cleanroom - User contributions [en-gb]

Tools

2026-07-16T11:30:56Z

Chenglee:

Before submitting a training request, please review the prerequisites for each instrument in the [[Training]] section.

'''A standardized training request form has been introduced. The new system will allow users to request training for multiple instruments using a single form ([https://forms.office.com/e/b3PDKjsZ88?origin=lpr NBI-Cleanroom Training Request Form]). Please only request training for instruments that require immediate access. Following submission of the request form, email communication will continue to be used for scheduling and coordinating training activities. The Cleanroom staff will acknowledge and respond to training requests within 1-2 working days'''.

Once the user has completed the training, they are given booking rights in the [http://cleanroom.brickhost.com cleanroom booking system]. However, after a certain period of inactivity (90-day) on a given tool, the booking rights will expire and the user will need to be retrained in order to continue using the tool.

== Tool list ==
{| style="width: 85%;"
|- style="text-align:left;"
! Lithography !! Thin film & III-Vs !! Characterization !! Other
|- valign="top"
| style="width: 20%;" |
* [[Heidelberg µPG 501|Heidelberg LED writer]]

* [[Raith eLine|Raith eLine 30 kV EBL/SEM]]
* [[Elionix_7000|Elionix 7000 100 kV EBL]]
* [[Elionix_F-125|Elionix F-125 125kV EBL]] (QuanTech)
| style="width: 20%;" |
* [[AJA systems]]
* [[Plassys Evaporator]]
* [[E-Gun evaporator]]

* [[Laurell spinners]]
* [[Cambridge ALD]]
* [[Leica sputter coater]]
* [[MBE]]
| style="width: 20%;" |
* [[JEOL 7800F|JEOL JSM-7800F]]
* [[Raith eLine]]
* [[Talos F200i S/TEM]]
* [[Tencor profilometer]]
* [[Alpha-SE ellipsometer]]
* [[Sensofar optical profiler]]
* [[Olympus microscopes]]
* [[Lynx EVO stereomicroscope]]
* [[Bruker Dimension Icon AFM]]
* [[Filmetrics reflectometer]]
* [[Probe station]]
| style="width: 20%;" |
* [[Süss scriber|Manual Süss scriber]]
* [[Loomis scriber|Automatic Loomis scriber]]
* [[Dicing saw]]
* [[AccuThermo RTA]]
* [[Biorad]]
* [[Plasma-Preen asher]]
* [[Diener plasma asher]]
* [[Tergeo plasma asher]]
* [[FS bonder]]
* [[K&S bonder]]
* [[Micromanipulator]]
* [[Präzitherm hotplates]]
* [[Critical point dryer]]
|}

== Tool access requirement guidelines ==

{| cellspacing=0px style="text-align: center;"
! scope="col" width="20%" align="right" |
! scope="col" width="20%" | Bachelor
! scope="col" width="20%" | Master
! scope="col" width="20%" | PhD
! scope="col" width="20%" | Postdoc
|-
| style="text-align:right; padding-right:6px;" | [[Raith eLine|eLine]]
| style="background-color: #ff9f9f" | No
| style="background-color: #c6e0b4" | Yes
| style="background-color: #c6e0b4" | Yes
| style="background-color: #c6e0b4" | Yes
|-
| style="text-align:right; padding-right:6px;" | [[Elionix]]
| style="background-color: #ff9f9f" | No
| style="background-color: #c6e0b4" | Yes
| style="background-color: #c6e0b4" | Yes
| style="background-color: #c6e0b4" | Yes
|-
| style="text-align:right; padding-right:6px;" | [[Heidelberg µPG 501|LED writer]]
| style="background-color: #ff9f9f" | No
| style="background-color: #c6e0b4" | Yes
| style="background-color: #c6e0b4" | Yes
| style="background-color: #c6e0b4" | Yes
|-
| style="padding-bottom:6px;" |
|-
| style="text-align:right; padding-right:6px;" | [[AJA Systems|AJAs]]
| style="background-color: #c6e0b4" | Yes
| style="background-color: #c6e0b4" | Yes
| style="background-color: #c6e0b4" | Yes
| style="background-color: #c6e0b4" | Yes
|-
| style="text-align:right; padding-right:6px;" | [[Plassys Evaporator|Plassys]]
| style="background-color: #c6e0b4" | Yes
| style="background-color: #c6e0b4" | Yes
| style="background-color: #c6e0b4" | Yes
| style="background-color: #c6e0b4" | Yes
|-
| style="text-align:right; padding-right:6px;" | [[E-Gun evaporator|E-gun]]
| style="background-color: #c6e0b4" | Yes
| style="background-color: #c6e0b4" | Yes
| style="background-color: #c6e0b4" | Yes
| style="background-color: #c6e0b4" | Yes
|-
| style="text-align:right; padding-right:6px;" | [[Cambridge ALD|ALD]]
| style="background-color: #c6e0b4" | Yes
| style="background-color: #c6e0b4" | Yes
| style="background-color: #c6e0b4" | Yes
| style="background-color: #c6e0b4" | Yes
|-
| style="text-align:right; padding-right:6px;" | [[Leica sputter coater|Leica sputter]]
| style="background-color: #c6e0b4" | Yes
| style="background-color: #c6e0b4" | Yes
| style="background-color: #c6e0b4" | Yes
| style="background-color: #c6e0b4" | Yes
|-
| style="padding-bottom:6px;" |
|-
| style="text-align:right; padding-right:6px;" | [[JEOL 7800F]]
| style="background-color: #ff9f9f" | No
| style="background-color: #c6e0b4" | Yes
| style="background-color: #c6e0b4" | Yes
| style="background-color: #c6e0b4" | Yes
|-
| style="text-align:right; padding-right:6px;" | [[Talos F200i S/TEM |TEM]]
| style="background-color: #ff9f9f" | No
| style="background-color: #ff9f9f" | No
| style="background-color: #c6e0b4" | Yes
| style="background-color: #c6e0b4" | Yes
|-
| style="text-align:right; padding-right:6px;" | [[Tencor profilometer|Profilometer]]
| style="background-color: #c6e0b4" | Yes
| style="background-color: #c6e0b4" | Yes
| style="background-color: #c6e0b4" | Yes
| style="background-color: #c6e0b4" | Yes
|-
| style="text-align:right; padding-right:6px;" | [[Alpha-SE Ellipsometer|Ellipsometer]]
| style="background-color: #c6e0b4" | Yes
| style="background-color: #c6e0b4" | Yes
| style="background-color: #c6e0b4" | Yes
| style="background-color: #c6e0b4" | Yes
|-

| style="text-align:right; padding-right:6px;" | [[Bruker Dimension Icon AFM|AFM]]
| style="background-color: #c6e0b4" | Yes
| style="background-color: #c6e0b4" | Yes
| style="background-color: #c6e0b4" | Yes
| style="background-color: #c6e0b4" | Yes
|-
| style="text-align:right; padding-right:6px;" | [[Filmetrics reflectometer|Filmetrics]]
| style="background-color: #c6e0b4" | Yes
| style="background-color: #c6e0b4" | Yes
| style="background-color: #c6e0b4" | Yes
| style="background-color: #c6e0b4" | Yes
|-
| style="padding-bottom:6px;" |
|-
| style="text-align:right; padding-right:6px;" | [[Süss scriber|Manual scriber]]
| style="background-color: #c6e0b4" | Yes
| style="background-color: #c6e0b4" | Yes
| style="background-color: #c6e0b4" | Yes
| style="background-color: #c6e0b4" | Yes
|-
| style="text-align:right; padding-right:6px;" | [[Dicing saw]]
| style="background-color: #ff9f9f" | No
| style="background-color: #ff9f9f" | No
| style="background-color: #ff9f9f" | No
| style="background-color: #ff9f9f" | No
|-
| style="text-align:right; padding-right:6px;" | [[Loomis scriber]]
| style="background-color: #ff9f9f" | No
| style="background-color: #ff9f9f" | No
| style="background-color: #ff9f9f" | No
| style="background-color: #ff9f9f" | No
|-
| style="text-align:right; padding-right:6px;" | [[AccuThermo RTA|RTA]]
| style="background-color: #c6e0b4" | Yes
| style="background-color: #c6e0b4" | Yes
| style="background-color: #c6e0b4" | Yes
| style="background-color: #c6e0b4" | Yes
|-
| style="text-align:right; padding-right:6px;" | [[Biorad]]
| style="background-color: #c6e0b4" | Yes
| style="background-color: #c6e0b4" | Yes
| style="background-color: #c6e0b4" | Yes
| style="background-color: #c6e0b4" | Yes
|-
| style="text-align:right; padding-right:6px;" | [[Plasma-Preen asher]]
| style="background-color: #c6e0b4" | Yes
| style="background-color: #c6e0b4" | Yes
| style="background-color: #c6e0b4" | Yes
| style="background-color: #c6e0b4" | Yes
|-
| style="text-align:right; padding-right:6px;" | [[Tergeo Plasma Asher|Tergeo asher]]
| style="background-color: #c6e0b4" | Yes
| style="background-color: #c6e0b4" | Yes
| style="background-color: #c6e0b4" | Yes
| style="background-color: #c6e0b4" | Yes
|-
| style="text-align:right; padding-right:6px;" | [[Laurell spinners|Spinners]]
| style="background-color: #c6e0b4" | Yes
| style="background-color: #c6e0b4" | Yes
| style="background-color: #c6e0b4" | Yes
| style="background-color: #c6e0b4" | Yes
|}

[[Category:Tools]]

Main Page

2026-07-16T07:31:47Z

Chenglee: /* Current Tool Status */

'''Welcome to the NBI Cleanroom wiki!'''

This site contains public information for the users of the cleanroom and related facilities. All items are available '''without login'''. Internal information that should not be disclosed can be posted at the password protected [https://wiki.nbi.ku.dk/qdevwiki/Main_Page QDev wiki].

{| style="width: 60%;" align="center"
|- style="text-align:center;"
|[[File:Tools_button.png|100px|link=Tools|Tools]] || [[File:Safety_button.png|100px|link=Safety|Safety]] || [[File:Fabrication_button.png|100px|link=Fabrication|Fabrication]] || [[File:Calendar_button.png|100px|link=http://cleanroom.brickhost.com/|Calendar]] || [[File:Training ico.png|100px|link=Training|Training]] || [[File:Info_button.png|100px|link=About|About]] || [[File:MBE.png|90px|link=MBE|MBE]] || [[File:sustain.png|90px|link=Sustainability|Sustainability]]
|- style="text-align:center;"
| Tools || Safety || Fabrication || Booking || Training || About || MBE || Sustainability
|}

==NEWS: NBI-Cleanroom Training Request Form==
Starting in July 2026, a standardized training request form has been introduced. The new system will allow users to request training for multiple instruments using a single form ([https://forms.office.com/e/b3PDKjsZ88?origin=lprLink NBI-Cleanroom Training Request Form]). Following submission of the request form, email communication will continue to be used for scheduling and coordinating training activities.

==NEWS: Sample Storage Box Label Policy==
Starting in July 2026, a new standard policy for labeling sample storage boxes has been implemented. As a minimum, each storage box must be labelled with user's name, research group or company, month and year the box was first used, and whether it contains III-V materials. In addition, all individual sample trays and wafer boxes must be labelled with sample ID and clearly indicate whether they contain III-V materials.

==Current Tool Status==

''List updated: Tue 1 July 2026''

{| cellspacing=0px style="text-align: left;"
|-
| style="text-align:right; padding-right:6px;" | [[Heidelberg µPG 501|Heidelberg LED writer]]
| style="background-color: #c6e0b4" | All good!
|-
| style="text-align:right; padding-right:6px;" | [[Raith eLine|Raith eLine 30 kV]]
| style="background-color: #c6e0b4" | All good!
|-
| style="text-align:right; padding-right:6px;" | [[Elionix_7000|Elionix 7000 100 kV]]
| style="background-color: #ff9f9f" | Service: Blanking aperture. Expected recovery date: Until further notice.
|-
| style="text-align:right; padding-right:6px;" | [[Elionix_F-125|Elionix F-125 125 kV]]
| style="background-color: #c6e0b4" | All good!
|-
| style="padding-bottom:6px;" |
|-
| style="text-align:right; padding-right:6px;" | [[AJA systems|AJA1]]
| style="background-color: #FFBF00" | Minor issue with the on/off button of the Carrera FerroTech. Please contact cleanroom if the button isn't responding.
|-
| style="text-align:right; padding-right:6px;" | [[AJA systems|AJA2]]
| style="background-color: #c6e0b4" | All good!
|-
| style="text-align:right; padding-right:6px;" | [[Plassys Evaporator]]
| style="background-color: #c6e0b4" | All good!
|-
| style="text-align:right; padding-right:6px;" | [[E-Gun evaporator]]
| style="background-color: #c6e0b4" | All good! The chamber is dedicated to In
|-
| style="text-align:right; padding-right:6px;" | [[Cambridge ALD|ALD1]]
| style="background-color: #c6e0b4" | All good!
|-
| style="text-align:right; padding-right:6px;" | [[Cambridge ALD|ALD2]]
| style="background-color: #c6e0b4" | All good!
|-
| style="padding-bottom:6px;" |
|-
| style="text-align:right; padding-right:6px;" | [[FS bonder]]
| style="background-color: #c6e0b4" | All good!
|-
| style="text-align:right; padding-right:6px;" | [[K&S bonder]]
| style="background-color: #c6e0b4" | All good!
|-
| style="text-align:right; padding-right:6px;" | [[Loomis scriber]]
| style="background-color: #c6e0b4" | All good!
|-
| style="text-align:right; padding-right:6px;" | [[Dicing saw]]
| style="background-color: #c6e0b4" | All good!
|-
| style="padding-bottom:6px;" |
|-
| style="text-align:right; padding-right:6px;" | [[Bruker Dimension Icon AFM|AFM]]
| style="background-color: #c6e0b4" | All good!
|-
| style="text-align:right; padding-right:6px;" | [[JEOL 7800F|JEOL JSM-7800F]]
| style="background-color: #c6e0b4" | All good!
|-
| style="text-align:right; padding-right:6px;" | [[JEOL 7800F|JEOL JSM-7800F prime]]
| style="background-color: #c6e0b4" | All good!
|-
| style="text-align:right; padding-right:6px;" | [[Talos F200i S/TEM|TEM]]
| style="background-color: #c6e0b4" | All good!
|}

Main Page

2026-07-16T07:27:03Z

Chenglee: /* NEWS: NBI-Cleanroom Training Request Form */

'''Welcome to the NBI Cleanroom wiki!'''

This site contains public information for the users of the cleanroom and related facilities. All items are available '''without login'''. Internal information that should not be disclosed can be posted at the password protected [https://wiki.nbi.ku.dk/qdevwiki/Main_Page QDev wiki].

{| style="width: 60%;" align="center"
|- style="text-align:center;"
|[[File:Tools_button.png|100px|link=Tools|Tools]] || [[File:Safety_button.png|100px|link=Safety|Safety]] || [[File:Fabrication_button.png|100px|link=Fabrication|Fabrication]] || [[File:Calendar_button.png|100px|link=http://cleanroom.brickhost.com/|Calendar]] || [[File:Training ico.png|100px|link=Training|Training]] || [[File:Info_button.png|100px|link=About|About]] || [[File:MBE.png|90px|link=MBE|MBE]] || [[File:sustain.png|90px|link=Sustainability|Sustainability]]
|- style="text-align:center;"
| Tools || Safety || Fabrication || Booking || Training || About || MBE || Sustainability
|}

==NEWS: NBI-Cleanroom Training Request Form==
Starting in July 2026, a standardized training request form has been introduced. The new system will allow users to request training for multiple instruments using a single form ([https://forms.office.com/e/b3PDKjsZ88?origin=lprLink NBI-Cleanroom Training Request Form]). Following submission of the request form, email communication will continue to be used for scheduling and coordinating training activities.

==NEWS: Sample Storage Box Label Policy==
Starting in July 2026, a new standard policy for labeling sample storage boxes has been implemented. As a minimum, each storage box must be labelled with user's name, research group or company, month and year the box was first used, and whether it contains III-V materials. In addition, all individual sample trays and wafer boxes must be labelled with sample ID and clearly indicate whether they contain III-V materials.

==Current Tool Status==

{| cellspacing=0px style="text-align: left;"
|-
| style="text-align:right; padding-right:6px;" | [[Heidelberg µPG 501|Heidelberg LED writer]]
| style="background-color: #c6e0b4" | All good!
|-
| style="text-align:right; padding-right:6px;" | [[Raith eLine|Raith eLine 30 kV]]
| style="background-color: #c6e0b4" | All good!
|-
| style="text-align:right; padding-right:6px;" | [[Elionix_7000|Elionix 7000 100 kV]]
| style="background-color: #ff9f9f" | Service: Blanking aperture. Expected recovery date: Until further notice.
|-
| style="text-align:right; padding-right:6px;" | [[Elionix_F-125|Elionix F-125 125 kV]]
| style="background-color: #c6e0b4" | All good!
|-
| style="padding-bottom:6px;" |
|-
| style="text-align:right; padding-right:6px;" | [[AJA systems|AJA1]]
| style="background-color: #FFBF00" | Minor issue with the on/off button of the Carrera FerroTech. Please contact cleanroom if the button isn't responding.
|-
| style="text-align:right; padding-right:6px;" | [[AJA systems|AJA2]]
| style="background-color: #c6e0b4" | All good!
|-
| style="text-align:right; padding-right:6px;" | [[Plassys Evaporator]]
| style="background-color: #c6e0b4" | All good!
|-
| style="text-align:right; padding-right:6px;" | [[E-Gun evaporator]]
| style="background-color: #c6e0b4" | All good! The chamber is dedicated to In
|-
| style="text-align:right; padding-right:6px;" | [[Cambridge ALD|ALD1]]
| style="background-color: #c6e0b4" | All good!
|-
| style="text-align:right; padding-right:6px;" | [[Cambridge ALD|ALD2]]
| style="background-color: #c6e0b4" | All good!
|-
| style="padding-bottom:6px;" |
|-
| style="text-align:right; padding-right:6px;" | [[FS bonder]]
| style="background-color: #c6e0b4" | All good!
|-
| style="text-align:right; padding-right:6px;" | [[K&S bonder]]
| style="background-color: #c6e0b4" | All good!
|-
| style="text-align:right; padding-right:6px;" | [[Loomis scriber]]
| style="background-color: #c6e0b4" | All good!
|-
| style="text-align:right; padding-right:6px;" | [[Dicing saw]]
| style="background-color: #c6e0b4" | All good!
|-
| style="padding-bottom:6px;" |
|-
| style="text-align:right; padding-right:6px;" | [[Bruker Dimension Icon AFM|AFM]]
| style="background-color: #c6e0b4" | All good!
|-
| style="text-align:right; padding-right:6px;" | [[JEOL 7800F|JEOL JSM-7800F]]
| style="background-color: #c6e0b4" | All good!
|-
| style="text-align:right; padding-right:6px;" | [[JEOL 7800F|JEOL JSM-7800F prime]]
| style="background-color: #c6e0b4" | All good!
|-
| style="text-align:right; padding-right:6px;" | [[Talos F200i S/TEM|TEM]]
| style="background-color: #c6e0b4" | All good!
|}

''List updated: Tue 1 July 2026''

Main Page

2026-07-16T07:26:27Z

Chenglee: /* NEWS: Sample Storage Box Label Policy */

'''Welcome to the NBI Cleanroom wiki!'''

This site contains public information for the users of the cleanroom and related facilities. All items are available '''without login'''. Internal information that should not be disclosed can be posted at the password protected [https://wiki.nbi.ku.dk/qdevwiki/Main_Page QDev wiki].

{| style="width: 60%;" align="center"
|- style="text-align:center;"
|[[File:Tools_button.png|100px|link=Tools|Tools]] || [[File:Safety_button.png|100px|link=Safety|Safety]] || [[File:Fabrication_button.png|100px|link=Fabrication|Fabrication]] || [[File:Calendar_button.png|100px|link=http://cleanroom.brickhost.com/|Calendar]] || [[File:Training ico.png|100px|link=Training|Training]] || [[File:Info_button.png|100px|link=About|About]] || [[File:MBE.png|90px|link=MBE|MBE]] || [[File:sustain.png|90px|link=Sustainability|Sustainability]]
|- style="text-align:center;"
| Tools || Safety || Fabrication || Booking || Training || About || MBE || Sustainability
|}

==NEWS: NBI-Cleanroom Training Request Form==
Starting in July 2026, a standardized training request form will be introduced. The new system will allow users to request training for multiple instruments using a single form ([https://forms.office.com/e/b3PDKjsZ88?origin=lprLink NBI-Cleanroom Training Request Form]). Following submission of the request form, email communication will continue to be used for scheduling and coordinating training activities.

==NEWS: Sample Storage Box Label Policy==
Starting in July 2026, a new standard policy for labeling sample storage boxes has been implemented. As a minimum, each storage box must be labelled with user's name, research group or company, month and year the box was first used, and whether it contains III-V materials. In addition, all individual sample trays and wafer boxes must be labelled with sample ID and clearly indicate whether they contain III-V materials.

==Current Tool Status==

{| cellspacing=0px style="text-align: left;"
|-
| style="text-align:right; padding-right:6px;" | [[Heidelberg µPG 501|Heidelberg LED writer]]
| style="background-color: #c6e0b4" | All good!
|-
| style="text-align:right; padding-right:6px;" | [[Raith eLine|Raith eLine 30 kV]]
| style="background-color: #c6e0b4" | All good!
|-
| style="text-align:right; padding-right:6px;" | [[Elionix_7000|Elionix 7000 100 kV]]
| style="background-color: #ff9f9f" | Service: Blanking aperture. Expected recovery date: Until further notice.
|-
| style="text-align:right; padding-right:6px;" | [[Elionix_F-125|Elionix F-125 125 kV]]
| style="background-color: #c6e0b4" | All good!
|-
| style="padding-bottom:6px;" |
|-
| style="text-align:right; padding-right:6px;" | [[AJA systems|AJA1]]
| style="background-color: #FFBF00" | Minor issue with the on/off button of the Carrera FerroTech. Please contact cleanroom if the button isn't responding.
|-
| style="text-align:right; padding-right:6px;" | [[AJA systems|AJA2]]
| style="background-color: #c6e0b4" | All good!
|-
| style="text-align:right; padding-right:6px;" | [[Plassys Evaporator]]
| style="background-color: #c6e0b4" | All good!
|-
| style="text-align:right; padding-right:6px;" | [[E-Gun evaporator]]
| style="background-color: #c6e0b4" | All good! The chamber is dedicated to In
|-
| style="text-align:right; padding-right:6px;" | [[Cambridge ALD|ALD1]]
| style="background-color: #c6e0b4" | All good!
|-
| style="text-align:right; padding-right:6px;" | [[Cambridge ALD|ALD2]]
| style="background-color: #c6e0b4" | All good!
|-
| style="padding-bottom:6px;" |
|-
| style="text-align:right; padding-right:6px;" | [[FS bonder]]
| style="background-color: #c6e0b4" | All good!
|-
| style="text-align:right; padding-right:6px;" | [[K&S bonder]]
| style="background-color: #c6e0b4" | All good!
|-
| style="text-align:right; padding-right:6px;" | [[Loomis scriber]]
| style="background-color: #c6e0b4" | All good!
|-
| style="text-align:right; padding-right:6px;" | [[Dicing saw]]
| style="background-color: #c6e0b4" | All good!
|-
| style="padding-bottom:6px;" |
|-
| style="text-align:right; padding-right:6px;" | [[Bruker Dimension Icon AFM|AFM]]
| style="background-color: #c6e0b4" | All good!
|-
| style="text-align:right; padding-right:6px;" | [[JEOL 7800F|JEOL JSM-7800F]]
| style="background-color: #c6e0b4" | All good!
|-
| style="text-align:right; padding-right:6px;" | [[JEOL 7800F|JEOL JSM-7800F prime]]
| style="background-color: #c6e0b4" | All good!
|-
| style="text-align:right; padding-right:6px;" | [[Talos F200i S/TEM|TEM]]
| style="background-color: #c6e0b4" | All good!
|}

''List updated: Tue 1 July 2026''

Main Page

2026-07-15T06:28:58Z

Chenglee: /* NEWS: Sample Storage Box Label Policy */

'''Welcome to the NBI Cleanroom wiki!'''

This site contains public information for the users of the cleanroom and related facilities. All items are available '''without login'''. Internal information that should not be disclosed can be posted at the password protected [https://wiki.nbi.ku.dk/qdevwiki/Main_Page QDev wiki].

{| style="width: 60%;" align="center"
|- style="text-align:center;"
|[[File:Tools_button.png|100px|link=Tools|Tools]] || [[File:Safety_button.png|100px|link=Safety|Safety]] || [[File:Fabrication_button.png|100px|link=Fabrication|Fabrication]] || [[File:Calendar_button.png|100px|link=http://cleanroom.brickhost.com/|Calendar]] || [[File:Training ico.png|100px|link=Training|Training]] || [[File:Info_button.png|100px|link=About|About]] || [[File:MBE.png|90px|link=MBE|MBE]] || [[File:sustain.png|90px|link=Sustainability|Sustainability]]
|- style="text-align:center;"
| Tools || Safety || Fabrication || Booking || Training || About || MBE || Sustainability
|}

==NEWS: NBI-Cleanroom Training Request Form==
Starting in July 2026, a standardized training request form will be introduced. The new system will allow users to request training for multiple instruments using a single form ([https://forms.office.com/e/b3PDKjsZ88?origin=lprLink NBI-Cleanroom Training Request Form]). Following submission of the request form, email communication will continue to be used for scheduling and coordinating training activities.

==NEWS: Sample Storage Box Label Policy==
Starting in July 2026, a standard policy for labeling sample storage boxes has been implemented. As a minimum, each storage box must be labelled with user's name, research group or company, month and year the box was first used, and whether it contains III-V materials. In addition, all individual sample trays and wafer boxes must be labelled with sample ID and clearly indicate whether they contain III-V materials.

==Current Tool Status==

{| cellspacing=0px style="text-align: left;"
|-
| style="text-align:right; padding-right:6px;" | [[Heidelberg µPG 501|Heidelberg LED writer]]
| style="background-color: #c6e0b4" | All good!
|-
| style="text-align:right; padding-right:6px;" | [[Raith eLine|Raith eLine 30 kV]]
| style="background-color: #c6e0b4" | All good!
|-
| style="text-align:right; padding-right:6px;" | [[Elionix_7000|Elionix 7000 100 kV]]
| style="background-color: #ff9f9f" | Service: Blanking aperture. Expected recovery date: Until further notice.
|-
| style="text-align:right; padding-right:6px;" | [[Elionix_F-125|Elionix F-125 125 kV]]
| style="background-color: #c6e0b4" | All good!
|-
| style="padding-bottom:6px;" |
|-
| style="text-align:right; padding-right:6px;" | [[AJA systems|AJA1]]
| style="background-color: #FFBF00" | Minor issue with the on/off button of the Carrera FerroTech. Please contact cleanroom if the button isn't responding.
|-
| style="text-align:right; padding-right:6px;" | [[AJA systems|AJA2]]
| style="background-color: #c6e0b4" | All good!
|-
| style="text-align:right; padding-right:6px;" | [[Plassys Evaporator]]
| style="background-color: #c6e0b4" | All good!
|-
| style="text-align:right; padding-right:6px;" | [[E-Gun evaporator]]
| style="background-color: #c6e0b4" | All good! The chamber is dedicated to In
|-
| style="text-align:right; padding-right:6px;" | [[Cambridge ALD|ALD1]]
| style="background-color: #c6e0b4" | All good!
|-
| style="text-align:right; padding-right:6px;" | [[Cambridge ALD|ALD2]]
| style="background-color: #c6e0b4" | All good!
|-
| style="padding-bottom:6px;" |
|-
| style="text-align:right; padding-right:6px;" | [[FS bonder]]
| style="background-color: #c6e0b4" | All good!
|-
| style="text-align:right; padding-right:6px;" | [[K&S bonder]]
| style="background-color: #c6e0b4" | All good!
|-
| style="text-align:right; padding-right:6px;" | [[Loomis scriber]]
| style="background-color: #c6e0b4" | All good!
|-
| style="text-align:right; padding-right:6px;" | [[Dicing saw]]
| style="background-color: #c6e0b4" | All good!
|-
| style="padding-bottom:6px;" |
|-
| style="text-align:right; padding-right:6px;" | [[Bruker Dimension Icon AFM|AFM]]
| style="background-color: #c6e0b4" | All good!
|-
| style="text-align:right; padding-right:6px;" | [[JEOL 7800F|JEOL JSM-7800F]]
| style="background-color: #c6e0b4" | All good!
|-
| style="text-align:right; padding-right:6px;" | [[JEOL 7800F|JEOL JSM-7800F prime]]
| style="background-color: #c6e0b4" | All good!
|-
| style="text-align:right; padding-right:6px;" | [[Talos F200i S/TEM|TEM]]
| style="background-color: #c6e0b4" | All good!
|}

''List updated: Tue 1 July 2026''

Main Page

2026-07-14T09:09:17Z

Chenglee: /* Current tool status */

'''Welcome to the NBI Cleanroom wiki!'''

This site contains public information for the users of the cleanroom and related facilities. All items are available '''without login'''. Internal information that should not be disclosed can be posted at the password protected [https://wiki.nbi.ku.dk/qdevwiki/Main_Page QDev wiki].

{| style="width: 60%;" align="center"
|- style="text-align:center;"
|[[File:Tools_button.png|100px|link=Tools|Tools]] || [[File:Safety_button.png|100px|link=Safety|Safety]] || [[File:Fabrication_button.png|100px|link=Fabrication|Fabrication]] || [[File:Calendar_button.png|100px|link=http://cleanroom.brickhost.com/|Calendar]] || [[File:Training ico.png|100px|link=Training|Training]] || [[File:Info_button.png|100px|link=About|About]] || [[File:MBE.png|90px|link=MBE|MBE]] || [[File:sustain.png|90px|link=Sustainability|Sustainability]]
|- style="text-align:center;"
| Tools || Safety || Fabrication || Booking || Training || About || MBE || Sustainability
|}

==NEWS: NBI-Cleanroom Training Request Form==
Starting in July 2026, a standardized training request form will be introduced. The new system will allow users to request training for multiple instruments using a single form ([https://forms.office.com/e/b3PDKjsZ88?origin=lprLink NBI-Cleanroom Training Request Form]). Following submission of the request form, email communication will continue to be used for scheduling and coordinating training activities.

==NEWS: Sample Storage Box Label Policy==
Starting in July 2026, a new policy for labeling sample storage boxes has been implemented. As a minimum, each storage box must be labelled with user's name, research group or company, month and year the box was first used, and whether it contains III-V materials. In addition, all individual sample trays and wafer boxes must be labelled with sample ID and clearly indicate whether they contain III-V materials.

==Current Tool Status==

{| cellspacing=0px style="text-align: left;"
|-
| style="text-align:right; padding-right:6px;" | [[Heidelberg µPG 501|Heidelberg LED writer]]
| style="background-color: #c6e0b4" | All good!
|-
| style="text-align:right; padding-right:6px;" | [[Raith eLine|Raith eLine 30 kV]]
| style="background-color: #c6e0b4" | All good!
|-
| style="text-align:right; padding-right:6px;" | [[Elionix_7000|Elionix 7000 100 kV]]
| style="background-color: #ff9f9f" | Service: Blanking aperture. Expected recovery date: Until further notice.
|-
| style="text-align:right; padding-right:6px;" | [[Elionix_F-125|Elionix F-125 125 kV]]
| style="background-color: #c6e0b4" | All good!
|-
| style="padding-bottom:6px;" |
|-
| style="text-align:right; padding-right:6px;" | [[AJA systems|AJA1]]
| style="background-color: #FFBF00" | Minor issue with the on/off button of the Carrera FerroTech. Please contact cleanroom if the button isn't responding.
|-
| style="text-align:right; padding-right:6px;" | [[AJA systems|AJA2]]
| style="background-color: #c6e0b4" | All good!
|-
| style="text-align:right; padding-right:6px;" | [[Plassys Evaporator]]
| style="background-color: #c6e0b4" | All good!
|-
| style="text-align:right; padding-right:6px;" | [[E-Gun evaporator]]
| style="background-color: #c6e0b4" | All good! The chamber is dedicated to In
|-
| style="text-align:right; padding-right:6px;" | [[Cambridge ALD|ALD1]]
| style="background-color: #c6e0b4" | All good!
|-
| style="text-align:right; padding-right:6px;" | [[Cambridge ALD|ALD2]]
| style="background-color: #c6e0b4" | All good!
|-
| style="padding-bottom:6px;" |
|-
| style="text-align:right; padding-right:6px;" | [[FS bonder]]
| style="background-color: #c6e0b4" | All good!
|-
| style="text-align:right; padding-right:6px;" | [[K&S bonder]]
| style="background-color: #c6e0b4" | All good!
|-
| style="text-align:right; padding-right:6px;" | [[Loomis scriber]]
| style="background-color: #c6e0b4" | All good!
|-
| style="text-align:right; padding-right:6px;" | [[Dicing saw]]
| style="background-color: #c6e0b4" | All good!
|-
| style="padding-bottom:6px;" |
|-
| style="text-align:right; padding-right:6px;" | [[Bruker Dimension Icon AFM|AFM]]
| style="background-color: #c6e0b4" | All good!
|-
| style="text-align:right; padding-right:6px;" | [[JEOL 7800F|JEOL JSM-7800F]]
| style="background-color: #c6e0b4" | All good!
|-
| style="text-align:right; padding-right:6px;" | [[JEOL 7800F|JEOL JSM-7800F prime]]
| style="background-color: #c6e0b4" | All good!
|-
| style="text-align:right; padding-right:6px;" | [[Talos F200i S/TEM|TEM]]
| style="background-color: #c6e0b4" | All good!
|}

''List updated: Tue 1 July 2026''

Main Page

2026-07-14T08:53:45Z

Chenglee: /* NEWS: Sample Storage Box Label Policy */

'''Welcome to the NBI Cleanroom wiki!'''

This site contains public information for the users of the cleanroom and related facilities. All items are available '''without login'''. Internal information that should not be disclosed can be posted at the password protected [https://wiki.nbi.ku.dk/qdevwiki/Main_Page QDev wiki].

{| style="width: 60%;" align="center"
|- style="text-align:center;"
|[[File:Tools_button.png|100px|link=Tools|Tools]] || [[File:Safety_button.png|100px|link=Safety|Safety]] || [[File:Fabrication_button.png|100px|link=Fabrication|Fabrication]] || [[File:Calendar_button.png|100px|link=http://cleanroom.brickhost.com/|Calendar]] || [[File:Training ico.png|100px|link=Training|Training]] || [[File:Info_button.png|100px|link=About|About]] || [[File:MBE.png|90px|link=MBE|MBE]] || [[File:sustain.png|90px|link=Sustainability|Sustainability]]
|- style="text-align:center;"
| Tools || Safety || Fabrication || Booking || Training || About || MBE || Sustainability
|}

==NEWS: NBI-Cleanroom Training Request Form==
Starting in July 2026, a standardized training request form will be introduced. The new system will allow users to request training for multiple instruments using a single form ([https://forms.office.com/e/b3PDKjsZ88?origin=lprLink NBI-Cleanroom Training Request Form]). Following submission of the request form, email communication will continue to be used for scheduling and coordinating training activities.

==NEWS: Sample Storage Box Label Policy==
Starting in July 2026, a new policy for labeling sample storage boxes has been implemented. As a minimum, each storage box must be labelled with user's name, research group or company, month and year the box was first used, and whether it contains III-V materials. In addition, all individual sample trays and wafer boxes must be labelled with sample ID and clearly indicate whether they contain III-V materials.

==Current tool status==

{| cellspacing=0px style="text-align: left;"
|-
| style="text-align:right; padding-right:6px;" | [[Heidelberg µPG 501|Heidelberg LED writer]]
| style="background-color: #c6e0b4" | All good!
|-
| style="text-align:right; padding-right:6px;" | [[Raith eLine|Raith eLine 30 kV]]
| style="background-color: #c6e0b4" | All good!
|-
| style="text-align:right; padding-right:6px;" | [[Elionix_7000|Elionix 7000 100 kV]]
| style="background-color: #ff9f9f" | Service: Blanking aperture. Expected recovery date: Until further notice.
|-
| style="text-align:right; padding-right:6px;" | [[Elionix_F-125|Elionix F-125 125 kV]]
| style="background-color: #c6e0b4" | All good!
|-
| style="padding-bottom:6px;" |
|-
| style="text-align:right; padding-right:6px;" | [[AJA systems|AJA1]]
| style="background-color: #FFBF00" | Minor issue with the on/off button of the Carrera FerroTech. Please contact cleanroom if the button isn't responding.
|-
| style="text-align:right; padding-right:6px;" | [[AJA systems|AJA2]]
| style="background-color: #c6e0b4" | All good!
|-
| style="text-align:right; padding-right:6px;" | [[Plassys Evaporator]]
| style="background-color: #c6e0b4" | All good!
|-
| style="text-align:right; padding-right:6px;" | [[E-Gun evaporator]]
| style="background-color: #c6e0b4" | All good! The chamber is dedicated to In
|-
| style="text-align:right; padding-right:6px;" | [[Cambridge ALD|ALD1]]
| style="background-color: #c6e0b4" | All good!
|-
| style="text-align:right; padding-right:6px;" | [[Cambridge ALD|ALD2]]
| style="background-color: #c6e0b4" | All good!
|-
| style="padding-bottom:6px;" |
|-
| style="text-align:right; padding-right:6px;" | [[FS bonder]]
| style="background-color: #c6e0b4" | All good!
|-
| style="text-align:right; padding-right:6px;" | [[K&S bonder]]
| style="background-color: #c6e0b4" | All good!
|-
| style="text-align:right; padding-right:6px;" | [[Loomis scriber]]
| style="background-color: #c6e0b4" | All good!
|-
| style="text-align:right; padding-right:6px;" | [[Dicing saw]]
| style="background-color: #c6e0b4" | All good!
|-
| style="padding-bottom:6px;" |
|-
| style="text-align:right; padding-right:6px;" | [[Bruker Dimension Icon AFM|AFM]]
| style="background-color: #c6e0b4" | All good!
|-
| style="text-align:right; padding-right:6px;" | [[JEOL 7800F|JEOL JSM-7800F]]
| style="background-color: #c6e0b4" | All good!
|-
| style="text-align:right; padding-right:6px;" | [[JEOL 7800F|JEOL JSM-7800F prime]]
| style="background-color: #c6e0b4" | All good!
|-
| style="text-align:right; padding-right:6px;" | [[Talos F200i S/TEM|TEM]]
| style="background-color: #c6e0b4" | All good!
|}

''List updated: Tue 1 July 2026''

Main Page

2026-07-14T08:49:31Z

Chenglee: /* NEWS: New Sample Storage Box Label Policy */

'''Welcome to the NBI Cleanroom wiki!'''

This site contains public information for the users of the cleanroom and related facilities. All items are available '''without login'''. Internal information that should not be disclosed can be posted at the password protected [https://wiki.nbi.ku.dk/qdevwiki/Main_Page QDev wiki].

{| style="width: 60%;" align="center"
|- style="text-align:center;"
|[[File:Tools_button.png|100px|link=Tools|Tools]] || [[File:Safety_button.png|100px|link=Safety|Safety]] || [[File:Fabrication_button.png|100px|link=Fabrication|Fabrication]] || [[File:Calendar_button.png|100px|link=http://cleanroom.brickhost.com/|Calendar]] || [[File:Training ico.png|100px|link=Training|Training]] || [[File:Info_button.png|100px|link=About|About]] || [[File:MBE.png|90px|link=MBE|MBE]] || [[File:sustain.png|90px|link=Sustainability|Sustainability]]
|- style="text-align:center;"
| Tools || Safety || Fabrication || Booking || Training || About || MBE || Sustainability
|}

==NEWS: NBI-Cleanroom Training Request Form==
Starting in July 2026, a standardized training request form will be introduced. The new system will allow users to request training for multiple instruments using a single form ([https://forms.office.com/e/b3PDKjsZ88?origin=lprLink NBI-Cleanroom Training Request Form]). Following submission of the request form, email communication will continue to be used for scheduling and coordinating training activities.

==NEWS: Sample Storage Box Label Policy==
Starting in July 2026, we implemented a new policy for labeling sample storage box. As a minimum, the storage box must state user name, group / company, month / year for the box start-up and if III-V material is present inside. All sample trays and wafer boxes must state sample ID and if it is a III-V material.

==Current tool status==

{| cellspacing=0px style="text-align: left;"
|-
| style="text-align:right; padding-right:6px;" | [[Heidelberg µPG 501|Heidelberg LED writer]]
| style="background-color: #c6e0b4" | All good!
|-
| style="text-align:right; padding-right:6px;" | [[Raith eLine|Raith eLine 30 kV]]
| style="background-color: #c6e0b4" | All good!
|-
| style="text-align:right; padding-right:6px;" | [[Elionix_7000|Elionix 7000 100 kV]]
| style="background-color: #ff9f9f" | Service: Blanking aperture. Expected recovery date: Until further notice.
|-
| style="text-align:right; padding-right:6px;" | [[Elionix_F-125|Elionix F-125 125 kV]]
| style="background-color: #c6e0b4" | All good!
|-
| style="padding-bottom:6px;" |
|-
| style="text-align:right; padding-right:6px;" | [[AJA systems|AJA1]]
| style="background-color: #FFBF00" | Minor issue with the on/off button of the Carrera FerroTech. Please contact cleanroom if the button isn't responding.
|-
| style="text-align:right; padding-right:6px;" | [[AJA systems|AJA2]]
| style="background-color: #c6e0b4" | All good!
|-
| style="text-align:right; padding-right:6px;" | [[Plassys Evaporator]]
| style="background-color: #c6e0b4" | All good!
|-
| style="text-align:right; padding-right:6px;" | [[E-Gun evaporator]]
| style="background-color: #c6e0b4" | All good! The chamber is dedicated to In
|-
| style="text-align:right; padding-right:6px;" | [[Cambridge ALD|ALD1]]
| style="background-color: #c6e0b4" | All good!
|-
| style="text-align:right; padding-right:6px;" | [[Cambridge ALD|ALD2]]
| style="background-color: #c6e0b4" | All good!
|-
| style="padding-bottom:6px;" |
|-
| style="text-align:right; padding-right:6px;" | [[FS bonder]]
| style="background-color: #c6e0b4" | All good!
|-
| style="text-align:right; padding-right:6px;" | [[K&S bonder]]
| style="background-color: #c6e0b4" | All good!
|-
| style="text-align:right; padding-right:6px;" | [[Loomis scriber]]
| style="background-color: #c6e0b4" | All good!
|-
| style="text-align:right; padding-right:6px;" | [[Dicing saw]]
| style="background-color: #c6e0b4" | All good!
|-
| style="padding-bottom:6px;" |
|-
| style="text-align:right; padding-right:6px;" | [[Bruker Dimension Icon AFM|AFM]]
| style="background-color: #c6e0b4" | All good!
|-
| style="text-align:right; padding-right:6px;" | [[JEOL 7800F|JEOL JSM-7800F]]
| style="background-color: #c6e0b4" | All good!
|-
| style="text-align:right; padding-right:6px;" | [[JEOL 7800F|JEOL JSM-7800F prime]]
| style="background-color: #c6e0b4" | All good!
|-
| style="text-align:right; padding-right:6px;" | [[Talos F200i S/TEM|TEM]]
| style="background-color: #c6e0b4" | All good!
|}

''List updated: Tue 1 July 2026''

Main Page

2026-07-14T08:49:17Z

Chenglee:

'''Welcome to the NBI Cleanroom wiki!'''

This site contains public information for the users of the cleanroom and related facilities. All items are available '''without login'''. Internal information that should not be disclosed can be posted at the password protected [https://wiki.nbi.ku.dk/qdevwiki/Main_Page QDev wiki].

{| style="width: 60%;" align="center"
|- style="text-align:center;"
|[[File:Tools_button.png|100px|link=Tools|Tools]] || [[File:Safety_button.png|100px|link=Safety|Safety]] || [[File:Fabrication_button.png|100px|link=Fabrication|Fabrication]] || [[File:Calendar_button.png|100px|link=http://cleanroom.brickhost.com/|Calendar]] || [[File:Training ico.png|100px|link=Training|Training]] || [[File:Info_button.png|100px|link=About|About]] || [[File:MBE.png|90px|link=MBE|MBE]] || [[File:sustain.png|90px|link=Sustainability|Sustainability]]
|- style="text-align:center;"
| Tools || Safety || Fabrication || Booking || Training || About || MBE || Sustainability
|}

==NEWS: NBI-Cleanroom Training Request Form==
Starting in July 2026, a standardized training request form will be introduced. The new system will allow users to request training for multiple instruments using a single form ([https://forms.office.com/e/b3PDKjsZ88?origin=lprLink NBI-Cleanroom Training Request Form]). Following submission of the request form, email communication will continue to be used for scheduling and coordinating training activities.

==NEWS: New Sample Storage Box Label Policy==
Starting in July 2026, we implemented a new policy for labeling sample storage box. As a minimum, the storage box must state user name, group / company, month / year for the box start-up and if III-V material is present inside. All sample trays and wafer boxes must state sample ID and if it is a III-V material.

==Current tool status==

{| cellspacing=0px style="text-align: left;"
|-
| style="text-align:right; padding-right:6px;" | [[Heidelberg µPG 501|Heidelberg LED writer]]
| style="background-color: #c6e0b4" | All good!
|-
| style="text-align:right; padding-right:6px;" | [[Raith eLine|Raith eLine 30 kV]]
| style="background-color: #c6e0b4" | All good!
|-
| style="text-align:right; padding-right:6px;" | [[Elionix_7000|Elionix 7000 100 kV]]
| style="background-color: #ff9f9f" | Service: Blanking aperture. Expected recovery date: Until further notice.
|-
| style="text-align:right; padding-right:6px;" | [[Elionix_F-125|Elionix F-125 125 kV]]
| style="background-color: #c6e0b4" | All good!
|-
| style="padding-bottom:6px;" |
|-
| style="text-align:right; padding-right:6px;" | [[AJA systems|AJA1]]
| style="background-color: #FFBF00" | Minor issue with the on/off button of the Carrera FerroTech. Please contact cleanroom if the button isn't responding.
|-
| style="text-align:right; padding-right:6px;" | [[AJA systems|AJA2]]
| style="background-color: #c6e0b4" | All good!
|-
| style="text-align:right; padding-right:6px;" | [[Plassys Evaporator]]
| style="background-color: #c6e0b4" | All good!
|-
| style="text-align:right; padding-right:6px;" | [[E-Gun evaporator]]
| style="background-color: #c6e0b4" | All good! The chamber is dedicated to In
|-
| style="text-align:right; padding-right:6px;" | [[Cambridge ALD|ALD1]]
| style="background-color: #c6e0b4" | All good!
|-
| style="text-align:right; padding-right:6px;" | [[Cambridge ALD|ALD2]]
| style="background-color: #c6e0b4" | All good!
|-
| style="padding-bottom:6px;" |
|-
| style="text-align:right; padding-right:6px;" | [[FS bonder]]
| style="background-color: #c6e0b4" | All good!
|-
| style="text-align:right; padding-right:6px;" | [[K&S bonder]]
| style="background-color: #c6e0b4" | All good!
|-
| style="text-align:right; padding-right:6px;" | [[Loomis scriber]]
| style="background-color: #c6e0b4" | All good!
|-
| style="text-align:right; padding-right:6px;" | [[Dicing saw]]
| style="background-color: #c6e0b4" | All good!
|-
| style="padding-bottom:6px;" |
|-
| style="text-align:right; padding-right:6px;" | [[Bruker Dimension Icon AFM|AFM]]
| style="background-color: #c6e0b4" | All good!
|-
| style="text-align:right; padding-right:6px;" | [[JEOL 7800F|JEOL JSM-7800F]]
| style="background-color: #c6e0b4" | All good!
|-
| style="text-align:right; padding-right:6px;" | [[JEOL 7800F|JEOL JSM-7800F prime]]
| style="background-color: #c6e0b4" | All good!
|-
| style="text-align:right; padding-right:6px;" | [[Talos F200i S/TEM|TEM]]
| style="background-color: #c6e0b4" | All good!
|}

''List updated: Tue 1 July 2026''

Sensofar optical profiler

2026-07-10T07:34:39Z

Chenglee:

{{Infobox tool
|image = Tool Sensofar.jpg
|toolfullname = Sensofar S neox
|website = https://www.sensofar.com/metrology/sneox/
|company = Sensofar Metrology
|description = Optical profiler
|location = Cleanroom 2
|primary = Nader
|secondary = Nikki
}}

[[Category:Tools]]
[[Category:Characterization]]

Sensofar S Neox is a versatile, '''non-contact 3D optical profiler''' used for high-precision surface metrology. It combines confocal, interferometry and focus variation techniques to characterize a wide range of surface topology and materials, including roughness, flatness, step height and texture. Choosing the appropriate technique based on the sample's surface characteristics is essential for obtaining accurate and reliable results.

'''Confocal''': for high lateral resolution to very rough surfaces.
'''Interferometry''' (PSI/VSI/ePSI): for smooth to moderately rough surfaces and sub-nanometer height resolution.
'''Focus Variation''': for very rough or steep surfaces.

Compared with contact profilometry and AFM:
* Lower lateral resolution than AFM for nanoscale feature.
* Less suitable for measuring features smaller than the optical diffraction limit.
* Transparent and semi-transparent films may generate reflections from multiple interfaces, which can reduce measurement accuracy.

'''💡Questions?'''

For more information, kindly contact NBI-Cleanroom staff.

Sensofar optical profiler

2026-07-09T14:10:30Z

Chenglee:

{{Infobox tool
|image = Tool Sensofar.jpg
|toolfullname = Sensofar S neox
|website = https://www.sensofar.com/metrology/sneox/
|company = Sensofar Metrology
|description = Optical profiler
|location = Cleanroom 2
|primary = Nikki
|secondary = Nader
}}

[[Category:Tools]]
[[Category:Characterization]]

Sensofar S Neox is a versatile, '''non-contact 3D optical profiler''' used for high-precision surface metrology. It combines confocal, interferometry and focus variation techniques to characterize a wide range of surface topology and materials, including roughness, flatness, step height and texture. Choosing the appropriate technique based on the sample's surface characteristics is essential for obtaining accurate and reliable results.

'''Confocal''': for high lateral resolution to very rough surfaces.
'''Interferometry''' (PSI/VSI/ePSI): for smooth to moderately rough surfaces and sub-nanometer height resolution.
'''Focus Variation''': for very rough or steep surfaces.

Compared with contact profilometry and AFM:
* Lower lateral resolution than AFM for nanoscale feature.
* Less suitable for measuring features smaller than the optical diffraction limit.
* Transparent and semi-transparent films may generate reflections from multiple interfaces, which can reduce measurement accuracy.

'''💡Questions?'''

For more information, kindly contact NBI-Cleanroom staff.

Sensofar optical profiler

2026-07-09T14:09:00Z

Chenglee:

{{Infobox tool
|image = Tool Sensofar.jpg
|toolfullname = Sensofar S neox
|website = https://www.sensofar.com/metrology/sneox/
|company = Sensofar Metrology
|description = Optical surface profiler
|location = Cleanroom 2
|primary = Nikki
|secondary = Nader
}}

[[Category:Tools]]
[[Category:Characterization]]

Sensofar S Neox is a versatile, '''non-contact 3D optical profiler''' used for high-precision surface metrology. It combines confocal, interferometry and focus variation techniques to characterize a wide range of surface topology and materials, including roughness, flatness, step height and texture. Choosing the appropriate technique based on the sample's surface characteristics is essential for obtaining accurate and reliable results.

Confocal: for high lateral resolution to very rough surfaces.
Interferometry (PSI/VSI/ePSI): for smooth to moderately rough surfaces and sub-nanometer height resolution.
Focus Variation: for very rough or steep surfaces.

Compared with contact profilometry and AFM:
* Lower lateral resolution than AFM for nanoscale feature.
* Less suitable for measuring features smaller than the optical diffraction limit.
* Transparent and semi-transparent films may generate reflections from multiple interfaces, which can reduce measurement accuracy.

'''💡Questions?'''

For more information, kindly contact NBI-Cleanroom staff.

Bruker Dimension Icon AFM

2026-07-09T13:49:01Z

Chenglee:

{{Infobox tool
|image = AFM_ICON.jpeg
|toolfullname = Dimension Icon PT
|company = Bruker
|description = Atomic Force Microscope
|website = https://www.bruker.com/en/products-and-solutions/microscopes/materials-afm/dimension-icon-afm.html
|location = 03.01.K08
|primary = Nikki
|secondary = Zhe
|limits = None
}}
Bruker Dimension Icon is an atomic force microscope used for accurate surface topography measurements.
Users can measure film thickness, roughness and other topographical data characteristics with Ångstrom accuracy.

Other alternatives for surface characterization at the [[Main Page|NBI cleanroom]] facilities:
* [[Tencor profilometer]] for step height and profile roughness
* [[Alpha-SE ellipsometer]] for transparent film overall thickness and roughness
* [[Filmetrics reflectometer]] for transparent film overall thickness and roughness
* [[JEOL 7800F]] SEM for film thickness by observing material cross-sections, elemental analysis
== '''Quick-Start Instruction Manual for ScanAsyst Operation''' ==
'''Before You Begin'''
* Complete and pass AFM training by NBI-Cleanroom staff.
'''Before Your Session'''
* Make sure your sample is ready.
* Book your session in advance and be on time.
'''During Your Session'''
'''Laboratory Reminders'''
* Wear shoe covers in the lab.
* Wear nitrile gloves before touching the tool.
* Keep the workstation clean and tidy.
* Make sure both main and support PCs are ON.
* Ensure AFM (Nanoscope 9.7) software is closed before starting. This ensures the laser is OFF.
* Check if a tip is already mounted. Use logbook (AFM Log) on the support PC to confirm.
* If needed, load or change the tip (see next section).
'''Unloading the Tip Holder from the Scan Head'''
* Open the AFM enclosure.
* Make sure the scan head is up, and the sample stage is not directly under.
* Loosen the side screw a few turns to release the scan head. 📍Do not remove the screw.
* Slide the scan head out of the dovetail groove and hold it carefully.
* Gently pull out the tip holder from the bottom of the scanner.
* Slide the scan head back into the dovetail groove. Keep holding until it is fully seated at the bottom of the groove.
* Mount the tip holder on the loading station. The loading station is a black, round block with 3 sets of probe-mounting slots.
* Place the loading station on the table.
'''Mounting the Tip'''
* Pick the right tip for your scan. Tip specifications can be found on the Gel-Pak box. The default tip for ScanAsyst mode is “ScanAsyst Air”. The tip holder looks like a small circuit board with 4-holes and a metal clip to hold the tip in position.
* Gently press down and slide the metal clip to the back until the groove (slot for the tip) is fully visible.
* Remove the old tip from the holder. Discard by placing it in a Gel-Pak box (aligning the tip horizontally).
* Use tweezers to carefully lift a new tip (by its side) from the Gel-Pak box. New tips are aligned vertically in the Gel-Pak box. 📍Do not flip or drop the tip!
* Gently place the tip into the groove. Make sure it sits neatly in the groove with the cantilever at the open end of the groove.
* Gently press down and slide the metal clip to the front until it locks the tip in place.

[[File:Figure-tip.png|thumb]]

'''Loading the Tip onto the Scan Head'''
* Slide the scan head out of the dovetail groove and hold it carefully.
* Connect the tip holder to the bottom of the scanner. Align the 4 pins to the matching sockets and press it gently but firmly. Make sure the tip is facing downwards.
* Slide the scan head back into the dovetail groove. Keep holding until it is fully seated at the bottom of the groove.
* Tighten the screw to lock the scan head. 📍Do not overtighten.
'''Starting Your AFM Session'''

'''Launching the Software'''
* Open Nanoscope 9.7 on the desktop.
* Wait for the Dimension Icon window to load and automatically pop up.
Choosing Your Experiment Settings
* By default, the “ScanAsyst in Air” experiment is selected so you can directly click “Load Experiment”. You will hear a sound, and the laser will activate (red LED lights up).
'''SETUP Tab'''
Adjust the illumination and zoom until the tip is visible on the screen. If you do not see the cantilever even at the lowest magnification, you may need to reposition the tip holder or replace the tip.
'''Probe Setup'''
* Check that the ScanAsyst-Air probe parameters are selected. Otherwise, choose the ScanAsyst-Air probe from the database.
'''Aligning the Laser'''
* Click “Move to the Alignment Station”.
* Use the top X-Y control knobs on the scanner to align the laser to the tip. Adjust the laser spot until the sum photodetector signal is at least 3.5V.
* Use the side X-Y control knobs on the scanner to align the laser at the center of the photodetector. Adjust the laser to center the red dot on the crosshair. Aim for ~ 0V offset on both axes but below 0.2V is acceptable.

[[File:Figure-laser.png|thumb]]

'''Focusing the Tip'''
* Click “Return from Alignment Station”.
* Use the Focus Controls (Up/Down arrows) to focus the tip of the cantilever.
* Adjust the illumination, zoom and focus until the tip image is sharp.
* Click near the tip apex (~ 7 µm) to mark the cantilever position.

[[File:Figure-cantilever.png|thumb]]

'''NAVIGATE Tab'''

'''Loading the Sample'''
* Make sure the stage is at “Sample Load Position”.
* Place your sample on the stage and turn on the vacuum.
* Use trackball or on-screen controls to move the sample under the tip.
* If you already scanned a sample before changing the tip and did not close the software, you can click “Sample Scan Position” to return to your previous scan position.
'''Focusing the Sample'''
* Choose “Sample (Default)” focus method if your sample has features, like lithography on the surface, you can use to identify the surface plane. Choose “Tip Reflection” for thin films.
* Use a low-speed setting.
* Use the Up/Down arrows (start with the Down arrow) to bring the sample into focus. For tip reflection, the mirror image of the cantilever should be brought into focus.
* Adjust the illumination, zoom and focus until the sample looks sharp and clear. 📍 Focus gradually to avoid tip crash. Moving too fast may break the tip!
* Close the AFM enclosure when done.

[[File:Figure-focus.png|thumb]]

'''Check Parameters'''
* Before scanning, confirm the basic scan settings (for standard use).
** Scan size: 500 nm
** Aspect ratio: 1.00
** X offset / Y offset: 0.000 nm
** Scan angle. 0.00°
** Scan rate: 1 Hz
** Samples per line: 256
** Spring constant: 0.4000 N/m
** Do not change other settings unless agreed with NBI-Cleanroom staff.
'''Engaging the Tip'''
* Click “Engage” to lower the tip and start scanning.
'''Scanning & Data Collection'''
* Monitor the Trace/Retrace lines in the Scope window. They should have similar shapes but not necessarily overlapping. Assess whether the features look physical or noise-like.
* Increase the scan size in steps (2 µm, 10 µm, 50 µm, 90 µm) until you see the area of interest. Use the zoom or offset tool to center and choose scan direction.
* Before moving to other areas, click “Withdraw” to safely lift the tip.
* Click “Engage” again when ready for a new scan.
📍The tip must be retracted before any stage movement.

'''Saving Your Data'''
* Go to:
Capture > Capture Filename > Change Directory > Rename File > OK
* Choose:
** Capture - captures a single scan
** Capture Continuous - captures every scan
** Capture Now - immediately captures whatever has been scanned since the beginning of the frame.
** Stop Capture - aborts the capture action.

[[File:Figure-software.png|thumb]]

'''Ending Your Session'''
* Click “Withdraw” to safely lift the tip.
* Click “Navigate”, then “Sample Load Position”.
* Open the AFM enclosure.
* Turn off the vacuum and remove your sample.
Tip Condition:
If the tip is broken, replace and align it before ending your session.
If the tip is still usable, exit Nanoscope 9.7 software (laser turns off).
* Close Nanoscope 9.7 on the desktop.
* Close the AFM enclosure.
* Copy your data and fill in the session log.
* Clean up the workspace and dispose used items properly.

'''💡Questions?'''

For help with scan settings and data analysis, contact NBI-Cleanroom staff.

[[Category:Tools]]
[[Category:Characterization]]

Sensofar optical profiler

2026-07-09T13:45:41Z

Chenglee:

Main Page

2026-07-01T11:08:38Z

Chenglee: /* Current tool status */

'''Welcome to the NBI Cleanroom wiki!'''

This site contains public information for the users of the cleanroom and related facilities. All items are available '''without login'''. Internal information that should not be disclosed can be posted at the password protected [https://wiki.nbi.ku.dk/qdevwiki/Main_Page QDev wiki].

{| style="width: 60%;" align="center"
|- style="text-align:center;"
|[[File:Tools_button.png|100px|link=Tools|Tools]] || [[File:Safety_button.png|100px|link=Safety|Safety]] || [[File:Fabrication_button.png|100px|link=Fabrication|Fabrication]] || [[File:Calendar_button.png|100px|link=http://cleanroom.brickhost.com/|Calendar]] || [[File:Training ico.png|100px|link=Training|Training]] || [[File:Info_button.png|100px|link=About|About]] || [[File:MBE.png|90px|link=MBE|MBE]] || [[File:sustain.png|90px|link=Sustainability|Sustainability]]
|- style="text-align:center;"
| Tools || Safety || Fabrication || Booking || Training || About || MBE || Sustainability
|}

==NEWS: NBI-Cleanroom Training Request Form==
Starting in July 2026, a standardized training request form will be introduced. The new system will allow users to request training for multiple instruments using a single form ([https://forms.office.com/e/b3PDKjsZ88?origin=lprLink NBI-Cleanroom Training Request Form]). Following submission of the request form, email communication will continue to be used for scheduling and coordinating training activities.

==Current tool status==

{| cellspacing=0px style="text-align: left;"
|-
| style="text-align:right; padding-right:6px;" | [[Heidelberg µPG 501|Heidelberg LED writer]]
| style="background-color: #c6e0b4" | All good!
|-
| style="text-align:right; padding-right:6px;" | [[Raith eLine|Raith eLine 30 kV]]
| style="background-color: #c6e0b4" | All good!
|-
| style="text-align:right; padding-right:6px;" | [[Elionix_7000|Elionix 7000 100 kV]]
| style="background-color: #ff9f9f" | Service: Blanking aperture. Expected recovery date: Until further notice.
|-
| style="text-align:right; padding-right:6px;" | [[Elionix_F-125|Elionix F-125 125 kV]]
| style="background-color: #c6e0b4" | All good!
|-
| style="padding-bottom:6px;" |
|-
| style="text-align:right; padding-right:6px;" | [[AJA systems|AJA1]]
| style="background-color: #FFBF00" | Minor issue with the on/off button of the Carrera FerroTech. Please contact cleanroom if the button isn't responding.
|-
| style="text-align:right; padding-right:6px;" | [[AJA systems|AJA2]]
| style="background-color: #c6e0b4" | All good!
|-
| style="text-align:right; padding-right:6px;" | [[Plassys Evaporator]]
| style="background-color: #c6e0b4" | All good!
|-
| style="text-align:right; padding-right:6px;" | [[E-Gun evaporator]]
| style="background-color: #c6e0b4" | All good! The chamber is dedicated to In
|-
| style="text-align:right; padding-right:6px;" | [[Cambridge ALD|ALD1]]
| style="background-color: #c6e0b4" | All good!
|-
| style="text-align:right; padding-right:6px;" | [[Cambridge ALD|ALD2]]
| style="background-color: #c6e0b4" | All good!
|-
| style="padding-bottom:6px;" |
|-
| style="text-align:right; padding-right:6px;" | [[FS bonder]]
| style="background-color: #c6e0b4" | All good!
|-
| style="text-align:right; padding-right:6px;" | [[K&S bonder]]
| style="background-color: #c6e0b4" | All good!
|-
| style="text-align:right; padding-right:6px;" | [[Loomis scriber]]
| style="background-color: #c6e0b4" | All good!
|-
| style="text-align:right; padding-right:6px;" | [[Dicing saw]]
| style="background-color: #c6e0b4" | All good!
|-
| style="padding-bottom:6px;" |
|-
| style="text-align:right; padding-right:6px;" | [[Bruker Dimension Icon AFM|AFM]]
| style="background-color: #c6e0b4" | All good!
|-
| style="text-align:right; padding-right:6px;" | [[JEOL 7800F|JEOL JSM-7800F]]
| style="background-color: #c6e0b4" | All good!
|-
| style="text-align:right; padding-right:6px;" | [[JEOL 7800F|JEOL JSM-7800F prime]]
| style="background-color: #c6e0b4" | All good!
|-
| style="text-align:right; padding-right:6px;" | [[Talos F200i S/TEM|TEM]]
| style="background-color: #c6e0b4" | All good!
|}

''List updated: Tue 1 July 2026''

Main Page

2026-07-01T11:08:12Z

Chenglee: /* Current tool status */

'''Welcome to the NBI Cleanroom wiki!'''

