open '''Valve 5''' (roughing).
#: Open '''Valve 3''' (soak).
# Move behind the tool so you can comfortably reach '''Valve 1''' and the regulator valve.
# Open '''Valve 1''' (fill). The regulator valve pressure should drop about 0.05 bar.
#: Adjust the regulator valve to desired value.
#: Close '''Valve 1'''.
# Open '''Valve 4''' (turbo purge) in the software. Wait for the pressure to go down to 0.148 Torr. You can safely continue if it is lower.
# Close '''Valve 5''' (roughing).
#: Open '''Valve 2''' (turbo iso). Wait until the pressure in the loadlock is below 3e-6 Torr.
# Close '''Valve 3''' (soak).

==== Standard oxidation procedure ====

Before you start make sure that:
* The loadlock is below 3e-6 Torr and your sample is already transferred in; ready for the oxidation process.
* Gate valve to the main chamber is closed.
* '''Valves 1, 3, 5, 6''' are closed.
* '''Valve 4''' (LL tp) is closed in the software.
* '''Valve 2''' is open.
* O2/Ar gas bottle regulator valve shows a reading that will give you a desirable pressure in the loadlock. '''Log this value.''' The pressure reading is relative to ambient atmosphere.

# Open '''Valve 1''' (Fill valve) for <del>~30</del> ''a few'' seconds in order to charge the gas ballast section. You will hear the gas quickly filling the volume.
# Close '''Valve 1'''.
# Close '''Valve 2''' (Turbo Iso valve) in order to isolate the load lock volume from the turbo.
# Open '''Valve 3''' (Soak valve) in order to expose O2 gas ballast to load lock volume. '''Start a timer.'''
#: If at any point the load lock increases above 10 Torr, it is safest/best to vent the load lock up to atmospheric pressure by opening '''Valve 6''' (manual N2 vent).
#:: Do not attempt to rough out the load lock if above 10 Torr through the manual bypass '''Valve 5'''.
# Soak for desired oxidation time. '''Log the Baratron pressure''' (red LEDs at the bottom of the tool). '''Log the oxidation time.'''
#: ''This needs data feedback from the users. --Karolis''
# Open '''Valve 4''' (turbo N2 purge valve) through the ''AJA PhaseIIJ'' software to initiate the purging process.
# Once ready to rough out the load lock body, slowly crack open '''Valve 5''' (rough valve) – monitor the load lock turbo's DCU display to ensure the turbo's speed doesn't get bogged down (the exhaust/foreline pressure will increase while roughing out the load lock of course).
#: ''It should be fine. --Karolis''
#: ''In case it is not fine and the turbo starts spinning down: turn loadlock pumping off and back on. If there's still a problem, repeat with Valve 4 closed. --Karolis''
#: The max foreline pressure that the turbo can handle is 10 Torr – this is only for short durations of time when roughing out after an oxidation process. Normally the foreline pressure would be ~e-3 – e-2 Torr range.
# Continue to monitor the load lock pressure as '''Valve 5''' continues to remain open while roughing.
# Once the pressure levels off after a couple minutes, you can close '''Valve 5'''.
#: ''The Baratron reading should reach 0.138 Torr while Valve 4 is open. --Karolis''
# Slowly crack open '''Valve 2''' (turbo iso valve) in order to continue pumping the load lock as normal; there will be a slight pressure differential, but well within the limits of valve operation.
#: ''It should be fine. --Karolis''
#: The Turbo iso '''Valve 2''' (or VAT Isolation valve) should not be operated with a high pressure differential. The greatest pressure differential this valve can operate is 100 mTorr. If following the example process above, this warning has already been taken into account.
# After the pressure goes down to 3e-6 Torr, you can close off '''Valve 4''' (turbo purge) from the software & also close '''Valve 3''' (soak valve). This will ensure the gas ballast returns to high vacuum before isolating.
# The load lock oxidation process is now complete. Repeat from Step 1 as necessary.

== Older ion milling notes ==
When operating normally, the chamber should light a clear whiteish hue, and the kaufman power source should read numbers similar to these:
[[Image: Milling_STDPROC.png|thumb|center|600px|Approximate standard values on power supply when running the milling]]<BR>

====Miscellaneous notes / values for milling ====
Please update this list with good tips / mill rates for materials:
* The approximate mill rate for '''InSb heterostructure is 15 nm/min'''. It is advised to tilt the sample to 30 degrees and use 30 speed on the rotating engine. This gives a cleaner and more smooth surface.

* '''Photolith AZ1505''' millrate is approximately '''15nm/min''' (at angle 30 degrees).

== '''Troubleshooting''' ==

; No rate?
:* E-beam shutter open?
:* Correct material selected on deposition controller?
:* Enough current?
:* Beam in center of crucible and hitting the material?
:* Enough material in crucible?

; Rate falling during deposition?
: Material running out. Needs top-up.

; Crucible drive getting stuck?
:* Drive support shafts worn + linear bearings gunked up. Replace
:** Protect by wiping with IPA
:** and covering with Al foil
:* Crucible liner sideways. Abort and open system.

; Can't turn on HV on remote emission controller?
:* Clear yellow error
:* Make sure power supply is on
:* Reconnect the controller cable
:*: Login as service: "2013"
:*: Adjust max emission so that 1% = 2.0/2.5 mA

; Can't adjust current?
:* Left in auto mode. Change back to manual
:* Emission knob encoder broken. Send back to factory to repair/replace.

; Red LED on loadlock gauge?
: Power cycle should fix it during next vent/pump.

; Lots of reflected power for an RF power source?
:* The matching network for RF3 on AJA2 sometimes needs a bigger kick.
:** Try turning on the power without ramping it.
:** Another option would be to set the matching network to manual mode and strike the plasma, then turn it back to manual mode.
:* The RF1 cable in the red shroud on AJA2 sometimes gets loose:
:*: Abort process, turn off RF milling power supply, reconnect cable, tighten as much as possible.
:* The RF1 power supply controls are very sensitive, maybe someone touched them?
:*: Extremely slowly adjust Load to reach minimum of reflected power. If not 0 W, adust Tune. Iterate until 0 W.

; Recipes failing when adjusting gas flow?
: Adjust MFC timeout to 30 s
:: user: service

; Software empty?
: Fill in with parameters from OneNote or the [[AJA_systems#Special_notes|special notes]].
:: user: apex

== Maintenance ==

=== Standard maintenance ===

# Log cryo temp, base pressure.
# Close cryo gate valve.
# Turn off ion gauge.
# Open loadlock gate valve.
# Turn off loadlock turbo.
#: While venting:
#* Unscrew right port with the linear crucible drive using two 9/16" wrenches.
#* Unscrew lid if you intend to open it.
#* Above 1e0 Torr loadlock pressure slowly open the vent nitrogen needle valve in front of the chamber.
# At atmosphere: start stopwatch.
# Pull out right port, open e-beam shutter.
# For each crucible:
#* Wipe target metal surface with wipe
#* Weigh with digital scale
#** W crucible weighs ~120 g
#** Intermetallic crucible ~20 g
#** FabMate crucible ~12 g
#** Gold pellets <80 g, 40-45 g for half
#** Al pellets 6-7 g
#** Top up target material if needed, log amount.
# If Sensor Life < 70% change the QCM. You can do this by sticking your hand through the loadlock. Be careful not to touch the mirror.
#* AJA1: gold plated 6 MHz. There are two. Sensor 2 is towards the end of the assembly. It is a bit tricky to get out, even with the sensor shutter open.
#* AJA2: silver plated 6 MHz (doesn't fail immediately during Pt evaporation)
# Push the linear drive back inside, screw the nuts back on the bolts
# Check if you can see the crucible in the mirror. If not:
## Attach chain to only one lid hook. Pull with ceiling motor for 20 mins
## Once the lid is open then lower the lid and lift with all three hooks
## Check if the quarter silicon wafer has started to delaminate. If so, peel off and reuse if possible. If it is not reflective enough, replace with clean quarter wafer.
## Adjust the clamp holding the mirror so that you can see the crucible through the port with LED light.
## Close lid, do not tighten screws/nuts
# Start pumping, log time at atmosphere, tighten the nuts on the crucible linear drive
# Close vent needle valve (not too tight!)
# If loadlock pressure goes below 1e-1 Torr, there are no obvious leaks
# After 30-60 mins check pressure. If <1e-4 Torr, turn on ion gauge
# Open cryo gate valve at own discretion. Turbo helps pumping down to ~1e-6 Torr. At lower pressures loadlock gate valve should be closed and only cryo should be open to the main chamber.
# Write a message to the users!

=== Cryo pump regeneration ===

# Close cryo VAT valve ( Adaptive pressure controller ) .
# Open the loadloack valve.
# Open Turbo is pumping the main chamber
# Turn off cryo (on the wall behind the tool). Just press and release switch .
# Open nitrogen vent valve on the back left of the cryo.
# Let warm to max T (~285 K), takes ~1 hour
# Close nitrogen vent valve
# Close roughing pump to turbo (screw valve under the loadlock turbo)
# Open roughing to cryo (screw valve next to cryo)
# Wait 20 mins to rough pump cryo
# Open roughing to turbo
# Turn on cryo ( wall switch) . Please check compressor as well .
# Wait ~60 mins to get between 200-150 K
# Close roughing to cryo
# Wait until min T. Must be below 20 K (2-3 hours at 2 K/min)
#: If does not go down below 20 K, replace cryo with spare unit. Return cryo for repair/refurb to Edwards Vacuum. Contacts on the [https://wiki.nbi.ku.dk/qdevwiki/AJA_Systems internal QDev wiki]
# Close loadlock
# Open cryo VAT valve

=== Special notes ===
The standard Phase II J software onfigurations on the systems are:



'''AJA1'''
[[Image:Aja1setup.jpg|600px|standard config AJA1]]

'''AJA2'''
[[Image:Aja2setup.jpg|600px|standard config AJA2]]

* If you are unable to ignite the plasma (either DC, RF or ion plasma) start by checking for shorts between pins on the powersupply input on the sputtering arm / ion source.

==Service/repair/purchasing==
More notes and service/repair/purchasing contacts on the [https://wiki.nbi.ku.dk/qdevwiki/AJA_Systems internal QDev wiki].
== Remote access ==
* TeamViewer: FILM
* LogMeIn: FILM AJA
[[Category:Tools]]
[[Category:Deposition]]

Training

2026-04-17T09:59:34Z

Harry: /* Thin Film Deposition */

A prerequisite for using the cleanroom [[Tools|tools]] is that a [[About|cleanroom staff]] member has given the necessary instruction or training.
This includes basic instruments such as hotplates and microscopes.
For '''all''' training requests, please read the prerequisites below and afterwards contact [mailto:cleanroom@nbi.ku.dk cleanroom@nbi.ku.dk].
A cleanroom staff member will typically respond within one workday.
Do not contact individual staff members for training.

Once the user has completed the training, they are given booking rights in the [http://cleanroom.brickhost.com cleanroom booking system].
However, after a certain period of inactivity (typically 90 days) on a given tool, the booking rights will expire and the user will need to be retrained in order to continue using the tool.

== Cleanroom General Introduction ==

=== Cleanroom general introduction ===
Request cleanroom introduction training via [mailto:cleanroom@nbi.ku.dk cleanroom@nbi.ku.dk].
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* Name a superuser from your group who will follow you in the cleanroom 2-3 times after your training.
* Introduction training requires acceptance from all of you and typically runs from 9.30 to 15.00.
* Before training, read the safety information: https://wiki.nbi.ku.dk/cleanroom/Safety
* Typical schedule:
** 9.15-10.30: Cleanroom introduction
** Coffee break
** 10.45-12.00: Asher, spinners, and optical microscopes
** Lunch break
** 13.00-14.00: Practical information inside and outside the lab
** 14.00-15.00: Q&A and account setup
</div>
</div>

== Lithography ==

=== Elionix 7000 (100 kV) ===
Elionix 7000 training is for advanced users and requires prior cleanroom tool competency.

Contact Harry (cleanroom@nbi.ku.dk) to request training.
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==== Prerequisites ====
* You must be at least a Master student or signed up for a long term (>6 months) project to be allowed to use the tool.
* Elionix is a high level tool. Make sure you are already trained to:
** Enter the cleanroom
** Use the microscope, spinner, asher

==== Training ====
* You'll need 4 sessions to get trained on this tool.
** Session 1 ( 1 hr.) - teaches you how to load/unload the sample and how to condition the beam.
** Session 2 ( 3 hr.) - involves exposing alignment marks and test patterns (any design: preferably one half of the overlay ,so to understand alignment later ).
** Session 3 ( 3 hr.) - involves using the exposed alignment marks for marker registration and exposing the 2nd pattern (i.e. the 2nd half of the overlay pattern).
** Session 4 involves exposing a "real" pattern on a "real" chip on your own to gain access.

==== Preparation ====
Before any training slots are booked on the tool you'll need all of the following prepared:
* Shadow senior users on the tool 2-3 times.
* Chip (comfortable to handle) spin coated with resist. This chip will be used for sessions 1 & 2. Please be aware of the coating and baking parameters for the resist.
* Any test design is preferred which has marks, overlay patterns that you will use to test alignment precision between two lithography steps. A Vernier pattern is commonly used. Feel free to test your ideas. Make sure you have something for both ''x'' and ''y'' directions. If you don't know how to start, check the [[Design template for EBL]].
* Convert your design files into the Elionix exposure format .co7. This can be done using Beamer in 4th floor design computers.
* Make sure all write fields are entirely in the positive coordinate space.
* Make sure neither exposure will take longer than 60 minutes at 500 pA current and dose of 1000 uC/cm2.
</div>
</div>

=== Elionix F-125 (125 kV at QuanTech) ===
Contact Zhe Liu to arrange access and training for Elionix F-125.
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* Please contact Zhe Liu ([mailto:zhe.liu@nbi.ku.dk zhe.liu@nbi.ku.dk])
</div>
</div>

=== Heidelberg upg501 ===
Prepare your design file and coated chip before requesting Heidelberg upg501 training.
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* Have a design file ready. GDS, DXF or CIF format works fine. Make sure you are familiar with the design before your actual session.
* Have a chip spin coated with an appropriate photoresist before the training session.
** The photoresist is sensitive to white light. Use the yellow filter on the microscopes. The light source in the both scribers is white and will already expose your resist.
* What is your project alias? If unsure, contact your supervisor first.

Before the training session:
* Watch the instruction video and read the standard operating procedure on the [[Heidelberg µPG 501|Heidelberg µPG 501 tool page]], shadow the tool with your group members, and ask for a sign-off session.
</div>
</div>

== Characterization ==

=== Bruker Dimension Icon Atomic Force Microscope (AFM) ===
Contact NBI-CR staff ([mailto:cleanroom@nbi.ku.dk cleanroom@nbi.ku.dk]) to request for AFM training.
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* Have a sample ready that you want to characterize. Think about what you want to learn about the sample: step height, roughness, etc.
* Only request for training if you plan on using the tool regularly.
* Training is usually 2-3 sessions of 2-hour per session.
* Staff can also carry out user projects, subject to availability and timeframe.
</div>
</div>

=== JEOL 7800-F ===
Prepare a real sample and imaging goals before booking JEOL 7800-F training.
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* Training is usually 2-3 sessions of 2-hour per session.
* You need a chip/sample to be imaged before a session is booked.
* Be familiar with the materials on the sample to be imaged and what feature is it that is of critical interest -- something that makes or breaks your device.
* Request the training session only once you have gathered the chips and information.
* What is your project alias? If unsure, contact your supervisor first.
</div>
</div>

=== JEOL 7800-F prime (QuanTech) ===
Prepare a real sample and imaging goals before booking JEOL 7800-F Prime training.
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* Training takes about 2-3 sessions.
* You need a chip/sample to be imaged before a session is booked.
* Be familiar with the materials on the sample to be imaged and what feature is it that is of critical interest -- something that makes or breaks your device.
* Request the training session only once you have gathered the chips and information.
* What is your project alias? If unsure, contact your supervisor first.
</div>
</div>

=== Raith e-Line ===
Bring a prepared design package for sessions 1 and 2, including alignment and overlay test patterns.
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* A design (gds, dxf, cif) for sessions 1 & 2 with:
** 4 alignment crosses (find out what marks work on the tool from your sub-group).
** Something to break the symmetry so you can tell chip orientation with your bare eye.
** A pattern that you will use to test overlay (alignment between two lithography steps). A Vernier pattern is commonly used. Feel free to test your ideas.
** Something creative, somethin fun :) This is an exercise in learning CAD as well.
* What is your project alias? If unsure, contact your supervisor first.
</div>
</div>

=== Woollam alpha-SE Ellipsometer ===
Request Woollam alpha-SE Ellipsometer training via [mailto:cleanroom@nbi.ku.dk cleanroom@nbi.ku.dk].
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=== Filmetrics reflectometer ===
Contact Zhe Liu to arrange access and training for the Filmetrics reflectometer.
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* Please contact Zhe Liu ([mailto:zhe.liu@nbi.ku.dk zhe.liu@nbi.ku.dk])
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</div>

== Thin Film Deposition ==

=== PLASSYS Evaporator ===
Email your PLASSYS request with shadowing, sample, and process parameters.
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Send an email with the following info before the training can be arranged:
* The name of the person you have shadowed and the number of times you've done it.
* Confirm that you have a sample ready.
* Specify the required process parameters( material, thickness, tilt etc)
* What is your project alias? If unsure, contact your supervisor first.
==== Training ====
* You'll need 2 sessions to get trained on this tool.
** Session 1 ( 2 hr.) - teaches you how to load/unload the sample and how to run a recipe.
** Session 2 ( 2 hr.) - sign off session
</div>
</div>

=== AJA metallization, sputtering or ion milling ===
Email your training request with shadowing, sample, tool, process, and recipe details for AJA.
<div class="mw-collapsible mw-collapsed" style="border:1px solid #f0d4ac; border-left:6px solid #c77700; background:#fff8ef; border-radius:6px; margin:0.45em 0 1.0em; padding:0.55em 0.75em 0.55em;">
<div class="mw-collapsible-toggle" style="text-align:right; margin:-0.62em 0 0.25em; line-height:1;">'''Expand'''</div>
<div class="mw-collapsible-content">
Send an email with the following info before the training can be arranged:
* The name of the person you have shadowed and the number of times you've done it.
* Confirm that you have a sample ready.
* Which tool you want to use: AJA1 or AJA2?
* What process do you want to run ?
* Either the recipe name or specify the required process parameters.
* What is your project alias? If unsure, contact your supervisor first.

Before the training session:
* Watch the instruction video on how to load/unload and read the standard operating procedures on the [[AJA Systems|AJA Systems tool page]]
==== Training ====
* You'll need 2 sessions to get trained on this tool.
** Session 1 ( 2 hr.) - teaches you how to load/unload the sample and how to run a recipe.
** Session 2 ( 2 hr.) - sign off session
</div>
</div>

=== ALD 1 ===
Email your ALD 1 request with shadowing, sample, and full process details.
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<div class="mw-collapsible-toggle" style="text-align:right; margin:-0.62em 0 0.25em; line-height:1;">'''Expand'''</div>
<div class="mw-collapsible-content">
Send an email with the following info before the training can be arranged:
* The name of the person you have shadowed and the number of times you've done it.
* Confirm that you have a sample ready.
* Which tool you want to use.
* What process steps you want to run.
** Either the recipe name or all required process parameters.
** How long does the process take.
* What is your project alias? If unsure, contact your supervisor first.

Before the training session:
* Watch the instruction video(s) and read the standard operating procedure on the [[Cambridge ALD|ALD tool page]].

</div>
</div>

=== ALD 2 ===
Email your ALD 2 request with shadowing, sample, and full process details.
<div class="mw-collapsible mw-collapsed" style="border:1px solid #f0d4ac; border-left:6px solid #c77700; background:#fff8ef; border-radius:6px; margin:0.45em 0 1.0em; padding:0.55em 0.75em 0.55em;">
<div class="mw-collapsible-toggle" style="text-align:right; margin:-0.62em 0 0.25em; line-height:1;">'''Expand'''</div>
<div class="mw-collapsible-content">
Send an email with the following info before the training can be arranged:
* The name of the person you have shadowed and the number of times you've done it.
* Confirm that you have a sample ready.
* Which tool you want to use.
* What process steps you want to run.
** Either the recipe name or all required process parameters.
** How long does the process take.
* What is your project alias? If unsure, contact your supervisor first.

Before the training session:
* Watch the instruction video(s) and read the standard operating procedure on the [[Cambridge ALD|ALD tool page]].
</div>
</div>

== Packaging ==

=== F&S autobonder ===
Prepare shadowing and bonding documentation, then request F&S autobonder training.
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<div class="mw-collapsible-content">
Send an email with the following info before the training can be arranged:

* Shadow colleagues using the tool 2-3 times.
* You must have a '''chip''' for bonding.
* You must know which '''daughterboard''' you will use for bonding.
* You must know what material you use to '''mount''' the chip to the daughterboard (silver paint, PMMA or whatever is specific to your measurement).
* You must prepare a '''bonding schematic''' and have one of your team members verify that it is correct.
* What is your project alias? If unsure, contact your supervisor first.
* Read through the wiki page: https://wiki.nbi.ku.dk/cleanroom/FS_bonder
* Request a training session at this point.

Two training sessions are required to get access to the bonder:

# 3 hours: Basic bonder training and chip bonding
# 2 hours: Sign-off session
</div>
</div>

=== Manual bonder ===
Request manual bonder training via [mailto:cleanroom@nbi.ku.dk cleanroom@nbi.ku.dk].
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<div class="mw-collapsible-content">
</div>
</div>

== Miscellaneous ==

=== Micromanipulator ===
Complete group-level training first, then request a micromanipulator sign-off session.
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<div class="mw-collapsible-content">
* Please get trained within your research group first. Then request a sign-off session.
* What is your project alias? If unsure, contact your supervisor first.
</div>
</div>

[[Category:Tools]]

Training

2026-04-17T09:59:01Z

Harry: /* AJA metallization, sputtering or ion milling */

A prerequisite for using the cleanroom [[Tools|tools]] is that a [[About|cleanroom staff]] member has given the necessary instruction or training.
This includes basic instruments such as hotplates and microscopes.
For '''all''' training requests, please read the prerequisites below and afterwards contact [mailto:cleanroom@nbi.ku.dk cleanroom@nbi.ku.dk].
A cleanroom staff member will typically respond within one workday.
Do not contact individual staff members for training.

Once the user has completed the training, they are given booking rights in the [http://cleanroom.brickhost.com cleanroom booking system].
However, after a certain period of inactivity (typically 90 days) on a given tool, the booking rights will expire and the user will need to be retrained in order to continue using the tool.

== Cleanroom General Introduction ==

=== Cleanroom general introduction ===
Request cleanroom introduction training via [mailto:cleanroom@nbi.ku.dk cleanroom@nbi.ku.dk].
<div class="mw-collapsible mw-collapsed" style="border:1px solid #d8dde3; border-left:6px solid #72777d; background:#f8f9fa; border-radius:6px; margin:0.45em 0 1.0em; padding:0.55em 0.75em 0.55em;">
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<div class="mw-collapsible-content">
* Name a superuser from your group who will follow you in the cleanroom 2-3 times after your training.
* Introduction training requires acceptance from all of you and typically runs from 9.30 to 15.00.
* Before training, read the safety information: https://wiki.nbi.ku.dk/cleanroom/Safety
* Typical schedule:
** 9.15-10.30: Cleanroom introduction
** Coffee break
** 10.45-12.00: Asher, spinners, and optical microscopes
** Lunch break
** 13.00-14.00: Practical information inside and outside the lab
** 14.00-15.00: Q&A and account setup
</div>
</div>

== Lithography ==

=== Elionix 7000 (100 kV) ===
Elionix 7000 training is for advanced users and requires prior cleanroom tool competency.

Contact Harry (cleanroom@nbi.ku.dk) to request training.
<div class="mw-collapsible mw-collapsed" style="border:1px solid #b8e2d5; border-left:6px solid #14866d; background:#f2fbf8; border-radius:6px; margin:0.45em 0 1.0em; padding:0.55em 0.75em 0.55em;">
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<div class="mw-collapsible-content">
==== Prerequisites ====
* You must be at least a Master student or signed up for a long term (>6 months) project to be allowed to use the tool.
* Elionix is a high level tool. Make sure you are already trained to:
** Enter the cleanroom
** Use the microscope, spinner, asher

==== Training ====
* You'll need 4 sessions to get trained on this tool.
** Session 1 ( 1 hr.) - teaches you how to load/unload the sample and how to condition the beam.
** Session 2 ( 3 hr.) - involves exposing alignment marks and test patterns (any design: preferably one half of the overlay ,so to understand alignment later ).
** Session 3 ( 3 hr.) - involves using the exposed alignment marks for marker registration and exposing the 2nd pattern (i.e. the 2nd half of the overlay pattern).
** Session 4 involves exposing a "real" pattern on a "real" chip on your own to gain access.

==== Preparation ====
Before any training slots are booked on the tool you'll need all of the following prepared:
* Shadow senior users on the tool 2-3 times.
* Chip (comfortable to handle) spin coated with resist. This chip will be used for sessions 1 & 2. Please be aware of the coating and baking parameters for the resist.
* Any test design is preferred which has marks, overlay patterns that you will use to test alignment precision between two lithography steps. A Vernier pattern is commonly used. Feel free to test your ideas. Make sure you have something for both ''x'' and ''y'' directions. If you don't know how to start, check the [[Design template for EBL]].
* Convert your design files into the Elionix exposure format .co7. This can be done using Beamer in 4th floor design computers.
* Make sure all write fields are entirely in the positive coordinate space.
* Make sure neither exposure will take longer than 60 minutes at 500 pA current and dose of 1000 uC/cm2.
</div>
</div>

=== Elionix F-125 (125 kV at QuanTech) ===
Contact Zhe Liu to arrange access and training for Elionix F-125.
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<div class="mw-collapsible-content">
* Please contact Zhe Liu ([mailto:zhe.liu@nbi.ku.dk zhe.liu@nbi.ku.dk])
</div>
</div>

=== Heidelberg upg501 ===
Prepare your design file and coated chip before requesting Heidelberg upg501 training.
<div class="mw-collapsible mw-collapsed" style="border:1px solid #b8e2d5; border-left:6px solid #14866d; background:#f2fbf8; border-radius:6px; margin:0.45em 0 1.0em; padding:0.55em 0.75em 0.55em;">
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<div class="mw-collapsible-content">
* Have a design file ready. GDS, DXF or CIF format works fine. Make sure you are familiar with the design before your actual session.
* Have a chip spin coated with an appropriate photoresist before the training session.
** The photoresist is sensitive to white light. Use the yellow filter on the microscopes. The light source in the both scribers is white and will already expose your resist.
* What is your project alias? If unsure, contact your supervisor first.

Before the training session:
* Watch the instruction video and read the standard operating procedure on the [[Heidelberg µPG 501|Heidelberg µPG 501 tool page]], shadow the tool with your group members, and ask for a sign-off session.
</div>
</div>

== Characterization ==

=== Bruker Dimension Icon Atomic Force Microscope (AFM) ===
Contact NBI-CR staff ([mailto:cleanroom@nbi.ku.dk cleanroom@nbi.ku.dk]) to request for AFM training.
<div class="mw-collapsible mw-collapsed" style="border:1px solid #c9ddf8; border-left:6px solid #3366cc; background:#f5f9ff; border-radius:6px; margin:0.45em 0 1.0em; padding:0.55em 0.75em 0.55em;">
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<div class="mw-collapsible-content">
* Have a sample ready that you want to characterize. Think about what you want to learn about the sample: step height, roughness, etc.
* Only request for training if you plan on using the tool regularly.
* Training is usually 2-3 sessions of 2-hour per session.
</div>
</div>

=== JEOL 7800-F ===
Prepare a real sample and imaging goals before booking JEOL 7800-F training.
<div class="mw-collapsible mw-collapsed" style="border:1px solid #b7e1c1; border-left:6px solid #2a9d5b; background:#f2fbf5; border-radius:6px; margin:0.45em 0 1.0em; padding:0.55em 0.75em 0.55em;">
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<div class="mw-collapsible-content">
* Training is usually 2-3 sessions of 2-hour per session.
* You need a chip/sample to be imaged before a session is booked.
* Be familiar with the materials on the sample to be imaged and what feature is it that is of critical interest -- something that makes or breaks your device.
* Request the training session only once you have gathered the chips and information.
* What is your project alias? If unsure, contact your supervisor first.
</div>
</div>

=== JEOL 7800-F prime (QuanTech) ===
Prepare a real sample and imaging goals before booking JEOL 7800-F Prime training.
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<div class="mw-collapsible-toggle" style="text-align:right; margin:-0.62em 0 0.25em; line-height:1;">'''Expand'''</div>
<div class="mw-collapsible-content">
* Training takes about 2-3 sessions.
* You need a chip/sample to be imaged before a session is booked.
* Be familiar with the materials on the sample to be imaged and what feature is it that is of critical interest -- something that makes or breaks your device.
* Request the training session only once you have gathered the chips and information.
* What is your project alias? If unsure, contact your supervisor first.
</div>
</div>

=== Raith e-Line ===
Bring a prepared design package for sessions 1 and 2, including alignment and overlay test patterns.
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<div class="mw-collapsible-content">
* A design (gds, dxf, cif) for sessions 1 & 2 with:
** 4 alignment crosses (find out what marks work on the tool from your sub-group).
** Something to break the symmetry so you can tell chip orientation with your bare eye.
** A pattern that you will use to test overlay (alignment between two lithography steps). A Vernier pattern is commonly used. Feel free to test your ideas.
** Something creative, somethin fun :) This is an exercise in learning CAD as well.
* What is your project alias? If unsure, contact your supervisor first.
</div>
</div>

=== Woollam alpha-SE Ellipsometer ===
Request Woollam alpha-SE Ellipsometer training via [mailto:cleanroom@nbi.ku.dk cleanroom@nbi.ku.dk].
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<div class="mw-collapsible-content">
</div>
</div>

=== Filmetrics reflectometer ===
Contact Zhe Liu to arrange access and training for the Filmetrics reflectometer.
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<div class="mw-collapsible-content">
* Please contact Zhe Liu ([mailto:zhe.liu@nbi.ku.dk zhe.liu@nbi.ku.dk])
</div>
</div>

== Thin Film Deposition ==

=== PLASSYS Evaporator ===
Email your PLASSYS request with shadowing, sample, and process parameters.
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<div class="mw-collapsible-content">
Send an email with the following info before the training can be arranged:
* The name of the person you have shadowed and the number of times you've done it.
* Confirm that you have a sample ready.
* Specify the required process parameters( material, thickness, tilt etc)
* What is your project alias? If unsure, contact your supervisor first.
==== Training ====
* You'll need 2 sessions to get trained on this tool.
** Session 1 ( 2 hr.) - teaches you how to load/unload the sample and how to run a recipe.
** Session 2 ( 2 hr.) - sign off session
</div>
</div>

=== AJA metallization, sputtering or ion milling ===
Email your training request with shadowing, sample, tool, process, and recipe details for AJA.
<div class="mw-collapsible mw-collapsed" style="border:1px solid #f0d4ac; border-left:6px solid #c77700; background:#fff8ef; border-radius:6px; margin:0.45em 0 1.0em; padding:0.55em 0.75em 0.55em;">
<div class="mw-collapsible-toggle" style="text-align:right; margin:-0.62em 0 0.25em; line-height:1;">'''Expand'''</div>
<div class="mw-collapsible-content">
Send an email with the following info before the training can be arranged:
* The name of the person you have shadowed and the number of times you've done it.
* Confirm that you have a sample ready.
* Which tool you want to use: AJA1 or AJA2?
* What process do you want to run ?
* Either the recipe name or specify the required process parameters.
* What is your project alias? If unsure, contact your supervisor first.