This site contains public information for the users of the cleanroom and related facilities. All items are available '''without login'''. Internal information that should not be disclosed can be posted at the password protected [https://wiki.nbi.ku.dk/qdevwiki/Main_Page QDev wiki].

{| style="width: 60%;" align="center"
|- style="text-align:center;"
|[[File:Tools_button.png|100px|link=Tools|Tools]] || [[File:Safety_button.png|100px|link=Safety|Safety]] || [[File:Fabrication_button.png|100px|link=Fabrication|Fabrication]] || [[File:Calendar_button.png|100px|link=http://cleanroom.brickhost.com/|Calendar]] || [[File:Training ico.png|100px|link=Training|Training]] || [[File:Info_button.png|100px|link=About|About]] || [[File:MBE.png|90px|link=MBE|MBE]] || [[File:sustain.png|90px|link=Sustainability|Sustainability]]
|- style="text-align:center;"
| Tools || Safety || Fabrication || Booking || Training || About || MBE || Sustainability
|}

==NEWS: NBI-Cleanroom Training Request Form==
Starting in July 2026, a standardized training request form will be introduced. The new system will allow users to request training for multiple instruments using a single form ([https://forms.office.com/e/b3PDKjsZ88?origin=lprLink NBI-Cleanroom Training Request Form]). Following submission of the request form, email communication will continue to be used for scheduling and coordinating training activities.

==Current tool status==

{| cellspacing=0px style="text-align: left;"
|-
| style="text-align:right; padding-right:6px;" | [[Heidelberg µPG 501|Heidelberg LED writer]]
| style="background-color: #c6e0b4" | All good!
|-
| style="text-align:right; padding-right:6px;" | [[Raith eLine|Raith eLine 30 kV]]
| style="background-color: #c6e0b4" | All good!
|-
| style="text-align:right; padding-right:6px;" | [[Elionix_7000|Elionix 7000 100 kV]]
| style="background-color: #ff9f9f" | Service: Blanking aperture. Expected recovery date: Until further notice.
|-
| style="text-align:right; padding-right:6px;" | [[Elionix_F-125|Elionix F-125 125 kV]]
| style="background-color: #c6e0b4" | All good!
|-
| style="padding-bottom:6px;" |
|-
| style="text-align:right; padding-right:6px;" | [[AJA systems|AJA1]]
| style="background-color: #FFBF00" | Minor issue with the on/off button of the Carrera FerroTech. Please contact cleanroom if the button isn't responding.
|-
| style="text-align:right; padding-right:6px;" | [[AJA systems|AJA2]]
| style="background-color: #c6e0b4" | All good!
|-
| style="text-align:right; padding-right:6px;" | [[Plassys Evaporator]]
| style="background-color: #c6e0b4" | All good!
|-
| style="text-align:right; padding-right:6px;" | [[E-Gun evaporator]]
| style="background-color: #c6e0b4" | All good! The chamber is dedicated to In
|-
| style="text-align:right; padding-right:6px;" | [[Cambridge ALD|ALD1]]
| style="background-color: #c6e0b4" | All good!
|-
| style="text-align:right; padding-right:6px;" | [[Cambridge ALD|ALD2]]
| style="background-color: #c6e0b4" | All good!
|-
| style="padding-bottom:6px;" |
|-
| style="text-align:right; padding-right:6px;" | [[FS bonder]]
| style="background-color: #c6e0b4" | All good!
|-
| style="text-align:right; padding-right:6px;" | [[K&S bonder]]
| style="background-color: #c6e0b4" | All good!
|-
| style="text-align:right; padding-right:6px;" | [[Loomis scriber]]
| style="background-color: #c6e0b4" | All good!
|-
| style="text-align:right; padding-right:6px;" | [[Dicing saw]]
| style="background-color: #c6e0b4" | All good!
|-
| style="padding-bottom:6px;" |
|-
| style="text-align:right; padding-right:6px;" | [[Bruker Dimension Icon AFM|AFM]]
| style="background-color: #c6e0b4" | All good!
|-
| style="text-align:right; padding-right:6px;" | [[JEOL 7800F|JEOL JSM-7800F]]
| style="background-color: #c6e0b4" | All good!
|-
| style="text-align:right; padding-right:6px;" | [[JEOL 7800F|JEOL JSM-7800F prime]]
| style="background-color: #c6e0b4" | All good!
|-
| style="text-align:right; padding-right:6px;" | [[Talos F200i S/TEM|TEM]]
| style="background-color: #c6e0b4" | All good!
|}

''List updated: Fri 12 Jun 2026''

Tools

2026-07-01T11:04:21Z

Chenglee:

Before submitting a training request, please review the prerequisites for each instrument in the [[Training]] section.

'''A standardized training request form has been introduced. The new system will allow users to request training for multiple instruments using a single form ([https://forms.office.com/e/b3PDKjsZ88?origin=lpr NBI-Cleanroom Training Request Form]). Please only request training for instruments that require immediate access. Following submission of the request form, email communication will continue to be used for scheduling and coordinating training activities. The Cleanroom staff will acknowledge and respond to training requests within 1-2 working days'''.

Once the user has completed the training, they are given booking rights in the [http://cleanroom.brickhost.com cleanroom booking system]. However, after a certain period of inactivity on a given tool, the booking rights will expire and the user will need to be retrained in order to continue using the tool.

== Tool list ==
{| style="width: 85%;"
|- style="text-align:left;"
! Lithography !! Thin film & III-Vs !! Characterization !! Other
|- valign="top"
| style="width: 20%;" |
* [[Heidelberg µPG 501|Heidelberg LED writer]]

* [[Raith eLine|Raith eLine 30 kV EBL/SEM]]
* [[Elionix_7000|Elionix 7000 100 kV EBL]]
* [[Elionix_F-125|Elionix F-125 125kV EBL]] (QuanTech)
| style="width: 20%;" |
* [[AJA systems]]
* [[Plassys Evaporator]]
* [[E-Gun evaporator]]

* [[Laurell spinners]]
* [[Cambridge ALD]]
* [[Leica sputter coater]]
* [[MBE]]
| style="width: 20%;" |
* [[JEOL 7800F|JEOL JSM-7800F]]
* [[Raith eLine]]
* [[Talos F200i S/TEM]]
* [[Tencor profilometer]]
* [[Alpha-SE ellipsometer]]
* [[Sensofar optical profiler]]
* [[Olympus microscopes]]
* [[Lynx EVO stereomicroscope]]
* [[Bruker Dimension Icon AFM]]
* [[Filmetrics reflectometer]]
* [[Probe station]]
| style="width: 20%;" |
* [[Süss scriber|Manual Süss scriber]]
* [[Loomis scriber|Automatic Loomis scriber]]
* [[Dicing saw]]
* [[AccuThermo RTA]]
* [[Biorad]]
* [[Plasma-Preen asher]]
* [[Diener plasma asher]]
* [[Tergeo plasma asher]]
* [[FS bonder]]
* [[K&S bonder]]
* [[Micromanipulator]]
* [[Präzitherm hotplates]]
* [[Critical point dryer]]
|}

== Tool access requirement guidelines ==

{| cellspacing=0px style="text-align: center;"
! scope="col" width="20%" align="right" |
! scope="col" width="20%" | Bachelor
! scope="col" width="20%" | Master
! scope="col" width="20%" | PhD
! scope="col" width="20%" | Postdoc
|-
| style="text-align:right; padding-right:6px;" | [[Raith eLine|eLine]]
| style="background-color: #ff9f9f" | No
| style="background-color: #c6e0b4" | Yes
| style="background-color: #c6e0b4" | Yes
| style="background-color: #c6e0b4" | Yes
|-
| style="text-align:right; padding-right:6px;" | [[Elionix]]
| style="background-color: #ff9f9f" | No
| style="background-color: #c6e0b4" | Yes
| style="background-color: #c6e0b4" | Yes
| style="background-color: #c6e0b4" | Yes
|-
| style="text-align:right; padding-right:6px;" | [[Heidelberg µPG 501|LED writer]]
| style="background-color: #ff9f9f" | No
| style="background-color: #c6e0b4" | Yes
| style="background-color: #c6e0b4" | Yes
| style="background-color: #c6e0b4" | Yes
|-
| style="padding-bottom:6px;" |
|-
| style="text-align:right; padding-right:6px;" | [[AJA Systems|AJAs]]
| style="background-color: #c6e0b4" | Yes
| style="background-color: #c6e0b4" | Yes
| style="background-color: #c6e0b4" | Yes
| style="background-color: #c6e0b4" | Yes
|-
| style="text-align:right; padding-right:6px;" | [[Plassys Evaporator|Plassys]]
| style="background-color: #c6e0b4" | Yes
| style="background-color: #c6e0b4" | Yes
| style="background-color: #c6e0b4" | Yes
| style="background-color: #c6e0b4" | Yes
|-
| style="text-align:right; padding-right:6px;" | [[E-Gun evaporator|E-gun]]
| style="background-color: #c6e0b4" | Yes
| style="background-color: #c6e0b4" | Yes
| style="background-color: #c6e0b4" | Yes
| style="background-color: #c6e0b4" | Yes
|-
| style="text-align:right; padding-right:6px;" | [[Cambridge ALD|ALD]]
| style="background-color: #c6e0b4" | Yes
| style="background-color: #c6e0b4" | Yes
| style="background-color: #c6e0b4" | Yes
| style="background-color: #c6e0b4" | Yes
|-
| style="text-align:right; padding-right:6px;" | [[Leica sputter coater|Leica sputter]]
| style="background-color: #c6e0b4" | Yes
| style="background-color: #c6e0b4" | Yes
| style="background-color: #c6e0b4" | Yes
| style="background-color: #c6e0b4" | Yes
|-
| style="padding-bottom:6px;" |
|-
| style="text-align:right; padding-right:6px;" | [[JEOL 7800F]]
| style="background-color: #ff9f9f" | No
| style="background-color: #c6e0b4" | Yes
| style="background-color: #c6e0b4" | Yes
| style="background-color: #c6e0b4" | Yes
|-
| style="text-align:right; padding-right:6px;" | [[Talos F200i S/TEM |TEM]]
| style="background-color: #ff9f9f" | No
| style="background-color: #ff9f9f" | No
| style="background-color: #c6e0b4" | Yes
| style="background-color: #c6e0b4" | Yes
|-
| style="text-align:right; padding-right:6px;" | [[Tencor profilometer|Profilometer]]
| style="background-color: #c6e0b4" | Yes
| style="background-color: #c6e0b4" | Yes
| style="background-color: #c6e0b4" | Yes
| style="background-color: #c6e0b4" | Yes
|-
| style="text-align:right; padding-right:6px;" | [[Alpha-SE Ellipsometer|Ellipsometer]]
| style="background-color: #c6e0b4" | Yes
| style="background-color: #c6e0b4" | Yes
| style="background-color: #c6e0b4" | Yes
| style="background-color: #c6e0b4" | Yes
|-

| style="text-align:right; padding-right:6px;" | [[Bruker Dimension Icon AFM|AFM]]
| style="background-color: #c6e0b4" | Yes
| style="background-color: #c6e0b4" | Yes
| style="background-color: #c6e0b4" | Yes
| style="background-color: #c6e0b4" | Yes
|-
| style="text-align:right; padding-right:6px;" | [[Filmetrics reflectometer|Filmetrics]]
| style="background-color: #c6e0b4" | Yes
| style="background-color: #c6e0b4" | Yes
| style="background-color: #c6e0b4" | Yes
| style="background-color: #c6e0b4" | Yes
|-
| style="padding-bottom:6px;" |
|-
| style="text-align:right; padding-right:6px;" | [[Süss scriber|Manual scriber]]
| style="background-color: #c6e0b4" | Yes
| style="background-color: #c6e0b4" | Yes
| style="background-color: #c6e0b4" | Yes
| style="background-color: #c6e0b4" | Yes
|-
| style="text-align:right; padding-right:6px;" | [[Dicing saw]]
| style="background-color: #ff9f9f" | No
| style="background-color: #ff9f9f" | No
| style="background-color: #ff9f9f" | No
| style="background-color: #ff9f9f" | No
|-
| style="text-align:right; padding-right:6px;" | [[Loomis scriber]]
| style="background-color: #ff9f9f" | No
| style="background-color: #ff9f9f" | No
| style="background-color: #ff9f9f" | No
| style="background-color: #ff9f9f" | No
|-
| style="text-align:right; padding-right:6px;" | [[AccuThermo RTA|RTA]]
| style="background-color: #c6e0b4" | Yes
| style="background-color: #c6e0b4" | Yes
| style="background-color: #c6e0b4" | Yes
| style="background-color: #c6e0b4" | Yes
|-
| style="text-align:right; padding-right:6px;" | [[Biorad]]
| style="background-color: #c6e0b4" | Yes
| style="background-color: #c6e0b4" | Yes
| style="background-color: #c6e0b4" | Yes
| style="background-color: #c6e0b4" | Yes
|-
| style="text-align:right; padding-right:6px;" | [[Plasma-Preen asher]]
| style="background-color: #c6e0b4" | Yes
| style="background-color: #c6e0b4" | Yes
| style="background-color: #c6e0b4" | Yes
| style="background-color: #c6e0b4" | Yes
|-
| style="text-align:right; padding-right:6px;" | [[Tergeo Plasma Asher|Tergeo asher]]
| style="background-color: #c6e0b4" | Yes
| style="background-color: #c6e0b4" | Yes
| style="background-color: #c6e0b4" | Yes
| style="background-color: #c6e0b4" | Yes
|-
| style="text-align:right; padding-right:6px;" | [[Laurell spinners|Spinners]]
| style="background-color: #c6e0b4" | Yes
| style="background-color: #c6e0b4" | Yes
| style="background-color: #c6e0b4" | Yes
| style="background-color: #c6e0b4" | Yes
|}

[[Category:Tools]]

Tools

2026-07-01T11:03:58Z

Chenglee:

Before submitting a training request, please review the prerequisites for each instrument in the [[Training]] section.

'''A standardized training request form has been introduced. The new system will allow users to request training for multiple instruments using a single form [https://forms.office.com/e/b3PDKjsZ88?origin=lpr NBI-Cleanroom Training Request Form]. Please only request training for instruments that require immediate access. Following submission of the request form, email communication will continue to be used for scheduling and coordinating training activities. The Cleanroom staff will acknowledge and respond to training requests within 1-2 working days'''.

Once the user has completed the training, they are given booking rights in the [http://cleanroom.brickhost.com cleanroom booking system]. However, after a certain period of inactivity on a given tool, the booking rights will expire and the user will need to be retrained in order to continue using the tool.

== Tool list ==
{| style="width: 85%;"
|- style="text-align:left;"
! Lithography !! Thin film & III-Vs !! Characterization !! Other
|- valign="top"
| style="width: 20%;" |
* [[Heidelberg µPG 501|Heidelberg LED writer]]

* [[Raith eLine|Raith eLine 30 kV EBL/SEM]]
* [[Elionix_7000|Elionix 7000 100 kV EBL]]
* [[Elionix_F-125|Elionix F-125 125kV EBL]] (QuanTech)
| style="width: 20%;" |
* [[AJA systems]]
* [[Plassys Evaporator]]
* [[E-Gun evaporator]]

* [[Laurell spinners]]
* [[Cambridge ALD]]
* [[Leica sputter coater]]
* [[MBE]]
| style="width: 20%;" |
* [[JEOL 7800F|JEOL JSM-7800F]]
* [[Raith eLine]]
* [[Talos F200i S/TEM]]
* [[Tencor profilometer]]
* [[Alpha-SE ellipsometer]]
* [[Sensofar optical profiler]]
* [[Olympus microscopes]]
* [[Lynx EVO stereomicroscope]]
* [[Bruker Dimension Icon AFM]]
* [[Filmetrics reflectometer]]
* [[Probe station]]
| style="width: 20%;" |
* [[Süss scriber|Manual Süss scriber]]
* [[Loomis scriber|Automatic Loomis scriber]]
* [[Dicing saw]]
* [[AccuThermo RTA]]
* [[Biorad]]
* [[Plasma-Preen asher]]
* [[Diener plasma asher]]
* [[Tergeo plasma asher]]
* [[FS bonder]]
* [[K&S bonder]]
* [[Micromanipulator]]
* [[Präzitherm hotplates]]
* [[Critical point dryer]]
|}

== Tool access requirement guidelines ==

{| cellspacing=0px style="text-align: center;"
! scope="col" width="20%" align="right" |
! scope="col" width="20%" | Bachelor
! scope="col" width="20%" | Master
! scope="col" width="20%" | PhD
! scope="col" width="20%" | Postdoc
|-
| style="text-align:right; padding-right:6px;" | [[Raith eLine|eLine]]
| style="background-color: #ff9f9f" | No
| style="background-color: #c6e0b4" | Yes
| style="background-color: #c6e0b4" | Yes
| style="background-color: #c6e0b4" | Yes
|-
| style="text-align:right; padding-right:6px;" | [[Elionix]]
| style="background-color: #ff9f9f" | No
| style="background-color: #c6e0b4" | Yes
| style="background-color: #c6e0b4" | Yes
| style="background-color: #c6e0b4" | Yes
|-
| style="text-align:right; padding-right:6px;" | [[Heidelberg µPG 501|LED writer]]
| style="background-color: #ff9f9f" | No
| style="background-color: #c6e0b4" | Yes
| style="background-color: #c6e0b4" | Yes
| style="background-color: #c6e0b4" | Yes
|-
| style="padding-bottom:6px;" |
|-
| style="text-align:right; padding-right:6px;" | [[AJA Systems|AJAs]]
| style="background-color: #c6e0b4" | Yes
| style="background-color: #c6e0b4" | Yes
| style="background-color: #c6e0b4" | Yes
| style="background-color: #c6e0b4" | Yes
|-
| style="text-align:right; padding-right:6px;" | [[Plassys Evaporator|Plassys]]
| style="background-color: #c6e0b4" | Yes
| style="background-color: #c6e0b4" | Yes
| style="background-color: #c6e0b4" | Yes
| style="background-color: #c6e0b4" | Yes
|-
| style="text-align:right; padding-right:6px;" | [[E-Gun evaporator|E-gun]]
| style="background-color: #c6e0b4" | Yes
| style="background-color: #c6e0b4" | Yes
| style="background-color: #c6e0b4" | Yes
| style="background-color: #c6e0b4" | Yes
|-
| style="text-align:right; padding-right:6px;" | [[Cambridge ALD|ALD]]
| style="background-color: #c6e0b4" | Yes
| style="background-color: #c6e0b4" | Yes
| style="background-color: #c6e0b4" | Yes
| style="background-color: #c6e0b4" | Yes
|-
| style="text-align:right; padding-right:6px;" | [[Leica sputter coater|Leica sputter]]
| style="background-color: #c6e0b4" | Yes
| style="background-color: #c6e0b4" | Yes
| style="background-color: #c6e0b4" | Yes
| style="background-color: #c6e0b4" | Yes
|-
| style="padding-bottom:6px;" |
|-
| style="text-align:right; padding-right:6px;" | [[JEOL 7800F]]
| style="background-color: #ff9f9f" | No
| style="background-color: #c6e0b4" | Yes
| style="background-color: #c6e0b4" | Yes
| style="background-color: #c6e0b4" | Yes
|-
| style="text-align:right; padding-right:6px;" | [[Talos F200i S/TEM |TEM]]
| style="background-color: #ff9f9f" | No
| style="background-color: #ff9f9f" | No
| style="background-color: #c6e0b4" | Yes
| style="background-color: #c6e0b4" | Yes
|-
| style="text-align:right; padding-right:6px;" | [[Tencor profilometer|Profilometer]]
| style="background-color: #c6e0b4" | Yes
| style="background-color: #c6e0b4" | Yes
| style="background-color: #c6e0b4" | Yes
| style="background-color: #c6e0b4" | Yes
|-
| style="text-align:right; padding-right:6px;" | [[Alpha-SE Ellipsometer|Ellipsometer]]
| style="background-color: #c6e0b4" | Yes
| style="background-color: #c6e0b4" | Yes
| style="background-color: #c6e0b4" | Yes
| style="background-color: #c6e0b4" | Yes
|-

| style="text-align:right; padding-right:6px;" | [[Bruker Dimension Icon AFM|AFM]]
| style="background-color: #c6e0b4" | Yes
| style="background-color: #c6e0b4" | Yes
| style="background-color: #c6e0b4" | Yes
| style="background-color: #c6e0b4" | Yes
|-
| style="text-align:right; padding-right:6px;" | [[Filmetrics reflectometer|Filmetrics]]
| style="background-color: #c6e0b4" | Yes
| style="background-color: #c6e0b4" | Yes
| style="background-color: #c6e0b4" | Yes
| style="background-color: #c6e0b4" | Yes
|-
| style="padding-bottom:6px;" |
|-
| style="text-align:right; padding-right:6px;" | [[Süss scriber|Manual scriber]]
| style="background-color: #c6e0b4" | Yes
| style="background-color: #c6e0b4" | Yes
| style="background-color: #c6e0b4" | Yes
| style="background-color: #c6e0b4" | Yes
|-
| style="text-align:right; padding-right:6px;" | [[Dicing saw]]
| style="background-color: #ff9f9f" | No
| style="background-color: #ff9f9f" | No
| style="background-color: #ff9f9f" | No
| style="background-color: #ff9f9f" | No
|-
| style="text-align:right; padding-right:6px;" | [[Loomis scriber]]
| style="background-color: #ff9f9f" | No
| style="background-color: #ff9f9f" | No
| style="background-color: #ff9f9f" | No
| style="background-color: #ff9f9f" | No
|-
| style="text-align:right; padding-right:6px;" | [[AccuThermo RTA|RTA]]
| style="background-color: #c6e0b4" | Yes
| style="background-color: #c6e0b4" | Yes
| style="background-color: #c6e0b4" | Yes
| style="background-color: #c6e0b4" | Yes
|-
| style="text-align:right; padding-right:6px;" | [[Biorad]]
| style="background-color: #c6e0b4" | Yes
| style="background-color: #c6e0b4" | Yes
| style="background-color: #c6e0b4" | Yes
| style="background-color: #c6e0b4" | Yes
|-
| style="text-align:right; padding-right:6px;" | [[Plasma-Preen asher]]
| style="background-color: #c6e0b4" | Yes
| style="background-color: #c6e0b4" | Yes
| style="background-color: #c6e0b4" | Yes
| style="background-color: #c6e0b4" | Yes
|-
| style="text-align:right; padding-right:6px;" | [[Tergeo Plasma Asher|Tergeo asher]]
| style="background-color: #c6e0b4" | Yes
| style="background-color: #c6e0b4" | Yes
| style="background-color: #c6e0b4" | Yes
| style="background-color: #c6e0b4" | Yes
|-
| style="text-align:right; padding-right:6px;" | [[Laurell spinners|Spinners]]
| style="background-color: #c6e0b4" | Yes
| style="background-color: #c6e0b4" | Yes
| style="background-color: #c6e0b4" | Yes
| style="background-color: #c6e0b4" | Yes
|}

[[Category:Tools]]

Tools

2026-07-01T11:02:12Z

Chenglee:

Before submitting a training request, please review the prerequisites for each instrument in the [[Training]] section.

'''A standardized training request form has been introduced. The new system will allow users to request training for multiple instruments using a single form (NBI-Cleanroom Training Request Form). Please only request training for instruments that require immediate access. Following submission of the request form, email communication will continue to be used for scheduling and coordinating training activities. The Cleanroom staff will acknowledge and respond to training requests within 1-2 working days'''.

Once the user has completed the training, they are given booking rights in the [http://cleanroom.brickhost.com cleanroom booking system]. However, after a certain period of inactivity on a given tool, the booking rights will expire and the user will need to be retrained in order to continue using the tool.

== Tool list ==
{| style="width: 85%;"
|- style="text-align:left;"
! Lithography !! Thin film & III-Vs !! Characterization !! Other
|- valign="top"
| style="width: 20%;" |
* [[Heidelberg µPG 501|Heidelberg LED writer]]

* [[Raith eLine|Raith eLine 30 kV EBL/SEM]]
* [[Elionix_7000|Elionix 7000 100 kV EBL]]
* [[Elionix_F-125|Elionix F-125 125kV EBL]] (QuanTech)
| style="width: 20%;" |
* [[AJA systems]]
* [[Plassys Evaporator]]
* [[E-Gun evaporator]]

* [[Laurell spinners]]
* [[Cambridge ALD]]
* [[Leica sputter coater]]
* [[MBE]]
| style="width: 20%;" |
* [[JEOL 7800F|JEOL JSM-7800F]]
* [[Raith eLine]]
* [[Talos F200i S/TEM]]
* [[Tencor profilometer]]
* [[Alpha-SE ellipsometer]]
* [[Sensofar optical profiler]]
* [[Olympus microscopes]]
* [[Lynx EVO stereomicroscope]]
* [[Bruker Dimension Icon AFM]]
* [[Filmetrics reflectometer]]
* [[Probe station]]
| style="width: 20%;" |
* [[Süss scriber|Manual Süss scriber]]
* [[Loomis scriber|Automatic Loomis scriber]]
* [[Dicing saw]]
* [[AccuThermo RTA]]
* [[Biorad]]
* [[Plasma-Preen asher]]
* [[Diener plasma asher]]
* [[Tergeo plasma asher]]
* [[FS bonder]]
* [[K&S bonder]]
* [[Micromanipulator]]
* [[Präzitherm hotplates]]
* [[Critical point dryer]]
|}

== Tool access requirement guidelines ==

{| cellspacing=0px style="text-align: center;"
! scope="col" width="20%" align="right" |
! scope="col" width="20%" | Bachelor
! scope="col" width="20%" | Master
! scope="col" width="20%" | PhD
! scope="col" width="20%" | Postdoc
|-
| style="text-align:right; padding-right:6px;" | [[Raith eLine|eLine]]
| style="background-color: #ff9f9f" | No
| style="background-color: #c6e0b4" | Yes
| style="background-color: #c6e0b4" | Yes
| style="background-color: #c6e0b4" | Yes
|-
| style="text-align:right; padding-right:6px;" | [[Elionix]]
| style="background-color: #ff9f9f" | No
| style="background-color: #c6e0b4" | Yes
| style="background-color: #c6e0b4" | Yes
| style="background-color: #c6e0b4" | Yes
|-
| style="text-align:right; padding-right:6px;" | [[Heidelberg µPG 501|LED writer]]
| style="background-color: #ff9f9f" | No
| style="background-color: #c6e0b4" | Yes
| style="background-color: #c6e0b4" | Yes
| style="background-color: #c6e0b4" | Yes
|-
| style="padding-bottom:6px;" |
|-
| style="text-align:right; padding-right:6px;" | [[AJA Systems|AJAs]]
| style="background-color: #c6e0b4" | Yes
| style="background-color: #c6e0b4" | Yes
| style="background-color: #c6e0b4" | Yes
| style="background-color: #c6e0b4" | Yes
|-
| style="text-align:right; padding-right:6px;" | [[Plassys Evaporator|Plassys]]
| style="background-color: #c6e0b4" | Yes
| style="background-color: #c6e0b4" | Yes
| style="background-color: #c6e0b4" | Yes
| style="background-color: #c6e0b4" | Yes
|-
| style="text-align:right; padding-right:6px;" | [[E-Gun evaporator|E-gun]]
| style="background-color: #c6e0b4" | Yes
| style="background-color: #c6e0b4" | Yes
| style="background-color: #c6e0b4" | Yes
| style="background-color: #c6e0b4" | Yes
|-
| style="text-align:right; padding-right:6px;" | [[Cambridge ALD|ALD]]
| style="background-color: #c6e0b4" | Yes
| style="background-color: #c6e0b4" | Yes
| style="background-color: #c6e0b4" | Yes
| style="background-color: #c6e0b4" | Yes
|-
| style="text-align:right; padding-right:6px;" | [[Leica sputter coater|Leica sputter]]
| style="background-color: #c6e0b4" | Yes
| style="background-color: #c6e0b4" | Yes
| style="background-color: #c6e0b4" | Yes
| style="background-color: #c6e0b4" | Yes
|-
| style="padding-bottom:6px;" |
|-
| style="text-align:right; padding-right:6px;" | [[JEOL 7800F]]
| style="background-color: #ff9f9f" | No
| style="background-color: #c6e0b4" | Yes
| style="background-color: #c6e0b4" | Yes
| style="background-color: #c6e0b4" | Yes
|-
| style="text-align:right; padding-right:6px;" | [[Talos F200i S/TEM |TEM]]
| style="background-color: #ff9f9f" | No
| style="background-color: #ff9f9f" | No
| style="background-color: #c6e0b4" | Yes
| style="background-color: #c6e0b4" | Yes
|-
| style="text-align:right; padding-right:6px;" | [[Tencor profilometer|Profilometer]]
| style="background-color: #c6e0b4" | Yes
| style="background-color: #c6e0b4" | Yes
| style="background-color: #c6e0b4" | Yes
| style="background-color: #c6e0b4" | Yes
|-
| style="text-align:right; padding-right:6px;" | [[Alpha-SE Ellipsometer|Ellipsometer]]
| style="background-color: #c6e0b4" | Yes
| style="background-color: #c6e0b4" | Yes
| style="background-color: #c6e0b4" | Yes
| style="background-color: #c6e0b4" | Yes
|-

| style="text-align:right; padding-right:6px;" | [[Bruker Dimension Icon AFM|AFM]]
| style="background-color: #c6e0b4" | Yes
| style="background-color: #c6e0b4" | Yes
| style="background-color: #c6e0b4" | Yes
| style="background-color: #c6e0b4" | Yes
|-
| style="text-align:right; padding-right:6px;" | [[Filmetrics reflectometer|Filmetrics]]
| style="background-color: #c6e0b4" | Yes
| style="background-color: #c6e0b4" | Yes
| style="background-color: #c6e0b4" | Yes
| style="background-color: #c6e0b4" | Yes
|-
| style="padding-bottom:6px;" |
|-
| style="text-align:right; padding-right:6px;" | [[Süss scriber|Manual scriber]]
| style="background-color: #c6e0b4" | Yes
| style="background-color: #c6e0b4" | Yes
| style="background-color: #c6e0b4" | Yes
| style="background-color: #c6e0b4" | Yes
|-
| style="text-align:right; padding-right:6px;" | [[Dicing saw]]
| style="background-color: #ff9f9f" | No
| style="background-color: #ff9f9f" | No
| style="background-color: #ff9f9f" | No
| style="background-color: #ff9f9f" | No
|-
| style="text-align:right; padding-right:6px;" | [[Loomis scriber]]
| style="background-color: #ff9f9f" | No
| style="background-color: #ff9f9f" | No
| style="background-color: #ff9f9f" | No
| style="background-color: #ff9f9f" | No
|-
| style="text-align:right; padding-right:6px;" | [[AccuThermo RTA|RTA]]
| style="background-color: #c6e0b4" | Yes
| style="background-color: #c6e0b4" | Yes
| style="background-color: #c6e0b4" | Yes
| style="background-color: #c6e0b4" | Yes
|-
| style="text-align:right; padding-right:6px;" | [[Biorad]]
| style="background-color: #c6e0b4" | Yes
| style="background-color: #c6e0b4" | Yes
| style="background-color: #c6e0b4" | Yes
| style="background-color: #c6e0b4" | Yes
|-
| style="text-align:right; padding-right:6px;" | [[Plasma-Preen asher]]
| style="background-color: #c6e0b4" | Yes
| style="background-color: #c6e0b4" | Yes
| style="background-color: #c6e0b4" | Yes
| style="background-color: #c6e0b4" | Yes
|-
| style="text-align:right; padding-right:6px;" | [[Tergeo Plasma Asher|Tergeo asher]]
| style="background-color: #c6e0b4" | Yes
| style="background-color: #c6e0b4" | Yes
| style="background-color: #c6e0b4" | Yes
| style="background-color: #c6e0b4" | Yes
|-
| style="text-align:right; padding-right:6px;" | [[Laurell spinners|Spinners]]
| style="background-color: #c6e0b4" | Yes
| style="background-color: #c6e0b4" | Yes
| style="background-color: #c6e0b4" | Yes
| style="background-color: #c6e0b4" | Yes
|}

[[Category:Tools]]

Tools

2026-07-01T11:01:49Z

Chenglee:

Before submitting a training request, please review the prerequisites for each instrument in the Training [[Training]] section.

'''A standardized training request form has been introduced. The new system will allow users to request training for multiple instruments using a single form (NBI-Cleanroom Training Request Form). Please only request training for instruments that require immediate access. Following submission of the request form, email communication will continue to be used for scheduling and coordinating training activities. The Cleanroom staff will acknowledge and respond to training requests within 1-2 working days'''.

Once the user has completed the training, they are given booking rights in the [http://cleanroom.brickhost.com cleanroom booking system]. However, after a certain period of inactivity on a given tool, the booking rights will expire and the user will need to be retrained in order to continue using the tool.

== Tool list ==
{| style="width: 85%;"
|- style="text-align:left;"
! Lithography !! Thin film & III-Vs !! Characterization !! Other
|- valign="top"
| style="width: 20%;" |
* [[Heidelberg µPG 501|Heidelberg LED writer]]

* [[Raith eLine|Raith eLine 30 kV EBL/SEM]]
* [[Elionix_7000|Elionix 7000 100 kV EBL]]
* [[Elionix_F-125|Elionix F-125 125kV EBL]] (QuanTech)
| style="width: 20%;" |
* [[AJA systems]]
* [[Plassys Evaporator]]
* [[E-Gun evaporator]]

* [[Laurell spinners]]
* [[Cambridge ALD]]
* [[Leica sputter coater]]
* [[MBE]]
| style="width: 20%;" |
* [[JEOL 7800F|JEOL JSM-7800F]]
* [[Raith eLine]]
* [[Talos F200i S/TEM]]
* [[Tencor profilometer]]
* [[Alpha-SE ellipsometer]]
* [[Sensofar optical profiler]]
* [[Olympus microscopes]]
* [[Lynx EVO stereomicroscope]]
* [[Bruker Dimension Icon AFM]]
* [[Filmetrics reflectometer]]
* [[Probe station]]
| style="width: 20%;" |
* [[Süss scriber|Manual Süss scriber]]
* [[Loomis scriber|Automatic Loomis scriber]]
* [[Dicing saw]]
* [[AccuThermo RTA]]
* [[Biorad]]
* [[Plasma-Preen asher]]
* [[Diener plasma asher]]
* [[Tergeo plasma asher]]
* [[FS bonder]]
* [[K&S bonder]]
* [[Micromanipulator]]
* [[Präzitherm hotplates]]
* [[Critical point dryer]]
|}

== Tool access requirement guidelines ==

{| cellspacing=0px style="text-align: center;"
! scope="col" width="20%" align="right" |
! scope="col" width="20%" | Bachelor
! scope="col" width="20%" | Master
! scope="col" width="20%" | PhD
! scope="col" width="20%" | Postdoc
|-
| style="text-align:right; padding-right:6px;" | [[Raith eLine|eLine]]
| style="background-color: #ff9f9f" | No
| style="background-color: #c6e0b4" | Yes
| style="background-color: #c6e0b4" | Yes
| style="background-color: #c6e0b4" | Yes
|-
| style="text-align:right; padding-right:6px;" | [[Elionix]]
| style="background-color: #ff9f9f" | No
| style="background-color: #c6e0b4" | Yes
| style="background-color: #c6e0b4" | Yes
| style="background-color: #c6e0b4" | Yes
|-
| style="text-align:right; padding-right:6px;" | [[Heidelberg µPG 501|LED writer]]
| style="background-color: #ff9f9f" | No
| style="background-color: #c6e0b4" | Yes
| style="background-color: #c6e0b4" | Yes
| style="background-color: #c6e0b4" | Yes
|-
| style="padding-bottom:6px;" |
|-
| style="text-align:right; padding-right:6px;" | [[AJA Systems|AJAs]]
| style="background-color: #c6e0b4" | Yes
| style="background-color: #c6e0b4" | Yes
| style="background-color: #c6e0b4" | Yes
| style="background-color: #c6e0b4" | Yes
|-
| style="text-align:right; padding-right:6px;" | [[Plassys Evaporator|Plassys]]
| style="background-color: #c6e0b4" | Yes
| style="background-color: #c6e0b4" | Yes
| style="background-color: #c6e0b4" | Yes
| style="background-color: #c6e0b4" | Yes
|-
| style="text-align:right; padding-right:6px;" | [[E-Gun evaporator|E-gun]]
| style="background-color: #c6e0b4" | Yes
| style="background-color: #c6e0b4" | Yes
| style="background-color: #c6e0b4" | Yes
| style="background-color: #c6e0b4" | Yes
|-
| style="text-align:right; padding-right:6px;" | [[Cambridge ALD|ALD]]
| style="background-color: #c6e0b4" | Yes
| style="background-color: #c6e0b4" | Yes
| style="background-color: #c6e0b4" | Yes
| style="background-color: #c6e0b4" | Yes
|-
| style="text-align:right; padding-right:6px;" | [[Leica sputter coater|Leica sputter]]
| style="background-color: #c6e0b4" | Yes
| style="background-color: #c6e0b4" | Yes
| style="background-color: #c6e0b4" | Yes
| style="background-color: #c6e0b4" | Yes
|-
| style="padding-bottom:6px;" |
|-
| style="text-align:right; padding-right:6px;" | [[JEOL 7800F]]
| style="background-color: #ff9f9f" | No
| style="background-color: #c6e0b4" | Yes
| style="background-color: #c6e0b4" | Yes
| style="background-color: #c6e0b4" | Yes
|-
| style="text-align:right; padding-right:6px;" | [[Talos F200i S/TEM |TEM]]
| style="background-color: #ff9f9f" | No
| style="background-color: #ff9f9f" | No
| style="background-color: #c6e0b4" | Yes
| style="background-color: #c6e0b4" | Yes
|-
| style="text-align:right; padding-right:6px;" | [[Tencor profilometer|Profilometer]]
| style="background-color: #c6e0b4" | Yes
| style="background-color: #c6e0b4" | Yes
| style="background-color: #c6e0b4" | Yes
| style="background-color: #c6e0b4" | Yes
|-
| style="text-align:right; padding-right:6px;" | [[Alpha-SE Ellipsometer|Ellipsometer]]
| style="background-color: #c6e0b4" | Yes
| style="background-color: #c6e0b4" | Yes
| style="background-color: #c6e0b4" | Yes
| style="background-color: #c6e0b4" | Yes
|-

| style="text-align:right; padding-right:6px;" | [[Bruker Dimension Icon AFM|AFM]]
| style="background-color: #c6e0b4" | Yes
| style="background-color: #c6e0b4" | Yes
| style="background-color: #c6e0b4" | Yes
| style="background-color: #c6e0b4" | Yes
|-
| style="text-align:right; padding-right:6px;" | [[Filmetrics reflectometer|Filmetrics]]
| style="background-color: #c6e0b4" | Yes
| style="background-color: #c6e0b4" | Yes
| style="background-color: #c6e0b4" | Yes
| style="background-color: #c6e0b4" | Yes
|-
| style="padding-bottom:6px;" |
|-
| style="text-align:right; padding-right:6px;" | [[Süss scriber|Manual scriber]]
| style="background-color: #c6e0b4" | Yes
| style="background-color: #c6e0b4" | Yes
| style="background-color: #c6e0b4" | Yes
| style="background-color: #c6e0b4" | Yes
|-
| style="text-align:right; padding-right:6px;" | [[Dicing saw]]
| style="background-color: #ff9f9f" | No
| style="background-color: #ff9f9f" | No
| style="background-color: #ff9f9f" | No
| style="background-color: #ff9f9f" | No
|-
| style="text-align:right; padding-right:6px;" | [[Loomis scriber]]
| style="background-color: #ff9f9f" | No
| style="background-color: #ff9f9f" | No
| style="background-color: #ff9f9f" | No
| style="background-color: #ff9f9f" | No
|-
| style="text-align:right; padding-right:6px;" | [[AccuThermo RTA|RTA]]
| style="background-color: #c6e0b4" | Yes
| style="background-color: #c6e0b4" | Yes
| style="background-color: #c6e0b4" | Yes
| style="background-color: #c6e0b4" | Yes
|-
| style="text-align:right; padding-right:6px;" | [[Biorad]]
| style="background-color: #c6e0b4" | Yes
| style="background-color: #c6e0b4" | Yes
| style="background-color: #c6e0b4" | Yes
| style="background-color: #c6e0b4" | Yes
|-
| style="text-align:right; padding-right:6px;" | [[Plasma-Preen asher]]
| style="background-color: #c6e0b4" | Yes
| style="background-color: #c6e0b4" | Yes
| style="background-color: #c6e0b4" | Yes
| style="background-color: #c6e0b4" | Yes
|-
| style="text-align:right; padding-right:6px;" | [[Tergeo Plasma Asher|Tergeo asher]]
| style="background-color: #c6e0b4" | Yes
| style="background-color: #c6e0b4" | Yes
| style="background-color: #c6e0b4" | Yes
| style="background-color: #c6e0b4" | Yes
|-
| style="text-align:right; padding-right:6px;" | [[Laurell spinners|Spinners]]
| style="background-color: #c6e0b4" | Yes
| style="background-color: #c6e0b4" | Yes
| style="background-color: #c6e0b4" | Yes
| style="background-color: #c6e0b4" | Yes
|}

[[Category:Tools]]

Tools

2026-07-01T11:00:56Z

Chenglee:

Before submitting a training request, please review the prerequisites for each instrument in the Training [Training|training] section.

'''A standardized training request form has been introduced. The new system will allow users to request training for multiple instruments using a single form (NBI-Cleanroom Training Request Form). Please only request training for instruments that require immediate access. Following submission of the request form, email communication will continue to be used for scheduling and coordinating training activities. The Cleanroom staff will acknowledge and respond to training requests within 1-2 working days'''.

Once the user has completed the training, they are given booking rights in the [http://cleanroom.brickhost.com cleanroom booking system]. However, after a certain period of inactivity on a given tool, the booking rights will expire and the user will need to be retrained in order to continue using the tool.

== Tool list ==
{| style="width: 85%;"
|- style="text-align:left;"
! Lithography !! Thin film & III-Vs !! Characterization !! Other
|- valign="top"
| style="width: 20%;" |
* [[Heidelberg µPG 501|Heidelberg LED writer]]

* [[Raith eLine|Raith eLine 30 kV EBL/SEM]]
* [[Elionix_7000|Elionix 7000 100 kV EBL]]
* [[Elionix_F-125|Elionix F-125 125kV EBL]] (QuanTech)
| style="width: 20%;" |
* [[AJA systems]]
* [[Plassys Evaporator]]
* [[E-Gun evaporator]]

* [[Laurell spinners]]
* [[Cambridge ALD]]
* [[Leica sputter coater]]
* [[MBE]]
| style="width: 20%;" |
* [[JEOL 7800F|JEOL JSM-7800F]]
* [[Raith eLine]]
* [[Talos F200i S/TEM]]
* [[Tencor profilometer]]
* [[Alpha-SE ellipsometer]]
* [[Sensofar optical profiler]]
* [[Olympus microscopes]]
* [[Lynx EVO stereomicroscope]]
* [[Bruker Dimension Icon AFM]]
* [[Filmetrics reflectometer]]
* [[Probe station]]
| style="width: 20%;" |
* [[Süss scriber|Manual Süss scriber]]
* [[Loomis scriber|Automatic Loomis scriber]]
* [[Dicing saw]]
* [[AccuThermo RTA]]
* [[Biorad]]
* [[Plasma-Preen asher]]
* [[Diener plasma asher]]
* [[Tergeo plasma asher]]
* [[FS bonder]]
* [[K&S bonder]]
* [[Micromanipulator]]
* [[Präzitherm hotplates]]
* [[Critical point dryer]]
|}

== Tool access requirement guidelines ==

{| cellspacing=0px style="text-align: center;"
! scope="col" width="20%" align="right" |
! scope="col" width="20%" | Bachelor
! scope="col" width="20%" | Master
! scope="col" width="20%" | PhD
! scope="col" width="20%" | Postdoc
|-
| style="text-align:right; padding-right:6px;" | [[Raith eLine|eLine]]
| style="background-color: #ff9f9f" | No
| style="background-color: #c6e0b4" | Yes
| style="background-color: #c6e0b4" | Yes
| style="background-color: #c6e0b4" | Yes
|-
| style="text-align:right; padding-right:6px;" | [[Elionix]]
| style="background-color: #ff9f9f" | No
| style="background-color: #c6e0b4" | Yes
| style="background-color: #c6e0b4" | Yes
| style="background-color: #c6e0b4" | Yes
|-
| style="text-align:right; padding-right:6px;" | [[Heidelberg µPG 501|LED writer]]
| style="background-color: #ff9f9f" | No
| style="background-color: #c6e0b4" | Yes
| style="background-color: #c6e0b4" | Yes
| style="background-color: #c6e0b4" | Yes
|-
| style="padding-bottom:6px;" |
|-
| style="text-align:right; padding-right:6px;" | [[AJA Systems|AJAs]]
| style="background-color: #c6e0b4" | Yes
| style="background-color: #c6e0b4" | Yes
| style="background-color: #c6e0b4" | Yes
| style="background-color: #c6e0b4" | Yes
|-
| style="text-align:right; padding-right:6px;" | [[Plassys Evaporator|Plassys]]
| style="background-color: #c6e0b4" | Yes
| style="background-color: #c6e0b4" | Yes
| style="background-color: #c6e0b4" | Yes
| style="background-color: #c6e0b4" | Yes
|-
| style="text-align:right; padding-right:6px;" | [[E-Gun evaporator|E-gun]]
| style="background-color: #c6e0b4" | Yes
| style="background-color: #c6e0b4" | Yes
| style="background-color: #c6e0b4" | Yes
| style="background-color: #c6e0b4" | Yes
|-
| style="text-align:right; padding-right:6px;" | [[Cambridge ALD|ALD]]
| style="background-color: #c6e0b4" | Yes
| style="background-color: #c6e0b4" | Yes
| style="background-color: #c6e0b4" | Yes
| style="background-color: #c6e0b4" | Yes
|-
| style="text-align:right; padding-right:6px;" | [[Leica sputter coater|Leica sputter]]
| style="background-color: #c6e0b4" | Yes
| style="background-color: #c6e0b4" | Yes
| style="background-color: #c6e0b4" | Yes
| style="background-color: #c6e0b4" | Yes
|-
| style="padding-bottom:6px;" |
|-
| style="text-align:right; padding-right:6px;" | [[JEOL 7800F]]
| style="background-color: #ff9f9f" | No
| style="background-color: #c6e0b4" | Yes
| style="background-color: #c6e0b4" | Yes
| style="background-color: #c6e0b4" | Yes
|-
| style="text-align:right; padding-right:6px;" | [[Talos F200i S/TEM |TEM]]
| style="background-color: #ff9f9f" | No
| style="background-color: #ff9f9f" | No
| style="background-color: #c6e0b4" | Yes
| style="background-color: #c6e0b4" | Yes
|-
| style="text-align:right; padding-right:6px;" | [[Tencor profilometer|Profilometer]]
| style="background-color: #c6e0b4" | Yes
| style="background-color: #c6e0b4" | Yes
| style="background-color: #c6e0b4" | Yes
| style="background-color: #c6e0b4" | Yes
|-
| style="text-align:right; padding-right:6px;" | [[Alpha-SE Ellipsometer|Ellipsometer]]
| style="background-color: #c6e0b4" | Yes
| style="background-color: #c6e0b4" | Yes
| style="background-color: #c6e0b4" | Yes
| style="background-color: #c6e0b4" | Yes
|-

| style="text-align:right; padding-right:6px;" | [[Bruker Dimension Icon AFM|AFM]]
| style="background-color: #c6e0b4" | Yes
| style="background-color: #c6e0b4" | Yes
| style="background-color: #c6e0b4" | Yes
| style="background-color: #c6e0b4" | Yes
|-
| style="text-align:right; padding-right:6px;" | [[Filmetrics reflectometer|Filmetrics]]
| style="background-color: #c6e0b4" | Yes
| style="background-color: #c6e0b4" | Yes
| style="background-color: #c6e0b4" | Yes
| style="background-color: #c6e0b4" | Yes
|-
| style="padding-bottom:6px;" |
|-
| style="text-align:right; padding-right:6px;" | [[Süss scriber|Manual scriber]]
| style="background-color: #c6e0b4" | Yes
| style="background-color: #c6e0b4" | Yes
| style="background-color: #c6e0b4" | Yes
| style="background-color: #c6e0b4" | Yes
|-
| style="text-align:right; padding-right:6px;" | [[Dicing saw]]
| style="background-color: #ff9f9f" | No
| style="background-color: #ff9f9f" | No
| style="background-color: #ff9f9f" | No
| style="background-color: #ff9f9f" | No
|-
| style="text-align:right; padding-right:6px;" | [[Loomis scriber]]
| style="background-color: #ff9f9f" | No
| style="background-color: #ff9f9f" | No
| style="background-color: #ff9f9f" | No
| style="background-color: #ff9f9f" | No
|-
| style="text-align:right; padding-right:6px;" | [[AccuThermo RTA|RTA]]
| style="background-color: #c6e0b4" | Yes
| style="background-color: #c6e0b4" | Yes
| style="background-color: #c6e0b4" | Yes
| style="background-color: #c6e0b4" | Yes
|-
| style="text-align:right; padding-right:6px;" | [[Biorad]]
| style="background-color: #c6e0b4" | Yes
| style="background-color: #c6e0b4" | Yes
| style="background-color: #c6e0b4" | Yes
| style="background-color: #c6e0b4" | Yes
|-
| style="text-align:right; padding-right:6px;" | [[Plasma-Preen asher]]
| style="background-color: #c6e0b4" | Yes
| style="background-color: #c6e0b4" | Yes
| style="background-color: #c6e0b4" | Yes
| style="background-color: #c6e0b4" | Yes
|-
| style="text-align:right; padding-right:6px;" | [[Tergeo Plasma Asher|Tergeo asher]]
| style="background-color: #c6e0b4" | Yes
| style="background-color: #c6e0b4" | Yes
| style="background-color: #c6e0b4" | Yes
| style="background-color: #c6e0b4" | Yes
|-
| style="text-align:right; padding-right:6px;" | [[Laurell spinners|Spinners]]
| style="background-color: #c6e0b4" | Yes
| style="background-color: #c6e0b4" | Yes
| style="background-color: #c6e0b4" | Yes
| style="background-color: #c6e0b4" | Yes
|}

[[Category:Tools]]

Main Page

2026-06-30T14:15:19Z

Chenglee: /* Current tool status */

'''Welcome to the NBI Cleanroom wiki!'''

This site contains public information for the users of the cleanroom and related facilities. All items are available '''without login'''. Internal information that should not be disclosed can be posted at the password protected [https://wiki.nbi.ku.dk/qdevwiki/Main_Page QDev wiki].

{| style="width: 60%;" align="center"
|- style="text-align:center;"
|[[File:Tools_button.png|100px|link=Tools|Tools]] || [[File:Safety_button.png|100px|link=Safety|Safety]] || [[File:Fabrication_button.png|100px|link=Fabrication|Fabrication]] || [[File:Calendar_button.png|100px|link=http://cleanroom.brickhost.com/|Calendar]] || [[File:Training ico.png|100px|link=Training|Training]] || [[File:Info_button.png|100px|link=About|About]] || [[File:MBE.png|90px|link=MBE|MBE]] || [[File:sustain.png|90px|link=Sustainability|Sustainability]]
|- style="text-align:center;"
| Tools || Safety || Fabrication || Booking || Training || About || MBE || Sustainability
|}

==NEWS: NBI-Cleanroom Training Request Form==
Starting in July 2026, a standardized training request form will be introduced. The new system will allow users to request training for multiple instruments using a single form ([https://forms.office.com/e/b3PDKjsZ88?origin=lprLink NBI-Cleanroom Training Request Form]). Following submission of the request form, email communication will continue to be used for scheduling and coordinating training activities.

==Current tool status==

{| cellspacing=0px style="text-align: left;"
|-
| style="text-align:right; padding-right:6px;" | [[Heidelberg µPG 501|Heidelberg LED writer]]
| style="background-color: #c6e0b4" | All good!
|-
| style="text-align:right; padding-right:6px;" | [[Raith eLine|Raith eLine 30 kV]]
| style="background-color: #c6e0b4" | All good!
|-
| style="text-align:right; padding-right:6px;" | [[Elionix_7000|Elionix 7000 100 kV]]
| style="background-color: #ff9f9f" | Service: Blanking aperture. Expected recovery date: Until further notice.
|-
| style="text-align:right; padding-right:6px;" | [[Elionix_F-125|Elionix F-125 125 kV]]
| style="background-color: #c6e0b4" | All good!
|-
| style="padding-bottom:6px;" |
|-
| style="text-align:right; padding-right:6px;" | [[AJA systems|AJA1]]
| style="background-color: #FFBF00" | Minor issue with the on/off button of the Carrera FerroTech. Please contact cleanroom if the button isn't responding.
|-
| style="text-align:right; padding-right:6px;" | [[AJA systems|AJA2]]
| style="background-color: #c6e0b4" | All good!
|-
| style="text-align:right; padding-right:6px;" | [[Plassys Evaporator]]
| style="background-color: #c6e0b4" | All good!
|-
| style="text-align:right; padding-right:6px;" | [[E-Gun evaporator]]
| style="background-color: #c6e0b4" | All good! The chamber is dedicated to In
|-
| style="text-align:right; padding-right:6px;" | [[Cambridge ALD|ALD1]]
| style="background-color: #c6e0b4" | All good!
|-
| style="text-align:right; padding-right:6px;" | [[Cambridge ALD|ALD2]]
| style="background-color: #c6e0b4" | All good!
|-
| style="padding-bottom:6px;" |
|-
| style="text-align:right; padding-right:6px;" | [[FS bonder]]
| style="background-color: #c6e0b4" | All good!
|-
| style="text-align:right; padding-right:6px;" | [[K&S bonder]]
| style="background-color: #c6e0b4" | All good!
|-
| style="text-align:right; padding-right:6px;" | [[Loomis scriber]]
| style="background-color: #c6e0b4" | All good!
|-
| style="text-align:right; padding-right:6px;" | [[Dicing saw]]
| style="background-color: #c6e0b4" | All good!
|-
| style="padding-bottom:6px;" |
|-
| style="text-align:right; padding-right:6px;" | [[Bruker Dimension Icon AFM|AFM]]
| style="background-color: #c6e0b4" | All good!
|-
| style="text-align:right; padding-right:6px;" | [[JEOL 7800F|JEOL JSM-7800F]]
| style="background-color: #c6e0b4" | All good!
|-
| style="text-align:right; padding-right:6px;" | [[JEOL 7800F|JEOL JSM-7800F prime]]
| style="background-color: #c6e0b4" | All good!
|-
| style="text-align:right; padding-right:6px;" | [[Talos F200i S/TEM|TEM]]
| style="background-color: #ff9f9f" | Service: Diaphragms replacement. Expected recovery date: July 2, 2026.
|}

''List updated: Fri 12 Jun 2026''

Main Page

2026-06-30T14:13:58Z

Chenglee: /* Current tool status */

'''Welcome to the NBI Cleanroom wiki!'''

This site contains public information for the users of the cleanroom and related facilities. All items are available '''without login'''. Internal information that should not be disclosed can be posted at the password protected [https://wiki.nbi.ku.dk/qdevwiki/Main_Page QDev wiki].

{| style="width: 60%;" align="center"
|- style="text-align:center;"
|[[File:Tools_button.png|100px|link=Tools|Tools]] || [[File:Safety_button.png|100px|link=Safety|Safety]] || [[File:Fabrication_button.png|100px|link=Fabrication|Fabrication]] || [[File:Calendar_button.png|100px|link=http://cleanroom.brickhost.com/|Calendar]] || [[File:Training ico.png|100px|link=Training|Training]] || [[File:Info_button.png|100px|link=About|About]] || [[File:MBE.png|90px|link=MBE|MBE]] || [[File:sustain.png|90px|link=Sustainability|Sustainability]]
|- style="text-align:center;"
| Tools || Safety || Fabrication || Booking || Training || About || MBE || Sustainability
|}

==NEWS: NBI-Cleanroom Training Request Form==
Starting in July 2026, a standardized training request form will be introduced. The new system will allow users to request training for multiple instruments using a single form ([https://forms.office.com/e/b3PDKjsZ88?origin=lprLink NBI-Cleanroom Training Request Form]). Following submission of the request form, email communication will continue to be used for scheduling and coordinating training activities.

==Current tool status==

{| cellspacing=0px style="text-align: left;"
|-
| style="text-align:right; padding-right:6px;" | [[Heidelberg µPG 501|Heidelberg LED writer]]
| style="background-color: #c6e0b4" | All good!
|-
| style="text-align:right; padding-right:6px;" | [[Raith eLine|Raith eLine 30 kV]]
| style="background-color: #c6e0b4" | All good!
|-
| style="text-align:right; padding-right:6px;" | [[Elionix_7000|Elionix 7000 100 kV]]
| style="background-color: #ff9f9f" | Service: Blanking aperture. Expected recovery date: Until further notice.
|-
| style="text-align:right; padding-right:6px;" | [[Elionix_F-125|Elionix F-125 125 kV]]
| style="background-color: #c6e0b4" | All good!
|-
| style="padding-bottom:6px;" |
|-
| style="text-align:right; padding-right:6px;" | [[AJA systems|AJA1]]
| style="background-color: #FFBF00" | Minor issue with the on/off button of the Carrera FerroTech. Please contact cleanroom if the button isn't responding.
|-
| style="text-align:right; padding-right:6px;" | [[AJA systems|AJA2]]
| style="background-color: #c6e0b4" | All good!
|-
| style="text-align:right; padding-right:6px;" | [[Plassys Evaporator]]
| style="background-color: #c6e0b4" | All good!
|-
| style="text-align:right; padding-right:6px;" | [[E-Gun evaporator]]
| style="background-color: #c6e0b4" | All good! The chamber is dedicated to In
|-
| style="text-align:right; padding-right:6px;" | [[Cambridge ALD|ALD1]]
| style="background-color: #c6e0b4" | All good!
|-
| style="text-align:right; padding-right:6px;" | [[Cambridge ALD|ALD2]]
| style="background-color: #c6e0b4" | All good!
|-
| style="padding-bottom:6px;" |
|-
| style="text-align:right; padding-right:6px;" | [[FS bonder]]
| style="background-color: #c6e0b4" | All good!
|-
| style="text-align:right; padding-right:6px;" | [[K&S bonder]]
| style="background-color: #c6e0b4" | All good!
|-
| style="text-align:right; padding-right:6px;" | [[Loomis scriber]]
| style="background-color: #c6e0b4" | All good!
|-
| style="text-align:right; padding-right:6px;" | [[Dicing saw]]
| style="background-color: #c6e0b4" | All good!
|-
| style="padding-bottom:6px;" |
|-
| style="text-align:right; padding-right:6px;" | [[Bruker Dimension Icon AFM|AFM]]
| style="background-color: #c6e0b4" | All good!
|-
| style="text-align:right; padding-right:6px;" | [[JEOL 7800F|JEOL JSM-7800F]]
| style="background-color: #c6e0b4" | All good!
|-
| style="text-align:right; padding-right:6px;" | [[JEOL 7800F|JEOL JSM-7800F prime]]
| style="background-color: #c6e0b4" | All good!
|-
| style="text-align:right; padding-right:6px;" | [[Talos F200i S/TEM|TEM]]
| style="background-color: #ff9f9f" | Service: Dampers replacement. Expected recovery date: July 2, 2026.
|}

''List updated: Fri 12 Jun 2026''

Main Page

2026-06-30T13:35:28Z

Chenglee: /* Current tool status */

'''Welcome to the NBI Cleanroom wiki!'''

This site contains public information for the users of the cleanroom and related facilities. All items are available '''without login'''. Internal information that should not be disclosed can be posted at the password protected [https://wiki.nbi.ku.dk/qdevwiki/Main_Page QDev wiki].

{| style="width: 60%;" align="center"
|- style="text-align:center;"
|[[File:Tools_button.png|100px|link=Tools|Tools]] || [[File:Safety_button.png|100px|link=Safety|Safety]] || [[File:Fabrication_button.png|100px|link=Fabrication|Fabrication]] || [[File:Calendar_button.png|100px|link=http://cleanroom.brickhost.com/|Calendar]] || [[File:Training ico.png|100px|link=Training|Training]] || [[File:Info_button.png|100px|link=About|About]] || [[File:MBE.png|90px|link=MBE|MBE]] || [[File:sustain.png|90px|link=Sustainability|Sustainability]]
|- style="text-align:center;"
| Tools || Safety || Fabrication || Booking || Training || About || MBE || Sustainability
|}

==NEWS: NBI-Cleanroom Training Request Form==
Starting in July 2026, a standardized training request form will be introduced. The new system will allow users to request training for multiple instruments using a single form ([https://forms.office.com/e/b3PDKjsZ88?origin=lprLink NBI-Cleanroom Training Request Form]). Following submission of the request form, email communication will continue to be used for scheduling and coordinating training activities.

==Current tool status==

{| cellspacing=0px style="text-align: left;"
|-
| style="text-align:right; padding-right:6px;" | [[Heidelberg µPG 501|Heidelberg LED writer]]
| style="background-color: #c6e0b4" | All good!
|-
| style="text-align:right; padding-right:6px;" | [[Raith eLine|Raith eLine 30 kV]]
| style="background-color: #c6e0b4" | All good!
|-
| style="text-align:right; padding-right:6px;" | [[Elionix_7000|Elionix 7000 100 kV]]
| style="background-color: #ff9f9f" | Service: Blanking aperture. Expected recovery date: Until further notice.
|-
| style="text-align:right; padding-right:6px;" | [[Elionix_F-125|Elionix F-125 125 kV]]
| style="background-color: #c6e0b4" | All good!
|-
| style="padding-bottom:6px;" |
|-
| style="text-align:right; padding-right:6px;" | [[AJA systems|AJA1]]
| style="background-color: #FFBF00" | Minor issue with the on/off button of the Carrera FerroTech. Please contact cleanroom if the button isn't responding.
|-
| style="text-align:right; padding-right:6px;" | [[AJA systems|AJA2]]
| style="background-color: #c6e0b4" | All good!
|-
| style="text-align:right; padding-right:6px;" | [[Plassys Evaporator]]
| style="background-color: #c6e0b4" | All good!
|-
| style="text-align:right; padding-right:6px;" | [[E-Gun evaporator]]
| style="background-color: #c6e0b4" | All good! The chamber is dedicated to In
|-
| style="text-align:right; padding-right:6px;" | [[Cambridge ALD|ALD1]]
| style="background-color: #c6e0b4" | All good!
|-
| style="text-align:right; padding-right:6px;" | [[Cambridge ALD|ALD2]]
| style="background-color: #c6e0b4" | All good!
|-
| style="padding-bottom:6px;" |
|-
| style="text-align:right; padding-right:6px;" | [[FS bonder]]
| style="background-color: #c6e0b4" | All good!
|-
| style="text-align:right; padding-right:6px;" | [[K&S bonder]]
| style="background-color: #c6e0b4" | All good!
|-
| style="text-align:right; padding-right:6px;" | [[Loomis scriber]]
| style="background-color: #c6e0b4" | All good!
|-
| style="text-align:right; padding-right:6px;" | [[Dicing saw]]
| style="background-color: #c6e0b4" | All good!
|-
| style="padding-bottom:6px;" |
|-
| style="text-align:right; padding-right:6px;" | [[Bruker Dimension Icon AFM|AFM]]
| style="background-color: #c6e0b4" | All good!
|-
| style="text-align:right; padding-right:6px;" | [[JEOL 7800F|JEOL JSM-7800F]]
| style="background-color: #c6e0b4" | All good!
|-
| style="text-align:right; padding-right:6px;" | [[JEOL 7800F|JEOL JSM-7800F prime]]
| style="background-color: #c6e0b4" | All good!
|-
| style="text-align:right; padding-right:6px;" | [[Talos F200i S/TEM|TEM]]
| style="background-color: #ff9f9f" | Service: Dampers replacement. Expected recovery date: July 1, 2026.
|}

''List updated: Fri 12 Jun 2026''

Training

2026-06-29T14:28:58Z

Chenglee: /* Bruker Dimension Icon AFM */

Before submitting a training request, please review the prerequisites for each instrument listed below.

'''Starting in July 2026, a standardized training request form will be introduced. The new system will allow users to request training for multiple instruments using a single form''' ([https://forms.office.com/e/b3PDKjsZ88?origin=lprLink NBI-Cleanroom Training Request Form]). '''Please only request training for instruments that require immediate access'''. Following submission of the request form, email communication will continue to be used for scheduling and coordinating training activities. The Cleanroom staff will acknowledge and respond to training requests within 1-2 working days.

Please note that access to the Cleanroom, tool laboratories and individual instruments can only be granted after the required safety instructions and instrument training have been completed and approved by the Cleanroom staff. Upon successful completion of the training, users will be granted booking privileges through [http://cleanroom.brickhost.com/ Cleanroom Booking System].