Before the training session:
* Watch the instruction video on how to load/unload and read the standard operating procedures on the [[AJA Systems|AJA Systems tool page]]
==== Training ====
* You'll need 2 sessions to get trained on this tool.
** Session 1 ( 2 hr.) - teaches you how to load/unload the sample and how to run a recipe.
** Session 2 ( 2 hr.) - sign off session
</div>
</div>

=== ALD 1 ===
Email your ALD 1 request with shadowing, sample, and full process details.
<div class="mw-collapsible mw-collapsed" style="border:1px solid #f0d4ac; border-left:6px solid #c77700; background:#fff8ef; border-radius:6px; margin:0.45em 0 1.0em; padding:0.55em 0.75em 0.55em;">
<div class="mw-collapsible-toggle" style="text-align:right; margin:-0.62em 0 0.25em; line-height:1;">'''Expand'''</div>
<div class="mw-collapsible-content">
Send an email with the following info before the training can be arranged:
* The name of the person you have shadowed and the number of times you've done it.
* Confirm that you have a sample ready.
* Which tool you want to use.
* What process steps you want to run.
** Either the recipe name or all required process parameters.
** How long does the process take.
* What is your project alias? If unsure, contact your supervisor first.

Before the training session:
* Watch the instruction video(s) and read the standard operating procedure on the [[Cambridge ALD|ALD tool page]].

=== AJA metallization, sputtering or ion milling ===

</div>
</div>

=== ALD 2 ===
Email your ALD 2 request with shadowing, sample, and full process details.
<div class="mw-collapsible mw-collapsed" style="border:1px solid #f0d4ac; border-left:6px solid #c77700; background:#fff8ef; border-radius:6px; margin:0.45em 0 1.0em; padding:0.55em 0.75em 0.55em;">
<div class="mw-collapsible-toggle" style="text-align:right; margin:-0.62em 0 0.25em; line-height:1;">'''Expand'''</div>
<div class="mw-collapsible-content">
Send an email with the following info before the training can be arranged:
* The name of the person you have shadowed and the number of times you've done it.
* Confirm that you have a sample ready.
* Which tool you want to use.
* What process steps you want to run.
** Either the recipe name or all required process parameters.
** How long does the process take.
* What is your project alias? If unsure, contact your supervisor first.

Before the training session:
* Watch the instruction video(s) and read the standard operating procedure on the [[Cambridge ALD|ALD tool page]].
</div>
</div>

== Packaging ==

=== F&S autobonder ===
Prepare shadowing and bonding documentation, then request F&S autobonder training.
<div class="mw-collapsible mw-collapsed" style="border:1px solid #d9c8b7; border-left:6px solid #8b5e3c; background:#fbf6f1; border-radius:6px; margin:0.45em 0 1.0em; padding:0.55em 0.75em 0.55em;">
<div class="mw-collapsible-toggle" style="text-align:right; margin:-0.62em 0 0.25em; line-height:1;">'''Expand'''</div>
<div class="mw-collapsible-content">
Send an email with the following info before the training can be arranged:

* Shadow colleagues using the tool 2-3 times.
* You must have a '''chip''' for bonding.
* You must know which '''daughterboard''' you will use for bonding.
* You must know what material you use to '''mount''' the chip to the daughterboard (silver paint, PMMA or whatever is specific to your measurement).
* You must prepare a '''bonding schematic''' and have one of your team members verify that it is correct.
* What is your project alias? If unsure, contact your supervisor first.
* Read through the wiki page: https://wiki.nbi.ku.dk/cleanroom/FS_bonder
* Request a training session at this point.

Two training sessions are required to get access to the bonder:

# 3 hours: Basic bonder training and chip bonding
# 2 hours: Sign-off session
</div>
</div>

=== Manual bonder ===
Request manual bonder training via [mailto:cleanroom@nbi.ku.dk cleanroom@nbi.ku.dk].
<div class="mw-collapsible mw-collapsed" style="border:1px solid #d8dde3; border-left:6px solid #72777d; background:#f8f9fa; border-radius:6px; margin:0.45em 0 1.0em; padding:0.55em 0.75em 0.55em;">
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<div class="mw-collapsible-content">
</div>
</div>

== Miscellaneous ==

=== Micromanipulator ===
Complete group-level training first, then request a micromanipulator sign-off session.
<div class="mw-collapsible mw-collapsed" style="border:1px solid #d9c8b7; border-left:6px solid #8b5e3c; background:#fbf6f1; border-radius:6px; margin:0.45em 0 1.0em; padding:0.55em 0.75em 0.55em;">
<div class="mw-collapsible-toggle" style="text-align:right; margin:-0.62em 0 0.25em; line-height:1;">'''Expand'''</div>
<div class="mw-collapsible-content">
* Please get trained within your research group first. Then request a sign-off session.
* What is your project alias? If unsure, contact your supervisor first.
</div>
</div>

[[Category:Tools]]

Training

2026-04-17T09:57:56Z

Harry: Undo revision 2792 by Harry (talk)

A prerequisite for using the cleanroom [[Tools|tools]] is that a [[About|cleanroom staff]] member has given the necessary instruction or training.
This includes basic instruments such as hotplates and microscopes.
For '''all''' training requests, please read the prerequisites below and afterwards contact [mailto:cleanroom@nbi.ku.dk cleanroom@nbi.ku.dk].
A cleanroom staff member will typically respond within one workday.
Do not contact individual staff members for training.

Once the user has completed the training, they are given booking rights in the [http://cleanroom.brickhost.com cleanroom booking system].
However, after a certain period of inactivity (typically 90 days) on a given tool, the booking rights will expire and the user will need to be retrained in order to continue using the tool.

== Cleanroom General Introduction ==

=== Cleanroom general introduction ===
Request cleanroom introduction training via [mailto:cleanroom@nbi.ku.dk cleanroom@nbi.ku.dk].
<div class="mw-collapsible mw-collapsed" style="border:1px solid #d8dde3; border-left:6px solid #72777d; background:#f8f9fa; border-radius:6px; margin:0.45em 0 1.0em; padding:0.55em 0.75em 0.55em;">
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<div class="mw-collapsible-content">
* Name a superuser from your group who will follow you in the cleanroom 2-3 times after your training.
* Introduction training requires acceptance from all of you and typically runs from 9.30 to 15.00.
* Before training, read the safety information: https://wiki.nbi.ku.dk/cleanroom/Safety
* Typical schedule:
** 9.15-10.30: Cleanroom introduction
** Coffee break
** 10.45-12.00: Asher, spinners, and optical microscopes
** Lunch break
** 13.00-14.00: Practical information inside and outside the lab
** 14.00-15.00: Q&A and account setup
</div>
</div>

== Lithography ==

=== Elionix 7000 (100 kV) ===
Elionix 7000 training is for advanced users and requires prior cleanroom tool competency.

Contact Harry (cleanroom@nbi.ku.dk) to request training.
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==== Prerequisites ====
* You must be at least a Master student or signed up for a long term (>6 months) project to be allowed to use the tool.
* Elionix is a high level tool. Make sure you are already trained to:
** Enter the cleanroom
** Use the microscope, spinner, asher

==== Training ====
* You'll need 4 sessions to get trained on this tool.
** Session 1 ( 1 hr.) - teaches you how to load/unload the sample and how to condition the beam.
** Session 2 ( 3 hr.) - involves exposing alignment marks and test patterns (any design: preferably one half of the overlay ,so to understand alignment later ).
** Session 3 ( 3 hr.) - involves using the exposed alignment marks for marker registration and exposing the 2nd pattern (i.e. the 2nd half of the overlay pattern).
** Session 4 involves exposing a "real" pattern on a "real" chip on your own to gain access.

==== Preparation ====
Before any training slots are booked on the tool you'll need all of the following prepared:
* Shadow senior users on the tool 2-3 times.
* Chip (comfortable to handle) spin coated with resist. This chip will be used for sessions 1 & 2. Please be aware of the coating and baking parameters for the resist.
* Any test design is preferred which has marks, overlay patterns that you will use to test alignment precision between two lithography steps. A Vernier pattern is commonly used. Feel free to test your ideas. Make sure you have something for both ''x'' and ''y'' directions. If you don't know how to start, check the [[Design template for EBL]].
* Convert your design files into the Elionix exposure format .co7. This can be done using Beamer in 4th floor design computers.
* Make sure all write fields are entirely in the positive coordinate space.
* Make sure neither exposure will take longer than 60 minutes at 500 pA current and dose of 1000 uC/cm2.
</div>
</div>

=== Elionix F-125 (125 kV at QuanTech) ===
Contact Zhe Liu to arrange access and training for Elionix F-125.
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* Please contact Zhe Liu ([mailto:zhe.liu@nbi.ku.dk zhe.liu@nbi.ku.dk])
</div>
</div>

=== Heidelberg upg501 ===
Prepare your design file and coated chip before requesting Heidelberg upg501 training.
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* Have a design file ready. GDS, DXF or CIF format works fine. Make sure you are familiar with the design before your actual session.
* Have a chip spin coated with an appropriate photoresist before the training session.
** The photoresist is sensitive to white light. Use the yellow filter on the microscopes. The light source in the both scribers is white and will already expose your resist.
* What is your project alias? If unsure, contact your supervisor first.

Before the training session:
* Watch the instruction video and read the standard operating procedure on the [[Heidelberg µPG 501|Heidelberg µPG 501 tool page]], shadow the tool with your group members, and ask for a sign-off session.
</div>
</div>

== Characterization ==

=== Bruker Dimension Icon Atomic Force Microscope (AFM) ===
Contact NBI-CR staff ([mailto:cleanroom@nbi.ku.dk cleanroom@nbi.ku.dk]) to request for AFM training.
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* Have a sample ready that you want to characterize. Think about what you want to learn about the sample: step height, roughness, etc.
* Only request for training if you plan on using the tool regularly.
* Training is usually 2-3 sessions of 2-hour per session.
</div>
</div>

=== JEOL 7800-F ===
Prepare a real sample and imaging goals before booking JEOL 7800-F training.
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* Training is usually 2-3 sessions of 2-hour per session.
* You need a chip/sample to be imaged before a session is booked.
* Be familiar with the materials on the sample to be imaged and what feature is it that is of critical interest -- something that makes or breaks your device.
* Request the training session only once you have gathered the chips and information.
* What is your project alias? If unsure, contact your supervisor first.
</div>
</div>

=== JEOL 7800-F prime (QuanTech) ===
Prepare a real sample and imaging goals before booking JEOL 7800-F Prime training.
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* Training takes about 2-3 sessions.
* You need a chip/sample to be imaged before a session is booked.
* Be familiar with the materials on the sample to be imaged and what feature is it that is of critical interest -- something that makes or breaks your device.
* Request the training session only once you have gathered the chips and information.
* What is your project alias? If unsure, contact your supervisor first.
</div>
</div>

=== Raith e-Line ===
Bring a prepared design package for sessions 1 and 2, including alignment and overlay test patterns.
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* A design (gds, dxf, cif) for sessions 1 & 2 with:
** 4 alignment crosses (find out what marks work on the tool from your sub-group).
** Something to break the symmetry so you can tell chip orientation with your bare eye.
** A pattern that you will use to test overlay (alignment between two lithography steps). A Vernier pattern is commonly used. Feel free to test your ideas.
** Something creative, somethin fun :) This is an exercise in learning CAD as well.
* What is your project alias? If unsure, contact your supervisor first.
</div>
</div>

=== Woollam alpha-SE Ellipsometer ===
Request Woollam alpha-SE Ellipsometer training via [mailto:cleanroom@nbi.ku.dk cleanroom@nbi.ku.dk].
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=== Filmetrics reflectometer ===
Contact Zhe Liu to arrange access and training for the Filmetrics reflectometer.
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* Please contact Zhe Liu ([mailto:zhe.liu@nbi.ku.dk zhe.liu@nbi.ku.dk])
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</div>

== Thin Film Deposition ==

=== PLASSYS Evaporator ===
Email your PLASSYS request with shadowing, sample, and process parameters.
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Send an email with the following info before the training can be arranged:
* The name of the person you have shadowed and the number of times you've done it.
* Confirm that you have a sample ready.
* Specify the required process parameters( material, thickness, tilt etc)
* What is your project alias? If unsure, contact your supervisor first.
==== Training ====
* You'll need 2 sessions to get trained on this tool.
** Session 1 ( 2 hr.) - teaches you how to load/unload the sample and how to run a recipe.
** Session 2 ( 2 hr.) - sign off session
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</div>

=== AJA metallization, sputtering or ion milling ===
Email your training request with shadowing, sample, tool, process, and recipe details for AJA.
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Send an email with the following info before the training can be arranged:
* The name of the person you have shadowed and the number of times you've done it.
* Confirm that you have a sample ready.
* Which tool you want to use: AJA1 or AJA2?
* What process do you want to run ?
* Either the recipe name or specify the required process parameters.
* What is your project alias? If unsure, contact your supervisor first.

Before the training session:
* Watch the instruction video on how to load/unload and read the standard operating procedures on the [[AJA Systems|AJA Systems tool page]]
==== Training ====
* You'll need 2 sessions to get trained on this tool.
** Session 1 ( 2 hr.) - teaches you how to load/unload the sample and how to run a recipe.
** Session 2 ( 2 hr.) - sign off session
</div>
</div>

=== ALD 1 ===
Email your ALD 1 request with shadowing, sample, and full process details.
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Send an email with the following info before the training can be arranged:
* The name of the person you have shadowed and the number of times you've done it.
* Confirm that you have a sample ready.
* Which tool you want to use.
* What process steps you want to run.
** Either the recipe name or all required process parameters.
** How long does the process take.
* What is your project alias? If unsure, contact your supervisor first.

Before the training session:
* Watch the instruction video(s) and read the standard operating procedure on the [[Cambridge ALD|ALD tool page]].

=== AJA metallization, sputtering or ion milling ===
Email your training request with shadowing, sample, tool, process, and recipe details for AJA.
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Send an email with the following info before the training can be arranged:
* The name of the person you have shadowed and the number of times you've done it.
* Confirm that you have a sample ready.
* Which tool you want to use: AJA1 or AJA2?
* What process do you want to run ?
* Either the recipe name or specify the required process parameters.
* What is your project alias? If unsure, contact your supervisor first.

Before the training session:
* Watch the instruction video on how to load/unload and read the standard operating procedures on the [[AJA Systems|AJA Systems tool page]]

==== Training ====
* You'll need 2 sessions to get access on this tool.
** Session 1 ( 2 hr.) - teaches you how to load/unload the sample and how to run a recipe.
** Session 2 ( 2 hr.) - sign off session

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</div>

=== ALD 2 ===
Email your ALD 2 request with shadowing, sample, and full process details.
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Send an email with the following info before the training can be arranged:
* The name of the person you have shadowed and the number of times you've done it.
* Confirm that you have a sample ready.
* Which tool you want to use.
* What process steps you want to run.
** Either the recipe name or all required process parameters.
** How long does the process take.
* What is your project alias? If unsure, contact your supervisor first.

Before the training session:
* Watch the instruction video(s) and read the standard operating procedure on the [[Cambridge ALD|ALD tool page]].
</div>
</div>

== Packaging ==

=== F&S autobonder ===
Prepare shadowing and bonding documentation, then request F&S autobonder training.
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Send an email with the following info before the training can be arranged:

* Shadow colleagues using the tool 2-3 times.
* You must have a '''chip''' for bonding.
* You must know which '''daughterboard''' you will use for bonding.
* You must know what material you use to '''mount''' the chip to the daughterboard (silver paint, PMMA or whatever is specific to your measurement).
* You must prepare a '''bonding schematic''' and have one of your team members verify that it is correct.
* What is your project alias? If unsure, contact your supervisor first.
* Read through the wiki page: https://wiki.nbi.ku.dk/cleanroom/FS_bonder
* Request a training session at this point.

Two training sessions are required to get access to the bonder:

# 3 hours: Basic bonder training and chip bonding
# 2 hours: Sign-off session
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=== Manual bonder ===
Request manual bonder training via [mailto:cleanroom@nbi.ku.dk cleanroom@nbi.ku.dk].
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== Miscellaneous ==

=== Micromanipulator ===
Complete group-level training first, then request a micromanipulator sign-off session.
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* Please get trained within your research group first. Then request a sign-off session.
* What is your project alias? If unsure, contact your supervisor first.
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</div>

[[Category:Tools]]

Training

2026-04-17T09:57:20Z

Harry: /* AJA metallization, sputtering or ion milling */

A prerequisite for using the cleanroom [[Tools|tools]] is that a [[About|cleanroom staff]] member has given the necessary instruction or training.
This includes basic instruments such as hotplates and microscopes.
For '''all''' training requests, please read the prerequisites below and afterwards contact [mailto:cleanroom@nbi.ku.dk cleanroom@nbi.ku.dk].
A cleanroom staff member will typically respond within one workday.
Do not contact individual staff members for training.

Once the user has completed the training, they are given booking rights in the [http://cleanroom.brickhost.com cleanroom booking system].
However, after a certain period of inactivity (typically 90 days) on a given tool, the booking rights will expire and the user will need to be retrained in order to continue using the tool.

== Cleanroom General Introduction ==

=== Cleanroom general introduction ===
Request cleanroom introduction training via [mailto:cleanroom@nbi.ku.dk cleanroom@nbi.ku.dk].
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* Name a superuser from your group who will follow you in the cleanroom 2-3 times after your training.
* Introduction training requires acceptance from all of you and typically runs from 9.30 to 15.00.
* Before training, read the safety information: https://wiki.nbi.ku.dk/cleanroom/Safety
* Typical schedule:
** 9.15-10.30: Cleanroom introduction
** Coffee break
** 10.45-12.00: Asher, spinners, and optical microscopes
** Lunch break
** 13.00-14.00: Practical information inside and outside the lab
** 14.00-15.00: Q&A and account setup
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</div>

== Lithography ==

=== Elionix 7000 (100 kV) ===
Elionix 7000 training is for advanced users and requires prior cleanroom tool competency.

Contact Harry (cleanroom@nbi.ku.dk) to request training.
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==== Prerequisites ====
* You must be at least a Master student or signed up for a long term (>6 months) project to be allowed to use the tool.
* Elionix is a high level tool. Make sure you are already trained to:
** Enter the cleanroom
** Use the microscope, spinner, asher

==== Training ====
* You'll need 4 sessions to get trained on this tool.
** Session 1 ( 1 hr.) - teaches you how to load/unload the sample and how to condition the beam.
** Session 2 ( 3 hr.) - involves exposing alignment marks and test patterns (any design: preferably one half of the overlay ,so to understand alignment later ).
** Session 3 ( 3 hr.) - involves using the exposed alignment marks for marker registration and exposing the 2nd pattern (i.e. the 2nd half of the overlay pattern).
** Session 4 involves exposing a "real" pattern on a "real" chip on your own to gain access.

==== Preparation ====
Before any training slots are booked on the tool you'll need all of the following prepared:
* Shadow senior users on the tool 2-3 times.
* Chip (comfortable to handle) spin coated with resist. This chip will be used for sessions 1 & 2. Please be aware of the coating and baking parameters for the resist.
* Any test design is preferred which has marks, overlay patterns that you will use to test alignment precision between two lithography steps. A Vernier pattern is commonly used. Feel free to test your ideas. Make sure you have something for both ''x'' and ''y'' directions. If you don't know how to start, check the [[Design template for EBL]].
* Convert your design files into the Elionix exposure format .co7. This can be done using Beamer in 4th floor design computers.
* Make sure all write fields are entirely in the positive coordinate space.
* Make sure neither exposure will take longer than 60 minutes at 500 pA current and dose of 1000 uC/cm2.
</div>
</div>

=== Elionix F-125 (125 kV at QuanTech) ===
Contact Zhe Liu to arrange access and training for Elionix F-125.
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* Please contact Zhe Liu ([mailto:zhe.liu@nbi.ku.dk zhe.liu@nbi.ku.dk])
</div>
</div>

=== Heidelberg upg501 ===
Prepare your design file and coated chip before requesting Heidelberg upg501 training.
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* Have a design file ready. GDS, DXF or CIF format works fine. Make sure you are familiar with the design before your actual session.
* Have a chip spin coated with an appropriate photoresist before the training session.
** The photoresist is sensitive to white light. Use the yellow filter on the microscopes. The light source in the both scribers is white and will already expose your resist.
* What is your project alias? If unsure, contact your supervisor first.

Before the training session:
* Watch the instruction video and read the standard operating procedure on the [[Heidelberg µPG 501|Heidelberg µPG 501 tool page]], shadow the tool with your group members, and ask for a sign-off session.
</div>
</div>

== Characterization ==

=== Bruker Dimension Icon Atomic Force Microscope (AFM) ===
Contact NBI-CR staff ([mailto:cleanroom@nbi.ku.dk cleanroom@nbi.ku.dk]) to request for AFM training.
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* Have a sample ready that you want to characterize. Think about what you want to learn about the sample: step height, roughness, etc.
* Only request for training if you plan on using the tool regularly.
* Training is usually 2-3 sessions of 2-hour per session.
</div>
</div>

=== JEOL 7800-F ===
Prepare a real sample and imaging goals before booking JEOL 7800-F training.
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* Training is usually 2-3 sessions of 2-hour per session.
* You need a chip/sample to be imaged before a session is booked.
* Be familiar with the materials on the sample to be imaged and what feature is it that is of critical interest -- something that makes or breaks your device.
* Request the training session only once you have gathered the chips and information.
* What is your project alias? If unsure, contact your supervisor first.
</div>
</div>

=== JEOL 7800-F prime (QuanTech) ===
Prepare a real sample and imaging goals before booking JEOL 7800-F Prime training.
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* Training takes about 2-3 sessions.
* You need a chip/sample to be imaged before a session is booked.
* Be familiar with the materials on the sample to be imaged and what feature is it that is of critical interest -- something that makes or breaks your device.
* Request the training session only once you have gathered the chips and information.
* What is your project alias? If unsure, contact your supervisor first.
</div>
</div>

=== Raith e-Line ===
Bring a prepared design package for sessions 1 and 2, including alignment and overlay test patterns.
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<div class="mw-collapsible-content">
* A design (gds, dxf, cif) for sessions 1 & 2 with:
** 4 alignment crosses (find out what marks work on the tool from your sub-group).
** Something to break the symmetry so you can tell chip orientation with your bare eye.
** A pattern that you will use to test overlay (alignment between two lithography steps). A Vernier pattern is commonly used. Feel free to test your ideas.
** Something creative, somethin fun :) This is an exercise in learning CAD as well.
* What is your project alias? If unsure, contact your supervisor first.
</div>
</div>

=== Woollam alpha-SE Ellipsometer ===
Request Woollam alpha-SE Ellipsometer training via [mailto:cleanroom@nbi.ku.dk cleanroom@nbi.ku.dk].
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<div class="mw-collapsible-content">
</div>
</div>

=== Filmetrics reflectometer ===
Contact Zhe Liu to arrange access and training for the Filmetrics reflectometer.
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<div class="mw-collapsible-content">
* Please contact Zhe Liu ([mailto:zhe.liu@nbi.ku.dk zhe.liu@nbi.ku.dk])
</div>
</div>

== Thin Film Deposition ==

=== PLASSYS Evaporator ===
Email your PLASSYS request with shadowing, sample, and process parameters.
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<div class="mw-collapsible-content">
Send an email with the following info before the training can be arranged:
* The name of the person you have shadowed and the number of times you've done it.
* Confirm that you have a sample ready.
* Specify the required process parameters( material, thickness, tilt etc)
* What is your project alias? If unsure, contact your supervisor first.
==== Training ====
* You'll need 2 sessions to get trained on this tool.
** Session 1 ( 2 hr.) - teaches you how to load/unload the sample and how to run a recipe.
** Session 2 ( 2 hr.) - sign off session
</div>
</div>

=== AJA metallization, sputtering or ion milling ===
Email your training request with shadowing, sample, tool, process, and recipe details for AJA.
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<div class="mw-collapsible-content">
Send an email with the following info before the training can be arranged:
* The name of the person you have shadowed and the number of times you've done it.
* Confirm that you have a sample ready.
* Which tool you want to use: AJA1 or AJA2?
* What process do you want to run ?
* Either the recipe name or specify the required process parameters.
* What is your project alias? If unsure, contact your supervisor first.

Before the training session:
* Watch the instruction video on how to load/unload and read the standard operating procedures on the [[AJA Systems|AJA Systems tool page]]
==== Training ====
* You'll need 2 sessions to get trained on this tool.
** Session 1 ( 2 hr.) - teaches you how to load/unload the sample and how to run a recipe.
** Session 2 ( 2 hr.) - sign off session
</div>
</div>

=== ALD 1 ===
Email your ALD 1 request with shadowing, sample, and full process details.
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<div class="mw-collapsible-content">
Send an email with the following info before the training can be arranged:
* The name of the person you have shadowed and the number of times you've done it.
* Confirm that you have a sample ready.
* Which tool you want to use.
* What process steps you want to run.
** Either the recipe name or all required process parameters.
** How long does the process take.
* What is your project alias? If unsure, contact your supervisor first.

Before the training session:
* Watch the instruction video(s) and read the standard operating procedure on the [[Cambridge ALD|ALD tool page]].

=== ALD 2 ===
Email your ALD 2 request with shadowing, sample, and full process details.
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<div class="mw-collapsible-toggle" style="text-align:right; margin:-0.62em 0 0.25em; line-height:1;">'''Expand'''</div>
<div class="mw-collapsible-content">
Send an email with the following info before the training can be arranged:
* The name of the person you have shadowed and the number of times you've done it.
* Confirm that you have a sample ready.
* Which tool you want to use.
* What process steps you want to run.
** Either the recipe name or all required process parameters.
** How long does the process take.
* What is your project alias? If unsure, contact your supervisor first.

Before the training session:
* Watch the instruction video(s) and read the standard operating procedure on the [[Cambridge ALD|ALD tool page]].
</div>
</div>

== Packaging ==

=== F&S autobonder ===
Prepare shadowing and bonding documentation, then request F&S autobonder training.
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<div class="mw-collapsible-content">
Send an email with the following info before the training can be arranged:

* Shadow colleagues using the tool 2-3 times.
* You must have a '''chip''' for bonding.
* You must know which '''daughterboard''' you will use for bonding.
* You must know what material you use to '''mount''' the chip to the daughterboard (silver paint, PMMA or whatever is specific to your measurement).
* You must prepare a '''bonding schematic''' and have one of your team members verify that it is correct.
* What is your project alias? If unsure, contact your supervisor first.
* Read through the wiki page: https://wiki.nbi.ku.dk/cleanroom/FS_bonder
* Request a training session at this point.

Two training sessions are required to get access to the bonder:

# 3 hours: Basic bonder training and chip bonding
# 2 hours: Sign-off session
</div>
</div>

=== Manual bonder ===
Request manual bonder training via [mailto:cleanroom@nbi.ku.dk cleanroom@nbi.ku.dk].
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<div class="mw-collapsible-content">
</div>
</div>

== Miscellaneous ==

=== Micromanipulator ===
Complete group-level training first, then request a micromanipulator sign-off session.
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<div class="mw-collapsible-content">
* Please get trained within your research group first. Then request a sign-off session.
* What is your project alias? If unsure, contact your supervisor first.
</div>
</div>

[[Category:Tools]]

Training

2026-04-17T09:56:15Z

Harry: /* PLASSYS Evaporator */

A prerequisite for using the cleanroom [[Tools|tools]] is that a [[About|cleanroom staff]] member has given the necessary instruction or training.
This includes basic instruments such as hotplates and microscopes.
For '''all''' training requests, please read the prerequisites below and afterwards contact [mailto:cleanroom@nbi.ku.dk cleanroom@nbi.ku.dk].
A cleanroom staff member will typically respond within one workday.
Do not contact individual staff members for training.

Once the user has completed the training, they are given booking rights in the [http://cleanroom.brickhost.com cleanroom booking system].
However, after a certain period of inactivity (typically 90 days) on a given tool, the booking rights will expire and the user will need to be retrained in order to continue using the tool.

== Cleanroom General Introduction ==

=== Cleanroom general introduction ===
Request cleanroom introduction training via [mailto:cleanroom@nbi.ku.dk cleanroom@nbi.ku.dk].
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<div class="mw-collapsible-content">
* Name a superuser from your group who will follow you in the cleanroom 2-3 times after your training.
* Introduction training requires acceptance from all of you and typically runs from 9.30 to 15.00.
* Before training, read the safety information: https://wiki.nbi.ku.dk/cleanroom/Safety
* Typical schedule:
** 9.15-10.30: Cleanroom introduction
** Coffee break
** 10.45-12.00: Asher, spinners, and optical microscopes
** Lunch break
** 13.00-14.00: Practical information inside and outside the lab
** 14.00-15.00: Q&A and account setup
</div>
</div>

== Lithography ==

=== Elionix 7000 (100 kV) ===
Elionix 7000 training is for advanced users and requires prior cleanroom tool competency.

Contact Harry (cleanroom@nbi.ku.dk) to request training.
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<div class="mw-collapsible-content">
==== Prerequisites ====
* You must be at least a Master student or signed up for a long term (>6 months) project to be allowed to use the tool.
* Elionix is a high level tool. Make sure you are already trained to:
** Enter the cleanroom
** Use the microscope, spinner, asher

==== Training ====
* You'll need 4 sessions to get trained on this tool.
** Session 1 ( 1 hr.) - teaches you how to load/unload the sample and how to condition the beam.
** Session 2 ( 3 hr.) - involves exposing alignment marks and test patterns (any design: preferably one half of the overlay ,so to understand alignment later ).
** Session 3 ( 3 hr.) - involves using the exposed alignment marks for marker registration and exposing the 2nd pattern (i.e. the 2nd half of the overlay pattern).
** Session 4 involves exposing a "real" pattern on a "real" chip on your own to gain access.

==== Preparation ====
Before any training slots are booked on the tool you'll need all of the following prepared:
* Shadow senior users on the tool 2-3 times.
* Chip (comfortable to handle) spin coated with resist. This chip will be used for sessions 1 & 2. Please be aware of the coating and baking parameters for the resist.
* Any test design is preferred which has marks, overlay patterns that you will use to test alignment precision between two lithography steps. A Vernier pattern is commonly used. Feel free to test your ideas. Make sure you have something for both ''x'' and ''y'' directions. If you don't know how to start, check the [[Design template for EBL]].
* Convert your design files into the Elionix exposure format .co7. This can be done using Beamer in 4th floor design computers.
* Make sure all write fields are entirely in the positive coordinate space.
* Make sure neither exposure will take longer than 60 minutes at 500 pA current and dose of 1000 uC/cm2.
</div>
</div>

=== Elionix F-125 (125 kV at QuanTech) ===
Contact Zhe Liu to arrange access and training for Elionix F-125.
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<div class="mw-collapsible-content">
* Please contact Zhe Liu ([mailto:zhe.liu@nbi.ku.dk zhe.liu@nbi.ku.dk])
</div>
</div>

=== Heidelberg upg501 ===
Prepare your design file and coated chip before requesting Heidelberg upg501 training.
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<div class="mw-collapsible-content">
* Have a design file ready. GDS, DXF or CIF format works fine. Make sure you are familiar with the design before your actual session.
* Have a chip spin coated with an appropriate photoresist before the training session.
** The photoresist is sensitive to white light. Use the yellow filter on the microscopes. The light source in the both scribers is white and will already expose your resist.
* What is your project alias? If unsure, contact your supervisor first.

Before the training session:
* Watch the instruction video and read the standard operating procedure on the [[Heidelberg µPG 501|Heidelberg µPG 501 tool page]], shadow the tool with your group members, and ask for a sign-off session.
</div>
</div>

== Characterization ==

=== Bruker Dimension Icon Atomic Force Microscope (AFM) ===
Contact NBI-CR staff ([mailto:cleanroom@nbi.ku.dk cleanroom@nbi.ku.dk]) to request for AFM training.
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<div class="mw-collapsible-content">
* Have a sample ready that you want to characterize. Think about what you want to learn about the sample: step height, roughness, etc.
* Only request for training if you plan on using the tool regularly.
* Training is usually 2-3 sessions of 2-hour per session.
</div>
</div>

=== JEOL 7800-F ===
Prepare a real sample and imaging goals before booking JEOL 7800-F training.
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<div class="mw-collapsible-content">
* Training is usually 2-3 sessions of 2-hour per session.
* You need a chip/sample to be imaged before a session is booked.
* Be familiar with the materials on the sample to be imaged and what feature is it that is of critical interest -- something that makes or breaks your device.
* Request the training session only once you have gathered the chips and information.
* What is your project alias? If unsure, contact your supervisor first.
</div>
</div>

=== JEOL 7800-F prime (QuanTech) ===
Prepare a real sample and imaging goals before booking JEOL 7800-F Prime training.
<div class="mw-collapsible mw-collapsed" style="border:1px solid #b7e1c1; border-left:6px solid #2a9d5b; background:#f2fbf5; border-radius:6px; margin:0.45em 0 1.0em; padding:0.55em 0.75em 0.55em;">
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<div class="mw-collapsible-content">
* Training takes about 2-3 sessions.
* You need a chip/sample to be imaged before a session is booked.
* Be familiar with the materials on the sample to be imaged and what feature is it that is of critical interest -- something that makes or breaks your device.
* Request the training session only once you have gathered the chips and information.
* What is your project alias? If unsure, contact your supervisor first.
</div>
</div>

=== Raith e-Line ===
Bring a prepared design package for sessions 1 and 2, including alignment and overlay test patterns.
<div class="mw-collapsible mw-collapsed" style="border:1px solid #b8e2d5; border-left:6px solid #14866d; background:#f2fbf8; border-radius:6px; margin:0.45em 0 1.0em; padding:0.55em 0.75em 0.55em;">
<div class="mw-collapsible-toggle" style="text-align:right; margin:-0.62em 0 0.25em; line-height:1;">'''Expand'''</div>
<div class="mw-collapsible-content">
* A design (gds, dxf, cif) for sessions 1 & 2 with:
** 4 alignment crosses (find out what marks work on the tool from your sub-group).
** Something to break the symmetry so you can tell chip orientation with your bare eye.
** A pattern that you will use to test overlay (alignment between two lithography steps). A Vernier pattern is commonly used. Feel free to test your ideas.
** Something creative, somethin fun :) This is an exercise in learning CAD as well.
* What is your project alias? If unsure, contact your supervisor first.
</div>
</div>

=== Woollam alpha-SE Ellipsometer ===
Request Woollam alpha-SE Ellipsometer training via [mailto:cleanroom@nbi.ku.dk cleanroom@nbi.ku.dk].
<div class="mw-collapsible mw-collapsed" style="border:1px solid #d8dde3; border-left:6px solid #72777d; background:#f8f9fa; border-radius:6px; margin:0.45em 0 1.0em; padding:0.55em 0.75em 0.55em;">
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<div class="mw-collapsible-content">
</div>
</div>

=== Filmetrics reflectometer ===
Contact Zhe Liu to arrange access and training for the Filmetrics reflectometer.
<div class="mw-collapsible mw-collapsed" style="border:1px solid #b7e1c1; border-left:6px solid #2a9d5b; background:#f2fbf5; border-radius:6px; margin:0.45em 0 1.0em; padding:0.55em 0.75em 0.55em;">
<div class="mw-collapsible-toggle" style="text-align:right; margin:-0.62em 0 0.25em; line-height:1;">'''Expand'''</div>
<div class="mw-collapsible-content">
* Please contact Zhe Liu ([mailto:zhe.liu@nbi.ku.dk zhe.liu@nbi.ku.dk])
</div>
</div>

== Thin Film Deposition ==

=== PLASSYS Evaporator ===
Email your PLASSYS request with shadowing, sample, and process parameters.
<div class="mw-collapsible mw-collapsed" style="border:1px solid #f0d4ac; border-left:6px solid #c77700; background:#fff8ef; border-radius:6px; margin:0.45em 0 1.0em; padding:0.55em 0.75em 0.55em;">
<div class="mw-collapsible-toggle" style="text-align:right; margin:-0.62em 0 0.25em; line-height:1;">'''Expand'''</div>
<div class="mw-collapsible-content">
Send an email with the following info before the training can be arranged:
* The name of the person you have shadowed and the number of times you've done it.
* Confirm that you have a sample ready.
* Specify the required process parameters( material, thickness, tilt etc)
* What is your project alias? If unsure, contact your supervisor first.
==== Training ====
* You'll need 2 sessions to get trained on this tool.
** Session 1 ( 2 hr.) - teaches you how to load/unload the sample and how to run a recipe.
** Session 2 ( 2 hr.) - sign off session
</div>
</div>

=== AJA metallization, sputtering or ion milling ===
Email your training request with shadowing, sample, tool, process, and recipe details for AJA.
<div class="mw-collapsible mw-collapsed" style="border:1px solid #f0d4ac; border-left:6px solid #c77700; background:#fff8ef; border-radius:6px; margin:0.45em 0 1.0em; padding:0.55em 0.75em 0.55em;">
<div class="mw-collapsible-toggle" style="text-align:right; margin:-0.62em 0 0.25em; line-height:1;">'''Expand'''</div>
<div class="mw-collapsible-content">
Send an email with the following info before the training can be arranged:
* The name of the person you have shadowed and the number of times you've done it.
* Confirm that you have a sample ready.
* Which tool you want to use: AJA1 or AJA2?
* What process do you want to run ?
* Either the recipe name or specify the required process parameters.
* What is your project alias? If unsure, contact your supervisor first.

Before the training session:
* Watch the instruction video on how to load/unload and read the standard operating procedures on the [[AJA Systems|AJA Systems tool page]]
==== Training ====
* You'll need 2 sessions to get trained on this tool.
** Session 1 ( 2 hr.) - teaches you how to load/unload the sample and how to run a recipe.
** Session 2 ( 2 hr.) - sign off session
</div>
</div>

=== ALD 1 ===
Email your ALD 1 request with shadowing, sample, and full process details.
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<div class="mw-collapsible-toggle" style="text-align:right; margin:-0.62em 0 0.25em; line-height:1;">'''Expand'''</div>
<div class="mw-collapsible-content">
Send an email with the following info before the training can be arranged:
* The name of the person you have shadowed and the number of times you've done it.
* Confirm that you have a sample ready.
* Which tool you want to use.
* What process steps you want to run.
** Either the recipe name or all required process parameters.
** How long does the process take.
* What is your project alias? If unsure, contact your supervisor first.

Before the training session:
* Watch the instruction video(s) and read the standard operating procedure on the [[Cambridge ALD|ALD tool page]].

=== AJA metallization, sputtering or ion milling ===
Email your training request with shadowing, sample, tool, process, and recipe details for AJA.
<div class="mw-collapsible mw-collapsed" style="border:1px solid #f0d4ac; border-left:6px solid #c77700; background:#fff8ef; border-radius:6px; margin:0.45em 0 1.0em; padding:0.55em 0.75em 0.55em;">
<div class="mw-collapsible-toggle" style="text-align:right; margin:-0.62em 0 0.25em; line-height:1;">'''Expand'''</div>
<div class="mw-collapsible-content">
Send an email with the following info before the training can be arranged:
* The name of the person you have shadowed and the number of times you've done it.
* Confirm that you have a sample ready.
* Which tool you want to use: AJA1 or AJA2?
* What process do you want to run ?
* Either the recipe name or specify the required process parameters.
* What is your project alias? If unsure, contact your supervisor first.

Before the training session:
* Watch the instruction video on how to load/unload and read the standard operating procedures on the [[AJA Systems|AJA Systems tool page]]

==== Training ====
* You'll need 2 sessions to get access on this tool.
** Session 1 ( 2 hr.) - teaches you how to load/unload the sample and how to run a recipe.
** Session 2 ( 2 hr.) - sign off session

</div>
</div>

</div>
</div>

=== ALD 2 ===
Email your ALD 2 request with shadowing, sample, and full process details.
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<div class="mw-collapsible-toggle" style="text-align:right; margin:-0.62em 0 0.25em; line-height:1;">'''Expand'''</div>
<div class="mw-collapsible-content">
Send an email with the following info before the training can be arranged:
* The name of the person you have shadowed and the number of times you've done it.
* Confirm that you have a sample ready.
* Which tool you want to use.
* What process steps you want to run.
** Either the recipe name or all required process parameters.
** How long does the process take.
* What is your project alias? If unsure, contact your supervisor first.

Before the training session:
* Watch the instruction video(s) and read the standard operating procedure on the [[Cambridge ALD|ALD tool page]].
</div>
</div>

== Packaging ==

=== F&S autobonder ===
Prepare shadowing and bonding documentation, then request F&S autobonder training.
<div class="mw-collapsible mw-collapsed" style="border:1px solid #d9c8b7; border-left:6px solid #8b5e3c; background:#fbf6f1; border-radius:6px; margin:0.45em 0 1.0em; padding:0.55em 0.75em 0.55em;">
<div class="mw-collapsible-toggle" style="text-align:right; margin:-0.62em 0 0.25em; line-height:1;">'''Expand'''</div>
<div class="mw-collapsible-content">
Send an email with the following info before the training can be arranged:

* Shadow colleagues using the tool 2-3 times.
* You must have a '''chip''' for bonding.
* You must know which '''daughterboard''' you will use for bonding.
* You must know what material you use to '''mount''' the chip to the daughterboard (silver paint, PMMA or whatever is specific to your measurement).
* You must prepare a '''bonding schematic''' and have one of your team members verify that it is correct.
* What is your project alias? If unsure, contact your supervisor first.
* Read through the wiki page: https://wiki.nbi.ku.dk/cleanroom/FS_bonder
* Request a training session at this point.

Two training sessions are required to get access to the bonder:

# 3 hours: Basic bonder training and chip bonding
# 2 hours: Sign-off session
</div>
</div>

=== Manual bonder ===
Request manual bonder training via [mailto:cleanroom@nbi.ku.dk cleanroom@nbi.ku.dk].
<div class="mw-collapsible mw-collapsed" style="border:1px solid #d8dde3; border-left:6px solid #72777d; background:#f8f9fa; border-radius:6px; margin:0.45em 0 1.0em; padding:0.55em 0.75em 0.55em;">
<div class="mw-collapsible-toggle" style="text-align:right; margin:-0.62em 0 0.25em; line-height:1;">'''Expand'''</div>
<div class="mw-collapsible-content">
</div>
</div>

== Miscellaneous ==

=== Micromanipulator ===
Complete group-level training first, then request a micromanipulator sign-off session.
<div class="mw-collapsible mw-collapsed" style="border:1px solid #d9c8b7; border-left:6px solid #8b5e3c; background:#fbf6f1; border-radius:6px; margin:0.45em 0 1.0em; padding:0.55em 0.75em 0.55em;">
<div class="mw-collapsible-toggle" style="text-align:right; margin:-0.62em 0 0.25em; line-height:1;">'''Expand'''</div>
<div class="mw-collapsible-content">
* Please get trained within your research group first. Then request a sign-off session.
* What is your project alias? If unsure, contact your supervisor first.
</div>
</div>

[[Category:Tools]]

Training

2026-04-17T09:56:03Z

Harry: /* AJA metallization, sputtering or ion milling */

A prerequisite for using the cleanroom [[Tools|tools]] is that a [[About|cleanroom staff]] member has given the necessary instruction or training.
This includes basic instruments such as hotplates and microscopes.
For '''all''' training requests, please read the prerequisites below and afterwards contact [mailto:cleanroom@nbi.ku.dk cleanroom@nbi.ku.dk].
A cleanroom staff member will typically respond within one workday.
Do not contact individual staff members for training.

Once the user has completed the training, they are given booking rights in the [http://cleanroom.brickhost.com cleanroom booking system].
However, after a certain period of inactivity (typically 90 days) on a given tool, the booking rights will expire and the user will need to be retrained in order to continue using the tool.

== Cleanroom General Introduction ==

=== Cleanroom general introduction ===
Request cleanroom introduction training via [mailto:cleanroom@nbi.ku.dk cleanroom@nbi.ku.dk].
<div class="mw-collapsible mw-collapsed" style="border:1px solid #d8dde3; border-left:6px solid #72777d; background:#f8f9fa; border-radius:6px; margin:0.45em 0 1.0em; padding:0.55em 0.75em 0.55em;">
<div class="mw-collapsible-toggle" style="text-align:right; margin:-0.62em 0 0.25em; line-height:1;">'''Expand'''</div>
<div class="mw-collapsible-content">
* Name a superuser from your group who will follow you in the cleanroom 2-3 times after your training.
* Introduction training requires acceptance from all of you and typically runs from 9.30 to 15.00.
* Before training, read the safety information: https://wiki.nbi.ku.dk/cleanroom/Safety
* Typical schedule:
** 9.15-10.30: Cleanroom introduction
** Coffee break
** 10.45-12.00: Asher, spinners, and optical microscopes
** Lunch break
** 13.00-14.00: Practical information inside and outside the lab
** 14.00-15.00: Q&A and account setup
</div>
</div>

== Lithography ==

=== Elionix 7000 (100 kV) ===
Elionix 7000 training is for advanced users and requires prior cleanroom tool competency.

Contact Harry (cleanroom@nbi.ku.dk) to request training.
<div class="mw-collapsible mw-collapsed" style="border:1px solid #b8e2d5; border-left:6px solid #14866d; background:#f2fbf8; border-radius:6px; margin:0.45em 0 1.0em; padding:0.55em 0.75em 0.55em;">
<div class="mw-collapsible-toggle" style="text-align:right; margin:-0.62em 0 0.25em; line-height:1;">'''Expand'''</div>
<div class="mw-collapsible-content">
==== Prerequisites ====
* You must be at least a Master student or signed up for a long term (>6 months) project to be allowed to use the tool.
* Elionix is a high level tool. Make sure you are already trained to:
** Enter the cleanroom
** Use the microscope, spinner, asher

==== Training ====
* You'll need 4 sessions to get trained on this tool.
** Session 1 ( 1 hr.) - teaches you how to load/unload the sample and how to condition the beam.
** Session 2 ( 3 hr.) - involves exposing alignment marks and test patterns (any design: preferably one half of the overlay ,so to understand alignment later ).
** Session 3 ( 3 hr.) - involves using the exposed alignment marks for marker registration and exposing the 2nd pattern (i.e. the 2nd half of the overlay pattern).
** Session 4 involves exposing a "real" pattern on a "real" chip on your own to gain access.

==== Preparation ====
Before any training slots are booked on the tool you'll need all of the following prepared:
* Shadow senior users on the tool 2-3 times.
* Chip (comfortable to handle) spin coated with resist. This chip will be used for sessions 1 & 2. Please be aware of the coating and baking parameters for the resist.
* Any test design is preferred which has marks, overlay patterns that you will use to test alignment precision between two lithography steps. A Vernier pattern is commonly used. Feel free to test your ideas. Make sure you have something for both ''x'' and ''y'' directions. If you don't know how to start, check the [[Design template for EBL]].
* Convert your design files into the Elionix exposure format .co7. This can be done using Beamer in 4th floor design computers.
* Make sure all write fields are entirely in the positive coordinate space.
* Make sure neither exposure will take longer than 60 minutes at 500 pA current and dose of 1000 uC/cm2.
</div>
</div>

=== Elionix F-125 (125 kV at QuanTech) ===
Contact Zhe Liu to arrange access and training for Elionix F-125.
<div class="mw-collapsible mw-collapsed" style="border:1px solid #b8e2d5; border-left:6px solid #14866d; background:#f2fbf8; border-radius:6px; margin:0.45em 0 1.0em; padding:0.55em 0.75em 0.55em;">
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<div class="mw-collapsible-content">
* Please contact Zhe Liu ([mailto:zhe.liu@nbi.ku.dk zhe.liu@nbi.ku.dk])
</div>
</div>

=== Heidelberg upg501 ===
Prepare your design file and coated chip before requesting Heidelberg upg501 training.
<div class="mw-collapsible mw-collapsed" style="border:1px solid #b8e2d5; border-left:6px solid #14866d; background:#f2fbf8; border-radius:6px; margin:0.45em 0 1.0em; padding:0.55em 0.75em 0.55em;">
<div class="mw-collapsible-toggle" style="text-align:right; margin:-0.62em 0 0.25em; line-height:1;">'''Expand'''</div>
<div class="mw-collapsible-content">
* Have a design file ready. GDS, DXF or CIF format works fine. Make sure you are familiar with the design before your actual session.
* Have a chip spin coated with an appropriate photoresist before the training session.
** The photoresist is sensitive to white light. Use the yellow filter on the microscopes. The light source in the both scribers is white and will already expose your resist.
* What is your project alias? If unsure, contact your supervisor first.

Before the training session:
* Watch the instruction video and read the standard operating procedure on the [[Heidelberg µPG 501|Heidelberg µPG 501 tool page]], shadow the tool with your group members, and ask for a sign-off session.
</div>
</div>

== Characterization ==

=== Bruker Dimension Icon Atomic Force Microscope (AFM) ===
Contact NBI-CR staff ([mailto:cleanroom@nbi.ku.dk cleanroom@nbi.ku.dk]) to request for AFM training.
<div class="mw-collapsible mw-collapsed" style="border:1px solid #c9ddf8; border-left:6px solid #3366cc; background:#f5f9ff; border-radius:6px; margin:0.45em 0 1.0em; padding:0.55em 0.75em 0.55em;">
<div class="mw-collapsible-toggle" style="text-align:right; margin:-0.62em 0 0.25em; line-height:1;">'''Expand'''</div>
<div class="mw-collapsible-content">
* Have a sample ready that you want to characterize. Think about what you want to learn about the sample: step height, roughness, etc.
* Only request for training if you plan on using the tool regularly.
* Training is usually 2-3 sessions of 2-hour per session.
</div>
</div>

=== JEOL 7800-F ===
Prepare a real sample and imaging goals before booking JEOL 7800-F training.
<div class="mw-collapsible mw-collapsed" style="border:1px solid #b7e1c1; border-left:6px solid #2a9d5b; background:#f2fbf5; border-radius:6px; margin:0.45em 0 1.0em; padding:0.55em 0.75em 0.55em;">
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<div class="mw-collapsible-content">
* Training is usually 2-3 sessions of 2-hour per session.
* You need a chip/sample to be imaged before a session is booked.
* Be familiar with the materials on the sample to be imaged and what feature is it that is of critical interest -- something that makes or breaks your device.
* Request the training session only once you have gathered the chips and information.
* What is your project alias? If unsure, contact your supervisor first.
</div>
</div>

=== JEOL 7800-F prime (QuanTech) ===
Prepare a real sample and imaging goals before booking JEOL 7800-F Prime training.
<div class="mw-collapsible mw-collapsed" style="border:1px solid #b7e1c1; border-left:6px solid #2a9d5b; background:#f2fbf5; border-radius:6px; margin:0.45em 0 1.0em; padding:0.55em 0.75em 0.55em;">
<div class="mw-collapsible-toggle" style="text-align:right; margin:-0.62em 0 0.25em; line-height:1;">'''Expand'''</div>
<div class="mw-collapsible-content">
* Training takes about 2-3 sessions.
* You need a chip/sample to be imaged before a session is booked.
* Be familiar with the materials on the sample to be imaged and what feature is it that is of critical interest -- something that makes or breaks your device.
* Request the training session only once you have gathered the chips and information.
* What is your project alias? If unsure, contact your supervisor first.
</div>
</div>

=== Raith e-Line ===
Bring a prepared design package for sessions 1 and 2, including alignment and overlay test patterns.
<div class="mw-collapsible mw-collapsed" style="border:1px solid #b8e2d5; border-left:6px solid #14866d; background:#f2fbf8; border-radius:6px; margin:0.45em 0 1.0em; padding:0.55em 0.75em 0.55em;">
<div class="mw-collapsible-toggle" style="text-align:right; margin:-0.62em 0 0.25em; line-height:1;">'''Expand'''</div>
<div class="mw-collapsible-content">
* A design (gds, dxf, cif) for sessions 1 & 2 with:
** 4 alignment crosses (find out what marks work on the tool from your sub-group).
** Something to break the symmetry so you can tell chip orientation with your bare eye.
** A pattern that you will use to test overlay (alignment between two lithography steps). A Vernier pattern is commonly used. Feel free to test your ideas.
** Something creative, somethin fun :) This is an exercise in learning CAD as well.
* What is your project alias? If unsure, contact your supervisor first.
</div>
</div>

=== Woollam alpha-SE Ellipsometer ===
Request Woollam alpha-SE Ellipsometer training via [mailto:cleanroom@nbi.ku.dk cleanroom@nbi.ku.dk].
<div class="mw-collapsible mw-collapsed" style="border:1px solid #d8dde3; border-left:6px solid #72777d; background:#f8f9fa; border-radius:6px; margin:0.45em 0 1.0em; padding:0.55em 0.75em 0.55em;">
<div class="mw-collapsible-toggle" style="text-align:right; margin:-0.62em 0 0.25em; line-height:1;">'''Expand'''</div>
<div class="mw-collapsible-content">
</div>
</div>

=== Filmetrics reflectometer ===
Contact Zhe Liu to arrange access and training for the Filmetrics reflectometer.
<div class="mw-collapsible mw-collapsed" style="border:1px solid #b7e1c1; border-left:6px solid #2a9d5b; background:#f2fbf5; border-radius:6px; margin:0.45em 0 1.0em; padding:0.55em 0.75em 0.55em;">
<div class="mw-collapsible-toggle" style="text-align:right; margin:-0.62em 0 0.25em; line-height:1;">'''Expand'''</div>
<div class="mw-collapsible-content">
* Please contact Zhe Liu ([mailto:zhe.liu@nbi.ku.dk zhe.liu@nbi.ku.dk])
</div>
</div>

== Thin Film Deposition ==

=== PLASSYS Evaporator ===
Email your PLASSYS request with shadowing, sample, and process parameters.
<div class="mw-collapsible mw-collapsed" style="border:1px solid #f0d4ac; border-left:6px solid #c77700; background:#fff8ef; border-radius:6px; margin:0.45em 0 1.0em; padding:0.55em 0.75em 0.55em;">
<div class="mw-collapsible-toggle" style="text-align:right; margin:-0.62em 0 0.25em; line-height:1;">'''Expand'''</div>
<div class="mw-collapsible-content">
Send an email with the following info before the training can be arranged:
* The name of the person you have shadowed and the number of times you've done it.
* Confirm that you have a sample ready.
* Specify the required process parameters( material, thickness, tilt etc)
* What is your project alias? If unsure, contact your supervisor first.
==== Training ====
* You'll need 3 sessions to get trained on this tool.
** Session 1 ( 2 hr.) - teaches you how to load/unload the sample and how to run a recipe.
** Session 2 ( 2 hr.) - sign off session
</div>
</div>

=== AJA metallization, sputtering or ion milling ===
Email your training request with shadowing, sample, tool, process, and recipe details for AJA.
<div class="mw-collapsible mw-collapsed" style="border:1px solid #f0d4ac; border-left:6px solid #c77700; background:#fff8ef; border-radius:6px; margin:0.45em 0 1.0em; padding:0.55em 0.75em 0.55em;">
<div class="mw-collapsible-toggle" style="text-align:right; margin:-0.62em 0 0.25em; line-height:1;">'''Expand'''</div>
<div class="mw-collapsible-content">
Send an email with the following info before the training can be arranged:
* The name of the person you have shadowed and the number of times you've done it.
* Confirm that you have a sample ready.
* Which tool you want to use: AJA1 or AJA2?
* What process do you want to run ?
* Either the recipe name or specify the required process parameters.
* What is your project alias? If unsure, contact your supervisor first.

Before the training session:
* Watch the instruction video on how to load/unload and read the standard operating procedures on the [[AJA Systems|AJA Systems tool page]]
==== Training ====
* You'll need 2 sessions to get trained on this tool.
** Session 1 ( 2 hr.) - teaches you how to load/unload the sample and how to run a recipe.
** Session 2 ( 2 hr.) - sign off session
</div>
</div>

=== ALD 1 ===
Email your ALD 1 request with shadowing, sample, and full process details.
<div class="mw-collapsible mw-collapsed" style="border:1px solid #f0d4ac; border-left:6px solid #c77700; background:#fff8ef; border-radius:6px; margin:0.45em 0 1.0em; padding:0.55em 0.75em 0.55em;">
<div class="mw-collapsible-toggle" style="text-align:right; margin:-0.62em 0 0.25em; line-height:1;">'''Expand'''</div>
<div class="mw-collapsible-content">
Send an email with the following info before the training can be arranged:
* The name of the person you have shadowed and the number of times you've done it.
* Confirm that you have a sample ready.
* Which tool you want to use.
* What process steps you want to run.
** Either the recipe name or all required process parameters.
** How long does the process take.
* What is your project alias? If unsure, contact your supervisor first.

Before the training session:
* Watch the instruction video(s) and read the standard operating procedure on the [[Cambridge ALD|ALD tool page]].

=== AJA metallization, sputtering or ion milling ===
Email your training request with shadowing, sample, tool, process, and recipe details for AJA.
<div class="mw-collapsible mw-collapsed" style="border:1px solid #f0d4ac; border-left:6px solid #c77700; background:#fff8ef; border-radius:6px; margin:0.45em 0 1.0em; padding:0.55em 0.75em 0.55em;">
<div class="mw-collapsible-toggle" style="text-align:right; margin:-0.62em 0 0.25em; line-height:1;">'''Expand'''</div>
<div class="mw-collapsible-content">
Send an email with the following info before the training can be arranged:
* The name of the person you have shadowed and the number of times you've done it.
* Confirm that you have a sample ready.
* Which tool you want to use: AJA1 or AJA2?
* What process do you want to run ?
* Either the recipe name or specify the required process parameters.
* What is your project alias? If unsure, contact your supervisor first.

Before the training session:
* Watch the instruction video on how to load/unload and read the standard operating procedures on the [[AJA Systems|AJA Systems tool page]]

==== Training ====
* You'll need 2 sessions to get access on this tool.
** Session 1 ( 2 hr.) - teaches you how to load/unload the sample and how to run a recipe.
** Session 2 ( 2 hr.) - sign off session

</div>
</div>

</div>
</div>

=== ALD 2 ===
Email your ALD 2 request with shadowing, sample, and full process details.
<div class="mw-collapsible mw-collapsed" style="border:1px solid #f0d4ac; border-left:6px solid #c77700; background:#fff8ef; border-radius:6px; margin:0.45em 0 1.0em; padding:0.55em 0.75em 0.55em;">
<div class="mw-collapsible-toggle" style="text-align:right; margin:-0.62em 0 0.25em; line-height:1;">'''Expand'''</div>
<div class="mw-collapsible-content">
Send an email with the following info before the training can be arranged:
* The name of the person you have shadowed and the number of times you've done it.
* Confirm that you have a sample ready.
* Which tool you want to use.
* What process steps you want to run.
** Either the recipe name or all required process parameters.
** How long does the process take.
* What is your project alias? If unsure, contact your supervisor first.

Before the training session:
* Watch the instruction video(s) and read the standard operating procedure on the [[Cambridge ALD|ALD tool page]].
</div>
</div>

== Packaging ==

=== F&S autobonder ===
Prepare shadowing and bonding documentation, then request F&S autobonder training.
<div class="mw-collapsible mw-collapsed" style="border:1px solid #d9c8b7; border-left:6px solid #8b5e3c; background:#fbf6f1; border-radius:6px; margin:0.45em 0 1.0em; padding:0.55em 0.75em 0.55em;">
<div class="mw-collapsible-toggle" style="text-align:right; margin:-0.62em 0 0.25em; line-height:1;">'''Expand'''</div>
<div class="mw-collapsible-content">
Send an email with the following info before the training can be arranged:

* Shadow colleagues using the tool 2-3 times.
* You must have a '''chip''' for bonding.
* You must know which '''daughterboard''' you will use for bonding.
* You must know what material you use to '''mount''' the chip to the daughterboard (silver paint, PMMA or whatever is specific to your measurement).
* You must prepare a '''bonding schematic''' and have one of your team members verify that it is correct.
* What is your project alias? If unsure, contact your supervisor first.
* Read through the wiki page: https://wiki.nbi.ku.dk/cleanroom/FS_bonder
* Request a training session at this point.

Two training sessions are required to get access to the bonder:

# 3 hours: Basic bonder training and chip bonding
# 2 hours: Sign-off session
</div>
</div>

=== Manual bonder ===
Request manual bonder training via [mailto:cleanroom@nbi.ku.dk cleanroom@nbi.ku.dk].
<div class="mw-collapsible mw-collapsed" style="border:1px solid #d8dde3; border-left:6px solid #72777d; background:#f8f9fa; border-radius:6px; margin:0.45em 0 1.0em; padding:0.55em 0.75em 0.55em;">
<div class="mw-collapsible-toggle" style="text-align:right; margin:-0.62em 0 0.25em; line-height:1;">'''Expand'''</div>
<div class="mw-collapsible-content">
</div>
</div>

== Miscellaneous ==

=== Micromanipulator ===
Complete group-level training first, then request a micromanipulator sign-off session.
<div class="mw-collapsible mw-collapsed" style="border:1px solid #d9c8b7; border-left:6px solid #8b5e3c; background:#fbf6f1; border-radius:6px; margin:0.45em 0 1.0em; padding:0.55em 0.75em 0.55em;">
<div class="mw-collapsible-toggle" style="text-align:right; margin:-0.62em 0 0.25em; line-height:1;">'''Expand'''</div>
<div class="mw-collapsible-content">
* Please get trained within your research group first. Then request a sign-off session.
* What is your project alias? If unsure, contact your supervisor first.
</div>
</div>

[[Category:Tools]]

Training

2026-04-17T09:55:13Z

Harry: /* ALD 1 */

A prerequisite for using the cleanroom [[Tools|tools]] is that a [[About|cleanroom staff]] member has given the necessary instruction or training.
This includes basic instruments such as hotplates and microscopes.
For '''all''' training requests, please read the prerequisites below and afterwards contact [mailto:cleanroom@nbi.ku.dk cleanroom@nbi.ku.dk].
A cleanroom staff member will typically respond within one workday.
Do not contact individual staff members for training.

Once the user has completed the training, they are given booking rights in the [http://cleanroom.brickhost.com cleanroom booking system].
However, after a certain period of inactivity (typically 90 days) on a given tool, the booking rights will expire and the user will need to be retrained in order to continue using the tool.

== Cleanroom General Introduction ==

=== Cleanroom general introduction ===
Request cleanroom introduction training via [mailto:cleanroom@nbi.ku.dk cleanroom@nbi.ku.dk].
<div class="mw-collapsible mw-collapsed" style="border:1px solid #d8dde3; border-left:6px solid #72777d; background:#f8f9fa; border-radius:6px; margin:0.45em 0 1.0em; padding:0.55em 0.75em 0.55em;">
<div class="mw-collapsible-toggle" style="text-align:right; margin:-0.62em 0 0.25em; line-height:1;">'''Expand'''</div>
<div class="mw-collapsible-content">
* Name a superuser from your group who will follow you in the cleanroom 2-3 times after your training.
* Introduction training requires acceptance from all of you and typically runs from 9.30 to 15.00.
* Before training, read the safety information: https://wiki.nbi.ku.dk/cleanroom/Safety
* Typical schedule:
** 9.15-10.30: Cleanroom introduction
** Coffee break
** 10.45-12.00: Asher, spinners, and optical microscopes
** Lunch break
** 13.00-14.00: Practical information inside and outside the lab
** 14.00-15.00: Q&A and account setup
</div>
</div>

== Lithography ==

=== Elionix 7000 (100 kV) ===
Elionix 7000 training is for advanced users and requires prior cleanroom tool competency.