To ensure continued competency and safe operation, booking privileges and laboratory access may expire after a period of inactivity (typically '''90 days''') for a given instrument or Cleanroom usage. In such cases, users will be required to complete a refresher training session before access can be reinstated.

== Cleanroom General (Safety) Introduction ==
Before attending the training session, all users must read and familiarize themselves with the relevant safety information ([[Safety]]). ''Expand to view more information''.
<div class="mw-collapsible mw-collapsed" style="border:1px solid #d8dde3; border-left:6px solid #72777d; background:#f8f9fa; border-radius:6px; margin:0.45em 0 1.0em; padding:0.55em 0.75em 0.55em;">
<div class="mw-collapsible-toggle" style="text-align:right; margin:-0.62em 0 0.25em; line-height:1;">'''Expand'''</div>
<div class="mw-collapsible-content">
* The introductory session is scheduled from 09:15 to 15:00.
* Training sessions are conducted in group of 3-4 participants. Once a training date has been proposed by the Cleanroom staff, participants are required to confirm their attendance by email ([mailto:cleanroom@nbi.ku.dk cleanroom@nbi.ku.dk]).
* If fewer than 3 participants are available for a scheduled session, an alternative training date may be proposed. If a session reaches its maximum capacity of 4 participants, additional users will be placed on a waiting list and offered the next available training opportunity.
* Please identify a superuser from your research group who will serve as your mentor during your first few weeks of working in the Cleanroom.
* The designated mentor is responsible for guiding you through the standard procedures and best practices after the Cleanroom General Introduction.
* Once the mentor has determined that you are competent to work independently, they must notify the Cleanroom team via email.
* Full access to the Cleanroom laboratories will only be granted after the Cleanroom team has received this confirmation.
* Standard Training Program:
** 09:15-10:30: Cleanroom introduction
** Coffee break
** 10:45-12:00: Asher, spinners and optical microscopes
** Lunch break
** 13:00-14:00: Practical information
** 14:00-15:00: Q&A and account setup
</div>
</div>

== Chemical Handling==

=== HF Safety Training ===
Before attending the training session, all users must read and familiarize themselves with the relevant safety information ([[Safety]]). ''Expand to view more information''.
<div class="mw-collapsible mw-collapsed" style="border:1px solid #d8dde3; border-left:6px solid #72777d; background:#f8f9fa; border-radius:6px; margin:0.45em 0 1.0em; padding:0.55em 0.75em 0.55em;">
<div class="mw-collapsible-toggle" style="text-align:right; margin:-0.62em 0 0.25em; line-height:1;">'''Expand'''</div>
<div class="mw-collapsible-content">
* The HF Safety introduction is offered on a monthly basis.
* Training sessions are conducted in groups of up to 4 participants.
* Once a training date has been proposed by the Cleanroom staff, participants must confirm their attendance by email.
* Users are required to complete the HF Handling Questionnaire (that you will receive from a Cleanroom staff) and submit it to the instructor during the training session.
* Each user must also designate an HF buddy. This person must be an authorized Cleanroom user with valid HF access and training.
* As HF handling involves significant safety risks, strict compliance to all safety requirements is mandatory.
* Users are expected to arrive fully prepared for the training session.
* The instructor reserves the right to suspend or terminate the training if a participant has not completed the required preparation or does not demonstrate an adequate understanding of the relevant safety procedures.
</div>
</div>

== Lithography ==
'''Request Training for Lithography Tools via''' [https://forms.office.com/e/b3PDKjsZ88?origin=lprLink NBI-Cleanroom Training Request Form].

=== Elionix 7000 (100 kV) ===
Elionix 7000 training is for advanced users and requires prior cleanroom tool competency.
<div class="mw-collapsible mw-collapsed" style="border:1px solid #b8e2d5; border-left:6px solid #14866d; background:#f2fbf8; border-radius:6px; margin:0.45em 0 1.0em; padding:0.55em 0.75em 0.55em;">
<div class="mw-collapsible-toggle" style="text-align:right; margin:-0.62em 0 0.25em; line-height:1;">'''Expand'''</div>
<div class="mw-collapsible-content">
==== Prerequisites ====
* You must be at least a Master student or signed up for a long term (>6 months) project to be allowed to use the tool.
* Elionix is a high level tool. Make sure you are already trained to:
** Enter the cleanroom
** Use the microscope, spinner, asher

==== Training ====
* You'll need 4 sessions to get trained on this tool.
** Session 1 ( 1 hr.) - teaches you how to load/unload the sample and how to condition the beam.
** Session 2 ( 3 hr.) - involves exposing alignment marks and test patterns (any design: preferably one half of the overlay ,so to understand alignment later ).
** Session 3 ( 3 hr.) - involves using the exposed alignment marks for marker registration and exposing the 2nd pattern (i.e. the 2nd half of the overlay pattern).
** Session 4 involves exposing a "real" pattern on a "real" chip on your own to gain access.

==== Preparation ====
Before any training slots are booked on the tool you'll need all of the following prepared:
* Shadow senior users on the tool 2-3 times.
* Chip (comfortable to handle) spin coated with resist. This chip will be used for sessions 1 & 2. Please be aware of the coating and baking parameters for the resist.
* Any test design is preferred which has marks, overlay patterns that you will use to test alignment precision between two lithography steps. A Vernier pattern is commonly used. Feel free to test your ideas. Make sure you have something for both ''x'' and ''y'' directions. If you don't know how to start, check the [[Design template for EBL]].
* Convert your design files into the Elionix exposure format .co7. This can be done using Beamer in 4th floor design computers.
* Make sure all write fields are entirely in the positive coordinate space.
* Make sure neither exposure will take longer than 60 minutes at 500 pA current and dose of 1000 uC/cm2.
</div>
</div>

=== Elionix F-125 (125 kV at QuanTech) ===
More information will be provided shortly.
<div class="mw-collapsible mw-collapsed" style="border:1px solid #b8e2d5; border-left:6px solid #14866d; background:#f2fbf8; border-radius:6px; margin:0.45em 0 1.0em; padding:0.55em 0.75em 0.55em;">
<div class="mw-collapsible-toggle" style="text-align:right; margin:-0.62em 0 0.25em; line-height:1;">'''Expand'''</div>
<div class="mw-collapsible-content">
</div>
</div>

=== Heidelberg upg501 ===
Prepare your design file and coated chip before requesting Heidelberg upg501 training.
<div class="mw-collapsible mw-collapsed" style="border:1px solid #b8e2d5; border-left:6px solid #14866d; background:#f2fbf8; border-radius:6px; margin:0.45em 0 1.0em; padding:0.55em 0.75em 0.55em;">
<div class="mw-collapsible-toggle" style="text-align:right; margin:-0.62em 0 0.25em; line-height:1;">'''Expand'''</div>
<div class="mw-collapsible-content">
* Have a design file ready. GDS, DXF or CIF format works fine. Make sure you are familiar with the design before your actual session.
* Have a chip spin coated with an appropriate photoresist before the training session.
** The photoresist is sensitive to white light. Use the yellow filter on the microscopes. The light source in the both scribers is white and will already expose your resist.
* What is your project alias? If unsure, contact your supervisor first.

Before the training session:
* Watch the instruction video and read the standard operating procedure on the [[Heidelberg µPG 501|Heidelberg µPG 501 tool page]], shadow the tool with your group members, and ask for a sign-off session.
</div>
</div>

== Characterization ==
'''Request Training for Characterization Tools via''' [https://forms.office.com/e/b3PDKjsZ88?origin=lprLink NBI-Cleanroom Training Request Form].

=== Bruker Dimension Icon AFM ===
Bruker Dimension Icon is an atomic force microscope used for high-resolution and accurate measurements of surface topography.
<div class="mw-collapsible mw-collapsed" style="border:1px solid #b7e1c1; border-left:6px solid #2a9d5b; background:#f2fbf5; border-radius:6px; margin:0.45em 0 1.0em; padding:0.55em 0.75em 0.55em;">
<div class="mw-collapsible-toggle" style="text-align:right; margin:-0.62em 0 0.25em; line-height:1;">'''Expand'''</div>
<div class="mw-collapsible-content">
* AFM training is offered upon user request and is typically conducted on a one-on-one basis.
* Completion of the training usually requires 2-3 sessions, with each session lasting approximately 2-3 hours.
* Prior to attending the training sessions, users are expected to review and familiarize themselves with the AFM operating procedures ([[Bruker Dimension Icon AFM|AFM]]).
* Users are encouraged to shadow an authorized user on the instrument 2-3 times before starting formal training.
* In addition, having a suitable sample prepared in advance of the training is highly recommended.
* Where appropriate and subject to staff availability and project timelines, a staff member may also assist in carrying out user projects.
</div>
</div>

=== JEOL 7800F SEM-EDS===
JEOL 7800F is a field-emission scanning electron microscope used for high-resolution imaging of surface morphology and compositional analysis.
<div class="mw-collapsible mw-collapsed" style="border:1px solid #b7e1c1; border-left:6px solid #2a9d5b; background:#f2fbf5; border-radius:6px; margin:0.45em 0 1.0em; padding:0.55em 0.75em 0.55em;">
<div class="mw-collapsible-toggle" style="text-align:right; margin:-0.62em 0 0.25em; line-height:1;">'''Expand'''</div>
<div class="mw-collapsible-content">
* SEM-EDS training is offered upon user request and is typically conducted on a one-on-one basis.
* Completion of the training usually requires 2-3 sessions, with each session lasting approximately 2-3 hours.
* Prior to attending the training sessions, users are expected to review and familiarize themselves with the SEM operating procedures ([[JEOL 7800F|JEOL JSM-7800F]]).
* Users are encouraged to shadow an authorized user on the instrument 2-3 times before starting formal training.
* In addition, having a suitable sample prepared in advance of the training is highly recommended.
* Where appropriate and subject to staff availability and project timelines, a staff member may also assist in carrying out user projects.
</div>
</div>

=== JEOL 7800F Prime SEM ===
JEOL 7800F Prime is a field-emission scanning electron microscope used for high-resolution imaging of surface morphology.
<div class="mw-collapsible mw-collapsed" style="border:1px solid #b7e1c1; border-left:6px solid #2a9d5b; background:#f2fbf5; border-radius:6px; margin:0.45em 0 1.0em; padding:0.55em 0.75em 0.55em;">
<div class="mw-collapsible-toggle" style="text-align:right; margin:-0.62em 0 0.25em; line-height:1;">'''Expand'''</div>
<div class="mw-collapsible-content">
* SEM training is offered upon user request and is typically conducted on a one-on-one basis.
* Completion of the training usually requires 2-3 sessions, with each session lasting approximately 2-3 hours.
* Prior to attending the training sessions, users are expected to review and familiarize themselves with the SEM operating procedures ([[JEOL 7800F|JEOL JSM-7800F]]).
* Users are encouraged to shadow an authorized user on the instrument 2-3 times before starting formal training.
* In addition, having a suitable sample prepared in advance of the training is highly recommended.
* Where appropriate and subject to staff availability and project timelines, a staff member may also assist in carrying out user projects.
</div>
</div>

=== Thermo Fisher Scientific Talos F200i S/TEM ===
Talos F200i is a versatile 200-kV field-emission (scanning) transmission electron microscope designed for high-throughput, high-resolution materials characterization.
<div class="mw-collapsible mw-collapsed" style="border:1px solid #b7e1c1; border-left:6px solid #2a9d5b; background:#f2fbf5; border-radius:6px; margin:0.45em 0 1.0em; padding:0.55em 0.75em 0.55em;">
<div class="mw-collapsible-toggle" style="text-align:right; margin:-0.62em 0 0.25em; line-height:1;">'''Expand'''</div>
<div class="mw-collapsible-content">
* This instrument is classified as a high-level tool, and training is selective.
* Users are required to have prior experience with TEM/STEM before being considered for training.
* Cleanroom staff reserves the right to decline a training request if the prerequisite requirements are not met.
* Where appropriate and subject to staff availability and project timelines, a staff member may also assist in carrying out user projects.
</div>
</div>

=== Raith e-Line ===
Bring a prepared design package for sessions 1 and 2, including alignment and overlay test patterns.
<div class="mw-collapsible mw-collapsed" style="border:1px solid #b7e1c1; border-left:6px solid #2a9d5b; background:#f2fbf5; border-radius:6px; margin:0.45em 0 1.0em; padding:0.55em 0.75em 0.55em;">
<div class="mw-collapsible-toggle" style="text-align:right; margin:-0.62em 0 0.25em; line-height:1;">'''Expand'''</div>
<div class="mw-collapsible-content">
* A design (gds, dxf, cif) for sessions 1 & 2 with:
** 4 alignment crosses (find out what marks work on the tool from your sub-group).
** Something to break the symmetry so you can tell chip orientation with your bare eye.
** A pattern that you will use to test overlay (alignment between two lithography steps). A Vernier pattern is commonly used. Feel free to test your ideas.
** Something creative, somethin fun :) This is an exercise in learning CAD as well.
* What is your project alias? If unsure, contact your supervisor first.
</div>
</div>

=== Woollam alpha-SE Ellipsometer ===
More information will be provided shortly.
<div class="mw-collapsible mw-collapsed" style="border:1px solid #b7e1c1; border-left:6px solid #2a9d5b; background:#f2fbf5; border-radius:6px; margin:0.45em 0 1.0em; padding:0.55em 0.75em 0.55em;">
<div class="mw-collapsible-toggle" style="text-align:right; margin:-0.62em 0 0.25em; line-height:1;">'''Expand'''</div>
<div class="mw-collapsible-content">
</div>
</div>

=== Filmetrics reflectometer ===
More information will be provided shortly.
<div class="mw-collapsible mw-collapsed" style="border:1px solid #b7e1c1; border-left:6px solid #2a9d5b; background:#f2fbf5; border-radius:6px; margin:0.45em 0 1.0em; padding:0.55em 0.75em 0.55em;">
<div class="mw-collapsible-toggle" style="text-align:right; margin:-0.62em 0 0.25em; line-height:1;">'''Expand'''</div>
<div class="mw-collapsible-content">
</div>
</div>

== Thin Film Deposition ==

=== Plassys Evaporator ===
A physical vapour deposition tool of aluminium via e-beam evaporation for Josephson junction fabrication.

Apply for training via the [https://forms.office.com/e/b3PDKjsZ88?origin=lprLink NBI-Cleanroom Training Request Form].
<div class="mw-collapsible mw-collapsed" style="border:1px solid #b7e1c1; border-left:6px solid #2a9d5b; background:#f2fbf5; border-radius:6px; margin:0.45em 0 1.0em; padding:0.55em 0.75em 0.55em;">
<div class="mw-collapsible-toggle" style="text-align:right; margin:-0.62em 0 0.25em; line-height:1;">'''Expand'''</div>
<div class="mw-collapsible-content">
====Confirmation====
Once you sign up via the form, the tool responsible will contact you for the following details:
* Confirm that you have a sample ready.
* Confirm that you have shadowed your colleagues using the tool 2-3 times.
* Specify process steps you want to run
*: Materials, thickness, tilt, milling, oxidation
* The name of the recipe.
==== Restrictions====
* Only Si and sapphire samples are allowed in the chamber.
==== Training ====
* You'll need 2 sessions to get trained on this tool.
** Session 1 (2 hr.) - teaches you how to load/unload the sample and how to run a recipe.
** Session 2 (2 hr.) - sign off session
'''The instructor has the right to ask for additional training sessions.'''
</div>
</div>

=== AJA1 and AJA2: metallization, sputtering or ion milling ===
Two nearly identical Orion physical vapour deposition (PVD) systems from AJA International for sputtering and e-beam evaporation, and substrate milling.

Apply for training via the [https://forms.office.com/e/b3PDKjsZ88?origin=lprLink NBI-Cleanroom Training Request Form].
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====Confirmation====
Once you sign up via the form, the tool responsible will contact you for the following details:
* Confirm that you have a sample ready.
* Confirm that you have shadowed your colleagues using the tool 2-3 times.
* Specify process steps you want to run
*: Materials, thickness, tilt, milling, oxidation
* Which tool do you want to use?
** '''AJA1'''
*** e-beam materials: Ti, Al, Au, SiOx, Pt, Ti, Ge
*** DC sputtering: Nb2Ti, Ti
*** DC Kaufman milling
*** Oxidation
*** Stage rotation, no stage cooling
** '''AJA2'''
*** e-beam materials: Ti, Al, Au, Cr, Pt, Pd
*** DC sputtering: Ti
*** RF sputtering: Ti, Nb2Ti
*** RF milling
*** Stage cooling, no stage rotation
* Specify the process steps you want to run.
*: Either the name of the recipe or all required process parameters.

===Before the training session===
* Watch the instruction video(s)
*Read the standard operating procedure on the [[AJA Systems|AJA Systems tool page]].

==== Training ====
* You'll need 2 sessions to get trained on this tool.
** Session 1 ( 2 hr.) - teaches you how to load/unload the sample and how to run a recipe.
** Session 2 ( 2 hr.) - sign off session
The instructor has the right to ask for additional training sessions.
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=== ALD1 and ALD2===
Two nearly identical Savannah S100-like systems are used for atomic layer deposition.

Apply for training via the [https://forms.office.com/e/b3PDKjsZ88?origin=lprLink NBI-Cleanroom Training Request Form].
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====Confirmation====
Once you sign up via the form, the tool responsible will contact you for the following details:
* Confirm that you have a sample ready.
* Confirm that you have shadowed your colleagues using the tool 2-3 times.
* Which tool do you want to use?
** '''ALD1''' available grown oxides: AlOx, HfOx, TiOx
** '''ALD2''' available grown oxides: AlOx, HfOx, ZrOx
** In ALD1, you are allowed to use resist for lift-off processes. In ALD2, '''you are not allowed to use a sample with resist on'''.
* Specify the process steps you want to run.
** Either the name of the recipe or all required process parameters.
====Before the training session====
* Watch the instruction video(s)
* Study the [[Atomic layer deposition|ALD principles]]
* Read the standard operating procedure on the [[Cambridge ALD|ALD tool page]].
====Training====
You'll need 2 sessions to get trained on this tool.
* Session 1 (30 mins) - teaches you how to load/unload the sample and how to run a recipe.
* Session 2 (30 mins) - sign off session
*: '''Note:''' An ALD session can have a long duration (often >12 hours). A usual training starts in the afternoon (load, setup, prepare recipe, run), and the film will grow throughout the evening. The next day, the user and the instructor will finish the training session (unloading).
'''The instructor has the right to ask for additional training sessions.'''
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== Packaging ==

=== F&S autobonder ===
A semi-automatic bonder to bond semiconductor substrates to PCB daughterboards from F&S Bondtec.

Apply for training via the [https://forms.office.com/e/b3PDKjsZ88?origin=lprLink NBI-Cleanroom Training Request Form].
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====Confirmation====
Once you sign up via the form, the tool responsible will contact you for the following details:
* Confirm that you have a '''chip''' ready for bonding.
* Confirm that you have shadowed your colleagues using the tool 2-3 times.
* You must know which '''daughterboard''' you will use for bonding (CPH, QBOARD1,2, QCAGE, Sydney, IC, custom).
* You must know what material you use to '''mount''' the chip to the daughterboard (mechanical clamping, silver paint, PMMA, other).
* Confirm that you have prepared a '''bonding schematic''' .
* By default, this bonder is using Al wire. You can request a special training if you want to use Au wire, but be aware it can be challenging.
*: Users are more likely to use the [[K&S bonder| K&S manual bonder]] for Au wire bonding.
* Specify the name of the recipe.
====Before the training session====
* Read the standard operating procedure on the [[FS bonder| FS bonder tool page]]
* Verify with one of your colleagues that your bonding schematic is correct.
==== Training ====
You'll need 2 sessions to get trained on this tool.
* Session 1 (2 hr.) - teaches you how to load/unload the sample and how to run a recipe.
* Session 2 (2 hr.) - sign off session
'''The instructor has the right to ask for additional training sessions.'''
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=== Manual bonder ===
Apply for sign-off via the [https://forms.office.com/e/b3PDKjsZ88?origin=lprLink NBI-Cleanroom Training Request Form].

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* Cleanroom doesn't train users in this tool.
* You need to get trained within your research group.
* Cleanroom will provide a sign-off session to ensure safety
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== Miscellaneous ==

=== Micromanipulator ===
Apply for sign-off via the [https://forms.office.com/e/b3PDKjsZ88?origin=lprLink NBI-Cleanroom Training Request Form].

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* Cleanroom doesn't train users in this tool.
* You need to get trained within your research group.
* Cleanroom will provide a sign-off session to ensure safety and verify that the user is aware of the dangers of working with nanoparticles.
==== Before you start your training sessions====
* You need to carefully read and familiarise yourself with the risks of exposure while [[Working with nanowires and nanotubes]]
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[[Category:Tools]]

Training

2026-06-29T14:28:08Z

Chenglee: /* JEOL 7800F SEM-EDS */

Before submitting a training request, please review the prerequisites for each instrument listed below.

'''Starting in July 2026, a standardized training request form will be introduced. The new system will allow users to request training for multiple instruments using a single form''' ([https://forms.office.com/e/b3PDKjsZ88?origin=lprLink NBI-Cleanroom Training Request Form]). '''Please only request training for instruments that require immediate access'''. Following submission of the request form, email communication will continue to be used for scheduling and coordinating training activities. The Cleanroom staff will acknowledge and respond to training requests within 1-2 working days.

Please note that access to the Cleanroom, tool laboratories and individual instruments can only be granted after the required safety instructions and instrument training have been completed and approved by the Cleanroom staff. Upon successful completion of the training, users will be granted booking privileges through [http://cleanroom.brickhost.com/ Cleanroom Booking System].

To ensure continued competency and safe operation, booking privileges and laboratory access may expire after a period of inactivity (typically '''90 days''') for a given instrument or Cleanroom usage. In such cases, users will be required to complete a refresher training session before access can be reinstated.

== Cleanroom General (Safety) Introduction ==
Before attending the training session, all users must read and familiarize themselves with the relevant safety information ([[Safety]]). ''Expand to view more information''.
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* The introductory session is scheduled from 09:15 to 15:00.
* Training sessions are conducted in group of 3-4 participants. Once a training date has been proposed by the Cleanroom staff, participants are required to confirm their attendance by email ([mailto:cleanroom@nbi.ku.dk cleanroom@nbi.ku.dk]).
* If fewer than 3 participants are available for a scheduled session, an alternative training date may be proposed. If a session reaches its maximum capacity of 4 participants, additional users will be placed on a waiting list and offered the next available training opportunity.
* Please identify a superuser from your research group who will serve as your mentor during your first few weeks of working in the Cleanroom.
* The designated mentor is responsible for guiding you through the standard procedures and best practices after the Cleanroom General Introduction.
* Once the mentor has determined that you are competent to work independently, they must notify the Cleanroom team via email.
* Full access to the Cleanroom laboratories will only be granted after the Cleanroom team has received this confirmation.
* Standard Training Program:
** 09:15-10:30: Cleanroom introduction
** Coffee break
** 10:45-12:00: Asher, spinners and optical microscopes
** Lunch break
** 13:00-14:00: Practical information
** 14:00-15:00: Q&A and account setup
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== Chemical Handling==

=== HF Safety Training ===
Before attending the training session, all users must read and familiarize themselves with the relevant safety information ([[Safety]]). ''Expand to view more information''.
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* The HF Safety introduction is offered on a monthly basis.
* Training sessions are conducted in groups of up to 4 participants.
* Once a training date has been proposed by the Cleanroom staff, participants must confirm their attendance by email.
* Users are required to complete the HF Handling Questionnaire (that you will receive from a Cleanroom staff) and submit it to the instructor during the training session.
* Each user must also designate an HF buddy. This person must be an authorized Cleanroom user with valid HF access and training.
* As HF handling involves significant safety risks, strict compliance to all safety requirements is mandatory.
* Users are expected to arrive fully prepared for the training session.
* The instructor reserves the right to suspend or terminate the training if a participant has not completed the required preparation or does not demonstrate an adequate understanding of the relevant safety procedures.
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== Lithography ==
'''Request Training for Lithography Tools via''' [https://forms.office.com/e/b3PDKjsZ88?origin=lprLink NBI-Cleanroom Training Request Form].

=== Elionix 7000 (100 kV) ===
Elionix 7000 training is for advanced users and requires prior cleanroom tool competency.
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==== Prerequisites ====
* You must be at least a Master student or signed up for a long term (>6 months) project to be allowed to use the tool.
* Elionix is a high level tool. Make sure you are already trained to:
** Enter the cleanroom
** Use the microscope, spinner, asher

==== Training ====
* You'll need 4 sessions to get trained on this tool.
** Session 1 ( 1 hr.) - teaches you how to load/unload the sample and how to condition the beam.
** Session 2 ( 3 hr.) - involves exposing alignment marks and test patterns (any design: preferably one half of the overlay ,so to understand alignment later ).
** Session 3 ( 3 hr.) - involves using the exposed alignment marks for marker registration and exposing the 2nd pattern (i.e. the 2nd half of the overlay pattern).
** Session 4 involves exposing a "real" pattern on a "real" chip on your own to gain access.

==== Preparation ====
Before any training slots are booked on the tool you'll need all of the following prepared:
* Shadow senior users on the tool 2-3 times.
* Chip (comfortable to handle) spin coated with resist. This chip will be used for sessions 1 & 2. Please be aware of the coating and baking parameters for the resist.
* Any test design is preferred which has marks, overlay patterns that you will use to test alignment precision between two lithography steps. A Vernier pattern is commonly used. Feel free to test your ideas. Make sure you have something for both ''x'' and ''y'' directions. If you don't know how to start, check the [[Design template for EBL]].
* Convert your design files into the Elionix exposure format .co7. This can be done using Beamer in 4th floor design computers.
* Make sure all write fields are entirely in the positive coordinate space.
* Make sure neither exposure will take longer than 60 minutes at 500 pA current and dose of 1000 uC/cm2.
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=== Elionix F-125 (125 kV at QuanTech) ===
More information will be provided shortly.
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=== Heidelberg upg501 ===
Prepare your design file and coated chip before requesting Heidelberg upg501 training.
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* Have a design file ready. GDS, DXF or CIF format works fine. Make sure you are familiar with the design before your actual session.
* Have a chip spin coated with an appropriate photoresist before the training session.
** The photoresist is sensitive to white light. Use the yellow filter on the microscopes. The light source in the both scribers is white and will already expose your resist.
* What is your project alias? If unsure, contact your supervisor first.

Before the training session:
* Watch the instruction video and read the standard operating procedure on the [[Heidelberg µPG 501|Heidelberg µPG 501 tool page]], shadow the tool with your group members, and ask for a sign-off session.
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== Characterization ==
'''Request Training for Characterization Tools via''' [https://forms.office.com/e/b3PDKjsZ88?origin=lprLink NBI-Cleanroom Training Request Form].

=== Bruker Dimension Icon AFM ===
Bruker Dimension Icon is an atomic force microscope used for high-resolution and accurate measurements of surface topography.
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* AFM training is offered upon user request and is typically conducted on a one-on-one basis. Completion of the training usually requires 2-3 sessions, with each session lasting approximately 2-3 hours.
* Prior to attending the training sessions, users are expected to review and familiarize themselves with the AFM operating procedures ([[Bruker Dimension Icon AFM|AFM]]). Users are encouraged to shadow an authorized user on the instrument 2-3 times before starting formal training. In addition, having a suitable sample prepared in advance of the training is highly recommended.
* Where appropriate and subject to staff availability and project timelines, a staff member may also assist in carrying out user projects.
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=== JEOL 7800F SEM-EDS===
JEOL 7800F is a field-emission scanning electron microscope used for high-resolution imaging of surface morphology and compositional analysis.
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* SEM-EDS training is offered upon user request and is typically conducted on a one-on-one basis.
* Completion of the training usually requires 2-3 sessions, with each session lasting approximately 2-3 hours.
* Prior to attending the training sessions, users are expected to review and familiarize themselves with the SEM operating procedures ([[JEOL 7800F|JEOL JSM-7800F]]).
* Users are encouraged to shadow an authorized user on the instrument 2-3 times before starting formal training.
* In addition, having a suitable sample prepared in advance of the training is highly recommended.
* Where appropriate and subject to staff availability and project timelines, a staff member may also assist in carrying out user projects.
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=== JEOL 7800F Prime SEM ===
JEOL 7800F Prime is a field-emission scanning electron microscope used for high-resolution imaging of surface morphology.
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* SEM training is offered upon user request and is typically conducted on a one-on-one basis.
* Completion of the training usually requires 2-3 sessions, with each session lasting approximately 2-3 hours.
* Prior to attending the training sessions, users are expected to review and familiarize themselves with the SEM operating procedures ([[JEOL 7800F|JEOL JSM-7800F]]).
* Users are encouraged to shadow an authorized user on the instrument 2-3 times before starting formal training.
* In addition, having a suitable sample prepared in advance of the training is highly recommended.
* Where appropriate and subject to staff availability and project timelines, a staff member may also assist in carrying out user projects.
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=== Thermo Fisher Scientific Talos F200i S/TEM ===
Talos F200i is a versatile 200-kV field-emission (scanning) transmission electron microscope designed for high-throughput, high-resolution materials characterization.
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* This instrument is classified as a high-level tool, and training is selective.
* Users are required to have prior experience with TEM/STEM before being considered for training.
* Cleanroom staff reserves the right to decline a training request if the prerequisite requirements are not met.
* Where appropriate and subject to staff availability and project timelines, a staff member may also assist in carrying out user projects.
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=== Raith e-Line ===
Bring a prepared design package for sessions 1 and 2, including alignment and overlay test patterns.
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* A design (gds, dxf, cif) for sessions 1 & 2 with:
** 4 alignment crosses (find out what marks work on the tool from your sub-group).
** Something to break the symmetry so you can tell chip orientation with your bare eye.
** A pattern that you will use to test overlay (alignment between two lithography steps). A Vernier pattern is commonly used. Feel free to test your ideas.
** Something creative, somethin fun :) This is an exercise in learning CAD as well.
* What is your project alias? If unsure, contact your supervisor first.
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=== Woollam alpha-SE Ellipsometer ===
More information will be provided shortly.
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=== Filmetrics reflectometer ===
More information will be provided shortly.
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== Thin Film Deposition ==

=== Plassys Evaporator ===
A physical vapour deposition tool of aluminium via e-beam evaporation for Josephson junction fabrication.

Apply for training via the [https://forms.office.com/e/b3PDKjsZ88?origin=lprLink NBI-Cleanroom Training Request Form].
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====Confirmation====
Once you sign up via the form, the tool responsible will contact you for the following details:
* Confirm that you have a sample ready.
* Confirm that you have shadowed your colleagues using the tool 2-3 times.
* Specify process steps you want to run
*: Materials, thickness, tilt, milling, oxidation
* The name of the recipe.
==== Restrictions====
* Only Si and sapphire samples are allowed in the chamber.
==== Training ====
* You'll need 2 sessions to get trained on this tool.
** Session 1 (2 hr.) - teaches you how to load/unload the sample and how to run a recipe.
** Session 2 (2 hr.) - sign off session
'''The instructor has the right to ask for additional training sessions.'''
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=== AJA1 and AJA2: metallization, sputtering or ion milling ===
Two nearly identical Orion physical vapour deposition (PVD) systems from AJA International for sputtering and e-beam evaporation, and substrate milling.

Apply for training via the [https://forms.office.com/e/b3PDKjsZ88?origin=lprLink NBI-Cleanroom Training Request Form].
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====Confirmation====
Once you sign up via the form, the tool responsible will contact you for the following details:
* Confirm that you have a sample ready.
* Confirm that you have shadowed your colleagues using the tool 2-3 times.
* Specify process steps you want to run
*: Materials, thickness, tilt, milling, oxidation
* Which tool do you want to use?
** '''AJA1'''
*** e-beam materials: Ti, Al, Au, SiOx, Pt, Ti, Ge
*** DC sputtering: Nb2Ti, Ti
*** DC Kaufman milling
*** Oxidation
*** Stage rotation, no stage cooling
** '''AJA2'''
*** e-beam materials: Ti, Al, Au, Cr, Pt, Pd
*** DC sputtering: Ti
*** RF sputtering: Ti, Nb2Ti
*** RF milling
*** Stage cooling, no stage rotation
* Specify the process steps you want to run.
*: Either the name of the recipe or all required process parameters.

===Before the training session===
* Watch the instruction video(s)
*Read the standard operating procedure on the [[AJA Systems|AJA Systems tool page]].

==== Training ====
* You'll need 2 sessions to get trained on this tool.
** Session 1 ( 2 hr.) - teaches you how to load/unload the sample and how to run a recipe.
** Session 2 ( 2 hr.) - sign off session
The instructor has the right to ask for additional training sessions.
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=== ALD1 and ALD2===
Two nearly identical Savannah S100-like systems are used for atomic layer deposition.

Apply for training via the [https://forms.office.com/e/b3PDKjsZ88?origin=lprLink NBI-Cleanroom Training Request Form].
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====Confirmation====
Once you sign up via the form, the tool responsible will contact you for the following details:
* Confirm that you have a sample ready.
* Confirm that you have shadowed your colleagues using the tool 2-3 times.
* Which tool do you want to use?
** '''ALD1''' available grown oxides: AlOx, HfOx, TiOx
** '''ALD2''' available grown oxides: AlOx, HfOx, ZrOx
** In ALD1, you are allowed to use resist for lift-off processes. In ALD2, '''you are not allowed to use a sample with resist on'''.
* Specify the process steps you want to run.
** Either the name of the recipe or all required process parameters.
====Before the training session====
* Watch the instruction video(s)
* Study the [[Atomic layer deposition|ALD principles]]
* Read the standard operating procedure on the [[Cambridge ALD|ALD tool page]].
====Training====
You'll need 2 sessions to get trained on this tool.
* Session 1 (30 mins) - teaches you how to load/unload the sample and how to run a recipe.
* Session 2 (30 mins) - sign off session
*: '''Note:''' An ALD session can have a long duration (often >12 hours). A usual training starts in the afternoon (load, setup, prepare recipe, run), and the film will grow throughout the evening. The next day, the user and the instructor will finish the training session (unloading).
'''The instructor has the right to ask for additional training sessions.'''
</div>
</div>

== Packaging ==

=== F&S autobonder ===
A semi-automatic bonder to bond semiconductor substrates to PCB daughterboards from F&S Bondtec.

Apply for training via the [https://forms.office.com/e/b3PDKjsZ88?origin=lprLink NBI-Cleanroom Training Request Form].
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====Confirmation====
Once you sign up via the form, the tool responsible will contact you for the following details:
* Confirm that you have a '''chip''' ready for bonding.
* Confirm that you have shadowed your colleagues using the tool 2-3 times.
* You must know which '''daughterboard''' you will use for bonding (CPH, QBOARD1,2, QCAGE, Sydney, IC, custom).
* You must know what material you use to '''mount''' the chip to the daughterboard (mechanical clamping, silver paint, PMMA, other).
* Confirm that you have prepared a '''bonding schematic''' .
* By default, this bonder is using Al wire. You can request a special training if you want to use Au wire, but be aware it can be challenging.
*: Users are more likely to use the [[K&S bonder| K&S manual bonder]] for Au wire bonding.
* Specify the name of the recipe.
====Before the training session====
* Read the standard operating procedure on the [[FS bonder| FS bonder tool page]]
* Verify with one of your colleagues that your bonding schematic is correct.
==== Training ====
You'll need 2 sessions to get trained on this tool.
* Session 1 (2 hr.) - teaches you how to load/unload the sample and how to run a recipe.
* Session 2 (2 hr.) - sign off session
'''The instructor has the right to ask for additional training sessions.'''
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</div>

=== Manual bonder ===
Apply for sign-off via the [https://forms.office.com/e/b3PDKjsZ88?origin=lprLink NBI-Cleanroom Training Request Form].

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* Cleanroom doesn't train users in this tool.
* You need to get trained within your research group.
* Cleanroom will provide a sign-off session to ensure safety
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</div>

== Miscellaneous ==

=== Micromanipulator ===
Apply for sign-off via the [https://forms.office.com/e/b3PDKjsZ88?origin=lprLink NBI-Cleanroom Training Request Form].

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* Cleanroom doesn't train users in this tool.
* You need to get trained within your research group.
* Cleanroom will provide a sign-off session to ensure safety and verify that the user is aware of the dangers of working with nanoparticles.
==== Before you start your training sessions====
* You need to carefully read and familiarise yourself with the risks of exposure while [[Working with nanowires and nanotubes]]
</div>
</div>

[[Category:Tools]]

Training

2026-06-29T14:27:38Z

Chenglee: /* JEOL 7800F Prime SEM */

Before submitting a training request, please review the prerequisites for each instrument listed below.

'''Starting in July 2026, a standardized training request form will be introduced. The new system will allow users to request training for multiple instruments using a single form''' ([https://forms.office.com/e/b3PDKjsZ88?origin=lprLink NBI-Cleanroom Training Request Form]). '''Please only request training for instruments that require immediate access'''. Following submission of the request form, email communication will continue to be used for scheduling and coordinating training activities. The Cleanroom staff will acknowledge and respond to training requests within 1-2 working days.

Please note that access to the Cleanroom, tool laboratories and individual instruments can only be granted after the required safety instructions and instrument training have been completed and approved by the Cleanroom staff. Upon successful completion of the training, users will be granted booking privileges through [http://cleanroom.brickhost.com/ Cleanroom Booking System].

To ensure continued competency and safe operation, booking privileges and laboratory access may expire after a period of inactivity (typically '''90 days''') for a given instrument or Cleanroom usage. In such cases, users will be required to complete a refresher training session before access can be reinstated.

== Cleanroom General (Safety) Introduction ==
Before attending the training session, all users must read and familiarize themselves with the relevant safety information ([[Safety]]). ''Expand to view more information''.
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* The introductory session is scheduled from 09:15 to 15:00.
* Training sessions are conducted in group of 3-4 participants. Once a training date has been proposed by the Cleanroom staff, participants are required to confirm their attendance by email ([mailto:cleanroom@nbi.ku.dk cleanroom@nbi.ku.dk]).
* If fewer than 3 participants are available for a scheduled session, an alternative training date may be proposed. If a session reaches its maximum capacity of 4 participants, additional users will be placed on a waiting list and offered the next available training opportunity.
* Please identify a superuser from your research group who will serve as your mentor during your first few weeks of working in the Cleanroom.
* The designated mentor is responsible for guiding you through the standard procedures and best practices after the Cleanroom General Introduction.
* Once the mentor has determined that you are competent to work independently, they must notify the Cleanroom team via email.
* Full access to the Cleanroom laboratories will only be granted after the Cleanroom team has received this confirmation.
* Standard Training Program:
** 09:15-10:30: Cleanroom introduction
** Coffee break
** 10:45-12:00: Asher, spinners and optical microscopes
** Lunch break
** 13:00-14:00: Practical information
** 14:00-15:00: Q&A and account setup
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</div>

== Chemical Handling==

=== HF Safety Training ===
Before attending the training session, all users must read and familiarize themselves with the relevant safety information ([[Safety]]). ''Expand to view more information''.
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* The HF Safety introduction is offered on a monthly basis.
* Training sessions are conducted in groups of up to 4 participants.
* Once a training date has been proposed by the Cleanroom staff, participants must confirm their attendance by email.
* Users are required to complete the HF Handling Questionnaire (that you will receive from a Cleanroom staff) and submit it to the instructor during the training session.
* Each user must also designate an HF buddy. This person must be an authorized Cleanroom user with valid HF access and training.
* As HF handling involves significant safety risks, strict compliance to all safety requirements is mandatory.
* Users are expected to arrive fully prepared for the training session.
* The instructor reserves the right to suspend or terminate the training if a participant has not completed the required preparation or does not demonstrate an adequate understanding of the relevant safety procedures.
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== Lithography ==
'''Request Training for Lithography Tools via''' [https://forms.office.com/e/b3PDKjsZ88?origin=lprLink NBI-Cleanroom Training Request Form].

=== Elionix 7000 (100 kV) ===
Elionix 7000 training is for advanced users and requires prior cleanroom tool competency.
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==== Prerequisites ====
* You must be at least a Master student or signed up for a long term (>6 months) project to be allowed to use the tool.
* Elionix is a high level tool. Make sure you are already trained to:
** Enter the cleanroom
** Use the microscope, spinner, asher

==== Training ====
* You'll need 4 sessions to get trained on this tool.
** Session 1 ( 1 hr.) - teaches you how to load/unload the sample and how to condition the beam.
** Session 2 ( 3 hr.) - involves exposing alignment marks and test patterns (any design: preferably one half of the overlay ,so to understand alignment later ).
** Session 3 ( 3 hr.) - involves using the exposed alignment marks for marker registration and exposing the 2nd pattern (i.e. the 2nd half of the overlay pattern).
** Session 4 involves exposing a "real" pattern on a "real" chip on your own to gain access.

==== Preparation ====
Before any training slots are booked on the tool you'll need all of the following prepared:
* Shadow senior users on the tool 2-3 times.
* Chip (comfortable to handle) spin coated with resist. This chip will be used for sessions 1 & 2. Please be aware of the coating and baking parameters for the resist.
* Any test design is preferred which has marks, overlay patterns that you will use to test alignment precision between two lithography steps. A Vernier pattern is commonly used. Feel free to test your ideas. Make sure you have something for both ''x'' and ''y'' directions. If you don't know how to start, check the [[Design template for EBL]].
* Convert your design files into the Elionix exposure format .co7. This can be done using Beamer in 4th floor design computers.
* Make sure all write fields are entirely in the positive coordinate space.
* Make sure neither exposure will take longer than 60 minutes at 500 pA current and dose of 1000 uC/cm2.
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=== Elionix F-125 (125 kV at QuanTech) ===
More information will be provided shortly.
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=== Heidelberg upg501 ===
Prepare your design file and coated chip before requesting Heidelberg upg501 training.
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* Have a design file ready. GDS, DXF or CIF format works fine. Make sure you are familiar with the design before your actual session.
* Have a chip spin coated with an appropriate photoresist before the training session.
** The photoresist is sensitive to white light. Use the yellow filter on the microscopes. The light source in the both scribers is white and will already expose your resist.
* What is your project alias? If unsure, contact your supervisor first.

Before the training session:
* Watch the instruction video and read the standard operating procedure on the [[Heidelberg µPG 501|Heidelberg µPG 501 tool page]], shadow the tool with your group members, and ask for a sign-off session.
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== Characterization ==
'''Request Training for Characterization Tools via''' [https://forms.office.com/e/b3PDKjsZ88?origin=lprLink NBI-Cleanroom Training Request Form].

=== Bruker Dimension Icon AFM ===
Bruker Dimension Icon is an atomic force microscope used for high-resolution and accurate measurements of surface topography.
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* AFM training is offered upon user request and is typically conducted on a one-on-one basis. Completion of the training usually requires 2-3 sessions, with each session lasting approximately 2-3 hours.
* Prior to attending the training sessions, users are expected to review and familiarize themselves with the AFM operating procedures ([[Bruker Dimension Icon AFM|AFM]]). Users are encouraged to shadow an authorized user on the instrument 2-3 times before starting formal training. In addition, having a suitable sample prepared in advance of the training is highly recommended.
* Where appropriate and subject to staff availability and project timelines, a staff member may also assist in carrying out user projects.
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=== JEOL 7800F SEM-EDS===
JEOL 7800F is a field-emission scanning electron microscope used for high-resolution imaging of surface morphology and compositional analysis.
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* SEM-EDS training is offered upon user request and is typically conducted on a one-on-one basis. Completion of the training usually requires 2-3 sessions, with each session lasting approximately 2-3 hours.
* Prior to attending the training sessions, users are expected to review and familiarize themselves with the SEM operating procedures ([[JEOL 7800F|JEOL JSM-7800F]]). Users are encouraged to shadow an authorized user on the instrument 2-3 times before starting formal training. In addition, having a suitable sample prepared in advance of the training is highly recommended.
* Where appropriate and subject to staff availability and project timelines, a staff member may also assist in carrying out user projects.
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=== JEOL 7800F Prime SEM ===
JEOL 7800F Prime is a field-emission scanning electron microscope used for high-resolution imaging of surface morphology.
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* SEM training is offered upon user request and is typically conducted on a one-on-one basis.
* Completion of the training usually requires 2-3 sessions, with each session lasting approximately 2-3 hours.
* Prior to attending the training sessions, users are expected to review and familiarize themselves with the SEM operating procedures ([[JEOL 7800F|JEOL JSM-7800F]]).
* Users are encouraged to shadow an authorized user on the instrument 2-3 times before starting formal training.
* In addition, having a suitable sample prepared in advance of the training is highly recommended.
* Where appropriate and subject to staff availability and project timelines, a staff member may also assist in carrying out user projects.
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=== Thermo Fisher Scientific Talos F200i S/TEM ===
Talos F200i is a versatile 200-kV field-emission (scanning) transmission electron microscope designed for high-throughput, high-resolution materials characterization.
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* This instrument is classified as a high-level tool, and training is selective.
* Users are required to have prior experience with TEM/STEM before being considered for training.
* Cleanroom staff reserves the right to decline a training request if the prerequisite requirements are not met.
* Where appropriate and subject to staff availability and project timelines, a staff member may also assist in carrying out user projects.
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=== Raith e-Line ===
Bring a prepared design package for sessions 1 and 2, including alignment and overlay test patterns.
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* A design (gds, dxf, cif) for sessions 1 & 2 with:
** 4 alignment crosses (find out what marks work on the tool from your sub-group).
** Something to break the symmetry so you can tell chip orientation with your bare eye.
** A pattern that you will use to test overlay (alignment between two lithography steps). A Vernier pattern is commonly used. Feel free to test your ideas.
** Something creative, somethin fun :) This is an exercise in learning CAD as well.
* What is your project alias? If unsure, contact your supervisor first.
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=== Woollam alpha-SE Ellipsometer ===
More information will be provided shortly.
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=== Filmetrics reflectometer ===
More information will be provided shortly.
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== Thin Film Deposition ==

=== Plassys Evaporator ===
A physical vapour deposition tool of aluminium via e-beam evaporation for Josephson junction fabrication.

Apply for training via the [https://forms.office.com/e/b3PDKjsZ88?origin=lprLink NBI-Cleanroom Training Request Form].
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====Confirmation====
Once you sign up via the form, the tool responsible will contact you for the following details:
* Confirm that you have a sample ready.
* Confirm that you have shadowed your colleagues using the tool 2-3 times.
* Specify process steps you want to run
*: Materials, thickness, tilt, milling, oxidation
* The name of the recipe.
==== Restrictions====
* Only Si and sapphire samples are allowed in the chamber.
==== Training ====
* You'll need 2 sessions to get trained on this tool.
** Session 1 (2 hr.) - teaches you how to load/unload the sample and how to run a recipe.
** Session 2 (2 hr.) - sign off session
'''The instructor has the right to ask for additional training sessions.'''
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=== AJA1 and AJA2: metallization, sputtering or ion milling ===
Two nearly identical Orion physical vapour deposition (PVD) systems from AJA International for sputtering and e-beam evaporation, and substrate milling.

Apply for training via the [https://forms.office.com/e/b3PDKjsZ88?origin=lprLink NBI-Cleanroom Training Request Form].
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====Confirmation====
Once you sign up via the form, the tool responsible will contact you for the following details:
* Confirm that you have a sample ready.
* Confirm that you have shadowed your colleagues using the tool 2-3 times.
* Specify process steps you want to run
*: Materials, thickness, tilt, milling, oxidation
* Which tool do you want to use?
** '''AJA1'''
*** e-beam materials: Ti, Al, Au, SiOx, Pt, Ti, Ge
*** DC sputtering: Nb2Ti, Ti
*** DC Kaufman milling
*** Oxidation
*** Stage rotation, no stage cooling
** '''AJA2'''
*** e-beam materials: Ti, Al, Au, Cr, Pt, Pd
*** DC sputtering: Ti
*** RF sputtering: Ti, Nb2Ti
*** RF milling
*** Stage cooling, no stage rotation
* Specify the process steps you want to run.
*: Either the name of the recipe or all required process parameters.

===Before the training session===
* Watch the instruction video(s)
*Read the standard operating procedure on the [[AJA Systems|AJA Systems tool page]].

==== Training ====
* You'll need 2 sessions to get trained on this tool.
** Session 1 ( 2 hr.) - teaches you how to load/unload the sample and how to run a recipe.
** Session 2 ( 2 hr.) - sign off session
The instructor has the right to ask for additional training sessions.
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=== ALD1 and ALD2===
Two nearly identical Savannah S100-like systems are used for atomic layer deposition.

Apply for training via the [https://forms.office.com/e/b3PDKjsZ88?origin=lprLink NBI-Cleanroom Training Request Form].
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====Confirmation====
Once you sign up via the form, the tool responsible will contact you for the following details:
* Confirm that you have a sample ready.
* Confirm that you have shadowed your colleagues using the tool 2-3 times.
* Which tool do you want to use?
** '''ALD1''' available grown oxides: AlOx, HfOx, TiOx
** '''ALD2''' available grown oxides: AlOx, HfOx, ZrOx
** In ALD1, you are allowed to use resist for lift-off processes. In ALD2, '''you are not allowed to use a sample with resist on'''.
* Specify the process steps you want to run.
** Either the name of the recipe or all required process parameters.
====Before the training session====
* Watch the instruction video(s)
* Study the [[Atomic layer deposition|ALD principles]]
* Read the standard operating procedure on the [[Cambridge ALD|ALD tool page]].
====Training====
You'll need 2 sessions to get trained on this tool.
* Session 1 (30 mins) - teaches you how to load/unload the sample and how to run a recipe.
* Session 2 (30 mins) - sign off session
*: '''Note:''' An ALD session can have a long duration (often >12 hours). A usual training starts in the afternoon (load, setup, prepare recipe, run), and the film will grow throughout the evening. The next day, the user and the instructor will finish the training session (unloading).
'''The instructor has the right to ask for additional training sessions.'''
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== Packaging ==

=== F&S autobonder ===
A semi-automatic bonder to bond semiconductor substrates to PCB daughterboards from F&S Bondtec.

Apply for training via the [https://forms.office.com/e/b3PDKjsZ88?origin=lprLink NBI-Cleanroom Training Request Form].
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====Confirmation====
Once you sign up via the form, the tool responsible will contact you for the following details:
* Confirm that you have a '''chip''' ready for bonding.
* Confirm that you have shadowed your colleagues using the tool 2-3 times.
* You must know which '''daughterboard''' you will use for bonding (CPH, QBOARD1,2, QCAGE, Sydney, IC, custom).
* You must know what material you use to '''mount''' the chip to the daughterboard (mechanical clamping, silver paint, PMMA, other).
* Confirm that you have prepared a '''bonding schematic''' .
* By default, this bonder is using Al wire. You can request a special training if you want to use Au wire, but be aware it can be challenging.
*: Users are more likely to use the [[K&S bonder| K&S manual bonder]] for Au wire bonding.
* Specify the name of the recipe.
====Before the training session====
* Read the standard operating procedure on the [[FS bonder| FS bonder tool page]]
* Verify with one of your colleagues that your bonding schematic is correct.
==== Training ====
You'll need 2 sessions to get trained on this tool.
* Session 1 (2 hr.) - teaches you how to load/unload the sample and how to run a recipe.
* Session 2 (2 hr.) - sign off session
'''The instructor has the right to ask for additional training sessions.'''
</div>
</div>

=== Manual bonder ===
Apply for sign-off via the [https://forms.office.com/e/b3PDKjsZ88?origin=lprLink NBI-Cleanroom Training Request Form].

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* Cleanroom doesn't train users in this tool.
* You need to get trained within your research group.
* Cleanroom will provide a sign-off session to ensure safety
</div>
</div>

== Miscellaneous ==

=== Micromanipulator ===
Apply for sign-off via the [https://forms.office.com/e/b3PDKjsZ88?origin=lprLink NBI-Cleanroom Training Request Form].

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* Cleanroom doesn't train users in this tool.
* You need to get trained within your research group.
* Cleanroom will provide a sign-off session to ensure safety and verify that the user is aware of the dangers of working with nanoparticles.
==== Before you start your training sessions====
* You need to carefully read and familiarise yourself with the risks of exposure while [[Working with nanowires and nanotubes]]
</div>
</div>

[[Category:Tools]]

Training

2026-06-29T14:27:23Z

Chenglee: /* JEOL 7800F Prime SEM */

Before submitting a training request, please review the prerequisites for each instrument listed below.

'''Starting in July 2026, a standardized training request form will be introduced. The new system will allow users to request training for multiple instruments using a single form''' ([https://forms.office.com/e/b3PDKjsZ88?origin=lprLink NBI-Cleanroom Training Request Form]). '''Please only request training for instruments that require immediate access'''. Following submission of the request form, email communication will continue to be used for scheduling and coordinating training activities. The Cleanroom staff will acknowledge and respond to training requests within 1-2 working days.

Please note that access to the Cleanroom, tool laboratories and individual instruments can only be granted after the required safety instructions and instrument training have been completed and approved by the Cleanroom staff. Upon successful completion of the training, users will be granted booking privileges through [http://cleanroom.brickhost.com/ Cleanroom Booking System].

To ensure continued competency and safe operation, booking privileges and laboratory access may expire after a period of inactivity (typically '''90 days''') for a given instrument or Cleanroom usage. In such cases, users will be required to complete a refresher training session before access can be reinstated.

== Cleanroom General (Safety) Introduction ==
Before attending the training session, all users must read and familiarize themselves with the relevant safety information ([[Safety]]). ''Expand to view more information''.
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* The introductory session is scheduled from 09:15 to 15:00.
* Training sessions are conducted in group of 3-4 participants. Once a training date has been proposed by the Cleanroom staff, participants are required to confirm their attendance by email ([mailto:cleanroom@nbi.ku.dk cleanroom@nbi.ku.dk]).
* If fewer than 3 participants are available for a scheduled session, an alternative training date may be proposed. If a session reaches its maximum capacity of 4 participants, additional users will be placed on a waiting list and offered the next available training opportunity.
* Please identify a superuser from your research group who will serve as your mentor during your first few weeks of working in the Cleanroom.
* The designated mentor is responsible for guiding you through the standard procedures and best practices after the Cleanroom General Introduction.
* Once the mentor has determined that you are competent to work independently, they must notify the Cleanroom team via email.
* Full access to the Cleanroom laboratories will only be granted after the Cleanroom team has received this confirmation.
* Standard Training Program:
** 09:15-10:30: Cleanroom introduction
** Coffee break
** 10:45-12:00: Asher, spinners and optical microscopes
** Lunch break
** 13:00-14:00: Practical information
** 14:00-15:00: Q&A and account setup
</div>
</div>

== Chemical Handling==

=== HF Safety Training ===
Before attending the training session, all users must read and familiarize themselves with the relevant safety information ([[Safety]]). ''Expand to view more information''.
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* The HF Safety introduction is offered on a monthly basis.
* Training sessions are conducted in groups of up to 4 participants.
* Once a training date has been proposed by the Cleanroom staff, participants must confirm their attendance by email.
* Users are required to complete the HF Handling Questionnaire (that you will receive from a Cleanroom staff) and submit it to the instructor during the training session.
* Each user must also designate an HF buddy. This person must be an authorized Cleanroom user with valid HF access and training.
* As HF handling involves significant safety risks, strict compliance to all safety requirements is mandatory.
* Users are expected to arrive fully prepared for the training session.
* The instructor reserves the right to suspend or terminate the training if a participant has not completed the required preparation or does not demonstrate an adequate understanding of the relevant safety procedures.
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</div>

== Lithography ==
'''Request Training for Lithography Tools via''' [https://forms.office.com/e/b3PDKjsZ88?origin=lprLink NBI-Cleanroom Training Request Form].

=== Elionix 7000 (100 kV) ===
Elionix 7000 training is for advanced users and requires prior cleanroom tool competency.
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==== Prerequisites ====
* You must be at least a Master student or signed up for a long term (>6 months) project to be allowed to use the tool.
* Elionix is a high level tool. Make sure you are already trained to:
** Enter the cleanroom
** Use the microscope, spinner, asher

==== Training ====
* You'll need 4 sessions to get trained on this tool.
** Session 1 ( 1 hr.) - teaches you how to load/unload the sample and how to condition the beam.
** Session 2 ( 3 hr.) - involves exposing alignment marks and test patterns (any design: preferably one half of the overlay ,so to understand alignment later ).
** Session 3 ( 3 hr.) - involves using the exposed alignment marks for marker registration and exposing the 2nd pattern (i.e. the 2nd half of the overlay pattern).
** Session 4 involves exposing a "real" pattern on a "real" chip on your own to gain access.

==== Preparation ====
Before any training slots are booked on the tool you'll need all of the following prepared:
* Shadow senior users on the tool 2-3 times.
* Chip (comfortable to handle) spin coated with resist. This chip will be used for sessions 1 & 2. Please be aware of the coating and baking parameters for the resist.
* Any test design is preferred which has marks, overlay patterns that you will use to test alignment precision between two lithography steps. A Vernier pattern is commonly used. Feel free to test your ideas. Make sure you have something for both ''x'' and ''y'' directions. If you don't know how to start, check the [[Design template for EBL]].
* Convert your design files into the Elionix exposure format .co7. This can be done using Beamer in 4th floor design computers.
* Make sure all write fields are entirely in the positive coordinate space.
* Make sure neither exposure will take longer than 60 minutes at 500 pA current and dose of 1000 uC/cm2.
</div>
</div>

=== Elionix F-125 (125 kV at QuanTech) ===
More information will be provided shortly.
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=== Heidelberg upg501 ===
Prepare your design file and coated chip before requesting Heidelberg upg501 training.
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* Have a design file ready. GDS, DXF or CIF format works fine. Make sure you are familiar with the design before your actual session.
* Have a chip spin coated with an appropriate photoresist before the training session.
** The photoresist is sensitive to white light. Use the yellow filter on the microscopes. The light source in the both scribers is white and will already expose your resist.
* What is your project alias? If unsure, contact your supervisor first.

Before the training session:
* Watch the instruction video and read the standard operating procedure on the [[Heidelberg µPG 501|Heidelberg µPG 501 tool page]], shadow the tool with your group members, and ask for a sign-off session.
</div>
</div>

== Characterization ==
'''Request Training for Characterization Tools via''' [https://forms.office.com/e/b3PDKjsZ88?origin=lprLink NBI-Cleanroom Training Request Form].

=== Bruker Dimension Icon AFM ===
Bruker Dimension Icon is an atomic force microscope used for high-resolution and accurate measurements of surface topography.
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* AFM training is offered upon user request and is typically conducted on a one-on-one basis. Completion of the training usually requires 2-3 sessions, with each session lasting approximately 2-3 hours.
* Prior to attending the training sessions, users are expected to review and familiarize themselves with the AFM operating procedures ([[Bruker Dimension Icon AFM|AFM]]). Users are encouraged to shadow an authorized user on the instrument 2-3 times before starting formal training. In addition, having a suitable sample prepared in advance of the training is highly recommended.
* Where appropriate and subject to staff availability and project timelines, a staff member may also assist in carrying out user projects.
</div>
</div>

=== JEOL 7800F SEM-EDS===
JEOL 7800F is a field-emission scanning electron microscope used for high-resolution imaging of surface morphology and compositional analysis.
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* SEM-EDS training is offered upon user request and is typically conducted on a one-on-one basis. Completion of the training usually requires 2-3 sessions, with each session lasting approximately 2-3 hours.
* Prior to attending the training sessions, users are expected to review and familiarize themselves with the SEM operating procedures ([[JEOL 7800F|JEOL JSM-7800F]]). Users are encouraged to shadow an authorized user on the instrument 2-3 times before starting formal training. In addition, having a suitable sample prepared in advance of the training is highly recommended.
* Where appropriate and subject to staff availability and project timelines, a staff member may also assist in carrying out user projects.
</div>
</div>

=== JEOL 7800F Prime SEM ===
JEOL 7800F Prime is a field-emission scanning electron microscope used for high-resolution imaging of surface morphology.
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* SEM training is offered upon user request and is typically conducted on a one-on-one basis. Completion of the training usually requires 2-3 sessions, with each session lasting approximately 2-3 hours.
* Prior to attending the training sessions, users are expected to review and familiarize themselves with the SEM operating procedures ([[JEOL 7800F|JEOL JSM-7800F]]).
* Users are encouraged to shadow an authorized user on the instrument 2-3 times before starting formal training.
* In addition, having a suitable sample prepared in advance of the training is highly recommended.
* Where appropriate and subject to staff availability and project timelines, a staff member may also assist in carrying out user projects.
</div>
</div>

=== Thermo Fisher Scientific Talos F200i S/TEM ===
Talos F200i is a versatile 200-kV field-emission (scanning) transmission electron microscope designed for high-throughput, high-resolution materials characterization.
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* This instrument is classified as a high-level tool, and training is selective.
* Users are required to have prior experience with TEM/STEM before being considered for training.
* Cleanroom staff reserves the right to decline a training request if the prerequisite requirements are not met.
* Where appropriate and subject to staff availability and project timelines, a staff member may also assist in carrying out user projects.
</div>
</div>

=== Raith e-Line ===
Bring a prepared design package for sessions 1 and 2, including alignment and overlay test patterns.
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* A design (gds, dxf, cif) for sessions 1 & 2 with:
** 4 alignment crosses (find out what marks work on the tool from your sub-group).
** Something to break the symmetry so you can tell chip orientation with your bare eye.
** A pattern that you will use to test overlay (alignment between two lithography steps). A Vernier pattern is commonly used. Feel free to test your ideas.
** Something creative, somethin fun :) This is an exercise in learning CAD as well.
* What is your project alias? If unsure, contact your supervisor first.
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</div>

=== Woollam alpha-SE Ellipsometer ===
More information will be provided shortly.
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=== Filmetrics reflectometer ===
More information will be provided shortly.
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== Thin Film Deposition ==

=== Plassys Evaporator ===
A physical vapour deposition tool of aluminium via e-beam evaporation for Josephson junction fabrication.

Apply for training via the [https://forms.office.com/e/b3PDKjsZ88?origin=lprLink NBI-Cleanroom Training Request Form].
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====Confirmation====
Once you sign up via the form, the tool responsible will contact you for the following details:
* Confirm that you have a sample ready.
* Confirm that you have shadowed your colleagues using the tool 2-3 times.
* Specify process steps you want to run
*: Materials, thickness, tilt, milling, oxidation
* The name of the recipe.
==== Restrictions====
* Only Si and sapphire samples are allowed in the chamber.
==== Training ====
* You'll need 2 sessions to get trained on this tool.
** Session 1 (2 hr.) - teaches you how to load/unload the sample and how to run a recipe.
** Session 2 (2 hr.) - sign off session
'''The instructor has the right to ask for additional training sessions.'''
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</div>

=== AJA1 and AJA2: metallization, sputtering or ion milling ===
Two nearly identical Orion physical vapour deposition (PVD) systems from AJA International for sputtering and e-beam evaporation, and substrate milling.

Apply for training via the [https://forms.office.com/e/b3PDKjsZ88?origin=lprLink NBI-Cleanroom Training Request Form].
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====Confirmation====
Once you sign up via the form, the tool responsible will contact you for the following details:
* Confirm that you have a sample ready.
* Confirm that you have shadowed your colleagues using the tool 2-3 times.
* Specify process steps you want to run
*: Materials, thickness, tilt, milling, oxidation
* Which tool do you want to use?
** '''AJA1'''
*** e-beam materials: Ti, Al, Au, SiOx, Pt, Ti, Ge
*** DC sputtering: Nb2Ti, Ti
*** DC Kaufman milling
*** Oxidation
*** Stage rotation, no stage cooling
** '''AJA2'''
*** e-beam materials: Ti, Al, Au, Cr, Pt, Pd
*** DC sputtering: Ti
*** RF sputtering: Ti, Nb2Ti
*** RF milling
*** Stage cooling, no stage rotation
* Specify the process steps you want to run.
*: Either the name of the recipe or all required process parameters.

===Before the training session===
* Watch the instruction video(s)
*Read the standard operating procedure on the [[AJA Systems|AJA Systems tool page]].

==== Training ====
* You'll need 2 sessions to get trained on this tool.
** Session 1 ( 2 hr.) - teaches you how to load/unload the sample and how to run a recipe.
** Session 2 ( 2 hr.) - sign off session
The instructor has the right to ask for additional training sessions.
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</div>

=== ALD1 and ALD2===
Two nearly identical Savannah S100-like systems are used for atomic layer deposition.