Contact Harry (cleanroom@nbi.ku.dk) to request training.
<div class="mw-collapsible mw-collapsed" style="border:1px solid #b8e2d5; border-left:6px solid #14866d; background:#f2fbf8; border-radius:6px; margin:0.45em 0 1.0em; padding:0.55em 0.75em 0.55em;">
<div class="mw-collapsible-toggle" style="text-align:right; margin:-0.62em 0 0.25em; line-height:1;">'''Expand'''</div>
<div class="mw-collapsible-content">
==== Prerequisites ====
* You must be at least a Master student or signed up for a long term (>6 months) project to be allowed to use the tool.
* Elionix is a high level tool. Make sure you are already trained to:
** Enter the cleanroom
** Use the microscope, spinner, asher

==== Training ====
* You'll need 4 sessions to get trained on this tool.
** Session 1 ( 1 hr.) - teaches you how to load/unload the sample and how to condition the beam.
** Session 2 ( 3 hr.) - involves exposing alignment marks and test patterns (any design: preferably one half of the overlay ,so to understand alignment later ).
** Session 3 ( 3 hr.) - involves using the exposed alignment marks for marker registration and exposing the 2nd pattern (i.e. the 2nd half of the overlay pattern).
** Session 4 involves exposing a "real" pattern on a "real" chip on your own to gain access.

==== Preparation ====
Before any training slots are booked on the tool you'll need all of the following prepared:
* Shadow senior users on the tool 2-3 times.
* Chip (comfortable to handle) spin coated with resist. This chip will be used for sessions 1 & 2. Please be aware of the coating and baking parameters for the resist.
* Any test design is preferred which has marks, overlay patterns that you will use to test alignment precision between two lithography steps. A Vernier pattern is commonly used. Feel free to test your ideas. Make sure you have something for both ''x'' and ''y'' directions. If you don't know how to start, check the [[Design template for EBL]].
* Convert your design files into the Elionix exposure format .co7. This can be done using Beamer in 4th floor design computers.
* Make sure all write fields are entirely in the positive coordinate space.
* Make sure neither exposure will take longer than 60 minutes at 500 pA current and dose of 1000 uC/cm2.
</div>
</div>

=== Elionix F-125 (125 kV at QuanTech) ===
Contact Zhe Liu to arrange access and training for Elionix F-125.
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<div class="mw-collapsible-content">
* Please contact Zhe Liu ([mailto:zhe.liu@nbi.ku.dk zhe.liu@nbi.ku.dk])
</div>
</div>

=== Heidelberg upg501 ===
Prepare your design file and coated chip before requesting Heidelberg upg501 training.
<div class="mw-collapsible mw-collapsed" style="border:1px solid #b8e2d5; border-left:6px solid #14866d; background:#f2fbf8; border-radius:6px; margin:0.45em 0 1.0em; padding:0.55em 0.75em 0.55em;">
<div class="mw-collapsible-toggle" style="text-align:right; margin:-0.62em 0 0.25em; line-height:1;">'''Expand'''</div>
<div class="mw-collapsible-content">
* Have a design file ready. GDS, DXF or CIF format works fine. Make sure you are familiar with the design before your actual session.
* Have a chip spin coated with an appropriate photoresist before the training session.
** The photoresist is sensitive to white light. Use the yellow filter on the microscopes. The light source in the both scribers is white and will already expose your resist.
* What is your project alias? If unsure, contact your supervisor first.

Before the training session:
* Watch the instruction video and read the standard operating procedure on the [[Heidelberg µPG 501|Heidelberg µPG 501 tool page]], shadow the tool with your group members, and ask for a sign-off session.
</div>
</div>

== Characterization ==

=== Bruker Dimension Icon Atomic Force Microscope (AFM) ===
Contact NBI-CR staff ([mailto:cleanroom@nbi.ku.dk cleanroom@nbi.ku.dk]) to request for AFM training.
<div class="mw-collapsible mw-collapsed" style="border:1px solid #c9ddf8; border-left:6px solid #3366cc; background:#f5f9ff; border-radius:6px; margin:0.45em 0 1.0em; padding:0.55em 0.75em 0.55em;">
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<div class="mw-collapsible-content">
* Have a sample ready that you want to characterize. Think about what you want to learn about the sample: step height, roughness, etc.
* Only request for training if you plan on using the tool regularly.
* Training is usually 2-3 sessions of 2-hour per session.
</div>
</div>

=== JEOL 7800-F ===
Prepare a real sample and imaging goals before booking JEOL 7800-F training.
<div class="mw-collapsible mw-collapsed" style="border:1px solid #b7e1c1; border-left:6px solid #2a9d5b; background:#f2fbf5; border-radius:6px; margin:0.45em 0 1.0em; padding:0.55em 0.75em 0.55em;">
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<div class="mw-collapsible-content">
* Training is usually 2-3 sessions of 2-hour per session.
* You need a chip/sample to be imaged before a session is booked.
* Be familiar with the materials on the sample to be imaged and what feature is it that is of critical interest -- something that makes or breaks your device.
* Request the training session only once you have gathered the chips and information.
* What is your project alias? If unsure, contact your supervisor first.
</div>
</div>

=== JEOL 7800-F prime (QuanTech) ===
Prepare a real sample and imaging goals before booking JEOL 7800-F Prime training.
<div class="mw-collapsible mw-collapsed" style="border:1px solid #b7e1c1; border-left:6px solid #2a9d5b; background:#f2fbf5; border-radius:6px; margin:0.45em 0 1.0em; padding:0.55em 0.75em 0.55em;">
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<div class="mw-collapsible-content">
* Training takes about 2-3 sessions.
* You need a chip/sample to be imaged before a session is booked.
* Be familiar with the materials on the sample to be imaged and what feature is it that is of critical interest -- something that makes or breaks your device.
* Request the training session only once you have gathered the chips and information.
* What is your project alias? If unsure, contact your supervisor first.
</div>
</div>

=== Raith e-Line ===
Bring a prepared design package for sessions 1 and 2, including alignment and overlay test patterns.
<div class="mw-collapsible mw-collapsed" style="border:1px solid #b8e2d5; border-left:6px solid #14866d; background:#f2fbf8; border-radius:6px; margin:0.45em 0 1.0em; padding:0.55em 0.75em 0.55em;">
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<div class="mw-collapsible-content">
* A design (gds, dxf, cif) for sessions 1 & 2 with:
** 4 alignment crosses (find out what marks work on the tool from your sub-group).
** Something to break the symmetry so you can tell chip orientation with your bare eye.
** A pattern that you will use to test overlay (alignment between two lithography steps). A Vernier pattern is commonly used. Feel free to test your ideas.
** Something creative, somethin fun :) This is an exercise in learning CAD as well.
* What is your project alias? If unsure, contact your supervisor first.
</div>
</div>

=== Woollam alpha-SE Ellipsometer ===
Request Woollam alpha-SE Ellipsometer training via [mailto:cleanroom@nbi.ku.dk cleanroom@nbi.ku.dk].
<div class="mw-collapsible mw-collapsed" style="border:1px solid #d8dde3; border-left:6px solid #72777d; background:#f8f9fa; border-radius:6px; margin:0.45em 0 1.0em; padding:0.55em 0.75em 0.55em;">
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<div class="mw-collapsible-content">
</div>
</div>

=== Filmetrics reflectometer ===
Contact Zhe Liu to arrange access and training for the Filmetrics reflectometer.
<div class="mw-collapsible mw-collapsed" style="border:1px solid #b7e1c1; border-left:6px solid #2a9d5b; background:#f2fbf5; border-radius:6px; margin:0.45em 0 1.0em; padding:0.55em 0.75em 0.55em;">
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<div class="mw-collapsible-content">
* Please contact Zhe Liu ([mailto:zhe.liu@nbi.ku.dk zhe.liu@nbi.ku.dk])
</div>
</div>

== Thin Film Deposition ==

=== PLASSYS Evaporator ===
Email your PLASSYS request with shadowing, sample, and process parameters.
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<div class="mw-collapsible-content">
Send an email with the following info before the training can be arranged:
* The name of the person you have shadowed and the number of times you've done it.
* Confirm that you have a sample ready.
* Specify the required process parameters( material, thickness, tilt etc)
* What is your project alias? If unsure, contact your supervisor first.
==== Training ====
* You'll need 3 sessions to get trained on this tool.
** Session 1 ( 2 hr.) - teaches you how to load/unload the sample and how to run a recipe.
** Session 2 ( 2 hr.) - sign off session
</div>
</div>

=== AJA metallization, sputtering or ion milling ===
Email your training request with shadowing, sample, tool, process, and recipe details for AJA.
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<div class="mw-collapsible-content">
Send an email with the following info before the training can be arranged:
* The name of the person you have shadowed and the number of times you've done it.
* Confirm that you have a sample ready.
* Which tool you want to use: AJA1 or AJA2?
* What process do you want to run ?
* Either the recipe name or specify the required process parameters.
* What is your project alias? If unsure, contact your supervisor first.

Before the training session:
* Watch the instruction video on how to load/unload and read the standard operating procedures on the [[AJA Systems|AJA Systems tool page]]
==== Training ====
* You'll need 3 sessions to get trained on this tool.
** Session 1 ( 2 hr.) - teaches you how to load/unload the sample and how to run a recipe.
** Session 2 ( 2 hr.) - sign off session
</div>
</div>

=== ALD 1 ===
Email your ALD 1 request with shadowing, sample, and full process details.
<div class="mw-collapsible mw-collapsed" style="border:1px solid #f0d4ac; border-left:6px solid #c77700; background:#fff8ef; border-radius:6px; margin:0.45em 0 1.0em; padding:0.55em 0.75em 0.55em;">
<div class="mw-collapsible-toggle" style="text-align:right; margin:-0.62em 0 0.25em; line-height:1;">'''Expand'''</div>
<div class="mw-collapsible-content">
Send an email with the following info before the training can be arranged:
* The name of the person you have shadowed and the number of times you've done it.
* Confirm that you have a sample ready.
* Which tool you want to use.
* What process steps you want to run.
** Either the recipe name or all required process parameters.
** How long does the process take.
* What is your project alias? If unsure, contact your supervisor first.

Before the training session:
* Watch the instruction video(s) and read the standard operating procedure on the [[Cambridge ALD|ALD tool page]].

=== AJA metallization, sputtering or ion milling ===
Email your training request with shadowing, sample, tool, process, and recipe details for AJA.
<div class="mw-collapsible mw-collapsed" style="border:1px solid #f0d4ac; border-left:6px solid #c77700; background:#fff8ef; border-radius:6px; margin:0.45em 0 1.0em; padding:0.55em 0.75em 0.55em;">
<div class="mw-collapsible-toggle" style="text-align:right; margin:-0.62em 0 0.25em; line-height:1;">'''Expand'''</div>
<div class="mw-collapsible-content">
Send an email with the following info before the training can be arranged:
* The name of the person you have shadowed and the number of times you've done it.
* Confirm that you have a sample ready.
* Which tool you want to use: AJA1 or AJA2?
* What process do you want to run ?
* Either the recipe name or specify the required process parameters.
* What is your project alias? If unsure, contact your supervisor first.

Before the training session:
* Watch the instruction video on how to load/unload and read the standard operating procedures on the [[AJA Systems|AJA Systems tool page]]

==== Training ====
* You'll need 2 sessions to get access on this tool.
** Session 1 ( 2 hr.) - teaches you how to load/unload the sample and how to run a recipe.
** Session 2 ( 2 hr.) - sign off session

</div>
</div>

</div>
</div>

=== ALD 2 ===
Email your ALD 2 request with shadowing, sample, and full process details.
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<div class="mw-collapsible-toggle" style="text-align:right; margin:-0.62em 0 0.25em; line-height:1;">'''Expand'''</div>
<div class="mw-collapsible-content">
Send an email with the following info before the training can be arranged:
* The name of the person you have shadowed and the number of times you've done it.
* Confirm that you have a sample ready.
* Which tool you want to use.
* What process steps you want to run.
** Either the recipe name or all required process parameters.
** How long does the process take.
* What is your project alias? If unsure, contact your supervisor first.

Before the training session:
* Watch the instruction video(s) and read the standard operating procedure on the [[Cambridge ALD|ALD tool page]].
</div>
</div>

== Packaging ==

=== F&S autobonder ===
Prepare shadowing and bonding documentation, then request F&S autobonder training.
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<div class="mw-collapsible-content">
Send an email with the following info before the training can be arranged:

* Shadow colleagues using the tool 2-3 times.
* You must have a '''chip''' for bonding.
* You must know which '''daughterboard''' you will use for bonding.
* You must know what material you use to '''mount''' the chip to the daughterboard (silver paint, PMMA or whatever is specific to your measurement).
* You must prepare a '''bonding schematic''' and have one of your team members verify that it is correct.
* What is your project alias? If unsure, contact your supervisor first.
* Read through the wiki page: https://wiki.nbi.ku.dk/cleanroom/FS_bonder
* Request a training session at this point.

Two training sessions are required to get access to the bonder:

# 3 hours: Basic bonder training and chip bonding
# 2 hours: Sign-off session
</div>
</div>

=== Manual bonder ===
Request manual bonder training via [mailto:cleanroom@nbi.ku.dk cleanroom@nbi.ku.dk].
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<div class="mw-collapsible-content">
</div>
</div>

== Miscellaneous ==

=== Micromanipulator ===
Complete group-level training first, then request a micromanipulator sign-off session.
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<div class="mw-collapsible-content">
* Please get trained within your research group first. Then request a sign-off session.
* What is your project alias? If unsure, contact your supervisor first.
</div>
</div>

[[Category:Tools]]

Training

2026-04-17T09:53:42Z

Harry: /* AJA metallization, sputtering or ion milling */

A prerequisite for using the cleanroom [[Tools|tools]] is that a [[About|cleanroom staff]] member has given the necessary instruction or training.
This includes basic instruments such as hotplates and microscopes.
For '''all''' training requests, please read the prerequisites below and afterwards contact [mailto:cleanroom@nbi.ku.dk cleanroom@nbi.ku.dk].
A cleanroom staff member will typically respond within one workday.
Do not contact individual staff members for training.

Once the user has completed the training, they are given booking rights in the [http://cleanroom.brickhost.com cleanroom booking system].
However, after a certain period of inactivity (typically 90 days) on a given tool, the booking rights will expire and the user will need to be retrained in order to continue using the tool.

== Cleanroom General Introduction ==

=== Cleanroom general introduction ===
Request cleanroom introduction training via [mailto:cleanroom@nbi.ku.dk cleanroom@nbi.ku.dk].
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<div class="mw-collapsible-content">
* Name a superuser from your group who will follow you in the cleanroom 2-3 times after your training.
* Introduction training requires acceptance from all of you and typically runs from 9.30 to 15.00.
* Before training, read the safety information: https://wiki.nbi.ku.dk/cleanroom/Safety
* Typical schedule:
** 9.15-10.30: Cleanroom introduction
** Coffee break
** 10.45-12.00: Asher, spinners, and optical microscopes
** Lunch break
** 13.00-14.00: Practical information inside and outside the lab
** 14.00-15.00: Q&A and account setup
</div>
</div>

== Lithography ==

=== Elionix 7000 (100 kV) ===
Elionix 7000 training is for advanced users and requires prior cleanroom tool competency.

Contact Harry (cleanroom@nbi.ku.dk) to request training.
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<div class="mw-collapsible-content">
==== Prerequisites ====
* You must be at least a Master student or signed up for a long term (>6 months) project to be allowed to use the tool.
* Elionix is a high level tool. Make sure you are already trained to:
** Enter the cleanroom
** Use the microscope, spinner, asher

==== Training ====
* You'll need 4 sessions to get trained on this tool.
** Session 1 ( 1 hr.) - teaches you how to load/unload the sample and how to condition the beam.
** Session 2 ( 3 hr.) - involves exposing alignment marks and test patterns (any design: preferably one half of the overlay ,so to understand alignment later ).
** Session 3 ( 3 hr.) - involves using the exposed alignment marks for marker registration and exposing the 2nd pattern (i.e. the 2nd half of the overlay pattern).
** Session 4 involves exposing a "real" pattern on a "real" chip on your own to gain access.

==== Preparation ====
Before any training slots are booked on the tool you'll need all of the following prepared:
* Shadow senior users on the tool 2-3 times.
* Chip (comfortable to handle) spin coated with resist. This chip will be used for sessions 1 & 2. Please be aware of the coating and baking parameters for the resist.
* Any test design is preferred which has marks, overlay patterns that you will use to test alignment precision between two lithography steps. A Vernier pattern is commonly used. Feel free to test your ideas. Make sure you have something for both ''x'' and ''y'' directions. If you don't know how to start, check the [[Design template for EBL]].
* Convert your design files into the Elionix exposure format .co7. This can be done using Beamer in 4th floor design computers.
* Make sure all write fields are entirely in the positive coordinate space.
* Make sure neither exposure will take longer than 60 minutes at 500 pA current and dose of 1000 uC/cm2.
</div>
</div>

=== Elionix F-125 (125 kV at QuanTech) ===
Contact Zhe Liu to arrange access and training for Elionix F-125.
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<div class="mw-collapsible-content">
* Please contact Zhe Liu ([mailto:zhe.liu@nbi.ku.dk zhe.liu@nbi.ku.dk])
</div>
</div>

=== Heidelberg upg501 ===
Prepare your design file and coated chip before requesting Heidelberg upg501 training.
<div class="mw-collapsible mw-collapsed" style="border:1px solid #b8e2d5; border-left:6px solid #14866d; background:#f2fbf8; border-radius:6px; margin:0.45em 0 1.0em; padding:0.55em 0.75em 0.55em;">
<div class="mw-collapsible-toggle" style="text-align:right; margin:-0.62em 0 0.25em; line-height:1;">'''Expand'''</div>
<div class="mw-collapsible-content">
* Have a design file ready. GDS, DXF or CIF format works fine. Make sure you are familiar with the design before your actual session.
* Have a chip spin coated with an appropriate photoresist before the training session.
** The photoresist is sensitive to white light. Use the yellow filter on the microscopes. The light source in the both scribers is white and will already expose your resist.
* What is your project alias? If unsure, contact your supervisor first.

Before the training session:
* Watch the instruction video and read the standard operating procedure on the [[Heidelberg µPG 501|Heidelberg µPG 501 tool page]], shadow the tool with your group members, and ask for a sign-off session.
</div>
</div>

== Characterization ==

=== Bruker Dimension Icon Atomic Force Microscope (AFM) ===
Contact NBI-CR staff ([mailto:cleanroom@nbi.ku.dk cleanroom@nbi.ku.dk]) to request for AFM training.
<div class="mw-collapsible mw-collapsed" style="border:1px solid #c9ddf8; border-left:6px solid #3366cc; background:#f5f9ff; border-radius:6px; margin:0.45em 0 1.0em; padding:0.55em 0.75em 0.55em;">
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<div class="mw-collapsible-content">
* Have a sample ready that you want to characterize. Think about what you want to learn about the sample: step height, roughness, etc.
* Only request for training if you plan on using the tool regularly.
* Training is usually 2-3 sessions of 2-hour per session.
</div>
</div>

=== JEOL 7800-F ===
Prepare a real sample and imaging goals before booking JEOL 7800-F training.
<div class="mw-collapsible mw-collapsed" style="border:1px solid #b7e1c1; border-left:6px solid #2a9d5b; background:#f2fbf5; border-radius:6px; margin:0.45em 0 1.0em; padding:0.55em 0.75em 0.55em;">
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<div class="mw-collapsible-content">
* Training is usually 2-3 sessions of 2-hour per session.
* You need a chip/sample to be imaged before a session is booked.
* Be familiar with the materials on the sample to be imaged and what feature is it that is of critical interest -- something that makes or breaks your device.
* Request the training session only once you have gathered the chips and information.
* What is your project alias? If unsure, contact your supervisor first.
</div>
</div>

=== JEOL 7800-F prime (QuanTech) ===
Prepare a real sample and imaging goals before booking JEOL 7800-F Prime training.
<div class="mw-collapsible mw-collapsed" style="border:1px solid #b7e1c1; border-left:6px solid #2a9d5b; background:#f2fbf5; border-radius:6px; margin:0.45em 0 1.0em; padding:0.55em 0.75em 0.55em;">
<div class="mw-collapsible-toggle" style="text-align:right; margin:-0.62em 0 0.25em; line-height:1;">'''Expand'''</div>
<div class="mw-collapsible-content">
* Training takes about 2-3 sessions.
* You need a chip/sample to be imaged before a session is booked.
* Be familiar with the materials on the sample to be imaged and what feature is it that is of critical interest -- something that makes or breaks your device.
* Request the training session only once you have gathered the chips and information.
* What is your project alias? If unsure, contact your supervisor first.
</div>
</div>

=== Raith e-Line ===
Bring a prepared design package for sessions 1 and 2, including alignment and overlay test patterns.
<div class="mw-collapsible mw-collapsed" style="border:1px solid #b8e2d5; border-left:6px solid #14866d; background:#f2fbf8; border-radius:6px; margin:0.45em 0 1.0em; padding:0.55em 0.75em 0.55em;">
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<div class="mw-collapsible-content">
* A design (gds, dxf, cif) for sessions 1 & 2 with:
** 4 alignment crosses (find out what marks work on the tool from your sub-group).
** Something to break the symmetry so you can tell chip orientation with your bare eye.
** A pattern that you will use to test overlay (alignment between two lithography steps). A Vernier pattern is commonly used. Feel free to test your ideas.
** Something creative, somethin fun :) This is an exercise in learning CAD as well.
* What is your project alias? If unsure, contact your supervisor first.
</div>
</div>

=== Woollam alpha-SE Ellipsometer ===
Request Woollam alpha-SE Ellipsometer training via [mailto:cleanroom@nbi.ku.dk cleanroom@nbi.ku.dk].
<div class="mw-collapsible mw-collapsed" style="border:1px solid #d8dde3; border-left:6px solid #72777d; background:#f8f9fa; border-radius:6px; margin:0.45em 0 1.0em; padding:0.55em 0.75em 0.55em;">
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<div class="mw-collapsible-content">
</div>
</div>

=== Filmetrics reflectometer ===
Contact Zhe Liu to arrange access and training for the Filmetrics reflectometer.
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<div class="mw-collapsible-content">
* Please contact Zhe Liu ([mailto:zhe.liu@nbi.ku.dk zhe.liu@nbi.ku.dk])
</div>
</div>

== Thin Film Deposition ==

=== PLASSYS Evaporator ===
Email your PLASSYS request with shadowing, sample, and process parameters.
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<div class="mw-collapsible-content">
Send an email with the following info before the training can be arranged:
* The name of the person you have shadowed and the number of times you've done it.
* Confirm that you have a sample ready.
* Specify the required process parameters( material, thickness, tilt etc)
* What is your project alias? If unsure, contact your supervisor first.
==== Training ====
* You'll need 3 sessions to get trained on this tool.
** Session 1 ( 2 hr.) - teaches you how to load/unload the sample and how to run a recipe.
** Session 2 ( 2 hr.) - sign off session
</div>
</div>

=== AJA metallization, sputtering or ion milling ===
Email your training request with shadowing, sample, tool, process, and recipe details for AJA.
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<div class="mw-collapsible-content">
Send an email with the following info before the training can be arranged:
* The name of the person you have shadowed and the number of times you've done it.
* Confirm that you have a sample ready.
* Which tool you want to use: AJA1 or AJA2?
* What process do you want to run ?
* Either the recipe name or specify the required process parameters.
* What is your project alias? If unsure, contact your supervisor first.

Before the training session:
* Watch the instruction video on how to load/unload and read the standard operating procedures on the [[AJA Systems|AJA Systems tool page]]
==== Training ====
* You'll need 3 sessions to get trained on this tool.
** Session 1 ( 2 hr.) - teaches you how to load/unload the sample and how to run a recipe.
** Session 2 ( 2 hr.) - sign off session
</div>
</div>

=== ALD 1 ===
Email your ALD 1 request with shadowing, sample, and full process details.
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<div class="mw-collapsible-content">
Send an email with the following info before the training can be arranged:
* The name of the person you have shadowed and the number of times you've done it.
* Confirm that you have a sample ready.
* Which tool you want to use.
* What process steps you want to run.
** Either the recipe name or all required process parameters.
** How long does the process take.
* What is your project alias? If unsure, contact your supervisor first.

Before the training session:
* Watch the instruction video(s) and read the standard operating procedure on the [[Cambridge ALD|ALD tool page]].
</div>
</div>

=== ALD 2 ===
Email your ALD 2 request with shadowing, sample, and full process details.
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<div class="mw-collapsible-toggle" style="text-align:right; margin:-0.62em 0 0.25em; line-height:1;">'''Expand'''</div>
<div class="mw-collapsible-content">
Send an email with the following info before the training can be arranged:
* The name of the person you have shadowed and the number of times you've done it.
* Confirm that you have a sample ready.
* Which tool you want to use.
* What process steps you want to run.
** Either the recipe name or all required process parameters.
** How long does the process take.
* What is your project alias? If unsure, contact your supervisor first.

Before the training session:
* Watch the instruction video(s) and read the standard operating procedure on the [[Cambridge ALD|ALD tool page]].
</div>
</div>

== Packaging ==

=== F&S autobonder ===
Prepare shadowing and bonding documentation, then request F&S autobonder training.
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<div class="mw-collapsible-content">
Send an email with the following info before the training can be arranged:

* Shadow colleagues using the tool 2-3 times.
* You must have a '''chip''' for bonding.
* You must know which '''daughterboard''' you will use for bonding.
* You must know what material you use to '''mount''' the chip to the daughterboard (silver paint, PMMA or whatever is specific to your measurement).
* You must prepare a '''bonding schematic''' and have one of your team members verify that it is correct.
* What is your project alias? If unsure, contact your supervisor first.
* Read through the wiki page: https://wiki.nbi.ku.dk/cleanroom/FS_bonder
* Request a training session at this point.

Two training sessions are required to get access to the bonder:

# 3 hours: Basic bonder training and chip bonding
# 2 hours: Sign-off session
</div>
</div>

=== Manual bonder ===
Request manual bonder training via [mailto:cleanroom@nbi.ku.dk cleanroom@nbi.ku.dk].
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<div class="mw-collapsible-content">
</div>
</div>

== Miscellaneous ==

=== Micromanipulator ===
Complete group-level training first, then request a micromanipulator sign-off session.
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<div class="mw-collapsible-content">
* Please get trained within your research group first. Then request a sign-off session.
* What is your project alias? If unsure, contact your supervisor first.
</div>
</div>

[[Category:Tools]]

Training

2026-04-17T09:52:50Z

Harry: /* PLASSYS Evaporator */

A prerequisite for using the cleanroom [[Tools|tools]] is that a [[About|cleanroom staff]] member has given the necessary instruction or training.
This includes basic instruments such as hotplates and microscopes.
For '''all''' training requests, please read the prerequisites below and afterwards contact [mailto:cleanroom@nbi.ku.dk cleanroom@nbi.ku.dk].
A cleanroom staff member will typically respond within one workday.
Do not contact individual staff members for training.

Once the user has completed the training, they are given booking rights in the [http://cleanroom.brickhost.com cleanroom booking system].
However, after a certain period of inactivity (typically 90 days) on a given tool, the booking rights will expire and the user will need to be retrained in order to continue using the tool.

== Cleanroom General Introduction ==

=== Cleanroom general introduction ===
Request cleanroom introduction training via [mailto:cleanroom@nbi.ku.dk cleanroom@nbi.ku.dk].
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<div class="mw-collapsible-content">
* Name a superuser from your group who will follow you in the cleanroom 2-3 times after your training.
* Introduction training requires acceptance from all of you and typically runs from 9.30 to 15.00.
* Before training, read the safety information: https://wiki.nbi.ku.dk/cleanroom/Safety
* Typical schedule:
** 9.15-10.30: Cleanroom introduction
** Coffee break
** 10.45-12.00: Asher, spinners, and optical microscopes
** Lunch break
** 13.00-14.00: Practical information inside and outside the lab
** 14.00-15.00: Q&A and account setup
</div>
</div>

== Lithography ==

=== Elionix 7000 (100 kV) ===
Elionix 7000 training is for advanced users and requires prior cleanroom tool competency.

Contact Harry (cleanroom@nbi.ku.dk) to request training.
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<div class="mw-collapsible-content">
==== Prerequisites ====
* You must be at least a Master student or signed up for a long term (>6 months) project to be allowed to use the tool.
* Elionix is a high level tool. Make sure you are already trained to:
** Enter the cleanroom
** Use the microscope, spinner, asher

==== Training ====
* You'll need 4 sessions to get trained on this tool.
** Session 1 ( 1 hr.) - teaches you how to load/unload the sample and how to condition the beam.
** Session 2 ( 3 hr.) - involves exposing alignment marks and test patterns (any design: preferably one half of the overlay ,so to understand alignment later ).
** Session 3 ( 3 hr.) - involves using the exposed alignment marks for marker registration and exposing the 2nd pattern (i.e. the 2nd half of the overlay pattern).
** Session 4 involves exposing a "real" pattern on a "real" chip on your own to gain access.

==== Preparation ====
Before any training slots are booked on the tool you'll need all of the following prepared:
* Shadow senior users on the tool 2-3 times.
* Chip (comfortable to handle) spin coated with resist. This chip will be used for sessions 1 & 2. Please be aware of the coating and baking parameters for the resist.
* Any test design is preferred which has marks, overlay patterns that you will use to test alignment precision between two lithography steps. A Vernier pattern is commonly used. Feel free to test your ideas. Make sure you have something for both ''x'' and ''y'' directions. If you don't know how to start, check the [[Design template for EBL]].
* Convert your design files into the Elionix exposure format .co7. This can be done using Beamer in 4th floor design computers.
* Make sure all write fields are entirely in the positive coordinate space.
* Make sure neither exposure will take longer than 60 minutes at 500 pA current and dose of 1000 uC/cm2.
</div>
</div>

=== Elionix F-125 (125 kV at QuanTech) ===
Contact Zhe Liu to arrange access and training for Elionix F-125.
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<div class="mw-collapsible-content">
* Please contact Zhe Liu ([mailto:zhe.liu@nbi.ku.dk zhe.liu@nbi.ku.dk])
</div>
</div>

=== Heidelberg upg501 ===
Prepare your design file and coated chip before requesting Heidelberg upg501 training.
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<div class="mw-collapsible-content">
* Have a design file ready. GDS, DXF or CIF format works fine. Make sure you are familiar with the design before your actual session.
* Have a chip spin coated with an appropriate photoresist before the training session.
** The photoresist is sensitive to white light. Use the yellow filter on the microscopes. The light source in the both scribers is white and will already expose your resist.
* What is your project alias? If unsure, contact your supervisor first.