Apply for training via the [https://forms.office.com/e/b3PDKjsZ88?origin=lprLink NBI-Cleanroom Training Request Form].
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====Confirmation====
Once you sign up via the form, the tool responsible will contact you for the following details:
* Confirm that you have a sample ready.
* Confirm that you have shadowed your colleagues using the tool 2-3 times.
* Which tool do you want to use?
** '''ALD1''' available grown oxides: AlOx, HfOx, TiOx
** '''ALD2''' available grown oxides: AlOx, HfOx, ZrOx
** In ALD1, you are allowed to use resist for lift-off processes. In ALD2, '''you are not allowed to use a sample with resist on'''.
* Specify the process steps you want to run.
** Either the name of the recipe or all required process parameters.
====Before the training session====
* Watch the instruction video(s)
* Study the [[Atomic layer deposition|ALD principles]]
* Read the standard operating procedure on the [[Cambridge ALD|ALD tool page]].
====Training====
You'll need 2 sessions to get trained on this tool.
* Session 1 (30 mins) - teaches you how to load/unload the sample and how to run a recipe.
* Session 2 (30 mins) - sign off session
*: '''Note:''' An ALD session can have a long duration (often >12 hours). A usual training starts in the afternoon (load, setup, prepare recipe, run), and the film will grow throughout the evening. The next day, the user and the instructor will finish the training session (unloading).
'''The instructor has the right to ask for additional training sessions.'''
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== Packaging ==

=== F&S autobonder ===
A semi-automatic bonder to bond semiconductor substrates to PCB daughterboards from F&S Bondtec.

Apply for training via the [https://forms.office.com/e/b3PDKjsZ88?origin=lprLink NBI-Cleanroom Training Request Form].
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====Confirmation====
Once you sign up via the form, the tool responsible will contact you for the following details:
* Confirm that you have a '''chip''' ready for bonding.
* Confirm that you have shadowed your colleagues using the tool 2-3 times.
* You must know which '''daughterboard''' you will use for bonding (CPH, QBOARD1,2, QCAGE, Sydney, IC, custom).
* You must know what material you use to '''mount''' the chip to the daughterboard (mechanical clamping, silver paint, PMMA, other).
* Confirm that you have prepared a '''bonding schematic''' .
* By default, this bonder is using Al wire. You can request a special training if you want to use Au wire, but be aware it can be challenging.
*: Users are more likely to use the [[K&S bonder| K&S manual bonder]] for Au wire bonding.
* Specify the name of the recipe.
====Before the training session====
* Read the standard operating procedure on the [[FS bonder| FS bonder tool page]]
* Verify with one of your colleagues that your bonding schematic is correct.
==== Training ====
You'll need 2 sessions to get trained on this tool.
* Session 1 (2 hr.) - teaches you how to load/unload the sample and how to run a recipe.
* Session 2 (2 hr.) - sign off session
'''The instructor has the right to ask for additional training sessions.'''
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</div>

=== Manual bonder ===
Apply for sign-off via the [https://forms.office.com/e/b3PDKjsZ88?origin=lprLink NBI-Cleanroom Training Request Form].

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* Cleanroom doesn't train users in this tool.
* You need to get trained within your research group.
* Cleanroom will provide a sign-off session to ensure safety
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== Miscellaneous ==

=== Micromanipulator ===
Apply for sign-off via the [https://forms.office.com/e/b3PDKjsZ88?origin=lprLink NBI-Cleanroom Training Request Form].

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* Cleanroom doesn't train users in this tool.
* You need to get trained within your research group.
* Cleanroom will provide a sign-off session to ensure safety and verify that the user is aware of the dangers of working with nanoparticles.
==== Before you start your training sessions====
* You need to carefully read and familiarise yourself with the risks of exposure while [[Working with nanowires and nanotubes]]
</div>
</div>

[[Category:Tools]]

Training

2026-06-29T14:26:38Z

Chenglee: /* Thermo Fisher Scientific Talos F200i S/TEM */

Before submitting a training request, please review the prerequisites for each instrument listed below.

'''Starting in July 2026, a standardized training request form will be introduced. The new system will allow users to request training for multiple instruments using a single form''' ([https://forms.office.com/e/b3PDKjsZ88?origin=lprLink NBI-Cleanroom Training Request Form]). '''Please only request training for instruments that require immediate access'''. Following submission of the request form, email communication will continue to be used for scheduling and coordinating training activities. The Cleanroom staff will acknowledge and respond to training requests within 1-2 working days.

Please note that access to the Cleanroom, tool laboratories and individual instruments can only be granted after the required safety instructions and instrument training have been completed and approved by the Cleanroom staff. Upon successful completion of the training, users will be granted booking privileges through [http://cleanroom.brickhost.com/ Cleanroom Booking System].

To ensure continued competency and safe operation, booking privileges and laboratory access may expire after a period of inactivity (typically '''90 days''') for a given instrument or Cleanroom usage. In such cases, users will be required to complete a refresher training session before access can be reinstated.

== Cleanroom General (Safety) Introduction ==
Before attending the training session, all users must read and familiarize themselves with the relevant safety information ([[Safety]]). ''Expand to view more information''.
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* The introductory session is scheduled from 09:15 to 15:00.
* Training sessions are conducted in group of 3-4 participants. Once a training date has been proposed by the Cleanroom staff, participants are required to confirm their attendance by email ([mailto:cleanroom@nbi.ku.dk cleanroom@nbi.ku.dk]).
* If fewer than 3 participants are available for a scheduled session, an alternative training date may be proposed. If a session reaches its maximum capacity of 4 participants, additional users will be placed on a waiting list and offered the next available training opportunity.
* Please identify a superuser from your research group who will serve as your mentor during your first few weeks of working in the Cleanroom.
* The designated mentor is responsible for guiding you through the standard procedures and best practices after the Cleanroom General Introduction.
* Once the mentor has determined that you are competent to work independently, they must notify the Cleanroom team via email.
* Full access to the Cleanroom laboratories will only be granted after the Cleanroom team has received this confirmation.
* Standard Training Program:
** 09:15-10:30: Cleanroom introduction
** Coffee break
** 10:45-12:00: Asher, spinners and optical microscopes
** Lunch break
** 13:00-14:00: Practical information
** 14:00-15:00: Q&A and account setup
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== Chemical Handling==

=== HF Safety Training ===
Before attending the training session, all users must read and familiarize themselves with the relevant safety information ([[Safety]]). ''Expand to view more information''.
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* The HF Safety introduction is offered on a monthly basis.
* Training sessions are conducted in groups of up to 4 participants.
* Once a training date has been proposed by the Cleanroom staff, participants must confirm their attendance by email.
* Users are required to complete the HF Handling Questionnaire (that you will receive from a Cleanroom staff) and submit it to the instructor during the training session.
* Each user must also designate an HF buddy. This person must be an authorized Cleanroom user with valid HF access and training.
* As HF handling involves significant safety risks, strict compliance to all safety requirements is mandatory.
* Users are expected to arrive fully prepared for the training session.
* The instructor reserves the right to suspend or terminate the training if a participant has not completed the required preparation or does not demonstrate an adequate understanding of the relevant safety procedures.
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== Lithography ==
'''Request Training for Lithography Tools via''' [https://forms.office.com/e/b3PDKjsZ88?origin=lprLink NBI-Cleanroom Training Request Form].

=== Elionix 7000 (100 kV) ===
Elionix 7000 training is for advanced users and requires prior cleanroom tool competency.
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==== Prerequisites ====
* You must be at least a Master student or signed up for a long term (>6 months) project to be allowed to use the tool.
* Elionix is a high level tool. Make sure you are already trained to:
** Enter the cleanroom
** Use the microscope, spinner, asher

==== Training ====
* You'll need 4 sessions to get trained on this tool.
** Session 1 ( 1 hr.) - teaches you how to load/unload the sample and how to condition the beam.
** Session 2 ( 3 hr.) - involves exposing alignment marks and test patterns (any design: preferably one half of the overlay ,so to understand alignment later ).
** Session 3 ( 3 hr.) - involves using the exposed alignment marks for marker registration and exposing the 2nd pattern (i.e. the 2nd half of the overlay pattern).
** Session 4 involves exposing a "real" pattern on a "real" chip on your own to gain access.

==== Preparation ====
Before any training slots are booked on the tool you'll need all of the following prepared:
* Shadow senior users on the tool 2-3 times.
* Chip (comfortable to handle) spin coated with resist. This chip will be used for sessions 1 & 2. Please be aware of the coating and baking parameters for the resist.
* Any test design is preferred which has marks, overlay patterns that you will use to test alignment precision between two lithography steps. A Vernier pattern is commonly used. Feel free to test your ideas. Make sure you have something for both ''x'' and ''y'' directions. If you don't know how to start, check the [[Design template for EBL]].
* Convert your design files into the Elionix exposure format .co7. This can be done using Beamer in 4th floor design computers.
* Make sure all write fields are entirely in the positive coordinate space.
* Make sure neither exposure will take longer than 60 minutes at 500 pA current and dose of 1000 uC/cm2.
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=== Elionix F-125 (125 kV at QuanTech) ===
More information will be provided shortly.
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=== Heidelberg upg501 ===
Prepare your design file and coated chip before requesting Heidelberg upg501 training.
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* Have a design file ready. GDS, DXF or CIF format works fine. Make sure you are familiar with the design before your actual session.
* Have a chip spin coated with an appropriate photoresist before the training session.
** The photoresist is sensitive to white light. Use the yellow filter on the microscopes. The light source in the both scribers is white and will already expose your resist.
* What is your project alias? If unsure, contact your supervisor first.

Before the training session:
* Watch the instruction video and read the standard operating procedure on the [[Heidelberg µPG 501|Heidelberg µPG 501 tool page]], shadow the tool with your group members, and ask for a sign-off session.
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== Characterization ==
'''Request Training for Characterization Tools via''' [https://forms.office.com/e/b3PDKjsZ88?origin=lprLink NBI-Cleanroom Training Request Form].

=== Bruker Dimension Icon AFM ===
Bruker Dimension Icon is an atomic force microscope used for high-resolution and accurate measurements of surface topography.
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* AFM training is offered upon user request and is typically conducted on a one-on-one basis. Completion of the training usually requires 2-3 sessions, with each session lasting approximately 2-3 hours.
* Prior to attending the training sessions, users are expected to review and familiarize themselves with the AFM operating procedures ([[Bruker Dimension Icon AFM|AFM]]). Users are encouraged to shadow an authorized user on the instrument 2-3 times before starting formal training. In addition, having a suitable sample prepared in advance of the training is highly recommended.
* Where appropriate and subject to staff availability and project timelines, a staff member may also assist in carrying out user projects.
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=== JEOL 7800F SEM-EDS===
JEOL 7800F is a field-emission scanning electron microscope used for high-resolution imaging of surface morphology and compositional analysis.
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* SEM-EDS training is offered upon user request and is typically conducted on a one-on-one basis. Completion of the training usually requires 2-3 sessions, with each session lasting approximately 2-3 hours.
* Prior to attending the training sessions, users are expected to review and familiarize themselves with the SEM operating procedures ([[JEOL 7800F|JEOL JSM-7800F]]). Users are encouraged to shadow an authorized user on the instrument 2-3 times before starting formal training. In addition, having a suitable sample prepared in advance of the training is highly recommended.
* Where appropriate and subject to staff availability and project timelines, a staff member may also assist in carrying out user projects.
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=== JEOL 7800F Prime SEM ===
JEOL 7800F Prime is a field-emission scanning electron microscope used for high-resolution imaging of surface morphology.
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* SEM training is offered upon user request and is typically conducted on a one-on-one basis. Completion of the training usually requires 2-3 sessions, with each session lasting approximately 2-3 hours.
* Prior to attending the training sessions, users are expected to review and familiarize themselves with the SEM operating procedures ([[JEOL 7800F|JEOL JSM-7800F]]). Users are encouraged to shadow an authorized user on the instrument 2-3 times before starting formal training. In addition, having a suitable sample prepared in advance of the training is highly recommended.
* Where appropriate and subject to staff availability and project timelines, a staff member may also assist in carrying out user projects.
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=== Thermo Fisher Scientific Talos F200i S/TEM ===
Talos F200i is a versatile 200-kV field-emission (scanning) transmission electron microscope designed for high-throughput, high-resolution materials characterization.
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* This instrument is classified as a high-level tool, and training is selective.
* Users are required to have prior experience with TEM/STEM before being considered for training.
* Cleanroom staff reserves the right to decline a training request if the prerequisite requirements are not met.
* Where appropriate and subject to staff availability and project timelines, a staff member may also assist in carrying out user projects.
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=== Raith e-Line ===
Bring a prepared design package for sessions 1 and 2, including alignment and overlay test patterns.
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* A design (gds, dxf, cif) for sessions 1 & 2 with:
** 4 alignment crosses (find out what marks work on the tool from your sub-group).
** Something to break the symmetry so you can tell chip orientation with your bare eye.
** A pattern that you will use to test overlay (alignment between two lithography steps). A Vernier pattern is commonly used. Feel free to test your ideas.
** Something creative, somethin fun :) This is an exercise in learning CAD as well.
* What is your project alias? If unsure, contact your supervisor first.
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=== Woollam alpha-SE Ellipsometer ===
More information will be provided shortly.
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=== Filmetrics reflectometer ===
More information will be provided shortly.
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== Thin Film Deposition ==

=== Plassys Evaporator ===
A physical vapour deposition tool of aluminium via e-beam evaporation for Josephson junction fabrication.

Apply for training via the [https://forms.office.com/e/b3PDKjsZ88?origin=lprLink NBI-Cleanroom Training Request Form].
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====Confirmation====
Once you sign up via the form, the tool responsible will contact you for the following details:
* Confirm that you have a sample ready.
* Confirm that you have shadowed your colleagues using the tool 2-3 times.
* Specify process steps you want to run
*: Materials, thickness, tilt, milling, oxidation
* The name of the recipe.
==== Restrictions====
* Only Si and sapphire samples are allowed in the chamber.
==== Training ====
* You'll need 2 sessions to get trained on this tool.
** Session 1 (2 hr.) - teaches you how to load/unload the sample and how to run a recipe.
** Session 2 (2 hr.) - sign off session
'''The instructor has the right to ask for additional training sessions.'''
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=== AJA1 and AJA2: metallization, sputtering or ion milling ===
Two nearly identical Orion physical vapour deposition (PVD) systems from AJA International for sputtering and e-beam evaporation, and substrate milling.

Apply for training via the [https://forms.office.com/e/b3PDKjsZ88?origin=lprLink NBI-Cleanroom Training Request Form].
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====Confirmation====
Once you sign up via the form, the tool responsible will contact you for the following details:
* Confirm that you have a sample ready.
* Confirm that you have shadowed your colleagues using the tool 2-3 times.
* Specify process steps you want to run
*: Materials, thickness, tilt, milling, oxidation
* Which tool do you want to use?
** '''AJA1'''
*** e-beam materials: Ti, Al, Au, SiOx, Pt, Ti, Ge
*** DC sputtering: Nb2Ti, Ti
*** DC Kaufman milling
*** Oxidation
*** Stage rotation, no stage cooling
** '''AJA2'''
*** e-beam materials: Ti, Al, Au, Cr, Pt, Pd
*** DC sputtering: Ti
*** RF sputtering: Ti, Nb2Ti
*** RF milling
*** Stage cooling, no stage rotation
* Specify the process steps you want to run.
*: Either the name of the recipe or all required process parameters.

===Before the training session===
* Watch the instruction video(s)
*Read the standard operating procedure on the [[AJA Systems|AJA Systems tool page]].

==== Training ====
* You'll need 2 sessions to get trained on this tool.
** Session 1 ( 2 hr.) - teaches you how to load/unload the sample and how to run a recipe.
** Session 2 ( 2 hr.) - sign off session
The instructor has the right to ask for additional training sessions.
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=== ALD1 and ALD2===
Two nearly identical Savannah S100-like systems are used for atomic layer deposition.

Apply for training via the [https://forms.office.com/e/b3PDKjsZ88?origin=lprLink NBI-Cleanroom Training Request Form].
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====Confirmation====
Once you sign up via the form, the tool responsible will contact you for the following details:
* Confirm that you have a sample ready.
* Confirm that you have shadowed your colleagues using the tool 2-3 times.
* Which tool do you want to use?
** '''ALD1''' available grown oxides: AlOx, HfOx, TiOx
** '''ALD2''' available grown oxides: AlOx, HfOx, ZrOx
** In ALD1, you are allowed to use resist for lift-off processes. In ALD2, '''you are not allowed to use a sample with resist on'''.
* Specify the process steps you want to run.
** Either the name of the recipe or all required process parameters.
====Before the training session====
* Watch the instruction video(s)
* Study the [[Atomic layer deposition|ALD principles]]
* Read the standard operating procedure on the [[Cambridge ALD|ALD tool page]].
====Training====
You'll need 2 sessions to get trained on this tool.
* Session 1 (30 mins) - teaches you how to load/unload the sample and how to run a recipe.
* Session 2 (30 mins) - sign off session
*: '''Note:''' An ALD session can have a long duration (often >12 hours). A usual training starts in the afternoon (load, setup, prepare recipe, run), and the film will grow throughout the evening. The next day, the user and the instructor will finish the training session (unloading).
'''The instructor has the right to ask for additional training sessions.'''
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== Packaging ==

=== F&S autobonder ===
A semi-automatic bonder to bond semiconductor substrates to PCB daughterboards from F&S Bondtec.

Apply for training via the [https://forms.office.com/e/b3PDKjsZ88?origin=lprLink NBI-Cleanroom Training Request Form].
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====Confirmation====
Once you sign up via the form, the tool responsible will contact you for the following details:
* Confirm that you have a '''chip''' ready for bonding.
* Confirm that you have shadowed your colleagues using the tool 2-3 times.
* You must know which '''daughterboard''' you will use for bonding (CPH, QBOARD1,2, QCAGE, Sydney, IC, custom).
* You must know what material you use to '''mount''' the chip to the daughterboard (mechanical clamping, silver paint, PMMA, other).
* Confirm that you have prepared a '''bonding schematic''' .
* By default, this bonder is using Al wire. You can request a special training if you want to use Au wire, but be aware it can be challenging.
*: Users are more likely to use the [[K&S bonder| K&S manual bonder]] for Au wire bonding.
* Specify the name of the recipe.
====Before the training session====
* Read the standard operating procedure on the [[FS bonder| FS bonder tool page]]
* Verify with one of your colleagues that your bonding schematic is correct.
==== Training ====
You'll need 2 sessions to get trained on this tool.
* Session 1 (2 hr.) - teaches you how to load/unload the sample and how to run a recipe.
* Session 2 (2 hr.) - sign off session
'''The instructor has the right to ask for additional training sessions.'''
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=== Manual bonder ===
Apply for sign-off via the [https://forms.office.com/e/b3PDKjsZ88?origin=lprLink NBI-Cleanroom Training Request Form].

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* Cleanroom doesn't train users in this tool.
* You need to get trained within your research group.
* Cleanroom will provide a sign-off session to ensure safety
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== Miscellaneous ==

=== Micromanipulator ===
Apply for sign-off via the [https://forms.office.com/e/b3PDKjsZ88?origin=lprLink NBI-Cleanroom Training Request Form].

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* Cleanroom doesn't train users in this tool.
* You need to get trained within your research group.
* Cleanroom will provide a sign-off session to ensure safety and verify that the user is aware of the dangers of working with nanoparticles.
==== Before you start your training sessions====
* You need to carefully read and familiarise yourself with the risks of exposure while [[Working with nanowires and nanotubes]]
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[[Category:Tools]]

Training

2026-06-29T14:26:20Z

Chenglee: /* Thermo Fisher Scientific Talos F200i S/TEM */

Before submitting a training request, please review the prerequisites for each instrument listed below.

'''Starting in July 2026, a standardized training request form will be introduced. The new system will allow users to request training for multiple instruments using a single form''' ([https://forms.office.com/e/b3PDKjsZ88?origin=lprLink NBI-Cleanroom Training Request Form]). '''Please only request training for instruments that require immediate access'''. Following submission of the request form, email communication will continue to be used for scheduling and coordinating training activities. The Cleanroom staff will acknowledge and respond to training requests within 1-2 working days.

Please note that access to the Cleanroom, tool laboratories and individual instruments can only be granted after the required safety instructions and instrument training have been completed and approved by the Cleanroom staff. Upon successful completion of the training, users will be granted booking privileges through [http://cleanroom.brickhost.com/ Cleanroom Booking System].

To ensure continued competency and safe operation, booking privileges and laboratory access may expire after a period of inactivity (typically '''90 days''') for a given instrument or Cleanroom usage. In such cases, users will be required to complete a refresher training session before access can be reinstated.

== Cleanroom General (Safety) Introduction ==
Before attending the training session, all users must read and familiarize themselves with the relevant safety information ([[Safety]]). ''Expand to view more information''.
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* The introductory session is scheduled from 09:15 to 15:00.
* Training sessions are conducted in group of 3-4 participants. Once a training date has been proposed by the Cleanroom staff, participants are required to confirm their attendance by email ([mailto:cleanroom@nbi.ku.dk cleanroom@nbi.ku.dk]).
* If fewer than 3 participants are available for a scheduled session, an alternative training date may be proposed. If a session reaches its maximum capacity of 4 participants, additional users will be placed on a waiting list and offered the next available training opportunity.
* Please identify a superuser from your research group who will serve as your mentor during your first few weeks of working in the Cleanroom.
* The designated mentor is responsible for guiding you through the standard procedures and best practices after the Cleanroom General Introduction.
* Once the mentor has determined that you are competent to work independently, they must notify the Cleanroom team via email.
* Full access to the Cleanroom laboratories will only be granted after the Cleanroom team has received this confirmation.
* Standard Training Program:
** 09:15-10:30: Cleanroom introduction
** Coffee break
** 10:45-12:00: Asher, spinners and optical microscopes
** Lunch break
** 13:00-14:00: Practical information
** 14:00-15:00: Q&A and account setup
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== Chemical Handling==

=== HF Safety Training ===
Before attending the training session, all users must read and familiarize themselves with the relevant safety information ([[Safety]]). ''Expand to view more information''.
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* The HF Safety introduction is offered on a monthly basis.
* Training sessions are conducted in groups of up to 4 participants.
* Once a training date has been proposed by the Cleanroom staff, participants must confirm their attendance by email.
* Users are required to complete the HF Handling Questionnaire (that you will receive from a Cleanroom staff) and submit it to the instructor during the training session.
* Each user must also designate an HF buddy. This person must be an authorized Cleanroom user with valid HF access and training.
* As HF handling involves significant safety risks, strict compliance to all safety requirements is mandatory.
* Users are expected to arrive fully prepared for the training session.
* The instructor reserves the right to suspend or terminate the training if a participant has not completed the required preparation or does not demonstrate an adequate understanding of the relevant safety procedures.
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== Lithography ==
'''Request Training for Lithography Tools via''' [https://forms.office.com/e/b3PDKjsZ88?origin=lprLink NBI-Cleanroom Training Request Form].

=== Elionix 7000 (100 kV) ===
Elionix 7000 training is for advanced users and requires prior cleanroom tool competency.
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==== Prerequisites ====
* You must be at least a Master student or signed up for a long term (>6 months) project to be allowed to use the tool.
* Elionix is a high level tool. Make sure you are already trained to:
** Enter the cleanroom
** Use the microscope, spinner, asher

==== Training ====
* You'll need 4 sessions to get trained on this tool.
** Session 1 ( 1 hr.) - teaches you how to load/unload the sample and how to condition the beam.
** Session 2 ( 3 hr.) - involves exposing alignment marks and test patterns (any design: preferably one half of the overlay ,so to understand alignment later ).
** Session 3 ( 3 hr.) - involves using the exposed alignment marks for marker registration and exposing the 2nd pattern (i.e. the 2nd half of the overlay pattern).
** Session 4 involves exposing a "real" pattern on a "real" chip on your own to gain access.

==== Preparation ====
Before any training slots are booked on the tool you'll need all of the following prepared:
* Shadow senior users on the tool 2-3 times.
* Chip (comfortable to handle) spin coated with resist. This chip will be used for sessions 1 & 2. Please be aware of the coating and baking parameters for the resist.
* Any test design is preferred which has marks, overlay patterns that you will use to test alignment precision between two lithography steps. A Vernier pattern is commonly used. Feel free to test your ideas. Make sure you have something for both ''x'' and ''y'' directions. If you don't know how to start, check the [[Design template for EBL]].
* Convert your design files into the Elionix exposure format .co7. This can be done using Beamer in 4th floor design computers.
* Make sure all write fields are entirely in the positive coordinate space.
* Make sure neither exposure will take longer than 60 minutes at 500 pA current and dose of 1000 uC/cm2.
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=== Elionix F-125 (125 kV at QuanTech) ===
More information will be provided shortly.
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=== Heidelberg upg501 ===
Prepare your design file and coated chip before requesting Heidelberg upg501 training.
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* Have a design file ready. GDS, DXF or CIF format works fine. Make sure you are familiar with the design before your actual session.
* Have a chip spin coated with an appropriate photoresist before the training session.
** The photoresist is sensitive to white light. Use the yellow filter on the microscopes. The light source in the both scribers is white and will already expose your resist.
* What is your project alias? If unsure, contact your supervisor first.

Before the training session:
* Watch the instruction video and read the standard operating procedure on the [[Heidelberg µPG 501|Heidelberg µPG 501 tool page]], shadow the tool with your group members, and ask for a sign-off session.
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== Characterization ==
'''Request Training for Characterization Tools via''' [https://forms.office.com/e/b3PDKjsZ88?origin=lprLink NBI-Cleanroom Training Request Form].

=== Bruker Dimension Icon AFM ===
Bruker Dimension Icon is an atomic force microscope used for high-resolution and accurate measurements of surface topography.
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* AFM training is offered upon user request and is typically conducted on a one-on-one basis. Completion of the training usually requires 2-3 sessions, with each session lasting approximately 2-3 hours.
* Prior to attending the training sessions, users are expected to review and familiarize themselves with the AFM operating procedures ([[Bruker Dimension Icon AFM|AFM]]). Users are encouraged to shadow an authorized user on the instrument 2-3 times before starting formal training. In addition, having a suitable sample prepared in advance of the training is highly recommended.
* Where appropriate and subject to staff availability and project timelines, a staff member may also assist in carrying out user projects.
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=== JEOL 7800F SEM-EDS===
JEOL 7800F is a field-emission scanning electron microscope used for high-resolution imaging of surface morphology and compositional analysis.
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* SEM-EDS training is offered upon user request and is typically conducted on a one-on-one basis. Completion of the training usually requires 2-3 sessions, with each session lasting approximately 2-3 hours.
* Prior to attending the training sessions, users are expected to review and familiarize themselves with the SEM operating procedures ([[JEOL 7800F|JEOL JSM-7800F]]). Users are encouraged to shadow an authorized user on the instrument 2-3 times before starting formal training. In addition, having a suitable sample prepared in advance of the training is highly recommended.
* Where appropriate and subject to staff availability and project timelines, a staff member may also assist in carrying out user projects.
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=== JEOL 7800F Prime SEM ===
JEOL 7800F Prime is a field-emission scanning electron microscope used for high-resolution imaging of surface morphology.
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* SEM training is offered upon user request and is typically conducted on a one-on-one basis. Completion of the training usually requires 2-3 sessions, with each session lasting approximately 2-3 hours.
* Prior to attending the training sessions, users are expected to review and familiarize themselves with the SEM operating procedures ([[JEOL 7800F|JEOL JSM-7800F]]). Users are encouraged to shadow an authorized user on the instrument 2-3 times before starting formal training. In addition, having a suitable sample prepared in advance of the training is highly recommended.
* Where appropriate and subject to staff availability and project timelines, a staff member may also assist in carrying out user projects.
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=== Thermo Fisher Scientific Talos F200i S/TEM ===
Talos F200i is a versatile 200-kV field-emission (scanning) transmission electron microscope designed for high-throughput, high-resolution materials characterization.
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* This instrument is classified as a high-level tool, and training is selective. Users are required to have prior experience with TEM/STEM before being considered for training.
* Cleanroom staff reserves the right to decline a training request if the prerequisite requirements are not met.
* Where appropriate and subject to staff availability and project timelines, a staff member may also assist in carrying out user projects.
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=== Raith e-Line ===
Bring a prepared design package for sessions 1 and 2, including alignment and overlay test patterns.
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* A design (gds, dxf, cif) for sessions 1 & 2 with:
** 4 alignment crosses (find out what marks work on the tool from your sub-group).
** Something to break the symmetry so you can tell chip orientation with your bare eye.
** A pattern that you will use to test overlay (alignment between two lithography steps). A Vernier pattern is commonly used. Feel free to test your ideas.
** Something creative, somethin fun :) This is an exercise in learning CAD as well.
* What is your project alias? If unsure, contact your supervisor first.
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=== Woollam alpha-SE Ellipsometer ===
More information will be provided shortly.
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=== Filmetrics reflectometer ===
More information will be provided shortly.
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== Thin Film Deposition ==

=== Plassys Evaporator ===
A physical vapour deposition tool of aluminium via e-beam evaporation for Josephson junction fabrication.

Apply for training via the [https://forms.office.com/e/b3PDKjsZ88?origin=lprLink NBI-Cleanroom Training Request Form].
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====Confirmation====
Once you sign up via the form, the tool responsible will contact you for the following details:
* Confirm that you have a sample ready.
* Confirm that you have shadowed your colleagues using the tool 2-3 times.
* Specify process steps you want to run
*: Materials, thickness, tilt, milling, oxidation
* The name of the recipe.
==== Restrictions====
* Only Si and sapphire samples are allowed in the chamber.
==== Training ====
* You'll need 2 sessions to get trained on this tool.
** Session 1 (2 hr.) - teaches you how to load/unload the sample and how to run a recipe.
** Session 2 (2 hr.) - sign off session
'''The instructor has the right to ask for additional training sessions.'''
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=== AJA1 and AJA2: metallization, sputtering or ion milling ===
Two nearly identical Orion physical vapour deposition (PVD) systems from AJA International for sputtering and e-beam evaporation, and substrate milling.

Apply for training via the [https://forms.office.com/e/b3PDKjsZ88?origin=lprLink NBI-Cleanroom Training Request Form].
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====Confirmation====
Once you sign up via the form, the tool responsible will contact you for the following details:
* Confirm that you have a sample ready.
* Confirm that you have shadowed your colleagues using the tool 2-3 times.
* Specify process steps you want to run
*: Materials, thickness, tilt, milling, oxidation
* Which tool do you want to use?
** '''AJA1'''
*** e-beam materials: Ti, Al, Au, SiOx, Pt, Ti, Ge
*** DC sputtering: Nb2Ti, Ti
*** DC Kaufman milling
*** Oxidation
*** Stage rotation, no stage cooling
** '''AJA2'''
*** e-beam materials: Ti, Al, Au, Cr, Pt, Pd
*** DC sputtering: Ti
*** RF sputtering: Ti, Nb2Ti
*** RF milling
*** Stage cooling, no stage rotation
* Specify the process steps you want to run.
*: Either the name of the recipe or all required process parameters.

===Before the training session===
* Watch the instruction video(s)
*Read the standard operating procedure on the [[AJA Systems|AJA Systems tool page]].

==== Training ====
* You'll need 2 sessions to get trained on this tool.
** Session 1 ( 2 hr.) - teaches you how to load/unload the sample and how to run a recipe.
** Session 2 ( 2 hr.) - sign off session
The instructor has the right to ask for additional training sessions.
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=== ALD1 and ALD2===
Two nearly identical Savannah S100-like systems are used for atomic layer deposition.

Apply for training via the [https://forms.office.com/e/b3PDKjsZ88?origin=lprLink NBI-Cleanroom Training Request Form].
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====Confirmation====
Once you sign up via the form, the tool responsible will contact you for the following details:
* Confirm that you have a sample ready.
* Confirm that you have shadowed your colleagues using the tool 2-3 times.
* Which tool do you want to use?
** '''ALD1''' available grown oxides: AlOx, HfOx, TiOx
** '''ALD2''' available grown oxides: AlOx, HfOx, ZrOx
** In ALD1, you are allowed to use resist for lift-off processes. In ALD2, '''you are not allowed to use a sample with resist on'''.
* Specify the process steps you want to run.
** Either the name of the recipe or all required process parameters.
====Before the training session====
* Watch the instruction video(s)
* Study the [[Atomic layer deposition|ALD principles]]
* Read the standard operating procedure on the [[Cambridge ALD|ALD tool page]].
====Training====
You'll need 2 sessions to get trained on this tool.
* Session 1 (30 mins) - teaches you how to load/unload the sample and how to run a recipe.
* Session 2 (30 mins) - sign off session
*: '''Note:''' An ALD session can have a long duration (often >12 hours). A usual training starts in the afternoon (load, setup, prepare recipe, run), and the film will grow throughout the evening. The next day, the user and the instructor will finish the training session (unloading).
'''The instructor has the right to ask for additional training sessions.'''
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== Packaging ==

=== F&S autobonder ===
A semi-automatic bonder to bond semiconductor substrates to PCB daughterboards from F&S Bondtec.

Apply for training via the [https://forms.office.com/e/b3PDKjsZ88?origin=lprLink NBI-Cleanroom Training Request Form].
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====Confirmation====
Once you sign up via the form, the tool responsible will contact you for the following details:
* Confirm that you have a '''chip''' ready for bonding.
* Confirm that you have shadowed your colleagues using the tool 2-3 times.
* You must know which '''daughterboard''' you will use for bonding (CPH, QBOARD1,2, QCAGE, Sydney, IC, custom).
* You must know what material you use to '''mount''' the chip to the daughterboard (mechanical clamping, silver paint, PMMA, other).
* Confirm that you have prepared a '''bonding schematic''' .
* By default, this bonder is using Al wire. You can request a special training if you want to use Au wire, but be aware it can be challenging.
*: Users are more likely to use the [[K&S bonder| K&S manual bonder]] for Au wire bonding.
* Specify the name of the recipe.
====Before the training session====
* Read the standard operating procedure on the [[FS bonder| FS bonder tool page]]
* Verify with one of your colleagues that your bonding schematic is correct.
==== Training ====
You'll need 2 sessions to get trained on this tool.
* Session 1 (2 hr.) - teaches you how to load/unload the sample and how to run a recipe.
* Session 2 (2 hr.) - sign off session
'''The instructor has the right to ask for additional training sessions.'''
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=== Manual bonder ===
Apply for sign-off via the [https://forms.office.com/e/b3PDKjsZ88?origin=lprLink NBI-Cleanroom Training Request Form].

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* Cleanroom doesn't train users in this tool.
* You need to get trained within your research group.
* Cleanroom will provide a sign-off session to ensure safety
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== Miscellaneous ==

=== Micromanipulator ===
Apply for sign-off via the [https://forms.office.com/e/b3PDKjsZ88?origin=lprLink NBI-Cleanroom Training Request Form].

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* Cleanroom doesn't train users in this tool.
* You need to get trained within your research group.
* Cleanroom will provide a sign-off session to ensure safety and verify that the user is aware of the dangers of working with nanoparticles.
==== Before you start your training sessions====
* You need to carefully read and familiarise yourself with the risks of exposure while [[Working with nanowires and nanotubes]]
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[[Category:Tools]]

Training

2026-06-29T14:22:18Z

Chenglee:

Before submitting a training request, please review the prerequisites for each instrument listed below.

'''Starting in July 2026, a standardized training request form will be introduced. The new system will allow users to request training for multiple instruments using a single form''' ([https://forms.office.com/e/b3PDKjsZ88?origin=lprLink NBI-Cleanroom Training Request Form]). '''Please only request training for instruments that require immediate access'''. Following submission of the request form, email communication will continue to be used for scheduling and coordinating training activities. The Cleanroom staff will acknowledge and respond to training requests within 1-2 working days.

Please note that access to the Cleanroom, tool laboratories and individual instruments can only be granted after the required safety instructions and instrument training have been completed and approved by the Cleanroom staff. Upon successful completion of the training, users will be granted booking privileges through [http://cleanroom.brickhost.com/ Cleanroom Booking System].

To ensure continued competency and safe operation, booking privileges and laboratory access may expire after a period of inactivity (typically '''90 days''') for a given instrument or Cleanroom usage. In such cases, users will be required to complete a refresher training session before access can be reinstated.

== Cleanroom General (Safety) Introduction ==
Before attending the training session, all users must read and familiarize themselves with the relevant safety information ([[Safety]]). ''Expand to view more information''.
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* The introductory session is scheduled from 09:15 to 15:00.
* Training sessions are conducted in group of 3-4 participants. Once a training date has been proposed by the Cleanroom staff, participants are required to confirm their attendance by email ([mailto:cleanroom@nbi.ku.dk cleanroom@nbi.ku.dk]).
* If fewer than 3 participants are available for a scheduled session, an alternative training date may be proposed. If a session reaches its maximum capacity of 4 participants, additional users will be placed on a waiting list and offered the next available training opportunity.
* Please identify a superuser from your research group who will serve as your mentor during your first few weeks of working in the Cleanroom.
* The designated mentor is responsible for guiding you through the standard procedures and best practices after the Cleanroom General Introduction.
* Once the mentor has determined that you are competent to work independently, they must notify the Cleanroom team via email.
* Full access to the Cleanroom laboratories will only be granted after the Cleanroom team has received this confirmation.
* Standard Training Program:
** 09:15-10:30: Cleanroom introduction
** Coffee break
** 10:45-12:00: Asher, spinners and optical microscopes
** Lunch break
** 13:00-14:00: Practical information
** 14:00-15:00: Q&A and account setup
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== Chemical Handling==

=== HF Safety Training ===
Before attending the training session, all users must read and familiarize themselves with the relevant safety information ([[Safety]]). ''Expand to view more information''.
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* The HF Safety introduction is offered on a monthly basis.
* Training sessions are conducted in groups of up to 4 participants.
* Once a training date has been proposed by the Cleanroom staff, participants must confirm their attendance by email.
* Users are required to complete the HF Handling Questionnaire (that you will receive from a Cleanroom staff) and submit it to the instructor during the training session.
* Each user must also designate an HF buddy. This person must be an authorized Cleanroom user with valid HF access and training.
* As HF handling involves significant safety risks, strict compliance to all safety requirements is mandatory.
* Users are expected to arrive fully prepared for the training session.
* The instructor reserves the right to suspend or terminate the training if a participant has not completed the required preparation or does not demonstrate an adequate understanding of the relevant safety procedures.
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== Lithography ==
'''Request Training for Lithography Tools via''' [https://forms.office.com/e/b3PDKjsZ88?origin=lprLink NBI-Cleanroom Training Request Form].

=== Elionix 7000 (100 kV) ===
Elionix 7000 training is for advanced users and requires prior cleanroom tool competency.
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==== Prerequisites ====
* You must be at least a Master student or signed up for a long term (>6 months) project to be allowed to use the tool.
* Elionix is a high level tool. Make sure you are already trained to:
** Enter the cleanroom
** Use the microscope, spinner, asher

==== Training ====
* You'll need 4 sessions to get trained on this tool.
** Session 1 ( 1 hr.) - teaches you how to load/unload the sample and how to condition the beam.
** Session 2 ( 3 hr.) - involves exposing alignment marks and test patterns (any design: preferably one half of the overlay ,so to understand alignment later ).
** Session 3 ( 3 hr.) - involves using the exposed alignment marks for marker registration and exposing the 2nd pattern (i.e. the 2nd half of the overlay pattern).
** Session 4 involves exposing a "real" pattern on a "real" chip on your own to gain access.

==== Preparation ====
Before any training slots are booked on the tool you'll need all of the following prepared:
* Shadow senior users on the tool 2-3 times.
* Chip (comfortable to handle) spin coated with resist. This chip will be used for sessions 1 & 2. Please be aware of the coating and baking parameters for the resist.
* Any test design is preferred which has marks, overlay patterns that you will use to test alignment precision between two lithography steps. A Vernier pattern is commonly used. Feel free to test your ideas. Make sure you have something for both ''x'' and ''y'' directions. If you don't know how to start, check the [[Design template for EBL]].
* Convert your design files into the Elionix exposure format .co7. This can be done using Beamer in 4th floor design computers.
* Make sure all write fields are entirely in the positive coordinate space.
* Make sure neither exposure will take longer than 60 minutes at 500 pA current and dose of 1000 uC/cm2.
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=== Elionix F-125 (125 kV at QuanTech) ===
More information will be provided shortly.
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=== Heidelberg upg501 ===
Prepare your design file and coated chip before requesting Heidelberg upg501 training.
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* Have a design file ready. GDS, DXF or CIF format works fine. Make sure you are familiar with the design before your actual session.
* Have a chip spin coated with an appropriate photoresist before the training session.
** The photoresist is sensitive to white light. Use the yellow filter on the microscopes. The light source in the both scribers is white and will already expose your resist.
* What is your project alias? If unsure, contact your supervisor first.

Before the training session:
* Watch the instruction video and read the standard operating procedure on the [[Heidelberg µPG 501|Heidelberg µPG 501 tool page]], shadow the tool with your group members, and ask for a sign-off session.
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== Characterization ==
'''Request Training for Characterization Tools via''' [https://forms.office.com/e/b3PDKjsZ88?origin=lprLink NBI-Cleanroom Training Request Form].

=== Bruker Dimension Icon AFM ===
Bruker Dimension Icon is an atomic force microscope used for high-resolution and accurate measurements of surface topography.
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* AFM training is offered upon user request and is typically conducted on a one-on-one basis. Completion of the training usually requires 2-3 sessions, with each session lasting approximately 2-3 hours.
* Prior to attending the training sessions, users are expected to review and familiarize themselves with the AFM operating procedures ([[Bruker Dimension Icon AFM|AFM]]). Users are encouraged to shadow an authorized user on the instrument 2-3 times before starting formal training. In addition, having a suitable sample prepared in advance of the training is highly recommended.
* Where appropriate and subject to staff availability and project timelines, a staff member may also assist in carrying out user projects.
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=== JEOL 7800F SEM-EDS===
JEOL 7800F is a field-emission scanning electron microscope used for high-resolution imaging of surface morphology and compositional analysis.
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* SEM-EDS training is offered upon user request and is typically conducted on a one-on-one basis. Completion of the training usually requires 2-3 sessions, with each session lasting approximately 2-3 hours.
* Prior to attending the training sessions, users are expected to review and familiarize themselves with the SEM operating procedures ([[JEOL 7800F|JEOL JSM-7800F]]). Users are encouraged to shadow an authorized user on the instrument 2-3 times before starting formal training. In addition, having a suitable sample prepared in advance of the training is highly recommended.
* Where appropriate and subject to staff availability and project timelines, a staff member may also assist in carrying out user projects.
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=== JEOL 7800F Prime SEM ===
JEOL 7800F Prime is a field-emission scanning electron microscope used for high-resolution imaging of surface morphology.
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* SEM training is offered upon user request and is typically conducted on a one-on-one basis. Completion of the training usually requires 2-3 sessions, with each session lasting approximately 2-3 hours.
* Prior to attending the training sessions, users are expected to review and familiarize themselves with the SEM operating procedures ([[JEOL 7800F|JEOL JSM-7800F]]). Users are encouraged to shadow an authorized user on the instrument 2-3 times before starting formal training. In addition, having a suitable sample prepared in advance of the training is highly recommended.
* Where appropriate and subject to staff availability and project timelines, a staff member may also assist in carrying out user projects.
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=== Thermo Fisher Scientific Talos F200i S/TEM ===
Talos F200i is a versatile 200-kV field-emission (scanning) transmission electron microscope designed for high-throughput, high-resolution materials characterization.
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* This instrument is classified as a high-level tool, and training is selective. Users are required to have prior experience with TEM/STEM before being considered for training. Cleanroom staff reserves the right to decline a training request if the prerequisite requirements are not met.
* Where appropriate and subject to staff availability and project timelines, a staff member may also assist in carrying out user projects.
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=== Raith e-Line ===
Bring a prepared design package for sessions 1 and 2, including alignment and overlay test patterns.
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* A design (gds, dxf, cif) for sessions 1 & 2 with:
** 4 alignment crosses (find out what marks work on the tool from your sub-group).
** Something to break the symmetry so you can tell chip orientation with your bare eye.
** A pattern that you will use to test overlay (alignment between two lithography steps). A Vernier pattern is commonly used. Feel free to test your ideas.
** Something creative, somethin fun :) This is an exercise in learning CAD as well.
* What is your project alias? If unsure, contact your supervisor first.
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=== Woollam alpha-SE Ellipsometer ===
More information will be provided shortly.
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=== Filmetrics reflectometer ===
More information will be provided shortly.
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== Thin Film Deposition ==

=== Plassys Evaporator ===
A physical vapour deposition tool of aluminium via e-beam evaporation for Josephson junction fabrication.

Apply for training via the [https://forms.office.com/e/b3PDKjsZ88?origin=lprLink NBI-Cleanroom Training Request Form].
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====Confirmation====
Once you sign up via the form, the tool responsible will contact you for the following details:
* Confirm that you have a sample ready.
* Confirm that you have shadowed your colleagues using the tool 2-3 times.
* Specify process steps you want to run
*: Materials, thickness, tilt, milling, oxidation
* The name of the recipe.
==== Restrictions====
* Only Si and sapphire samples are allowed in the chamber.
==== Training ====
* You'll need 2 sessions to get trained on this tool.
** Session 1 (2 hr.) - teaches you how to load/unload the sample and how to run a recipe.
** Session 2 (2 hr.) - sign off session
'''The instructor has the right to ask for additional training sessions.'''
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=== AJA1 and AJA2: metallization, sputtering or ion milling ===
Two nearly identical Orion physical vapour deposition (PVD) systems from AJA International for sputtering and e-beam evaporation, and substrate milling.

Apply for training via the [https://forms.office.com/e/b3PDKjsZ88?origin=lprLink NBI-Cleanroom Training Request Form].
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====Confirmation====
Once you sign up via the form, the tool responsible will contact you for the following details:
* Confirm that you have a sample ready.
* Confirm that you have shadowed your colleagues using the tool 2-3 times.
* Specify process steps you want to run
*: Materials, thickness, tilt, milling, oxidation
* Which tool do you want to use?
** '''AJA1'''
*** e-beam materials: Ti, Al, Au, SiOx, Pt, Ti, Ge
*** DC sputtering: Nb2Ti, Ti
*** DC Kaufman milling
*** Oxidation
*** Stage rotation, no stage cooling
** '''AJA2'''
*** e-beam materials: Ti, Al, Au, Cr, Pt, Pd
*** DC sputtering: Ti
*** RF sputtering: Ti, Nb2Ti
*** RF milling
*** Stage cooling, no stage rotation
* Specify the process steps you want to run.
*: Either the name of the recipe or all required process parameters.

===Before the training session===
* Watch the instruction video(s)
*Read the standard operating procedure on the [[AJA Systems|AJA Systems tool page]].

==== Training ====
* You'll need 2 sessions to get trained on this tool.
** Session 1 ( 2 hr.) - teaches you how to load/unload the sample and how to run a recipe.
** Session 2 ( 2 hr.) - sign off session
The instructor has the right to ask for additional training sessions.
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=== ALD1 and ALD2===
Two nearly identical Savannah S100-like systems are used for atomic layer deposition.

Apply for training via the [https://forms.office.com/e/b3PDKjsZ88?origin=lprLink NBI-Cleanroom Training Request Form].
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====Confirmation====
Once you sign up via the form, the tool responsible will contact you for the following details:
* Confirm that you have a sample ready.
* Confirm that you have shadowed your colleagues using the tool 2-3 times.
* Which tool do you want to use?
** '''ALD1''' available grown oxides: AlOx, HfOx, TiOx
** '''ALD2''' available grown oxides: AlOx, HfOx, ZrOx
** In ALD1, you are allowed to use resist for lift-off processes. In ALD2, '''you are not allowed to use a sample with resist on'''.
* Specify the process steps you want to run.
** Either the name of the recipe or all required process parameters.
====Before the training session====
* Watch the instruction video(s)
* Study the [[Atomic layer deposition|ALD principles]]
* Read the standard operating procedure on the [[Cambridge ALD|ALD tool page]].
====Training====
You'll need 2 sessions to get trained on this tool.
* Session 1 (30 mins) - teaches you how to load/unload the sample and how to run a recipe.
* Session 2 (30 mins) - sign off session
*: '''Note:''' An ALD session can have a long duration (often >12 hours). A usual training starts in the afternoon (load, setup, prepare recipe, run), and the film will grow throughout the evening. The next day, the user and the instructor will finish the training session (unloading).
'''The instructor has the right to ask for additional training sessions.'''
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== Packaging ==

=== F&S autobonder ===
A semi-automatic bonder to bond semiconductor substrates to PCB daughterboards from F&S Bondtec.

Apply for training via the [https://forms.office.com/e/b3PDKjsZ88?origin=lprLink NBI-Cleanroom Training Request Form].
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====Confirmation====
Once you sign up via the form, the tool responsible will contact you for the following details:
* Confirm that you have a '''chip''' ready for bonding.
* Confirm that you have shadowed your colleagues using the tool 2-3 times.
* You must know which '''daughterboard''' you will use for bonding (CPH, QBOARD1,2, QCAGE, Sydney, IC, custom).
* You must know what material you use to '''mount''' the chip to the daughterboard (mechanical clamping, silver paint, PMMA, other).
* Confirm that you have prepared a '''bonding schematic''' .
* By default, this bonder is using Al wire. You can request a special training if you want to use Au wire, but be aware it can be challenging.
*: Users are more likely to use the [[K&S bonder| K&S manual bonder]] for Au wire bonding.
* Specify the name of the recipe.
====Before the training session====
* Read the standard operating procedure on the [[FS bonder| FS bonder tool page]]
* Verify with one of your colleagues that your bonding schematic is correct.
==== Training ====
You'll need 2 sessions to get trained on this tool.
* Session 1 (2 hr.) - teaches you how to load/unload the sample and how to run a recipe.
* Session 2 (2 hr.) - sign off session
'''The instructor has the right to ask for additional training sessions.'''
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=== Manual bonder ===
Apply for sign-off via the [https://forms.office.com/e/b3PDKjsZ88?origin=lprLink NBI-Cleanroom Training Request Form].

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* Cleanroom doesn't train users in this tool.
* You need to get trained within your research group.
* Cleanroom will provide a sign-off session to ensure safety
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== Miscellaneous ==

=== Micromanipulator ===
Apply for sign-off via the [https://forms.office.com/e/b3PDKjsZ88?origin=lprLink NBI-Cleanroom Training Request Form].

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* Cleanroom doesn't train users in this tool.
* You need to get trained within your research group.
* Cleanroom will provide a sign-off session to ensure safety and verify that the user is aware of the dangers of working with nanoparticles.
==== Before you start your training sessions====
* You need to carefully read and familiarise yourself with the risks of exposure while [[Working with nanowires and nanotubes]]
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[[Category:Tools]]

Training

2026-06-29T14:21:51Z

Chenglee:

Before submitting a training request, please review the prerequisites for each instrument listed below.

'''Starting in July 2026, a standardized training request form will be introduced. The new system will allow users to request training for multiple instruments using a single form''' ([https://forms.office.com/e/b3PDKjsZ88?origin=lprLink NBI-Cleanroom Training Request Form]). '''Please only request training for instruments that require immediate access'''. Following submission of the request form, email communication will continue to be used for scheduling and coordinating training activities. The Cleanroom staff will acknowledge and respond to training requests within 1-2 working days.

Please note that access to the Cleanroom, tool laboratories and individual instruments can only be granted after the required safety instructions and instrument training have been completed and approved by the Cleanroom staff. Upon successful completion of the training, users will be granted booking privileges through the Cleanroom Booking System [http://cleanroom.brickhost.com/ Cleanroom Booking System].

To ensure continued competency and safe operation, booking privileges and laboratory access may expire after a period of inactivity (typically '''90 days''') for a given instrument or Cleanroom usage. In such cases, users will be required to complete a refresher training session before access can be reinstated.

== Cleanroom General (Safety) Introduction ==
Before attending the training session, all users must read and familiarize themselves with the relevant safety information ([[Safety]]). ''Expand to view more information''.
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* The introductory session is scheduled from 09:15 to 15:00.
* Training sessions are conducted in group of 3-4 participants. Once a training date has been proposed by the Cleanroom staff, participants are required to confirm their attendance by email ([mailto:cleanroom@nbi.ku.dk cleanroom@nbi.ku.dk]).
* If fewer than 3 participants are available for a scheduled session, an alternative training date may be proposed. If a session reaches its maximum capacity of 4 participants, additional users will be placed on a waiting list and offered the next available training opportunity.
* Please identify a superuser from your research group who will serve as your mentor during your first few weeks of working in the Cleanroom.
* The designated mentor is responsible for guiding you through the standard procedures and best practices after the Cleanroom General Introduction.
* Once the mentor has determined that you are competent to work independently, they must notify the Cleanroom team via email.
* Full access to the Cleanroom laboratories will only be granted after the Cleanroom team has received this confirmation.
* Standard Training Program:
** 09:15-10:30: Cleanroom introduction
** Coffee break
** 10:45-12:00: Asher, spinners and optical microscopes
** Lunch break
** 13:00-14:00: Practical information
** 14:00-15:00: Q&A and account setup
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== Chemical Handling==

=== HF Safety Training ===
Before attending the training session, all users must read and familiarize themselves with the relevant safety information ([[Safety]]). ''Expand to view more information''.
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* The HF Safety introduction is offered on a monthly basis.
* Training sessions are conducted in groups of up to 4 participants.
* Once a training date has been proposed by the Cleanroom staff, participants must confirm their attendance by email.
* Users are required to complete the HF Handling Questionnaire (that you will receive from a Cleanroom staff) and submit it to the instructor during the training session.
* Each user must also designate an HF buddy. This person must be an authorized Cleanroom user with valid HF access and training.
* As HF handling involves significant safety risks, strict compliance to all safety requirements is mandatory.
* Users are expected to arrive fully prepared for the training session.
* The instructor reserves the right to suspend or terminate the training if a participant has not completed the required preparation or does not demonstrate an adequate understanding of the relevant safety procedures.
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== Lithography ==
'''Request Training for Lithography Tools via''' [https://forms.office.com/e/b3PDKjsZ88?origin=lprLink NBI-Cleanroom Training Request Form].

=== Elionix 7000 (100 kV) ===
Elionix 7000 training is for advanced users and requires prior cleanroom tool competency.
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==== Prerequisites ====
* You must be at least a Master student or signed up for a long term (>6 months) project to be allowed to use the tool.
* Elionix is a high level tool. Make sure you are already trained to:
** Enter the cleanroom
** Use the microscope, spinner, asher

==== Training ====
* You'll need 4 sessions to get trained on this tool.
** Session 1 ( 1 hr.) - teaches you how to load/unload the sample and how to condition the beam.
** Session 2 ( 3 hr.) - involves exposing alignment marks and test patterns (any design: preferably one half of the overlay ,so to understand alignment later ).
** Session 3 ( 3 hr.) - involves using the exposed alignment marks for marker registration and exposing the 2nd pattern (i.e. the 2nd half of the overlay pattern).
** Session 4 involves exposing a "real" pattern on a "real" chip on your own to gain access.

==== Preparation ====
Before any training slots are booked on the tool you'll need all of the following prepared:
* Shadow senior users on the tool 2-3 times.
* Chip (comfortable to handle) spin coated with resist. This chip will be used for sessions 1 & 2. Please be aware of the coating and baking parameters for the resist.
* Any test design is preferred which has marks, overlay patterns that you will use to test alignment precision between two lithography steps. A Vernier pattern is commonly used. Feel free to test your ideas. Make sure you have something for both ''x'' and ''y'' directions. If you don't know how to start, check the [[Design template for EBL]].
* Convert your design files into the Elionix exposure format .co7. This can be done using Beamer in 4th floor design computers.
* Make sure all write fields are entirely in the positive coordinate space.
* Make sure neither exposure will take longer than 60 minutes at 500 pA current and dose of 1000 uC/cm2.
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=== Elionix F-125 (125 kV at QuanTech) ===
More information will be provided shortly.
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=== Heidelberg upg501 ===
Prepare your design file and coated chip before requesting Heidelberg upg501 training.
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* Have a design file ready. GDS, DXF or CIF format works fine. Make sure you are familiar with the design before your actual session.
* Have a chip spin coated with an appropriate photoresist before the training session.
** The photoresist is sensitive to white light. Use the yellow filter on the microscopes. The light source in the both scribers is white and will already expose your resist.
* What is your project alias? If unsure, contact your supervisor first.

Before the training session:
* Watch the instruction video and read the standard operating procedure on the [[Heidelberg µPG 501|Heidelberg µPG 501 tool page]], shadow the tool with your group members, and ask for a sign-off session.
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== Characterization ==
'''Request Training for Characterization Tools via''' [https://forms.office.com/e/b3PDKjsZ88?origin=lprLink NBI-Cleanroom Training Request Form].

=== Bruker Dimension Icon AFM ===
Bruker Dimension Icon is an atomic force microscope used for high-resolution and accurate measurements of surface topography.
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* AFM training is offered upon user request and is typically conducted on a one-on-one basis. Completion of the training usually requires 2-3 sessions, with each session lasting approximately 2-3 hours.
* Prior to attending the training sessions, users are expected to review and familiarize themselves with the AFM operating procedures ([[Bruker Dimension Icon AFM|AFM]]). Users are encouraged to shadow an authorized user on the instrument 2-3 times before starting formal training. In addition, having a suitable sample prepared in advance of the training is highly recommended.
* Where appropriate and subject to staff availability and project timelines, a staff member may also assist in carrying out user projects.
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=== JEOL 7800F SEM-EDS===
JEOL 7800F is a field-emission scanning electron microscope used for high-resolution imaging of surface morphology and compositional analysis.
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* SEM-EDS training is offered upon user request and is typically conducted on a one-on-one basis. Completion of the training usually requires 2-3 sessions, with each session lasting approximately 2-3 hours.
* Prior to attending the training sessions, users are expected to review and familiarize themselves with the SEM operating procedures ([[JEOL 7800F|JEOL JSM-7800F]]). Users are encouraged to shadow an authorized user on the instrument 2-3 times before starting formal training. In addition, having a suitable sample prepared in advance of the training is highly recommended.
* Where appropriate and subject to staff availability and project timelines, a staff member may also assist in carrying out user projects.
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=== JEOL 7800F Prime SEM ===
JEOL 7800F Prime is a field-emission scanning electron microscope used for high-resolution imaging of surface morphology.
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* SEM training is offered upon user request and is typically conducted on a one-on-one basis. Completion of the training usually requires 2-3 sessions, with each session lasting approximately 2-3 hours.
* Prior to attending the training sessions, users are expected to review and familiarize themselves with the SEM operating procedures ([[JEOL 7800F|JEOL JSM-7800F]]). Users are encouraged to shadow an authorized user on the instrument 2-3 times before starting formal training. In addition, having a suitable sample prepared in advance of the training is highly recommended.
* Where appropriate and subject to staff availability and project timelines, a staff member may also assist in carrying out user projects.
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=== Thermo Fisher Scientific Talos F200i S/TEM ===
Talos F200i is a versatile 200-kV field-emission (scanning) transmission electron microscope designed for high-throughput, high-resolution materials characterization.
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* This instrument is classified as a high-level tool, and training is selective. Users are required to have prior experience with TEM/STEM before being considered for training. Cleanroom staff reserves the right to decline a training request if the prerequisite requirements are not met.
* Where appropriate and subject to staff availability and project timelines, a staff member may also assist in carrying out user projects.
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=== Raith e-Line ===
Bring a prepared design package for sessions 1 and 2, including alignment and overlay test patterns.
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* A design (gds, dxf, cif) for sessions 1 & 2 with:
** 4 alignment crosses (find out what marks work on the tool from your sub-group).
** Something to break the symmetry so you can tell chip orientation with your bare eye.
** A pattern that you will use to test overlay (alignment between two lithography steps). A Vernier pattern is commonly used. Feel free to test your ideas.
** Something creative, somethin fun :) This is an exercise in learning CAD as well.
* What is your project alias? If unsure, contact your supervisor first.
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=== Woollam alpha-SE Ellipsometer ===
More information will be provided shortly.
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=== Filmetrics reflectometer ===
More information will be provided shortly.
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== Thin Film Deposition ==

=== Plassys Evaporator ===
A physical vapour deposition tool of aluminium via e-beam evaporation for Josephson junction fabrication.

Apply for training via the [https://forms.office.com/e/b3PDKjsZ88?origin=lprLink NBI-Cleanroom Training Request Form].
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====Confirmation====
Once you sign up via the form, the tool responsible will contact you for the following details:
* Confirm that you have a sample ready.
* Confirm that you have shadowed your colleagues using the tool 2-3 times.
* Specify process steps you want to run
*: Materials, thickness, tilt, milling, oxidation
* The name of the recipe.
==== Restrictions====
* Only Si and sapphire samples are allowed in the chamber.
==== Training ====
* You'll need 2 sessions to get trained on this tool.
** Session 1 (2 hr.) - teaches you how to load/unload the sample and how to run a recipe.
** Session 2 (2 hr.) - sign off session
'''The instructor has the right to ask for additional training sessions.'''
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=== AJA1 and AJA2: metallization, sputtering or ion milling ===
Two nearly identical Orion physical vapour deposition (PVD) systems from AJA International for sputtering and e-beam evaporation, and substrate milling.

Apply for training via the [https://forms.office.com/e/b3PDKjsZ88?origin=lprLink NBI-Cleanroom Training Request Form].
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====Confirmation====
Once you sign up via the form, the tool responsible will contact you for the following details:
* Confirm that you have a sample ready.
* Confirm that you have shadowed your colleagues using the tool 2-3 times.
* Specify process steps you want to run
*: Materials, thickness, tilt, milling, oxidation
* Which tool do you want to use?
** '''AJA1'''
*** e-beam materials: Ti, Al, Au, SiOx, Pt, Ti, Ge
*** DC sputtering: Nb2Ti, Ti
*** DC Kaufman milling
*** Oxidation
*** Stage rotation, no stage cooling
** '''AJA2'''
*** e-beam materials: Ti, Al, Au, Cr, Pt, Pd
*** DC sputtering: Ti
*** RF sputtering: Ti, Nb2Ti
*** RF milling
*** Stage cooling, no stage rotation
* Specify the process steps you want to run.
*: Either the name of the recipe or all required process parameters.

===Before the training session===
* Watch the instruction video(s)
*Read the standard operating procedure on the [[AJA Systems|AJA Systems tool page]].

==== Training ====
* You'll need 2 sessions to get trained on this tool.
** Session 1 ( 2 hr.) - teaches you how to load/unload the sample and how to run a recipe.
** Session 2 ( 2 hr.) - sign off session
The instructor has the right to ask for additional training sessions.
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=== ALD1 and ALD2===
Two nearly identical Savannah S100-like systems are used for atomic layer deposition.

Apply for training via the [https://forms.office.com/e/b3PDKjsZ88?origin=lprLink NBI-Cleanroom Training Request Form].
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====Confirmation====
Once you sign up via the form, the tool responsible will contact you for the following details:
* Confirm that you have a sample ready.
* Confirm that you have shadowed your colleagues using the tool 2-3 times.
* Which tool do you want to use?
** '''ALD1''' available grown oxides: AlOx, HfOx, TiOx
** '''ALD2''' available grown oxides: AlOx, HfOx, ZrOx
** In ALD1, you are allowed to use resist for lift-off processes. In ALD2, '''you are not allowed to use a sample with resist on'''.
* Specify the process steps you want to run.
** Either the name of the recipe or all required process parameters.
====Before the training session====
* Watch the instruction video(s)
* Study the [[Atomic layer deposition|ALD principles]]
* Read the standard operating procedure on the [[Cambridge ALD|ALD tool page]].
====Training====
You'll need 2 sessions to get trained on this tool.
* Session 1 (30 mins) - teaches you how to load/unload the sample and how to run a recipe.
* Session 2 (30 mins) - sign off session
*: '''Note:''' An ALD session can have a long duration (often >12 hours). A usual training starts in the afternoon (load, setup, prepare recipe, run), and the film will grow throughout the evening. The next day, the user and the instructor will finish the training session (unloading).
'''The instructor has the right to ask for additional training sessions.'''
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== Packaging ==

=== F&S autobonder ===
A semi-automatic bonder to bond semiconductor substrates to PCB daughterboards from F&S Bondtec.

Apply for training via the [https://forms.office.com/e/b3PDKjsZ88?origin=lprLink NBI-Cleanroom Training Request Form].
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====Confirmation====
Once you sign up via the form, the tool responsible will contact you for the following details:
* Confirm that you have a '''chip''' ready for bonding.
* Confirm that you have shadowed your colleagues using the tool 2-3 times.
* You must know which '''daughterboard''' you will use for bonding (CPH, QBOARD1,2, QCAGE, Sydney, IC, custom).
* You must know what material you use to '''mount''' the chip to the daughterboard (mechanical clamping, silver paint, PMMA, other).
* Confirm that you have prepared a '''bonding schematic''' .
* By default, this bonder is using Al wire. You can request a special training if you want to use Au wire, but be aware it can be challenging.
*: Users are more likely to use the [[K&S bonder| K&S manual bonder]] for Au wire bonding.
* Specify the name of the recipe.
====Before the training session====
* Read the standard operating procedure on the [[FS bonder| FS bonder tool page]]
* Verify with one of your colleagues that your bonding schematic is correct.
==== Training ====
You'll need 2 sessions to get trained on this tool.
* Session 1 (2 hr.) - teaches you how to load/unload the sample and how to run a recipe.
* Session 2 (2 hr.) - sign off session
'''The instructor has the right to ask for additional training sessions.'''
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=== Manual bonder ===
Apply for sign-off via the [https://forms.office.com/e/b3PDKjsZ88?origin=lprLink NBI-Cleanroom Training Request Form].