Before the training session:
* Watch the instruction video and read the standard operating procedure on the [[Heidelberg µPG 501|Heidelberg µPG 501 tool page]], shadow the tool with your group members, and ask for a sign-off session.
</div>
</div>

== Characterization ==

=== Bruker Dimension Icon Atomic Force Microscope (AFM) ===
Contact NBI-CR staff ([mailto:cleanroom@nbi.ku.dk cleanroom@nbi.ku.dk]) to request for AFM training.
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<div class="mw-collapsible-content">
* Have a sample ready that you want to characterize. Think about what you want to learn about the sample: step height, roughness, etc.
* Only request for training if you plan on using the tool regularly.
* Training is usually 2-3 sessions of 2-hour per session.
</div>
</div>

=== JEOL 7800-F ===
Prepare a real sample and imaging goals before booking JEOL 7800-F training.
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<div class="mw-collapsible-content">
* Training is usually 2-3 sessions of 2-hour per session.
* You need a chip/sample to be imaged before a session is booked.
* Be familiar with the materials on the sample to be imaged and what feature is it that is of critical interest -- something that makes or breaks your device.
* Request the training session only once you have gathered the chips and information.
* What is your project alias? If unsure, contact your supervisor first.
</div>
</div>

=== JEOL 7800-F prime (QuanTech) ===
Prepare a real sample and imaging goals before booking JEOL 7800-F Prime training.
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<div class="mw-collapsible-content">
* Training takes about 2-3 sessions.
* You need a chip/sample to be imaged before a session is booked.
* Be familiar with the materials on the sample to be imaged and what feature is it that is of critical interest -- something that makes or breaks your device.
* Request the training session only once you have gathered the chips and information.
* What is your project alias? If unsure, contact your supervisor first.
</div>
</div>

=== Raith e-Line ===
Bring a prepared design package for sessions 1 and 2, including alignment and overlay test patterns.
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<div class="mw-collapsible-content">
* A design (gds, dxf, cif) for sessions 1 & 2 with:
** 4 alignment crosses (find out what marks work on the tool from your sub-group).
** Something to break the symmetry so you can tell chip orientation with your bare eye.
** A pattern that you will use to test overlay (alignment between two lithography steps). A Vernier pattern is commonly used. Feel free to test your ideas.
** Something creative, somethin fun :) This is an exercise in learning CAD as well.
* What is your project alias? If unsure, contact your supervisor first.
</div>
</div>

=== Woollam alpha-SE Ellipsometer ===
Request Woollam alpha-SE Ellipsometer training via [mailto:cleanroom@nbi.ku.dk cleanroom@nbi.ku.dk].
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<div class="mw-collapsible-content">
</div>
</div>

=== Filmetrics reflectometer ===
Contact Zhe Liu to arrange access and training for the Filmetrics reflectometer.
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<div class="mw-collapsible-content">
* Please contact Zhe Liu ([mailto:zhe.liu@nbi.ku.dk zhe.liu@nbi.ku.dk])
</div>
</div>

== Thin Film Deposition ==

=== PLASSYS Evaporator ===
Email your PLASSYS request with shadowing, sample, and process parameters.
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<div class="mw-collapsible-content">
Send an email with the following info before the training can be arranged:
* The name of the person you have shadowed and the number of times you've done it.
* Confirm that you have a sample ready.
* Specify the required process parameters( material, thickness, tilt etc)
* What is your project alias? If unsure, contact your supervisor first.
==== Training ====
* You'll need 3 sessions to get trained on this tool.
** Session 1 ( 2 hr.) - teaches you how to load/unload the sample and how to run a recipe.
** Session 2 ( 2 hr.) - sign off session
</div>
</div>

=== AJA metallization, sputtering or ion milling ===
Email your training request with shadowing, sample, tool, process, and recipe details for AJA.
<div class="mw-collapsible mw-collapsed" style="border:1px solid #f0d4ac; border-left:6px solid #c77700; background:#fff8ef; border-radius:6px; margin:0.45em 0 1.0em; padding:0.55em 0.75em 0.55em;">
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<div class="mw-collapsible-content">
Send an email with the following info before the training can be arranged:
* The name of the person you have shadowed and the number of times you've done it.
* Confirm that you have a sample ready.
* Which tool you want to use: AJA1 or AJA2?
* What process do you want to run ?
* Either the recipe name or specify the required process parameters.
* What is your project alias? If unsure, contact your supervisor first.

Before the training session:
* Watch the instruction video on how to load/unload and read the standard operating procedures on the [[AJA Systems|AJA Systems tool page]]
</div>
</div>

=== ALD 1 ===
Email your ALD 1 request with shadowing, sample, and full process details.
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<div class="mw-collapsible-toggle" style="text-align:right; margin:-0.62em 0 0.25em; line-height:1;">'''Expand'''</div>
<div class="mw-collapsible-content">
Send an email with the following info before the training can be arranged:
* The name of the person you have shadowed and the number of times you've done it.
* Confirm that you have a sample ready.
* Which tool you want to use.
* What process steps you want to run.
** Either the recipe name or all required process parameters.
** How long does the process take.
* What is your project alias? If unsure, contact your supervisor first.

Before the training session:
* Watch the instruction video(s) and read the standard operating procedure on the [[Cambridge ALD|ALD tool page]].
</div>
</div>

=== ALD 2 ===
Email your ALD 2 request with shadowing, sample, and full process details.
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<div class="mw-collapsible-toggle" style="text-align:right; margin:-0.62em 0 0.25em; line-height:1;">'''Expand'''</div>
<div class="mw-collapsible-content">
Send an email with the following info before the training can be arranged:
* The name of the person you have shadowed and the number of times you've done it.
* Confirm that you have a sample ready.
* Which tool you want to use.
* What process steps you want to run.
** Either the recipe name or all required process parameters.
** How long does the process take.
* What is your project alias? If unsure, contact your supervisor first.

Before the training session:
* Watch the instruction video(s) and read the standard operating procedure on the [[Cambridge ALD|ALD tool page]].
</div>
</div>

== Packaging ==

=== F&S autobonder ===
Prepare shadowing and bonding documentation, then request F&S autobonder training.
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<div class="mw-collapsible-content">
Send an email with the following info before the training can be arranged:

* Shadow colleagues using the tool 2-3 times.
* You must have a '''chip''' for bonding.
* You must know which '''daughterboard''' you will use for bonding.
* You must know what material you use to '''mount''' the chip to the daughterboard (silver paint, PMMA or whatever is specific to your measurement).
* You must prepare a '''bonding schematic''' and have one of your team members verify that it is correct.
* What is your project alias? If unsure, contact your supervisor first.
* Read through the wiki page: https://wiki.nbi.ku.dk/cleanroom/FS_bonder
* Request a training session at this point.

Two training sessions are required to get access to the bonder:

# 3 hours: Basic bonder training and chip bonding
# 2 hours: Sign-off session
</div>
</div>

=== Manual bonder ===
Request manual bonder training via [mailto:cleanroom@nbi.ku.dk cleanroom@nbi.ku.dk].
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</div>
</div>

== Miscellaneous ==

=== Micromanipulator ===
Complete group-level training first, then request a micromanipulator sign-off session.
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<div class="mw-collapsible-toggle" style="text-align:right; margin:-0.62em 0 0.25em; line-height:1;">'''Expand'''</div>
<div class="mw-collapsible-content">
* Please get trained within your research group first. Then request a sign-off session.
* What is your project alias? If unsure, contact your supervisor first.
</div>
</div>

[[Category:Tools]]

Training

2026-04-17T09:51:54Z

Harry: /* Training */

A prerequisite for using the cleanroom [[Tools|tools]] is that a [[About|cleanroom staff]] member has given the necessary instruction or training.
This includes basic instruments such as hotplates and microscopes.
For '''all''' training requests, please read the prerequisites below and afterwards contact [mailto:cleanroom@nbi.ku.dk cleanroom@nbi.ku.dk].
A cleanroom staff member will typically respond within one workday.
Do not contact individual staff members for training.

Once the user has completed the training, they are given booking rights in the [http://cleanroom.brickhost.com cleanroom booking system].
However, after a certain period of inactivity (typically 90 days) on a given tool, the booking rights will expire and the user will need to be retrained in order to continue using the tool.

== Cleanroom General Introduction ==

=== Cleanroom general introduction ===
Request cleanroom introduction training via [mailto:cleanroom@nbi.ku.dk cleanroom@nbi.ku.dk].
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* Name a superuser from your group who will follow you in the cleanroom 2-3 times after your training.
* Introduction training requires acceptance from all of you and typically runs from 9.30 to 15.00.
* Before training, read the safety information: https://wiki.nbi.ku.dk/cleanroom/Safety
* Typical schedule:
** 9.15-10.30: Cleanroom introduction
** Coffee break
** 10.45-12.00: Asher, spinners, and optical microscopes
** Lunch break
** 13.00-14.00: Practical information inside and outside the lab
** 14.00-15.00: Q&A and account setup
</div>
</div>

== Lithography ==

=== Elionix 7000 (100 kV) ===
Elionix 7000 training is for advanced users and requires prior cleanroom tool competency.

Contact Harry (cleanroom@nbi.ku.dk) to request training.
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==== Prerequisites ====
* You must be at least a Master student or signed up for a long term (>6 months) project to be allowed to use the tool.
* Elionix is a high level tool. Make sure you are already trained to:
** Enter the cleanroom
** Use the microscope, spinner, asher

==== Training ====
* You'll need 4 sessions to get trained on this tool.
** Session 1 ( 1 hr.) - teaches you how to load/unload the sample and how to condition the beam.
** Session 2 ( 3 hr.) - involves exposing alignment marks and test patterns (any design: preferably one half of the overlay ,so to understand alignment later ).
** Session 3 ( 3 hr.) - involves using the exposed alignment marks for marker registration and exposing the 2nd pattern (i.e. the 2nd half of the overlay pattern).
** Session 4 involves exposing a "real" pattern on a "real" chip on your own to gain access.

==== Preparation ====
Before any training slots are booked on the tool you'll need all of the following prepared:
* Shadow senior users on the tool 2-3 times.
* Chip (comfortable to handle) spin coated with resist. This chip will be used for sessions 1 & 2. Please be aware of the coating and baking parameters for the resist.
* Any test design is preferred which has marks, overlay patterns that you will use to test alignment precision between two lithography steps. A Vernier pattern is commonly used. Feel free to test your ideas. Make sure you have something for both ''x'' and ''y'' directions. If you don't know how to start, check the [[Design template for EBL]].
* Convert your design files into the Elionix exposure format .co7. This can be done using Beamer in 4th floor design computers.
* Make sure all write fields are entirely in the positive coordinate space.
* Make sure neither exposure will take longer than 60 minutes at 500 pA current and dose of 1000 uC/cm2.
</div>
</div>

=== Elionix F-125 (125 kV at QuanTech) ===
Contact Zhe Liu to arrange access and training for Elionix F-125.
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* Please contact Zhe Liu ([mailto:zhe.liu@nbi.ku.dk zhe.liu@nbi.ku.dk])
</div>
</div>

=== Heidelberg upg501 ===
Prepare your design file and coated chip before requesting Heidelberg upg501 training.
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* Have a design file ready. GDS, DXF or CIF format works fine. Make sure you are familiar with the design before your actual session.
* Have a chip spin coated with an appropriate photoresist before the training session.
** The photoresist is sensitive to white light. Use the yellow filter on the microscopes. The light source in the both scribers is white and will already expose your resist.
* What is your project alias? If unsure, contact your supervisor first.

Before the training session:
* Watch the instruction video and read the standard operating procedure on the [[Heidelberg µPG 501|Heidelberg µPG 501 tool page]], shadow the tool with your group members, and ask for a sign-off session.
</div>
</div>

== Characterization ==

=== Bruker Dimension Icon Atomic Force Microscope (AFM) ===
Contact NBI-CR staff ([mailto:cleanroom@nbi.ku.dk cleanroom@nbi.ku.dk]) to request for AFM training.
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<div class="mw-collapsible-content">
* Have a sample ready that you want to characterize. Think about what you want to learn about the sample: step height, roughness, etc.
* Only request for training if you plan on using the tool regularly.
* Training is usually 2-3 sessions of 2-hour per session.
</div>
</div>

=== JEOL 7800-F ===
Prepare a real sample and imaging goals before booking JEOL 7800-F training.
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* Training is usually 2-3 sessions of 2-hour per session.
* You need a chip/sample to be imaged before a session is booked.
* Be familiar with the materials on the sample to be imaged and what feature is it that is of critical interest -- something that makes or breaks your device.
* Request the training session only once you have gathered the chips and information.
* What is your project alias? If unsure, contact your supervisor first.
</div>
</div>

=== JEOL 7800-F prime (QuanTech) ===
Prepare a real sample and imaging goals before booking JEOL 7800-F Prime training.
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<div class="mw-collapsible-content">
* Training takes about 2-3 sessions.
* You need a chip/sample to be imaged before a session is booked.
* Be familiar with the materials on the sample to be imaged and what feature is it that is of critical interest -- something that makes or breaks your device.
* Request the training session only once you have gathered the chips and information.
* What is your project alias? If unsure, contact your supervisor first.
</div>
</div>

=== Raith e-Line ===
Bring a prepared design package for sessions 1 and 2, including alignment and overlay test patterns.
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<div class="mw-collapsible-content">
* A design (gds, dxf, cif) for sessions 1 & 2 with:
** 4 alignment crosses (find out what marks work on the tool from your sub-group).
** Something to break the symmetry so you can tell chip orientation with your bare eye.
** A pattern that you will use to test overlay (alignment between two lithography steps). A Vernier pattern is commonly used. Feel free to test your ideas.
** Something creative, somethin fun :) This is an exercise in learning CAD as well.
* What is your project alias? If unsure, contact your supervisor first.
</div>
</div>

=== Woollam alpha-SE Ellipsometer ===
Request Woollam alpha-SE Ellipsometer training via [mailto:cleanroom@nbi.ku.dk cleanroom@nbi.ku.dk].
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</div>
</div>

=== Filmetrics reflectometer ===
Contact Zhe Liu to arrange access and training for the Filmetrics reflectometer.
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* Please contact Zhe Liu ([mailto:zhe.liu@nbi.ku.dk zhe.liu@nbi.ku.dk])
</div>
</div>

== Thin Film Deposition ==

=== PLASSYS Evaporator ===
Email your PLASSYS request with shadowing, sample, and process parameters.
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<div class="mw-collapsible-content">
Send an email with the following info before the training can be arranged:
* The name of the person you have shadowed and the number of times you've done it.
* Confirm that you have a sample ready.
* Specify the required process parameters( material, thickness, tilt etc)
* What is your project alias? If unsure, contact your supervisor first.
==== Training ====
* You'll need 3 sessions to get trained on this tool.
** Session 1 ( 1 hr.) - teaches you how to load/unload the sample and how to run a recipe.
** Session 2 ( 2 hr.) - sign off session
</div>
</div>

=== AJA metallization, sputtering or ion milling ===
Email your training request with shadowing, sample, tool, process, and recipe details for AJA.
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Send an email with the following info before the training can be arranged:
* The name of the person you have shadowed and the number of times you've done it.
* Confirm that you have a sample ready.
* Which tool you want to use: AJA1 or AJA2?
* What process do you want to run ?
* Either the recipe name or specify the required process parameters.
* What is your project alias? If unsure, contact your supervisor first.

Before the training session:
* Watch the instruction video on how to load/unload and read the standard operating procedures on the [[AJA Systems|AJA Systems tool page]]
</div>
</div>

=== ALD 1 ===
Email your ALD 1 request with shadowing, sample, and full process details.
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<div class="mw-collapsible-content">
Send an email with the following info before the training can be arranged:
* The name of the person you have shadowed and the number of times you've done it.
* Confirm that you have a sample ready.
* Which tool you want to use.
* What process steps you want to run.
** Either the recipe name or all required process parameters.
** How long does the process take.
* What is your project alias? If unsure, contact your supervisor first.

Before the training session:
* Watch the instruction video(s) and read the standard operating procedure on the [[Cambridge ALD|ALD tool page]].
</div>
</div>

=== ALD 2 ===
Email your ALD 2 request with shadowing, sample, and full process details.
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<div class="mw-collapsible-content">
Send an email with the following info before the training can be arranged:
* The name of the person you have shadowed and the number of times you've done it.
* Confirm that you have a sample ready.
* Which tool you want to use.
* What process steps you want to run.
** Either the recipe name or all required process parameters.
** How long does the process take.
* What is your project alias? If unsure, contact your supervisor first.

Before the training session:
* Watch the instruction video(s) and read the standard operating procedure on the [[Cambridge ALD|ALD tool page]].
</div>
</div>

== Packaging ==

=== F&S autobonder ===
Prepare shadowing and bonding documentation, then request F&S autobonder training.
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<div class="mw-collapsible-content">
Send an email with the following info before the training can be arranged:

* Shadow colleagues using the tool 2-3 times.
* You must have a '''chip''' for bonding.
* You must know which '''daughterboard''' you will use for bonding.
* You must know what material you use to '''mount''' the chip to the daughterboard (silver paint, PMMA or whatever is specific to your measurement).
* You must prepare a '''bonding schematic''' and have one of your team members verify that it is correct.
* What is your project alias? If unsure, contact your supervisor first.
* Read through the wiki page: https://wiki.nbi.ku.dk/cleanroom/FS_bonder
* Request a training session at this point.

Two training sessions are required to get access to the bonder:

# 3 hours: Basic bonder training and chip bonding
# 2 hours: Sign-off session
</div>
</div>

=== Manual bonder ===
Request manual bonder training via [mailto:cleanroom@nbi.ku.dk cleanroom@nbi.ku.dk].
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</div>
</div>

== Miscellaneous ==

=== Micromanipulator ===
Complete group-level training first, then request a micromanipulator sign-off session.
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<div class="mw-collapsible-content">
* Please get trained within your research group first. Then request a sign-off session.
* What is your project alias? If unsure, contact your supervisor first.
</div>
</div>

[[Category:Tools]]

Training

2026-04-17T09:50:41Z

Harry: /* Bruker Dimension Icon Atomic Force Microscope (AFM) */

A prerequisite for using the cleanroom [[Tools|tools]] is that a [[About|cleanroom staff]] member has given the necessary instruction or training.
This includes basic instruments such as hotplates and microscopes.
For '''all''' training requests, please read the prerequisites below and afterwards contact [mailto:cleanroom@nbi.ku.dk cleanroom@nbi.ku.dk].
A cleanroom staff member will typically respond within one workday.
Do not contact individual staff members for training.

Once the user has completed the training, they are given booking rights in the [http://cleanroom.brickhost.com cleanroom booking system].
However, after a certain period of inactivity (typically 90 days) on a given tool, the booking rights will expire and the user will need to be retrained in order to continue using the tool.

== Cleanroom General Introduction ==

=== Cleanroom general introduction ===
Request cleanroom introduction training via [mailto:cleanroom@nbi.ku.dk cleanroom@nbi.ku.dk].
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<div class="mw-collapsible-content">
* Name a superuser from your group who will follow you in the cleanroom 2-3 times after your training.
* Introduction training requires acceptance from all of you and typically runs from 9.30 to 15.00.
* Before training, read the safety information: https://wiki.nbi.ku.dk/cleanroom/Safety
* Typical schedule:
** 9.15-10.30: Cleanroom introduction
** Coffee break
** 10.45-12.00: Asher, spinners, and optical microscopes
** Lunch break
** 13.00-14.00: Practical information inside and outside the lab
** 14.00-15.00: Q&A and account setup
</div>
</div>

== Lithography ==

=== Elionix 7000 (100 kV) ===
Elionix 7000 training is for advanced users and requires prior cleanroom tool competency.

Contact Harry (cleanroom@nbi.ku.dk) to request training.
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<div class="mw-collapsible-content">
==== Prerequisites ====
* You must be at least a Master student or signed up for a long term (>6 months) project to be allowed to use the tool.
* Elionix is a high level tool. Make sure you are already trained to:
** Enter the cleanroom
** Use the microscope, spinner, asher

==== Training ====
* You'll need 4 sessions to get trained on this tool.
** Session 1 ( 1 hr.) - teaches you how to load/unload the sample and how to condition the beam.
** Session 2 ( 3 hr.) - involves exposing alignment marks and test patterns (any design: preferably one half of the overlay ,so to understand alignment later ).
** Session 3 ( 3 hr.) - involves using the exposed alignment marks for marker registration and exposing the 2nd pattern (i.e. the 2nd half of the overlay pattern).
** Session 4 involves exposing a "real" pattern on a "real" chip on your own to gain access.

==== Preparation ====
Before any training slots are booked on the tool you'll need all of the following prepared:
* Shadow senior users on the tool 2-3 times.
* Chip (comfortable to handle) spin coated with resist. This chip will be used for sessions 1 & 2. Please be aware of the coating and baking parameters for the resist.
* Any test design is preferred which has marks, overlay patterns that you will use to test alignment precision between two lithography steps. A Vernier pattern is commonly used. Feel free to test your ideas. Make sure you have something for both ''x'' and ''y'' directions. If you don't know how to start, check the [[Design template for EBL]].
* Convert your design files into the Elionix exposure format .co7. This can be done using Beamer in 4th floor design computers.
* Make sure all write fields are entirely in the positive coordinate space.
* Make sure neither exposure will take longer than 60 minutes at 500 pA current and dose of 1000 uC/cm2.
</div>
</div>

=== Elionix F-125 (125 kV at QuanTech) ===
Contact Zhe Liu to arrange access and training for Elionix F-125.
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<div class="mw-collapsible-content">
* Please contact Zhe Liu ([mailto:zhe.liu@nbi.ku.dk zhe.liu@nbi.ku.dk])
</div>
</div>

=== Heidelberg upg501 ===
Prepare your design file and coated chip before requesting Heidelberg upg501 training.
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<div class="mw-collapsible-content">
* Have a design file ready. GDS, DXF or CIF format works fine. Make sure you are familiar with the design before your actual session.
* Have a chip spin coated with an appropriate photoresist before the training session.
** The photoresist is sensitive to white light. Use the yellow filter on the microscopes. The light source in the both scribers is white and will already expose your resist.
* What is your project alias? If unsure, contact your supervisor first.

Before the training session:
* Watch the instruction video and read the standard operating procedure on the [[Heidelberg µPG 501|Heidelberg µPG 501 tool page]], shadow the tool with your group members, and ask for a sign-off session.
</div>
</div>

== Characterization ==

=== Bruker Dimension Icon Atomic Force Microscope (AFM) ===
Contact NBI-CR staff ([mailto:cleanroom@nbi.ku.dk cleanroom@nbi.ku.dk]) to request for AFM training.
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<div class="mw-collapsible-content">
* Have a sample ready that you want to characterize. Think about what you want to learn about the sample: step height, roughness, etc.
* Only request for training if you plan on using the tool regularly.
* Training is usually 2-3 sessions of 2-hour per session.
</div>
</div>

=== JEOL 7800-F ===
Prepare a real sample and imaging goals before booking JEOL 7800-F training.
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<div class="mw-collapsible-content">
* Training is usually 2-3 sessions of 2-hour per session.
* You need a chip/sample to be imaged before a session is booked.
* Be familiar with the materials on the sample to be imaged and what feature is it that is of critical interest -- something that makes or breaks your device.
* Request the training session only once you have gathered the chips and information.
* What is your project alias? If unsure, contact your supervisor first.
</div>
</div>

=== JEOL 7800-F prime (QuanTech) ===
Prepare a real sample and imaging goals before booking JEOL 7800-F Prime training.
<div class="mw-collapsible mw-collapsed" style="border:1px solid #b7e1c1; border-left:6px solid #2a9d5b; background:#f2fbf5; border-radius:6px; margin:0.45em 0 1.0em; padding:0.55em 0.75em 0.55em;">
<div class="mw-collapsible-toggle" style="text-align:right; margin:-0.62em 0 0.25em; line-height:1;">'''Expand'''</div>
<div class="mw-collapsible-content">
* Training takes about 2-3 sessions.
* You need a chip/sample to be imaged before a session is booked.
* Be familiar with the materials on the sample to be imaged and what feature is it that is of critical interest -- something that makes or breaks your device.
* Request the training session only once you have gathered the chips and information.
* What is your project alias? If unsure, contact your supervisor first.
</div>
</div>

=== Raith e-Line ===
Bring a prepared design package for sessions 1 and 2, including alignment and overlay test patterns.
<div class="mw-collapsible mw-collapsed" style="border:1px solid #b8e2d5; border-left:6px solid #14866d; background:#f2fbf8; border-radius:6px; margin:0.45em 0 1.0em; padding:0.55em 0.75em 0.55em;">
<div class="mw-collapsible-toggle" style="text-align:right; margin:-0.62em 0 0.25em; line-height:1;">'''Expand'''</div>
<div class="mw-collapsible-content">
* A design (gds, dxf, cif) for sessions 1 & 2 with:
** 4 alignment crosses (find out what marks work on the tool from your sub-group).
** Something to break the symmetry so you can tell chip orientation with your bare eye.
** A pattern that you will use to test overlay (alignment between two lithography steps). A Vernier pattern is commonly used. Feel free to test your ideas.
** Something creative, somethin fun :) This is an exercise in learning CAD as well.
* What is your project alias? If unsure, contact your supervisor first.
</div>
</div>

=== Woollam alpha-SE Ellipsometer ===
Request Woollam alpha-SE Ellipsometer training via [mailto:cleanroom@nbi.ku.dk cleanroom@nbi.ku.dk].
<div class="mw-collapsible mw-collapsed" style="border:1px solid #d8dde3; border-left:6px solid #72777d; background:#f8f9fa; border-radius:6px; margin:0.45em 0 1.0em; padding:0.55em 0.75em 0.55em;">
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<div class="mw-collapsible-content">
</div>
</div>

=== Filmetrics reflectometer ===
Contact Zhe Liu to arrange access and training for the Filmetrics reflectometer.
<div class="mw-collapsible mw-collapsed" style="border:1px solid #b7e1c1; border-left:6px solid #2a9d5b; background:#f2fbf5; border-radius:6px; margin:0.45em 0 1.0em; padding:0.55em 0.75em 0.55em;">
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<div class="mw-collapsible-content">
* Please contact Zhe Liu ([mailto:zhe.liu@nbi.ku.dk zhe.liu@nbi.ku.dk])
</div>
</div>

== Thin Film Deposition ==

=== PLASSYS Evaporator ===
Email your PLASSYS request with shadowing, sample, and process parameters.
<div class="mw-collapsible mw-collapsed" style="border:1px solid #f0d4ac; border-left:6px solid #c77700; background:#fff8ef; border-radius:6px; margin:0.45em 0 1.0em; padding:0.55em 0.75em 0.55em;">
<div class="mw-collapsible-toggle" style="text-align:right; margin:-0.62em 0 0.25em; line-height:1;">'''Expand'''</div>
<div class="mw-collapsible-content">
Send an email with the following info before the training can be arranged:
* The name of the person you have shadowed and the number of times you've done it.
* Confirm that you have a sample ready.
* Specify the required process parameters( material, thickness, tilt etc)
* What is your project alias? If unsure, contact your supervisor first.
==== Training ====
* You'll need 3 sessions to get trained on this tool.
** Session 1 ( 1 hr.) - teaches you how to load/unload the sample and how to run a recipe.
** Session 2 ( 2 hr.) - how to create your own recipe and run the process.
** Session 3 ( 3 hr.) - sign off session
</div>
</div>

=== AJA metallization, sputtering or ion milling ===
Email your training request with shadowing, sample, tool, process, and recipe details for AJA.
<div class="mw-collapsible mw-collapsed" style="border:1px solid #f0d4ac; border-left:6px solid #c77700; background:#fff8ef; border-radius:6px; margin:0.45em 0 1.0em; padding:0.55em 0.75em 0.55em;">
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<div class="mw-collapsible-content">
Send an email with the following info before the training can be arranged:
* The name of the person you have shadowed and the number of times you've done it.
* Confirm that you have a sample ready.
* Which tool you want to use: AJA1 or AJA2?
* What process do you want to run ?
* Either the recipe name or specify the required process parameters.
* What is your project alias? If unsure, contact your supervisor first.

Before the training session:
* Watch the instruction video on how to load/unload and read the standard operating procedures on the [[AJA Systems|AJA Systems tool page]]
</div>
</div>

=== ALD 1 ===
Email your ALD 1 request with shadowing, sample, and full process details.
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<div class="mw-collapsible-toggle" style="text-align:right; margin:-0.62em 0 0.25em; line-height:1;">'''Expand'''</div>
<div class="mw-collapsible-content">
Send an email with the following info before the training can be arranged:
* The name of the person you have shadowed and the number of times you've done it.
* Confirm that you have a sample ready.
* Which tool you want to use.
* What process steps you want to run.
** Either the recipe name or all required process parameters.
** How long does the process take.
* What is your project alias? If unsure, contact your supervisor first.

Before the training session:
* Watch the instruction video(s) and read the standard operating procedure on the [[Cambridge ALD|ALD tool page]].
</div>
</div>

=== ALD 2 ===
Email your ALD 2 request with shadowing, sample, and full process details.
<div class="mw-collapsible mw-collapsed" style="border:1px solid #f0d4ac; border-left:6px solid #c77700; background:#fff8ef; border-radius:6px; margin:0.45em 0 1.0em; padding:0.55em 0.75em 0.55em;">
<div class="mw-collapsible-toggle" style="text-align:right; margin:-0.62em 0 0.25em; line-height:1;">'''Expand'''</div>
<div class="mw-collapsible-content">
Send an email with the following info before the training can be arranged:
* The name of the person you have shadowed and the number of times you've done it.
* Confirm that you have a sample ready.
* Which tool you want to use.
* What process steps you want to run.
** Either the recipe name or all required process parameters.
** How long does the process take.
* What is your project alias? If unsure, contact your supervisor first.

Before the training session:
* Watch the instruction video(s) and read the standard operating procedure on the [[Cambridge ALD|ALD tool page]].
</div>
</div>

== Packaging ==

=== F&S autobonder ===
Prepare shadowing and bonding documentation, then request F&S autobonder training.
<div class="mw-collapsible mw-collapsed" style="border:1px solid #d9c8b7; border-left:6px solid #8b5e3c; background:#fbf6f1; border-radius:6px; margin:0.45em 0 1.0em; padding:0.55em 0.75em 0.55em;">
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<div class="mw-collapsible-content">
Send an email with the following info before the training can be arranged:

* Shadow colleagues using the tool 2-3 times.
* You must have a '''chip''' for bonding.
* You must know which '''daughterboard''' you will use for bonding.
* You must know what material you use to '''mount''' the chip to the daughterboard (silver paint, PMMA or whatever is specific to your measurement).
* You must prepare a '''bonding schematic''' and have one of your team members verify that it is correct.
* What is your project alias? If unsure, contact your supervisor first.
* Read through the wiki page: https://wiki.nbi.ku.dk/cleanroom/FS_bonder
* Request a training session at this point.

Two training sessions are required to get access to the bonder:

# 3 hours: Basic bonder training and chip bonding
# 2 hours: Sign-off session
</div>
</div>

=== Manual bonder ===
Request manual bonder training via [mailto:cleanroom@nbi.ku.dk cleanroom@nbi.ku.dk].
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<div class="mw-collapsible-content">
</div>
</div>

== Miscellaneous ==

=== Micromanipulator ===
Complete group-level training first, then request a micromanipulator sign-off session.
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<div class="mw-collapsible-content">
* Please get trained within your research group first. Then request a sign-off session.
* What is your project alias? If unsure, contact your supervisor first.
</div>
</div>

[[Category:Tools]]

Training

2026-04-17T09:49:53Z

Harry: /* Preparation */

A prerequisite for using the cleanroom [[Tools|tools]] is that a [[About|cleanroom staff]] member has given the necessary instruction or training.
This includes basic instruments such as hotplates and microscopes.
For '''all''' training requests, please read the prerequisites below and afterwards contact [mailto:cleanroom@nbi.ku.dk cleanroom@nbi.ku.dk].
A cleanroom staff member will typically respond within one workday.
Do not contact individual staff members for training.