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* Cleanroom doesn't train users in this tool.
* You need to get trained within your research group.
* Cleanroom will provide a sign-off session to ensure safety
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== Miscellaneous ==

=== Micromanipulator ===
Apply for sign-off via the [https://forms.office.com/e/b3PDKjsZ88?origin=lprLink NBI-Cleanroom Training Request Form].

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* Cleanroom doesn't train users in this tool.
* You need to get trained within your research group.
* Cleanroom will provide a sign-off session to ensure safety and verify that the user is aware of the dangers of working with nanoparticles.
==== Before you start your training sessions====
* You need to carefully read and familiarise yourself with the risks of exposure while [[Working with nanowires and nanotubes]]
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[[Category:Tools]]

Training

2026-06-29T11:43:34Z

Chenglee: /* Cleanroom General Introduction */

Before submitting a training request, please review the prerequisites for each instrument listed below.

'''Starting in July 2026, a standardized training request form will be introduced. The new system will allow users to request training for multiple instruments using a single form''' ([https://forms.office.com/e/b3PDKjsZ88?origin=lprLink NBI-Cleanroom Training Request Form]). '''Please only request training for instruments that require immediate access'''. Following submission of the request form, email communication will continue to be used for scheduling and coordinating training activities. The Cleanroom staff will acknowledge and respond to training requests within 1-2 working days.

Please note that access to the Cleanroom, tool laboratories and individual instruments can only be granted after the required safety instructions and instrument training have been completed and approved by the Cleanroom staff. Upon successful completion of the training, users will be granted booking privileges through the Cleanroom Booking System.

To ensure continued competency and safe operation, booking privileges and laboratory access may expire after a period of inactivity (typically '''90 days''') for a given instrument or Cleanroom usage. In such cases, users will be required to complete a refresher training session before access can be reinstated.

== Cleanroom General (Safety) Introduction ==
Before attending the training session, all users must read and familiarize themselves with the relevant safety information ([[Safety]]). ''Expand to view more information''.
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* The introductory session is scheduled from 09:15 to 15:00.
* Training sessions are conducted in group of 3-4 participants. Once a training date has been proposed by the Cleanroom staff, participants are required to confirm their attendance by email ([mailto:cleanroom@nbi.ku.dk cleanroom@nbi.ku.dk]).
* If fewer than 3 participants are available for a scheduled session, an alternative training date may be proposed. If a session reaches its maximum capacity of 4 participants, additional users will be placed on a waiting list and offered the next available training opportunity.
* Please identify a superuser from your research group who will serve as your mentor during your first few weeks of working in the Cleanroom.
* The designated mentor is responsible for guiding you through the standard procedures and best practices after the Cleanroom General Introduction.
* Once the mentor has determined that you are competent to work independently, they must notify the Cleanroom team via email.
* Full access to the Cleanroom laboratories will only be granted after the Cleanroom team has received this confirmation.
* Standard Training Program:
** 09:15-10:30: Cleanroom introduction
** Coffee break
** 10:45-12:00: Asher, spinners and optical microscopes
** Lunch break
** 13:00-14:00: Practical information
** 14:00-15:00: Q&A and account setup
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== Chemical Handling==

=== HF Safety Training ===
Before attending the training session, all users must read and familiarize themselves with the relevant safety information ([[Safety]]). ''Expand to view more information''.
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* The HF Safety introduction is offered on a monthly basis.
* Training sessions are conducted in groups of up to 4 participants.
* Once a training date has been proposed by the Cleanroom staff, participants must confirm their attendance by email.
* Users are required to complete the HF Handling Questionnaire (that you will receive from a Cleanroom staff) and submit it to the instructor during the training session.
* Each user must also designate an HF buddy. This person must be an authorized Cleanroom user with valid HF access and training.
* As HF handling involves significant safety risks, strict compliance to all safety requirements is mandatory.
* Users are expected to arrive fully prepared for the training session.
* The instructor reserves the right to suspend or terminate the training if a participant has not completed the required preparation or does not demonstrate an adequate understanding of the relevant safety procedures.
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== Lithography ==
'''Request Training for Lithography Tools via''' [https://forms.office.com/e/b3PDKjsZ88?origin=lprLink NBI-Cleanroom Training Request Form].

=== Elionix 7000 (100 kV) ===
Elionix 7000 training is for advanced users and requires prior cleanroom tool competency.
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==== Prerequisites ====
* You must be at least a Master student or signed up for a long term (>6 months) project to be allowed to use the tool.
* Elionix is a high level tool. Make sure you are already trained to:
** Enter the cleanroom
** Use the microscope, spinner, asher

==== Training ====
* You'll need 4 sessions to get trained on this tool.
** Session 1 ( 1 hr.) - teaches you how to load/unload the sample and how to condition the beam.
** Session 2 ( 3 hr.) - involves exposing alignment marks and test patterns (any design: preferably one half of the overlay ,so to understand alignment later ).
** Session 3 ( 3 hr.) - involves using the exposed alignment marks for marker registration and exposing the 2nd pattern (i.e. the 2nd half of the overlay pattern).
** Session 4 involves exposing a "real" pattern on a "real" chip on your own to gain access.

==== Preparation ====
Before any training slots are booked on the tool you'll need all of the following prepared:
* Shadow senior users on the tool 2-3 times.
* Chip (comfortable to handle) spin coated with resist. This chip will be used for sessions 1 & 2. Please be aware of the coating and baking parameters for the resist.
* Any test design is preferred which has marks, overlay patterns that you will use to test alignment precision between two lithography steps. A Vernier pattern is commonly used. Feel free to test your ideas. Make sure you have something for both ''x'' and ''y'' directions. If you don't know how to start, check the [[Design template for EBL]].
* Convert your design files into the Elionix exposure format .co7. This can be done using Beamer in 4th floor design computers.
* Make sure all write fields are entirely in the positive coordinate space.
* Make sure neither exposure will take longer than 60 minutes at 500 pA current and dose of 1000 uC/cm2.
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=== Elionix F-125 (125 kV at QuanTech) ===
More information will be provided shortly.
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=== Heidelberg upg501 ===
Prepare your design file and coated chip before requesting Heidelberg upg501 training.
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* Have a design file ready. GDS, DXF or CIF format works fine. Make sure you are familiar with the design before your actual session.
* Have a chip spin coated with an appropriate photoresist before the training session.
** The photoresist is sensitive to white light. Use the yellow filter on the microscopes. The light source in the both scribers is white and will already expose your resist.
* What is your project alias? If unsure, contact your supervisor first.

Before the training session:
* Watch the instruction video and read the standard operating procedure on the [[Heidelberg µPG 501|Heidelberg µPG 501 tool page]], shadow the tool with your group members, and ask for a sign-off session.
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== Characterization ==
'''Request Training for Characterization Tools via''' [https://forms.office.com/e/b3PDKjsZ88?origin=lprLink NBI-Cleanroom Training Request Form].

=== Bruker Dimension Icon AFM ===
Bruker Dimension Icon is an atomic force microscope used for high-resolution and accurate measurements of surface topography.
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* AFM training is offered upon user request and is typically conducted on a one-on-one basis. Completion of the training usually requires 2-3 sessions, with each session lasting approximately 2-3 hours.
* Prior to attending the training sessions, users are expected to review and familiarize themselves with the AFM operating procedures ([[Bruker Dimension Icon AFM|AFM]]). Users are encouraged to shadow an authorized user on the instrument 2-3 times before starting formal training. In addition, having a suitable sample prepared in advance of the training is highly recommended.
* Where appropriate and subject to staff availability and project timelines, a staff member may also assist in carrying out user projects.
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=== JEOL 7800F SEM-EDS===
JEOL 7800F is a field-emission scanning electron microscope used for high-resolution imaging of surface morphology and compositional analysis.
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* SEM-EDS training is offered upon user request and is typically conducted on a one-on-one basis. Completion of the training usually requires 2-3 sessions, with each session lasting approximately 2-3 hours.
* Prior to attending the training sessions, users are expected to review and familiarize themselves with the SEM operating procedures ([[JEOL 7800F|JEOL JSM-7800F]]). Users are encouraged to shadow an authorized user on the instrument 2-3 times before starting formal training. In addition, having a suitable sample prepared in advance of the training is highly recommended.
* Where appropriate and subject to staff availability and project timelines, a staff member may also assist in carrying out user projects.
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=== JEOL 7800F Prime SEM ===
JEOL 7800F Prime is a field-emission scanning electron microscope used for high-resolution imaging of surface morphology.
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* SEM training is offered upon user request and is typically conducted on a one-on-one basis. Completion of the training usually requires 2-3 sessions, with each session lasting approximately 2-3 hours.
* Prior to attending the training sessions, users are expected to review and familiarize themselves with the SEM operating procedures ([[JEOL 7800F|JEOL JSM-7800F]]). Users are encouraged to shadow an authorized user on the instrument 2-3 times before starting formal training. In addition, having a suitable sample prepared in advance of the training is highly recommended.
* Where appropriate and subject to staff availability and project timelines, a staff member may also assist in carrying out user projects.
</div>
</div>

=== Thermo Fisher Scientific Talos F200i S/TEM ===
Talos F200i is a versatile 200-kV field-emission (scanning) transmission electron microscope designed for high-throughput, high-resolution materials characterization.
<div class="mw-collapsible mw-collapsed" style="border:1px solid #b7e1c1; border-left:6px solid #2a9d5b; background:#f2fbf5; border-radius:6px; margin:0.45em 0 1.0em; padding:0.55em 0.75em 0.55em;">
<div class="mw-collapsible-toggle" style="text-align:right; margin:-0.62em 0 0.25em; line-height:1;">'''Expand'''</div>
<div class="mw-collapsible-content">
* This instrument is classified as a high-level tool, and training is selective. Users are required to have prior experience with TEM/STEM before being considered for training. Cleanroom staff reserves the right to decline a training request if the prerequisite requirements are not met.
* Where appropriate and subject to staff availability and project timelines, a staff member may also assist in carrying out user projects.
</div>
</div>

=== Raith e-Line ===
Bring a prepared design package for sessions 1 and 2, including alignment and overlay test patterns.
<div class="mw-collapsible mw-collapsed" style="border:1px solid #b7e1c1; border-left:6px solid #2a9d5b; background:#f2fbf5; border-radius:6px; margin:0.45em 0 1.0em; padding:0.55em 0.75em 0.55em;">
<div class="mw-collapsible-toggle" style="text-align:right; margin:-0.62em 0 0.25em; line-height:1;">'''Expand'''</div>
<div class="mw-collapsible-content">
* A design (gds, dxf, cif) for sessions 1 & 2 with:
** 4 alignment crosses (find out what marks work on the tool from your sub-group).
** Something to break the symmetry so you can tell chip orientation with your bare eye.
** A pattern that you will use to test overlay (alignment between two lithography steps). A Vernier pattern is commonly used. Feel free to test your ideas.
** Something creative, somethin fun :) This is an exercise in learning CAD as well.
* What is your project alias? If unsure, contact your supervisor first.
</div>
</div>

=== Woollam alpha-SE Ellipsometer ===
More information will be provided shortly.
<div class="mw-collapsible mw-collapsed" style="border:1px solid #b7e1c1; border-left:6px solid #2a9d5b; background:#f2fbf5; border-radius:6px; margin:0.45em 0 1.0em; padding:0.55em 0.75em 0.55em;">
<div class="mw-collapsible-toggle" style="text-align:right; margin:-0.62em 0 0.25em; line-height:1;">'''Expand'''</div>
<div class="mw-collapsible-content">
</div>
</div>

=== Filmetrics reflectometer ===
More information will be provided shortly.
<div class="mw-collapsible mw-collapsed" style="border:1px solid #b7e1c1; border-left:6px solid #2a9d5b; background:#f2fbf5; border-radius:6px; margin:0.45em 0 1.0em; padding:0.55em 0.75em 0.55em;">
<div class="mw-collapsible-toggle" style="text-align:right; margin:-0.62em 0 0.25em; line-height:1;">'''Expand'''</div>
<div class="mw-collapsible-content">
</div>
</div>

== Thin Film Deposition ==

=== Plassys Evaporator ===
A physical vapour deposition tool of aluminium via e-beam evaporation for Josephson junction fabrication.

Apply for training via the [https://forms.office.com/e/b3PDKjsZ88?origin=lprLink NBI-Cleanroom Training Request Form].
<div class="mw-collapsible mw-collapsed" style="border:1px solid #b7e1c1; border-left:6px solid #2a9d5b; background:#f2fbf5; border-radius:6px; margin:0.45em 0 1.0em; padding:0.55em 0.75em 0.55em;">
<div class="mw-collapsible-toggle" style="text-align:right; margin:-0.62em 0 0.25em; line-height:1;">'''Expand'''</div>
<div class="mw-collapsible-content">
====Confirmation====
Once you sign up via the form, the tool responsible will contact you for the following details:
* Confirm that you have a sample ready.
* Confirm that you have shadowed your colleagues using the tool 2-3 times.
* Specify process steps you want to run
*: Materials, thickness, tilt, milling, oxidation
* The name of the recipe.
==== Restrictions====
* Only Si and sapphire samples are allowed in the chamber.
==== Training ====
* You'll need 2 sessions to get trained on this tool.
** Session 1 (2 hr.) - teaches you how to load/unload the sample and how to run a recipe.
** Session 2 (2 hr.) - sign off session
'''The instructor has the right to ask for additional training sessions.'''
</div>
</div>

=== AJA1 and AJA2: metallization, sputtering or ion milling ===
Two nearly identical Orion physical vapour deposition (PVD) systems from AJA International for sputtering and e-beam evaporation, and substrate milling.

Apply for training via the [https://forms.office.com/e/b3PDKjsZ88?origin=lprLink NBI-Cleanroom Training Request Form].
<div class="mw-collapsible mw-collapsed" style="border:1px solid #b7e1c1; border-left:6px solid #2a9d5b; background:#f2fbf5; border-radius:6px; margin:0.45em 0 1.0em; padding:0.55em 0.75em 0.55em;">
<div class="mw-collapsible-toggle" style="text-align:right; margin:-0.62em 0 0.25em; line-height:1;">'''Expand'''</div>
<div class="mw-collapsible-content">
====Confirmation====
Once you sign up via the form, the tool responsible will contact you for the following details:
* Confirm that you have a sample ready.
* Confirm that you have shadowed your colleagues using the tool 2-3 times.
* Specify process steps you want to run
*: Materials, thickness, tilt, milling, oxidation
* Which tool do you want to use?
** '''AJA1'''
*** e-beam materials: Ti, Al, Au, SiOx, Pt, Ti, Ge
*** DC sputtering: Nb2Ti, Ti
*** DC Kaufman milling
*** Oxidation
*** Stage rotation, no stage cooling
** '''AJA2'''
*** e-beam materials: Ti, Al, Au, Cr, Pt, Pd
*** DC sputtering: Ti
*** RF sputtering: Ti, Nb2Ti
*** RF milling
*** Stage cooling, no stage rotation
* Specify the process steps you want to run.
*: Either the name of the recipe or all required process parameters.

===Before the training session===
* Watch the instruction video(s)
*Read the standard operating procedure on the [[AJA Systems|AJA Systems tool page]].

==== Training ====
* You'll need 2 sessions to get trained on this tool.
** Session 1 ( 2 hr.) - teaches you how to load/unload the sample and how to run a recipe.
** Session 2 ( 2 hr.) - sign off session
The instructor has the right to ask for additional training sessions.
</div>
</div>

=== ALD1 and ALD2===
Two nearly identical Savannah S100-like systems are used for atomic layer deposition.

Apply for training via the [https://forms.office.com/e/b3PDKjsZ88?origin=lprLink NBI-Cleanroom Training Request Form].
<div class="mw-collapsible mw-collapsed" style="border:1px solid #b7e1c1; border-left:6px solid #2a9d5b; background:#f2fbf5; border-radius:6px; margin:0.45em 0 1.0em; padding:0.55em 0.75em 0.55em;">
<div class="mw-collapsible-toggle" style="text-align:right; margin:-0.62em 0 0.25em; line-height:1;">'''Expand'''</div>
<div class="mw-collapsible-content">
====Confirmation====
Once you sign up via the form, the tool responsible will contact you for the following details:
* Confirm that you have a sample ready.
* Confirm that you have shadowed your colleagues using the tool 2-3 times.
* Which tool do you want to use?
** '''ALD1''' available grown oxides: AlOx, HfOx, TiOx
** '''ALD2''' available grown oxides: AlOx, HfOx, ZrOx
** In ALD1, you are allowed to use resist for lift-off processes. In ALD2, '''you are not allowed to use a sample with resist on'''.
* Specify the process steps you want to run.
** Either the name of the recipe or all required process parameters.
====Before the training session====
* Watch the instruction video(s)
* Study the [[Atomic layer deposition|ALD principles]]
* Read the standard operating procedure on the [[Cambridge ALD|ALD tool page]].
====Training====
You'll need 2 sessions to get trained on this tool.
* Session 1 (30 mins) - teaches you how to load/unload the sample and how to run a recipe.
* Session 2 (30 mins) - sign off session
*: '''Note:''' An ALD session can have a long duration (often >12 hours). A usual training starts in the afternoon (load, setup, prepare recipe, run), and the film will grow throughout the evening. The next day, the user and the instructor will finish the training session (unloading).
'''The instructor has the right to ask for additional training sessions.'''
</div>
</div>

== Packaging ==

=== F&S autobonder ===
A semi-automatic bonder to bond semiconductor substrates to PCB daughterboards from F&S Bondtec.

Apply for training via the [https://forms.office.com/e/b3PDKjsZ88?origin=lprLink NBI-Cleanroom Training Request Form].
<div class="mw-collapsible mw-collapsed" style="border:1px solid #b7e1c1; border-left:6px solid #2a9d5b; background:#f2fbf5; border-radius:6px; margin:0.45em 0 1.0em; padding:0.55em 0.75em 0.55em;">
<div class="mw-collapsible-toggle" style="text-align:right; margin:-0.62em 0 0.25em; line-height:1;">'''Expand'''</div>
<div class="mw-collapsible-content">
====Confirmation====
Once you sign up via the form, the tool responsible will contact you for the following details:
* Confirm that you have a '''chip''' ready for bonding.
* Confirm that you have shadowed your colleagues using the tool 2-3 times.
* You must know which '''daughterboard''' you will use for bonding (CPH, QBOARD1,2, QCAGE, Sydney, IC, custom).
* You must know what material you use to '''mount''' the chip to the daughterboard (mechanical clamping, silver paint, PMMA, other).
* Confirm that you have prepared a '''bonding schematic''' .
* By default, this bonder is using Al wire. You can request a special training if you want to use Au wire, but be aware it can be challenging.
*: Users are more likely to use the [[K&S bonder| K&S manual bonder]] for Au wire bonding.
* Specify the name of the recipe.
====Before the training session====
* Read the standard operating procedure on the [[FS bonder| FS bonder tool page]]
* Verify with one of your colleagues that your bonding schematic is correct.
==== Training ====
You'll need 2 sessions to get trained on this tool.
* Session 1 (2 hr.) - teaches you how to load/unload the sample and how to run a recipe.
* Session 2 (2 hr.) - sign off session
'''The instructor has the right to ask for additional training sessions.'''
</div>
</div>

=== Manual bonder ===
Apply for sign-off via the [https://forms.office.com/e/b3PDKjsZ88?origin=lprLink NBI-Cleanroom Training Request Form].

<div class="mw-collapsible mw-collapsed" style="border:1px solid #b7e1c1; border-left:6px solid #2a9d5b; background:#f2fbf5; border-radius:6px; margin:0.45em 0 1.0em; padding:0.55em 0.75em 0.55em;">
<div class="mw-collapsible-toggle" style="text-align:right; margin:-0.62em 0 0.25em; line-height:1;">'''Expand'''</div>
<div class="mw-collapsible-content">
* Cleanroom doesn't train users in this tool.
* You need to get trained within your research group.
* Cleanroom will provide a sign-off session to ensure safety
</div>
</div>

== Miscellaneous ==

=== Micromanipulator ===
Apply for sign-off via the [https://forms.office.com/e/b3PDKjsZ88?origin=lprLink NBI-Cleanroom Training Request Form].

<div class="mw-collapsible mw-collapsed" style="border:1px solid #b7e1c1; border-left:6px solid #2a9d5b; background:#f2fbf5; border-radius:6px; margin:0.45em 0 1.0em; padding:0.55em 0.75em 0.55em;">
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<div class="mw-collapsible-content">
* Cleanroom doesn't train users in this tool.
* You need to get trained within your research group.
* Cleanroom will provide a sign-off session to ensure safety and verify that the user is aware of the dangers of working with nanoparticles.
==== Before you start your training sessions====
* You need to carefully read and familiarise yourself with the risks of exposure while [[Working with nanowires and nanotubes]]
</div>
</div>

[[Category:Tools]]

Main Page

2026-06-29T11:38:39Z

Chenglee: /* NEWS: NBI-Cleanroom Training Request Form */

'''Welcome to the NBI Cleanroom wiki!'''

This site contains public information for the users of the cleanroom and related facilities. All items are available '''without login'''. Internal information that should not be disclosed can be posted at the password protected [https://wiki.nbi.ku.dk/qdevwiki/Main_Page QDev wiki].

{| style="width: 60%;" align="center"
|- style="text-align:center;"
|[[File:Tools_button.png|100px|link=Tools|Tools]] || [[File:Safety_button.png|100px|link=Safety|Safety]] || [[File:Fabrication_button.png|100px|link=Fabrication|Fabrication]] || [[File:Calendar_button.png|100px|link=http://cleanroom.brickhost.com/|Calendar]] || [[File:Training ico.png|100px|link=Training|Training]] || [[File:Info_button.png|100px|link=About|About]] || [[File:MBE.png|90px|link=MBE|MBE]] || [[File:sustain.png|90px|link=Sustainability|Sustainability]]
|- style="text-align:center;"
| Tools || Safety || Fabrication || Booking || Training || About || MBE || Sustainability
|}

==NEWS: NBI-Cleanroom Training Request Form==
Starting in July 2026, a standardized training request form will be introduced. The new system will allow users to request training for multiple instruments using a single form ([https://forms.office.com/e/b3PDKjsZ88?origin=lprLink NBI-Cleanroom Training Request Form]). Following submission of the request form, email communication will continue to be used for scheduling and coordinating training activities.

==Current tool status==

{| cellspacing=0px style="text-align: left;"
|-
| style="text-align:right; padding-right:6px;" | [[Heidelberg µPG 501|Heidelberg LED writer]]
| style="background-color: #c6e0b4" | All good!
|-
| style="text-align:right; padding-right:6px;" | [[Raith eLine|Raith eLine 30 kV]]
| style="background-color: #c6e0b4" | All good!
|-
| style="text-align:right; padding-right:6px;" | [[Elionix_7000|Elionix 7000 100 kV]]
| style="background-color: #ff9f9f" | Service: Blanking aperture. Expected recovery date: Until further notice.
|-
| style="text-align:right; padding-right:6px;" | [[Elionix_F-125|Elionix F-125 125 kV]]
| style="background-color: #c6e0b4" | All good!
|-
| style="padding-bottom:6px;" |
|-
| style="text-align:right; padding-right:6px;" | [[AJA systems|AJA1]]
| style="background-color: #FFBF00" | Minor issue with the on/off button of the Carrera FerroTech. Please contact cleanroom if the button isn't responding.
|-
| style="text-align:right; padding-right:6px;" | [[AJA systems|AJA2]]
| style="background-color: #c6e0b4" | All good!
|-
| style="text-align:right; padding-right:6px;" | [[Plassys Evaporator]]
| style="background-color: #c6e0b4" | All good!
|-
| style="text-align:right; padding-right:6px;" | [[E-Gun evaporator]]
| style="background-color: #c6e0b4" | All good! The chamber is dedicated to In
|-
| style="text-align:right; padding-right:6px;" | [[Cambridge ALD|ALD1]]
| style="background-color: #c6e0b4" | All good!
|-
| style="text-align:right; padding-right:6px;" | [[Cambridge ALD|ALD2]]
| style="background-color: #c6e0b4" | All good!
|-
| style="padding-bottom:6px;" |
|-
| style="text-align:right; padding-right:6px;" | [[FS bonder]]
| style="background-color: #c6e0b4" | All good!
|-
| style="text-align:right; padding-right:6px;" | [[K&S bonder]]
| style="background-color: #c6e0b4" | All good!
|-
| style="text-align:right; padding-right:6px;" | [[Loomis scriber]]
| style="background-color: #c6e0b4" | All good!
|-
| style="text-align:right; padding-right:6px;" | [[Dicing saw]]
| style="background-color: #c6e0b4" | All good!
|-
| style="padding-bottom:6px;" |
|-
| style="text-align:right; padding-right:6px;" | [[Bruker Dimension Icon AFM|AFM]]
| style="background-color: #c6e0b4" | All good!
|-
| style="text-align:right; padding-right:6px;" | [[JEOL 7800F|JEOL JSM-7800F]]
| style="background-color: #c6e0b4" | All good!
|-
| style="text-align:right; padding-right:6px;" | [[JEOL 7800F|JEOL JSM-7800F prime]]
| style="background-color: #c6e0b4" | All good!
|-
| style="text-align:right; padding-right:6px;" | [[Talos F200i S/TEM|TEM]]
| style="background-color: #FFBF00" | Damper issues affecting probe stability. Expected recovery date: end-of-June 2026.
|}

''List updated: Fri 12 Jun 2026''

Training

2026-06-29T11:35:59Z

Chenglee: /* Lithography */

Before submitting a training request, please review the prerequisites for each instrument listed below.

'''Starting in July 2026, a standardized training request form will be introduced. The new system will allow users to request training for multiple instruments using a single form''' ([https://forms.office.com/e/b3PDKjsZ88?origin=lprLink NBI-Cleanroom Training Request Form]). '''Please only request training for instruments that require immediate access'''. Following submission of the request form, email communication will continue to be used for scheduling and coordinating training activities. The Cleanroom staff will acknowledge and respond to training requests within 1-2 working days.

Please note that access to the Cleanroom, tool laboratories and individual instruments can only be granted after the required safety instructions and instrument training have been completed and approved by the Cleanroom staff. Upon successful completion of the training, users will be granted booking privileges through the Cleanroom Booking System.

To ensure continued competency and safe operation, booking privileges and laboratory access may expire after a period of inactivity (typically '''90 days''') for a given instrument or Cleanroom usage. In such cases, users will be required to complete a refresher training session before access can be reinstated.

== Cleanroom General Introduction ==
Before attending the training session, all users must read and familiarize themselves with the relevant safety information ([[Safety]]). ''Expand to view more information''.
<div class="mw-collapsible mw-collapsed" style="border:1px solid #d8dde3; border-left:6px solid #72777d; background:#f8f9fa; border-radius:6px; margin:0.45em 0 1.0em; padding:0.55em 0.75em 0.55em;">
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<div class="mw-collapsible-content">
* The introductory session is scheduled from 09:15 to 15:00.
* Training sessions are conducted in group of 3-4 participants. Once a training date has been proposed by the Cleanroom staff, participants are required to confirm their attendance by email ([mailto:cleanroom@nbi.ku.dk cleanroom@nbi.ku.dk]).
* If fewer than 3 participants are available for a scheduled session, an alternative training date may be proposed. If a session reaches its maximum capacity of 4 participants, additional users will be placed on a waiting list and offered the next available training opportunity.
* Please identify a superuser from your research group who will serve as your mentor during your first few weeks of working in the Cleanroom.
* The designated mentor is responsible for guiding you through the standard procedures and best practices after the Cleanroom General Introduction.
* Once the mentor has determined that you are competent to work independently, they must notify the Cleanroom team via email.
* Full access to the Cleanroom laboratories will only be granted after the Cleanroom team has received this confirmation.
* Standard Training Program:
** 09:15-10:30: Cleanroom introduction
** Coffee break
** 10:45-12:00: Asher, spinners and optical microscopes
** Lunch break
** 13:00-14:00: Practical information
** 14:00-15:00: Q&A and account setup
</div>
</div>

== Chemical Handling==

=== HF Safety Training ===
Before attending the training session, all users must read and familiarize themselves with the relevant safety information ([[Safety]]). ''Expand to view more information''.
<div class="mw-collapsible mw-collapsed" style="border:1px solid #d8dde3; border-left:6px solid #72777d; background:#f8f9fa; border-radius:6px; margin:0.45em 0 1.0em; padding:0.55em 0.75em 0.55em;">
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<div class="mw-collapsible-content">
* The HF Safety introduction is offered on a monthly basis.
* Training sessions are conducted in groups of up to 4 participants.
* Once a training date has been proposed by the Cleanroom staff, participants must confirm their attendance by email.
* Users are required to complete the HF Handling Questionnaire (that you will receive from a Cleanroom staff) and submit it to the instructor during the training session.
* Each user must also designate an HF buddy. This person must be an authorized Cleanroom user with valid HF access and training.
* As HF handling involves significant safety risks, strict compliance to all safety requirements is mandatory.
* Users are expected to arrive fully prepared for the training session.
* The instructor reserves the right to suspend or terminate the training if a participant has not completed the required preparation or does not demonstrate an adequate understanding of the relevant safety procedures.
</div>
</div>

== Lithography ==
'''Request Training for Lithography Tools via''' [https://forms.office.com/e/b3PDKjsZ88?origin=lprLink NBI-Cleanroom Training Request Form].

=== Elionix 7000 (100 kV) ===
Elionix 7000 training is for advanced users and requires prior cleanroom tool competency.
<div class="mw-collapsible mw-collapsed" style="border:1px solid #b8e2d5; border-left:6px solid #14866d; background:#f2fbf8; border-radius:6px; margin:0.45em 0 1.0em; padding:0.55em 0.75em 0.55em;">
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<div class="mw-collapsible-content">
==== Prerequisites ====
* You must be at least a Master student or signed up for a long term (>6 months) project to be allowed to use the tool.
* Elionix is a high level tool. Make sure you are already trained to:
** Enter the cleanroom
** Use the microscope, spinner, asher

==== Training ====
* You'll need 4 sessions to get trained on this tool.
** Session 1 ( 1 hr.) - teaches you how to load/unload the sample and how to condition the beam.
** Session 2 ( 3 hr.) - involves exposing alignment marks and test patterns (any design: preferably one half of the overlay ,so to understand alignment later ).
** Session 3 ( 3 hr.) - involves using the exposed alignment marks for marker registration and exposing the 2nd pattern (i.e. the 2nd half of the overlay pattern).
** Session 4 involves exposing a "real" pattern on a "real" chip on your own to gain access.

==== Preparation ====
Before any training slots are booked on the tool you'll need all of the following prepared:
* Shadow senior users on the tool 2-3 times.
* Chip (comfortable to handle) spin coated with resist. This chip will be used for sessions 1 & 2. Please be aware of the coating and baking parameters for the resist.
* Any test design is preferred which has marks, overlay patterns that you will use to test alignment precision between two lithography steps. A Vernier pattern is commonly used. Feel free to test your ideas. Make sure you have something for both ''x'' and ''y'' directions. If you don't know how to start, check the [[Design template for EBL]].
* Convert your design files into the Elionix exposure format .co7. This can be done using Beamer in 4th floor design computers.
* Make sure all write fields are entirely in the positive coordinate space.
* Make sure neither exposure will take longer than 60 minutes at 500 pA current and dose of 1000 uC/cm2.
</div>
</div>

=== Elionix F-125 (125 kV at QuanTech) ===
More information will be provided shortly.
<div class="mw-collapsible mw-collapsed" style="border:1px solid #b8e2d5; border-left:6px solid #14866d; background:#f2fbf8; border-radius:6px; margin:0.45em 0 1.0em; padding:0.55em 0.75em 0.55em;">
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<div class="mw-collapsible-content">
</div>
</div>

=== Heidelberg upg501 ===
Prepare your design file and coated chip before requesting Heidelberg upg501 training.
<div class="mw-collapsible mw-collapsed" style="border:1px solid #b8e2d5; border-left:6px solid #14866d; background:#f2fbf8; border-radius:6px; margin:0.45em 0 1.0em; padding:0.55em 0.75em 0.55em;">
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<div class="mw-collapsible-content">
* Have a design file ready. GDS, DXF or CIF format works fine. Make sure you are familiar with the design before your actual session.
* Have a chip spin coated with an appropriate photoresist before the training session.
** The photoresist is sensitive to white light. Use the yellow filter on the microscopes. The light source in the both scribers is white and will already expose your resist.
* What is your project alias? If unsure, contact your supervisor first.

Before the training session:
* Watch the instruction video and read the standard operating procedure on the [[Heidelberg µPG 501|Heidelberg µPG 501 tool page]], shadow the tool with your group members, and ask for a sign-off session.
</div>
</div>

== Characterization ==
'''Request Training for Characterization Tools via''' [https://forms.office.com/e/b3PDKjsZ88?origin=lprLink NBI-Cleanroom Training Request Form].

=== Bruker Dimension Icon AFM ===
Bruker Dimension Icon is an atomic force microscope used for high-resolution and accurate measurements of surface topography.
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* AFM training is offered upon user request and is typically conducted on a one-on-one basis. Completion of the training usually requires 2-3 sessions, with each session lasting approximately 2-3 hours.
* Prior to attending the training sessions, users are expected to review and familiarize themselves with the AFM operating procedures ([[Bruker Dimension Icon AFM|AFM]]). Users are encouraged to shadow an authorized user on the instrument 2-3 times before starting formal training. In addition, having a suitable sample prepared in advance of the training is highly recommended.
* Where appropriate and subject to staff availability and project timelines, a staff member may also assist in carrying out user projects.
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=== JEOL 7800F SEM-EDS===
JEOL 7800F is a field-emission scanning electron microscope used for high-resolution imaging of surface morphology and compositional analysis.
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* SEM-EDS training is offered upon user request and is typically conducted on a one-on-one basis. Completion of the training usually requires 2-3 sessions, with each session lasting approximately 2-3 hours.
* Prior to attending the training sessions, users are expected to review and familiarize themselves with the SEM operating procedures ([[JEOL 7800F|JEOL JSM-7800F]]). Users are encouraged to shadow an authorized user on the instrument 2-3 times before starting formal training. In addition, having a suitable sample prepared in advance of the training is highly recommended.
* Where appropriate and subject to staff availability and project timelines, a staff member may also assist in carrying out user projects.
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=== JEOL 7800F Prime SEM ===
JEOL 7800F Prime is a field-emission scanning electron microscope used for high-resolution imaging of surface morphology.
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* SEM training is offered upon user request and is typically conducted on a one-on-one basis. Completion of the training usually requires 2-3 sessions, with each session lasting approximately 2-3 hours.
* Prior to attending the training sessions, users are expected to review and familiarize themselves with the SEM operating procedures ([[JEOL 7800F|JEOL JSM-7800F]]). Users are encouraged to shadow an authorized user on the instrument 2-3 times before starting formal training. In addition, having a suitable sample prepared in advance of the training is highly recommended.
* Where appropriate and subject to staff availability and project timelines, a staff member may also assist in carrying out user projects.
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=== Thermo Fisher Scientific Talos F200i S/TEM ===
Talos F200i is a versatile 200-kV field-emission (scanning) transmission electron microscope designed for high-throughput, high-resolution materials characterization.
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* This instrument is classified as a high-level tool, and training is selective. Users are required to have prior experience with TEM/STEM before being considered for training. Cleanroom staff reserves the right to decline a training request if the prerequisite requirements are not met.
* Where appropriate and subject to staff availability and project timelines, a staff member may also assist in carrying out user projects.
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=== Raith e-Line ===
Bring a prepared design package for sessions 1 and 2, including alignment and overlay test patterns.
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* A design (gds, dxf, cif) for sessions 1 & 2 with:
** 4 alignment crosses (find out what marks work on the tool from your sub-group).
** Something to break the symmetry so you can tell chip orientation with your bare eye.
** A pattern that you will use to test overlay (alignment between two lithography steps). A Vernier pattern is commonly used. Feel free to test your ideas.
** Something creative, somethin fun :) This is an exercise in learning CAD as well.
* What is your project alias? If unsure, contact your supervisor first.
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=== Woollam alpha-SE Ellipsometer ===
More information will be provided shortly.
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=== Filmetrics reflectometer ===
More information will be provided shortly.
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== Thin Film Deposition ==

=== Plassys Evaporator ===
A physical vapour deposition tool of aluminium via e-beam evaporation for Josephson junction fabrication.

Apply for training via the [https://forms.office.com/e/b3PDKjsZ88?origin=lprLink NBI-Cleanroom Training Request Form].
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====Confirmation====
Once you sign up via the form, the tool responsible will contact you for the following details:
* Confirm that you have a sample ready.
* Confirm that you have shadowed your colleagues using the tool 2-3 times.
* Specify process steps you want to run
*: Materials, thickness, tilt, milling, oxidation
* The name of the recipe.
==== Restrictions====
* Only Si and sapphire samples are allowed in the chamber.
==== Training ====
* You'll need 2 sessions to get trained on this tool.
** Session 1 (2 hr.) - teaches you how to load/unload the sample and how to run a recipe.
** Session 2 (2 hr.) - sign off session
'''The instructor has the right to ask for additional training sessions.'''
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=== AJA1 and AJA2: metallization, sputtering or ion milling ===
Two nearly identical Orion physical vapour deposition (PVD) systems from AJA International for sputtering and e-beam evaporation, and substrate milling.

Apply for training via the [https://forms.office.com/e/b3PDKjsZ88?origin=lprLink NBI-Cleanroom Training Request Form].
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====Confirmation====
Once you sign up via the form, the tool responsible will contact you for the following details:
* Confirm that you have a sample ready.
* Confirm that you have shadowed your colleagues using the tool 2-3 times.
* Specify process steps you want to run
*: Materials, thickness, tilt, milling, oxidation
* Which tool do you want to use?
** '''AJA1'''
*** e-beam materials: Ti, Al, Au, SiOx, Pt, Ti, Ge
*** DC sputtering: Nb2Ti, Ti
*** DC Kaufman milling
*** Oxidation
*** Stage rotation, no stage cooling
** '''AJA2'''
*** e-beam materials: Ti, Al, Au, Cr, Pt, Pd
*** DC sputtering: Ti
*** RF sputtering: Ti, Nb2Ti
*** RF milling
*** Stage cooling, no stage rotation
* Specify the process steps you want to run.
*: Either the name of the recipe or all required process parameters.

===Before the training session===
* Watch the instruction video(s)
*Read the standard operating procedure on the [[AJA Systems|AJA Systems tool page]].

==== Training ====
* You'll need 2 sessions to get trained on this tool.
** Session 1 ( 2 hr.) - teaches you how to load/unload the sample and how to run a recipe.
** Session 2 ( 2 hr.) - sign off session
The instructor has the right to ask for additional training sessions.
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=== ALD1 and ALD2===
Two nearly identical Savannah S100-like systems are used for atomic layer deposition.

Apply for training via the [https://forms.office.com/e/b3PDKjsZ88?origin=lprLink NBI-Cleanroom Training Request Form].
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====Confirmation====
Once you sign up via the form, the tool responsible will contact you for the following details:
* Confirm that you have a sample ready.
* Confirm that you have shadowed your colleagues using the tool 2-3 times.
* Which tool do you want to use?
** '''ALD1''' available grown oxides: AlOx, HfOx, TiOx
** '''ALD2''' available grown oxides: AlOx, HfOx, ZrOx
** In ALD1, you are allowed to use resist for lift-off processes. In ALD2, '''you are not allowed to use a sample with resist on'''.
* Specify the process steps you want to run.
** Either the name of the recipe or all required process parameters.
====Before the training session====
* Watch the instruction video(s)
* Study the [[Atomic layer deposition|ALD principles]]
* Read the standard operating procedure on the [[Cambridge ALD|ALD tool page]].
====Training====
You'll need 2 sessions to get trained on this tool.
* Session 1 (30 mins) - teaches you how to load/unload the sample and how to run a recipe.
* Session 2 (30 mins) - sign off session
*: '''Note:''' An ALD session can have a long duration (often >12 hours). A usual training starts in the afternoon (load, setup, prepare recipe, run), and the film will grow throughout the evening. The next day, the user and the instructor will finish the training session (unloading).
'''The instructor has the right to ask for additional training sessions.'''
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== Packaging ==

=== F&S autobonder ===
A semi-automatic bonder to bond semiconductor substrates to PCB daughterboards from F&S Bondtec.

Apply for training via the [https://forms.office.com/e/b3PDKjsZ88?origin=lprLink NBI-Cleanroom Training Request Form].
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====Confirmation====
Once you sign up via the form, the tool responsible will contact you for the following details:
* Confirm that you have a '''chip''' ready for bonding.
* Confirm that you have shadowed your colleagues using the tool 2-3 times.
* You must know which '''daughterboard''' you will use for bonding (CPH, QBOARD1,2, QCAGE, Sydney, IC, custom).
* You must know what material you use to '''mount''' the chip to the daughterboard (mechanical clamping, silver paint, PMMA, other).
* Confirm that you have prepared a '''bonding schematic''' .
* By default, this bonder is using Al wire. You can request a special training if you want to use Au wire, but be aware it can be challenging.
*: Users are more likely to use the [[K&S bonder| K&S manual bonder]] for Au wire bonding.
* Specify the name of the recipe.
====Before the training session====
* Read the standard operating procedure on the [[FS bonder| FS bonder tool page]]
* Verify with one of your colleagues that your bonding schematic is correct.
==== Training ====
You'll need 2 sessions to get trained on this tool.
* Session 1 (2 hr.) - teaches you how to load/unload the sample and how to run a recipe.
* Session 2 (2 hr.) - sign off session
'''The instructor has the right to ask for additional training sessions.'''
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=== Manual bonder ===
Apply for sign-off via the [https://forms.office.com/e/b3PDKjsZ88?origin=lprLink NBI-Cleanroom Training Request Form].

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* Cleanroom doesn't train users in this tool.
* You need to get trained within your research group.
* Cleanroom will provide a sign-off session to ensure safety
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== Miscellaneous ==

=== Micromanipulator ===
Apply for sign-off via the [https://forms.office.com/e/b3PDKjsZ88?origin=lprLink NBI-Cleanroom Training Request Form].

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* Cleanroom doesn't train users in this tool.
* You need to get trained within your research group.
* Cleanroom will provide a sign-off session to ensure safety and verify that the user is aware of the dangers of working with nanoparticles.
==== Before you start your training sessions====
* You need to carefully read and familiarise yourself with the risks of exposure while [[Working with nanowires and nanotubes]]
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[[Category:Tools]]

Training

2026-06-29T11:35:08Z

Chenglee: /* Characterization */

Before submitting a training request, please review the prerequisites for each instrument listed below.

'''Starting in July 2026, a standardized training request form will be introduced. The new system will allow users to request training for multiple instruments using a single form''' ([https://forms.office.com/e/b3PDKjsZ88?origin=lprLink NBI-Cleanroom Training Request Form]). '''Please only request training for instruments that require immediate access'''. Following submission of the request form, email communication will continue to be used for scheduling and coordinating training activities. The Cleanroom staff will acknowledge and respond to training requests within 1-2 working days.

Please note that access to the Cleanroom, tool laboratories and individual instruments can only be granted after the required safety instructions and instrument training have been completed and approved by the Cleanroom staff. Upon successful completion of the training, users will be granted booking privileges through the Cleanroom Booking System.

To ensure continued competency and safe operation, booking privileges and laboratory access may expire after a period of inactivity (typically '''90 days''') for a given instrument or Cleanroom usage. In such cases, users will be required to complete a refresher training session before access can be reinstated.

== Cleanroom General Introduction ==
Before attending the training session, all users must read and familiarize themselves with the relevant safety information ([[Safety]]). ''Expand to view more information''.
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* The introductory session is scheduled from 09:15 to 15:00.
* Training sessions are conducted in group of 3-4 participants. Once a training date has been proposed by the Cleanroom staff, participants are required to confirm their attendance by email ([mailto:cleanroom@nbi.ku.dk cleanroom@nbi.ku.dk]).
* If fewer than 3 participants are available for a scheduled session, an alternative training date may be proposed. If a session reaches its maximum capacity of 4 participants, additional users will be placed on a waiting list and offered the next available training opportunity.
* Please identify a superuser from your research group who will serve as your mentor during your first few weeks of working in the Cleanroom.
* The designated mentor is responsible for guiding you through the standard procedures and best practices after the Cleanroom General Introduction.
* Once the mentor has determined that you are competent to work independently, they must notify the Cleanroom team via email.
* Full access to the Cleanroom laboratories will only be granted after the Cleanroom team has received this confirmation.
* Standard Training Program:
** 09:15-10:30: Cleanroom introduction
** Coffee break
** 10:45-12:00: Asher, spinners and optical microscopes
** Lunch break
** 13:00-14:00: Practical information
** 14:00-15:00: Q&A and account setup
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== Chemical Handling==

=== HF Safety Training ===
Before attending the training session, all users must read and familiarize themselves with the relevant safety information ([[Safety]]). ''Expand to view more information''.
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* The HF Safety introduction is offered on a monthly basis.
* Training sessions are conducted in groups of up to 4 participants.
* Once a training date has been proposed by the Cleanroom staff, participants must confirm their attendance by email.
* Users are required to complete the HF Handling Questionnaire (that you will receive from a Cleanroom staff) and submit it to the instructor during the training session.
* Each user must also designate an HF buddy. This person must be an authorized Cleanroom user with valid HF access and training.
* As HF handling involves significant safety risks, strict compliance to all safety requirements is mandatory.
* Users are expected to arrive fully prepared for the training session.
* The instructor reserves the right to suspend or terminate the training if a participant has not completed the required preparation or does not demonstrate an adequate understanding of the relevant safety procedures.
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== Lithography ==

=== Elionix 7000 (100 kV) ===
Elionix 7000 training is for advanced users and requires prior cleanroom tool competency.
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==== Prerequisites ====
* You must be at least a Master student or signed up for a long term (>6 months) project to be allowed to use the tool.
* Elionix is a high level tool. Make sure you are already trained to:
** Enter the cleanroom
** Use the microscope, spinner, asher

==== Training ====
* You'll need 4 sessions to get trained on this tool.
** Session 1 ( 1 hr.) - teaches you how to load/unload the sample and how to condition the beam.
** Session 2 ( 3 hr.) - involves exposing alignment marks and test patterns (any design: preferably one half of the overlay ,so to understand alignment later ).
** Session 3 ( 3 hr.) - involves using the exposed alignment marks for marker registration and exposing the 2nd pattern (i.e. the 2nd half of the overlay pattern).
** Session 4 involves exposing a "real" pattern on a "real" chip on your own to gain access.

==== Preparation ====
Before any training slots are booked on the tool you'll need all of the following prepared:
* Shadow senior users on the tool 2-3 times.
* Chip (comfortable to handle) spin coated with resist. This chip will be used for sessions 1 & 2. Please be aware of the coating and baking parameters for the resist.
* Any test design is preferred which has marks, overlay patterns that you will use to test alignment precision between two lithography steps. A Vernier pattern is commonly used. Feel free to test your ideas. Make sure you have something for both ''x'' and ''y'' directions. If you don't know how to start, check the [[Design template for EBL]].
* Convert your design files into the Elionix exposure format .co7. This can be done using Beamer in 4th floor design computers.
* Make sure all write fields are entirely in the positive coordinate space.
* Make sure neither exposure will take longer than 60 minutes at 500 pA current and dose of 1000 uC/cm2.
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=== Elionix F-125 (125 kV at QuanTech) ===
More information will be provided shortly.
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=== Heidelberg upg501 ===
Prepare your design file and coated chip before requesting Heidelberg upg501 training.
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* Have a design file ready. GDS, DXF or CIF format works fine. Make sure you are familiar with the design before your actual session.
* Have a chip spin coated with an appropriate photoresist before the training session.
** The photoresist is sensitive to white light. Use the yellow filter on the microscopes. The light source in the both scribers is white and will already expose your resist.
* What is your project alias? If unsure, contact your supervisor first.

Before the training session:
* Watch the instruction video and read the standard operating procedure on the [[Heidelberg µPG 501|Heidelberg µPG 501 tool page]], shadow the tool with your group members, and ask for a sign-off session.
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== Characterization ==
'''Request Training for Characterization Tools via''' [https://forms.office.com/e/b3PDKjsZ88?origin=lprLink NBI-Cleanroom Training Request Form].

=== Bruker Dimension Icon AFM ===
Bruker Dimension Icon is an atomic force microscope used for high-resolution and accurate measurements of surface topography.
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* AFM training is offered upon user request and is typically conducted on a one-on-one basis. Completion of the training usually requires 2-3 sessions, with each session lasting approximately 2-3 hours.
* Prior to attending the training sessions, users are expected to review and familiarize themselves with the AFM operating procedures ([[Bruker Dimension Icon AFM|AFM]]). Users are encouraged to shadow an authorized user on the instrument 2-3 times before starting formal training. In addition, having a suitable sample prepared in advance of the training is highly recommended.
* Where appropriate and subject to staff availability and project timelines, a staff member may also assist in carrying out user projects.
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=== JEOL 7800F SEM-EDS===
JEOL 7800F is a field-emission scanning electron microscope used for high-resolution imaging of surface morphology and compositional analysis.
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* SEM-EDS training is offered upon user request and is typically conducted on a one-on-one basis. Completion of the training usually requires 2-3 sessions, with each session lasting approximately 2-3 hours.
* Prior to attending the training sessions, users are expected to review and familiarize themselves with the SEM operating procedures ([[JEOL 7800F|JEOL JSM-7800F]]). Users are encouraged to shadow an authorized user on the instrument 2-3 times before starting formal training. In addition, having a suitable sample prepared in advance of the training is highly recommended.
* Where appropriate and subject to staff availability and project timelines, a staff member may also assist in carrying out user projects.
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=== JEOL 7800F Prime SEM ===
JEOL 7800F Prime is a field-emission scanning electron microscope used for high-resolution imaging of surface morphology.
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* SEM training is offered upon user request and is typically conducted on a one-on-one basis. Completion of the training usually requires 2-3 sessions, with each session lasting approximately 2-3 hours.
* Prior to attending the training sessions, users are expected to review and familiarize themselves with the SEM operating procedures ([[JEOL 7800F|JEOL JSM-7800F]]). Users are encouraged to shadow an authorized user on the instrument 2-3 times before starting formal training. In addition, having a suitable sample prepared in advance of the training is highly recommended.
* Where appropriate and subject to staff availability and project timelines, a staff member may also assist in carrying out user projects.
</div>
</div>

=== Thermo Fisher Scientific Talos F200i S/TEM ===
Talos F200i is a versatile 200-kV field-emission (scanning) transmission electron microscope designed for high-throughput, high-resolution materials characterization.
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* This instrument is classified as a high-level tool, and training is selective. Users are required to have prior experience with TEM/STEM before being considered for training. Cleanroom staff reserves the right to decline a training request if the prerequisite requirements are not met.
* Where appropriate and subject to staff availability and project timelines, a staff member may also assist in carrying out user projects.
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</div>

=== Raith e-Line ===
Bring a prepared design package for sessions 1 and 2, including alignment and overlay test patterns.
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* A design (gds, dxf, cif) for sessions 1 & 2 with:
** 4 alignment crosses (find out what marks work on the tool from your sub-group).
** Something to break the symmetry so you can tell chip orientation with your bare eye.
** A pattern that you will use to test overlay (alignment between two lithography steps). A Vernier pattern is commonly used. Feel free to test your ideas.
** Something creative, somethin fun :) This is an exercise in learning CAD as well.
* What is your project alias? If unsure, contact your supervisor first.
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</div>

=== Woollam alpha-SE Ellipsometer ===
More information will be provided shortly.
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=== Filmetrics reflectometer ===
More information will be provided shortly.
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== Thin Film Deposition ==

=== Plassys Evaporator ===
A physical vapour deposition tool of aluminium via e-beam evaporation for Josephson junction fabrication.

Apply for training via the [https://forms.office.com/e/b3PDKjsZ88?origin=lprLink NBI-Cleanroom Training Request Form].
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====Confirmation====
Once you sign up via the form, the tool responsible will contact you for the following details:
* Confirm that you have a sample ready.
* Confirm that you have shadowed your colleagues using the tool 2-3 times.
* Specify process steps you want to run
*: Materials, thickness, tilt, milling, oxidation
* The name of the recipe.
==== Restrictions====
* Only Si and sapphire samples are allowed in the chamber.
==== Training ====
* You'll need 2 sessions to get trained on this tool.
** Session 1 (2 hr.) - teaches you how to load/unload the sample and how to run a recipe.
** Session 2 (2 hr.) - sign off session
'''The instructor has the right to ask for additional training sessions.'''
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=== AJA1 and AJA2: metallization, sputtering or ion milling ===
Two nearly identical Orion physical vapour deposition (PVD) systems from AJA International for sputtering and e-beam evaporation, and substrate milling.

Apply for training via the [https://forms.office.com/e/b3PDKjsZ88?origin=lprLink NBI-Cleanroom Training Request Form].
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====Confirmation====
Once you sign up via the form, the tool responsible will contact you for the following details:
* Confirm that you have a sample ready.
* Confirm that you have shadowed your colleagues using the tool 2-3 times.
* Specify process steps you want to run
*: Materials, thickness, tilt, milling, oxidation
* Which tool do you want to use?
** '''AJA1'''
*** e-beam materials: Ti, Al, Au, SiOx, Pt, Ti, Ge
*** DC sputtering: Nb2Ti, Ti
*** DC Kaufman milling
*** Oxidation
*** Stage rotation, no stage cooling
** '''AJA2'''
*** e-beam materials: Ti, Al, Au, Cr, Pt, Pd
*** DC sputtering: Ti
*** RF sputtering: Ti, Nb2Ti
*** RF milling
*** Stage cooling, no stage rotation
* Specify the process steps you want to run.
*: Either the name of the recipe or all required process parameters.

===Before the training session===
* Watch the instruction video(s)
*Read the standard operating procedure on the [[AJA Systems|AJA Systems tool page]].

==== Training ====
* You'll need 2 sessions to get trained on this tool.
** Session 1 ( 2 hr.) - teaches you how to load/unload the sample and how to run a recipe.
** Session 2 ( 2 hr.) - sign off session
The instructor has the right to ask for additional training sessions.
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=== ALD1 and ALD2===
Two nearly identical Savannah S100-like systems are used for atomic layer deposition.

Apply for training via the [https://forms.office.com/e/b3PDKjsZ88?origin=lprLink NBI-Cleanroom Training Request Form].
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====Confirmation====
Once you sign up via the form, the tool responsible will contact you for the following details:
* Confirm that you have a sample ready.
* Confirm that you have shadowed your colleagues using the tool 2-3 times.
* Which tool do you want to use?
** '''ALD1''' available grown oxides: AlOx, HfOx, TiOx
** '''ALD2''' available grown oxides: AlOx, HfOx, ZrOx
** In ALD1, you are allowed to use resist for lift-off processes. In ALD2, '''you are not allowed to use a sample with resist on'''.
* Specify the process steps you want to run.
** Either the name of the recipe or all required process parameters.
====Before the training session====
* Watch the instruction video(s)
* Study the [[Atomic layer deposition|ALD principles]]
* Read the standard operating procedure on the [[Cambridge ALD|ALD tool page]].
====Training====
You'll need 2 sessions to get trained on this tool.
* Session 1 (30 mins) - teaches you how to load/unload the sample and how to run a recipe.
* Session 2 (30 mins) - sign off session
*: '''Note:''' An ALD session can have a long duration (often >12 hours). A usual training starts in the afternoon (load, setup, prepare recipe, run), and the film will grow throughout the evening. The next day, the user and the instructor will finish the training session (unloading).
'''The instructor has the right to ask for additional training sessions.'''
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== Packaging ==

=== F&S autobonder ===
A semi-automatic bonder to bond semiconductor substrates to PCB daughterboards from F&S Bondtec.

Apply for training via the [https://forms.office.com/e/b3PDKjsZ88?origin=lprLink NBI-Cleanroom Training Request Form].
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====Confirmation====
Once you sign up via the form, the tool responsible will contact you for the following details:
* Confirm that you have a '''chip''' ready for bonding.
* Confirm that you have shadowed your colleagues using the tool 2-3 times.
* You must know which '''daughterboard''' you will use for bonding (CPH, QBOARD1,2, QCAGE, Sydney, IC, custom).
* You must know what material you use to '''mount''' the chip to the daughterboard (mechanical clamping, silver paint, PMMA, other).
* Confirm that you have prepared a '''bonding schematic''' .
* By default, this bonder is using Al wire. You can request a special training if you want to use Au wire, but be aware it can be challenging.
*: Users are more likely to use the [[K&S bonder| K&S manual bonder]] for Au wire bonding.
* Specify the name of the recipe.
====Before the training session====
* Read the standard operating procedure on the [[FS bonder| FS bonder tool page]]
* Verify with one of your colleagues that your bonding schematic is correct.
==== Training ====
You'll need 2 sessions to get trained on this tool.
* Session 1 (2 hr.) - teaches you how to load/unload the sample and how to run a recipe.
* Session 2 (2 hr.) - sign off session
'''The instructor has the right to ask for additional training sessions.'''
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=== Manual bonder ===
Apply for sign-off via the [https://forms.office.com/e/b3PDKjsZ88?origin=lprLink NBI-Cleanroom Training Request Form].

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* Cleanroom doesn't train users in this tool.
* You need to get trained within your research group.
* Cleanroom will provide a sign-off session to ensure safety
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== Miscellaneous ==

=== Micromanipulator ===
Apply for sign-off via the [https://forms.office.com/e/b3PDKjsZ88?origin=lprLink NBI-Cleanroom Training Request Form].

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* Cleanroom doesn't train users in this tool.
* You need to get trained within your research group.
* Cleanroom will provide a sign-off session to ensure safety and verify that the user is aware of the dangers of working with nanoparticles.
==== Before you start your training sessions====
* You need to carefully read and familiarise yourself with the risks of exposure while [[Working with nanowires and nanotubes]]
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[[Category:Tools]]

Training

2026-06-29T11:34:56Z

Chenglee: /* Characterization */

Before submitting a training request, please review the prerequisites for each instrument listed below.

'''Starting in July 2026, a standardized training request form will be introduced. The new system will allow users to request training for multiple instruments using a single form''' ([https://forms.office.com/e/b3PDKjsZ88?origin=lprLink NBI-Cleanroom Training Request Form]). '''Please only request training for instruments that require immediate access'''. Following submission of the request form, email communication will continue to be used for scheduling and coordinating training activities. The Cleanroom staff will acknowledge and respond to training requests within 1-2 working days.

Please note that access to the Cleanroom, tool laboratories and individual instruments can only be granted after the required safety instructions and instrument training have been completed and approved by the Cleanroom staff. Upon successful completion of the training, users will be granted booking privileges through the Cleanroom Booking System.

To ensure continued competency and safe operation, booking privileges and laboratory access may expire after a period of inactivity (typically '''90 days''') for a given instrument or Cleanroom usage. In such cases, users will be required to complete a refresher training session before access can be reinstated.

== Cleanroom General Introduction ==
Before attending the training session, all users must read and familiarize themselves with the relevant safety information ([[Safety]]). ''Expand to view more information''.
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* The introductory session is scheduled from 09:15 to 15:00.
* Training sessions are conducted in group of 3-4 participants. Once a training date has been proposed by the Cleanroom staff, participants are required to confirm their attendance by email ([mailto:cleanroom@nbi.ku.dk cleanroom@nbi.ku.dk]).
* If fewer than 3 participants are available for a scheduled session, an alternative training date may be proposed. If a session reaches its maximum capacity of 4 participants, additional users will be placed on a waiting list and offered the next available training opportunity.
* Please identify a superuser from your research group who will serve as your mentor during your first few weeks of working in the Cleanroom.
* The designated mentor is responsible for guiding you through the standard procedures and best practices after the Cleanroom General Introduction.
* Once the mentor has determined that you are competent to work independently, they must notify the Cleanroom team via email.
* Full access to the Cleanroom laboratories will only be granted after the Cleanroom team has received this confirmation.
* Standard Training Program:
** 09:15-10:30: Cleanroom introduction
** Coffee break
** 10:45-12:00: Asher, spinners and optical microscopes
** Lunch break
** 13:00-14:00: Practical information
** 14:00-15:00: Q&A and account setup
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== Chemical Handling==

=== HF Safety Training ===
Before attending the training session, all users must read and familiarize themselves with the relevant safety information ([[Safety]]). ''Expand to view more information''.
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* The HF Safety introduction is offered on a monthly basis.
* Training sessions are conducted in groups of up to 4 participants.
* Once a training date has been proposed by the Cleanroom staff, participants must confirm their attendance by email.
* Users are required to complete the HF Handling Questionnaire (that you will receive from a Cleanroom staff) and submit it to the instructor during the training session.
* Each user must also designate an HF buddy. This person must be an authorized Cleanroom user with valid HF access and training.
* As HF handling involves significant safety risks, strict compliance to all safety requirements is mandatory.
* Users are expected to arrive fully prepared for the training session.
* The instructor reserves the right to suspend or terminate the training if a participant has not completed the required preparation or does not demonstrate an adequate understanding of the relevant safety procedures.
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== Lithography ==

=== Elionix 7000 (100 kV) ===
Elionix 7000 training is for advanced users and requires prior cleanroom tool competency.
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==== Prerequisites ====
* You must be at least a Master student or signed up for a long term (>6 months) project to be allowed to use the tool.
* Elionix is a high level tool. Make sure you are already trained to:
** Enter the cleanroom
** Use the microscope, spinner, asher

==== Training ====
* You'll need 4 sessions to get trained on this tool.
** Session 1 ( 1 hr.) - teaches you how to load/unload the sample and how to condition the beam.
** Session 2 ( 3 hr.) - involves exposing alignment marks and test patterns (any design: preferably one half of the overlay ,so to understand alignment later ).
** Session 3 ( 3 hr.) - involves using the exposed alignment marks for marker registration and exposing the 2nd pattern (i.e. the 2nd half of the overlay pattern).
** Session 4 involves exposing a "real" pattern on a "real" chip on your own to gain access.

==== Preparation ====
Before any training slots are booked on the tool you'll need all of the following prepared:
* Shadow senior users on the tool 2-3 times.
* Chip (comfortable to handle) spin coated with resist. This chip will be used for sessions 1 & 2. Please be aware of the coating and baking parameters for the resist.
* Any test design is preferred which has marks, overlay patterns that you will use to test alignment precision between two lithography steps. A Vernier pattern is commonly used. Feel free to test your ideas. Make sure you have something for both ''x'' and ''y'' directions. If you don't know how to start, check the [[Design template for EBL]].
* Convert your design files into the Elionix exposure format .co7. This can be done using Beamer in 4th floor design computers.
* Make sure all write fields are entirely in the positive coordinate space.
* Make sure neither exposure will take longer than 60 minutes at 500 pA current and dose of 1000 uC/cm2.
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=== Elionix F-125 (125 kV at QuanTech) ===
More information will be provided shortly.
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=== Heidelberg upg501 ===
Prepare your design file and coated chip before requesting Heidelberg upg501 training.
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* Have a design file ready. GDS, DXF or CIF format works fine. Make sure you are familiar with the design before your actual session.
* Have a chip spin coated with an appropriate photoresist before the training session.
** The photoresist is sensitive to white light. Use the yellow filter on the microscopes. The light source in the both scribers is white and will already expose your resist.
* What is your project alias? If unsure, contact your supervisor first.

Before the training session:
* Watch the instruction video and read the standard operating procedure on the [[Heidelberg µPG 501|Heidelberg µPG 501 tool page]], shadow the tool with your group members, and ask for a sign-off session.
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== Characterization ==
Request Training for Characterization Tools via [https://forms.office.com/e/b3PDKjsZ88?origin=lprLink NBI-Cleanroom Training Request Form].