Once the user has completed the training, they are given booking rights in the [http://cleanroom.brickhost.com cleanroom booking system].
However, after a certain period of inactivity (typically 90 days) on a given tool, the booking rights will expire and the user will need to be retrained in order to continue using the tool.

== Cleanroom General Introduction ==

=== Cleanroom general introduction ===
Request cleanroom introduction training via [mailto:cleanroom@nbi.ku.dk cleanroom@nbi.ku.dk].
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<div class="mw-collapsible-content">
* Name a superuser from your group who will follow you in the cleanroom 2-3 times after your training.
* Introduction training requires acceptance from all of you and typically runs from 9.30 to 15.00.
* Before training, read the safety information: https://wiki.nbi.ku.dk/cleanroom/Safety
* Typical schedule:
** 9.15-10.30: Cleanroom introduction
** Coffee break
** 10.45-12.00: Asher, spinners, and optical microscopes
** Lunch break
** 13.00-14.00: Practical information inside and outside the lab
** 14.00-15.00: Q&A and account setup
</div>
</div>

== Lithography ==

=== Elionix 7000 (100 kV) ===
Elionix 7000 training is for advanced users and requires prior cleanroom tool competency.

Contact Harry (cleanroom@nbi.ku.dk) to request training.
<div class="mw-collapsible mw-collapsed" style="border:1px solid #b8e2d5; border-left:6px solid #14866d; background:#f2fbf8; border-radius:6px; margin:0.45em 0 1.0em; padding:0.55em 0.75em 0.55em;">
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<div class="mw-collapsible-content">
==== Prerequisites ====
* You must be at least a Master student or signed up for a long term (>6 months) project to be allowed to use the tool.
* Elionix is a high level tool. Make sure you are already trained to:
** Enter the cleanroom
** Use the microscope, spinner, asher

==== Training ====
* You'll need 4 sessions to get trained on this tool.
** Session 1 ( 1 hr.) - teaches you how to load/unload the sample and how to condition the beam.
** Session 2 ( 3 hr.) - involves exposing alignment marks and test patterns (any design: preferably one half of the overlay ,so to understand alignment later ).
** Session 3 ( 3 hr.) - involves using the exposed alignment marks for marker registration and exposing the 2nd pattern (i.e. the 2nd half of the overlay pattern).
** Session 4 involves exposing a "real" pattern on a "real" chip on your own to gain access.

==== Preparation ====
Before any training slots are booked on the tool you'll need all of the following prepared:
* Shadow senior users on the tool 2-3 times.
* Chip (comfortable to handle) spin coated with resist. This chip will be used for sessions 1 & 2. Please be aware of the coating and baking parameters for the resist.
* Any test design is preferred which has marks, overlay patterns that you will use to test alignment precision between two lithography steps. A Vernier pattern is commonly used. Feel free to test your ideas. Make sure you have something for both ''x'' and ''y'' directions. If you don't know how to start, check the [[Design template for EBL]].
* Convert your design files into the Elionix exposure format .co7. This can be done using Beamer in 4th floor design computers.
* Make sure all write fields are entirely in the positive coordinate space.
* Make sure neither exposure will take longer than 60 minutes at 500 pA current and dose of 1000 uC/cm2.
</div>
</div>

=== Elionix F-125 (125 kV at QuanTech) ===
Contact Zhe Liu to arrange access and training for Elionix F-125.
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<div class="mw-collapsible-content">
* Please contact Zhe Liu ([mailto:zhe.liu@nbi.ku.dk zhe.liu@nbi.ku.dk])
</div>
</div>

=== Heidelberg upg501 ===
Prepare your design file and coated chip before requesting Heidelberg upg501 training.
<div class="mw-collapsible mw-collapsed" style="border:1px solid #b8e2d5; border-left:6px solid #14866d; background:#f2fbf8; border-radius:6px; margin:0.45em 0 1.0em; padding:0.55em 0.75em 0.55em;">
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<div class="mw-collapsible-content">
* Have a design file ready. GDS, DXF or CIF format works fine. Make sure you are familiar with the design before your actual session.
* Have a chip spin coated with an appropriate photoresist before the training session.
** The photoresist is sensitive to white light. Use the yellow filter on the microscopes. The light source in the both scribers is white and will already expose your resist.
* What is your project alias? If unsure, contact your supervisor first.

Before the training session:
* Watch the instruction video and read the standard operating procedure on the [[Heidelberg µPG 501|Heidelberg µPG 501 tool page]], shadow the tool with your group members, and ask for a sign-off session.
</div>
</div>

== Characterization ==

=== Bruker Dimension Icon Atomic Force Microscope (AFM) ===
Contact NBI-CR staff (cleanroom[at]nbi[dot]ku.dk) to request for AFM training.
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<div class="mw-collapsible-content">
* Have a sample ready that you want to characterize. Think about what you want to learn about the sample: step height, roughness, etc.
* Only request for training if you plan on using the tool regularly.
* Training is usually 2-3 sessions of 2-hour per session.
</div>
</div>

=== JEOL 7800-F ===
Prepare a real sample and imaging goals before booking JEOL 7800-F training.
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<div class="mw-collapsible-content">
* Training is usually 2-3 sessions of 2-hour per session.
* You need a chip/sample to be imaged before a session is booked.
* Be familiar with the materials on the sample to be imaged and what feature is it that is of critical interest -- something that makes or breaks your device.
* Request the training session only once you have gathered the chips and information.
* What is your project alias? If unsure, contact your supervisor first.
</div>
</div>

=== JEOL 7800-F prime (QuanTech) ===
Prepare a real sample and imaging goals before booking JEOL 7800-F Prime training.
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<div class="mw-collapsible-toggle" style="text-align:right; margin:-0.62em 0 0.25em; line-height:1;">'''Expand'''</div>
<div class="mw-collapsible-content">
* Training takes about 2-3 sessions.
* You need a chip/sample to be imaged before a session is booked.
* Be familiar with the materials on the sample to be imaged and what feature is it that is of critical interest -- something that makes or breaks your device.
* Request the training session only once you have gathered the chips and information.
* What is your project alias? If unsure, contact your supervisor first.
</div>
</div>

=== Raith e-Line ===
Bring a prepared design package for sessions 1 and 2, including alignment and overlay test patterns.
<div class="mw-collapsible mw-collapsed" style="border:1px solid #b8e2d5; border-left:6px solid #14866d; background:#f2fbf8; border-radius:6px; margin:0.45em 0 1.0em; padding:0.55em 0.75em 0.55em;">
<div class="mw-collapsible-toggle" style="text-align:right; margin:-0.62em 0 0.25em; line-height:1;">'''Expand'''</div>
<div class="mw-collapsible-content">
* A design (gds, dxf, cif) for sessions 1 & 2 with:
** 4 alignment crosses (find out what marks work on the tool from your sub-group).
** Something to break the symmetry so you can tell chip orientation with your bare eye.
** A pattern that you will use to test overlay (alignment between two lithography steps). A Vernier pattern is commonly used. Feel free to test your ideas.
** Something creative, somethin fun :) This is an exercise in learning CAD as well.
* What is your project alias? If unsure, contact your supervisor first.
</div>
</div>

=== Woollam alpha-SE Ellipsometer ===
Request Woollam alpha-SE Ellipsometer training via [mailto:cleanroom@nbi.ku.dk cleanroom@nbi.ku.dk].
<div class="mw-collapsible mw-collapsed" style="border:1px solid #d8dde3; border-left:6px solid #72777d; background:#f8f9fa; border-radius:6px; margin:0.45em 0 1.0em; padding:0.55em 0.75em 0.55em;">
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<div class="mw-collapsible-content">
</div>
</div>

=== Filmetrics reflectometer ===
Contact Zhe Liu to arrange access and training for the Filmetrics reflectometer.
<div class="mw-collapsible mw-collapsed" style="border:1px solid #b7e1c1; border-left:6px solid #2a9d5b; background:#f2fbf5; border-radius:6px; margin:0.45em 0 1.0em; padding:0.55em 0.75em 0.55em;">
<div class="mw-collapsible-toggle" style="text-align:right; margin:-0.62em 0 0.25em; line-height:1;">'''Expand'''</div>
<div class="mw-collapsible-content">
* Please contact Zhe Liu ([mailto:zhe.liu@nbi.ku.dk zhe.liu@nbi.ku.dk])
</div>
</div>

== Thin Film Deposition ==

=== PLASSYS Evaporator ===
Email your PLASSYS request with shadowing, sample, and process parameters.
<div class="mw-collapsible mw-collapsed" style="border:1px solid #f0d4ac; border-left:6px solid #c77700; background:#fff8ef; border-radius:6px; margin:0.45em 0 1.0em; padding:0.55em 0.75em 0.55em;">
<div class="mw-collapsible-toggle" style="text-align:right; margin:-0.62em 0 0.25em; line-height:1;">'''Expand'''</div>
<div class="mw-collapsible-content">
Send an email with the following info before the training can be arranged:
* The name of the person you have shadowed and the number of times you've done it.
* Confirm that you have a sample ready.
* Specify the required process parameters( material, thickness, tilt etc)
* What is your project alias? If unsure, contact your supervisor first.
==== Training ====
* You'll need 3 sessions to get trained on this tool.
** Session 1 ( 1 hr.) - teaches you how to load/unload the sample and how to run a recipe.
** Session 2 ( 2 hr.) - how to create your own recipe and run the process.
** Session 3 ( 3 hr.) - sign off session
</div>
</div>

=== AJA metallization, sputtering or ion milling ===
Email your training request with shadowing, sample, tool, process, and recipe details for AJA.
<div class="mw-collapsible mw-collapsed" style="border:1px solid #f0d4ac; border-left:6px solid #c77700; background:#fff8ef; border-radius:6px; margin:0.45em 0 1.0em; padding:0.55em 0.75em 0.55em;">
<div class="mw-collapsible-toggle" style="text-align:right; margin:-0.62em 0 0.25em; line-height:1;">'''Expand'''</div>
<div class="mw-collapsible-content">
Send an email with the following info before the training can be arranged:
* The name of the person you have shadowed and the number of times you've done it.
* Confirm that you have a sample ready.
* Which tool you want to use: AJA1 or AJA2?
* What process do you want to run ?
* Either the recipe name or specify the required process parameters.
* What is your project alias? If unsure, contact your supervisor first.

Before the training session:
* Watch the instruction video on how to load/unload and read the standard operating procedures on the [[AJA Systems|AJA Systems tool page]]
</div>
</div>

=== ALD 1 ===
Email your ALD 1 request with shadowing, sample, and full process details.
<div class="mw-collapsible mw-collapsed" style="border:1px solid #f0d4ac; border-left:6px solid #c77700; background:#fff8ef; border-radius:6px; margin:0.45em 0 1.0em; padding:0.55em 0.75em 0.55em;">
<div class="mw-collapsible-toggle" style="text-align:right; margin:-0.62em 0 0.25em; line-height:1;">'''Expand'''</div>
<div class="mw-collapsible-content">
Send an email with the following info before the training can be arranged:
* The name of the person you have shadowed and the number of times you've done it.
* Confirm that you have a sample ready.
* Which tool you want to use.
* What process steps you want to run.
** Either the recipe name or all required process parameters.
** How long does the process take.
* What is your project alias? If unsure, contact your supervisor first.

Before the training session:
* Watch the instruction video(s) and read the standard operating procedure on the [[Cambridge ALD|ALD tool page]].
</div>
</div>

=== ALD 2 ===
Email your ALD 2 request with shadowing, sample, and full process details.
<div class="mw-collapsible mw-collapsed" style="border:1px solid #f0d4ac; border-left:6px solid #c77700; background:#fff8ef; border-radius:6px; margin:0.45em 0 1.0em; padding:0.55em 0.75em 0.55em;">
<div class="mw-collapsible-toggle" style="text-align:right; margin:-0.62em 0 0.25em; line-height:1;">'''Expand'''</div>
<div class="mw-collapsible-content">
Send an email with the following info before the training can be arranged:
* The name of the person you have shadowed and the number of times you've done it.
* Confirm that you have a sample ready.
* Which tool you want to use.
* What process steps you want to run.
** Either the recipe name or all required process parameters.
** How long does the process take.
* What is your project alias? If unsure, contact your supervisor first.

Before the training session:
* Watch the instruction video(s) and read the standard operating procedure on the [[Cambridge ALD|ALD tool page]].
</div>
</div>

== Packaging ==

=== F&S autobonder ===
Prepare shadowing and bonding documentation, then request F&S autobonder training.
<div class="mw-collapsible mw-collapsed" style="border:1px solid #d9c8b7; border-left:6px solid #8b5e3c; background:#fbf6f1; border-radius:6px; margin:0.45em 0 1.0em; padding:0.55em 0.75em 0.55em;">
<div class="mw-collapsible-toggle" style="text-align:right; margin:-0.62em 0 0.25em; line-height:1;">'''Expand'''</div>
<div class="mw-collapsible-content">
Send an email with the following info before the training can be arranged:

* Shadow colleagues using the tool 2-3 times.
* You must have a '''chip''' for bonding.
* You must know which '''daughterboard''' you will use for bonding.
* You must know what material you use to '''mount''' the chip to the daughterboard (silver paint, PMMA or whatever is specific to your measurement).
* You must prepare a '''bonding schematic''' and have one of your team members verify that it is correct.
* What is your project alias? If unsure, contact your supervisor first.
* Read through the wiki page: https://wiki.nbi.ku.dk/cleanroom/FS_bonder
* Request a training session at this point.

Two training sessions are required to get access to the bonder:

# 3 hours: Basic bonder training and chip bonding
# 2 hours: Sign-off session
</div>
</div>

=== Manual bonder ===
Request manual bonder training via [mailto:cleanroom@nbi.ku.dk cleanroom@nbi.ku.dk].
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<div class="mw-collapsible-content">
</div>
</div>

== Miscellaneous ==

=== Micromanipulator ===
Complete group-level training first, then request a micromanipulator sign-off session.
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<div class="mw-collapsible-content">
* Please get trained within your research group first. Then request a sign-off session.
* What is your project alias? If unsure, contact your supervisor first.
</div>
</div>

[[Category:Tools]]

Training

2026-04-17T09:48:53Z

Harry: /* Preparation */

A prerequisite for using the cleanroom [[Tools|tools]] is that a [[About|cleanroom staff]] member has given the necessary instruction or training.
This includes basic instruments such as hotplates and microscopes.
For '''all''' training requests, please read the prerequisites below and afterwards contact [mailto:cleanroom@nbi.ku.dk cleanroom@nbi.ku.dk].
A cleanroom staff member will typically respond within one workday.
Do not contact individual staff members for training.

Once the user has completed the training, they are given booking rights in the [http://cleanroom.brickhost.com cleanroom booking system].
However, after a certain period of inactivity (typically 90 days) on a given tool, the booking rights will expire and the user will need to be retrained in order to continue using the tool.

== Cleanroom General Introduction ==

=== Cleanroom general introduction ===
Request cleanroom introduction training via [mailto:cleanroom@nbi.ku.dk cleanroom@nbi.ku.dk].
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<div class="mw-collapsible-content">
* Name a superuser from your group who will follow you in the cleanroom 2-3 times after your training.
* Introduction training requires acceptance from all of you and typically runs from 9.30 to 15.00.
* Before training, read the safety information: https://wiki.nbi.ku.dk/cleanroom/Safety
* Typical schedule:
** 9.15-10.30: Cleanroom introduction
** Coffee break
** 10.45-12.00: Asher, spinners, and optical microscopes
** Lunch break
** 13.00-14.00: Practical information inside and outside the lab
** 14.00-15.00: Q&A and account setup
</div>
</div>

== Lithography ==

=== Elionix 7000 (100 kV) ===
Elionix 7000 training is for advanced users and requires prior cleanroom tool competency.

Contact Harry (cleanroom@nbi.ku.dk) to request training.
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<div class="mw-collapsible-content">
==== Prerequisites ====
* You must be at least a Master student or signed up for a long term (>6 months) project to be allowed to use the tool.
* Elionix is a high level tool. Make sure you are already trained to:
** Enter the cleanroom
** Use the microscope, spinner, asher

==== Training ====
* You'll need 4 sessions to get trained on this tool.
** Session 1 ( 1 hr.) - teaches you how to load/unload the sample and how to condition the beam.
** Session 2 ( 3 hr.) - involves exposing alignment marks and test patterns (any design: preferably one half of the overlay ,so to understand alignment later ).
** Session 3 ( 3 hr.) - involves using the exposed alignment marks for marker registration and exposing the 2nd pattern (i.e. the 2nd half of the overlay pattern).
** Session 4 involves exposing a "real" pattern on a "real" chip on your own to gain access.

==== Preparation ====
Before any training slots are booked on the tool you'll need all of the following prepared:
* Shadow senior users on the tool 2-3 times.
* Chip (comfortable to handle) spin coated with resist. This chip will be used for sessions 1 & 2. Please be aware of the coating and baking parameters for the resist.
* Any test design is preferred which has marks, overlay patterns that you will use to test alignment precision between two lithography steps. A Vernier pattern is commonly used. Feel free to test your ideas. Make sure you have something for both ''x'' and ''y'' directions. If you don't know how to start, check the [[Design template for EBL]].
* Convert your design files into the Elionix exposure format .co7. This can be done using Beamer in 4th floor design computers.
* Make sure all write fields are entirely in the positive coordinate space.
* Make sure neither exposure will take longer than 30 minutes at 500 pA current and dose of 1000 uC/cm2.
</div>
</div>

=== Elionix F-125 (125 kV at QuanTech) ===
Contact Zhe Liu to arrange access and training for Elionix F-125.
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<div class="mw-collapsible-content">
* Please contact Zhe Liu ([mailto:zhe.liu@nbi.ku.dk zhe.liu@nbi.ku.dk])
</div>
</div>

=== Heidelberg upg501 ===
Prepare your design file and coated chip before requesting Heidelberg upg501 training.
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<div class="mw-collapsible-content">
* Have a design file ready. GDS, DXF or CIF format works fine. Make sure you are familiar with the design before your actual session.
* Have a chip spin coated with an appropriate photoresist before the training session.
** The photoresist is sensitive to white light. Use the yellow filter on the microscopes. The light source in the both scribers is white and will already expose your resist.
* What is your project alias? If unsure, contact your supervisor first.

Before the training session:
* Watch the instruction video and read the standard operating procedure on the [[Heidelberg µPG 501|Heidelberg µPG 501 tool page]], shadow the tool with your group members, and ask for a sign-off session.
</div>
</div>

== Characterization ==

=== Bruker Dimension Icon Atomic Force Microscope (AFM) ===
Contact NBI-CR staff (cleanroom[at]nbi[dot]ku.dk) to request for AFM training.
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<div class="mw-collapsible-content">
* Have a sample ready that you want to characterize. Think about what you want to learn about the sample: step height, roughness, etc.
* Only request for training if you plan on using the tool regularly.
* Training is usually 2-3 sessions of 2-hour per session.
</div>
</div>

=== JEOL 7800-F ===
Prepare a real sample and imaging goals before booking JEOL 7800-F training.
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<div class="mw-collapsible-content">
* Training is usually 2-3 sessions of 2-hour per session.
* You need a chip/sample to be imaged before a session is booked.
* Be familiar with the materials on the sample to be imaged and what feature is it that is of critical interest -- something that makes or breaks your device.
* Request the training session only once you have gathered the chips and information.
* What is your project alias? If unsure, contact your supervisor first.
</div>
</div>

=== JEOL 7800-F prime (QuanTech) ===
Prepare a real sample and imaging goals before booking JEOL 7800-F Prime training.
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<div class="mw-collapsible-content">
* Training takes about 2-3 sessions.
* You need a chip/sample to be imaged before a session is booked.
* Be familiar with the materials on the sample to be imaged and what feature is it that is of critical interest -- something that makes or breaks your device.
* Request the training session only once you have gathered the chips and information.
* What is your project alias? If unsure, contact your supervisor first.
</div>
</div>

=== Raith e-Line ===
Bring a prepared design package for sessions 1 and 2, including alignment and overlay test patterns.
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<div class="mw-collapsible-content">
* A design (gds, dxf, cif) for sessions 1 & 2 with:
** 4 alignment crosses (find out what marks work on the tool from your sub-group).
** Something to break the symmetry so you can tell chip orientation with your bare eye.
** A pattern that you will use to test overlay (alignment between two lithography steps). A Vernier pattern is commonly used. Feel free to test your ideas.
** Something creative, somethin fun :) This is an exercise in learning CAD as well.
* What is your project alias? If unsure, contact your supervisor first.
</div>
</div>

=== Woollam alpha-SE Ellipsometer ===
Request Woollam alpha-SE Ellipsometer training via [mailto:cleanroom@nbi.ku.dk cleanroom@nbi.ku.dk].
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<div class="mw-collapsible-content">
</div>
</div>

=== Filmetrics reflectometer ===
Contact Zhe Liu to arrange access and training for the Filmetrics reflectometer.
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<div class="mw-collapsible-content">
* Please contact Zhe Liu ([mailto:zhe.liu@nbi.ku.dk zhe.liu@nbi.ku.dk])
</div>
</div>

== Thin Film Deposition ==

=== PLASSYS Evaporator ===
Email your PLASSYS request with shadowing, sample, and process parameters.
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<div class="mw-collapsible-content">
Send an email with the following info before the training can be arranged:
* The name of the person you have shadowed and the number of times you've done it.
* Confirm that you have a sample ready.
* Specify the required process parameters( material, thickness, tilt etc)
* What is your project alias? If unsure, contact your supervisor first.
==== Training ====
* You'll need 3 sessions to get trained on this tool.
** Session 1 ( 1 hr.) - teaches you how to load/unload the sample and how to run a recipe.
** Session 2 ( 2 hr.) - how to create your own recipe and run the process.
** Session 3 ( 3 hr.) - sign off session
</div>
</div>

=== AJA metallization, sputtering or ion milling ===
Email your training request with shadowing, sample, tool, process, and recipe details for AJA.
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<div class="mw-collapsible-content">
Send an email with the following info before the training can be arranged:
* The name of the person you have shadowed and the number of times you've done it.
* Confirm that you have a sample ready.
* Which tool you want to use: AJA1 or AJA2?
* What process do you want to run ?
* Either the recipe name or specify the required process parameters.
* What is your project alias? If unsure, contact your supervisor first.

Before the training session:
* Watch the instruction video on how to load/unload and read the standard operating procedures on the [[AJA Systems|AJA Systems tool page]]
</div>
</div>

=== ALD 1 ===
Email your ALD 1 request with shadowing, sample, and full process details.
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<div class="mw-collapsible-content">
Send an email with the following info before the training can be arranged:
* The name of the person you have shadowed and the number of times you've done it.
* Confirm that you have a sample ready.
* Which tool you want to use.
* What process steps you want to run.
** Either the recipe name or all required process parameters.
** How long does the process take.
* What is your project alias? If unsure, contact your supervisor first.

Before the training session:
* Watch the instruction video(s) and read the standard operating procedure on the [[Cambridge ALD|ALD tool page]].
</div>
</div>

=== ALD 2 ===
Email your ALD 2 request with shadowing, sample, and full process details.
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<div class="mw-collapsible-content">
Send an email with the following info before the training can be arranged:
* The name of the person you have shadowed and the number of times you've done it.
* Confirm that you have a sample ready.
* Which tool you want to use.
* What process steps you want to run.
** Either the recipe name or all required process parameters.
** How long does the process take.
* What is your project alias? If unsure, contact your supervisor first.

Before the training session:
* Watch the instruction video(s) and read the standard operating procedure on the [[Cambridge ALD|ALD tool page]].
</div>
</div>

== Packaging ==

=== F&S autobonder ===
Prepare shadowing and bonding documentation, then request F&S autobonder training.
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<div class="mw-collapsible-content">
Send an email with the following info before the training can be arranged:

* Shadow colleagues using the tool 2-3 times.
* You must have a '''chip''' for bonding.
* You must know which '''daughterboard''' you will use for bonding.
* You must know what material you use to '''mount''' the chip to the daughterboard (silver paint, PMMA or whatever is specific to your measurement).
* You must prepare a '''bonding schematic''' and have one of your team members verify that it is correct.
* What is your project alias? If unsure, contact your supervisor first.
* Read through the wiki page: https://wiki.nbi.ku.dk/cleanroom/FS_bonder
* Request a training session at this point.

Two training sessions are required to get access to the bonder:

# 3 hours: Basic bonder training and chip bonding
# 2 hours: Sign-off session
</div>
</div>

=== Manual bonder ===
Request manual bonder training via [mailto:cleanroom@nbi.ku.dk cleanroom@nbi.ku.dk].
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<div class="mw-collapsible-content">
</div>
</div>

== Miscellaneous ==

=== Micromanipulator ===
Complete group-level training first, then request a micromanipulator sign-off session.
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<div class="mw-collapsible-content">
* Please get trained within your research group first. Then request a sign-off session.
* What is your project alias? If unsure, contact your supervisor first.
</div>
</div>

[[Category:Tools]]

Training

2026-04-17T09:48:26Z

Harry: /* Preparation */

A prerequisite for using the cleanroom [[Tools|tools]] is that a [[About|cleanroom staff]] member has given the necessary instruction or training.
This includes basic instruments such as hotplates and microscopes.
For '''all''' training requests, please read the prerequisites below and afterwards contact [mailto:cleanroom@nbi.ku.dk cleanroom@nbi.ku.dk].
A cleanroom staff member will typically respond within one workday.
Do not contact individual staff members for training.

Once the user has completed the training, they are given booking rights in the [http://cleanroom.brickhost.com cleanroom booking system].
However, after a certain period of inactivity (typically 90 days) on a given tool, the booking rights will expire and the user will need to be retrained in order to continue using the tool.

== Cleanroom General Introduction ==

=== Cleanroom general introduction ===
Request cleanroom introduction training via [mailto:cleanroom@nbi.ku.dk cleanroom@nbi.ku.dk].
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<div class="mw-collapsible-content">
* Name a superuser from your group who will follow you in the cleanroom 2-3 times after your training.
* Introduction training requires acceptance from all of you and typically runs from 9.30 to 15.00.
* Before training, read the safety information: https://wiki.nbi.ku.dk/cleanroom/Safety
* Typical schedule:
** 9.15-10.30: Cleanroom introduction
** Coffee break
** 10.45-12.00: Asher, spinners, and optical microscopes
** Lunch break
** 13.00-14.00: Practical information inside and outside the lab
** 14.00-15.00: Q&A and account setup
</div>
</div>

== Lithography ==

=== Elionix 7000 (100 kV) ===
Elionix 7000 training is for advanced users and requires prior cleanroom tool competency.

Contact Harry (cleanroom@nbi.ku.dk) to request training.
<div class="mw-collapsible mw-collapsed" style="border:1px solid #b8e2d5; border-left:6px solid #14866d; background:#f2fbf8; border-radius:6px; margin:0.45em 0 1.0em; padding:0.55em 0.75em 0.55em;">
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<div class="mw-collapsible-content">
==== Prerequisites ====
* You must be at least a Master student or signed up for a long term (>6 months) project to be allowed to use the tool.
* Elionix is a high level tool. Make sure you are already trained to:
** Enter the cleanroom
** Use the microscope, spinner, asher

==== Training ====
* You'll need 4 sessions to get trained on this tool.
** Session 1 ( 1 hr.) - teaches you how to load/unload the sample and how to condition the beam.
** Session 2 ( 3 hr.) - involves exposing alignment marks and test patterns (any design: preferably one half of the overlay ,so to understand alignment later ).
** Session 3 ( 3 hr.) - involves using the exposed alignment marks for marker registration and exposing the 2nd pattern (i.e. the 2nd half of the overlay pattern).
** Session 4 involves exposing a "real" pattern on a "real" chip on your own to gain access.

==== Preparation ====
Before any training slots are booked on the tool you'll need all of the following prepared:
* Shadow senior users on the tool 2-3 times.
* Chip (comfortable to handle) spin coated with resist. This chip will be used for sessions 1 & 2. Please be aware of the coating and baking parameters for the resist.
* Any test design is preferred which has marks, overlay patterns that you will use to test alignment precision between two lithography steps. A Vernier pattern is commonly used. Feel free to test your ideas. Make sure you have something for both ''x'' and ''y'' directions. If you don't know how to start, check the [[Design template for EBL]].
* Convert your design files into the Elionix exposure format .co7. This can be done using Beamer in 4th floor design computers.
* Make sure all write fields are entirely in the positive coordinate space.
* Make sure neither exposure will take longer than 15 minutes at 500 pA current and dose of 1000 uC/cm2.
</div>
</div>

=== Elionix F-125 (125 kV at QuanTech) ===
Contact Zhe Liu to arrange access and training for Elionix F-125.
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<div class="mw-collapsible-content">
* Please contact Zhe Liu ([mailto:zhe.liu@nbi.ku.dk zhe.liu@nbi.ku.dk])
</div>
</div>

=== Heidelberg upg501 ===
Prepare your design file and coated chip before requesting Heidelberg upg501 training.
<div class="mw-collapsible mw-collapsed" style="border:1px solid #b8e2d5; border-left:6px solid #14866d; background:#f2fbf8; border-radius:6px; margin:0.45em 0 1.0em; padding:0.55em 0.75em 0.55em;">
<div class="mw-collapsible-toggle" style="text-align:right; margin:-0.62em 0 0.25em; line-height:1;">'''Expand'''</div>
<div class="mw-collapsible-content">
* Have a design file ready. GDS, DXF or CIF format works fine. Make sure you are familiar with the design before your actual session.
* Have a chip spin coated with an appropriate photoresist before the training session.
** The photoresist is sensitive to white light. Use the yellow filter on the microscopes. The light source in the both scribers is white and will already expose your resist.
* What is your project alias? If unsure, contact your supervisor first.

Before the training session:
* Watch the instruction video and read the standard operating procedure on the [[Heidelberg µPG 501|Heidelberg µPG 501 tool page]], shadow the tool with your group members, and ask for a sign-off session.
</div>
</div>

== Characterization ==

=== Bruker Dimension Icon Atomic Force Microscope (AFM) ===
Contact NBI-CR staff (cleanroom[at]nbi[dot]ku.dk) to request for AFM training.
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<div class="mw-collapsible-content">
* Have a sample ready that you want to characterize. Think about what you want to learn about the sample: step height, roughness, etc.
* Only request for training if you plan on using the tool regularly.
* Training is usually 2-3 sessions of 2-hour per session.
</div>
</div>

=== JEOL 7800-F ===
Prepare a real sample and imaging goals before booking JEOL 7800-F training.
<div class="mw-collapsible mw-collapsed" style="border:1px solid #b7e1c1; border-left:6px solid #2a9d5b; background:#f2fbf5; border-radius:6px; margin:0.45em 0 1.0em; padding:0.55em 0.75em 0.55em;">
<div class="mw-collapsible-toggle" style="text-align:right; margin:-0.62em 0 0.25em; line-height:1;">'''Expand'''</div>
<div class="mw-collapsible-content">
* Training is usually 2-3 sessions of 2-hour per session.
* You need a chip/sample to be imaged before a session is booked.
* Be familiar with the materials on the sample to be imaged and what feature is it that is of critical interest -- something that makes or breaks your device.
* Request the training session only once you have gathered the chips and information.
* What is your project alias? If unsure, contact your supervisor first.
</div>
</div>

=== JEOL 7800-F prime (QuanTech) ===
Prepare a real sample and imaging goals before booking JEOL 7800-F Prime training.
<div class="mw-collapsible mw-collapsed" style="border:1px solid #b7e1c1; border-left:6px solid #2a9d5b; background:#f2fbf5; border-radius:6px; margin:0.45em 0 1.0em; padding:0.55em 0.75em 0.55em;">
<div class="mw-collapsible-toggle" style="text-align:right; margin:-0.62em 0 0.25em; line-height:1;">'''Expand'''</div>
<div class="mw-collapsible-content">
* Training takes about 2-3 sessions.
* You need a chip/sample to be imaged before a session is booked.
* Be familiar with the materials on the sample to be imaged and what feature is it that is of critical interest -- something that makes or breaks your device.
* Request the training session only once you have gathered the chips and information.
* What is your project alias? If unsure, contact your supervisor first.
</div>
</div>

=== Raith e-Line ===
Bring a prepared design package for sessions 1 and 2, including alignment and overlay test patterns.
<div class="mw-collapsible mw-collapsed" style="border:1px solid #b8e2d5; border-left:6px solid #14866d; background:#f2fbf8; border-radius:6px; margin:0.45em 0 1.0em; padding:0.55em 0.75em 0.55em;">
<div class="mw-collapsible-toggle" style="text-align:right; margin:-0.62em 0 0.25em; line-height:1;">'''Expand'''</div>
<div class="mw-collapsible-content">
* A design (gds, dxf, cif) for sessions 1 & 2 with:
** 4 alignment crosses (find out what marks work on the tool from your sub-group).
** Something to break the symmetry so you can tell chip orientation with your bare eye.
** A pattern that you will use to test overlay (alignment between two lithography steps). A Vernier pattern is commonly used. Feel free to test your ideas.
** Something creative, somethin fun :) This is an exercise in learning CAD as well.
* What is your project alias? If unsure, contact your supervisor first.
</div>
</div>

=== Woollam alpha-SE Ellipsometer ===
Request Woollam alpha-SE Ellipsometer training via [mailto:cleanroom@nbi.ku.dk cleanroom@nbi.ku.dk].
<div class="mw-collapsible mw-collapsed" style="border:1px solid #d8dde3; border-left:6px solid #72777d; background:#f8f9fa; border-radius:6px; margin:0.45em 0 1.0em; padding:0.55em 0.75em 0.55em;">
<div class="mw-collapsible-toggle" style="text-align:right; margin:-0.62em 0 0.25em; line-height:1;">'''Expand'''</div>
<div class="mw-collapsible-content">
</div>
</div>

=== Filmetrics reflectometer ===
Contact Zhe Liu to arrange access and training for the Filmetrics reflectometer.
<div class="mw-collapsible mw-collapsed" style="border:1px solid #b7e1c1; border-left:6px solid #2a9d5b; background:#f2fbf5; border-radius:6px; margin:0.45em 0 1.0em; padding:0.55em 0.75em 0.55em;">
<div class="mw-collapsible-toggle" style="text-align:right; margin:-0.62em 0 0.25em; line-height:1;">'''Expand'''</div>
<div class="mw-collapsible-content">
* Please contact Zhe Liu ([mailto:zhe.liu@nbi.ku.dk zhe.liu@nbi.ku.dk])
</div>
</div>

== Thin Film Deposition ==

=== PLASSYS Evaporator ===
Email your PLASSYS request with shadowing, sample, and process parameters.
<div class="mw-collapsible mw-collapsed" style="border:1px solid #f0d4ac; border-left:6px solid #c77700; background:#fff8ef; border-radius:6px; margin:0.45em 0 1.0em; padding:0.55em 0.75em 0.55em;">
<div class="mw-collapsible-toggle" style="text-align:right; margin:-0.62em 0 0.25em; line-height:1;">'''Expand'''</div>
<div class="mw-collapsible-content">
Send an email with the following info before the training can be arranged:
* The name of the person you have shadowed and the number of times you've done it.
* Confirm that you have a sample ready.
* Specify the required process parameters( material, thickness, tilt etc)
* What is your project alias? If unsure, contact your supervisor first.
==== Training ====
* You'll need 3 sessions to get trained on this tool.
** Session 1 ( 1 hr.) - teaches you how to load/unload the sample and how to run a recipe.
** Session 2 ( 2 hr.) - how to create your own recipe and run the process.
** Session 3 ( 3 hr.) - sign off session
</div>
</div>

=== AJA metallization, sputtering or ion milling ===
Email your training request with shadowing, sample, tool, process, and recipe details for AJA.
<div class="mw-collapsible mw-collapsed" style="border:1px solid #f0d4ac; border-left:6px solid #c77700; background:#fff8ef; border-radius:6px; margin:0.45em 0 1.0em; padding:0.55em 0.75em 0.55em;">
<div class="mw-collapsible-toggle" style="text-align:right; margin:-0.62em 0 0.25em; line-height:1;">'''Expand'''</div>
<div class="mw-collapsible-content">
Send an email with the following info before the training can be arranged:
* The name of the person you have shadowed and the number of times you've done it.
* Confirm that you have a sample ready.
* Which tool you want to use: AJA1 or AJA2?
* What process do you want to run ?
* Either the recipe name or specify the required process parameters.
* What is your project alias? If unsure, contact your supervisor first.

Before the training session:
* Watch the instruction video on how to load/unload and read the standard operating procedures on the [[AJA Systems|AJA Systems tool page]]
</div>
</div>

=== ALD 1 ===
Email your ALD 1 request with shadowing, sample, and full process details.
<div class="mw-collapsible mw-collapsed" style="border:1px solid #f0d4ac; border-left:6px solid #c77700; background:#fff8ef; border-radius:6px; margin:0.45em 0 1.0em; padding:0.55em 0.75em 0.55em;">
<div class="mw-collapsible-toggle" style="text-align:right; margin:-0.62em 0 0.25em; line-height:1;">'''Expand'''</div>
<div class="mw-collapsible-content">
Send an email with the following info before the training can be arranged:
* The name of the person you have shadowed and the number of times you've done it.
* Confirm that you have a sample ready.
* Which tool you want to use.
* What process steps you want to run.
** Either the recipe name or all required process parameters.
** How long does the process take.
* What is your project alias? If unsure, contact your supervisor first.

Before the training session:
* Watch the instruction video(s) and read the standard operating procedure on the [[Cambridge ALD|ALD tool page]].
</div>
</div>

=== ALD 2 ===
Email your ALD 2 request with shadowing, sample, and full process details.
<div class="mw-collapsible mw-collapsed" style="border:1px solid #f0d4ac; border-left:6px solid #c77700; background:#fff8ef; border-radius:6px; margin:0.45em 0 1.0em; padding:0.55em 0.75em 0.55em;">
<div class="mw-collapsible-toggle" style="text-align:right; margin:-0.62em 0 0.25em; line-height:1;">'''Expand'''</div>
<div class="mw-collapsible-content">
Send an email with the following info before the training can be arranged:
* The name of the person you have shadowed and the number of times you've done it.
* Confirm that you have a sample ready.
* Which tool you want to use.
* What process steps you want to run.
** Either the recipe name or all required process parameters.
** How long does the process take.
* What is your project alias? If unsure, contact your supervisor first.

Before the training session:
* Watch the instruction video(s) and read the standard operating procedure on the [[Cambridge ALD|ALD tool page]].
</div>
</div>

== Packaging ==

=== F&S autobonder ===
Prepare shadowing and bonding documentation, then request F&S autobonder training.
<div class="mw-collapsible mw-collapsed" style="border:1px solid #d9c8b7; border-left:6px solid #8b5e3c; background:#fbf6f1; border-radius:6px; margin:0.45em 0 1.0em; padding:0.55em 0.75em 0.55em;">
<div class="mw-collapsible-toggle" style="text-align:right; margin:-0.62em 0 0.25em; line-height:1;">'''Expand'''</div>
<div class="mw-collapsible-content">
Send an email with the following info before the training can be arranged:

* Shadow colleagues using the tool 2-3 times.
* You must have a '''chip''' for bonding.
* You must know which '''daughterboard''' you will use for bonding.
* You must know what material you use to '''mount''' the chip to the daughterboard (silver paint, PMMA or whatever is specific to your measurement).
* You must prepare a '''bonding schematic''' and have one of your team members verify that it is correct.
* What is your project alias? If unsure, contact your supervisor first.
* Read through the wiki page: https://wiki.nbi.ku.dk/cleanroom/FS_bonder
* Request a training session at this point.

Two training sessions are required to get access to the bonder:

# 3 hours: Basic bonder training and chip bonding
# 2 hours: Sign-off session
</div>
</div>

=== Manual bonder ===
Request manual bonder training via [mailto:cleanroom@nbi.ku.dk cleanroom@nbi.ku.dk].
<div class="mw-collapsible mw-collapsed" style="border:1px solid #d8dde3; border-left:6px solid #72777d; background:#f8f9fa; border-radius:6px; margin:0.45em 0 1.0em; padding:0.55em 0.75em 0.55em;">
<div class="mw-collapsible-toggle" style="text-align:right; margin:-0.62em 0 0.25em; line-height:1;">'''Expand'''</div>
<div class="mw-collapsible-content">
</div>
</div>

== Miscellaneous ==

=== Micromanipulator ===
Complete group-level training first, then request a micromanipulator sign-off session.
<div class="mw-collapsible mw-collapsed" style="border:1px solid #d9c8b7; border-left:6px solid #8b5e3c; background:#fbf6f1; border-radius:6px; margin:0.45em 0 1.0em; padding:0.55em 0.75em 0.55em;">
<div class="mw-collapsible-toggle" style="text-align:right; margin:-0.62em 0 0.25em; line-height:1;">'''Expand'''</div>
<div class="mw-collapsible-content">
* Please get trained within your research group first. Then request a sign-off session.
* What is your project alias? If unsure, contact your supervisor first.
</div>
</div>

[[Category:Tools]]

Fabrication

2026-04-14T08:01:52Z

Harry:

__NOTOC__
=Computers and software=

[[Remote access and N-Drive]]

[[Cleanroom computers]]

[[Design computers]]

[[Design software]]

[[Booking Calendar]]

=Electron Beam Lithography=

[[Recommended parameters for EBL]]

[[Doses]]

[[Design template for EBL]]

[[BEAMER]]

[[ProSEM]]

[[TRACER]]

=Lithography=
[[Fundamentals of lithography]]

=Materials & Processes in the NBI Cleanroom=
==Materials==
[[Resists]]

[[Wafers]]

==Processes==

[[Resist spin coating]]

[[Cleaning]]

[[Ga removal from backside of GaAs wafers]]

[[Etching]]

[[Preparation of solutions]]

[[Category:Fabrication]]

Design template for lithography training

2026-04-14T07:57:42Z

Harry: Harry moved page Design template for lithography training to Design template for EBL

#REDIRECT [[Design template for EBL]]

Design template for EBL

2026-04-14T07:57:42Z

Harry: Harry moved page Design template for lithography training to Design template for EBL

=Introduction=
[[Image: design_phidl.png|thumb|Recommended design on phidl]]
We recommend using a combination of the following tools for designing devices:
* Klayout or CleWin (only for Windows)
* [[Phidl]] (python-based)
* Copilot (great tool to boost your productivity)

There is a code you can use as a basis to build the design for your EBL trainings.

You can find them on <code>N/SCI-NBI-Cleanroom/Elionix100 EXP files/general Training</code>.
* CR_template_training.gds ''design with alrignment marks and vernier patterns (~27mins exposure time)''
* design_template.ipynb
* layer1_training.ftxt ''BEAMER file for elionix 100keV with 500pA''

=Design requirements=
The chips provided from the cleanroom are usually 10x10mm2, so the design should be inside this area
You are welcome to use the provided code and explore different possibilities on your own.

As a baseline, please follow the guidelines:

* Include at least 4 alignment marks, each at the corner of your chip
* Include a vernier pattern to test the alignment accuracy of the tool.
* The design should be in gds or dxf format
* Your design will have two layers: one for session 2 and one for ''Session 3''
* Contain your design in an area of 600x1200 μm2
* Avoid placing your design in the centre of the chip (ie break the symmetry). This will make it easier for you to identify the correct orientation when loading ''Session 3''
* Lines can have a width of a minimum 60 nm up to 2 μm
* The complete exposure shouldn't take more than 90 mins
* Most importantly, let your creativity be free. You can use images transformed in gds.

Main Page

2026-04-14T07:56:44Z

Harry: /* Current tool status */

'''Welcome to the NBI Cleanroom wiki!'''

This site contains public information for the users of the cleanroom and related facilities. All items are available '''without login'''. Internal information that should not be disclosed can be posted at the password protected [https://wiki.nbi.ku.dk/qdevwiki/Main_Page QDev wiki].

{| style="width: 60%;" align="center"
|- style="text-align:center;"
|[[File:Tools_button.png|100px|link=Tools|Tools]] || [[File:Safety_button.png|100px|link=Safety|Safety]] || [[File:Fabrication_button.png|100px|link=Fabrication|Fabrication]] || [[File:Calendar_button.png|100px|link=http://cleanroom.brickhost.com/|Calendar]] || [[File:Training ico.png|100px|link=Training|Training]] || [[File:Info_button.png|100px|link=About|About]] || [[File:MBE.png|90px|link=MBE|MBE]] || [[File:sustain.png|90px|link=Sustainability|Sustainability]]
|- style="text-align:center;"
| Tools || Safety || Fabrication || Booking || Training || About || MBE || Sustainability
|}

==Current tool status==

{| cellspacing=0px style="text-align: left;"
|-
| style="text-align:right; padding-right:6px;" | [[Heidelberg µPG 501|Heidelberg LED writer]]
| style="background-color: #c6e0b4" | All good!
|-
| style="text-align:right; padding-right:6px;" | [[Raith eLine|Raith eLine 30 kV]]
| style="background-color: #c6e0b4" | All good!
|-
| style="text-align:right; padding-right:6px;" | [[Elionix_7000|Elionix 7000 100 kV]]
| style="background-color: #ff9f9f" | Maintenance: Gun exchange. expected date: Fri 1 May 2026
|-
| style="text-align:right; padding-right:6px;" | [[Elionix_F-125|Elionix F-125 125 kV]]
| style="background-color: #c6e0b4" | All good!
|-
| style="padding-bottom:6px;" |
|-
| style="text-align:right; padding-right:6px;" | [[AJA systems|AJA1]]
| style="background-color: #FFBF00" | Minor issue with the on/off button of the Carrera FerroTech. Please contact cleanroom if the button isn't responding.
|-
| style="text-align:right; padding-right:6px;" | [[AJA systems|AJA2]]
| style="background-color: #c6e0b4" | All good!
|-
| style="text-align:right; padding-right:6px;" | [[Plassys Evaporator]]
| style="background-color: #c6e0b4" | All good!
|-
| style="text-align:right; padding-right:6px;" | [[E-Gun evaporator]]
| style="background-color: #c6e0b4" | All good! The chamber is dedicated to In
|-
| style="text-align:right; padding-right:6px;" | [[Cambridge ALD|ALD1]]
| style="background-color: #c6e0b4" | All good!
|-
| style="text-align:right; padding-right:6px;" | [[Cambridge ALD|ALD2]]
| style="background-color: #c6e0b4" | All good!
|-
| style="padding-bottom:6px;" |
|-
| style="text-align:right; padding-right:6px;" | [[FS bonder]]
| style="background-color: #c6e0b4" | All good!
|-
| style="text-align:right; padding-right:6px;" | [[K&S bonder]]
| style="background-color: #c6e0b4" | All good!
|-
| style="text-align:right; padding-right:6px;" | [[Loomis scriber]]
| style="background-color: #c6e0b4" | All good!
|-
| style="text-align:right; padding-right:6px;" | [[Dicing saw]]
| style="background-color: #c6e0b4" | All good!
|-
| style="padding-bottom:6px;" |
|-
| style="text-align:right; padding-right:6px;" | [[Bruker Dimension Icon AFM|AFM]]
| style="background-color: #c6e0b4" | All good!
|-
| style="text-align:right; padding-right:6px;" | [[JEOL 7800F|JEOL JSM-7800F]]
| style="background-color: #c6e0b4" | All good!
|-
| style="text-align:right; padding-right:6px;" | [[JEOL 7800F|JEOL JSM-7800F prime]]
| style="background-color: #c6e0b4" | All good!
|-
| style="text-align:right; padding-right:6px;" | [[Talos F200i S/TEM|TEM]]
| style="background-color: #c6e0b4" | All good!
|}

''List updated: Tue 14 Apr 2026''

Recommended parameters for EBL

2026-04-09T08:45:22Z

Harry: /* Cleanroom recommendations */

= Cleanroom recommendations=

''This section needs additional data''

{| class="wikitable"
|+[[Elionix F-125|125 kV]]
|-
|Field Size (µm)
|Dots
|Pitch
|Pixel size (nm)
|Aperture (µm)
|Beam current (A)
|Beam spot (nm)
|-
|500
|50000
|8
|80
|240
|60e-9
|83.3
|-
|500
|1000000
|5
|2.5
|60
|1e-9
|2.6
|-
|-
|}

{| class="wikitable"
|+[[Elionix 7000|100 kV]]
|-
|Field Size (µm)
|Dots
|Pitch
|Pixel size (nm)
|Aperture (µm)
|Beam current (A)
|Beam spot (nm)
|-
|600
|20000
|7
|210
|250
|20e-9
|218.6
|-
|600
|240000
|1
|2.5
|40
|500e-12
|2.7
|-
|-
|}

= How to choose the correct parameters yourself =

A good place to start is the [https://sid.erda.dk/share_redirect/HUEfw6ttjf/index.html Unofficial dose calculator]

* Choose the EBL tool ('''100''' or '''125''' keV)
* '''Write field size (µm)''' and '''Dots''': The combination of these two will give you the pixel size for a default pitch of 1.
** It is recommended to use high number of dots with a pitch multiplier for fine exposures
* '''Aperture''' and '''Beam current''': The combination of these two will give you the beam spot size

<blockquote style="background-color: #F0F0F0; border: dashed thin grey;">
The '''pixel size''' should be roughly equal to the '''beam spot size'''
</blockquote>

* '''Area dose''': The recommended dose for the combination of substrate and resist stack that you have. If you don't know this value you can do a dose test for your substrate/resist combination or consult the [[Doses]] page

Fabrication

2026-04-09T08:42:06Z

Harry: /* EBL and GenISys software */

__NOTOC__
=Computers and software=

[[Remote access and N-Drive]]

[[Cleanroom computers]]

[[Design computers]]

[[Design software]]

[[Booking Calendar]]

=Electron Beam Lithography=

[[Recommended parameters for EBL]]

[[Doses]]

[[BEAMER]]

[[ProSEM]]

[[TRACER]]

=Lithography=
[[Fundamentals of lithography]]

[[Design template for lithography training]]

=Preparing your sample=
[[Resists]]

[[Resist spin coating]]

[[Cleaning]]

[[Wafers]]

[[Ga removal from backside of GaAs wafers]]

=Processing your sample=

[[Etching]]

[[Preparation of solutions]]

[[Category:Fabrication]]

Recommended parameters for EBL

2026-04-09T08:40:33Z

Harry: /* How to choose the correct parameters yourself */

= Cleanroom recommendations=
{| class="wikitable"
|+[[Elionix F-125|125 kV]]
|-
|Field Size (µm)
|Dots
|Pitch
|Pixel size (nm)
|Aperture (µm)
|Beam current (A)
|Beam spot (nm)
|-
|500
|50000
|8
|80
|240
|60e-9
|83.3
|-
|500
|1000000
|5
|2.5
|60
|1e-9
|2.6
|-
|-
|}

{| class="wikitable"
|+[[Elionix 7000|100 kV]]
|-
|Field Size (µm)
|Dots
|Pitch
|Pixel size (nm)
|Aperture (µm)
|Beam current (A)
|Beam spot (nm)
|-
|600
|20000
|7
|210
|250
|20e-9
|218.6
|-
|600
|240000
|1
|2.5
|40
|500e-12
|2.7
|-
|-
|}

= How to choose the correct parameters yourself =

A good place to start is the [https://sid.erda.dk/share_redirect/HUEfw6ttjf/index.html Unofficial dose calculator]

* Choose the EBL tool ('''100''' or '''125''' keV)
* '''Write field size (µm)''' and '''Dots''': The combination of these two will give you the pixel size for a default pitch of 1.
** It is recommended to use high number of dots with a pitch multiplier for fine exposures
* '''Aperture''' and '''Beam current''': The combination of these two will give you the beam spot size

<blockquote style="background-color: #F0F0F0; border: dashed thin grey;">
The '''pixel size''' should be roughly equal to the '''beam spot size'''
</blockquote>

* '''Area dose''': The recommended dose for the combination of substrate and resist stack that you have. If you don't know this value you can do a dose test for your substrate/resist combination or consult the [[Doses]] page

Recommended parameters for EBL

2026-04-09T08:40:17Z

Harry: /* Cleanroom recommendations */

= Cleanroom recommendations=
{| class="wikitable"
|+[[Elionix F-125|125 kV]]
|-
|Field Size (µm)
|Dots
|Pitch
|Pixel size (nm)
|Aperture (µm)
|Beam current (A)
|Beam spot (nm)
|-
|500
|50000
|8
|80
|240
|60e-9
|83.3
|-
|500
|1000000
|5
|2.5
|60
|1e-9
|2.6
|-
|-
|}

{| class="wikitable"
|+[[Elionix 7000|100 kV]]
|-
|Field Size (µm)
|Dots
|Pitch
|Pixel size (nm)
|Aperture (µm)
|Beam current (A)
|Beam spot (nm)
|-
|600
|20000
|7
|210
|250
|20e-9
|218.6
|-
|600
|240000
|1
|2.5
|40
|500e-12
|2.7
|-
|-
|}

= How to choose the correct parameters yourself =

A good place to start is the [https://sid.erda.dk/share_redirect/HUEfw6ttjf/index.html Unofficial dose calculator]

* Choose the EBL tool ('''100''' or '''125''' keV)
* '''Write field size (µm)''' and '''Dots''': The combination of these two will give you the pixel size for a default pitch of 1.
** It is recommended to use high number of dots with a pitch multiplier for fine exposures
* '''Aperture''' and '''Beam current''': The combination of these two will give you the beam spot size

<blockquote style="background-color: #F0F0F0; border: dashed thin grey;">
The '''pixel size''' should be equal to the '''beam spot size'''
</blockquote>

* '''Area dose''': The recommended dose for the combination of substrate and resist stack that you have. If you don't know this value you can do a dose test for your substrate/resist combination or consult the [[Doses]] page

Recommended parameters for EBL

2026-04-09T08:12:24Z

Harry: Created page with "= Cleanroom recommendations= {| class="wikitable" |+125 kV |- |Resist |Si |InAs<sup>UC</sup> |InP<sup>UC</sup> |GaAs<sup>UC</sup> |SiGe |- |A2 |1000 |700 |? |? |? |- |A4 |1200-1300 <ref name="Kringhoej" /> |700 |900 <ref name="Hertel" /> |630 |? |- |A6 |1200 |800 |900-920 <ref name="Hertel" /> |760 |? |- |EL6 |? |? |? |? |? |- |EL9 |450-500 <ref name="Kringhoej">[https://nbi.ku.dk/english/theses/phd-theses/anders-kringhoej/Anders_Kringhoej_P..."

= Cleanroom recommendations=
{| class="wikitable"
|+[[Elionix F-125|125 kV]]
|-
|[[Resists|Resist]]
|Si
|InAs<sup>UC</sup>
|InP<sup>UC</sup>
|GaAs<sup>UC</sup>
|SiGe
|-
|A2
|1000
|700
|?
|?
|?
|-
|A4
|1200-1300 <ref name="Kringhoej" />
|700
|900 <ref name="Hertel" />
|630
|?
|-
|A6
|1200
|800
|900-920 <ref name="Hertel" />
|760
|?
|-
|EL6
|?
|?
|?
|?
|?
|-
|EL9
|450-500 <ref name="Kringhoej">[https://nbi.ku.dk/english/theses/phd-theses/anders-kringhoej/Anders_Kringhoej_PhD.pdf Kringhøj PhD thesis]</ref>
|?
|280 <ref name="Hertel" />
|420
|?
|-
|CSAR4
|430
|?
|?
|?
|?
|-
|CSAR9
|500 <ref name="Kringhoej" />
|?
|?
|?
|?
|-
|CSAR13
|430 <ref name="Kringhoej" />
|?
|?
|350
|?
|-
|50k+A4
|?
|?
|500 <ref name="Hertel" />
|745
|?
|-
|}

{| class="wikitable"
|+[[Elionix 7000|100 kV]]
|-
|[[Resists|Resist]]
|Si
|InAs<sup>UC</sup>
|InP<sup>UC</sup>
|GaAs<sup>UC</sup>
|SiGe
|-
|A2
|900
|?
|620 <ref name="Drachmann" />
|?
|1500-1600 <ref name="Ansaloni" />
|-
|A4
|900
|640-680 <ref name="Whiticar">[https://nbi.ku.dk/english/theses/phd-theses/alexander-m-whiticar/Whiticar_thesis.pdf Whiticar PhD thesis]</ref>
|608-640 <ref name="Drachmann">[https://nbi.ku.dk/english/theses/phd-theses/asbjorn-cliff-drachmann/Drachmann_PhD_Thesis.pdf/Drachmann_PhD_Thesis.pdf Drachmann PhD thesis]</ref>
|630
|900 <ref name="Ansaloni">[https://nbi.ku.dk/english/theses/phd-theses/fabio-ansaloni/thesis_Ansaloni.pdf Ansaloni PhD thesis]</ref>
|-
|A6
|1000
|?
|?
|670
|?
|-
|EL6
|?
|?
|?
|?
|?
|-
|EL9
|?
|250
|380 <ref name="Hertel">[https://nbi.ku.dk/english/theses/phd-theses/hertel/dissertation_Hertel.pdf Hertel PhD thesis]</ref>
|200 <ref name="Drachmann" />
|?
|-
|CSAR4
|400
|?
|?
|?
|335 <ref name="Ansaloni" />
|-
|CSAR9
|?
|?
|?
|?
|335 <ref name="Ansaloni" />
|-
|CSAR13
|?
|?
|?
|?
|?
|-
|50k+A4
|?
|?
|?
|630
|?
|-
|}

= How to choose the correct parameters yourself =

A good place to start is the [https://sid.erda.dk/share_redirect/HUEfw6ttjf/index.html Unofficial dose calculator]

* Choose the EBL tool ('''100''' or '''125''' keV)
* '''Write field size (µm)''' and '''Dots''': The combination of these two will give you the pixel size for a default pitch of 1.
** It is recommended to use high number of dots with a pitch multiplier for fine exposures
* '''Aperture''' and '''Beam current''': The combination of these two will give you the beam spot size

<blockquote style="background-color: #F0F0F0; border: dashed thin grey;">
The '''pixel size''' should be equal to the '''beam spot size'''
</blockquote>

* '''Area dose''': The recommended dose for the combination of substrate and resist stack that you have. If you don't know this value you can do a dose test for your substrate/resist combination or consult the [[Doses]] page

Fabrication

2026-04-09T07:53:18Z

Harry:

__NOTOC__
=Computers and software=

[[Remote access and N-Drive]]

[[Cleanroom computers]]

[[Design computers]]

[[Design software]]

[[Booking Calendar]]

=EBL and GenISys software=

[[Recommended parameters for EBL]]

[[Doses]]

[[BEAMER]]

[[ProSEM]]

[[TRACER]]

=Lithography=
[[Fundamentals of lithography]]

[[Design template for lithography training]]

=Preparing your sample=
[[Resists]]

[[Resist spin coating]]

[[Cleaning]]

[[Wafers]]

[[Ga removal from backside of GaAs wafers]]

=Processing your sample=

[[Etching]]

[[Preparation of solutions]]

[[Category:Fabrication]]

Remote access and N-Drive

2026-04-08T13:05:46Z

Harry: Created page with "= Requests for N-drive and remote access = All the requests are handled via the KUIT webpage. Log in with your credentials at the following webpage [https://identity.ku.dk identity.ku.dk]. * Click on <code> Manage user access</code> * <code> Select Users</code> : find your name and click next * Search: ** <code>SGT-FORSK_S4_NBI_CLEANROOM-USER</code> for remote access ** <code>N-SCI-NBI-Cleanroom-W</code> for N-Drive access : ''if you cannot see one of the above options..."

= Requests for N-drive and remote access =
All the requests are handled via the KUIT webpage. Log in with your credentials at the following webpage [https://identity.ku.dk identity.ku.dk].
* Click on <code> Manage user access</code>
* <code> Select Users</code> : find your name and click next
* Search:
** <code>SGT-FORSK_S4_NBI_CLEANROOM-USER</code> for remote access
** <code>N-SCI-NBI-Cleanroom-W</code> for N-Drive access
: ''if you cannot see one of the above options please contact your local administration and request to be added to the group.''
* Select the service that you would like to get access
* <code> Review and Submit</code>: Press submit
* One of the cleanroom administrators will approve your request.

= Mount N-drive to your PC=
To mount the Cleanroom N-drive on your own (non-KU) computer, map the following network drive

'''NB: You need to be on a wired KU network (ethernet connection) or connected to AnyConnect VPN: '''
* Windows: <code>\\unicph.domain\groupdir\SCI-NBI-Cleanroom </code>
* Mac: <code>smb://unicph.domain/groupdir/SCI-NBI-Cleanroom</code>
**User name: unicph\”your KU username”
**Password: “your KU password”

=Remote control of the lab computers=
* Log in to AnyConnect VPN
* Open VNC viewer
* Add the desired connection
* Connect

Cleanroom computers

2026-04-08T12:57:16Z

Harry: Created page with "There is a number of PCs connected to cleanroom tools. Cleanroom staff is responsible for those. They are used to control fabrication related systems and/or transfer data between them and N-drive. Do not use flash drives or other removable media."

There is a number of PCs connected to cleanroom tools.

Cleanroom staff is responsible for those.

They are used to control fabrication related systems and/or transfer data between them and N-drive.

Do not use flash drives or other removable media.

Fabrication

2026-04-08T12:55:38Z

Harry: /* Computers and software */

__NOTOC__
=Computers and software=

[[Remote access and N-Drive]]

[[Cleanroom computers]]

[[Design computers]]

[[Design software]]

[[Booking Calendar]]

=Lithography=
[[Fundamentals of lithography]]

[[Design template for lithography training]]

=Preparing your sample=
[[Resists]]

[[Resist spin coating]]

[[Cleaning]]

[[Wafers]]

[[Ga removal from backside of GaAs wafers]]

=Preparing your design=

[[Doses]]

[[BEAMER]]

[[TRACER]]

=Processing your sample=

[[Etching]]

[[Preparation of solutions]]

[[Category:Fabrication]]

=Characterisation software=

[[ProSEM]]

Design computers

2026-04-08T12:53:38Z

Harry: /* Design PCs */

There are '''four''' common computers at QDev/NBI cleanroom dedicated to CAD and EBL prep work, so-called ''Design PCs'', named Design 5 through 8.

They are located in '''321'''.

Please be mindful that a lot of other people want to use them. Booking is '''mandatory''' on the [[Booking Calendar]], schedule ''3rd Design'', regardless of whether the work is performed locally or remotely.

Clean up after yourself -- do not leave windows open and programs running once you are done.

Do not use flash drives or other removable media - use N-Drive instead.

Design computers

2026-04-08T12:53:30Z

Harry: Created page with "= Design PCs = There are '''four''' common computers at QDev/NBI cleanroom dedicated to CAD and EBL prep work, so-called ''Design PCs'', named Design 5 through 8. They are located in '''321'''. Please be mindful that a lot of other people want to use them. Booking is '''mandatory''' on the Booking Calendar, schedule ''3rd Design'', regardless of whether the work is performed locally or remotely. Clean up after yourself -- do not leave windows open and programs ru..."