=== Bruker Dimension Icon AFM ===
Bruker Dimension Icon is an atomic force microscope used for high-resolution and accurate measurements of surface topography.
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* AFM training is offered upon user request and is typically conducted on a one-on-one basis. Completion of the training usually requires 2-3 sessions, with each session lasting approximately 2-3 hours.
* Prior to attending the training sessions, users are expected to review and familiarize themselves with the AFM operating procedures ([[Bruker Dimension Icon AFM|AFM]]). Users are encouraged to shadow an authorized user on the instrument 2-3 times before starting formal training. In addition, having a suitable sample prepared in advance of the training is highly recommended.
* Where appropriate and subject to staff availability and project timelines, a staff member may also assist in carrying out user projects.
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=== JEOL 7800F SEM-EDS===
JEOL 7800F is a field-emission scanning electron microscope used for high-resolution imaging of surface morphology and compositional analysis.
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* SEM-EDS training is offered upon user request and is typically conducted on a one-on-one basis. Completion of the training usually requires 2-3 sessions, with each session lasting approximately 2-3 hours.
* Prior to attending the training sessions, users are expected to review and familiarize themselves with the SEM operating procedures ([[JEOL 7800F|JEOL JSM-7800F]]). Users are encouraged to shadow an authorized user on the instrument 2-3 times before starting formal training. In addition, having a suitable sample prepared in advance of the training is highly recommended.
* Where appropriate and subject to staff availability and project timelines, a staff member may also assist in carrying out user projects.
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=== JEOL 7800F Prime SEM ===
JEOL 7800F Prime is a field-emission scanning electron microscope used for high-resolution imaging of surface morphology.
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* SEM training is offered upon user request and is typically conducted on a one-on-one basis. Completion of the training usually requires 2-3 sessions, with each session lasting approximately 2-3 hours.
* Prior to attending the training sessions, users are expected to review and familiarize themselves with the SEM operating procedures ([[JEOL 7800F|JEOL JSM-7800F]]). Users are encouraged to shadow an authorized user on the instrument 2-3 times before starting formal training. In addition, having a suitable sample prepared in advance of the training is highly recommended.
* Where appropriate and subject to staff availability and project timelines, a staff member may also assist in carrying out user projects.
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=== Thermo Fisher Scientific Talos F200i S/TEM ===
Talos F200i is a versatile 200-kV field-emission (scanning) transmission electron microscope designed for high-throughput, high-resolution materials characterization.
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* This instrument is classified as a high-level tool, and training is selective. Users are required to have prior experience with TEM/STEM before being considered for training. Cleanroom staff reserves the right to decline a training request if the prerequisite requirements are not met.
* Where appropriate and subject to staff availability and project timelines, a staff member may also assist in carrying out user projects.
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=== Raith e-Line ===
Bring a prepared design package for sessions 1 and 2, including alignment and overlay test patterns.
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* A design (gds, dxf, cif) for sessions 1 & 2 with:
** 4 alignment crosses (find out what marks work on the tool from your sub-group).
** Something to break the symmetry so you can tell chip orientation with your bare eye.
** A pattern that you will use to test overlay (alignment between two lithography steps). A Vernier pattern is commonly used. Feel free to test your ideas.
** Something creative, somethin fun :) This is an exercise in learning CAD as well.
* What is your project alias? If unsure, contact your supervisor first.
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=== Woollam alpha-SE Ellipsometer ===
More information will be provided shortly.
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=== Filmetrics reflectometer ===
More information will be provided shortly.
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== Thin Film Deposition ==

=== Plassys Evaporator ===
A physical vapour deposition tool of aluminium via e-beam evaporation for Josephson junction fabrication.

Apply for training via the [https://forms.office.com/e/b3PDKjsZ88?origin=lprLink NBI-Cleanroom Training Request Form].
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====Confirmation====
Once you sign up via the form, the tool responsible will contact you for the following details:
* Confirm that you have a sample ready.
* Confirm that you have shadowed your colleagues using the tool 2-3 times.
* Specify process steps you want to run
*: Materials, thickness, tilt, milling, oxidation
* The name of the recipe.
==== Restrictions====
* Only Si and sapphire samples are allowed in the chamber.
==== Training ====
* You'll need 2 sessions to get trained on this tool.
** Session 1 (2 hr.) - teaches you how to load/unload the sample and how to run a recipe.
** Session 2 (2 hr.) - sign off session
'''The instructor has the right to ask for additional training sessions.'''
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=== AJA1 and AJA2: metallization, sputtering or ion milling ===
Two nearly identical Orion physical vapour deposition (PVD) systems from AJA International for sputtering and e-beam evaporation, and substrate milling.

Apply for training via the [https://forms.office.com/e/b3PDKjsZ88?origin=lprLink NBI-Cleanroom Training Request Form].
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====Confirmation====
Once you sign up via the form, the tool responsible will contact you for the following details:
* Confirm that you have a sample ready.
* Confirm that you have shadowed your colleagues using the tool 2-3 times.
* Specify process steps you want to run
*: Materials, thickness, tilt, milling, oxidation
* Which tool do you want to use?
** '''AJA1'''
*** e-beam materials: Ti, Al, Au, SiOx, Pt, Ti, Ge
*** DC sputtering: Nb2Ti, Ti
*** DC Kaufman milling
*** Oxidation
*** Stage rotation, no stage cooling
** '''AJA2'''
*** e-beam materials: Ti, Al, Au, Cr, Pt, Pd
*** DC sputtering: Ti
*** RF sputtering: Ti, Nb2Ti
*** RF milling
*** Stage cooling, no stage rotation
* Specify the process steps you want to run.
*: Either the name of the recipe or all required process parameters.

===Before the training session===
* Watch the instruction video(s)
*Read the standard operating procedure on the [[AJA Systems|AJA Systems tool page]].

==== Training ====
* You'll need 2 sessions to get trained on this tool.
** Session 1 ( 2 hr.) - teaches you how to load/unload the sample and how to run a recipe.
** Session 2 ( 2 hr.) - sign off session
The instructor has the right to ask for additional training sessions.
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=== ALD1 and ALD2===
Two nearly identical Savannah S100-like systems are used for atomic layer deposition.

Apply for training via the [https://forms.office.com/e/b3PDKjsZ88?origin=lprLink NBI-Cleanroom Training Request Form].
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====Confirmation====
Once you sign up via the form, the tool responsible will contact you for the following details:
* Confirm that you have a sample ready.
* Confirm that you have shadowed your colleagues using the tool 2-3 times.
* Which tool do you want to use?
** '''ALD1''' available grown oxides: AlOx, HfOx, TiOx
** '''ALD2''' available grown oxides: AlOx, HfOx, ZrOx
** In ALD1, you are allowed to use resist for lift-off processes. In ALD2, '''you are not allowed to use a sample with resist on'''.
* Specify the process steps you want to run.
** Either the name of the recipe or all required process parameters.
====Before the training session====
* Watch the instruction video(s)
* Study the [[Atomic layer deposition|ALD principles]]
* Read the standard operating procedure on the [[Cambridge ALD|ALD tool page]].
====Training====
You'll need 2 sessions to get trained on this tool.
* Session 1 (30 mins) - teaches you how to load/unload the sample and how to run a recipe.
* Session 2 (30 mins) - sign off session
*: '''Note:''' An ALD session can have a long duration (often >12 hours). A usual training starts in the afternoon (load, setup, prepare recipe, run), and the film will grow throughout the evening. The next day, the user and the instructor will finish the training session (unloading).
'''The instructor has the right to ask for additional training sessions.'''
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== Packaging ==

=== F&S autobonder ===
A semi-automatic bonder to bond semiconductor substrates to PCB daughterboards from F&S Bondtec.

Apply for training via the [https://forms.office.com/e/b3PDKjsZ88?origin=lprLink NBI-Cleanroom Training Request Form].
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====Confirmation====
Once you sign up via the form, the tool responsible will contact you for the following details:
* Confirm that you have a '''chip''' ready for bonding.
* Confirm that you have shadowed your colleagues using the tool 2-3 times.
* You must know which '''daughterboard''' you will use for bonding (CPH, QBOARD1,2, QCAGE, Sydney, IC, custom).
* You must know what material you use to '''mount''' the chip to the daughterboard (mechanical clamping, silver paint, PMMA, other).
* Confirm that you have prepared a '''bonding schematic''' .
* By default, this bonder is using Al wire. You can request a special training if you want to use Au wire, but be aware it can be challenging.
*: Users are more likely to use the [[K&S bonder| K&S manual bonder]] for Au wire bonding.
* Specify the name of the recipe.
====Before the training session====
* Read the standard operating procedure on the [[FS bonder| FS bonder tool page]]
* Verify with one of your colleagues that your bonding schematic is correct.
==== Training ====
You'll need 2 sessions to get trained on this tool.
* Session 1 (2 hr.) - teaches you how to load/unload the sample and how to run a recipe.
* Session 2 (2 hr.) - sign off session
'''The instructor has the right to ask for additional training sessions.'''
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=== Manual bonder ===
Apply for sign-off via the [https://forms.office.com/e/b3PDKjsZ88?origin=lprLink NBI-Cleanroom Training Request Form].

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* Cleanroom doesn't train users in this tool.
* You need to get trained within your research group.
* Cleanroom will provide a sign-off session to ensure safety
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== Miscellaneous ==

=== Micromanipulator ===
Apply for sign-off via the [https://forms.office.com/e/b3PDKjsZ88?origin=lprLink NBI-Cleanroom Training Request Form].

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* Cleanroom doesn't train users in this tool.
* You need to get trained within your research group.
* Cleanroom will provide a sign-off session to ensure safety and verify that the user is aware of the dangers of working with nanoparticles.
==== Before you start your training sessions====
* You need to carefully read and familiarise yourself with the risks of exposure while [[Working with nanowires and nanotubes]]
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[[Category:Tools]]

Training

2026-06-29T11:33:15Z

Chenglee: /* Characterization */

Before submitting a training request, please review the prerequisites for each instrument listed below.

'''Starting in July 2026, a standardized training request form will be introduced. The new system will allow users to request training for multiple instruments using a single form''' ([https://forms.office.com/e/b3PDKjsZ88?origin=lprLink NBI-Cleanroom Training Request Form]). '''Please only request training for instruments that require immediate access'''. Following submission of the request form, email communication will continue to be used for scheduling and coordinating training activities. The Cleanroom staff will acknowledge and respond to training requests within 1-2 working days.

Please note that access to the Cleanroom, tool laboratories and individual instruments can only be granted after the required safety instructions and instrument training have been completed and approved by the Cleanroom staff. Upon successful completion of the training, users will be granted booking privileges through the Cleanroom Booking System.

To ensure continued competency and safe operation, booking privileges and laboratory access may expire after a period of inactivity (typically '''90 days''') for a given instrument or Cleanroom usage. In such cases, users will be required to complete a refresher training session before access can be reinstated.

== Cleanroom General Introduction ==
Before attending the training session, all users must read and familiarize themselves with the relevant safety information ([[Safety]]). ''Expand to view more information''.
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* The introductory session is scheduled from 09:15 to 15:00.
* Training sessions are conducted in group of 3-4 participants. Once a training date has been proposed by the Cleanroom staff, participants are required to confirm their attendance by email ([mailto:cleanroom@nbi.ku.dk cleanroom@nbi.ku.dk]).
* If fewer than 3 participants are available for a scheduled session, an alternative training date may be proposed. If a session reaches its maximum capacity of 4 participants, additional users will be placed on a waiting list and offered the next available training opportunity.
* Please identify a superuser from your research group who will serve as your mentor during your first few weeks of working in the Cleanroom.
* The designated mentor is responsible for guiding you through the standard procedures and best practices after the Cleanroom General Introduction.
* Once the mentor has determined that you are competent to work independently, they must notify the Cleanroom team via email.
* Full access to the Cleanroom laboratories will only be granted after the Cleanroom team has received this confirmation.
* Standard Training Program:
** 09:15-10:30: Cleanroom introduction
** Coffee break
** 10:45-12:00: Asher, spinners and optical microscopes
** Lunch break
** 13:00-14:00: Practical information
** 14:00-15:00: Q&A and account setup
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== Chemical Handling==

=== HF Safety Training ===
Before attending the training session, all users must read and familiarize themselves with the relevant safety information ([[Safety]]). ''Expand to view more information''.
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* The HF Safety introduction is offered on a monthly basis.
* Training sessions are conducted in groups of up to 4 participants.
* Once a training date has been proposed by the Cleanroom staff, participants must confirm their attendance by email.
* Users are required to complete the HF Handling Questionnaire (that you will receive from a Cleanroom staff) and submit it to the instructor during the training session.
* Each user must also designate an HF buddy. This person must be an authorized Cleanroom user with valid HF access and training.
* As HF handling involves significant safety risks, strict compliance to all safety requirements is mandatory.
* Users are expected to arrive fully prepared for the training session.
* The instructor reserves the right to suspend or terminate the training if a participant has not completed the required preparation or does not demonstrate an adequate understanding of the relevant safety procedures.
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== Lithography ==

=== Elionix 7000 (100 kV) ===
Elionix 7000 training is for advanced users and requires prior cleanroom tool competency.
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==== Prerequisites ====
* You must be at least a Master student or signed up for a long term (>6 months) project to be allowed to use the tool.
* Elionix is a high level tool. Make sure you are already trained to:
** Enter the cleanroom
** Use the microscope, spinner, asher

==== Training ====
* You'll need 4 sessions to get trained on this tool.
** Session 1 ( 1 hr.) - teaches you how to load/unload the sample and how to condition the beam.
** Session 2 ( 3 hr.) - involves exposing alignment marks and test patterns (any design: preferably one half of the overlay ,so to understand alignment later ).
** Session 3 ( 3 hr.) - involves using the exposed alignment marks for marker registration and exposing the 2nd pattern (i.e. the 2nd half of the overlay pattern).
** Session 4 involves exposing a "real" pattern on a "real" chip on your own to gain access.

==== Preparation ====
Before any training slots are booked on the tool you'll need all of the following prepared:
* Shadow senior users on the tool 2-3 times.
* Chip (comfortable to handle) spin coated with resist. This chip will be used for sessions 1 & 2. Please be aware of the coating and baking parameters for the resist.
* Any test design is preferred which has marks, overlay patterns that you will use to test alignment precision between two lithography steps. A Vernier pattern is commonly used. Feel free to test your ideas. Make sure you have something for both ''x'' and ''y'' directions. If you don't know how to start, check the [[Design template for EBL]].
* Convert your design files into the Elionix exposure format .co7. This can be done using Beamer in 4th floor design computers.
* Make sure all write fields are entirely in the positive coordinate space.
* Make sure neither exposure will take longer than 60 minutes at 500 pA current and dose of 1000 uC/cm2.
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=== Elionix F-125 (125 kV at QuanTech) ===
More information will be provided shortly.
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=== Heidelberg upg501 ===
Prepare your design file and coated chip before requesting Heidelberg upg501 training.
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* Have a design file ready. GDS, DXF or CIF format works fine. Make sure you are familiar with the design before your actual session.
* Have a chip spin coated with an appropriate photoresist before the training session.
** The photoresist is sensitive to white light. Use the yellow filter on the microscopes. The light source in the both scribers is white and will already expose your resist.
* What is your project alias? If unsure, contact your supervisor first.

Before the training session:
* Watch the instruction video and read the standard operating procedure on the [[Heidelberg µPG 501|Heidelberg µPG 501 tool page]], shadow the tool with your group members, and ask for a sign-off session.
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== Characterization ==
Request training for characterization tools via [https://forms.office.com/e/b3PDKjsZ88?origin=lprLink NBI-Cleanroom Training Request Form].

=== Bruker Dimension Icon AFM ===
Bruker Dimension Icon is an atomic force microscope used for high-resolution and accurate measurements of surface topography.
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* AFM training is offered upon user request and is typically conducted on a one-on-one basis. Completion of the training usually requires 2-3 sessions, with each session lasting approximately 2-3 hours.
* Prior to attending the training sessions, users are expected to review and familiarize themselves with the AFM operating procedures ([[Bruker Dimension Icon AFM|AFM]]). Users are encouraged to shadow an authorized user on the instrument 2-3 times before starting formal training. In addition, having a suitable sample prepared in advance of the training is highly recommended.
* Where appropriate and subject to staff availability and project timelines, a staff member may also assist in carrying out user projects.
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=== JEOL 7800F SEM-EDS===
JEOL 7800F is a field-emission scanning electron microscope used for high-resolution imaging of surface morphology and compositional analysis.
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* SEM-EDS training is offered upon user request and is typically conducted on a one-on-one basis. Completion of the training usually requires 2-3 sessions, with each session lasting approximately 2-3 hours.
* Prior to attending the training sessions, users are expected to review and familiarize themselves with the SEM operating procedures ([[JEOL 7800F|JEOL JSM-7800F]]). Users are encouraged to shadow an authorized user on the instrument 2-3 times before starting formal training. In addition, having a suitable sample prepared in advance of the training is highly recommended.
* Where appropriate and subject to staff availability and project timelines, a staff member may also assist in carrying out user projects.
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=== JEOL 7800F Prime SEM ===
JEOL 7800F Prime is a field-emission scanning electron microscope used for high-resolution imaging of surface morphology.
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* SEM training is offered upon user request and is typically conducted on a one-on-one basis. Completion of the training usually requires 2-3 sessions, with each session lasting approximately 2-3 hours.
* Prior to attending the training sessions, users are expected to review and familiarize themselves with the SEM operating procedures ([[JEOL 7800F|JEOL JSM-7800F]]). Users are encouraged to shadow an authorized user on the instrument 2-3 times before starting formal training. In addition, having a suitable sample prepared in advance of the training is highly recommended.
* Where appropriate and subject to staff availability and project timelines, a staff member may also assist in carrying out user projects.
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=== Thermo Fisher Scientific Talos F200i S/TEM ===
Talos F200i is a versatile 200-kV field-emission (scanning) transmission electron microscope designed for high-throughput, high-resolution materials characterization.
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* This instrument is classified as a high-level tool, and training is selective. Users are required to have prior experience with TEM/STEM before being considered for training. Cleanroom staff reserves the right to decline a training request if the prerequisite requirements are not met.
* Where appropriate and subject to staff availability and project timelines, a staff member may also assist in carrying out user projects.
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=== Raith e-Line ===
Bring a prepared design package for sessions 1 and 2, including alignment and overlay test patterns.
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* A design (gds, dxf, cif) for sessions 1 & 2 with:
** 4 alignment crosses (find out what marks work on the tool from your sub-group).
** Something to break the symmetry so you can tell chip orientation with your bare eye.
** A pattern that you will use to test overlay (alignment between two lithography steps). A Vernier pattern is commonly used. Feel free to test your ideas.
** Something creative, somethin fun :) This is an exercise in learning CAD as well.
* What is your project alias? If unsure, contact your supervisor first.
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=== Woollam alpha-SE Ellipsometer ===
More information will be provided shortly.
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=== Filmetrics reflectometer ===
More information will be provided shortly.
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== Thin Film Deposition ==

=== Plassys Evaporator ===
A physical vapour deposition tool of aluminium via e-beam evaporation for Josephson junction fabrication.

Apply for training via the [https://forms.office.com/e/b3PDKjsZ88?origin=lprLink NBI-Cleanroom Training Request Form].
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====Confirmation====
Once you sign up via the form, the tool responsible will contact you for the following details:
* Confirm that you have a sample ready.
* Confirm that you have shadowed your colleagues using the tool 2-3 times.
* Specify process steps you want to run
*: Materials, thickness, tilt, milling, oxidation
* The name of the recipe.
==== Restrictions====
* Only Si and sapphire samples are allowed in the chamber.
==== Training ====
* You'll need 2 sessions to get trained on this tool.
** Session 1 (2 hr.) - teaches you how to load/unload the sample and how to run a recipe.
** Session 2 (2 hr.) - sign off session
'''The instructor has the right to ask for additional training sessions.'''
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=== AJA1 and AJA2: metallization, sputtering or ion milling ===
Two nearly identical Orion physical vapour deposition (PVD) systems from AJA International for sputtering and e-beam evaporation, and substrate milling.

Apply for training via the [https://forms.office.com/e/b3PDKjsZ88?origin=lprLink NBI-Cleanroom Training Request Form].
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====Confirmation====
Once you sign up via the form, the tool responsible will contact you for the following details:
* Confirm that you have a sample ready.
* Confirm that you have shadowed your colleagues using the tool 2-3 times.
* Specify process steps you want to run
*: Materials, thickness, tilt, milling, oxidation
* Which tool do you want to use?
** '''AJA1'''
*** e-beam materials: Ti, Al, Au, SiOx, Pt, Ti, Ge
*** DC sputtering: Nb2Ti, Ti
*** DC Kaufman milling
*** Oxidation
*** Stage rotation, no stage cooling
** '''AJA2'''
*** e-beam materials: Ti, Al, Au, Cr, Pt, Pd
*** DC sputtering: Ti
*** RF sputtering: Ti, Nb2Ti
*** RF milling
*** Stage cooling, no stage rotation
* Specify the process steps you want to run.
*: Either the name of the recipe or all required process parameters.

===Before the training session===
* Watch the instruction video(s)
*Read the standard operating procedure on the [[AJA Systems|AJA Systems tool page]].

==== Training ====
* You'll need 2 sessions to get trained on this tool.
** Session 1 ( 2 hr.) - teaches you how to load/unload the sample and how to run a recipe.
** Session 2 ( 2 hr.) - sign off session
The instructor has the right to ask for additional training sessions.
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=== ALD1 and ALD2===
Two nearly identical Savannah S100-like systems are used for atomic layer deposition.

Apply for training via the [https://forms.office.com/e/b3PDKjsZ88?origin=lprLink NBI-Cleanroom Training Request Form].
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====Confirmation====
Once you sign up via the form, the tool responsible will contact you for the following details:
* Confirm that you have a sample ready.
* Confirm that you have shadowed your colleagues using the tool 2-3 times.
* Which tool do you want to use?
** '''ALD1''' available grown oxides: AlOx, HfOx, TiOx
** '''ALD2''' available grown oxides: AlOx, HfOx, ZrOx
** In ALD1, you are allowed to use resist for lift-off processes. In ALD2, '''you are not allowed to use a sample with resist on'''.
* Specify the process steps you want to run.
** Either the name of the recipe or all required process parameters.
====Before the training session====
* Watch the instruction video(s)
* Study the [[Atomic layer deposition|ALD principles]]
* Read the standard operating procedure on the [[Cambridge ALD|ALD tool page]].
====Training====
You'll need 2 sessions to get trained on this tool.
* Session 1 (30 mins) - teaches you how to load/unload the sample and how to run a recipe.
* Session 2 (30 mins) - sign off session
*: '''Note:''' An ALD session can have a long duration (often >12 hours). A usual training starts in the afternoon (load, setup, prepare recipe, run), and the film will grow throughout the evening. The next day, the user and the instructor will finish the training session (unloading).
'''The instructor has the right to ask for additional training sessions.'''
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== Packaging ==

=== F&S autobonder ===
A semi-automatic bonder to bond semiconductor substrates to PCB daughterboards from F&S Bondtec.

Apply for training via the [https://forms.office.com/e/b3PDKjsZ88?origin=lprLink NBI-Cleanroom Training Request Form].
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====Confirmation====
Once you sign up via the form, the tool responsible will contact you for the following details:
* Confirm that you have a '''chip''' ready for bonding.
* Confirm that you have shadowed your colleagues using the tool 2-3 times.
* You must know which '''daughterboard''' you will use for bonding (CPH, QBOARD1,2, QCAGE, Sydney, IC, custom).
* You must know what material you use to '''mount''' the chip to the daughterboard (mechanical clamping, silver paint, PMMA, other).
* Confirm that you have prepared a '''bonding schematic''' .
* By default, this bonder is using Al wire. You can request a special training if you want to use Au wire, but be aware it can be challenging.
*: Users are more likely to use the [[K&S bonder| K&S manual bonder]] for Au wire bonding.
* Specify the name of the recipe.
====Before the training session====
* Read the standard operating procedure on the [[FS bonder| FS bonder tool page]]
* Verify with one of your colleagues that your bonding schematic is correct.
==== Training ====
You'll need 2 sessions to get trained on this tool.
* Session 1 (2 hr.) - teaches you how to load/unload the sample and how to run a recipe.
* Session 2 (2 hr.) - sign off session
'''The instructor has the right to ask for additional training sessions.'''
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=== Manual bonder ===
Apply for sign-off via the [https://forms.office.com/e/b3PDKjsZ88?origin=lprLink NBI-Cleanroom Training Request Form].

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* Cleanroom doesn't train users in this tool.
* You need to get trained within your research group.
* Cleanroom will provide a sign-off session to ensure safety
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== Miscellaneous ==

=== Micromanipulator ===
Apply for sign-off via the [https://forms.office.com/e/b3PDKjsZ88?origin=lprLink NBI-Cleanroom Training Request Form].

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* Cleanroom doesn't train users in this tool.
* You need to get trained within your research group.
* Cleanroom will provide a sign-off session to ensure safety and verify that the user is aware of the dangers of working with nanoparticles.
==== Before you start your training sessions====
* You need to carefully read and familiarise yourself with the risks of exposure while [[Working with nanowires and nanotubes]]
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[[Category:Tools]]

Training

2026-06-29T11:32:27Z

Chenglee: /* Characterization */

Before submitting a training request, please review the prerequisites for each instrument listed below.

'''Starting in July 2026, a standardized training request form will be introduced. The new system will allow users to request training for multiple instruments using a single form''' ([https://forms.office.com/e/b3PDKjsZ88?origin=lprLink NBI-Cleanroom Training Request Form]). '''Please only request training for instruments that require immediate access'''. Following submission of the request form, email communication will continue to be used for scheduling and coordinating training activities. The Cleanroom staff will acknowledge and respond to training requests within 1-2 working days.

Please note that access to the Cleanroom, tool laboratories and individual instruments can only be granted after the required safety instructions and instrument training have been completed and approved by the Cleanroom staff. Upon successful completion of the training, users will be granted booking privileges through the Cleanroom Booking System.

To ensure continued competency and safe operation, booking privileges and laboratory access may expire after a period of inactivity (typically '''90 days''') for a given instrument or Cleanroom usage. In such cases, users will be required to complete a refresher training session before access can be reinstated.

== Cleanroom General Introduction ==
Before attending the training session, all users must read and familiarize themselves with the relevant safety information ([[Safety]]). ''Expand to view more information''.
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* The introductory session is scheduled from 09:15 to 15:00.
* Training sessions are conducted in group of 3-4 participants. Once a training date has been proposed by the Cleanroom staff, participants are required to confirm their attendance by email ([mailto:cleanroom@nbi.ku.dk cleanroom@nbi.ku.dk]).
* If fewer than 3 participants are available for a scheduled session, an alternative training date may be proposed. If a session reaches its maximum capacity of 4 participants, additional users will be placed on a waiting list and offered the next available training opportunity.
* Please identify a superuser from your research group who will serve as your mentor during your first few weeks of working in the Cleanroom.
* The designated mentor is responsible for guiding you through the standard procedures and best practices after the Cleanroom General Introduction.
* Once the mentor has determined that you are competent to work independently, they must notify the Cleanroom team via email.
* Full access to the Cleanroom laboratories will only be granted after the Cleanroom team has received this confirmation.
* Standard Training Program:
** 09:15-10:30: Cleanroom introduction
** Coffee break
** 10:45-12:00: Asher, spinners and optical microscopes
** Lunch break
** 13:00-14:00: Practical information
** 14:00-15:00: Q&A and account setup
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== Chemical Handling==

=== HF Safety Training ===
Before attending the training session, all users must read and familiarize themselves with the relevant safety information ([[Safety]]). ''Expand to view more information''.
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* The HF Safety introduction is offered on a monthly basis.
* Training sessions are conducted in groups of up to 4 participants.
* Once a training date has been proposed by the Cleanroom staff, participants must confirm their attendance by email.
* Users are required to complete the HF Handling Questionnaire (that you will receive from a Cleanroom staff) and submit it to the instructor during the training session.
* Each user must also designate an HF buddy. This person must be an authorized Cleanroom user with valid HF access and training.
* As HF handling involves significant safety risks, strict compliance to all safety requirements is mandatory.
* Users are expected to arrive fully prepared for the training session.
* The instructor reserves the right to suspend or terminate the training if a participant has not completed the required preparation or does not demonstrate an adequate understanding of the relevant safety procedures.
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== Lithography ==

=== Elionix 7000 (100 kV) ===
Elionix 7000 training is for advanced users and requires prior cleanroom tool competency.
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==== Prerequisites ====
* You must be at least a Master student or signed up for a long term (>6 months) project to be allowed to use the tool.
* Elionix is a high level tool. Make sure you are already trained to:
** Enter the cleanroom
** Use the microscope, spinner, asher

==== Training ====
* You'll need 4 sessions to get trained on this tool.
** Session 1 ( 1 hr.) - teaches you how to load/unload the sample and how to condition the beam.
** Session 2 ( 3 hr.) - involves exposing alignment marks and test patterns (any design: preferably one half of the overlay ,so to understand alignment later ).
** Session 3 ( 3 hr.) - involves using the exposed alignment marks for marker registration and exposing the 2nd pattern (i.e. the 2nd half of the overlay pattern).
** Session 4 involves exposing a "real" pattern on a "real" chip on your own to gain access.

==== Preparation ====
Before any training slots are booked on the tool you'll need all of the following prepared:
* Shadow senior users on the tool 2-3 times.
* Chip (comfortable to handle) spin coated with resist. This chip will be used for sessions 1 & 2. Please be aware of the coating and baking parameters for the resist.
* Any test design is preferred which has marks, overlay patterns that you will use to test alignment precision between two lithography steps. A Vernier pattern is commonly used. Feel free to test your ideas. Make sure you have something for both ''x'' and ''y'' directions. If you don't know how to start, check the [[Design template for EBL]].
* Convert your design files into the Elionix exposure format .co7. This can be done using Beamer in 4th floor design computers.
* Make sure all write fields are entirely in the positive coordinate space.
* Make sure neither exposure will take longer than 60 minutes at 500 pA current and dose of 1000 uC/cm2.
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=== Elionix F-125 (125 kV at QuanTech) ===
More information will be provided shortly.
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=== Heidelberg upg501 ===
Prepare your design file and coated chip before requesting Heidelberg upg501 training.
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* Have a design file ready. GDS, DXF or CIF format works fine. Make sure you are familiar with the design before your actual session.
* Have a chip spin coated with an appropriate photoresist before the training session.
** The photoresist is sensitive to white light. Use the yellow filter on the microscopes. The light source in the both scribers is white and will already expose your resist.
* What is your project alias? If unsure, contact your supervisor first.

Before the training session:
* Watch the instruction video and read the standard operating procedure on the [[Heidelberg µPG 501|Heidelberg µPG 501 tool page]], shadow the tool with your group members, and ask for a sign-off session.
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== Characterization ==
Request for training via [https://forms.office.com/e/b3PDKjsZ88?origin=lprLink NBI-Cleanroom Training Request Form].

=== Bruker Dimension Icon AFM ===
Bruker Dimension Icon is an atomic force microscope used for high-resolution and accurate measurements of surface topography.
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* AFM training is offered upon user request and is typically conducted on a one-on-one basis. Completion of the training usually requires 2-3 sessions, with each session lasting approximately 2-3 hours.
* Prior to attending the training sessions, users are expected to review and familiarize themselves with the AFM operating procedures ([[Bruker Dimension Icon AFM|AFM]]). Users are encouraged to shadow an authorized user on the instrument 2-3 times before starting formal training. In addition, having a suitable sample prepared in advance of the training is highly recommended.
* Where appropriate and subject to staff availability and project timelines, a staff member may also assist in carrying out user projects.
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=== JEOL 7800F SEM-EDS===
JEOL 7800F is a field-emission scanning electron microscope used for high-resolution imaging of surface morphology and compositional analysis.
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* SEM-EDS training is offered upon user request and is typically conducted on a one-on-one basis. Completion of the training usually requires 2-3 sessions, with each session lasting approximately 2-3 hours.
* Prior to attending the training sessions, users are expected to review and familiarize themselves with the SEM operating procedures ([[JEOL 7800F|JEOL JSM-7800F]]). Users are encouraged to shadow an authorized user on the instrument 2-3 times before starting formal training. In addition, having a suitable sample prepared in advance of the training is highly recommended.
* Where appropriate and subject to staff availability and project timelines, a staff member may also assist in carrying out user projects.
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=== JEOL 7800F Prime SEM ===
JEOL 7800F Prime is a field-emission scanning electron microscope used for high-resolution imaging of surface morphology.
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* SEM training is offered upon user request and is typically conducted on a one-on-one basis. Completion of the training usually requires 2-3 sessions, with each session lasting approximately 2-3 hours.
* Prior to attending the training sessions, users are expected to review and familiarize themselves with the SEM operating procedures ([[JEOL 7800F|JEOL JSM-7800F]]). Users are encouraged to shadow an authorized user on the instrument 2-3 times before starting formal training. In addition, having a suitable sample prepared in advance of the training is highly recommended.
* Where appropriate and subject to staff availability and project timelines, a staff member may also assist in carrying out user projects.
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=== Thermo Fisher Scientific Talos F200i S/TEM ===
Talos F200i is a versatile 200-kV field-emission (scanning) transmission electron microscope designed for high-throughput, high-resolution materials characterization.
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* This instrument is classified as a high-level tool, and training is selective. Users are required to have prior experience with TEM/STEM before being considered for training. Cleanroom staff reserves the right to decline a training request if the prerequisite requirements are not met.
* Where appropriate and subject to staff availability and project timelines, a staff member may also assist in carrying out user projects.
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=== Raith e-Line ===
Bring a prepared design package for sessions 1 and 2, including alignment and overlay test patterns.
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* A design (gds, dxf, cif) for sessions 1 & 2 with:
** 4 alignment crosses (find out what marks work on the tool from your sub-group).
** Something to break the symmetry so you can tell chip orientation with your bare eye.
** A pattern that you will use to test overlay (alignment between two lithography steps). A Vernier pattern is commonly used. Feel free to test your ideas.
** Something creative, somethin fun :) This is an exercise in learning CAD as well.
* What is your project alias? If unsure, contact your supervisor first.
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=== Woollam alpha-SE Ellipsometer ===
More information will be provided shortly.
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=== Filmetrics reflectometer ===
More information will be provided shortly.
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== Thin Film Deposition ==

=== Plassys Evaporator ===
A physical vapour deposition tool of aluminium via e-beam evaporation for Josephson junction fabrication.

Apply for training via the [https://forms.office.com/e/b3PDKjsZ88?origin=lprLink NBI-Cleanroom Training Request Form].
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====Confirmation====
Once you sign up via the form, the tool responsible will contact you for the following details:
* Confirm that you have a sample ready.
* Confirm that you have shadowed your colleagues using the tool 2-3 times.
* Specify process steps you want to run
*: Materials, thickness, tilt, milling, oxidation
* The name of the recipe.
==== Restrictions====
* Only Si and sapphire samples are allowed in the chamber.
==== Training ====
* You'll need 2 sessions to get trained on this tool.
** Session 1 (2 hr.) - teaches you how to load/unload the sample and how to run a recipe.
** Session 2 (2 hr.) - sign off session
'''The instructor has the right to ask for additional training sessions.'''
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=== AJA1 and AJA2: metallization, sputtering or ion milling ===
Two nearly identical Orion physical vapour deposition (PVD) systems from AJA International for sputtering and e-beam evaporation, and substrate milling.

Apply for training via the [https://forms.office.com/e/b3PDKjsZ88?origin=lprLink NBI-Cleanroom Training Request Form].
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====Confirmation====
Once you sign up via the form, the tool responsible will contact you for the following details:
* Confirm that you have a sample ready.
* Confirm that you have shadowed your colleagues using the tool 2-3 times.
* Specify process steps you want to run
*: Materials, thickness, tilt, milling, oxidation
* Which tool do you want to use?
** '''AJA1'''
*** e-beam materials: Ti, Al, Au, SiOx, Pt, Ti, Ge
*** DC sputtering: Nb2Ti, Ti
*** DC Kaufman milling
*** Oxidation
*** Stage rotation, no stage cooling
** '''AJA2'''
*** e-beam materials: Ti, Al, Au, Cr, Pt, Pd
*** DC sputtering: Ti
*** RF sputtering: Ti, Nb2Ti
*** RF milling
*** Stage cooling, no stage rotation
* Specify the process steps you want to run.
*: Either the name of the recipe or all required process parameters.

===Before the training session===
* Watch the instruction video(s)
*Read the standard operating procedure on the [[AJA Systems|AJA Systems tool page]].

==== Training ====
* You'll need 2 sessions to get trained on this tool.
** Session 1 ( 2 hr.) - teaches you how to load/unload the sample and how to run a recipe.
** Session 2 ( 2 hr.) - sign off session
The instructor has the right to ask for additional training sessions.
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=== ALD1 and ALD2===
Two nearly identical Savannah S100-like systems are used for atomic layer deposition.

Apply for training via the [https://forms.office.com/e/b3PDKjsZ88?origin=lprLink NBI-Cleanroom Training Request Form].
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====Confirmation====
Once you sign up via the form, the tool responsible will contact you for the following details:
* Confirm that you have a sample ready.
* Confirm that you have shadowed your colleagues using the tool 2-3 times.
* Which tool do you want to use?
** '''ALD1''' available grown oxides: AlOx, HfOx, TiOx
** '''ALD2''' available grown oxides: AlOx, HfOx, ZrOx
** In ALD1, you are allowed to use resist for lift-off processes. In ALD2, '''you are not allowed to use a sample with resist on'''.
* Specify the process steps you want to run.
** Either the name of the recipe or all required process parameters.
====Before the training session====
* Watch the instruction video(s)
* Study the [[Atomic layer deposition|ALD principles]]
* Read the standard operating procedure on the [[Cambridge ALD|ALD tool page]].
====Training====
You'll need 2 sessions to get trained on this tool.
* Session 1 (30 mins) - teaches you how to load/unload the sample and how to run a recipe.
* Session 2 (30 mins) - sign off session
*: '''Note:''' An ALD session can have a long duration (often >12 hours). A usual training starts in the afternoon (load, setup, prepare recipe, run), and the film will grow throughout the evening. The next day, the user and the instructor will finish the training session (unloading).
'''The instructor has the right to ask for additional training sessions.'''
</div>
</div>

== Packaging ==

=== F&S autobonder ===
A semi-automatic bonder to bond semiconductor substrates to PCB daughterboards from F&S Bondtec.

Apply for training via the [https://forms.office.com/e/b3PDKjsZ88?origin=lprLink NBI-Cleanroom Training Request Form].
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====Confirmation====
Once you sign up via the form, the tool responsible will contact you for the following details:
* Confirm that you have a '''chip''' ready for bonding.
* Confirm that you have shadowed your colleagues using the tool 2-3 times.
* You must know which '''daughterboard''' you will use for bonding (CPH, QBOARD1,2, QCAGE, Sydney, IC, custom).
* You must know what material you use to '''mount''' the chip to the daughterboard (mechanical clamping, silver paint, PMMA, other).
* Confirm that you have prepared a '''bonding schematic''' .
* By default, this bonder is using Al wire. You can request a special training if you want to use Au wire, but be aware it can be challenging.
*: Users are more likely to use the [[K&S bonder| K&S manual bonder]] for Au wire bonding.
* Specify the name of the recipe.
====Before the training session====
* Read the standard operating procedure on the [[FS bonder| FS bonder tool page]]
* Verify with one of your colleagues that your bonding schematic is correct.
==== Training ====
You'll need 2 sessions to get trained on this tool.
* Session 1 (2 hr.) - teaches you how to load/unload the sample and how to run a recipe.
* Session 2 (2 hr.) - sign off session
'''The instructor has the right to ask for additional training sessions.'''
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</div>

=== Manual bonder ===
Apply for sign-off via the [https://forms.office.com/e/b3PDKjsZ88?origin=lprLink NBI-Cleanroom Training Request Form].

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* Cleanroom doesn't train users in this tool.
* You need to get trained within your research group.
* Cleanroom will provide a sign-off session to ensure safety
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</div>

== Miscellaneous ==

=== Micromanipulator ===
Apply for sign-off via the [https://forms.office.com/e/b3PDKjsZ88?origin=lprLink NBI-Cleanroom Training Request Form].

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* Cleanroom doesn't train users in this tool.
* You need to get trained within your research group.
* Cleanroom will provide a sign-off session to ensure safety and verify that the user is aware of the dangers of working with nanoparticles.
==== Before you start your training sessions====
* You need to carefully read and familiarise yourself with the risks of exposure while [[Working with nanowires and nanotubes]]
</div>
</div>

[[Category:Tools]]

Training

2026-06-29T11:32:15Z

Chenglee: /* Characterization */

Before submitting a training request, please review the prerequisites for each instrument listed below.

'''Starting in July 2026, a standardized training request form will be introduced. The new system will allow users to request training for multiple instruments using a single form''' ([https://forms.office.com/e/b3PDKjsZ88?origin=lprLink NBI-Cleanroom Training Request Form]). '''Please only request training for instruments that require immediate access'''. Following submission of the request form, email communication will continue to be used for scheduling and coordinating training activities. The Cleanroom staff will acknowledge and respond to training requests within 1-2 working days.

Please note that access to the Cleanroom, tool laboratories and individual instruments can only be granted after the required safety instructions and instrument training have been completed and approved by the Cleanroom staff. Upon successful completion of the training, users will be granted booking privileges through the Cleanroom Booking System.

To ensure continued competency and safe operation, booking privileges and laboratory access may expire after a period of inactivity (typically '''90 days''') for a given instrument or Cleanroom usage. In such cases, users will be required to complete a refresher training session before access can be reinstated.

== Cleanroom General Introduction ==
Before attending the training session, all users must read and familiarize themselves with the relevant safety information ([[Safety]]). ''Expand to view more information''.
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* The introductory session is scheduled from 09:15 to 15:00.
* Training sessions are conducted in group of 3-4 participants. Once a training date has been proposed by the Cleanroom staff, participants are required to confirm their attendance by email ([mailto:cleanroom@nbi.ku.dk cleanroom@nbi.ku.dk]).
* If fewer than 3 participants are available for a scheduled session, an alternative training date may be proposed. If a session reaches its maximum capacity of 4 participants, additional users will be placed on a waiting list and offered the next available training opportunity.
* Please identify a superuser from your research group who will serve as your mentor during your first few weeks of working in the Cleanroom.
* The designated mentor is responsible for guiding you through the standard procedures and best practices after the Cleanroom General Introduction.
* Once the mentor has determined that you are competent to work independently, they must notify the Cleanroom team via email.
* Full access to the Cleanroom laboratories will only be granted after the Cleanroom team has received this confirmation.
* Standard Training Program:
** 09:15-10:30: Cleanroom introduction
** Coffee break
** 10:45-12:00: Asher, spinners and optical microscopes
** Lunch break
** 13:00-14:00: Practical information
** 14:00-15:00: Q&A and account setup
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== Chemical Handling==

=== HF Safety Training ===
Before attending the training session, all users must read and familiarize themselves with the relevant safety information ([[Safety]]). ''Expand to view more information''.
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* The HF Safety introduction is offered on a monthly basis.
* Training sessions are conducted in groups of up to 4 participants.
* Once a training date has been proposed by the Cleanroom staff, participants must confirm their attendance by email.
* Users are required to complete the HF Handling Questionnaire (that you will receive from a Cleanroom staff) and submit it to the instructor during the training session.
* Each user must also designate an HF buddy. This person must be an authorized Cleanroom user with valid HF access and training.
* As HF handling involves significant safety risks, strict compliance to all safety requirements is mandatory.
* Users are expected to arrive fully prepared for the training session.
* The instructor reserves the right to suspend or terminate the training if a participant has not completed the required preparation or does not demonstrate an adequate understanding of the relevant safety procedures.
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== Lithography ==

=== Elionix 7000 (100 kV) ===
Elionix 7000 training is for advanced users and requires prior cleanroom tool competency.
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==== Prerequisites ====
* You must be at least a Master student or signed up for a long term (>6 months) project to be allowed to use the tool.
* Elionix is a high level tool. Make sure you are already trained to:
** Enter the cleanroom
** Use the microscope, spinner, asher

==== Training ====
* You'll need 4 sessions to get trained on this tool.
** Session 1 ( 1 hr.) - teaches you how to load/unload the sample and how to condition the beam.
** Session 2 ( 3 hr.) - involves exposing alignment marks and test patterns (any design: preferably one half of the overlay ,so to understand alignment later ).
** Session 3 ( 3 hr.) - involves using the exposed alignment marks for marker registration and exposing the 2nd pattern (i.e. the 2nd half of the overlay pattern).
** Session 4 involves exposing a "real" pattern on a "real" chip on your own to gain access.

==== Preparation ====
Before any training slots are booked on the tool you'll need all of the following prepared:
* Shadow senior users on the tool 2-3 times.
* Chip (comfortable to handle) spin coated with resist. This chip will be used for sessions 1 & 2. Please be aware of the coating and baking parameters for the resist.
* Any test design is preferred which has marks, overlay patterns that you will use to test alignment precision between two lithography steps. A Vernier pattern is commonly used. Feel free to test your ideas. Make sure you have something for both ''x'' and ''y'' directions. If you don't know how to start, check the [[Design template for EBL]].
* Convert your design files into the Elionix exposure format .co7. This can be done using Beamer in 4th floor design computers.
* Make sure all write fields are entirely in the positive coordinate space.
* Make sure neither exposure will take longer than 60 minutes at 500 pA current and dose of 1000 uC/cm2.
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=== Elionix F-125 (125 kV at QuanTech) ===
More information will be provided shortly.
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=== Heidelberg upg501 ===
Prepare your design file and coated chip before requesting Heidelberg upg501 training.
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* Have a design file ready. GDS, DXF or CIF format works fine. Make sure you are familiar with the design before your actual session.
* Have a chip spin coated with an appropriate photoresist before the training session.
** The photoresist is sensitive to white light. Use the yellow filter on the microscopes. The light source in the both scribers is white and will already expose your resist.
* What is your project alias? If unsure, contact your supervisor first.

Before the training session:
* Watch the instruction video and read the standard operating procedure on the [[Heidelberg µPG 501|Heidelberg µPG 501 tool page]], shadow the tool with your group members, and ask for a sign-off session.
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== Characterization ==
Request for training [https://forms.office.com/e/b3PDKjsZ88?origin=lprLink NBI-Cleanroom Training Request Form].

=== Bruker Dimension Icon AFM ===
Bruker Dimension Icon is an atomic force microscope used for high-resolution and accurate measurements of surface topography.
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* AFM training is offered upon user request and is typically conducted on a one-on-one basis. Completion of the training usually requires 2-3 sessions, with each session lasting approximately 2-3 hours.
* Prior to attending the training sessions, users are expected to review and familiarize themselves with the AFM operating procedures ([[Bruker Dimension Icon AFM|AFM]]). Users are encouraged to shadow an authorized user on the instrument 2-3 times before starting formal training. In addition, having a suitable sample prepared in advance of the training is highly recommended.
* Where appropriate and subject to staff availability and project timelines, a staff member may also assist in carrying out user projects.
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=== JEOL 7800F SEM-EDS===
JEOL 7800F is a field-emission scanning electron microscope used for high-resolution imaging of surface morphology and compositional analysis.
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* SEM-EDS training is offered upon user request and is typically conducted on a one-on-one basis. Completion of the training usually requires 2-3 sessions, with each session lasting approximately 2-3 hours.
* Prior to attending the training sessions, users are expected to review and familiarize themselves with the SEM operating procedures ([[JEOL 7800F|JEOL JSM-7800F]]). Users are encouraged to shadow an authorized user on the instrument 2-3 times before starting formal training. In addition, having a suitable sample prepared in advance of the training is highly recommended.
* Where appropriate and subject to staff availability and project timelines, a staff member may also assist in carrying out user projects.
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=== JEOL 7800F Prime SEM ===
JEOL 7800F Prime is a field-emission scanning electron microscope used for high-resolution imaging of surface morphology.
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* SEM training is offered upon user request and is typically conducted on a one-on-one basis. Completion of the training usually requires 2-3 sessions, with each session lasting approximately 2-3 hours.
* Prior to attending the training sessions, users are expected to review and familiarize themselves with the SEM operating procedures ([[JEOL 7800F|JEOL JSM-7800F]]). Users are encouraged to shadow an authorized user on the instrument 2-3 times before starting formal training. In addition, having a suitable sample prepared in advance of the training is highly recommended.
* Where appropriate and subject to staff availability and project timelines, a staff member may also assist in carrying out user projects.
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=== Thermo Fisher Scientific Talos F200i S/TEM ===
Talos F200i is a versatile 200-kV field-emission (scanning) transmission electron microscope designed for high-throughput, high-resolution materials characterization.
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* This instrument is classified as a high-level tool, and training is selective. Users are required to have prior experience with TEM/STEM before being considered for training. Cleanroom staff reserves the right to decline a training request if the prerequisite requirements are not met.
* Where appropriate and subject to staff availability and project timelines, a staff member may also assist in carrying out user projects.
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=== Raith e-Line ===
Bring a prepared design package for sessions 1 and 2, including alignment and overlay test patterns.
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* A design (gds, dxf, cif) for sessions 1 & 2 with:
** 4 alignment crosses (find out what marks work on the tool from your sub-group).
** Something to break the symmetry so you can tell chip orientation with your bare eye.
** A pattern that you will use to test overlay (alignment between two lithography steps). A Vernier pattern is commonly used. Feel free to test your ideas.
** Something creative, somethin fun :) This is an exercise in learning CAD as well.
* What is your project alias? If unsure, contact your supervisor first.
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=== Woollam alpha-SE Ellipsometer ===
More information will be provided shortly.
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=== Filmetrics reflectometer ===
More information will be provided shortly.
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== Thin Film Deposition ==

=== Plassys Evaporator ===
A physical vapour deposition tool of aluminium via e-beam evaporation for Josephson junction fabrication.

Apply for training via the [https://forms.office.com/e/b3PDKjsZ88?origin=lprLink NBI-Cleanroom Training Request Form].
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====Confirmation====
Once you sign up via the form, the tool responsible will contact you for the following details:
* Confirm that you have a sample ready.
* Confirm that you have shadowed your colleagues using the tool 2-3 times.
* Specify process steps you want to run
*: Materials, thickness, tilt, milling, oxidation
* The name of the recipe.
==== Restrictions====
* Only Si and sapphire samples are allowed in the chamber.
==== Training ====
* You'll need 2 sessions to get trained on this tool.
** Session 1 (2 hr.) - teaches you how to load/unload the sample and how to run a recipe.
** Session 2 (2 hr.) - sign off session
'''The instructor has the right to ask for additional training sessions.'''
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=== AJA1 and AJA2: metallization, sputtering or ion milling ===
Two nearly identical Orion physical vapour deposition (PVD) systems from AJA International for sputtering and e-beam evaporation, and substrate milling.

Apply for training via the [https://forms.office.com/e/b3PDKjsZ88?origin=lprLink NBI-Cleanroom Training Request Form].
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====Confirmation====
Once you sign up via the form, the tool responsible will contact you for the following details:
* Confirm that you have a sample ready.
* Confirm that you have shadowed your colleagues using the tool 2-3 times.
* Specify process steps you want to run
*: Materials, thickness, tilt, milling, oxidation
* Which tool do you want to use?
** '''AJA1'''
*** e-beam materials: Ti, Al, Au, SiOx, Pt, Ti, Ge
*** DC sputtering: Nb2Ti, Ti
*** DC Kaufman milling
*** Oxidation
*** Stage rotation, no stage cooling
** '''AJA2'''
*** e-beam materials: Ti, Al, Au, Cr, Pt, Pd
*** DC sputtering: Ti
*** RF sputtering: Ti, Nb2Ti
*** RF milling
*** Stage cooling, no stage rotation
* Specify the process steps you want to run.
*: Either the name of the recipe or all required process parameters.

===Before the training session===
* Watch the instruction video(s)
*Read the standard operating procedure on the [[AJA Systems|AJA Systems tool page]].

==== Training ====
* You'll need 2 sessions to get trained on this tool.
** Session 1 ( 2 hr.) - teaches you how to load/unload the sample and how to run a recipe.
** Session 2 ( 2 hr.) - sign off session
The instructor has the right to ask for additional training sessions.
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=== ALD1 and ALD2===
Two nearly identical Savannah S100-like systems are used for atomic layer deposition.

Apply for training via the [https://forms.office.com/e/b3PDKjsZ88?origin=lprLink NBI-Cleanroom Training Request Form].
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====Confirmation====
Once you sign up via the form, the tool responsible will contact you for the following details:
* Confirm that you have a sample ready.
* Confirm that you have shadowed your colleagues using the tool 2-3 times.
* Which tool do you want to use?
** '''ALD1''' available grown oxides: AlOx, HfOx, TiOx
** '''ALD2''' available grown oxides: AlOx, HfOx, ZrOx
** In ALD1, you are allowed to use resist for lift-off processes. In ALD2, '''you are not allowed to use a sample with resist on'''.
* Specify the process steps you want to run.
** Either the name of the recipe or all required process parameters.
====Before the training session====
* Watch the instruction video(s)
* Study the [[Atomic layer deposition|ALD principles]]
* Read the standard operating procedure on the [[Cambridge ALD|ALD tool page]].
====Training====
You'll need 2 sessions to get trained on this tool.
* Session 1 (30 mins) - teaches you how to load/unload the sample and how to run a recipe.
* Session 2 (30 mins) - sign off session
*: '''Note:''' An ALD session can have a long duration (often >12 hours). A usual training starts in the afternoon (load, setup, prepare recipe, run), and the film will grow throughout the evening. The next day, the user and the instructor will finish the training session (unloading).
'''The instructor has the right to ask for additional training sessions.'''
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== Packaging ==

=== F&S autobonder ===
A semi-automatic bonder to bond semiconductor substrates to PCB daughterboards from F&S Bondtec.

Apply for training via the [https://forms.office.com/e/b3PDKjsZ88?origin=lprLink NBI-Cleanroom Training Request Form].
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====Confirmation====
Once you sign up via the form, the tool responsible will contact you for the following details:
* Confirm that you have a '''chip''' ready for bonding.
* Confirm that you have shadowed your colleagues using the tool 2-3 times.
* You must know which '''daughterboard''' you will use for bonding (CPH, QBOARD1,2, QCAGE, Sydney, IC, custom).
* You must know what material you use to '''mount''' the chip to the daughterboard (mechanical clamping, silver paint, PMMA, other).
* Confirm that you have prepared a '''bonding schematic''' .
* By default, this bonder is using Al wire. You can request a special training if you want to use Au wire, but be aware it can be challenging.
*: Users are more likely to use the [[K&S bonder| K&S manual bonder]] for Au wire bonding.
* Specify the name of the recipe.
====Before the training session====
* Read the standard operating procedure on the [[FS bonder| FS bonder tool page]]
* Verify with one of your colleagues that your bonding schematic is correct.
==== Training ====
You'll need 2 sessions to get trained on this tool.
* Session 1 (2 hr.) - teaches you how to load/unload the sample and how to run a recipe.
* Session 2 (2 hr.) - sign off session
'''The instructor has the right to ask for additional training sessions.'''
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=== Manual bonder ===
Apply for sign-off via the [https://forms.office.com/e/b3PDKjsZ88?origin=lprLink NBI-Cleanroom Training Request Form].

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* Cleanroom doesn't train users in this tool.
* You need to get trained within your research group.
* Cleanroom will provide a sign-off session to ensure safety
</div>
</div>

== Miscellaneous ==

=== Micromanipulator ===
Apply for sign-off via the [https://forms.office.com/e/b3PDKjsZ88?origin=lprLink NBI-Cleanroom Training Request Form].

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* Cleanroom doesn't train users in this tool.
* You need to get trained within your research group.
* Cleanroom will provide a sign-off session to ensure safety and verify that the user is aware of the dangers of working with nanoparticles.
==== Before you start your training sessions====
* You need to carefully read and familiarise yourself with the risks of exposure while [[Working with nanowires and nanotubes]]
</div>
</div>

[[Category:Tools]]

Training

2026-06-29T11:29:45Z

Chenglee:

Before submitting a training request, please review the prerequisites for each instrument listed below.

'''Starting in July 2026, a standardized training request form will be introduced. The new system will allow users to request training for multiple instruments using a single form''' ([https://forms.office.com/e/b3PDKjsZ88?origin=lprLink NBI-Cleanroom Training Request Form]). '''Please only request training for instruments that require immediate access'''. Following submission of the request form, email communication will continue to be used for scheduling and coordinating training activities. The Cleanroom staff will acknowledge and respond to training requests within 1-2 working days.

Please note that access to the Cleanroom, tool laboratories and individual instruments can only be granted after the required safety instructions and instrument training have been completed and approved by the Cleanroom staff. Upon successful completion of the training, users will be granted booking privileges through the Cleanroom Booking System.

To ensure continued competency and safe operation, booking privileges and laboratory access may expire after a period of inactivity (typically '''90 days''') for a given instrument or Cleanroom usage. In such cases, users will be required to complete a refresher training session before access can be reinstated.

== Cleanroom General Introduction ==
Before attending the training session, all users must read and familiarize themselves with the relevant safety information ([[Safety]]). ''Expand to view more information''.
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* The introductory session is scheduled from 09:15 to 15:00.
* Training sessions are conducted in group of 3-4 participants. Once a training date has been proposed by the Cleanroom staff, participants are required to confirm their attendance by email ([mailto:cleanroom@nbi.ku.dk cleanroom@nbi.ku.dk]).
* If fewer than 3 participants are available for a scheduled session, an alternative training date may be proposed. If a session reaches its maximum capacity of 4 participants, additional users will be placed on a waiting list and offered the next available training opportunity.
* Please identify a superuser from your research group who will serve as your mentor during your first few weeks of working in the Cleanroom.
* The designated mentor is responsible for guiding you through the standard procedures and best practices after the Cleanroom General Introduction.
* Once the mentor has determined that you are competent to work independently, they must notify the Cleanroom team via email.
* Full access to the Cleanroom laboratories will only be granted after the Cleanroom team has received this confirmation.
* Standard Training Program:
** 09:15-10:30: Cleanroom introduction
** Coffee break
** 10:45-12:00: Asher, spinners and optical microscopes
** Lunch break
** 13:00-14:00: Practical information
** 14:00-15:00: Q&A and account setup
</div>
</div>

== Chemical Handling==

=== HF Safety Training ===
Before attending the training session, all users must read and familiarize themselves with the relevant safety information ([[Safety]]). ''Expand to view more information''.
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* The HF Safety introduction is offered on a monthly basis.
* Training sessions are conducted in groups of up to 4 participants.
* Once a training date has been proposed by the Cleanroom staff, participants must confirm their attendance by email.
* Users are required to complete the HF Handling Questionnaire (that you will receive from a Cleanroom staff) and submit it to the instructor during the training session.
* Each user must also designate an HF buddy. This person must be an authorized Cleanroom user with valid HF access and training.
* As HF handling involves significant safety risks, strict compliance to all safety requirements is mandatory.
* Users are expected to arrive fully prepared for the training session.
* The instructor reserves the right to suspend or terminate the training if a participant has not completed the required preparation or does not demonstrate an adequate understanding of the relevant safety procedures.
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</div>

== Lithography ==

=== Elionix 7000 (100 kV) ===
Elionix 7000 training is for advanced users and requires prior cleanroom tool competency.
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==== Prerequisites ====
* You must be at least a Master student or signed up for a long term (>6 months) project to be allowed to use the tool.
* Elionix is a high level tool. Make sure you are already trained to:
** Enter the cleanroom
** Use the microscope, spinner, asher

==== Training ====
* You'll need 4 sessions to get trained on this tool.
** Session 1 ( 1 hr.) - teaches you how to load/unload the sample and how to condition the beam.
** Session 2 ( 3 hr.) - involves exposing alignment marks and test patterns (any design: preferably one half of the overlay ,so to understand alignment later ).
** Session 3 ( 3 hr.) - involves using the exposed alignment marks for marker registration and exposing the 2nd pattern (i.e. the 2nd half of the overlay pattern).
** Session 4 involves exposing a "real" pattern on a "real" chip on your own to gain access.

==== Preparation ====
Before any training slots are booked on the tool you'll need all of the following prepared:
* Shadow senior users on the tool 2-3 times.
* Chip (comfortable to handle) spin coated with resist. This chip will be used for sessions 1 & 2. Please be aware of the coating and baking parameters for the resist.
* Any test design is preferred which has marks, overlay patterns that you will use to test alignment precision between two lithography steps. A Vernier pattern is commonly used. Feel free to test your ideas. Make sure you have something for both ''x'' and ''y'' directions. If you don't know how to start, check the [[Design template for EBL]].
* Convert your design files into the Elionix exposure format .co7. This can be done using Beamer in 4th floor design computers.
* Make sure all write fields are entirely in the positive coordinate space.
* Make sure neither exposure will take longer than 60 minutes at 500 pA current and dose of 1000 uC/cm2.
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</div>

=== Elionix F-125 (125 kV at QuanTech) ===
More information will be provided shortly.
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=== Heidelberg upg501 ===
Prepare your design file and coated chip before requesting Heidelberg upg501 training.
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* Have a design file ready. GDS, DXF or CIF format works fine. Make sure you are familiar with the design before your actual session.
* Have a chip spin coated with an appropriate photoresist before the training session.
** The photoresist is sensitive to white light. Use the yellow filter on the microscopes. The light source in the both scribers is white and will already expose your resist.
* What is your project alias? If unsure, contact your supervisor first.

Before the training session:
* Watch the instruction video and read the standard operating procedure on the [[Heidelberg µPG 501|Heidelberg µPG 501 tool page]], shadow the tool with your group members, and ask for a sign-off session.
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</div>

== Characterization ==

=== Bruker Dimension Icon AFM ===
Bruker Dimension Icon is an atomic force microscope used for high-resolution and accurate measurements of surface topography.
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* AFM training is offered upon user request and is typically conducted on a one-on-one basis. Completion of the training usually requires 2-3 sessions, with each session lasting approximately 2-3 hours.
* Prior to attending the training sessions, users are expected to review and familiarize themselves with the AFM operating procedures ([[Bruker Dimension Icon AFM|AFM]]). Users are encouraged to shadow an authorized user on the instrument 2-3 times before starting formal training. In addition, having a suitable sample prepared in advance of the training is highly recommended.
* Where appropriate and subject to staff availability and project timelines, a staff member may also assist in carrying out user projects.
</div>
</div>

=== JEOL 7800F SEM-EDS===
JEOL 7800F is a field-emission scanning electron microscope used for high-resolution imaging of surface morphology and compositional analysis.
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* SEM-EDS training is offered upon user request and is typically conducted on a one-on-one basis. Completion of the training usually requires 2-3 sessions, with each session lasting approximately 2-3 hours.
* Prior to attending the training sessions, users are expected to review and familiarize themselves with the SEM operating procedures ([[JEOL 7800F|JEOL JSM-7800F]]). Users are encouraged to shadow an authorized user on the instrument 2-3 times before starting formal training. In addition, having a suitable sample prepared in advance of the training is highly recommended.
* Where appropriate and subject to staff availability and project timelines, a staff member may also assist in carrying out user projects.
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=== JEOL 7800F Prime SEM ===
JEOL 7800F Prime is a field-emission scanning electron microscope used for high-resolution imaging of surface morphology.
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* SEM training is offered upon user request and is typically conducted on a one-on-one basis. Completion of the training usually requires 2-3 sessions, with each session lasting approximately 2-3 hours.
* Prior to attending the training sessions, users are expected to review and familiarize themselves with the SEM operating procedures ([[JEOL 7800F|JEOL JSM-7800F]]). Users are encouraged to shadow an authorized user on the instrument 2-3 times before starting formal training. In addition, having a suitable sample prepared in advance of the training is highly recommended.
* Where appropriate and subject to staff availability and project timelines, a staff member may also assist in carrying out user projects.
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=== Thermo Fisher Scientific Talos F200i S/TEM ===
Talos F200i is a versatile 200-kV field-emission (scanning) transmission electron microscope designed for high-throughput, high-resolution materials characterization.
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* This instrument is classified as a high-level tool, and training is selective. Users are required to have prior experience with TEM/STEM before being considered for training. Cleanroom staff reserves the right to decline a training request if the prerequisite requirements are not met.
* Where appropriate and subject to staff availability and project timelines, a staff member may also assist in carrying out user projects.
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</div>

=== Raith e-Line ===
Bring a prepared design package for sessions 1 and 2, including alignment and overlay test patterns.
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* A design (gds, dxf, cif) for sessions 1 & 2 with:
** 4 alignment crosses (find out what marks work on the tool from your sub-group).
** Something to break the symmetry so you can tell chip orientation with your bare eye.
** A pattern that you will use to test overlay (alignment between two lithography steps). A Vernier pattern is commonly used. Feel free to test your ideas.
** Something creative, somethin fun :) This is an exercise in learning CAD as well.
* What is your project alias? If unsure, contact your supervisor first.
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</div>

=== Woollam alpha-SE Ellipsometer ===
More information will be provided shortly.
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=== Filmetrics reflectometer ===
More information will be provided shortly.
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== Thin Film Deposition ==

=== Plassys Evaporator ===
A physical vapour deposition tool of aluminium via e-beam evaporation for Josephson junction fabrication.