Fabrication

2026-04-08T12:53:21Z

Harry: /* Computers and software */

__NOTOC__
=Computers and software=

[[Design computers]]

[[Design software]]

[[Cleanroom PCs]]

[[Booking Calendar]]

=Lithography=
[[Fundamentals of lithography]]

[[Design template for lithography training]]

=Preparing your sample=
[[Resists]]

[[Resist spin coating]]

[[Cleaning]]

[[Wafers]]

[[Ga removal from backside of GaAs wafers]]

=Preparing your design=

[[Doses]]

[[BEAMER]]

[[TRACER]]

=Processing your sample=

[[Etching]]

[[Preparation of solutions]]

[[Category:Fabrication]]

=Characterisation software=

[[ProSEM]]

Design software

2026-04-08T12:49:42Z

Harry:

= Design PCs =
There are '''four''' common computers at QDev/NBI cleanroom dedicated to CAD and EBL prep work, so-called ''Design PCs'', named Design 5 through 8.

They are located in '''321'''.

Please be mindful that a lot of other people want to use them. Booking is '''mandatory''' on the [[Booking Calendar]], schedule ''3rd Design'', regardless of whether the work is performed locally or remotely.

Clean up after yourself -- do not leave windows open and programs running once you are done.

Do not use flash drives or other removable media - use N-Drive instead.

= CAD software =
You are free to use any software you please to make your designs.

You are not limited to this list.

Cleanroom/IT staff does not provide support for using CAD software.

IT staff is responsible for maintaining licenses for CAD software at QDev/NBI.

== Visual design ==
If you want to have a visual editor and draw the design yourself, the following CAD software is available on the design PCs:
* AutoCAD
* KLayout (see some youtube tutorials here: https://www.youtube.com/@qnfcf6093/videos)
* DesignCAD
* LayoutEditor
* [[Clewin]]
All of the above is already installed on the Design PCs on the 3rd floor, room 321.
It may be possible to get them running on your own PC.

== Parametric design ==
If you wish to write code that generates your design, these software libraries are available online:
* [https://github.com/amccaugh/phidl phidl] for Python (Also available on this wiki: '''[[Phidl | Phidl]]''')
* [https://github.com/heitzmann/gdspy gdspy] for Python
* [https://github.com/heitzmann/gdstk gdstk] for C++/Python
* [https://github.com/ulfgri/gdsii-toolbox GDSII toolbox] for Octave/MATLAB

= EBL software =
Cleanroom staff is responsible for EBL-related software.

EBL-related processing software (only Design 5 & 7):
* [[BEAMER]]
* [[TRACER]]
* [[ProSEM]]
* WeCaS (separate versions for 100 kV and 125 kV systems)

== Troubleshooting ==
; WeCaS 100 kV is suddenly behaving like WeCaS 125 kV!
:# Start ''regedit.exe''
:# Delete all parameters under ''HKEY_CURRENT_USER/Software/Elionix,Inc./WecaS/Setting''
:# Set "Deny" permissions for the registry folder for the current user
; [[BEAMER]] frozen/non-responsive/seemingly not doing anything?
: Restart Design 7 (it runs the license server). This fixes most software errors and hang-ups.

Main Page

2026-03-24T16:34:38Z

Harry: /* Current tool status */

'''Welcome to the NBI Cleanroom wiki!'''

This site contains public information for the users of the cleanroom and related facilities. All items are available '''without login'''. Internal information that should not be disclosed can be posted at the password protected [https://wiki.nbi.ku.dk/qdevwiki/Main_Page QDev wiki].

{| style="width: 60%;" align="center"
|- style="text-align:center;"
|[[File:Tools_button.png|100px|link=Tools|Tools]] || [[File:Safety_button.png|100px|link=Safety|Safety]] || [[File:Fabrication_button.png|100px|link=Fabrication|Fabrication]] || [[File:Calendar_button.png|100px|link=http://cleanroom.brickhost.com/|Calendar]] || [[File:Training ico.png|100px|link=Training|Training]] || [[File:Info_button.png|100px|link=About|About]] || [[File:MBE.png|90px|link=MBE|MBE]] || [[File:sustain.png|90px|link=Sustainability|Sustainability]]
|- style="text-align:center;"
| Tools || Safety || Fabrication || Booking || Training || About || MBE || Sustainability
|}

==Current tool status==

{| cellspacing=0px style="text-align: left;"
|-
| style="text-align:right; padding-right:6px;" | [[Heidelberg µPG 501|Heidelberg LED writer]]
| style="background-color: #c6e0b4" | All good!
|-
| style="text-align:right; padding-right:6px;" | [[Raith eLine|Raith eLine 30 kV]]
| style="background-color: #c6e0b4" | All good!
|-
| style="text-align:right; padding-right:6px;" | [[Elionix_7000|Elionix 7000 100 kV]]
| style="background-color: #ff9f9f" | Maintenance: Gun exchange. expected date: Fri 27 Mar 2026
|-
| style="text-align:right; padding-right:6px;" | [[Elionix_F-125|Elionix F-125 125 kV]]
| style="background-color: #c6e0b4" | All good!
|-
| style="padding-bottom:6px;" |
|-
| style="text-align:right; padding-right:6px;" | [[AJA systems|AJA1]]
| style="background-color: #FFBF00" | Minor issue with the on/off button of the Carrera FerroTech. Please contact cleanroom if the button isn't responding.
|-
| style="text-align:right; padding-right:6px;" | [[AJA systems|AJA2]]
| style="background-color: #c6e0b4" | All good!
|-
| style="text-align:right; padding-right:6px;" | [[Plassys Evaporator]]
| style="background-color: #c6e0b4" | All good!
|-
| style="text-align:right; padding-right:6px;" | [[E-Gun evaporator]]
| style="background-color: #c6e0b4" | All good! The chamber is dedicated to In
|-
| style="text-align:right; padding-right:6px;" | [[Cambridge ALD|ALD1]]
| style="background-color: #c6e0b4" | All good!
|-
| style="text-align:right; padding-right:6px;" | [[Cambridge ALD|ALD2]]
| style="background-color: #c6e0b4" | All good!
|-
| style="padding-bottom:6px;" |
|-
| style="text-align:right; padding-right:6px;" | [[FS bonder]]
| style="background-color: #c6e0b4" | All good!
|-
| style="text-align:right; padding-right:6px;" | [[K&S bonder]]
| style="background-color: #c6e0b4" | All good!
|-
| style="text-align:right; padding-right:6px;" | [[Loomis scriber]]
| style="background-color: #c6e0b4" | All good!
|-
| style="text-align:right; padding-right:6px;" | [[Dicing saw]]
| style="background-color: #c6e0b4" | All good!
|-
| style="padding-bottom:6px;" |
|-
| style="text-align:right; padding-right:6px;" | [[Bruker Dimension Icon AFM|AFM]]
| style="background-color: #c6e0b4" | All good!
|-
| style="text-align:right; padding-right:6px;" | [[JEOL 7800F|JEOL JSM-7800F]]
| style="background-color: #c6e0b4" | All good!
|-
| style="text-align:right; padding-right:6px;" | [[JEOL 7800F|JEOL JSM-7800F prime]]
| style="background-color: #c6e0b4" | All good!
|}

''List updated: Wed 11 Mar 2026''

Main Page

2026-03-24T16:34:06Z

Harry: /* Current tool status */

'''Welcome to the NBI Cleanroom wiki!'''

This site contains public information for the users of the cleanroom and related facilities. All items are available '''without login'''. Internal information that should not be disclosed can be posted at the password protected [https://wiki.nbi.ku.dk/qdevwiki/Main_Page QDev wiki].

{| style="width: 60%;" align="center"
|- style="text-align:center;"
|[[File:Tools_button.png|100px|link=Tools|Tools]] || [[File:Safety_button.png|100px|link=Safety|Safety]] || [[File:Fabrication_button.png|100px|link=Fabrication|Fabrication]] || [[File:Calendar_button.png|100px|link=http://cleanroom.brickhost.com/|Calendar]] || [[File:Training ico.png|100px|link=Training|Training]] || [[File:Info_button.png|100px|link=About|About]] || [[File:MBE.png|90px|link=MBE|MBE]] || [[File:sustain.png|90px|link=Sustainability|Sustainability]]
|- style="text-align:center;"
| Tools || Safety || Fabrication || Booking || Training || About || MBE || Sustainability
|}

==Current tool status==

{| cellspacing=0px style="text-align: left;"
|-
| style="text-align:right; padding-right:6px;" | [[Heidelberg µPG 501|Heidelberg LED writer]]
| style="background-color: #c6e0b4" | All good!
|-
| style="text-align:right; padding-right:6px;" | [[Raith eLine|Raith eLine 30 kV]]
| style="background-color: #c6e0b4" | All good!
|-
| style="text-align:right; padding-right:6px;" | [[Elionix_7000|Elionix 7000 100 kV]]
| style="background-color: #ff9f9f" | Maintenance: Gun exchange. expected date: Fri 27 Mar 2026
|-
| style="text-align:right; padding-right:6px;" | [[Elionix_F-125|Elionix F-125 125 kV]]
| style="background-color: #c6e0b4" | All good!
|-
| style="padding-bottom:6px;" |
|-
| style="text-align:right; padding-right:6px;" | [[AJA systems|AJA1]]
| style="background-color: #FFBF00" | Minor issue with the on/off button of the Carrera FerroTech. Please contact cleanroom if the button isn't responding.
|-
| style="text-align:right; padding-right:6px;" | [[AJA systems|AJA2]]
| style="background-color: #FFBF00" | All good!
|-
| style="text-align:right; padding-right:6px;" | [[Plassys Evaporator]]
| style="background-color: #c6e0b4" | All good!
|-
| style="text-align:right; padding-right:6px;" | [[E-Gun evaporator]]
| style="background-color: #c6e0b4" | All good! The chamber is dedicated to In
|-
| style="text-align:right; padding-right:6px;" | [[Cambridge ALD|ALD1]]
| style="background-color: #c6e0b4" | All good!
|-
| style="text-align:right; padding-right:6px;" | [[Cambridge ALD|ALD2]]
| style="background-color: #FFBF00" | All good!
|-
| style="padding-bottom:6px;" |
|-
| style="text-align:right; padding-right:6px;" | [[FS bonder]]
| style="background-color: #c6e0b4" | All good!
|-
| style="text-align:right; padding-right:6px;" | [[K&S bonder]]
| style="background-color: #c6e0b4" | All good!
|-
| style="text-align:right; padding-right:6px;" | [[Loomis scriber]]
| style="background-color: #c6e0b4" | All good!
|-
| style="text-align:right; padding-right:6px;" | [[Dicing saw]]
| style="background-color: #c6e0b4" | All good!
|-
| style="padding-bottom:6px;" |
|-
| style="text-align:right; padding-right:6px;" | [[Bruker Dimension Icon AFM|AFM]]
| style="background-color: #c6e0b4" | All good!
|-
| style="text-align:right; padding-right:6px;" | [[JEOL 7800F|JEOL JSM-7800F]]
| style="background-color: #c6e0b4" | All good!
|-
| style="text-align:right; padding-right:6px;" | [[JEOL 7800F|JEOL JSM-7800F prime]]
| style="background-color: #c6e0b4" | All good!
|}

''List updated: Wed 11 Mar 2026''

Etching

2026-03-24T09:48:57Z

Harry: /* etching ALD HfOx */

=Wet etching=

https://transene.com/etch-compatibility/
Data comparing different bottles of transene type D: Etching on Si, InAs (001), and GaAs(001)

== Etch rate with MIF321 ==
The Al/SiO2 chips are developed in MIF321 for 50 sec, before etching.

{| class="wikitable"
|-
| Time [seconds]
| 0
| 3
| 6
| 9
| 12
| 15
|-
| Δh [nm]
| 10
| 25
| 35
| 40
| 50
| 60
|}

[[File:MIF_etch.jpg|750px]]

== Etch rate with BHF ==
===etching ALD HfOx===
Blank Si samples with HfOx grown locally by ALD.
The sample was etched for 2 mins and the film was measured by ellipsometry. Then, repeated the etch 3 times.

{| class="wikitable"
|-
| Time [minutes]
| 0
| 2
| 4
| 6
|-
| h [nm]
| 21.53
| 17.18
| 12.18
| 7.55
|}

=Dry etching=
For dry etching, you can use [[AJA systems]] or [[Plassys Evaporator]]. AJA1 and Plassys have an Ion gun for DC Kaufman milling, and in AJA2 you can do RF milling.
==Erch rate with AJA1==
* Argon flow: 15 sccm.
* pressure: 1 mTorr.
* Angle: 90 degree tilt , i.e. head on.
* Milling duration: 2 minutes warm-up followed by 4 minutes milling.

=== Kaufmann settings ===
* cathode Amps = 7.0
* Discharge Volts = 40.0
* Discharge Amps = 0.5
* Beam Volts = 300.0
* beam Amps = 23.0
* Accelerator Volts = 120.0
* Accelerator Amps = 10.0
* Emission mAmps = 46.0
* Neutralizer Amps = 11.0

=== Gold ===

{| class="wikitable"
|-
| Time [minutes]
| 1
| 3
| 5
| 7
|-
| Δh [nm]
| 9.2
| 28.4
| 46.9
| 46.5
|}

[[File:AJA1_Au.jpg|500px]]

=== Aluminum ===

{| class="wikitable"
|-
| Time [minutes]
| 1
| 3
| 5
| 7
|-
| Δh [nm]
| 2.5
| 7.7
| 13.4
| 21.3
|}

[[File:AJA1_Al.jpg|500px]]

==Erch rate with AJA2==

===SiOx===
Milling of SiOx on Si for 5 minutes at different pressures

{| class="wikitable"
|-
! rowspan="2" |Power [W] !! colspan="4" |Δh [nm]
|-
! 6 mTorr !! 12 mTorr !! 18 mTorr !! 24 mTorr
|-
| 50 ||2.7||3.0||5.5||3.7
|-
| 100||9.8||13.6||10.4||17.3
|-
| 150||13.5||16.2||47.3||35.1
|-
| 200||24.3||35.9||57.0||53.1
|-
| 250||38.3||47.9||77.3||72.7
|}

[[File:Milling.jpg|500px]]

''Data from Shiv, qdevwiki Aug 2016''

Etching

2026-03-24T09:47:15Z

Harry: /* Wet etching */

=Wet etching=

https://transene.com/etch-compatibility/
Data comparing different bottles of transene type D: Etching on Si, InAs (001), and GaAs(001)

== Etch rate with MIF321 ==
The Al/SiO2 chips are developed in MIF321 for 50 sec, before etching.

{| class="wikitable"
|-
| Time [seconds]
| 0
| 3
| 6
| 9
| 12
| 15
|-
| Δh [nm]
| 10
| 25
| 35
| 40
| 50
| 60
|}

[[File:MIF_etch.jpg|750px]]

== Etch rate with BHF ==
===etching ALD HfOx===
Blank Si samples with HfOx grown locally by ALD.

{| class="wikitable"
|-
| Time [minutes]
| 0
| 2
| 4
| 6
|-
| Δh [nm]
| 21.53
| 17.18
| 12.18
| 7.55
|}

=Dry etching=
For dry etching, you can use [[AJA systems]] or [[Plassys Evaporator]]. AJA1 and Plassys have an Ion gun for DC Kaufman milling, and in AJA2 you can do RF milling.
==Erch rate with AJA1==
* Argon flow: 15 sccm.
* pressure: 1 mTorr.
* Angle: 90 degree tilt , i.e. head on.
* Milling duration: 2 minutes warm-up followed by 4 minutes milling.

=== Kaufmann settings ===
* cathode Amps = 7.0
* Discharge Volts = 40.0
* Discharge Amps = 0.5
* Beam Volts = 300.0
* beam Amps = 23.0
* Accelerator Volts = 120.0
* Accelerator Amps = 10.0
* Emission mAmps = 46.0
* Neutralizer Amps = 11.0

=== Gold ===

{| class="wikitable"
|-
| Time [minutes]
| 1
| 3
| 5
| 7
|-
| Δh [nm]
| 9.2
| 28.4
| 46.9
| 46.5
|}

[[File:AJA1_Au.jpg|500px]]

=== Aluminum ===

{| class="wikitable"
|-
| Time [minutes]
| 1
| 3
| 5
| 7
|-
| Δh [nm]
| 2.5
| 7.7
| 13.4
| 21.3
|}

[[File:AJA1_Al.jpg|500px]]

==Erch rate with AJA2==

===SiOx===
Milling of SiOx on Si for 5 minutes at different pressures

{| class="wikitable"
|-
! rowspan="2" |Power [W] !! colspan="4" |Δh [nm]
|-
! 6 mTorr !! 12 mTorr !! 18 mTorr !! 24 mTorr
|-
| 50 ||2.7||3.0||5.5||3.7
|-
| 100||9.8||13.6||10.4||17.3
|-
| 150||13.5||16.2||47.3||35.1
|-
| 200||24.3||35.9||57.0||53.1
|-
| 250||38.3||47.9||77.3||72.7
|}

[[File:Milling.jpg|500px]]

''Data from Shiv, qdevwiki Aug 2016''

Main Page

2026-03-11T16:00:52Z

Harry: /* Current tool status */

'''Welcome to the NBI Cleanroom wiki!'''

This site contains public information for the users of the cleanroom and related facilities. All items are available '''without login'''. Internal information that should not be disclosed can be posted at the password protected [https://wiki.nbi.ku.dk/qdevwiki/Main_Page QDev wiki].

{| style="width: 60%;" align="center"
|- style="text-align:center;"
|[[File:Tools_button.png|100px|link=Tools|Tools]] || [[File:Safety_button.png|100px|link=Safety|Safety]] || [[File:Fabrication_button.png|100px|link=Fabrication|Fabrication]] || [[File:Calendar_button.png|100px|link=http://cleanroom.brickhost.com/|Calendar]] || [[File:Training ico.png|100px|link=Training|Training]] || [[File:Info_button.png|100px|link=About|About]] || [[File:MBE.png|90px|link=MBE|MBE]] || [[File:sustain.png|90px|link=Sustainability|Sustainability]]
|- style="text-align:center;"
| Tools || Safety || Fabrication || Booking || Training || About || MBE || Sustainability
|}

==Current tool status==

{| cellspacing=0px style="text-align: left;"
|-
| style="text-align:right; padding-right:6px;" | [[Heidelberg µPG 501|Heidelberg LED writer]]
| style="background-color: #FFBF00" | Cooling circulation pump will be replaced in week 11. The tool is available in the meantime.
|-
| style="text-align:right; padding-right:6px;" | [[Raith eLine|Raith eLine 30 kV]]
| style="background-color: #c6e0b4" | All good!
|-
| style="text-align:right; padding-right:6px;" | [[Elionix_7000|Elionix 7000 100 kV]]
| style="background-color: #ff9f9f" | Maintenance: Gun exchange. expected date: Fri 13 Mar 2026
|-
| style="text-align:right; padding-right:6px;" | [[Elionix_F-125|Elionix F-125 125 kV]]
| style="background-color: #c6e0b4" | All good!
|-
| style="padding-bottom:6px;" |
|-
| style="text-align:right; padding-right:6px;" | [[AJA systems|AJA1]]
| style="background-color: #FFBF00" | Minor issue with the on/off button of the Carrera FerroTech. Please contact cleanroom if the button isn't responding.
|-
| style="text-align:right; padding-right:6px;" | [[AJA systems|AJA2]]
| style="background-color: #FFBF00" | Concern about the deposition uniformity: Will be checked on Monday 9 of March
|-
| style="text-align:right; padding-right:6px;" | [[Plassys Evaporator]]
| style="background-color: #c6e0b4" | All good!
|-
| style="text-align:right; padding-right:6px;" | [[E-Gun evaporator]]
| style="background-color: #c6e0b4" | All good! The chamber is dedicated to In
|-
| style="text-align:right; padding-right:6px;" | [[Cambridge ALD|ALD1]]
| style="background-color: #c6e0b4" | All good!
|-
| style="text-align:right; padding-right:6px;" | [[Cambridge ALD|ALD2]]
| style="background-color: #FFBF00" | Concern about the vacuum. Will be checked on week 12
|-
| style="padding-bottom:6px;" |
|-
| style="text-align:right; padding-right:6px;" | [[FS bonder]]
| style="background-color: #c6e0b4" | All good!
|-
| style="text-align:right; padding-right:6px;" | [[K&S bonder]]
| style="background-color: #c6e0b4" | All good!
|-
| style="text-align:right; padding-right:6px;" | [[Loomis scriber]]
| style="background-color: #c6e0b4" | All good!
|-
| style="text-align:right; padding-right:6px;" | [[Dicing saw]]
| style="background-color: #c6e0b4" | All good!
|-
| style="padding-bottom:6px;" |
|-
| style="text-align:right; padding-right:6px;" | [[Bruker Dimension Icon AFM|AFM]]
| style="background-color: #c6e0b4" | All good!
|-
| style="text-align:right; padding-right:6px;" | [[JEOL 7800F|JEOL JSM-7800F]]
| style="background-color: #c6e0b4" | All good!
|-
| style="text-align:right; padding-right:6px;" | [[JEOL 7800F|JEOL JSM-7800F prime]]
| style="background-color: #c6e0b4" | All good!
|}

''List updated: Wed 11 Mar 2026''

Main Page

2026-03-06T14:43:58Z

Harry: /* Current tool status */

'''Welcome to the NBI Cleanroom wiki!'''

This site contains public information for the users of the cleanroom and related facilities. All items are available '''without login'''. Internal information that should not be disclosed can be posted at the password protected [https://wiki.nbi.ku.dk/qdevwiki/Main_Page QDev wiki].

{| style="width: 60%;" align="center"
|- style="text-align:center;"
|[[File:Tools_button.png|100px|link=Tools|Tools]] || [[File:Safety_button.png|100px|link=Safety|Safety]] || [[File:Fabrication_button.png|100px|link=Fabrication|Fabrication]] || [[File:Calendar_button.png|100px|link=http://cleanroom.brickhost.com/|Calendar]] || [[File:Training ico.png|100px|link=Training|Training]] || [[File:Info_button.png|100px|link=About|About]] || [[File:MBE.png|90px|link=MBE|MBE]] || [[File:sustain.png|90px|link=Sustainability|Sustainability]]
|- style="text-align:center;"
| Tools || Safety || Fabrication || Booking || Training || About || MBE || Sustainability
|}

==Current tool status==

{| cellspacing=0px style="text-align: left;"
|-
| style="text-align:right; padding-right:6px;" | [[Heidelberg µPG 501|Heidelberg LED writer]]
| style="background-color: #FFBF00" | Cooling circulation pump will be replaced in week 11. The tool is available in the meantime.
|-
| style="text-align:right; padding-right:6px;" | [[Raith eLine|Raith eLine 30 kV]]
| style="background-color: #c6e0b4" | All good!
|-
| style="text-align:right; padding-right:6px;" | [[Elionix_7000|Elionix 7000 100 kV]]
| style="background-color: #ff9f9f" | Maintenance: Gun exchange. expected date: Tue 10 Mar 2026
|-
| style="text-align:right; padding-right:6px;" | [[Elionix_F-125|Elionix F-125 125 kV]]
| style="background-color: #c6e0b4" | All good!
|-
| style="padding-bottom:6px;" |
|-
| style="text-align:right; padding-right:6px;" | [[AJA systems|AJA1]]
| style="background-color: #FFBF00" | Minor issue with the on/off button of the Carrera FerroTech. Please contact cleanroom if the button isn't responding.
|-
| style="text-align:right; padding-right:6px;" | [[AJA systems|AJA2]]
| style="background-color: #FFBF00" | Concern about the deposition uniformity: Will be checked on Monday 9 of March
|-
| style="text-align:right; padding-right:6px;" | [[Plassys Evaporator]]
| style="background-color: #c6e0b4" | All good!
|-
| style="text-align:right; padding-right:6px;" | [[E-Gun evaporator]]
| style="background-color: #c6e0b4" | All good! The chamber is dedicated to In
|-
| style="text-align:right; padding-right:6px;" | [[Cambridge ALD|ALD1]]
| style="background-color: #c6e0b4" | All good!
|-
| style="text-align:right; padding-right:6px;" | [[Cambridge ALD|ALD2]]
| style="background-color: #FFBF00" | Concern about the vacuum. Will be checked on week 11
|-
| style="padding-bottom:6px;" |
|-
| style="text-align:right; padding-right:6px;" | [[FS bonder]]
| style="background-color: #c6e0b4" | All good!
|-
| style="text-align:right; padding-right:6px;" | [[K&S bonder]]
| style="background-color: #c6e0b4" | All good!
|-
| style="text-align:right; padding-right:6px;" | [[Loomis scriber]]
| style="background-color: #c6e0b4" | All good!
|-
| style="text-align:right; padding-right:6px;" | [[Dicing saw]]
| style="background-color: #c6e0b4" | All good!
|-
| style="padding-bottom:6px;" |
|-
| style="text-align:right; padding-right:6px;" | [[Bruker Dimension Icon AFM|AFM]]
| style="background-color: #c6e0b4" | All good!
|-
| style="text-align:right; padding-right:6px;" | [[JEOL 7800F|JEOL JSM-7800F]]
| style="background-color: #c6e0b4" | All good!
|-
| style="text-align:right; padding-right:6px;" | [[JEOL 7800F|JEOL JSM-7800F prime]]
| style="background-color: #c6e0b4" | All good!
|}

''List updated: Fri 6 Mar 2026''

Design software

2026-03-03T09:04:21Z

Harry: /* Visual design */

There is a number of common computers at QDev/NBI cleanroom for shared use.

Please be mindful that a lot of other people want to use them. So, always book before starting to use a PC.

Clean up after yourself -- do not leave windows open and programs running once you are done.

Do not use flash drives or other removable media.
Use N-Drive instead.

= Design PCs =
There are 4 PCs dedicated to CAD and EBL prep work, so-called ''Design PCs'', named Design 5 through 8.

They are located in 321.

They have N-Drive access.

= Booking rules =
Booking is '''mandatory''' on the [[Booking Calendar]], schedule ''3rd Design'', regardless of whether the work is performed locally or remotely.

= CAD software =
You are free to use any software you please to make your designs.

You are not limited to this list.

Cleanroom/IT staff does not provide support for using CAD software.

IT staff is responsible for maintaining licenses for CAD software at QDev/NBI.

== Visual design ==
If you want to have a visual editor and draw the design yourself, the following CAD software is available on the design PCs:
* AutoCAD
* KLayout (see some youtube tutorials here: https://www.youtube.com/@qnfcf6093/videos)
* DesignCAD
* LayoutEditor
* [[Clewin]]
All of the above is already installed on the Design PCs on the 3rd floor, room 321.
It may be possible to get them running on your own PC.

== Parametric design ==
If you wish to write code that generates your design, these software libraries are available online:
* [https://github.com/amccaugh/phidl phidl] for Python (Also available on this wiki: '''[[Phidl | Phidl]]''')
* [https://github.com/heitzmann/gdspy gdspy] for Python
* [https://github.com/heitzmann/gdstk gdstk] for C++/Python
* [https://github.com/ulfgri/gdsii-toolbox GDSII toolbox] for Octave/MATLAB

= EBL software =
Cleanroom staff is responsible for EBL-related software.

EBL-related processing software (only Design 5 & 7):
* [[BEAMER]]
* [[TRACER]]
* [[ProSEM]]
* WeCaS (separate versions for 100 kV and 125 kV systems)

== Troubleshooting ==
; WeCaS 100 kV is suddenly behaving like WeCaS 125 kV!
:# Start ''regedit.exe''
:# Delete all parameters under ''HKEY_CURRENT_USER/Software/Elionix,Inc./WecaS/Setting''
:# Set "Deny" permissions for the registry folder for the current user
; [[BEAMER]] frozen/non-responsive/seemingly not doing anything?
: Restart Design 7 (it runs the license server). This fixes most software errors and hang-ups.

Design software

2026-03-03T09:03:23Z

Harry:

There is a number of common computers at QDev/NBI cleanroom for shared use.

Please be mindful that a lot of other people want to use them. So, always book before starting to use a PC.

Clean up after yourself -- do not leave windows open and programs running once you are done.

Do not use flash drives or other removable media.
Use N-Drive instead.

= Design PCs =
There are 4 PCs dedicated to CAD and EBL prep work, so-called ''Design PCs'', named Design 5 through 8.

They are located in 321.

They have N-Drive access.

= Booking rules =
Booking is '''mandatory''' on the [[Booking Calendar]], schedule ''3rd Design'', regardless of whether the work is performed locally or remotely.

= CAD software =
You are free to use any software you please to make your designs.

You are not limited to this list.

Cleanroom/IT staff does not provide support for using CAD software.

IT staff is responsible for maintaining licenses for CAD software at QDev/NBI.

== Visual design ==
If you want to have a visual editor and draw the design yourself, the following CAD software is available on the design PCs:
* AutoCAD
* KLayout
* DesignCAD
* LayoutEditor
* [[Clewin]]
All of the above is already installed on the Design PCs on the 3rd floor, room 321.
It may be possible to get them running on your own PC.

== Parametric design ==
If you wish to write code that generates your design, these software libraries are available online:
* [https://github.com/amccaugh/phidl phidl] for Python (Also available on this wiki: '''[[Phidl | Phidl]]''')
* [https://github.com/heitzmann/gdspy gdspy] for Python
* [https://github.com/heitzmann/gdstk gdstk] for C++/Python
* [https://github.com/ulfgri/gdsii-toolbox GDSII toolbox] for Octave/MATLAB

= EBL software =
Cleanroom staff is responsible for EBL-related software.

EBL-related processing software (only Design 5 & 7):
* [[BEAMER]]
* [[TRACER]]
* [[ProSEM]]
* WeCaS (separate versions for 100 kV and 125 kV systems)

== Troubleshooting ==
; WeCaS 100 kV is suddenly behaving like WeCaS 125 kV!
:# Start ''regedit.exe''
:# Delete all parameters under ''HKEY_CURRENT_USER/Software/Elionix,Inc./WecaS/Setting''
:# Set "Deny" permissions for the registry folder for the current user
; [[BEAMER]] frozen/non-responsive/seemingly not doing anything?
: Restart Design 7 (it runs the license server). This fixes most software errors and hang-ups.

Design template for EBL

2026-02-18T13:42:48Z

Harry: /* Design requirements */

Design template for EBL

2026-02-17T17:27:26Z

Harry: /* Introduction */

=Introduction=
[[Image: design_phidl.png|thumb|Recommended design on phidl]]
We recommend using a combination of the following tools for designing devices:
* Klayout or CleWin (only for Windows)
* [[Phidl]] (python-based)
* Copilot (great tool to boost your productivity)

There is a code you can use as a basis to build the design for your EBL trainings.

You can find them on <code>N/SCI-NBI-Cleanroom/Elionix100 EXP files/general Training</code>.
* CR_template_training.gds ''design with alrignment marks and vernier patterns (~27mins exposure time)''
* design_template.ipynb
* layer1_training.ftxt ''BEAMER file for elionix 100keV with 500pA''

=Design requirements=
The chips provided from the cleanroom are usually 10x10mm2, so the design should be inside this area
You are welcome to use the provided code and explore different possibilities on your own.

As a baseline, please follow the guidelines:

* Include at least 4 alignment marks, each at the corner of your chip
* Include a vernier pattern to test the alignment accuracy of the tool
* The design should be in gds or dxf format
* Your design will have two layers: one for session 2 and one for session 3
* Contain your design in an area of 600x1200 μm2
* Lines can have a width of a minimum 60nm up to 2 μm
* The complete exposure shouldn't take more than 90 mins
* Most importantly, let your creativity be free. You can use images transformed in gds.