Apply for training via the [https://forms.office.com/e/b3PDKjsZ88?origin=lprLink NBI-Cleanroom Training Request Form].
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====Confirmation====
Once you sign up via the form, the tool responsible will contact you for the following details:
* Confirm that you have a sample ready.
* Confirm that you have shadowed your colleagues using the tool 2-3 times.
* Specify process steps you want to run
*: Materials, thickness, tilt, milling, oxidation
* The name of the recipe.
==== Restrictions====
* Only Si and sapphire samples are allowed in the chamber.
==== Training ====
* You'll need 2 sessions to get trained on this tool.
** Session 1 (2 hr.) - teaches you how to load/unload the sample and how to run a recipe.
** Session 2 (2 hr.) - sign off session
'''The instructor has the right to ask for additional training sessions.'''
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=== AJA1 and AJA2: metallization, sputtering or ion milling ===
Two nearly identical Orion physical vapour deposition (PVD) systems from AJA International for sputtering and e-beam evaporation, and substrate milling.

Apply for training via the [https://forms.office.com/e/b3PDKjsZ88?origin=lprLink NBI-Cleanroom Training Request Form].
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====Confirmation====
Once you sign up via the form, the tool responsible will contact you for the following details:
* Confirm that you have a sample ready.
* Confirm that you have shadowed your colleagues using the tool 2-3 times.
* Specify process steps you want to run
*: Materials, thickness, tilt, milling, oxidation
* Which tool do you want to use?
** '''AJA1'''
*** e-beam materials: Ti, Al, Au, SiOx, Pt, Ti, Ge
*** DC sputtering: Nb2Ti, Ti
*** DC Kaufman milling
*** Oxidation
*** Stage rotation, no stage cooling
** '''AJA2'''
*** e-beam materials: Ti, Al, Au, Cr, Pt, Pd
*** DC sputtering: Ti
*** RF sputtering: Ti, Nb2Ti
*** RF milling
*** Stage cooling, no stage rotation
* Specify the process steps you want to run.
*: Either the name of the recipe or all required process parameters.

===Before the training session===
* Watch the instruction video(s)
*Read the standard operating procedure on the [[AJA Systems|AJA Systems tool page]].

==== Training ====
* You'll need 2 sessions to get trained on this tool.
** Session 1 ( 2 hr.) - teaches you how to load/unload the sample and how to run a recipe.
** Session 2 ( 2 hr.) - sign off session
The instructor has the right to ask for additional training sessions.
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</div>

=== ALD1 and ALD2===
Two nearly identical Savannah S100-like systems are used for atomic layer deposition.

Apply for training via the [https://forms.office.com/e/b3PDKjsZ88?origin=lprLink NBI-Cleanroom Training Request Form].
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====Confirmation====
Once you sign up via the form, the tool responsible will contact you for the following details:
* Confirm that you have a sample ready.
* Confirm that you have shadowed your colleagues using the tool 2-3 times.
* Which tool do you want to use?
** '''ALD1''' available grown oxides: AlOx, HfOx, TiOx
** '''ALD2''' available grown oxides: AlOx, HfOx, ZrOx
** In ALD1, you are allowed to use resist for lift-off processes. In ALD2, '''you are not allowed to use a sample with resist on'''.
* Specify the process steps you want to run.
** Either the name of the recipe or all required process parameters.
====Before the training session====
* Watch the instruction video(s)
* Study the [[Atomic layer deposition|ALD principles]]
* Read the standard operating procedure on the [[Cambridge ALD|ALD tool page]].
====Training====
You'll need 2 sessions to get trained on this tool.
* Session 1 (30 mins) - teaches you how to load/unload the sample and how to run a recipe.
* Session 2 (30 mins) - sign off session
*: '''Note:''' An ALD session can have a long duration (often >12 hours). A usual training starts in the afternoon (load, setup, prepare recipe, run), and the film will grow throughout the evening. The next day, the user and the instructor will finish the training session (unloading).
'''The instructor has the right to ask for additional training sessions.'''
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</div>

== Packaging ==

=== F&S autobonder ===
A semi-automatic bonder to bond semiconductor substrates to PCB daughterboards from F&S Bondtec.

Apply for training via the [https://forms.office.com/e/b3PDKjsZ88?origin=lprLink NBI-Cleanroom Training Request Form].
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====Confirmation====
Once you sign up via the form, the tool responsible will contact you for the following details:
* Confirm that you have a '''chip''' ready for bonding.
* Confirm that you have shadowed your colleagues using the tool 2-3 times.
* You must know which '''daughterboard''' you will use for bonding (CPH, QBOARD1,2, QCAGE, Sydney, IC, custom).
* You must know what material you use to '''mount''' the chip to the daughterboard (mechanical clamping, silver paint, PMMA, other).
* Confirm that you have prepared a '''bonding schematic''' .
* By default, this bonder is using Al wire. You can request a special training if you want to use Au wire, but be aware it can be challenging.
*: Users are more likely to use the [[K&S bonder| K&S manual bonder]] for Au wire bonding.
* Specify the name of the recipe.
====Before the training session====
* Read the standard operating procedure on the [[FS bonder| FS bonder tool page]]
* Verify with one of your colleagues that your bonding schematic is correct.
==== Training ====
You'll need 2 sessions to get trained on this tool.
* Session 1 (2 hr.) - teaches you how to load/unload the sample and how to run a recipe.
* Session 2 (2 hr.) - sign off session
'''The instructor has the right to ask for additional training sessions.'''
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</div>

=== Manual bonder ===
Apply for sign-off via the [https://forms.office.com/e/b3PDKjsZ88?origin=lprLink NBI-Cleanroom Training Request Form].

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* Cleanroom doesn't train users in this tool.
* You need to get trained within your research group.
* Cleanroom will provide a sign-off session to ensure safety
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</div>

== Miscellaneous ==

=== Micromanipulator ===
Apply for sign-off via the [https://forms.office.com/e/b3PDKjsZ88?origin=lprLink NBI-Cleanroom Training Request Form].

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* Cleanroom doesn't train users in this tool.
* You need to get trained within your research group.
* Cleanroom will provide a sign-off session to ensure safety and verify that the user is aware of the dangers of working with nanoparticles.
==== Before you start your training sessions====
* You need to carefully read and familiarise yourself with the risks of exposure while [[Working with nanowires and nanotubes]]
</div>
</div>

[[Category:Tools]]

Tools

2026-06-29T09:24:01Z

Chenglee: /* Tool access requirement guidelines */

A prerequisite for using the cleanroom tools is that a cleanroom staff member has given the necessary instruction or training.
This includes basic instruments such as hotplates and microscopes.
For '''all''' training requests, please read the [[Training|training]] page and afterwards contact [mailto:cleanroom@nbi.ku.dk cleanroom@nbi.ku.dk].]
A cleanroom staff member will typically respond within one workday.
Do not contact individual staff members for training.

Once the user has completed the training, they are given booking rights in the [http://cleanroom.brickhost.com cleanroom booking system]. However, after a certain period of inactivity on a given tool, the booking rights will expire and the user will need to be retrained in order to continue using the tool.

== Tool list ==
{| style="width: 85%;"
|- style="text-align:left;"
! Lithography !! Thin film & III-Vs !! Characterization !! Other
|- valign="top"
| style="width: 20%;" |
* [[Heidelberg µPG 501|Heidelberg LED writer]]

* [[Raith eLine|Raith eLine 30 kV EBL/SEM]]
* [[Elionix_7000|Elionix 7000 100 kV EBL]]
* [[Elionix_F-125|Elionix F-125 125kV EBL]] (QuanTech)
| style="width: 20%;" |
* [[AJA systems]]
* [[Plassys Evaporator]]
* [[E-Gun evaporator]]

* [[Laurell spinners]]
* [[Cambridge ALD]]
* [[Leica sputter coater]]
* [[MBE]]
| style="width: 20%;" |
* [[JEOL 7800F|JEOL JSM-7800F]]
* [[Raith eLine]]
* [[Talos F200i S/TEM]]
* [[Tencor profilometer]]
* [[Alpha-SE ellipsometer]]
* [[Sensofar optical profiler]]
* [[Olympus microscopes]]
* [[Lynx EVO stereomicroscope]]
* [[Bruker Dimension Icon AFM]]
* [[Filmetrics reflectometer]]
* [[Probe station]]
| style="width: 20%;" |
* [[Süss scriber|Manual Süss scriber]]
* [[Loomis scriber|Automatic Loomis scriber]]
* [[Dicing saw]]
* [[AccuThermo RTA]]
* [[Biorad]]
* [[Plasma-Preen asher]]
* [[Diener plasma asher]]
* [[Tergeo plasma asher]]
* [[FS bonder]]
* [[K&S bonder]]
* [[Micromanipulator]]
* [[Präzitherm hotplates]]
* [[Critical point dryer]]
|}

== Tool access requirement guidelines ==

{| cellspacing=0px style="text-align: center;"
! scope="col" width="20%" align="right" |
! scope="col" width="20%" | Bachelor
! scope="col" width="20%" | Master
! scope="col" width="20%" | PhD
! scope="col" width="20%" | Postdoc
|-
| style="text-align:right; padding-right:6px;" | [[Raith eLine|eLine]]
| style="background-color: #ff9f9f" | No
| style="background-color: #c6e0b4" | Yes
| style="background-color: #c6e0b4" | Yes
| style="background-color: #c6e0b4" | Yes
|-
| style="text-align:right; padding-right:6px;" | [[Elionix]]
| style="background-color: #ff9f9f" | No
| style="background-color: #c6e0b4" | Yes
| style="background-color: #c6e0b4" | Yes
| style="background-color: #c6e0b4" | Yes
|-
| style="text-align:right; padding-right:6px;" | [[Heidelberg µPG 501|LED writer]]
| style="background-color: #ff9f9f" | No
| style="background-color: #c6e0b4" | Yes
| style="background-color: #c6e0b4" | Yes
| style="background-color: #c6e0b4" | Yes
|-
| style="padding-bottom:6px;" |
|-
| style="text-align:right; padding-right:6px;" | [[AJA Systems|AJAs]]
| style="background-color: #c6e0b4" | Yes
| style="background-color: #c6e0b4" | Yes
| style="background-color: #c6e0b4" | Yes
| style="background-color: #c6e0b4" | Yes
|-
| style="text-align:right; padding-right:6px;" | [[Plassys Evaporator|Plassys]]
| style="background-color: #c6e0b4" | Yes
| style="background-color: #c6e0b4" | Yes
| style="background-color: #c6e0b4" | Yes
| style="background-color: #c6e0b4" | Yes
|-
| style="text-align:right; padding-right:6px;" | [[E-Gun evaporator|E-gun]]
| style="background-color: #c6e0b4" | Yes
| style="background-color: #c6e0b4" | Yes
| style="background-color: #c6e0b4" | Yes
| style="background-color: #c6e0b4" | Yes
|-
| style="text-align:right; padding-right:6px;" | [[Cambridge ALD|ALD]]
| style="background-color: #c6e0b4" | Yes
| style="background-color: #c6e0b4" | Yes
| style="background-color: #c6e0b4" | Yes
| style="background-color: #c6e0b4" | Yes
|-
| style="text-align:right; padding-right:6px;" | [[Leica sputter coater|Leica sputter]]
| style="background-color: #c6e0b4" | Yes
| style="background-color: #c6e0b4" | Yes
| style="background-color: #c6e0b4" | Yes
| style="background-color: #c6e0b4" | Yes
|-
| style="padding-bottom:6px;" |
|-
| style="text-align:right; padding-right:6px;" | [[JEOL 7800F]]
| style="background-color: #ff9f9f" | No
| style="background-color: #c6e0b4" | Yes
| style="background-color: #c6e0b4" | Yes
| style="background-color: #c6e0b4" | Yes
|-
| style="text-align:right; padding-right:6px;" | [[Talos F200i S/TEM |TEM]]
| style="background-color: #ff9f9f" | No
| style="background-color: #ff9f9f" | No
| style="background-color: #c6e0b4" | Yes
| style="background-color: #c6e0b4" | Yes
|-
| style="text-align:right; padding-right:6px;" | [[Tencor profilometer|Profilometer]]
| style="background-color: #c6e0b4" | Yes
| style="background-color: #c6e0b4" | Yes
| style="background-color: #c6e0b4" | Yes
| style="background-color: #c6e0b4" | Yes
|-
| style="text-align:right; padding-right:6px;" | [[Alpha-SE Ellipsometer|Ellipsometer]]
| style="background-color: #c6e0b4" | Yes
| style="background-color: #c6e0b4" | Yes
| style="background-color: #c6e0b4" | Yes
| style="background-color: #c6e0b4" | Yes
|-

| style="text-align:right; padding-right:6px;" | [[Bruker Dimension Icon AFM|AFM]]
| style="background-color: #c6e0b4" | Yes
| style="background-color: #c6e0b4" | Yes
| style="background-color: #c6e0b4" | Yes
| style="background-color: #c6e0b4" | Yes
|-
| style="text-align:right; padding-right:6px;" | [[Filmetrics reflectometer|Filmetrics]]
| style="background-color: #c6e0b4" | Yes
| style="background-color: #c6e0b4" | Yes
| style="background-color: #c6e0b4" | Yes
| style="background-color: #c6e0b4" | Yes
|-
| style="padding-bottom:6px;" |
|-
| style="text-align:right; padding-right:6px;" | [[Süss scriber|Manual scriber]]
| style="background-color: #c6e0b4" | Yes
| style="background-color: #c6e0b4" | Yes
| style="background-color: #c6e0b4" | Yes
| style="background-color: #c6e0b4" | Yes
|-
| style="text-align:right; padding-right:6px;" | [[Dicing saw]]
| style="background-color: #ff9f9f" | No
| style="background-color: #ff9f9f" | No
| style="background-color: #ff9f9f" | No
| style="background-color: #ff9f9f" | No
|-
| style="text-align:right; padding-right:6px;" | [[Loomis scriber]]
| style="background-color: #ff9f9f" | No
| style="background-color: #ff9f9f" | No
| style="background-color: #ff9f9f" | No
| style="background-color: #ff9f9f" | No
|-
| style="text-align:right; padding-right:6px;" | [[AccuThermo RTA|RTA]]
| style="background-color: #c6e0b4" | Yes
| style="background-color: #c6e0b4" | Yes
| style="background-color: #c6e0b4" | Yes
| style="background-color: #c6e0b4" | Yes
|-
| style="text-align:right; padding-right:6px;" | [[Biorad]]
| style="background-color: #c6e0b4" | Yes
| style="background-color: #c6e0b4" | Yes
| style="background-color: #c6e0b4" | Yes
| style="background-color: #c6e0b4" | Yes
|-
| style="text-align:right; padding-right:6px;" | [[Plasma-Preen asher]]
| style="background-color: #c6e0b4" | Yes
| style="background-color: #c6e0b4" | Yes
| style="background-color: #c6e0b4" | Yes
| style="background-color: #c6e0b4" | Yes
|-
| style="text-align:right; padding-right:6px;" | [[Tergeo Plasma Asher|Tergeo asher]]
| style="background-color: #c6e0b4" | Yes
| style="background-color: #c6e0b4" | Yes
| style="background-color: #c6e0b4" | Yes
| style="background-color: #c6e0b4" | Yes
|-
| style="text-align:right; padding-right:6px;" | [[Laurell spinners|Spinners]]
| style="background-color: #c6e0b4" | Yes
| style="background-color: #c6e0b4" | Yes
| style="background-color: #c6e0b4" | Yes
| style="background-color: #c6e0b4" | Yes
|}

[[Category:Tools]]

Main Page

2026-06-29T08:41:34Z

Chenglee: /* Current tool status */

'''Welcome to the NBI Cleanroom wiki!'''

This site contains public information for the users of the cleanroom and related facilities. All items are available '''without login'''. Internal information that should not be disclosed can be posted at the password protected [https://wiki.nbi.ku.dk/qdevwiki/Main_Page QDev wiki].

{| style="width: 60%;" align="center"
|- style="text-align:center;"
|[[File:Tools_button.png|100px|link=Tools|Tools]] || [[File:Safety_button.png|100px|link=Safety|Safety]] || [[File:Fabrication_button.png|100px|link=Fabrication|Fabrication]] || [[File:Calendar_button.png|100px|link=http://cleanroom.brickhost.com/|Calendar]] || [[File:Training ico.png|100px|link=Training|Training]] || [[File:Info_button.png|100px|link=About|About]] || [[File:MBE.png|90px|link=MBE|MBE]] || [[File:sustain.png|90px|link=Sustainability|Sustainability]]
|- style="text-align:center;"
| Tools || Safety || Fabrication || Booking || Training || About || MBE || Sustainability
|}

==NEWS: NBI-Cleanroom Training Request Form==
Starting in July 2026, a standardized training request form will be introduced. The new system will allow users to request training for multiple instruments using a single form ([https://forms.office.com/e/b3PDKjsZ88?origin=lprLink NBI-Cleanroom Training Request Form]).

==Current tool status==

{| cellspacing=0px style="text-align: left;"
|-
| style="text-align:right; padding-right:6px;" | [[Heidelberg µPG 501|Heidelberg LED writer]]
| style="background-color: #c6e0b4" | All good!
|-
| style="text-align:right; padding-right:6px;" | [[Raith eLine|Raith eLine 30 kV]]
| style="background-color: #c6e0b4" | All good!
|-
| style="text-align:right; padding-right:6px;" | [[Elionix_7000|Elionix 7000 100 kV]]
| style="background-color: #ff9f9f" | Service: Blanking aperture. Expected recovery date: Until further notice.
|-
| style="text-align:right; padding-right:6px;" | [[Elionix_F-125|Elionix F-125 125 kV]]
| style="background-color: #c6e0b4" | All good!
|-
| style="padding-bottom:6px;" |
|-
| style="text-align:right; padding-right:6px;" | [[AJA systems|AJA1]]
| style="background-color: #FFBF00" | Minor issue with the on/off button of the Carrera FerroTech. Please contact cleanroom if the button isn't responding.
|-
| style="text-align:right; padding-right:6px;" | [[AJA systems|AJA2]]
| style="background-color: #c6e0b4" | All good!
|-
| style="text-align:right; padding-right:6px;" | [[Plassys Evaporator]]
| style="background-color: #c6e0b4" | All good!
|-
| style="text-align:right; padding-right:6px;" | [[E-Gun evaporator]]
| style="background-color: #c6e0b4" | All good! The chamber is dedicated to In
|-
| style="text-align:right; padding-right:6px;" | [[Cambridge ALD|ALD1]]
| style="background-color: #c6e0b4" | All good!
|-
| style="text-align:right; padding-right:6px;" | [[Cambridge ALD|ALD2]]
| style="background-color: #c6e0b4" | All good!
|-
| style="padding-bottom:6px;" |
|-
| style="text-align:right; padding-right:6px;" | [[FS bonder]]
| style="background-color: #c6e0b4" | All good!
|-
| style="text-align:right; padding-right:6px;" | [[K&S bonder]]
| style="background-color: #c6e0b4" | All good!
|-
| style="text-align:right; padding-right:6px;" | [[Loomis scriber]]
| style="background-color: #c6e0b4" | All good!
|-
| style="text-align:right; padding-right:6px;" | [[Dicing saw]]
| style="background-color: #c6e0b4" | All good!
|-
| style="padding-bottom:6px;" |
|-
| style="text-align:right; padding-right:6px;" | [[Bruker Dimension Icon AFM|AFM]]
| style="background-color: #c6e0b4" | All good!
|-
| style="text-align:right; padding-right:6px;" | [[JEOL 7800F|JEOL JSM-7800F]]
| style="background-color: #c6e0b4" | All good!
|-
| style="text-align:right; padding-right:6px;" | [[JEOL 7800F|JEOL JSM-7800F prime]]
| style="background-color: #c6e0b4" | All good!
|-
| style="text-align:right; padding-right:6px;" | [[Talos F200i S/TEM|TEM]]
| style="background-color: #FFBF00" | Damper issues affecting probe stability. Expected recovery date: end-of-June 2026.
|}

''List updated: Fri 12 Jun 2026''

Training

2026-06-26T16:58:37Z

Chenglee: /* JEOL 7800F Prime SEM (QuanTech) */

Before submitting a training request, please review the prerequisites for each instrument listed below.

Starting in July 2026, a standardized training request form will be introduced. The new system will allow users to request training for multiple instruments using a single form ([https://forms.office.com/e/b3PDKjsZ88?origin=lprLink NBI-Cleanroom Training Request Form]). '''Please only request training for instruments that require immediate access'''. Following submission of the request form, email communication will continue to be used for scheduling and coordinating training activities. The Cleanroom staff will acknowledge and respond to training requests within 1-2 working days.

Please note that access to the Cleanroom, tool laboratories and individual instruments can only be granted after the required safety instructions and instrument training have been completed and approved by the Cleanroom staff. Upon successful completion of the training, users will be granted booking privileges through the Cleanroom Booking System.

To ensure continued competency and safe operation, booking privileges and laboratory access may expire after a period of inactivity (typically '''90 days''') for a given instrument or Cleanroom usage. In such cases, users will be required to complete a refresher training session before access can be reinstated.

== Cleanroom General Introduction ==
Before attending the training session, all users must read and familiarize themselves with the relevant safety information ([[Safety]]). ''Expand to view more information''.
<div class="mw-collapsible mw-collapsed" style="border:1px solid #d8dde3; border-left:6px solid #72777d; background:#f8f9fa; border-radius:6px; margin:0.45em 0 1.0em; padding:0.55em 0.75em 0.55em;">
<div class="mw-collapsible-toggle" style="text-align:right; margin:-0.62em 0 0.25em; line-height:1;">'''Expand'''</div>
<div class="mw-collapsible-content">
* The introductory session is scheduled from 09:15 to 15:00.
* Training sessions are conducted in group of 3-4 participants. Once a training date has been proposed by the Cleanroom staff, participants are required to confirm their attendance by email ([mailto:cleanroom@nbi.ku.dk cleanroom@nbi.ku.dk]).
* If fewer than 3 participants are available for a scheduled session, an alternative training date may be proposed. If a session reaches its maximum capacity of 4 participants, additional users will be placed on a waiting list and offered the next available training opportunity.
* Please identify a superuser from your research group who will serve as your mentor during your first few weeks of working in the Cleanroom.
* The designated mentor is responsible for guiding you through the standard procedures and best practices after the Cleanroom General Introduction.
* Once the mentor has determined that you are competent to work independently, they must notify the Cleanroom team via email.
* Full access to the Cleanroom laboratories will only be granted after the Cleanroom team has received this confirmation.
* Standard Training Program:
** 09:15-10:30: Cleanroom introduction
** Coffee break
** 10:45-12:00: Asher, spinners and optical microscopes
** Lunch break
** 13:00-14:00: Practical information
** 14:00-15:00: Q&A and account setup
</div>
</div>

== Chemical Handling==

=== HF Safety Training ===
Before attending the training session, all users must read and familiarize themselves with the relevant safety information ([[Safety]]). ''Expand to view more information''.
<div class="mw-collapsible mw-collapsed" style="border:1px solid #d8dde3; border-left:6px solid #72777d; background:#f8f9fa; border-radius:6px; margin:0.45em 0 1.0em; padding:0.55em 0.75em 0.55em;">
<div class="mw-collapsible-toggle" style="text-align:right; margin:-0.62em 0 0.25em; line-height:1;">'''Expand'''</div>
<div class="mw-collapsible-content">
* The HF Safety introduction is offered on a monthly basis.
* Training sessions are conducted in groups of up to 4 participants.
* Once a training date has been proposed by the Cleanroom staff, participants must confirm their attendance by email.
* Users are required to complete the HF Handling Questionnaire (that you will receive from a Cleanroom staff) and submit it to the instructor during the training session.
* Each user must also designate an HF buddy. This person must be an authorized Cleanroom user with valid HF access and training.
* As HF handling involves significant safety risks, strict compliance to all safety requirements is mandatory.
* Users are expected to arrive fully prepared for the training session.
* The instructor reserves the right to suspend or terminate the training if a participant has not completed the required preparation or does not demonstrate an adequate understanding of the relevant safety procedures.
</div>
</div>

== Lithography ==

=== Elionix 7000 (100 kV) ===
Elionix 7000 training is for advanced users and requires prior cleanroom tool competency.
<div class="mw-collapsible mw-collapsed" style="border:1px solid #b8e2d5; border-left:6px solid #14866d; background:#f2fbf8; border-radius:6px; margin:0.45em 0 1.0em; padding:0.55em 0.75em 0.55em;">
<div class="mw-collapsible-toggle" style="text-align:right; margin:-0.62em 0 0.25em; line-height:1;">'''Expand'''</div>
<div class="mw-collapsible-content">
==== Prerequisites ====
* You must be at least a Master student or signed up for a long term (>6 months) project to be allowed to use the tool.
* Elionix is a high level tool. Make sure you are already trained to:
** Enter the cleanroom
** Use the microscope, spinner, asher

==== Training ====
* You'll need 4 sessions to get trained on this tool.
** Session 1 ( 1 hr.) - teaches you how to load/unload the sample and how to condition the beam.
** Session 2 ( 3 hr.) - involves exposing alignment marks and test patterns (any design: preferably one half of the overlay ,so to understand alignment later ).
** Session 3 ( 3 hr.) - involves using the exposed alignment marks for marker registration and exposing the 2nd pattern (i.e. the 2nd half of the overlay pattern).
** Session 4 involves exposing a "real" pattern on a "real" chip on your own to gain access.

==== Preparation ====
Before any training slots are booked on the tool you'll need all of the following prepared:
* Shadow senior users on the tool 2-3 times.
* Chip (comfortable to handle) spin coated with resist. This chip will be used for sessions 1 & 2. Please be aware of the coating and baking parameters for the resist.
* Any test design is preferred which has marks, overlay patterns that you will use to test alignment precision between two lithography steps. A Vernier pattern is commonly used. Feel free to test your ideas. Make sure you have something for both ''x'' and ''y'' directions. If you don't know how to start, check the [[Design template for EBL]].
* Convert your design files into the Elionix exposure format .co7. This can be done using Beamer in 4th floor design computers.
* Make sure all write fields are entirely in the positive coordinate space.
* Make sure neither exposure will take longer than 60 minutes at 500 pA current and dose of 1000 uC/cm2.
</div>
</div>

=== Elionix F-125 (125 kV at QuanTech) ===
More information will be provided shortly.
<div class="mw-collapsible mw-collapsed" style="border:1px solid #b8e2d5; border-left:6px solid #14866d; background:#f2fbf8; border-radius:6px; margin:0.45em 0 1.0em; padding:0.55em 0.75em 0.55em;">
<div class="mw-collapsible-toggle" style="text-align:right; margin:-0.62em 0 0.25em; line-height:1;">'''Expand'''</div>
<div class="mw-collapsible-content">
</div>
</div>

=== Heidelberg upg501 ===
Prepare your design file and coated chip before requesting Heidelberg upg501 training.
<div class="mw-collapsible mw-collapsed" style="border:1px solid #b8e2d5; border-left:6px solid #14866d; background:#f2fbf8; border-radius:6px; margin:0.45em 0 1.0em; padding:0.55em 0.75em 0.55em;">
<div class="mw-collapsible-toggle" style="text-align:right; margin:-0.62em 0 0.25em; line-height:1;">'''Expand'''</div>
<div class="mw-collapsible-content">
* Have a design file ready. GDS, DXF or CIF format works fine. Make sure you are familiar with the design before your actual session.
* Have a chip spin coated with an appropriate photoresist before the training session.
** The photoresist is sensitive to white light. Use the yellow filter on the microscopes. The light source in the both scribers is white and will already expose your resist.
* What is your project alias? If unsure, contact your supervisor first.

Before the training session:
* Watch the instruction video and read the standard operating procedure on the [[Heidelberg µPG 501|Heidelberg µPG 501 tool page]], shadow the tool with your group members, and ask for a sign-off session.
</div>
</div>

== Characterization ==

=== Bruker Dimension Icon AFM ===
Bruker Dimension Icon is an atomic force microscope used for high-resolution and accurate measurements of surface topography.
<div class="mw-collapsible mw-collapsed" style="border:1px solid #b7e1c1; border-left:6px solid #2a9d5b; background:#f2fbf5; border-radius:6px; margin:0.45em 0 1.0em; padding:0.55em 0.75em 0.55em;">
<div class="mw-collapsible-toggle" style="text-align:right; margin:-0.62em 0 0.25em; line-height:1;">'''Expand'''</div>
<div class="mw-collapsible-content">
* AFM training is offered upon user request and is typically conducted on a one-on-one basis. Completion of the training usually requires 2-3 sessions, with each session lasting approximately 2-3 hours.
* Prior to attending the training sessions, users are expected to review and familiarize themselves with the AFM operating procedures ([[Bruker Dimension Icon AFM|AFM]]). Users are encouraged to shadow an authorized user on the instrument 2-3 times before starting formal training. In addition, having a suitable sample prepared in advance of the training is highly recommended.
* Where appropriate and subject to staff availability and project timelines, a staff member may also assist in carrying out user projects.
</div>
</div>

=== JEOL 7800F SEM-EDS===
JEOL 7800F is a field-emission scanning electron microscope used for high-resolution imaging of surface morphology and compositional analysis.
<div class="mw-collapsible mw-collapsed" style="border:1px solid #b7e1c1; border-left:6px solid #2a9d5b; background:#f2fbf5; border-radius:6px; margin:0.45em 0 1.0em; padding:0.55em 0.75em 0.55em;">
<div class="mw-collapsible-toggle" style="text-align:right; margin:-0.62em 0 0.25em; line-height:1;">'''Expand'''</div>
<div class="mw-collapsible-content">
* SEM-EDS training is offered upon user request and is typically conducted on a one-on-one basis. Completion of the training usually requires 2-3 sessions, with each session lasting approximately 2-3 hours.
* Prior to attending the training sessions, users are expected to review and familiarize themselves with the SEM operating procedures ([[JEOL 7800F|JEOL JSM-7800F]]). Users are encouraged to shadow an authorized user on the instrument 2-3 times before starting formal training. In addition, having a suitable sample prepared in advance of the training is highly recommended.
* Where appropriate and subject to staff availability and project timelines, a staff member may also assist in carrying out user projects.
</div>
</div>

=== JEOL 7800F Prime SEM ===
JEOL 7800F Prime is a field-emission scanning electron microscope used for high-resolution imaging of surface morphology.
<div class="mw-collapsible mw-collapsed" style="border:1px solid #b7e1c1; border-left:6px solid #2a9d5b; background:#f2fbf5; border-radius:6px; margin:0.45em 0 1.0em; padding:0.55em 0.75em 0.55em;">
<div class="mw-collapsible-toggle" style="text-align:right; margin:-0.62em 0 0.25em; line-height:1;">'''Expand'''</div>
<div class="mw-collapsible-content">
* SEM training is offered upon user request and is typically conducted on a one-on-one basis. Completion of the training usually requires 2-3 sessions, with each session lasting approximately 2-3 hours.
* Prior to attending the training sessions, users are expected to review and familiarize themselves with the SEM operating procedures ([[JEOL 7800F|JEOL JSM-7800F]]). Users are encouraged to shadow an authorized user on the instrument 2-3 times before starting formal training. In addition, having a suitable sample prepared in advance of the training is highly recommended.
* Where appropriate and subject to staff availability and project timelines, a staff member may also assist in carrying out user projects.
</div>
</div>

=== Thermo Fisher Scientific Talos F200i S/TEM ===
Talos F200i is a versatile 200-kV field-emission (scanning) transmission electron microscope designed for high-throughput, high-resolution materials characterization.
<div class="mw-collapsible mw-collapsed" style="border:1px solid #b7e1c1; border-left:6px solid #2a9d5b; background:#f2fbf5; border-radius:6px; margin:0.45em 0 1.0em; padding:0.55em 0.75em 0.55em;">
<div class="mw-collapsible-toggle" style="text-align:right; margin:-0.62em 0 0.25em; line-height:1;">'''Expand'''</div>
<div class="mw-collapsible-content">
* This instrument is classified as a high-level tool, and training is selective. Users are required to have prior experience with TEM/STEM before being considered for training. Cleanroom staff reserves the right to decline a training request if the prerequisite requirements are not met.
* Where appropriate and subject to staff availability and project timelines, a staff member may also assist in carrying out user projects.
</div>
</div>

=== Raith e-Line ===
Bring a prepared design package for sessions 1 and 2, including alignment and overlay test patterns.
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* A design (gds, dxf, cif) for sessions 1 & 2 with:
** 4 alignment crosses (find out what marks work on the tool from your sub-group).
** Something to break the symmetry so you can tell chip orientation with your bare eye.
** A pattern that you will use to test overlay (alignment between two lithography steps). A Vernier pattern is commonly used. Feel free to test your ideas.
** Something creative, somethin fun :) This is an exercise in learning CAD as well.
* What is your project alias? If unsure, contact your supervisor first.
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</div>

=== Woollam alpha-SE Ellipsometer ===
More information will be provided shortly.
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=== Filmetrics reflectometer ===
More information will be provided shortly.
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== Thin Film Deposition ==

=== Plassys Evaporator ===
A physical vapour deposition tool of aluminium via e-beam evaporation for Josephson junction fabrication.

Apply for training via the [https://forms.office.com/e/b3PDKjsZ88?origin=lprLink NBI-Cleanroom Training Request Form].
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====Confirmation====
Once you sign up via the form, the tool responsible will contact you for the following details:
* Confirm that you have a sample ready.
* Confirm that you have shadowed your colleagues using the tool 2-3 times.
* Specify process steps you want to run
*: Materials, thickness, tilt, milling, oxidation
* The name of the recipe.
==== Restrictions====
* Only Si and sapphire samples are allowed in the chamber.
==== Training ====
* You'll need 2 sessions to get trained on this tool.
** Session 1 (2 hr.) - teaches you how to load/unload the sample and how to run a recipe.
** Session 2 (2 hr.) - sign off session
'''The instructor has the right to ask for additional training sessions.'''
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</div>

=== AJA1 and AJA2: metallization, sputtering or ion milling ===
Two nearly identical Orion physical vapour deposition (PVD) systems from AJA International for sputtering and e-beam evaporation, and substrate milling.

Apply for training via the [https://forms.office.com/e/b3PDKjsZ88?origin=lprLink NBI-Cleanroom Training Request Form].
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====Confirmation====
Once you sign up via the form, the tool responsible will contact you for the following details:
* Confirm that you have a sample ready.
* Confirm that you have shadowed your colleagues using the tool 2-3 times.
* Specify process steps you want to run
*: Materials, thickness, tilt, milling, oxidation
* Which tool do you want to use?
** '''AJA1'''
*** e-beam materials: Ti, Al, Au, SiOx, Pt, Ti, Ge
*** DC sputtering: Nb2Ti, Ti
*** DC Kaufman milling
*** Oxidation
*** Stage rotation, no stage cooling
** '''AJA2'''
*** e-beam materials: Ti, Al, Au, Cr, Pt, Pd
*** DC sputtering: Ti
*** RF sputtering: Ti, Nb2Ti
*** RF milling
*** Stage cooling, no stage rotation
* Specify the process steps you want to run.
*: Either the name of the recipe or all required process parameters.

===Before the training session===
* Watch the instruction video(s)
*Read the standard operating procedure on the [[AJA Systems|AJA Systems tool page]].

==== Training ====
* You'll need 2 sessions to get trained on this tool.
** Session 1 ( 2 hr.) - teaches you how to load/unload the sample and how to run a recipe.
** Session 2 ( 2 hr.) - sign off session
The instructor has the right to ask for additional training sessions.
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=== ALD1 and ALD2===
Two nearly identical Savannah S100-like systems are used for atomic layer deposition.

Apply for training via the [https://forms.office.com/e/b3PDKjsZ88?origin=lprLink NBI-Cleanroom Training Request Form].
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====Confirmation====
Once you sign up via the form, the tool responsible will contact you for the following details:
* Confirm that you have a sample ready.
* Confirm that you have shadowed your colleagues using the tool 2-3 times.
* Which tool do you want to use?
** '''ALD1''' available grown oxides: AlOx, HfOx, TiOx
** '''ALD2''' available grown oxides: AlOx, HfOx, ZrOx
** In ALD1, you are allowed to use resist for lift-off processes. In ALD2, '''you are not allowed to use a sample with resist on'''.
* Specify the process steps you want to run.
** Either the name of the recipe or all required process parameters.
====Before the training session====
* Watch the instruction video(s)
* Study the [[Atomic layer deposition|ALD principles]]
* Read the standard operating procedure on the [[Cambridge ALD|ALD tool page]].
====Training====
You'll need 2 sessions to get trained on this tool.
* Session 1 (30 mins) - teaches you how to load/unload the sample and how to run a recipe.
* Session 2 (30 mins) - sign off session
*: '''Note:''' An ALD session can have a long duration (often >12 hours). A usual training starts in the afternoon (load, setup, prepare recipe, run), and the film will grow throughout the evening. The next day, the user and the instructor will finish the training session (unloading).
'''The instructor has the right to ask for additional training sessions.'''
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== Packaging ==

=== F&S autobonder ===
A semi-automatic bonder to bond semiconductor substrates to PCB daughterboards from F&S Bondtec.

Apply for training via the [https://forms.office.com/e/b3PDKjsZ88?origin=lprLink NBI-Cleanroom Training Request Form].
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====Confirmation====
Once you sign up via the form, the tool responsible will contact you for the following details:
* Confirm that you have a '''chip''' ready for bonding.
* Confirm that you have shadowed your colleagues using the tool 2-3 times.
* You must know which '''daughterboard''' you will use for bonding (CPH, QBOARD1,2, QCAGE, Sydney, IC, custom).
* You must know what material you use to '''mount''' the chip to the daughterboard (mechanical clamping, silver paint, PMMA, other).
* Confirm that you have prepared a '''bonding schematic''' .
* By default, this bonder is using Al wire. You can request a special training if you want to use Au wire, but be aware it can be challenging.
*: Users are more likely to use the [[K&S bonder| K&S manual bonder]] for Au wire bonding.
* Specify the name of the recipe.
====Before the training session====
* Read the standard operating procedure on the [[FS bonder| FS bonder tool page]]
* Verify with one of your colleagues that your bonding schematic is correct.
==== Training ====
You'll need 2 sessions to get trained on this tool.
* Session 1 (2 hr.) - teaches you how to load/unload the sample and how to run a recipe.
* Session 2 (2 hr.) - sign off session
'''The instructor has the right to ask for additional training sessions.'''
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=== Manual bonder ===
More information will be provided shortly.
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== Miscellaneous ==

=== Micromanipulator ===
Apply for sign-off via the [https://forms.office.com/e/b3PDKjsZ88?origin=lprLink NBI-Cleanroom Training Request Form].

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* Cleanroom doesn't train users in this tool.
* You need to get trained within your research group.
* Cleanroom will provide a sign-off session to ensure safety and verify that the user is aware of the dangers of working with nanoparticles.
==== Before you start your training sessions====
* You need to carefully read and familiarise yourself with the risks of exposure while [[Working with nanowires and nanotubes]]
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</div>

[[Category:Tools]]

Training

2026-06-26T16:58:06Z

Chenglee: /* JEOL 7800F Prime SEM (QuanTech) */

Before submitting a training request, please review the prerequisites for each instrument listed below.

Starting in July 2026, a standardized training request form will be introduced. The new system will allow users to request training for multiple instruments using a single form ([https://forms.office.com/e/b3PDKjsZ88?origin=lprLink NBI-Cleanroom Training Request Form]). '''Please only request training for instruments that require immediate access'''. Following submission of the request form, email communication will continue to be used for scheduling and coordinating training activities. The Cleanroom staff will acknowledge and respond to training requests within 1-2 working days.

Please note that access to the Cleanroom, tool laboratories and individual instruments can only be granted after the required safety instructions and instrument training have been completed and approved by the Cleanroom staff. Upon successful completion of the training, users will be granted booking privileges through the Cleanroom Booking System.

To ensure continued competency and safe operation, booking privileges and laboratory access may expire after a period of inactivity (typically '''90 days''') for a given instrument or Cleanroom usage. In such cases, users will be required to complete a refresher training session before access can be reinstated.

== Cleanroom General Introduction ==
Before attending the training session, all users must read and familiarize themselves with the relevant safety information ([[Safety]]). ''Expand to view more information''.
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* The introductory session is scheduled from 09:15 to 15:00.
* Training sessions are conducted in group of 3-4 participants. Once a training date has been proposed by the Cleanroom staff, participants are required to confirm their attendance by email ([mailto:cleanroom@nbi.ku.dk cleanroom@nbi.ku.dk]).
* If fewer than 3 participants are available for a scheduled session, an alternative training date may be proposed. If a session reaches its maximum capacity of 4 participants, additional users will be placed on a waiting list and offered the next available training opportunity.
* Please identify a superuser from your research group who will serve as your mentor during your first few weeks of working in the Cleanroom.
* The designated mentor is responsible for guiding you through the standard procedures and best practices after the Cleanroom General Introduction.
* Once the mentor has determined that you are competent to work independently, they must notify the Cleanroom team via email.
* Full access to the Cleanroom laboratories will only be granted after the Cleanroom team has received this confirmation.
* Standard Training Program:
** 09:15-10:30: Cleanroom introduction
** Coffee break
** 10:45-12:00: Asher, spinners and optical microscopes
** Lunch break
** 13:00-14:00: Practical information
** 14:00-15:00: Q&A and account setup
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== Chemical Handling==

=== HF Safety Training ===
Before attending the training session, all users must read and familiarize themselves with the relevant safety information ([[Safety]]). ''Expand to view more information''.
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* The HF Safety introduction is offered on a monthly basis.
* Training sessions are conducted in groups of up to 4 participants.
* Once a training date has been proposed by the Cleanroom staff, participants must confirm their attendance by email.
* Users are required to complete the HF Handling Questionnaire (that you will receive from a Cleanroom staff) and submit it to the instructor during the training session.
* Each user must also designate an HF buddy. This person must be an authorized Cleanroom user with valid HF access and training.
* As HF handling involves significant safety risks, strict compliance to all safety requirements is mandatory.
* Users are expected to arrive fully prepared for the training session.
* The instructor reserves the right to suspend or terminate the training if a participant has not completed the required preparation or does not demonstrate an adequate understanding of the relevant safety procedures.
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== Lithography ==

=== Elionix 7000 (100 kV) ===
Elionix 7000 training is for advanced users and requires prior cleanroom tool competency.
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==== Prerequisites ====
* You must be at least a Master student or signed up for a long term (>6 months) project to be allowed to use the tool.
* Elionix is a high level tool. Make sure you are already trained to:
** Enter the cleanroom
** Use the microscope, spinner, asher

==== Training ====
* You'll need 4 sessions to get trained on this tool.
** Session 1 ( 1 hr.) - teaches you how to load/unload the sample and how to condition the beam.
** Session 2 ( 3 hr.) - involves exposing alignment marks and test patterns (any design: preferably one half of the overlay ,so to understand alignment later ).
** Session 3 ( 3 hr.) - involves using the exposed alignment marks for marker registration and exposing the 2nd pattern (i.e. the 2nd half of the overlay pattern).
** Session 4 involves exposing a "real" pattern on a "real" chip on your own to gain access.

==== Preparation ====
Before any training slots are booked on the tool you'll need all of the following prepared:
* Shadow senior users on the tool 2-3 times.
* Chip (comfortable to handle) spin coated with resist. This chip will be used for sessions 1 & 2. Please be aware of the coating and baking parameters for the resist.
* Any test design is preferred which has marks, overlay patterns that you will use to test alignment precision between two lithography steps. A Vernier pattern is commonly used. Feel free to test your ideas. Make sure you have something for both ''x'' and ''y'' directions. If you don't know how to start, check the [[Design template for EBL]].
* Convert your design files into the Elionix exposure format .co7. This can be done using Beamer in 4th floor design computers.
* Make sure all write fields are entirely in the positive coordinate space.
* Make sure neither exposure will take longer than 60 minutes at 500 pA current and dose of 1000 uC/cm2.
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=== Elionix F-125 (125 kV at QuanTech) ===
More information will be provided shortly.
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=== Heidelberg upg501 ===
Prepare your design file and coated chip before requesting Heidelberg upg501 training.
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* Have a design file ready. GDS, DXF or CIF format works fine. Make sure you are familiar with the design before your actual session.
* Have a chip spin coated with an appropriate photoresist before the training session.
** The photoresist is sensitive to white light. Use the yellow filter on the microscopes. The light source in the both scribers is white and will already expose your resist.
* What is your project alias? If unsure, contact your supervisor first.

Before the training session:
* Watch the instruction video and read the standard operating procedure on the [[Heidelberg µPG 501|Heidelberg µPG 501 tool page]], shadow the tool with your group members, and ask for a sign-off session.
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== Characterization ==

=== Bruker Dimension Icon AFM ===
Bruker Dimension Icon is an atomic force microscope used for high-resolution and accurate measurements of surface topography.
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* AFM training is offered upon user request and is typically conducted on a one-on-one basis. Completion of the training usually requires 2-3 sessions, with each session lasting approximately 2-3 hours.
* Prior to attending the training sessions, users are expected to review and familiarize themselves with the AFM operating procedures ([[Bruker Dimension Icon AFM|AFM]]). Users are encouraged to shadow an authorized user on the instrument 2-3 times before starting formal training. In addition, having a suitable sample prepared in advance of the training is highly recommended.
* Where appropriate and subject to staff availability and project timelines, a staff member may also assist in carrying out user projects.
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=== JEOL 7800F SEM-EDS===
JEOL 7800F is a field-emission scanning electron microscope used for high-resolution imaging of surface morphology and compositional analysis.
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* SEM-EDS training is offered upon user request and is typically conducted on a one-on-one basis. Completion of the training usually requires 2-3 sessions, with each session lasting approximately 2-3 hours.
* Prior to attending the training sessions, users are expected to review and familiarize themselves with the SEM operating procedures ([[JEOL 7800F|JEOL JSM-7800F]]). Users are encouraged to shadow an authorized user on the instrument 2-3 times before starting formal training. In addition, having a suitable sample prepared in advance of the training is highly recommended.
* Where appropriate and subject to staff availability and project timelines, a staff member may also assist in carrying out user projects.
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=== JEOL 7800F Prime SEM (QuanTech) ===
JEOL 7800F Prime is a field-emission scanning electron microscope used for high-resolution imaging of surface morphology.
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* SEM training is offered upon user request and is typically conducted on a one-on-one basis. Completion of the training usually requires 2-3 sessions, with each session lasting approximately 2-3 hours.
* Prior to attending the training sessions, users are expected to review and familiarize themselves with the SEM operating procedures ([[JEOL 7800F|JEOL JSM-7800F]]). Users are encouraged to shadow an authorized user on the instrument 2-3 times before starting formal training. In addition, having a suitable sample prepared in advance of the training is highly recommended.
* Where appropriate and subject to staff availability and project timelines, a staff member may also assist in carrying out user projects.
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=== Thermo Fisher Scientific Talos F200i S/TEM ===
Talos F200i is a versatile 200-kV field-emission (scanning) transmission electron microscope designed for high-throughput, high-resolution materials characterization.
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* This instrument is classified as a high-level tool, and training is selective. Users are required to have prior experience with TEM/STEM before being considered for training. Cleanroom staff reserves the right to decline a training request if the prerequisite requirements are not met.
* Where appropriate and subject to staff availability and project timelines, a staff member may also assist in carrying out user projects.
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=== Raith e-Line ===
Bring a prepared design package for sessions 1 and 2, including alignment and overlay test patterns.
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* A design (gds, dxf, cif) for sessions 1 & 2 with:
** 4 alignment crosses (find out what marks work on the tool from your sub-group).
** Something to break the symmetry so you can tell chip orientation with your bare eye.
** A pattern that you will use to test overlay (alignment between two lithography steps). A Vernier pattern is commonly used. Feel free to test your ideas.
** Something creative, somethin fun :) This is an exercise in learning CAD as well.
* What is your project alias? If unsure, contact your supervisor first.
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=== Woollam alpha-SE Ellipsometer ===
More information will be provided shortly.
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=== Filmetrics reflectometer ===
More information will be provided shortly.
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== Thin Film Deposition ==

=== Plassys Evaporator ===
A physical vapour deposition tool of aluminium via e-beam evaporation for Josephson junction fabrication.

Apply for training via the [https://forms.office.com/e/b3PDKjsZ88?origin=lprLink NBI-Cleanroom Training Request Form].
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====Confirmation====
Once you sign up via the form, the tool responsible will contact you for the following details:
* Confirm that you have a sample ready.
* Confirm that you have shadowed your colleagues using the tool 2-3 times.
* Specify process steps you want to run
*: Materials, thickness, tilt, milling, oxidation
* The name of the recipe.
==== Restrictions====
* Only Si and sapphire samples are allowed in the chamber.
==== Training ====
* You'll need 2 sessions to get trained on this tool.
** Session 1 (2 hr.) - teaches you how to load/unload the sample and how to run a recipe.
** Session 2 (2 hr.) - sign off session
'''The instructor has the right to ask for additional training sessions.'''
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</div>

=== AJA1 and AJA2: metallization, sputtering or ion milling ===
Two nearly identical Orion physical vapour deposition (PVD) systems from AJA International for sputtering and e-beam evaporation, and substrate milling.

Apply for training via the [https://forms.office.com/e/b3PDKjsZ88?origin=lprLink NBI-Cleanroom Training Request Form].
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====Confirmation====
Once you sign up via the form, the tool responsible will contact you for the following details:
* Confirm that you have a sample ready.
* Confirm that you have shadowed your colleagues using the tool 2-3 times.
* Specify process steps you want to run
*: Materials, thickness, tilt, milling, oxidation
* Which tool do you want to use?
** '''AJA1'''
*** e-beam materials: Ti, Al, Au, SiOx, Pt, Ti, Ge
*** DC sputtering: Nb2Ti, Ti
*** DC Kaufman milling
*** Oxidation
*** Stage rotation, no stage cooling
** '''AJA2'''
*** e-beam materials: Ti, Al, Au, Cr, Pt, Pd
*** DC sputtering: Ti
*** RF sputtering: Ti, Nb2Ti
*** RF milling
*** Stage cooling, no stage rotation
* Specify the process steps you want to run.
*: Either the name of the recipe or all required process parameters.

===Before the training session===
* Watch the instruction video(s)
*Read the standard operating procedure on the [[AJA Systems|AJA Systems tool page]].

==== Training ====
* You'll need 2 sessions to get trained on this tool.
** Session 1 ( 2 hr.) - teaches you how to load/unload the sample and how to run a recipe.
** Session 2 ( 2 hr.) - sign off session
The instructor has the right to ask for additional training sessions.
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=== ALD1 and ALD2===
Two nearly identical Savannah S100-like systems are used for atomic layer deposition.

Apply for training via the [https://forms.office.com/e/b3PDKjsZ88?origin=lprLink NBI-Cleanroom Training Request Form].
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====Confirmation====
Once you sign up via the form, the tool responsible will contact you for the following details:
* Confirm that you have a sample ready.
* Confirm that you have shadowed your colleagues using the tool 2-3 times.
* Which tool do you want to use?
** '''ALD1''' available grown oxides: AlOx, HfOx, TiOx
** '''ALD2''' available grown oxides: AlOx, HfOx, ZrOx
** In ALD1, you are allowed to use resist for lift-off processes. In ALD2, '''you are not allowed to use a sample with resist on'''.
* Specify the process steps you want to run.
** Either the name of the recipe or all required process parameters.
====Before the training session====
* Watch the instruction video(s)
* Study the [[Atomic layer deposition|ALD principles]]
* Read the standard operating procedure on the [[Cambridge ALD|ALD tool page]].
====Training====
You'll need 2 sessions to get trained on this tool.
* Session 1 (30 mins) - teaches you how to load/unload the sample and how to run a recipe.
* Session 2 (30 mins) - sign off session
*: '''Note:''' An ALD session can have a long duration (often >12 hours). A usual training starts in the afternoon (load, setup, prepare recipe, run), and the film will grow throughout the evening. The next day, the user and the instructor will finish the training session (unloading).
'''The instructor has the right to ask for additional training sessions.'''
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== Packaging ==

=== F&S autobonder ===
A semi-automatic bonder to bond semiconductor substrates to PCB daughterboards from F&S Bondtec.

Apply for training via the [https://forms.office.com/e/b3PDKjsZ88?origin=lprLink NBI-Cleanroom Training Request Form].
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====Confirmation====
Once you sign up via the form, the tool responsible will contact you for the following details:
* Confirm that you have a '''chip''' ready for bonding.
* Confirm that you have shadowed your colleagues using the tool 2-3 times.
* You must know which '''daughterboard''' you will use for bonding (CPH, QBOARD1,2, QCAGE, Sydney, IC, custom).
* You must know what material you use to '''mount''' the chip to the daughterboard (mechanical clamping, silver paint, PMMA, other).
* Confirm that you have prepared a '''bonding schematic''' .
* By default, this bonder is using Al wire. You can request a special training if you want to use Au wire, but be aware it can be challenging.
*: Users are more likely to use the [[K&S bonder| K&S manual bonder]] for Au wire bonding.
* Specify the name of the recipe.
====Before the training session====
* Read the standard operating procedure on the [[FS bonder| FS bonder tool page]]
* Verify with one of your colleagues that your bonding schematic is correct.
==== Training ====
You'll need 2 sessions to get trained on this tool.
* Session 1 (2 hr.) - teaches you how to load/unload the sample and how to run a recipe.
* Session 2 (2 hr.) - sign off session
'''The instructor has the right to ask for additional training sessions.'''
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=== Manual bonder ===
More information will be provided shortly.
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== Miscellaneous ==

=== Micromanipulator ===
Apply for sign-off via the [https://forms.office.com/e/b3PDKjsZ88?origin=lprLink NBI-Cleanroom Training Request Form].

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* Cleanroom doesn't train users in this tool.
* You need to get trained within your research group.
* Cleanroom will provide a sign-off session to ensure safety and verify that the user is aware of the dangers of working with nanoparticles.
==== Before you start your training sessions====
* You need to carefully read and familiarise yourself with the risks of exposure while [[Working with nanowires and nanotubes]]
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[[Category:Tools]]

Training

2026-06-26T14:12:30Z

Chenglee: /* Packaging */

Before submitting a training request, please review the prerequisites for each instrument listed below.

Starting in July 2026, a standardized training request form will be introduced. The new system will allow users to request training for multiple instruments using a single form ([https://forms.office.com/e/b3PDKjsZ88?origin=lprLink NBI-Cleanroom Training Request Form]). '''Please only request training for instruments that require immediate access'''. Following submission of the request form, email communication will continue to be used for scheduling and coordinating training activities. The Cleanroom staff will acknowledge and respond to training requests within 1-2 working days.

Please note that access to the Cleanroom, tool laboratories and individual instruments can only be granted after the required safety instructions and instrument training have been completed and approved by the Cleanroom staff. Upon successful completion of the training, users will be granted booking privileges through the Cleanroom Booking System.

To ensure continued competency and safe operation, booking privileges and laboratory access may expire after a period of inactivity (typically '''90 days''') for a given instrument or Cleanroom usage. In such cases, users will be required to complete a refresher training session before access can be reinstated.

== Cleanroom General Introduction ==
Before attending the training session, all users must read and familiarize themselves with the relevant safety information ([[Safety]]). ''Expand to view more information''.
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* The introductory session is scheduled from 09:15 to 15:00.
* Training sessions are conducted in group of 3-4 participants. Once a training date has been proposed by the Cleanroom staff, participants are required to confirm their attendance by email ([mailto:cleanroom@nbi.ku.dk cleanroom@nbi.ku.dk]).
* If fewer than 3 participants are available for a scheduled session, an alternative training date may be proposed. If a session reaches its maximum capacity of 4 participants, additional users will be placed on a waiting list and offered the next available training opportunity.
* Please identify a superuser from your research group who will serve as your mentor during your first few weeks of working in the Cleanroom.
* The designated mentor is responsible for guiding you through the standard procedures and best practices after the Cleanroom General Introduction.
* Once the mentor has determined that you are competent to work independently, they must notify the Cleanroom team via email.
* Full access to the Cleanroom laboratories will only be granted after the Cleanroom team has received this confirmation.
* Standard Training Program:
** 09:15-10:30: Cleanroom introduction
** Coffee break
** 10:45-12:00: Asher, spinners and optical microscopes
** Lunch break
** 13:00-14:00: Practical information
** 14:00-15:00: Q&A and account setup
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== Chemical Handling==

=== HF Safety Training ===
Before attending the training session, all users must read and familiarize themselves with the relevant safety information ([[Safety]]). ''Expand to view more information''.
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* The HF Safety introduction is offered on a monthly basis.
* Training sessions are conducted in groups of up to 4 participants.
* Once a training date has been proposed by the Cleanroom staff, participants must confirm their attendance by email.
* Users are required to complete the HF Handling Questionnaire (that you will receive from a Cleanroom staff) and submit it to the instructor during the training session.
* Each user must also designate an HF buddy. This person must be an authorized Cleanroom user with valid HF access and training.
* As HF handling involves significant safety risks, strict compliance to all safety requirements is mandatory.
* Users are expected to arrive fully prepared for the training session.
* The instructor reserves the right to suspend or terminate the training if a participant has not completed the required preparation or does not demonstrate an adequate understanding of the relevant safety procedures.
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== Lithography ==

=== Elionix 7000 (100 kV) ===
Elionix 7000 training is for advanced users and requires prior cleanroom tool competency.
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==== Prerequisites ====
* You must be at least a Master student or signed up for a long term (>6 months) project to be allowed to use the tool.
* Elionix is a high level tool. Make sure you are already trained to:
** Enter the cleanroom
** Use the microscope, spinner, asher

==== Training ====
* You'll need 4 sessions to get trained on this tool.
** Session 1 ( 1 hr.) - teaches you how to load/unload the sample and how to condition the beam.
** Session 2 ( 3 hr.) - involves exposing alignment marks and test patterns (any design: preferably one half of the overlay ,so to understand alignment later ).
** Session 3 ( 3 hr.) - involves using the exposed alignment marks for marker registration and exposing the 2nd pattern (i.e. the 2nd half of the overlay pattern).
** Session 4 involves exposing a "real" pattern on a "real" chip on your own to gain access.

==== Preparation ====
Before any training slots are booked on the tool you'll need all of the following prepared:
* Shadow senior users on the tool 2-3 times.
* Chip (comfortable to handle) spin coated with resist. This chip will be used for sessions 1 & 2. Please be aware of the coating and baking parameters for the resist.
* Any test design is preferred which has marks, overlay patterns that you will use to test alignment precision between two lithography steps. A Vernier pattern is commonly used. Feel free to test your ideas. Make sure you have something for both ''x'' and ''y'' directions. If you don't know how to start, check the [[Design template for EBL]].
* Convert your design files into the Elionix exposure format .co7. This can be done using Beamer in 4th floor design computers.
* Make sure all write fields are entirely in the positive coordinate space.
* Make sure neither exposure will take longer than 60 minutes at 500 pA current and dose of 1000 uC/cm2.
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=== Elionix F-125 (125 kV at QuanTech) ===
More information will be provided shortly.
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=== Heidelberg upg501 ===
Prepare your design file and coated chip before requesting Heidelberg upg501 training.
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* Have a design file ready. GDS, DXF or CIF format works fine. Make sure you are familiar with the design before your actual session.
* Have a chip spin coated with an appropriate photoresist before the training session.
** The photoresist is sensitive to white light. Use the yellow filter on the microscopes. The light source in the both scribers is white and will already expose your resist.
* What is your project alias? If unsure, contact your supervisor first.

Before the training session:
* Watch the instruction video and read the standard operating procedure on the [[Heidelberg µPG 501|Heidelberg µPG 501 tool page]], shadow the tool with your group members, and ask for a sign-off session.
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== Characterization ==

=== Bruker Dimension Icon AFM ===
Bruker Dimension Icon is an atomic force microscope used for high-resolution and accurate measurements of surface topography.
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* AFM training is offered upon user request and is typically conducted on a one-on-one basis. Completion of the training usually requires 2-3 sessions, with each session lasting approximately 2-3 hours.
* Prior to attending the training sessions, users are expected to review and familiarize themselves with the AFM operating procedures ([[Bruker Dimension Icon AFM|AFM]]). Users are encouraged to shadow an authorized user on the instrument 2-3 times before starting formal training. In addition, having a suitable sample prepared in advance of the training is highly recommended.
* Where appropriate and subject to staff availability and project timelines, a staff member may also assist in carrying out user projects.
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=== JEOL 7800F SEM-EDS===
JEOL 7800F is a field-emission scanning electron microscope used for high-resolution imaging of surface morphology and compositional analysis.
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* SEM-EDS training is offered upon user request and is typically conducted on a one-on-one basis. Completion of the training usually requires 2-3 sessions, with each session lasting approximately 2-3 hours.
* Prior to attending the training sessions, users are expected to review and familiarize themselves with the SEM operating procedures ([[JEOL 7800F|JEOL JSM-7800F]]). Users are encouraged to shadow an authorized user on the instrument 2-3 times before starting formal training. In addition, having a suitable sample prepared in advance of the training is highly recommended.
* Where appropriate and subject to staff availability and project timelines, a staff member may also assist in carrying out user projects.
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=== JEOL 7800F Prime SEM (QuanTech) ===
JEOL 7800F Prime is a field-emission scanning electron microscope used for high-resolution imaging of surface morphology.
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* SEM training is offered upon user request and is typically conducted on a one-on-one basis. Completion of the training usually requires 2-3 sessions, with each session lasting approximately 2-3 hours.
* Prior to attending the training sessions, users are expected to review and familiarize themselves with the SEM operating procedures ([[JEOL 7800F|JEOL JSM-7800F]]). Users are encouraged to shadow an authorized user on the instrument 2-3 times before starting formal training. In addition, having a suitable sample prepared in advance of the training is highly recommended.
* Where appropriate and subject to staff availability and project timelines, a staff member may also assist in carrying out user projects.
Training is usually 2-3 sessions of 2-hour per session.
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=== Thermo Fisher Scientific Talos F200i S/TEM ===
Talos F200i is a versatile 200-kV field-emission (scanning) transmission electron microscope designed for high-throughput, high-resolution materials characterization.
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* This instrument is classified as a high-level tool, and training is selective. Users are required to have prior experience with TEM/STEM before being considered for training. Cleanroom staff reserves the right to decline a training request if the prerequisite requirements are not met.
* Where appropriate and subject to staff availability and project timelines, a staff member may also assist in carrying out user projects.
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=== Raith e-Line ===
Bring a prepared design package for sessions 1 and 2, including alignment and overlay test patterns.
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* A design (gds, dxf, cif) for sessions 1 & 2 with:
** 4 alignment crosses (find out what marks work on the tool from your sub-group).
** Something to break the symmetry so you can tell chip orientation with your bare eye.
** A pattern that you will use to test overlay (alignment between two lithography steps). A Vernier pattern is commonly used. Feel free to test your ideas.
** Something creative, somethin fun :) This is an exercise in learning CAD as well.
* What is your project alias? If unsure, contact your supervisor first.
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=== Woollam alpha-SE Ellipsometer ===
More information will be provided shortly.
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=== Filmetrics reflectometer ===
More information will be provided shortly.
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== Thin Film Deposition ==

=== Plassys Evaporator ===
A physical vapour deposition tool of aluminium via e-beam evaporation for Josephson junction fabrication.

Apply for training via the [https://forms.office.com/e/b3PDKjsZ88?origin=lprLink NBI-Cleanroom Training Request Form].
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====Confirmation====
Once you sign up via the form, the tool responsible will contact you for the following details:
* Confirm that you have a sample ready.
* Confirm that you have shadowed your colleagues using the tool 2-3 times.
* Specify process steps you want to run
*: Materials, thickness, tilt, milling, oxidation
* The name of the recipe.
==== Restrictions====
* Only Si and sapphire samples are allowed in the chamber.
==== Training ====
* You'll need 2 sessions to get trained on this tool.
** Session 1 (2 hr.) - teaches you how to load/unload the sample and how to run a recipe.
** Session 2 (2 hr.) - sign off session
'''The instructor has the right to ask for additional training sessions.'''
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=== AJA1 and AJA2: metallization, sputtering or ion milling ===
Two nearly identical Orion physical vapour deposition (PVD) systems from AJA International for sputtering and e-beam evaporation, and substrate milling.

Apply for training via the [https://forms.office.com/e/b3PDKjsZ88?origin=lprLink NBI-Cleanroom Training Request Form].
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====Confirmation====
Once you sign up via the form, the tool responsible will contact you for the following details:
* Confirm that you have a sample ready.
* Confirm that you have shadowed your colleagues using the tool 2-3 times.
* Specify process steps you want to run
*: Materials, thickness, tilt, milling, oxidation
* Which tool do you want to use?
** '''AJA1'''
*** e-beam materials: Ti, Al, Au, SiOx, Pt, Ti, Ge
*** DC sputtering: Nb2Ti, Ti
*** DC Kaufman milling
*** Oxidation
*** Stage rotation, no stage cooling
** '''AJA2'''
*** e-beam materials: Ti, Al, Au, Cr, Pt, Pd
*** DC sputtering: Ti
*** RF sputtering: Ti, Nb2Ti
*** RF milling
*** Stage cooling, no stage rotation
* Specify the process steps you want to run.
*: Either the name of the recipe or all required process parameters.

===Before the training session===
* Watch the instruction video(s)
*Read the standard operating procedure on the [[AJA Systems|AJA Systems tool page]].

==== Training ====
* You'll need 2 sessions to get trained on this tool.
** Session 1 ( 2 hr.) - teaches you how to load/unload the sample and how to run a recipe.
** Session 2 ( 2 hr.) - sign off session
The instructor has the right to ask for additional training sessions.
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=== ALD1 and ALD2===
Two nearly identical Savannah S100-like systems are used for atomic layer deposition.

Apply for training via the [https://forms.office.com/e/b3PDKjsZ88?origin=lprLink NBI-Cleanroom Training Request Form].
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====Confirmation====
Once you sign up via the form, the tool responsible will contact you for the following details:
* Confirm that you have a sample ready.
* Confirm that you have shadowed your colleagues using the tool 2-3 times.
* Which tool do you want to use?
** '''ALD1''' available grown oxides: AlOx, HfOx, TiOx
** '''ALD2''' available grown oxides: AlOx, HfOx, ZrOx
** In ALD1, you are allowed to use resist for lift-off processes. In ALD2, '''you are not allowed to use a sample with resist on'''.
* Specify the process steps you want to run.
** Either the name of the recipe or all required process parameters.
====Before the training session====
* Watch the instruction video(s)
* Study the [[Atomic layer deposition|ALD principles]]
* Read the standard operating procedure on the [[Cambridge ALD|ALD tool page]].
====Training====
You'll need 2 sessions to get trained on this tool.
* Session 1 (30 mins) - teaches you how to load/unload the sample and how to run a recipe.
* Session 2 (30 mins) - sign off session
*: '''Note:''' An ALD session can have a long duration (often >12 hours). A usual training starts in the afternoon (load, setup, prepare recipe, run), and the film will grow throughout the evening. The next day, the user and the instructor will finish the training session (unloading).
'''The instructor has the right to ask for additional training sessions.'''
</div>
</div>

== Packaging ==

=== F&S autobonder ===
A semi-automatic bonder to bond semiconductor substrates to PCB daughterboards from F&S Bondtec.

Apply for training via the [https://forms.office.com/e/b3PDKjsZ88?origin=lprLink NBI-Cleanroom Training Request Form].
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====Confirmation====
Once you sign up via the form, the tool responsible will contact you for the following details:
* Confirm that you have a '''chip''' ready for bonding.
* Confirm that you have shadowed your colleagues using the tool 2-3 times.
* You must know which '''daughterboard''' you will use for bonding (CPH, QBOARD1,2, QCAGE, Sydney, IC, custom).
* You must know what material you use to '''mount''' the chip to the daughterboard (mechanical clamping, silver paint, PMMA, other).
* Confirm that you have prepared a '''bonding schematic''' .
* By default, this bonder is using Al wire. You can request a special training if you want to use Au wire, but be aware it can be challenging.
*: Users are more likely to use the [[K&S bonder| K&S manual bonder]] for Au wire bonding.
* Specify the name of the recipe.
====Before the training session====
* Read the standard operating procedure on the [[FS bonder| FS bonder tool page]]
* Verify with one of your colleagues that your bonding schematic is correct.
==== Training ====
You'll need 2 sessions to get trained on this tool.
* Session 1 (2 hr.) - teaches you how to load/unload the sample and how to run a recipe.
* Session 2 (2 hr.) - sign off session
'''The instructor has the right to ask for additional training sessions.'''
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=== Manual bonder ===
More information will be provided shortly.
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== Miscellaneous ==

=== Micromanipulator ===
Apply for sign-off via the [https://forms.office.com/e/b3PDKjsZ88?origin=lprLink NBI-Cleanroom Training Request Form].

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* Cleanroom doesn't train users in this tool.
* You need to get trained within your research group.
* Cleanroom will provide a sign-off session to ensure safety and verify that the user is aware of the dangers of working with nanoparticles.
==== Before you start your training sessions====
* You need to carefully read and familiarise yourself with the risks of exposure while [[Working with nanowires and nanotubes]]
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[[Category:Tools]]

Training

2026-06-26T14:12:03Z

Chenglee: /* Manual bonder */

Before submitting a training request, please review the prerequisites for each instrument listed below.

Starting in July 2026, a standardized training request form will be introduced. The new system will allow users to request training for multiple instruments using a single form ([https://forms.office.com/e/b3PDKjsZ88?origin=lprLink NBI-Cleanroom Training Request Form]). '''Please only request training for instruments that require immediate access'''. Following submission of the request form, email communication will continue to be used for scheduling and coordinating training activities. The Cleanroom staff will acknowledge and respond to training requests within 1-2 working days.

Please note that access to the Cleanroom, tool laboratories and individual instruments can only be granted after the required safety instructions and instrument training have been completed and approved by the Cleanroom staff. Upon successful completion of the training, users will be granted booking privileges through the Cleanroom Booking System.

To ensure continued competency and safe operation, booking privileges and laboratory access may expire after a period of inactivity (typically '''90 days''') for a given instrument or Cleanroom usage. In such cases, users will be required to complete a refresher training session before access can be reinstated.

== Cleanroom General Introduction ==
Before attending the training session, all users must read and familiarize themselves with the relevant safety information ([[Safety]]). ''Expand to view more information''.
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* The introductory session is scheduled from 09:15 to 15:00.
* Training sessions are conducted in group of 3-4 participants. Once a training date has been proposed by the Cleanroom staff, participants are required to confirm their attendance by email ([mailto:cleanroom@nbi.ku.dk cleanroom@nbi.ku.dk]).
* If fewer than 3 participants are available for a scheduled session, an alternative training date may be proposed. If a session reaches its maximum capacity of 4 participants, additional users will be placed on a waiting list and offered the next available training opportunity.
* Please identify a superuser from your research group who will serve as your mentor during your first few weeks of working in the Cleanroom.
* The designated mentor is responsible for guiding you through the standard procedures and best practices after the Cleanroom General Introduction.
* Once the mentor has determined that you are competent to work independently, they must notify the Cleanroom team via email.
* Full access to the Cleanroom laboratories will only be granted after the Cleanroom team has received this confirmation.
* Standard Training Program:
** 09:15-10:30: Cleanroom introduction
** Coffee break
** 10:45-12:00: Asher, spinners and optical microscopes
** Lunch break
** 13:00-14:00: Practical information
** 14:00-15:00: Q&A and account setup
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== Chemical Handling==

=== HF Safety Training ===
Before attending the training session, all users must read and familiarize themselves with the relevant safety information ([[Safety]]). ''Expand to view more information''.
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* The HF Safety introduction is offered on a monthly basis.
* Training sessions are conducted in groups of up to 4 participants.
* Once a training date has been proposed by the Cleanroom staff, participants must confirm their attendance by email.
* Users are required to complete the HF Handling Questionnaire (that you will receive from a Cleanroom staff) and submit it to the instructor during the training session.
* Each user must also designate an HF buddy. This person must be an authorized Cleanroom user with valid HF access and training.
* As HF handling involves significant safety risks, strict compliance to all safety requirements is mandatory.
* Users are expected to arrive fully prepared for the training session.
* The instructor reserves the right to suspend or terminate the training if a participant has not completed the required preparation or does not demonstrate an adequate understanding of the relevant safety procedures.
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== Lithography ==

=== Elionix 7000 (100 kV) ===
Elionix 7000 training is for advanced users and requires prior cleanroom tool competency.
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==== Prerequisites ====
* You must be at least a Master student or signed up for a long term (>6 months) project to be allowed to use the tool.
* Elionix is a high level tool. Make sure you are already trained to:
** Enter the cleanroom
** Use the microscope, spinner, asher

==== Training ====
* You'll need 4 sessions to get trained on this tool.
** Session 1 ( 1 hr.) - teaches you how to load/unload the sample and how to condition the beam.
** Session 2 ( 3 hr.) - involves exposing alignment marks and test patterns (any design: preferably one half of the overlay ,so to understand alignment later ).
** Session 3 ( 3 hr.) - involves using the exposed alignment marks for marker registration and exposing the 2nd pattern (i.e. the 2nd half of the overlay pattern).
** Session 4 involves exposing a "real" pattern on a "real" chip on your own to gain access.

==== Preparation ====
Before any training slots are booked on the tool you'll need all of the following prepared:
* Shadow senior users on the tool 2-3 times.
* Chip (comfortable to handle) spin coated with resist. This chip will be used for sessions 1 & 2. Please be aware of the coating and baking parameters for the resist.
* Any test design is preferred which has marks, overlay patterns that you will use to test alignment precision between two lithography steps. A Vernier pattern is commonly used. Feel free to test your ideas. Make sure you have something for both ''x'' and ''y'' directions. If you don't know how to start, check the [[Design template for EBL]].
* Convert your design files into the Elionix exposure format .co7. This can be done using Beamer in 4th floor design computers.
* Make sure all write fields are entirely in the positive coordinate space.
* Make sure neither exposure will take longer than 60 minutes at 500 pA current and dose of 1000 uC/cm2.
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=== Elionix F-125 (125 kV at QuanTech) ===
More information will be provided shortly.
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=== Heidelberg upg501 ===
Prepare your design file and coated chip before requesting Heidelberg upg501 training.
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* Have a design file ready. GDS, DXF or CIF format works fine. Make sure you are familiar with the design before your actual session.
* Have a chip spin coated with an appropriate photoresist before the training session.
** The photoresist is sensitive to white light. Use the yellow filter on the microscopes. The light source in the both scribers is white and will already expose your resist.
* What is your project alias? If unsure, contact your supervisor first.

Before the training session:
* Watch the instruction video and read the standard operating procedure on the [[Heidelberg µPG 501|Heidelberg µPG 501 tool page]], shadow the tool with your group members, and ask for a sign-off session.
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== Characterization ==

=== Bruker Dimension Icon AFM ===
Bruker Dimension Icon is an atomic force microscope used for high-resolution and accurate measurements of surface topography.
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* AFM training is offered upon user request and is typically conducted on a one-on-one basis. Completion of the training usually requires 2-3 sessions, with each session lasting approximately 2-3 hours.
* Prior to attending the training sessions, users are expected to review and familiarize themselves with the AFM operating procedures ([[Bruker Dimension Icon AFM|AFM]]). Users are encouraged to shadow an authorized user on the instrument 2-3 times before starting formal training. In addition, having a suitable sample prepared in advance of the training is highly recommended.
* Where appropriate and subject to staff availability and project timelines, a staff member may also assist in carrying out user projects.
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=== JEOL 7800F SEM-EDS===
JEOL 7800F is a field-emission scanning electron microscope used for high-resolution imaging of surface morphology and compositional analysis.
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* SEM-EDS training is offered upon user request and is typically conducted on a one-on-one basis. Completion of the training usually requires 2-3 sessions, with each session lasting approximately 2-3 hours.
* Prior to attending the training sessions, users are expected to review and familiarize themselves with the SEM operating procedures ([[JEOL 7800F|JEOL JSM-7800F]]). Users are encouraged to shadow an authorized user on the instrument 2-3 times before starting formal training. In addition, having a suitable sample prepared in advance of the training is highly recommended.
* Where appropriate and subject to staff availability and project timelines, a staff member may also assist in carrying out user projects.
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=== JEOL 7800F Prime SEM (QuanTech) ===
JEOL 7800F Prime is a field-emission scanning electron microscope used for high-resolution imaging of surface morphology.
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* SEM training is offered upon user request and is typically conducted on a one-on-one basis. Completion of the training usually requires 2-3 sessions, with each session lasting approximately 2-3 hours.
* Prior to attending the training sessions, users are expected to review and familiarize themselves with the SEM operating procedures ([[JEOL 7800F|JEOL JSM-7800F]]). Users are encouraged to shadow an authorized user on the instrument 2-3 times before starting formal training. In addition, having a suitable sample prepared in advance of the training is highly recommended.
* Where appropriate and subject to staff availability and project timelines, a staff member may also assist in carrying out user projects.
Training is usually 2-3 sessions of 2-hour per session.
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=== Thermo Fisher Scientific Talos F200i S/TEM ===
Talos F200i is a versatile 200-kV field-emission (scanning) transmission electron microscope designed for high-throughput, high-resolution materials characterization.
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* This instrument is classified as a high-level tool, and training is selective. Users are required to have prior experience with TEM/STEM before being considered for training. Cleanroom staff reserves the right to decline a training request if the prerequisite requirements are not met.
* Where appropriate and subject to staff availability and project timelines, a staff member may also assist in carrying out user projects.
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=== Raith e-Line ===
Bring a prepared design package for sessions 1 and 2, including alignment and overlay test patterns.
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* A design (gds, dxf, cif) for sessions 1 & 2 with:
** 4 alignment crosses (find out what marks work on the tool from your sub-group).
** Something to break the symmetry so you can tell chip orientation with your bare eye.
** A pattern that you will use to test overlay (alignment between two lithography steps). A Vernier pattern is commonly used. Feel free to test your ideas.
** Something creative, somethin fun :) This is an exercise in learning CAD as well.
* What is your project alias? If unsure, contact your supervisor first.
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=== Woollam alpha-SE Ellipsometer ===
More information will be provided shortly.
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=== Filmetrics reflectometer ===
More information will be provided shortly.
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== Thin Film Deposition ==

=== Plassys Evaporator ===
A physical vapour deposition tool of aluminium via e-beam evaporation for Josephson junction fabrication.

Apply for training via the [https://forms.office.com/e/b3PDKjsZ88?origin=lprLink NBI-Cleanroom Training Request Form].
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====Confirmation====
Once you sign up via the form, the tool responsible will contact you for the following details:
* Confirm that you have a sample ready.
* Confirm that you have shadowed your colleagues using the tool 2-3 times.
* Specify process steps you want to run
*: Materials, thickness, tilt, milling, oxidation
* The name of the recipe.
==== Restrictions====
* Only Si and sapphire samples are allowed in the chamber.
==== Training ====
* You'll need 2 sessions to get trained on this tool.
** Session 1 (2 hr.) - teaches you how to load/unload the sample and how to run a recipe.
** Session 2 (2 hr.) - sign off session
'''The instructor has the right to ask for additional training sessions.'''
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=== AJA1 and AJA2: metallization, sputtering or ion milling ===
Two nearly identical Orion physical vapour deposition (PVD) systems from AJA International for sputtering and e-beam evaporation, and substrate milling.

Apply for training via the [https://forms.office.com/e/b3PDKjsZ88?origin=lprLink NBI-Cleanroom Training Request Form].
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====Confirmation====
Once you sign up via the form, the tool responsible will contact you for the following details:
* Confirm that you have a sample ready.
* Confirm that you have shadowed your colleagues using the tool 2-3 times.
* Specify process steps you want to run
*: Materials, thickness, tilt, milling, oxidation
* Which tool do you want to use?
** '''AJA1'''
*** e-beam materials: Ti, Al, Au, SiOx, Pt, Ti, Ge
*** DC sputtering: Nb2Ti, Ti
*** DC Kaufman milling
*** Oxidation
*** Stage rotation, no stage cooling
** '''AJA2'''
*** e-beam materials: Ti, Al, Au, Cr, Pt, Pd
*** DC sputtering: Ti
*** RF sputtering: Ti, Nb2Ti
*** RF milling
*** Stage cooling, no stage rotation
* Specify the process steps you want to run.
*: Either the name of the recipe or all required process parameters.

===Before the training session===
* Watch the instruction video(s)
*Read the standard operating procedure on the [[AJA Systems|AJA Systems tool page]].

==== Training ====
* You'll need 2 sessions to get trained on this tool.
** Session 1 ( 2 hr.) - teaches you how to load/unload the sample and how to run a recipe.
** Session 2 ( 2 hr.) - sign off session
The instructor has the right to ask for additional training sessions.
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=== ALD1 and ALD2===
Two nearly identical Savannah S100-like systems are used for atomic layer deposition.

Apply for training via the [https://forms.office.com/e/b3PDKjsZ88?origin=lprLink NBI-Cleanroom Training Request Form].
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====Confirmation====
Once you sign up via the form, the tool responsible will contact you for the following details:
* Confirm that you have a sample ready.
* Confirm that you have shadowed your colleagues using the tool 2-3 times.
* Which tool do you want to use?
** '''ALD1''' available grown oxides: AlOx, HfOx, TiOx
** '''ALD2''' available grown oxides: AlOx, HfOx, ZrOx
** In ALD1, you are allowed to use resist for lift-off processes. In ALD2, '''you are not allowed to use a sample with resist on'''.
* Specify the process steps you want to run.
** Either the name of the recipe or all required process parameters.
====Before the training session====
* Watch the instruction video(s)
* Study the [[Atomic layer deposition|ALD principles]]
* Read the standard operating procedure on the [[Cambridge ALD|ALD tool page]].
====Training====
You'll need 2 sessions to get trained on this tool.
* Session 1 (30 mins) - teaches you how to load/unload the sample and how to run a recipe.
* Session 2 (30 mins) - sign off session
*: '''Note:''' An ALD session can have a long duration (often >12 hours). A usual training starts in the afternoon (load, setup, prepare recipe, run), and the film will grow throughout the evening. The next day, the user and the instructor will finish the training session (unloading).
'''The instructor has the right to ask for additional training sessions.'''
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== Packaging ==

=== F&S autobonder ===
A semi-automatic bonder to bond semiconductor substrates to PCB daughterboards from F&S Bondtec.

Apply for training via the [https://forms.office.com/e/b3PDKjsZ88?origin=lprLink NBI-Cleanroom Training Request Form].
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====Confirmation====
Once you sign up via the form, the tool responsible will contact you for the following details:
* Confirm that you have a '''chip''' ready for bonding.
* Confirm that you have shadowed your colleagues using the tool 2-3 times.
* You must know which '''daughterboard''' you will use for bonding (CPH, QBOARD1,2, QCAGE, Sydney, IC, custom).
* You must know what material you use to '''mount''' the chip to the daughterboard (mechanical clamping, silver paint, PMMA, other).
* Confirm that you have prepared a '''bonding schematic''' .
* By default, this bonder is using Al wire. You can request a special training if you want to use Au wire, but be aware it can be challenging.
*: Users are more likely to use the [[K&S bonder| K&S manual bonder]] for Au wire bonding.
* Specify the name of the recipe.
====Before the training session====
* Read the standard operating procedure on the [[FS bonder| FS bonder tool page]]
* Verify with one of your colleagues that your bonding schematic is correct.
==== Training ====
You'll need 2 sessions to get trained on this tool.
* Session 1 (2 hr.) - teaches you how to load/unload the sample and how to run a recipe.
* Session 2 (2 hr.) - sign off session
'''The instructor has the right to ask for additional training sessions.'''
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=== Manual bonder ===
More information will be provided shortly.
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== Miscellaneous ==

=== Micromanipulator ===
Apply for sign-off via the [https://forms.office.com/e/b3PDKjsZ88?origin=lprLink NBI-Cleanroom Training Request Form].

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* Cleanroom doesn't train users in this tool.
* You need to get trained within your research group.
* Cleanroom will provide a sign-off session to ensure safety and verify that the user is aware of the dangers of working with nanoparticles.
==== Before you start your training sessions====
* You need to carefully read and familiarise yourself with the risks of exposure while [[Working with nanowires and nanotubes]]
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</div>

[[Category:Tools]]

Training

2026-06-26T14:11:09Z

Chenglee: /* Elionix 7000 (100 kV) */

Before submitting a training request, please review the prerequisites for each instrument listed below.

Starting in July 2026, a standardized training request form will be introduced. The new system will allow users to request training for multiple instruments using a single form ([https://forms.office.com/e/b3PDKjsZ88?origin=lprLink NBI-Cleanroom Training Request Form]). '''Please only request training for instruments that require immediate access'''. Following submission of the request form, email communication will continue to be used for scheduling and coordinating training activities. The Cleanroom staff will acknowledge and respond to training requests within 1-2 working days.

Please note that access to the Cleanroom, tool laboratories and individual instruments can only be granted after the required safety instructions and instrument training have been completed and approved by the Cleanroom staff. Upon successful completion of the training, users will be granted booking privileges through the Cleanroom Booking System.

To ensure continued competency and safe operation, booking privileges and laboratory access may expire after a period of inactivity (typically '''90 days''') for a given instrument or Cleanroom usage. In such cases, users will be required to complete a refresher training session before access can be reinstated.

== Cleanroom General Introduction ==
Before attending the training session, all users must read and familiarize themselves with the relevant safety information ([[Safety]]). ''Expand to view more information''.
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* The introductory session is scheduled from 09:15 to 15:00.
* Training sessions are conducted in group of 3-4 participants. Once a training date has been proposed by the Cleanroom staff, participants are required to confirm their attendance by email ([mailto:cleanroom@nbi.ku.dk cleanroom@nbi.ku.dk]).
* If fewer than 3 participants are available for a scheduled session, an alternative training date may be proposed. If a session reaches its maximum capacity of 4 participants, additional users will be placed on a waiting list and offered the next available training opportunity.
* Please identify a superuser from your research group who will serve as your mentor during your first few weeks of working in the Cleanroom.
* The designated mentor is responsible for guiding you through the standard procedures and best practices after the Cleanroom General Introduction.
* Once the mentor has determined that you are competent to work independently, they must notify the Cleanroom team via email.
* Full access to the Cleanroom laboratories will only be granted after the Cleanroom team has received this confirmation.
* Standard Training Program:
** 09:15-10:30: Cleanroom introduction
** Coffee break
** 10:45-12:00: Asher, spinners and optical microscopes
** Lunch break
** 13:00-14:00: Practical information
** 14:00-15:00: Q&A and account setup
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== Chemical Handling==

=== HF Safety Training ===
Before attending the training session, all users must read and familiarize themselves with the relevant safety information ([[Safety]]). ''Expand to view more information''.
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* The HF Safety introduction is offered on a monthly basis.
* Training sessions are conducted in groups of up to 4 participants.
* Once a training date has been proposed by the Cleanroom staff, participants must confirm their attendance by email.
* Users are required to complete the HF Handling Questionnaire (that you will receive from a Cleanroom staff) and submit it to the instructor during the training session.
* Each user must also designate an HF buddy. This person must be an authorized Cleanroom user with valid HF access and training.
* As HF handling involves significant safety risks, strict compliance to all safety requirements is mandatory.
* Users are expected to arrive fully prepared for the training session.
* The instructor reserves the right to suspend or terminate the training if a participant has not completed the required preparation or does not demonstrate an adequate understanding of the relevant safety procedures.
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== Lithography ==

=== Elionix 7000 (100 kV) ===
Elionix 7000 training is for advanced users and requires prior cleanroom tool competency.
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==== Prerequisites ====
* You must be at least a Master student or signed up for a long term (>6 months) project to be allowed to use the tool.
* Elionix is a high level tool. Make sure you are already trained to:
** Enter the cleanroom
** Use the microscope, spinner, asher

==== Training ====
* You'll need 4 sessions to get trained on this tool.
** Session 1 ( 1 hr.) - teaches you how to load/unload the sample and how to condition the beam.
** Session 2 ( 3 hr.) - involves exposing alignment marks and test patterns (any design: preferably one half of the overlay ,so to understand alignment later ).
** Session 3 ( 3 hr.) - involves using the exposed alignment marks for marker registration and exposing the 2nd pattern (i.e. the 2nd half of the overlay pattern).
** Session 4 involves exposing a "real" pattern on a "real" chip on your own to gain access.

==== Preparation ====
Before any training slots are booked on the tool you'll need all of the following prepared:
* Shadow senior users on the tool 2-3 times.
* Chip (comfortable to handle) spin coated with resist. This chip will be used for sessions 1 & 2. Please be aware of the coating and baking parameters for the resist.
* Any test design is preferred which has marks, overlay patterns that you will use to test alignment precision between two lithography steps. A Vernier pattern is commonly used. Feel free to test your ideas. Make sure you have something for both ''x'' and ''y'' directions. If you don't know how to start, check the [[Design template for EBL]].
* Convert your design files into the Elionix exposure format .co7. This can be done using Beamer in 4th floor design computers.
* Make sure all write fields are entirely in the positive coordinate space.
* Make sure neither exposure will take longer than 60 minutes at 500 pA current and dose of 1000 uC/cm2.
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=== Elionix F-125 (125 kV at QuanTech) ===
More information will be provided shortly.
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=== Heidelberg upg501 ===
Prepare your design file and coated chip before requesting Heidelberg upg501 training.
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* Have a design file ready. GDS, DXF or CIF format works fine. Make sure you are familiar with the design before your actual session.
* Have a chip spin coated with an appropriate photoresist before the training session.
** The photoresist is sensitive to white light. Use the yellow filter on the microscopes. The light source in the both scribers is white and will already expose your resist.
* What is your project alias? If unsure, contact your supervisor first.

Before the training session:
* Watch the instruction video and read the standard operating procedure on the [[Heidelberg µPG 501|Heidelberg µPG 501 tool page]], shadow the tool with your group members, and ask for a sign-off session.
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== Characterization ==

=== Bruker Dimension Icon AFM ===
Bruker Dimension Icon is an atomic force microscope used for high-resolution and accurate measurements of surface topography.
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* AFM training is offered upon user request and is typically conducted on a one-on-one basis. Completion of the training usually requires 2-3 sessions, with each session lasting approximately 2-3 hours.
* Prior to attending the training sessions, users are expected to review and familiarize themselves with the AFM operating procedures ([[Bruker Dimension Icon AFM|AFM]]). Users are encouraged to shadow an authorized user on the instrument 2-3 times before starting formal training. In addition, having a suitable sample prepared in advance of the training is highly recommended.
* Where appropriate and subject to staff availability and project timelines, a staff member may also assist in carrying out user projects.
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=== JEOL 7800F SEM-EDS===
JEOL 7800F is a field-emission scanning electron microscope used for high-resolution imaging of surface morphology and compositional analysis.
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* SEM-EDS training is offered upon user request and is typically conducted on a one-on-one basis. Completion of the training usually requires 2-3 sessions, with each session lasting approximately 2-3 hours.
* Prior to attending the training sessions, users are expected to review and familiarize themselves with the SEM operating procedures ([[JEOL 7800F|JEOL JSM-7800F]]). Users are encouraged to shadow an authorized user on the instrument 2-3 times before starting formal training. In addition, having a suitable sample prepared in advance of the training is highly recommended.
* Where appropriate and subject to staff availability and project timelines, a staff member may also assist in carrying out user projects.
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=== JEOL 7800F Prime SEM (QuanTech) ===
JEOL 7800F Prime is a field-emission scanning electron microscope used for high-resolution imaging of surface morphology.
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* SEM training is offered upon user request and is typically conducted on a one-on-one basis. Completion of the training usually requires 2-3 sessions, with each session lasting approximately 2-3 hours.
* Prior to attending the training sessions, users are expected to review and familiarize themselves with the SEM operating procedures ([[JEOL 7800F|JEOL JSM-7800F]]). Users are encouraged to shadow an authorized user on the instrument 2-3 times before starting formal training. In addition, having a suitable sample prepared in advance of the training is highly recommended.
* Where appropriate and subject to staff availability and project timelines, a staff member may also assist in carrying out user projects.
Training is usually 2-3 sessions of 2-hour per session.
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=== Thermo Fisher Scientific Talos F200i S/TEM ===
Talos F200i is a versatile 200-kV field-emission (scanning) transmission electron microscope designed for high-throughput, high-resolution materials characterization.
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* This instrument is classified as a high-level tool, and training is selective. Users are required to have prior experience with TEM/STEM before being considered for training. Cleanroom staff reserves the right to decline a training request if the prerequisite requirements are not met.
* Where appropriate and subject to staff availability and project timelines, a staff member may also assist in carrying out user projects.
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=== Raith e-Line ===
Bring a prepared design package for sessions 1 and 2, including alignment and overlay test patterns.
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* A design (gds, dxf, cif) for sessions 1 & 2 with:
** 4 alignment crosses (find out what marks work on the tool from your sub-group).
** Something to break the symmetry so you can tell chip orientation with your bare eye.
** A pattern that you will use to test overlay (alignment between two lithography steps). A Vernier pattern is commonly used. Feel free to test your ideas.
** Something creative, somethin fun :) This is an exercise in learning CAD as well.
* What is your project alias? If unsure, contact your supervisor first.
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=== Woollam alpha-SE Ellipsometer ===
More information will be provided shortly.
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=== Filmetrics reflectometer ===
More information will be provided shortly.
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== Thin Film Deposition ==

=== Plassys Evaporator ===
A physical vapour deposition tool of aluminium via e-beam evaporation for Josephson junction fabrication.

Apply for training via the [https://forms.office.com/e/b3PDKjsZ88?origin=lprLink NBI-Cleanroom Training Request Form].
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====Confirmation====
Once you sign up via the form, the tool responsible will contact you for the following details:
* Confirm that you have a sample ready.
* Confirm that you have shadowed your colleagues using the tool 2-3 times.
* Specify process steps you want to run
*: Materials, thickness, tilt, milling, oxidation
* The name of the recipe.
==== Restrictions====
* Only Si and sapphire samples are allowed in the chamber.
==== Training ====
* You'll need 2 sessions to get trained on this tool.
** Session 1 (2 hr.) - teaches you how to load/unload the sample and how to run a recipe.
** Session 2 (2 hr.) - sign off session
'''The instructor has the right to ask for additional training sessions.'''
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=== AJA1 and AJA2: metallization, sputtering or ion milling ===
Two nearly identical Orion physical vapour deposition (PVD) systems from AJA International for sputtering and e-beam evaporation, and substrate milling.

Apply for training via the [https://forms.office.com/e/b3PDKjsZ88?origin=lprLink NBI-Cleanroom Training Request Form].
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====Confirmation====
Once you sign up via the form, the tool responsible will contact you for the following details:
* Confirm that you have a sample ready.
* Confirm that you have shadowed your colleagues using the tool 2-3 times.
* Specify process steps you want to run
*: Materials, thickness, tilt, milling, oxidation
* Which tool do you want to use?
** '''AJA1'''
*** e-beam materials: Ti, Al, Au, SiOx, Pt, Ti, Ge
*** DC sputtering: Nb2Ti, Ti
*** DC Kaufman milling
*** Oxidation
*** Stage rotation, no stage cooling
** '''AJA2'''
*** e-beam materials: Ti, Al, Au, Cr, Pt, Pd
*** DC sputtering: Ti
*** RF sputtering: Ti, Nb2Ti
*** RF milling
*** Stage cooling, no stage rotation
* Specify the process steps you want to run.
*: Either the name of the recipe or all required process parameters.

===Before the training session===
* Watch the instruction video(s)
*Read the standard operating procedure on the [[AJA Systems|AJA Systems tool page]].

==== Training ====
* You'll need 2 sessions to get trained on this tool.
** Session 1 ( 2 hr.) - teaches you how to load/unload the sample and how to run a recipe.
** Session 2 ( 2 hr.) - sign off session
The instructor has the right to ask for additional training sessions.
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=== ALD1 and ALD2===
Two nearly identical Savannah S100-like systems are used for atomic layer deposition.

Apply for training via the [https://forms.office.com/e/b3PDKjsZ88?origin=lprLink NBI-Cleanroom Training Request Form].
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====Confirmation====
Once you sign up via the form, the tool responsible will contact you for the following details:
* Confirm that you have a sample ready.
* Confirm that you have shadowed your colleagues using the tool 2-3 times.
* Which tool do you want to use?
** '''ALD1''' available grown oxides: AlOx, HfOx, TiOx
** '''ALD2''' available grown oxides: AlOx, HfOx, ZrOx
** In ALD1, you are allowed to use resist for lift-off processes. In ALD2, '''you are not allowed to use a sample with resist on'''.
* Specify the process steps you want to run.
** Either the name of the recipe or all required process parameters.
====Before the training session====
* Watch the instruction video(s)
* Study the [[Atomic layer deposition|ALD principles]]
* Read the standard operating procedure on the [[Cambridge ALD|ALD tool page]].
====Training====
You'll need 2 sessions to get trained on this tool.
* Session 1 (30 mins) - teaches you how to load/unload the sample and how to run a recipe.
* Session 2 (30 mins) - sign off session
*: '''Note:''' An ALD session can have a long duration (often >12 hours). A usual training starts in the afternoon (load, setup, prepare recipe, run), and the film will grow throughout the evening. The next day, the user and the instructor will finish the training session (unloading).
'''The instructor has the right to ask for additional training sessions.'''
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== Packaging ==

=== F&S autobonder ===
A semi-automatic bonder to bond semiconductor substrates to PCB daughterboards from F&S Bondtec.

Apply for training via the [https://forms.office.com/e/b3PDKjsZ88?origin=lprLink NBI-Cleanroom Training Request Form].
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====Confirmation====
Once you sign up via the form, the tool responsible will contact you for the following details:
* Confirm that you have a '''chip''' ready for bonding.
* Confirm that you have shadowed your colleagues using the tool 2-3 times.
* You must know which '''daughterboard''' you will use for bonding (CPH, QBOARD1,2, QCAGE, Sydney, IC, custom).
* You must know what material you use to '''mount''' the chip to the daughterboard (mechanical clamping, silver paint, PMMA, other).
* Confirm that you have prepared a '''bonding schematic''' .
* By default, this bonder is using Al wire. You can request a special training if you want to use Au wire, but be aware it can be challenging.
*: Users are more likely to use the [[K&S bonder| K&S manual bonder]] for Au wire bonding.
* Specify the name of the recipe.
====Before the training session====
* Read the standard operating procedure on the [[FS bonder| FS bonder tool page]]
* Verify with one of your colleagues that your bonding schematic is correct.
==== Training ====
You'll need 2 sessions to get trained on this tool.
* Session 1 (2 hr.) - teaches you how to load/unload the sample and how to run a recipe.
* Session 2 (2 hr.) - sign off session
'''The instructor has the right to ask for additional training sessions.'''
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=== Manual bonder ===
Request manual bonder training via [mailto:cleanroom@nbi.ku.dk cleanroom@nbi.ku.dk].
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== Miscellaneous ==

=== Micromanipulator ===
Apply for sign-off via the [https://forms.office.com/e/b3PDKjsZ88?origin=lprLink NBI-Cleanroom Training Request Form].

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* Cleanroom doesn't train users in this tool.
* You need to get trained within your research group.
* Cleanroom will provide a sign-off session to ensure safety and verify that the user is aware of the dangers of working with nanoparticles.
==== Before you start your training sessions====
* You need to carefully read and familiarise yourself with the risks of exposure while [[Working with nanowires and nanotubes]]
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[[Category:Tools]]

Training

2026-06-26T14:10:14Z

Chenglee: /* Elionix F-125 (125 kV at QuanTech) */

Before submitting a training request, please review the prerequisites for each instrument listed below.

Starting in July 2026, a standardized training request form will be introduced. The new system will allow users to request training for multiple instruments using a single form ([https://forms.office.com/e/b3PDKjsZ88?origin=lprLink NBI-Cleanroom Training Request Form]). '''Please only request training for instruments that require immediate access'''. Following submission of the request form, email communication will continue to be used for scheduling and coordinating training activities. The Cleanroom staff will acknowledge and respond to training requests within 1-2 working days.

Please note that access to the Cleanroom, tool laboratories and individual instruments can only be granted after the required safety instructions and instrument training have been completed and approved by the Cleanroom staff. Upon successful completion of the training, users will be granted booking privileges through the Cleanroom Booking System.

To ensure continued competency and safe operation, booking privileges and laboratory access may expire after a period of inactivity (typically '''90 days''') for a given instrument or Cleanroom usage. In such cases, users will be required to complete a refresher training session before access can be reinstated.

== Cleanroom General Introduction ==
Before attending the training session, all users must read and familiarize themselves with the relevant safety information ([[Safety]]). ''Expand to view more information''.
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* The introductory session is scheduled from 09:15 to 15:00.
* Training sessions are conducted in group of 3-4 participants. Once a training date has been proposed by the Cleanroom staff, participants are required to confirm their attendance by email ([mailto:cleanroom@nbi.ku.dk cleanroom@nbi.ku.dk]).
* If fewer than 3 participants are available for a scheduled session, an alternative training date may be proposed. If a session reaches its maximum capacity of 4 participants, additional users will be placed on a waiting list and offered the next available training opportunity.
* Please identify a superuser from your research group who will serve as your mentor during your first few weeks of working in the Cleanroom.
* The designated mentor is responsible for guiding you through the standard procedures and best practices after the Cleanroom General Introduction.
* Once the mentor has determined that you are competent to work independently, they must notify the Cleanroom team via email.
* Full access to the Cleanroom laboratories will only be granted after the Cleanroom team has received this confirmation.
* Standard Training Program:
** 09:15-10:30: Cleanroom introduction
** Coffee break
** 10:45-12:00: Asher, spinners and optical microscopes
** Lunch break
** 13:00-14:00: Practical information
** 14:00-15:00: Q&A and account setup
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== Chemical Handling==

=== HF Safety Training ===
Before attending the training session, all users must read and familiarize themselves with the relevant safety information ([[Safety]]). ''Expand to view more information''.
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* The HF Safety introduction is offered on a monthly basis.
* Training sessions are conducted in groups of up to 4 participants.
* Once a training date has been proposed by the Cleanroom staff, participants must confirm their attendance by email.
* Users are required to complete the HF Handling Questionnaire (that you will receive from a Cleanroom staff) and submit it to the instructor during the training session.
* Each user must also designate an HF buddy. This person must be an authorized Cleanroom user with valid HF access and training.
* As HF handling involves significant safety risks, strict compliance to all safety requirements is mandatory.
* Users are expected to arrive fully prepared for the training session.
* The instructor reserves the right to suspend or terminate the training if a participant has not completed the required preparation or does not demonstrate an adequate understanding of the relevant safety procedures.
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</div>

== Lithography ==

=== Elionix 7000 (100 kV) ===
Elionix 7000 training is for advanced users and requires prior cleanroom tool competency.

Contact Harry (cleanroom@nbi.ku.dk) to request training.
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==== Prerequisites ====
* You must be at least a Master student or signed up for a long term (>6 months) project to be allowed to use the tool.
* Elionix is a high level tool. Make sure you are already trained to:
** Enter the cleanroom
** Use the microscope, spinner, asher

==== Training ====
* You'll need 4 sessions to get trained on this tool.
** Session 1 ( 1 hr.) - teaches you how to load/unload the sample and how to condition the beam.
** Session 2 ( 3 hr.) - involves exposing alignment marks and test patterns (any design: preferably one half of the overlay ,so to understand alignment later ).
** Session 3 ( 3 hr.) - involves using the exposed alignment marks for marker registration and exposing the 2nd pattern (i.e. the 2nd half of the overlay pattern).
** Session 4 involves exposing a "real" pattern on a "real" chip on your own to gain access.

==== Preparation ====
Before any training slots are booked on the tool you'll need all of the following prepared:
* Shadow senior users on the tool 2-3 times.
* Chip (comfortable to handle) spin coated with resist. This chip will be used for sessions 1 & 2. Please be aware of the coating and baking parameters for the resist.
* Any test design is preferred which has marks, overlay patterns that you will use to test alignment precision between two lithography steps. A Vernier pattern is commonly used. Feel free to test your ideas. Make sure you have something for both ''x'' and ''y'' directions. If you don't know how to start, check the [[Design template for EBL]].
* Convert your design files into the Elionix exposure format .co7. This can be done using Beamer in 4th floor design computers.
* Make sure all write fields are entirely in the positive coordinate space.
* Make sure neither exposure will take longer than 60 minutes at 500 pA current and dose of 1000 uC/cm2.
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=== Elionix F-125 (125 kV at QuanTech) ===
More information will be provided shortly.
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=== Heidelberg upg501 ===
Prepare your design file and coated chip before requesting Heidelberg upg501 training.
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* Have a design file ready. GDS, DXF or CIF format works fine. Make sure you are familiar with the design before your actual session.
* Have a chip spin coated with an appropriate photoresist before the training session.
** The photoresist is sensitive to white light. Use the yellow filter on the microscopes. The light source in the both scribers is white and will already expose your resist.
* What is your project alias? If unsure, contact your supervisor first.

Before the training session:
* Watch the instruction video and read the standard operating procedure on the [[Heidelberg µPG 501|Heidelberg µPG 501 tool page]], shadow the tool with your group members, and ask for a sign-off session.
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== Characterization ==

=== Bruker Dimension Icon AFM ===
Bruker Dimension Icon is an atomic force microscope used for high-resolution and accurate measurements of surface topography.
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* AFM training is offered upon user request and is typically conducted on a one-on-one basis. Completion of the training usually requires 2-3 sessions, with each session lasting approximately 2-3 hours.
* Prior to attending the training sessions, users are expected to review and familiarize themselves with the AFM operating procedures ([[Bruker Dimension Icon AFM|AFM]]). Users are encouraged to shadow an authorized user on the instrument 2-3 times before starting formal training. In addition, having a suitable sample prepared in advance of the training is highly recommended.
* Where appropriate and subject to staff availability and project timelines, a staff member may also assist in carrying out user projects.
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=== JEOL 7800F SEM-EDS===
JEOL 7800F is a field-emission scanning electron microscope used for high-resolution imaging of surface morphology and compositional analysis.
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* SEM-EDS training is offered upon user request and is typically conducted on a one-on-one basis. Completion of the training usually requires 2-3 sessions, with each session lasting approximately 2-3 hours.
* Prior to attending the training sessions, users are expected to review and familiarize themselves with the SEM operating procedures ([[JEOL 7800F|JEOL JSM-7800F]]). Users are encouraged to shadow an authorized user on the instrument 2-3 times before starting formal training. In addition, having a suitable sample prepared in advance of the training is highly recommended.
* Where appropriate and subject to staff availability and project timelines, a staff member may also assist in carrying out user projects.
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=== JEOL 7800F Prime SEM (QuanTech) ===
JEOL 7800F Prime is a field-emission scanning electron microscope used for high-resolution imaging of surface morphology.
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* SEM training is offered upon user request and is typically conducted on a one-on-one basis. Completion of the training usually requires 2-3 sessions, with each session lasting approximately 2-3 hours.
* Prior to attending the training sessions, users are expected to review and familiarize themselves with the SEM operating procedures ([[JEOL 7800F|JEOL JSM-7800F]]). Users are encouraged to shadow an authorized user on the instrument 2-3 times before starting formal training. In addition, having a suitable sample prepared in advance of the training is highly recommended.
* Where appropriate and subject to staff availability and project timelines, a staff member may also assist in carrying out user projects.
Training is usually 2-3 sessions of 2-hour per session.
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=== Thermo Fisher Scientific Talos F200i S/TEM ===
Talos F200i is a versatile 200-kV field-emission (scanning) transmission electron microscope designed for high-throughput, high-resolution materials characterization.
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* This instrument is classified as a high-level tool, and training is selective. Users are required to have prior experience with TEM/STEM before being considered for training. Cleanroom staff reserves the right to decline a training request if the prerequisite requirements are not met.
* Where appropriate and subject to staff availability and project timelines, a staff member may also assist in carrying out user projects.
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=== Raith e-Line ===
Bring a prepared design package for sessions 1 and 2, including alignment and overlay test patterns.
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* A design (gds, dxf, cif) for sessions 1 & 2 with:
** 4 alignment crosses (find out what marks work on the tool from your sub-group).
** Something to break the symmetry so you can tell chip orientation with your bare eye.
** A pattern that you will use to test overlay (alignment between two lithography steps). A Vernier pattern is commonly used. Feel free to test your ideas.
** Something creative, somethin fun :) This is an exercise in learning CAD as well.
* What is your project alias? If unsure, contact your supervisor first.
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=== Woollam alpha-SE Ellipsometer ===
More information will be provided shortly.
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=== Filmetrics reflectometer ===
More information will be provided shortly.
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== Thin Film Deposition ==

=== Plassys Evaporator ===
A physical vapour deposition tool of aluminium via e-beam evaporation for Josephson junction fabrication.

Apply for training via the [https://forms.office.com/e/b3PDKjsZ88?origin=lprLink NBI-Cleanroom Training Request Form].
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====Confirmation====
Once you sign up via the form, the tool responsible will contact you for the following details:
* Confirm that you have a sample ready.
* Confirm that you have shadowed your colleagues using the tool 2-3 times.
* Specify process steps you want to run
*: Materials, thickness, tilt, milling, oxidation
* The name of the recipe.
==== Restrictions====
* Only Si and sapphire samples are allowed in the chamber.
==== Training ====
* You'll need 2 sessions to get trained on this tool.
** Session 1 (2 hr.) - teaches you how to load/unload the sample and how to run a recipe.
** Session 2 (2 hr.) - sign off session
'''The instructor has the right to ask for additional training sessions.'''
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=== AJA1 and AJA2: metallization, sputtering or ion milling ===
Two nearly identical Orion physical vapour deposition (PVD) systems from AJA International for sputtering and e-beam evaporation, and substrate milling.

Apply for training via the [https://forms.office.com/e/b3PDKjsZ88?origin=lprLink NBI-Cleanroom Training Request Form].
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====Confirmation====
Once you sign up via the form, the tool responsible will contact you for the following details:
* Confirm that you have a sample ready.
* Confirm that you have shadowed your colleagues using the tool 2-3 times.
* Specify process steps you want to run
*: Materials, thickness, tilt, milling, oxidation
* Which tool do you want to use?
** '''AJA1'''
*** e-beam materials: Ti, Al, Au, SiOx, Pt, Ti, Ge
*** DC sputtering: Nb2Ti, Ti
*** DC Kaufman milling
*** Oxidation
*** Stage rotation, no stage cooling
** '''AJA2'''
*** e-beam materials: Ti, Al, Au, Cr, Pt, Pd
*** DC sputtering: Ti
*** RF sputtering: Ti, Nb2Ti
*** RF milling
*** Stage cooling, no stage rotation
* Specify the process steps you want to run.
*: Either the name of the recipe or all required process parameters.

===Before the training session===
* Watch the instruction video(s)
*Read the standard operating procedure on the [[AJA Systems|AJA Systems tool page]].

==== Training ====
* You'll need 2 sessions to get trained on this tool.
** Session 1 ( 2 hr.) - teaches you how to load/unload the sample and how to run a recipe.
** Session 2 ( 2 hr.) - sign off session
The instructor has the right to ask for additional training sessions.
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=== ALD1 and ALD2===
Two nearly identical Savannah S100-like systems are used for atomic layer deposition.

Apply for training via the [https://forms.office.com/e/b3PDKjsZ88?origin=lprLink NBI-Cleanroom Training Request Form].
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====Confirmation====
Once you sign up via the form, the tool responsible will contact you for the following details:
* Confirm that you have a sample ready.
* Confirm that you have shadowed your colleagues using the tool 2-3 times.
* Which tool do you want to use?
** '''ALD1''' available grown oxides: AlOx, HfOx, TiOx
** '''ALD2''' available grown oxides: AlOx, HfOx, ZrOx
** In ALD1, you are allowed to use resist for lift-off processes. In ALD2, '''you are not allowed to use a sample with resist on'''.
* Specify the process steps you want to run.
** Either the name of the recipe or all required process parameters.
====Before the training session====
* Watch the instruction video(s)
* Study the [[Atomic layer deposition|ALD principles]]
* Read the standard operating procedure on the [[Cambridge ALD|ALD tool page]].
====Training====
You'll need 2 sessions to get trained on this tool.
* Session 1 (30 mins) - teaches you how to load/unload the sample and how to run a recipe.
* Session 2 (30 mins) - sign off session
*: '''Note:''' An ALD session can have a long duration (often >12 hours). A usual training starts in the afternoon (load, setup, prepare recipe, run), and the film will grow throughout the evening. The next day, the user and the instructor will finish the training session (unloading).
'''The instructor has the right to ask for additional training sessions.'''
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== Packaging ==

=== F&S autobonder ===
A semi-automatic bonder to bond semiconductor substrates to PCB daughterboards from F&S Bondtec.

Apply for training via the [https://forms.office.com/e/b3PDKjsZ88?origin=lprLink NBI-Cleanroom Training Request Form].
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====Confirmation====
Once you sign up via the form, the tool responsible will contact you for the following details:
* Confirm that you have a '''chip''' ready for bonding.
* Confirm that you have shadowed your colleagues using the tool 2-3 times.
* You must know which '''daughterboard''' you will use for bonding (CPH, QBOARD1,2, QCAGE, Sydney, IC, custom).
* You must know what material you use to '''mount''' the chip to the daughterboard (mechanical clamping, silver paint, PMMA, other).
* Confirm that you have prepared a '''bonding schematic''' .
* By default, this bonder is using Al wire. You can request a special training if you want to use Au wire, but be aware it can be challenging.
*: Users are more likely to use the [[K&S bonder| K&S manual bonder]] for Au wire bonding.
* Specify the name of the recipe.
====Before the training session====
* Read the standard operating procedure on the [[FS bonder| FS bonder tool page]]
* Verify with one of your colleagues that your bonding schematic is correct.
==== Training ====
You'll need 2 sessions to get trained on this tool.
* Session 1 (2 hr.) - teaches you how to load/unload the sample and how to run a recipe.
* Session 2 (2 hr.) - sign off session
'''The instructor has the right to ask for additional training sessions.'''
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=== Manual bonder ===
Request manual bonder training via [mailto:cleanroom@nbi.ku.dk cleanroom@nbi.ku.dk].
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== Miscellaneous ==

=== Micromanipulator ===
Apply for sign-off via the [https://forms.office.com/e/b3PDKjsZ88?origin=lprLink NBI-Cleanroom Training Request Form].

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* Cleanroom doesn't train users in this tool.
* You need to get trained within your research group.
* Cleanroom will provide a sign-off session to ensure safety and verify that the user is aware of the dangers of working with nanoparticles.
==== Before you start your training sessions====
* You need to carefully read and familiarise yourself with the risks of exposure while [[Working with nanowires and nanotubes]]
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[[Category:Tools]]

Training

2026-06-26T14:09:23Z

Chenglee: /* Characterization */

Before submitting a training request, please review the prerequisites for each instrument listed below.

Starting in July 2026, a standardized training request form will be introduced. The new system will allow users to request training for multiple instruments using a single form ([https://forms.office.com/e/b3PDKjsZ88?origin=lprLink NBI-Cleanroom Training Request Form]). '''Please only request training for instruments that require immediate access'''. Following submission of the request form, email communication will continue to be used for scheduling and coordinating training activities. The Cleanroom staff will acknowledge and respond to training requests within 1-2 working days.

Please note that access to the Cleanroom, tool laboratories and individual instruments can only be granted after the required safety instructions and instrument training have been completed and approved by the Cleanroom staff. Upon successful completion of the training, users will be granted booking privileges through the Cleanroom Booking System.

To ensure continued competency and safe operation, booking privileges and laboratory access may expire after a period of inactivity (typically '''90 days''') for a given instrument or Cleanroom usage. In such cases, users will be required to complete a refresher training session before access can be reinstated.

== Cleanroom General Introduction ==
Before attending the training session, all users must read and familiarize themselves with the relevant safety information ([[Safety]]). ''Expand to view more information''.
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* The introductory session is scheduled from 09:15 to 15:00.
* Training sessions are conducted in group of 3-4 participants. Once a training date has been proposed by the Cleanroom staff, participants are required to confirm their attendance by email ([mailto:cleanroom@nbi.ku.dk cleanroom@nbi.ku.dk]).
* If fewer than 3 participants are available for a scheduled session, an alternative training date may be proposed. If a session reaches its maximum capacity of 4 participants, additional users will be placed on a waiting list and offered the next available training opportunity.
* Please identify a superuser from your research group who will serve as your mentor during your first few weeks of working in the Cleanroom.
* The designated mentor is responsible for guiding you through the standard procedures and best practices after the Cleanroom General Introduction.
* Once the mentor has determined that you are competent to work independently, they must notify the Cleanroom team via email.
* Full access to the Cleanroom laboratories will only be granted after the Cleanroom team has received this confirmation.
* Standard Training Program:
** 09:15-10:30: Cleanroom introduction
** Coffee break
** 10:45-12:00: Asher, spinners and optical microscopes
** Lunch break
** 13:00-14:00: Practical information
** 14:00-15:00: Q&A and account setup
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== Chemical Handling==

=== HF Safety Training ===
Before attending the training session, all users must read and familiarize themselves with the relevant safety information ([[Safety]]). ''Expand to view more information''.
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* The HF Safety introduction is offered on a monthly basis.
* Training sessions are conducted in groups of up to 4 participants.
* Once a training date has been proposed by the Cleanroom staff, participants must confirm their attendance by email.
* Users are required to complete the HF Handling Questionnaire (that you will receive from a Cleanroom staff) and submit it to the instructor during the training session.
* Each user must also designate an HF buddy. This person must be an authorized Cleanroom user with valid HF access and training.
* As HF handling involves significant safety risks, strict compliance to all safety requirements is mandatory.
* Users are expected to arrive fully prepared for the training session.
* The instructor reserves the right to suspend or terminate the training if a participant has not completed the required preparation or does not demonstrate an adequate understanding of the relevant safety procedures.
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== Lithography ==

=== Elionix 7000 (100 kV) ===
Elionix 7000 training is for advanced users and requires prior cleanroom tool competency.

Contact Harry (cleanroom@nbi.ku.dk) to request training.
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==== Prerequisites ====
* You must be at least a Master student or signed up for a long term (>6 months) project to be allowed to use the tool.
* Elionix is a high level tool. Make sure you are already trained to:
** Enter the cleanroom
** Use the microscope, spinner, asher

==== Training ====
* You'll need 4 sessions to get trained on this tool.
** Session 1 ( 1 hr.) - teaches you how to load/unload the sample and how to condition the beam.
** Session 2 ( 3 hr.) - involves exposing alignment marks and test patterns (any design: preferably one half of the overlay ,so to understand alignment later ).
** Session 3 ( 3 hr.) - involves using the exposed alignment marks for marker registration and exposing the 2nd pattern (i.e. the 2nd half of the overlay pattern).
** Session 4 involves exposing a "real" pattern on a "real" chip on your own to gain access.

==== Preparation ====
Before any training slots are booked on the tool you'll need all of the following prepared:
* Shadow senior users on the tool 2-3 times.
* Chip (comfortable to handle) spin coated with resist. This chip will be used for sessions 1 & 2. Please be aware of the coating and baking parameters for the resist.
* Any test design is preferred which has marks, overlay patterns that you will use to test alignment precision between two lithography steps. A Vernier pattern is commonly used. Feel free to test your ideas. Make sure you have something for both ''x'' and ''y'' directions. If you don't know how to start, check the [[Design template for EBL]].
* Convert your design files into the Elionix exposure format .co7. This can be done using Beamer in 4th floor design computers.
* Make sure all write fields are entirely in the positive coordinate space.
* Make sure neither exposure will take longer than 60 minutes at 500 pA current and dose of 1000 uC/cm2.
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=== Elionix F-125 (125 kV at QuanTech) ===
Contact Zhe Liu to arrange access and training for Elionix F-125.
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* Please contact Zhe Liu ([mailto:zhe.liu@nbi.ku.dk zhe.liu@nbi.ku.dk])
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=== Heidelberg upg501 ===
Prepare your design file and coated chip before requesting Heidelberg upg501 training.
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* Have a design file ready. GDS, DXF or CIF format works fine. Make sure you are familiar with the design before your actual session.
* Have a chip spin coated with an appropriate photoresist before the training session.
** The photoresist is sensitive to white light. Use the yellow filter on the microscopes. The light source in the both scribers is white and will already expose your resist.
* What is your project alias? If unsure, contact your supervisor first.

Before the training session:
* Watch the instruction video and read the standard operating procedure on the [[Heidelberg µPG 501|Heidelberg µPG 501 tool page]], shadow the tool with your group members, and ask for a sign-off session.
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== Characterization ==

=== Bruker Dimension Icon AFM ===
Bruker Dimension Icon is an atomic force microscope used for high-resolution and accurate measurements of surface topography.
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* AFM training is offered upon user request and is typically conducted on a one-on-one basis. Completion of the training usually requires 2-3 sessions, with each session lasting approximately 2-3 hours.
* Prior to attending the training sessions, users are expected to review and familiarize themselves with the AFM operating procedures ([[Bruker Dimension Icon AFM|AFM]]). Users are encouraged to shadow an authorized user on the instrument 2-3 times before starting formal training. In addition, having a suitable sample prepared in advance of the training is highly recommended.
* Where appropriate and subject to staff availability and project timelines, a staff member may also assist in carrying out user projects.
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=== JEOL 7800F SEM-EDS===
JEOL 7800F is a field-emission scanning electron microscope used for high-resolution imaging of surface morphology and compositional analysis.
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* SEM-EDS training is offered upon user request and is typically conducted on a one-on-one basis. Completion of the training usually requires 2-3 sessions, with each session lasting approximately 2-3 hours.
* Prior to attending the training sessions, users are expected to review and familiarize themselves with the SEM operating procedures ([[JEOL 7800F|JEOL JSM-7800F]]). Users are encouraged to shadow an authorized user on the instrument 2-3 times before starting formal training. In addition, having a suitable sample prepared in advance of the training is highly recommended.
* Where appropriate and subject to staff availability and project timelines, a staff member may also assist in carrying out user projects.
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=== JEOL 7800F Prime SEM (QuanTech) ===
JEOL 7800F Prime is a field-emission scanning electron microscope used for high-resolution imaging of surface morphology.
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* SEM training is offered upon user request and is typically conducted on a one-on-one basis. Completion of the training usually requires 2-3 sessions, with each session lasting approximately 2-3 hours.
* Prior to attending the training sessions, users are expected to review and familiarize themselves with the SEM operating procedures ([[JEOL 7800F|JEOL JSM-7800F]]). Users are encouraged to shadow an authorized user on the instrument 2-3 times before starting formal training. In addition, having a suitable sample prepared in advance of the training is highly recommended.
* Where appropriate and subject to staff availability and project timelines, a staff member may also assist in carrying out user projects.
Training is usually 2-3 sessions of 2-hour per session.
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=== Thermo Fisher Scientific Talos F200i S/TEM ===
Talos F200i is a versatile 200-kV field-emission (scanning) transmission electron microscope designed for high-throughput, high-resolution materials characterization.
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* This instrument is classified as a high-level tool, and training is selective. Users are required to have prior experience with TEM/STEM before being considered for training. Cleanroom staff reserves the right to decline a training request if the prerequisite requirements are not met.
* Where appropriate and subject to staff availability and project timelines, a staff member may also assist in carrying out user projects.
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=== Raith e-Line ===
Bring a prepared design package for sessions 1 and 2, including alignment and overlay test patterns.
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* A design (gds, dxf, cif) for sessions 1 & 2 with:
** 4 alignment crosses (find out what marks work on the tool from your sub-group).
** Something to break the symmetry so you can tell chip orientation with your bare eye.
** A pattern that you will use to test overlay (alignment between two lithography steps). A Vernier pattern is commonly used. Feel free to test your ideas.
** Something creative, somethin fun :) This is an exercise in learning CAD as well.
* What is your project alias? If unsure, contact your supervisor first.
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=== Woollam alpha-SE Ellipsometer ===
More information will be provided shortly.
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=== Filmetrics reflectometer ===
More information will be provided shortly.
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== Thin Film Deposition ==

=== Plassys Evaporator ===
A physical vapour deposition tool of aluminium via e-beam evaporation for Josephson junction fabrication.

Apply for training via the [https://forms.office.com/e/b3PDKjsZ88?origin=lprLink NBI-Cleanroom Training Request Form].
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====Confirmation====
Once you sign up via the form, the tool responsible will contact you for the following details:
* Confirm that you have a sample ready.
* Confirm that you have shadowed your colleagues using the tool 2-3 times.
* Specify process steps you want to run
*: Materials, thickness, tilt, milling, oxidation
* The name of the recipe.
==== Restrictions====
* Only Si and sapphire samples are allowed in the chamber.
==== Training ====
* You'll need 2 sessions to get trained on this tool.
** Session 1 (2 hr.) - teaches you how to load/unload the sample and how to run a recipe.
** Session 2 (2 hr.) - sign off session
'''The instructor has the right to ask for additional training sessions.'''
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=== AJA1 and AJA2: metallization, sputtering or ion milling ===
Two nearly identical Orion physical vapour deposition (PVD) systems from AJA International for sputtering and e-beam evaporation, and substrate milling.

Apply for training via the [https://forms.office.com/e/b3PDKjsZ88?origin=lprLink NBI-Cleanroom Training Request Form].
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====Confirmation====
Once you sign up via the form, the tool responsible will contact you for the following details:
* Confirm that you have a sample ready.
* Confirm that you have shadowed your colleagues using the tool 2-3 times.
* Specify process steps you want to run
*: Materials, thickness, tilt, milling, oxidation
* Which tool do you want to use?
** '''AJA1'''
*** e-beam materials: Ti, Al, Au, SiOx, Pt, Ti, Ge
*** DC sputtering: Nb2Ti, Ti
*** DC Kaufman milling
*** Oxidation
*** Stage rotation, no stage cooling
** '''AJA2'''
*** e-beam materials: Ti, Al, Au, Cr, Pt, Pd
*** DC sputtering: Ti
*** RF sputtering: Ti, Nb2Ti
*** RF milling
*** Stage cooling, no stage rotation
* Specify the process steps you want to run.
*: Either the name of the recipe or all required process parameters.

===Before the training session===
* Watch the instruction video(s)
*Read the standard operating procedure on the [[AJA Systems|AJA Systems tool page]].

==== Training ====
* You'll need 2 sessions to get trained on this tool.
** Session 1 ( 2 hr.) - teaches you how to load/unload the sample and how to run a recipe.
** Session 2 ( 2 hr.) - sign off session
The instructor has the right to ask for additional training sessions.
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=== ALD1 and ALD2===
Two nearly identical Savannah S100-like systems are used for atomic layer deposition.

Apply for training via the [https://forms.office.com/e/b3PDKjsZ88?origin=lprLink NBI-Cleanroom Training Request Form].
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====Confirmation====
Once you sign up via the form, the tool responsible will contact you for the following details:
* Confirm that you have a sample ready.
* Confirm that you have shadowed your colleagues using the tool 2-3 times.
* Which tool do you want to use?
** '''ALD1''' available grown oxides: AlOx, HfOx, TiOx
** '''ALD2''' available grown oxides: AlOx, HfOx, ZrOx
** In ALD1, you are allowed to use resist for lift-off processes. In ALD2, '''you are not allowed to use a sample with resist on'''.
* Specify the process steps you want to run.
** Either the name of the recipe or all required process parameters.
====Before the training session====
* Watch the instruction video(s)
* Study the [[Atomic layer deposition|ALD principles]]
* Read the standard operating procedure on the [[Cambridge ALD|ALD tool page]].
====Training====
You'll need 2 sessions to get trained on this tool.
* Session 1 (30 mins) - teaches you how to load/unload the sample and how to run a recipe.
* Session 2 (30 mins) - sign off session
*: '''Note:''' An ALD session can have a long duration (often >12 hours). A usual training starts in the afternoon (load, setup, prepare recipe, run), and the film will grow throughout the evening. The next day, the user and the instructor will finish the training session (unloading).
'''The instructor has the right to ask for additional training sessions.'''
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== Packaging ==

=== F&S autobonder ===
A semi-automatic bonder to bond semiconductor substrates to PCB daughterboards from F&S Bondtec.

Apply for training via the [https://forms.office.com/e/b3PDKjsZ88?origin=lprLink NBI-Cleanroom Training Request Form].
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====Confirmation====
Once you sign up via the form, the tool responsible will contact you for the following details:
* Confirm that you have a '''chip''' ready for bonding.
* Confirm that you have shadowed your colleagues using the tool 2-3 times.
* You must know which '''daughterboard''' you will use for bonding (CPH, QBOARD1,2, QCAGE, Sydney, IC, custom).
* You must know what material you use to '''mount''' the chip to the daughterboard (mechanical clamping, silver paint, PMMA, other).
* Confirm that you have prepared a '''bonding schematic''' .
* By default, this bonder is using Al wire. You can request a special training if you want to use Au wire, but be aware it can be challenging.
*: Users are more likely to use the [[K&S bonder| K&S manual bonder]] for Au wire bonding.
* Specify the name of the recipe.
====Before the training session====
* Read the standard operating procedure on the [[FS bonder| FS bonder tool page]]
* Verify with one of your colleagues that your bonding schematic is correct.
==== Training ====
You'll need 2 sessions to get trained on this tool.
* Session 1 (2 hr.) - teaches you how to load/unload the sample and how to run a recipe.
* Session 2 (2 hr.) - sign off session
'''The instructor has the right to ask for additional training sessions.'''
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=== Manual bonder ===
Request manual bonder training via [mailto:cleanroom@nbi.ku.dk cleanroom@nbi.ku.dk].
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== Miscellaneous ==

=== Micromanipulator ===
Apply for sign-off via the [https://forms.office.com/e/b3PDKjsZ88?origin=lprLink NBI-Cleanroom Training Request Form].

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* Cleanroom doesn't train users in this tool.
* You need to get trained within your research group.
* Cleanroom will provide a sign-off session to ensure safety and verify that the user is aware of the dangers of working with nanoparticles.
==== Before you start your training sessions====
* You need to carefully read and familiarise yourself with the risks of exposure while [[Working with nanowires and nanotubes]]
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[[Category:Tools]]